CN101054265B - Glass etching liquid for flat panel display - Google Patents

Abstract

The invention discloses a flat panel display glass etching solution, including hydrogen fluoride ammonium, strong acid and pure water, thinning FPD glass to target thickness through soak method assisting with means of mechanical throwing or spraying. The invention has advantages: little toxicity, without volatilization and fast etching speed, high-usage and low cost, good glass appearance, high non defective rate, low aftertreatment cost, simple compound technology, little environmental pollution, which is a novel technology material of thinning FPD glass in future.

Description

Glass etching liquid for flat panel display

Technical field

The present invention relates to a kind of glass etching liquid, especially relate to a kind of glass etching liquid that is applied to display screen (comprising TN, STN, CSTN, TFT, TP, OLED etc.) the glass substrate thinning among the flat-panel monitor FPD.

Background technology

Liquid crystal display common thining method at present has two kinds, and one is physics polishing grinding, and one is chemical milling, and wherein chemical thinning glass has following characteristics:

1. the thinning time is short;

2. thinning output is higher;

3. composition is simple, and preparation is than being easier to.

At present, the producer that carries out the FPD glass thinning is arranged, major part is to be main raw material with hydrofluoric acid, and some only uses single hydrofluoric acid solution, and there is following shortcoming in this way: 1, directly contact hydrofluoric acid, the toxicity height, and this soup easily produces hydrofluoric acid gas, dangerous height when particularly preparing in the production process, if be aided with heating, then danger is higher; 2, etching process produces white indissoluble thing, is suspended in the etching solution easily and adheres to the pipeline cell wall, is difficult to handle.And this indissoluble thing adsorptivity is stronger, sticks to the FPD glass surface easily, and FPD glass appearance good article rate and aftertreatment have been caused very big influence; 3, speed instability and utilization ratio are lower in the production process; 4. low owing to utilization ratio, the liquid waste disposal difficulty, the treatment cost of waste liquor that matches with it is higher.

Along with thinning FPD market development is increasing, the attenuate of FPD glass will have more and more enterprises to add, the increase of hydrofluoric acid consumption will strengthen the injury to environment, and this technology should be eliminated as early as possible, and effective new technology safe in utilization will become the trend of FPD glass thinning.

Summary of the invention

The objective of the invention is to provide safety, stable, production environment efficiently, the glass etching liquid of handling etching indissoluble thing problem simultaneously preferably and improving good article rate for the FPD glass etching.

Purpose of the present invention can realize by following technical measures: a kind of glass etching liquid comprises the following moiety of meter by weight:

22～26 parts of 50～59 parts of pure water of 9～15 parts of strong acid of ammonium bifluoride.

Strong acid of the present invention is 45%～60% sulfuric acid.

Strong acid of the present invention is sulfuric acid and hydrochloric acid, and wherein 45%～60% sulfuric acid is 36～41 parts, 14～18 parts of 36%～37% hydrochloric acid.

Strong acid of the present invention is sulfuric acid and nitric acid, and wherein 45%～60% sulfuric acid is 44～52 parts, 6～7 parts in 30%～35% nitric acid.

Strong acid of the present invention is sulfuric acid, hydrochloric acid and nitric acid, and wherein 45%～60% sulfuric acid is 33～37 parts, 12～15 parts of 36%～37% hydrochloric acid, 5～7 parts in 30%～35% nitric acid.

The present invention compared with prior art has following advantage and effect:

1) toxicity is little, pollution-free: the relative and HF acid solution of solution formula raw material of the present invention, and toxicity is much lower, and ammonium bifluoride is that solid, sulfuric acid and salpeter solution concentration are less, hydrochloric acid toxicity is low, it all is dangerous low, easy processing, after being mixed with solution, no volatilization problem, the soup security is better; Get final product through the water flushing with after being coated with simple process such as putting calglucon on the skin after the careless contact of personnel;

2) etch-rate is fast, utilization ratio is high: the relative HF acid solution of solution formula of the present invention, and etching speed has improved 1～2 micron/minute, can reach 6.5 microns/minute; The soup utilization ratio has improved 60～80%; Calculate from utilization ratio, the amount that spent acid is handled has also descended about 50%, has not only improved efficient, and cost also reduces widely;

3) improved etching indissoluble thing problem and improved good article rate: prescription of the present invention and FPD glass reaction have generated and have been different from the material that hydrofluoric acid and FPD glass reaction generate, this indissoluble thing amount does not have adsorptivity less, easily precipitate, etching solution is always clear state, is better than the muddy state after hydrofluoric acid etch liquid uses; Be precipitated as mashed prod, do not have an also prevented from caking of adsorptivity, very easily flushing;

In sum, etching solution of the present invention is a kind of glass thinning prescription more more advanced than hydrofluoric acid etch liquid, no matter being better than advanced person's prescription of hydrofluoric acid etch liquid from security, environmental pollution, stability, speed, yield everyway, is the novel process materials of following FPD glass thinning.

Embodiment

Example 1

10 parts of the ammonium bifluorides, 55 parts in 55% sulfuric acid, the pure water that take by weighing are by weight poured in the container for 24 parts, promptly got etching solution after stirring.

Example 2

38 parts in 14 parts of ammonium bifluorides, 60% sulfuric acid, 15 parts of 37% hydrochloric acid, the pure water that take by weighing are by weight poured in the container for 23 parts, promptly got etching solution after stirring.

Example 3

48 parts in 10 parts of ammonium bifluorides, 55% sulfuric acid, 6 parts in 30% nitric acid, the pure water that take by weighing are by weight poured in the container for 23 parts, promptly got etching solution after stirring at room is even.

Example 4

39 parts in 12 parts of ammonium bifluorides, 50% sulfuric acid, 17 parts of 37% hydrochloric acid, the pure water that take by weighing are by weight poured in the container for 25 parts, promptly got etching solution after stirring.

Example 5

With 15 parts of ammonium bifluorides, 35 parts in 45% sulfuric acid that takes by weighing by weight, 13 parts of 36% hydrochloric acid, 32% nitric acid is poured in the container for 5 parts, promptly gets etching solution after stirring.

Glass etching liquid of the present invention is that TFT (thin film transistor) glass thinning of 1.000mm is that the process of 0.800mm is as follows with thickness:

With size is 305*375mm, thickness is that TFT glass four limits of 1.000mm seal with UV glue, through surface cleaning, setting is positioned in the etching basket, is soaked in the etching bath of being furnished with etching solution of the present invention, opening moving frame of throwing and attemperation simultaneously is 25 ℃～35 ℃, about in half an hour, glass is proposed, pass through pure water rinsing, alkali lye flushing, pure water rinsing, oven dry again, measure thickness of glass, statistical average value is 0.800 ± 0.030mm.Except that TFT glass, the present invention can also be used for other as glass such as TN, STN, CSTN, TFT, TP, OLED.

Above embodiment is several preferable embodiment of the present invention; but protection scope of the present invention is not limited thereto, and those skilled in the art all can realize purpose of the present invention by disclosed component ratio scope in the above-mentioned technology contents.

Claims (4)

1. glass etching liquid for flat panel display is characterized in that comprising the following moiety of meter by weight:

22～26 parts of 50～59 parts of pure water of 9～15 parts of strong acid of ammonium bifluoride;

Described strong acid is 45%～60% sulfuric acid.

2. glass etching liquid for flat panel display is characterized in that comprising the following moiety of meter by weight:

22～26 parts of 50～59 parts of pure water of 9～15 parts of strong acid of ammonium bifluoride;

Described strong acid is sulfuric acid and hydrochloric acid, and wherein 45%～60% sulfuric acid is 36～41 parts, 14～18 parts of 36%～37% hydrochloric acid.

3. glass etching liquid for flat panel display is characterized in that comprising the following moiety of meter by weight:

22～26 parts of 50～59 parts of pure water of 9～15 parts of strong acid of ammonium bifluoride;

Described strong acid is sulfuric acid and nitric acid, and wherein 45%～60% sulfuric acid is 44～52 parts, 6～7 parts in 30%～35% nitric acid.

4. glass etching liquid for flat panel display is characterized in that comprising the following moiety of meter by weight:

22～26 parts of 50～59 parts of pure water of 9～15 parts of strong acid of ammonium bifluoride;

Described strong acid is sulfuric acid, hydrochloric acid and nitric acid, and wherein 45%～60% sulfuric acid is 33～37 parts, 12～15 parts of 36%～37% hydrochloric acid, 5～7 parts in 30%～35% nitric acid.