CN101038438A - Black photosensitive composition - Google Patents
Black photosensitive composition Download PDFInfo
- Publication number
- CN101038438A CN101038438A CNA2007100877634A CN200710087763A CN101038438A CN 101038438 A CN101038438 A CN 101038438A CN A2007100877634 A CNA2007100877634 A CN A2007100877634A CN 200710087763 A CN200710087763 A CN 200710087763A CN 101038438 A CN101038438 A CN 101038438A
- Authority
- CN
- China
- Prior art keywords
- black
- photosensitive composition
- pigment
- black photosensitive
- mass parts
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 239000011159 matrix material Substances 0.000 claims abstract description 43
- 150000001875 compounds Chemical class 0.000 claims abstract description 25
- 239000004973 liquid crystal related substance Substances 0.000 claims abstract description 8
- 239000000049 pigment Substances 0.000 claims description 42
- 239000012860 organic pigment Substances 0.000 claims description 22
- 230000003287 optical effect Effects 0.000 claims description 20
- 239000003795 chemical substances by application Substances 0.000 claims description 18
- 238000005192 partition Methods 0.000 claims description 14
- 239000006229 carbon black Substances 0.000 claims description 9
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- 239000007787 solid Substances 0.000 claims description 2
- 206010034972 Photosensitivity reaction Diseases 0.000 abstract 3
- 230000036211 photosensitivity Effects 0.000 abstract 3
- 239000003999 initiator Substances 0.000 abstract 1
- 239000003381 stabilizer Substances 0.000 abstract 1
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- 125000006158 tetracarboxylic acid group Chemical group 0.000 description 4
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- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- ZJTLZYDQJHKRMQ-UHFFFAOYSA-N menadiol Chemical compound C1=CC=CC2=C(O)C(C)=CC(O)=C21 ZJTLZYDQJHKRMQ-UHFFFAOYSA-N 0.000 description 1
- 229910052976 metal sulfide Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- KBHMHROOFHVLBA-UHFFFAOYSA-N metamfepramone Chemical compound CN(C)C(C)C(=O)C1=CC=CC=C1 KBHMHROOFHVLBA-UHFFFAOYSA-N 0.000 description 1
- NYGZLYXAPMMJTE-UHFFFAOYSA-M metanil yellow Chemical group [Na+].[O-]S(=O)(=O)C1=CC=CC(N=NC=2C=CC(NC=3C=CC=CC=3)=CC=2)=C1 NYGZLYXAPMMJTE-UHFFFAOYSA-M 0.000 description 1
- 125000005641 methacryl group Chemical group 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- 125000005395 methacrylic acid group Chemical class 0.000 description 1
- HSDFKDZBJMDHFF-UHFFFAOYSA-N methyl 3-ethoxypropanoate Chemical class CCOCCC(=O)OC HSDFKDZBJMDHFF-UHFFFAOYSA-N 0.000 description 1
- BDJSOPWXYLFTNW-UHFFFAOYSA-N methyl 3-methoxypropanoate Chemical class COCCC(=O)OC BDJSOPWXYLFTNW-UHFFFAOYSA-N 0.000 description 1
- DBQGARDMYOMOOS-UHFFFAOYSA-N methyl 4-(dimethylamino)benzoate Chemical class COC(=O)C1=CC=C(N(C)C)C=C1 DBQGARDMYOMOOS-UHFFFAOYSA-N 0.000 description 1
- QPJVMBTYPHYUOC-UHFFFAOYSA-N methyl benzoate Chemical class COC(=O)C1=CC=CC=C1 QPJVMBTYPHYUOC-UHFFFAOYSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 229940017219 methyl propionate Drugs 0.000 description 1
- CWKLZLBVOJRSOM-UHFFFAOYSA-N methyl pyruvate Chemical compound COC(=O)C(C)=O CWKLZLBVOJRSOM-UHFFFAOYSA-N 0.000 description 1
- NKHAVTQWNUWKEO-NSCUHMNNSA-N monomethyl fumarate Chemical compound COC(=O)\C=C\C(O)=O NKHAVTQWNUWKEO-NSCUHMNNSA-N 0.000 description 1
- 229940005650 monomethyl fumarate Drugs 0.000 description 1
- UUIQMZJEGPQKFD-UHFFFAOYSA-N n-butyric acid methyl ester Natural products CCCC(=O)OC UUIQMZJEGPQKFD-UHFFFAOYSA-N 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- JMXROTHPANUTOJ-UHFFFAOYSA-H naphthol green b Chemical compound [Na+].[Na+].[Na+].[Fe+3].C1=C(S([O-])(=O)=O)C=CC2=C(N=O)C([O-])=CC=C21.C1=C(S([O-])(=O)=O)C=CC2=C(N=O)C([O-])=CC=C21.C1=C(S([O-])(=O)=O)C=CC2=C(N=O)C([O-])=CC=C21 JMXROTHPANUTOJ-UHFFFAOYSA-H 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- FZUGPQWGEGAKET-UHFFFAOYSA-N parbenate Chemical compound CCOC(=O)C1=CC=C(N(C)C)C=C1 FZUGPQWGEGAKET-UHFFFAOYSA-N 0.000 description 1
- PHEDXBVPIONUQT-RGYGYFBISA-N phorbol 13-acetate 12-myristate Chemical compound C([C@]1(O)C(=O)C(C)=C[C@H]1[C@@]1(O)[C@H](C)[C@H]2OC(=O)CCCCCCCCCCCCC)C(CO)=C[C@H]1[C@H]1[C@]2(OC(C)=O)C1(C)C PHEDXBVPIONUQT-RGYGYFBISA-N 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 229940110337 pigment blue 1 Drugs 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 229920005749 polyurethane resin Chemical class 0.000 description 1
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- CIBMHJPPKCXONB-UHFFFAOYSA-N propane-2,2-diol Chemical compound CC(C)(O)O CIBMHJPPKCXONB-UHFFFAOYSA-N 0.000 description 1
- 229940107700 pyruvic acid Drugs 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 238000012216 screening Methods 0.000 description 1
- DCKVNWZUADLDEH-UHFFFAOYSA-N sec-butyl acetate Chemical compound CCC(C)OC(C)=O DCKVNWZUADLDEH-UHFFFAOYSA-N 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- GOLXNESZZPUPJE-UHFFFAOYSA-N spiromesifen Chemical compound CC1=CC(C)=CC(C)=C1C(C(O1)=O)=C(OC(=O)CC(C)(C)C)C11CCCC1 GOLXNESZZPUPJE-UHFFFAOYSA-N 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 239000006234 thermal black Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000010023 transfer printing Methods 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- JLGLQAWTXXGVEM-UHFFFAOYSA-N triethylene glycol monomethyl ether Chemical compound COCCOCCOCCO JLGLQAWTXXGVEM-UHFFFAOYSA-N 0.000 description 1
- 229940124543 ultraviolet light absorber Drugs 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
- Optical Filters (AREA)
- Optical Elements Other Than Lenses (AREA)
Abstract
The invention provides a black photosensitivity composition which can forms black matrix having high heat-stability. In addition, the invention provides a black matrix, dividing wall used by ink-jet type color filter and interval layer used by Liquid crystal display element which are formed by the black photosensitivity composition. The black photosensitivity composition contains photopolymerization compound, photopolymerization initiator and organic colour serving as shape stabilizer.
Description
Technical field
The present invention relates to black photosensitive composition.Relate to be used to form the black photosensitive composition of light-proofness films such as black matrix" specifically.
Background technology
Display device such as LCD be a kind of between two substrates that formed at opposite one another paired electrode the structure of clamping liquid crystal layer.And, formed the color filter that has by red (R), green (G), blue formed pixels of all kinds such as (B) in the inboard of a side group plate.In this color filter, in order to prevent the colour mixture of different colours in each pixel, or in order to cover the pattern of electrode, form usually be rectangular configuration black matrix" to distinguish R, G, each color pixel of B.
Usually, color filter is formed by photoetching process.Specifically, the at first photosensitive composite of painting black on substrate, and exposure, development form black matrix".Then, red (R), green (G), blue (B) every kind of photosensitive composite of all kinds are coated with repeatedly, expose, develop, form each colored pattern at assigned address thus, and form color filter.
In addition, the black matrix" in the past forms with in the photosensitive composite, and in order to give light-proofness, the carbon removal infrablack also contains organic pigment as auxiliary pigment (referring to patent documentation 1).
[patent documentation 1] spy opens flat 6-289216 communique
Summary of the invention
Yet, in order in black matrix", to give high light-proofness, must improve the content of light screening material, and increase film thickness.Therefore, exist optical concentration to uprise, light can't arrive the depths of film, the situation that causes photocuring (photoresponse) fully to carry out when exposure.Its result causes development permission scope to narrow down, the rectilinearity step-down of pattern, or pattern peels off from substrate, or on substrate, produce the situation of residue.
In addition, when using the ink-jetting style of being paid close attention in recent years to form color filter, in black matrix" in the past, if from top spraying ink composition, the situation that then exists ink composition outside pattern, to overflow.Therefore, in order to prevent overflowing of this ink composition, must increase the thickness of black matrix".
Under the above-mentioned situation that increases the black matrix" thickness, the problem of wrinkle has appearred producing on patterned surfaces.In addition, though be difficult to occur this situation at black matrix" during for film, the problem that film deforms when heat-treating has appearred again.
In view of above problem, the object of the invention is to provide a kind of black matrix" formation black photosensitive composition that can form at the high black matrix" of hot shape stability.In addition, the object of the invention is to provide a kind of by the formed black matrix" of this black photosensitive composition, ink jet type color filter partition wall and used for liquid crystal display element wall.
Discoveries such as the inventor contain the dimensionally stable agent in black photosensitive composition, be effective to the stabilization of black matrix" shape.Specifically, agent is effectively as dimensionally stable to find to contain organic pigment, finishes the present invention thus.
The present invention relates to a kind of black photosensitive composition that contains optical polymerism compound, Photoepolymerizationinitiater initiater and black pigment, and provide and contain the black photosensitive composition of organic pigment, and by the formed black matrix" of this black photosensitive composition, ink jet type color filter partition wall and used for liquid crystal display element wall as the dimensionally stable agent.
According to the present invention, contain the dimensionally stable agent in the black photosensitive composition by making, can form for the high black matrix" of hot shape stability.In addition, by with organic pigment as the dimensionally stable agent, on one side can adjust the black of black pigment, Yi Bian make the dimensionally stableization of black matrix".By adding organic pigment, can adjust the cone angle of black matrix".Its result can provide a kind of have ink composition black matrix", ink jet type the color filter partition wall and the used for liquid crystal display element wall of the pattern of control easily.
Embodiment
Below, embodiments of the present invention are described.
Black photosensitive composition of the present invention contains optical polymerism compound, Photoepolymerizationinitiater initiater and black pigment, and further contains the organic pigment as the dimensionally stable agent.
[optical polymerism compound]
So-called " optical polymerism compound " is meant illumination such as accepting ultraviolet ray and polymerization and solidified material.As the optical polymerism compound, preferably has the compound of the two keys of ethene.
＜have a compound of the two keys of ethene 〉
As compound with the two keys of ethene, can enumerate acrylic acid, methacrylic acid, fumaric acid, maleic acid, monomethyl fumarate, monomethyl ester, acrylic acid-2-hydroxyl ethyl ester, 2-hydroxyethyl methacry-late, the glycol monoethyl ether acrylate, the glycol monoethyl ether methacrylate, the ethylene glycol monoethyl ether acrylate, the ethylene glycol monoethyl ether methacrylate, acrylic acid glyceride, glyceral methacrylate, acrylamide, Methacrylamide, vinyl cyanide, methacrylonitrile, methyl acrylate, methyl methacrylate, ethyl acrylate, Jia Jibingxisuanyizhi, isobutyl acrylate, isobutyl methacrylate, acrylic acid-2-ethyl caproite, methacrylic acid-2-Octyl Nitrite, benzyl acrylate, benzyl methacrylate, glycol diacrylate, ethylene glycol dimethacrylate, diethylene glycol diacrylate, triethylene glycol diacrylate, triethylene glycol dimethacrylate, tetraethylene glycol diacrylate, tetraethylene glycol dimethacrylate, butanediol dimethylacrylate, propylene glycol diacrylate, the propylene glycol dimethylacrylate, trimethylolpropane triacrylate, trimethylol-propane trimethacrylate, tetra methylol propane tetraacrylate, tetra methylol propane tetramethyl acrylate, pentaerythritol triacrylate, pentaerythritol acrylate trimethyl, tetramethylol methane tetraacrylate, pentaerythrite tetramethyl acrylate, dipentaerythritol five acrylate, dipentaerythritol pentamethyl acrylate, dipentaerythritol acrylate, dipentaerythritol hexamethyl acrylate, 1, the 6-hexanediyl ester, 1, the 6-hexanediol dimethacrylate, monomers such as the epoxy diacrylate of curling, the oligomer class; Make polyester prepolyer reaction that (methyl) acrylic acid and polyalcohols and monoacid or polyprotonic acid condensation obtain and polyester (methyl) acrylate, make polynary alcohol radical and have the compound reaction of two isocyanate group after, (methyl) acrylic acid is reacted and polycarbamate (methyl) acrylate that obtains with it; Epoxy (methyl) acrylate resin that makes the reaction of epoxy resin such as bisphenol A type epoxy resin, bisphenol f type epoxy resin, bisphenol-s epoxy resin, phenol or cresols linear phenol-aldehyde resin type epoxy resin, bakelite type epoxy resin, tris-phenol type epoxy resin, polybasic carboxylic acid poly glycidyl ester, polyvalent alcohol poly glycidyl ester, aliphatics or alicyclic epoxy resin, amine epoxy resin, dihydroxy benzenes type epoxy resin and (methyl) acrylic acid and obtain etc.The resin that can use the reaction of multi-anhydride and aforementioned epoxy (methyl) acrylate resin in addition and obtain.Owing in these compounds, imported acryloyl group or methacryl, therefore can improve cross-linking efficiency, and the photostability of filming, chemical proofing are good.
The wherein also preferred resin that in molecule, has coiled structure.Because therefore its thermotolerance of resin and chemical proofing height with coiled structure use in the optical polymerism compound, can improve the thermotolerance and the chemical proofing of black photosensitive composition.It specifically is the preferred represented resin of following general formula (1) that uses.
Change 1
In the formula, X is the represented group of following general formula (2), and (residue CO-O-CO-), Z are for to slough two residues after the anhydride group from the tetracarboxylic dianhydride, n is 1～20 integer in order to slough anhydride group from dicarboxylic anhydride for Y.
Change 2
As the instantiation of the dicarboxylic anhydride that derives aforementioned Y (sloughing anhydride group dicarboxylic anhydride before), can enumerate for example maleic anhydride, succinic anhydride, itaconic anhydride, phthalate anhydride, tetrahydrobenzene dicarboxylic acid anhydride, hexahydrobenzene dicarboxylic acid anhydride, methyl endo-methylene group tetrahydrobenzene dicarboxylic acid anhydride, chlorendic acid acid anhydride, methyltetrahydro phthalate anhydride, glutaric anhydride etc.
In addition, instantiation as the tetracarboxylic dianhydride who derives aforementioned Z (sloughing two anhydride group tetracarboxylic dianhydride before), for example can enumerate tetracarboxylic dianhydrides such as PMA, benzophenone tetracarboxylic dianhydride, biphenyl tetracarboxylic dianhydride, biphenyl ether tetracarboxylic dianhydride etc.
In addition, the above-mentioned preferred service property (quality) mean molecular weight of compound with the two keys of ethene is the material more than 1,000.By making the quality mean molecular weight is more than 1,000, can make to film evenly.In addition, the quality mean molecular weight is preferably below 100,000.By making the quality mean molecular weight is below 100,000, can make development good.Among the present invention, be that the compound with the two keys of ethene more than 1,000 is called the macromolecular compound with the two keys of ethene with the quality mean molecular weight.
In addition, preferably above-mentioned macromolecular compound and photopolymerization monomer with the two keys of ethene is used in combination.As this photopolymerization monomer, can enumerate methyl acrylate, methyl methacrylate, acrylic acid-2-hydroxyl ethyl ester, 2-hydroxyethyl methacry-late, methacrylic acid-2-hydroxypropyl acrylate, glycol diacrylate, ethylene glycol dimethacrylate, triethylene glycol diacrylate, triethylene glycol dimethacrylate, tetraethylene glycol diacrylate, tetraethylene glycol dimethacrylate, propylene glycol diacrylate, the propylene glycol dimethylacrylate, trimethylolpropane triacrylate, trimethylol-propane trimethacrylate, tetra methylol propane tetraacrylate, tetra methylol propane tetramethyl acrylate, pentaerythritol triacrylate, pentaerythritol acrylate trimethyl, tetramethylol methane tetraacrylate, pentaerythrite tetramethyl acrylate, dipentaerythritol five acrylate, dipentaerythritol pentamethyl acrylate, dipentaerythritol acrylate, dipentaerythritol hexamethyl acrylate, 1, the 6-hexanediyl ester, benzyl acrylate, benzyl methacrylate, curling epoxy diacrylate, acrylic acid, methacrylic acid etc., but be not limited to these.Wherein, preferred multi-functional photopolymerization monomer.By this macromolecular compound and photopolymerization monomer with the two keys of ethene combined, can improve curable, and make pattern formation become easy.
As above-mentioned optical polymerism compound, can enumerate the material that its molecule self can polymerization, in the present invention, the potpourri of polymer binder and photopolymerization monomer is also contained in the optical polymerism compound.
As polymer binder, consider the bonding agent that preferably can carry out alkaline development from the difficulty or ease of developing.As polymer binder, can enumerate acrylic acid, methacrylic acids etc. have the monomer and the methyl acrylate of carboxyl, methyl methacrylate, ethyl acrylate, Jia Jibingxisuanyizhi, acrylic acid-2-hydroxyl ethyl ester, 2-hydroxyethyl methacry-late, methacrylic acid-2-hydroxypropyl acrylate, n-butyl acrylate, n-BMA, isobutyl acrylate, isobutyl methacrylate, benzyl acrylate, benzyl methacrylate, acrylic acid benzene oxygen ester, methacrylic acid benzene oxygen METH acrylic acid benzene oxygen ester, isobornyl acrylate, IBOMA, glycidyl methacrylate, styrene, acrylamide, the multipolymer of vinyl cyanide etc., and phenol novolac-type epoxy acrylic ester polymer, phenol linear phenol-aldehyde resin type epoxy methacrylates polymkeric substance, cresols linear phenol-aldehyde resin type epoxy acrylic ester polymer, cresols linear phenol-aldehyde resin type epoxy methacrylates polymkeric substance, the bisphenol-a epoxy acrylate polymkeric substance, resins such as bisphenol S type epoxy acrylic ester polymer.The content that the acrylic acid, methacrylic acid etc. that constitute aforementioned resin have a monomer component of carboxyl is preferably the scope of 5～40mol%.
The preferable range of above-mentioned polymer binder quality mean molecular weight is 1,000～100,000.By making the quality mean molecular weight is more than 1,000, can make to film evenly.In addition, be below 100,000 by making the quality mean molecular weight, can make development good.
When containing polymer binder and photopolymerization monomer, with respect to the total amount of polymer binder and the photopolymerization monomer and the Photoepolymerizationinitiater initiater of 100 mass parts, preferably with the range fit polymer binder of 10～60 mass parts as the optical polymerism compound.By making use level is more than 10 mass parts, can form film at an easy rate when coating, drying, and can fully improve the overlay film intensity after the curing.In addition, be below 60 mass parts by making use level, can make development good.
In addition, with respect to polymer binder and the photopolymerization monomer and the Photoepolymerizationinitiater initiater total amount of 100 mass parts, preferably with the range fit photopolymerization monomer of 15～50 mass parts.By making aforementioned use level is more than 15 mass parts, can prevent that photocuring is bad, and can access enough thermotolerances and chemical proofing.In addition, be below 50 mass parts by making use level, can make the formation ability of filming good.
[Photoepolymerizationinitiater initiater]
As Photoepolymerizationinitiater initiater; for example can enumerate; the 1-hydroxycyclohexylphenylketone; 2-hydroxy-2-methyl-1-phenyl-propane-1-ketone; 1-[4-(2-hydroxyl-oxethyl) phenyl]-2-hydroxy-2-methyl-1-propane-1-ketone; 1-(4-isopropyl phenyl)-2-hydroxy-2-methyl propane-1-ketone; 1-(4-dodecylphenyl)-2-hydroxy-2-methyl propane-1-ketone; 2; 2-dimethoxy-1; 2-diphenylethane-1-ketone; two (4-dimethylaminophenyl) ketone; 2-methyl isophthalic acid-[4-(methyl mercapto) phenyl]-2-morpholino propane-1-ketone; 2-benzyl-2-dimethylamino-1-(4-morpholino phenyl)-butane-1-ketone; ethyl ketone-1-[9-ethyl-6-(2-methyl benzoyl)-9H-carbazole-3-yl]-1-(o-acetyl-base oxime); 2; 4; 6-trimethylbenzoyl diphenyl phosphine oxide; 4-benzoyl-4 '-methyl dimethoxy base sulfide; the 4-dimethylaminobenzoic acid; 4-dimethylaminobenzoic acid methyl esters; 4-dimethylaminobenzoic acid ethyl ester; 4-dimethylaminobenzoic acid butyl ester; 4-dimethylamino-2-ethylhexyl benzoic acid; 4-dimethylamino-2-isoamyl benzene formic acid; benzyl-'beta '-methoxy ethyl acetals; benzyl dimethyl ketal; 1-phenyl-1; 2-propanedione-2-(adjacent ethoxy carbonyl) oxime; o-benzoyl yl benzoic acid methyl esters; 2; the 4-diethyl thioxanthone; the 2-clopenthixal ketone; 2; 4-dimethyl thioxanthones; 1-chloro-4-propoxyl group thioxanthones; thioxanthene; 2-diuril ton; 2; 4-diethyl thioxanthene; 2-methyl thioxanthene; 2-isopropyl thioxanthene; the 2-EAQ; the prestox anthraquinone; 1; 2-benzo anthraquinone; 2; 3-diphenyl anthraquinone; azoisobutyronitrile; benzoyl peroxide; dicumyl peroxide; 2-mercaptobenzimidazole; the 2-mercaptobenzoxazole; 2-mercaptobenzothiazole; 2-(Chloro-O-Phenyl)-4; 5-two (m-methoxyphenyl)-imidazole radicals dipolymer; benzophenone; the 2-chlorobenzophenone; p; p '-two dimethylamino benzophenone; 4; 4 '-two diethylamino benzophenone; 4; 4 '-dichloro benzophenone; 3; 3-dimethyl-4-methoxy benzophenone; benzil; benzoin; benzoin methylether; benzoin ethyl ether; benzoin iso-propylether; benzoin n-butylether; the benzoin isobutyl ether; the benzoin butyl ether; acetophenone; 2; the 2-diethoxy acetophenone; to dimethyl acetophenone; to the dimethylamino propiophenone; dichloroacetophenone; trichloroacetophenone; p-tert.-butyl acetophenone; to the dimethylamino benzoylformaldoxime; to tert-butyl group trichloroacetophenone; to tert-butyl group dichloroacetophenone; α; α-Er Lv-4-Ben Yangjibenyitong; thioxanthones; 2-methyl thioxanthones; the 2-isopropyl thioxanthone; Dibenzosuberone; amyl group-4-dimethylaminobenzoic acid ester; the 9-phenylacridine; 1; 7-two-(9-acridinyl) heptane; 1; 5-pair-(9-acridinyl) pentane; 1; 3-pair-(9-acridinyl) propane; right-the methoxyl triazine; 2; 4; 6-three (trichloromethyl)-s-triazine; 2-methyl-4; two (the trichloromethyl)-s-triazines of 6-; 2-[2-(5-methylfuran-2-yl) vinyl]-4; two (the trichloromethyl)-s-triazines of 6-; 2-[2-(furans-2-yl) vinyl]-4; two (the trichloromethyl)-s-triazines of 6-; 2-[2-(4-diethylamino-2-aminomethyl phenyl) vinyl]-4; two (the trichloromethyl)-s-triazines of 6-; 2-[2-(3; the 4-Dimethoxyphenyl) vinyl]-4; two (the trichloromethyl)-s-triazines of 6-; 2-(4-methoxyphenyl)-4; two (the trichloromethyl)-s-triazines of 6-; 2-(4-ethoxybenzene vinyl)-4; two (the trichloromethyl)-s-triazines of 6-; 2-(4-n-butoxy phenyl)-4; two (the trichloromethyl)-s-triazines of 6-; 2; 4-pair-trichloromethyl-6-(3-bromo-4-methoxyl) phenyl-s-triazine; 2; 4-pair-trichloromethyl-6-(2-bromo-4-methoxyl) phenyl-s-triazine; 2; 4-pair-trichloromethyl-6-(3-bromo-4-methoxyl) styryl phenyl-s-triazine; 2,4-pair-trichloromethyl-6-(2-bromo-4-methoxyl) styryl phenyl-s-triazine etc.These Photoepolymerizationinitiater initiaters can be used in combination separately or more than 2 kinds.
With respect to the total amount of above-mentioned optical polymerism compound of 100 mass parts and Photoepolymerizationinitiater initiater, the content of this Photoepolymerizationinitiater initiater is preferably 1～40 mass parts.
[black pigment]
As this black pigment, so long as have the pigment of light-proofness, just be not particularly limited, specifically can enumerate the inorganic pigments such as oxide, composite oxides, metal sulfide, metal sulfate or metal carbonate of metals such as carbon black, titanium are black, copper, iron, manganese, cobalt, chromium, nickel, zinc, calcium, silver.In these black pigments, more preferably use carbon black with high light-proofness.
As carbon black, can use channel black, stove China ink, thermal black, known carbon black such as dim.In addition, preferably use the carbon black of coated with resins.
Because the carbon black of this coated with resins is compared with the carbon black with coated with resins not, its electric conductivity is low, during therefore as the black matrix" of the liquid crystal display cells of LCD and so on, can form the electric current leakage less, LCD that reliability is high.
In addition, as spreading agent, preferably use polyethyleneimine: amine, polyurethane resin class, crylic acid resin macromolecule dispersing agent.
As these spreading agents, for example can enumerate the commodity ソ Le ス パ one ス S3000 of the commodity BYK-161,162,163,164,166,170,182 of BYK-ChemieJapan Co., Ltd. system, Zeneca Co., Ltd. system, S9000, S17000, S20000, S27000, S24000, S26000, S28000 etc.
[dimensionally stable agent]
Black photosensitive composition of the present invention contains the organic pigment as the dimensionally stable agent.By containing this organic pigment, can form for heat-staple black matrix".In addition, this organic pigment also can be adjusted the color of black pigment.By adding organic pigment, at high temperature handle the also stable pattern of shape even can form.
In addition, by adding this organic pigment, when forming black matrix", can adjust the cone angle of pattern.
As this organic pigment, can enumerate color index (C.I.; The distribution of The Society of Dyers andColourists society) is categorized as the compound of pigment (pigment) in, is specially material shown in following this color index (C.I.) numbering.
C.I. pigment yellow 1 (below, only record be the numbering of " C.I. pigment yellow " equally), 3,11,12,13,14,15,16,17,20,24,31,53,55,60,61,65,71,73,74,81,83,86,93,95,97,98,99,100,101,104,106,108,109,110,113,114,116,117,119,120,125,126,127,128,129,137,138,139,147,148,150,151,152,153,154,155,156,166,167,168,175,180,185;
C.I. pigment orange 1 (below, only record be the numbering of " C.I. pigment orange " equally), 5,13,14,16,17,24,34,36,38,40,43,46,49,51,55,59,61,63,64,71,73;
C.I. pigment violet 1 (below, only record be the numbering of " C.I. pigment violet " equally), 19,23,29,30,32,36,37,38,39,40,50;
C.I. paratonere 1 (below, only record be the numbering of " C.I. paratonere " equally), 2,3,4,5,6,7,8,9,10,11,12,14,15,16,17,18,19,21,22,23,30,31,32,37,38,40,41,42,48:1,48:2,48:3,48:4,49:1,49:2,50:1,52:1,53:1,57,57:1,57:2,58:2,58:4,60:1,63:1,63:2,64:1,81:1,83,88,90:1,97,101,102,104,105,106,108,112,113,114,122,123,144,146,149,150,151,155,166,168,170,171,172,174,175,176,177,178,179,180,185,187,188,190,192,193,194,202,206,207,208,209,215,216,217,220,223,224,226,227,228,240,242,243,245,254,255,264,265;
C.I. pigment blue 1 (below, only record be the numbering of " C.I. alizarol saphirol " equally), 2,15,15:3,15:4,15:6,16,22,60,64,66;
C.I. pigment Green 7, C.I. pigment green 36, C.I. naphthol green 37;
C.I. bistre 23, C.I. bistre 25, C.I. bistre 26, C.I. bistre 28;
C.I. pigment black 1, C.I. pigment black 7.
In addition, as mentioned above, organic pigment also is used as the auxiliary pigment of carbon black not only as the dimensionally stable agent.As auxiliary pigment, for example can enumerate phthalocyanine pigment, azo class pigment and basic-dyeable fibre mordant pigment etc.
The mass ratio of organic pigment and black pigment is preferably 10: 2～and 10: 10, and more preferably 10: 4～10: 7.
In addition, the total amount of aforementioned organic pigment and aforementioned black pigment is preferably 60～120 quality % with respect to the total amount of optical polymerism compound and Photoepolymerizationinitiater initiater, and 70～105 quality % more preferably.By making its total amount is below the 120 quality %, can obtain appropriate sensitivity.In addition, be more than the 60 quality % by making its total amount, can improve light-proofness, and fully obtain function as black matrix".
Preferred substance in the organic pigment can be enumerated the C.I. pigment blue 15: 6, C.I. paratonere 177, C.I. pigment yellow 13 9.These organic pigments can further promote the raising of light-proofness and shape stability.
[other composition]
In black photosensitive composition of the present invention, can cooperate adjuvant as required.Specifically can enumerate sensitizer, curing accelerator, photocrosslinking agent, light sensitizer, spreading agent, dispersing aid, filling agent, adhesion promotor, antioxidant, ultraviolet light absorber, anti-agglomerating agent etc.
In addition, when use as described below black photosensitive composition of the present invention forms black matrix", preferably adjust the concentration of black pigment, so that the OD value (Optical Density, optical density (OD)) of per 1 μ m black photosensitive composition thickness is more than 4.If the OD value of per 1 μ m black photosensitive composition thickness is more than 4, then when being used for the black matrix" of LCD, can obtain enough demonstration contrasts.
In addition, as described below when using black photosensitive composition of the present invention to form black matrix", coating and dry black photosensitive composition of the present invention on substrate form film.In order to improve coating at this moment and the rerum natura behind the photocuring, except that mentioned component, can also further contain polymer binder as bonding agent.According to improve compatibility, the purpose of film formation property, development, cohesive etc., suitably select to use bonding agent to get final product.
As the thickness of formed black matrix" on substrate, can be set in the scope of 0.5～10 μ m usually, be preferably 1～5 μ m, and 2～4 μ m more preferably.If thickness is more than the 2 μ m, then not only can be used as common color filter black matrix", can also be used as the partition wall of the color filter of ink-jetting style.
In addition, when using this black matrix" as partition wall, angle of the flank is preferably more than 50 °, more preferably more than 70 °.Further, this angle of the flank is preferably less than 90 °.Wherein, so-called " angle of the flank " is meant substrate surface and pattern inclined-plane angulation.In addition, above-mentioned partition wall forms and has opening portion.
When using ink-jetting style to form color filter, ink composition overflows outside the opening portion of partition wall.Yet, be more than 50 ° by making angle of the flank, even ink composition overflows more or less,, therefore can prevent to overflow because the ink composition that overflows is back in the opening portion.
In addition, the solvent and the thermal polymerization that are used to dilute be can also add in the black photosensitive composition of the present invention and agent, defoamer, surfactant etc. forbidden.
Wherein, as the solvent that can be added in the black photosensitive composition, for example can enumerate glycol monoethyl ether, ethylene glycol monoethyl ether, ethylene glycol propyl ether, ethylene glycol mono-n-butyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, the diglycol monotertiary positive propyl ether, the diglycol monotertiary n-butyl ether, triethylene glycol monomethyl ether, triethylene glycol list ether, propylene glycol monomethyl ether, dihydroxypropane single-ether, propylene glycol list positive propyl ether, the propylene glycol mono-n-butyl ether, dipropylene glycol monomethyl ether, the single ether of dipropylene glycol, the single positive propyl ether of dipropylene glycol, the dipropylene glycol mono-n-butyl ether, the tripropylene glycol monomethyl ether, (gathering) alkylene glycol monoalkyl ethers classes such as tripropylene glycol list ether; (gathering) alkylene glycol monoalkyl ethers acetate esters such as ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, diethylene glycol monomethyl ether acetic acid esters, diethylene glycol monoethyl ether acetic acid esters, propylene glycol methyl ether acetate, propylene glycol monoethyl ether acetate; Other ethers such as diethylene glycol dimethyl ether, diethylene glycol ethylmethyl ether, diethylene glycol diethyl ether, tetrahydrofuran; Ketones such as MEK, cyclohexanone, 2-heptanone, 3-heptanone; Lactic acid alkyl ester classes such as 2 hydroxy propanoic acid methyl esters, 2 hydroxy propanoic acid ethyl ester; 2-hydroxy-2-methyl methyl propionate, 3-methoxypropionic acid methyl esters, 3-methoxy propyl acetoacetic ester, 3-ethoxy-propionic acid methyl esters, the 3-ethoxyl ethyl propionate, ethoxy ethyl acetate, hydroxyl ethyl acetate, 2-hydroxy-3-methyl methyl butyrate, 3-methoxyl butylacetic acid ester, 3-methyl-3-methoxyl butylacetic acid ester, 3-methyl-3-methoxyl butyl propionic ester, ethyl acetate, n-propyl acetate, isopropyl acetate, n-butyl acetate, isobutyl acetate, the formic acid n-pentyl ester, isoamyl acetate, n-butyl propionate, ethyl butyrate, the butyric acid n-propyl, isopropyl isobutyrate, the positive butyl ester of butyric acid, methyl pyruvate, ethyl pyruvate, the pyruvic acid n-propyl, methyl acetoacetate, ethyl acetoacetate, other ester classes such as 2-oxygen base ethyl butyrate; Toluene, dimethylbenzene etc. are aromatic hydrocarbon based; N-Methyl pyrrolidone, N, amide-types such as dinethylformamide, N,N-dimethylacetamide etc.These solvents can use separately or mix more than 2 kinds and use.
Wherein, because propylene glycol monomethyl ether, ethylene glycol monomethyl ether acetate, propylene glycol methyl ether acetate, propylene glycol monoethyl ether acetate, diethylene glycol dimethyl ether, diethylene glycol ethylmethyl ether, cyclohexanone, 3-methoxyl butylacetic acid ester, optical polymerism compound, Photoepolymerizationinitiater initiater are demonstrated good dissolubility, can make simultaneously the favorable dispersibility of insoluble composition such as black pigment, therefore be preferred, and especially preferably use propylene glycol methyl ether acetate, 3-methoxyl butylacetic acid ester.With respect to the total amount of 100 mass parts optical polymerism compounds, Photoepolymerizationinitiater initiater and colorant, solvent can use in the scope of 50～500 mass parts.
In addition, forbid agent, can use quinhydrones, quinhydrones list ether etc. as thermal polymerization.In addition,, polysiloxane-based, fluoride compound can be used, and, known various surfactants such as anionic species, cationic, nonionic system can be used as surfactant as defoamer.
As the preparation method of black photosensitive composition of the present invention, can obtain by compositions such as above-mentioned optical polymerism compound, Photoepolymerizationinitiater initiater, black pigment and organic pigment are mixed in stirring machine fully.In addition, can also use filtrator to filter so that the gained potpourri becomes evenly.
[black matrix", wall and the ink-jet formation of partition wall]
At first, use contact transfer printing type apparatus for coating or non-contact type apparatus for coating such as spinner (rotary apparatus for coating), showering curtain type spreader such as print roll coating device, counter-rotating spreader, bar type spreader, coating black photosensitive composition of the present invention on substrate.As substrate, can use substrate with photopermeability.
In order to improve the cohesive of glass substrate and black photosensitive composition, silane-coating coupling agent on glass substrate in advance.Perhaps can when the preparation black photosensitive composition, add silane coupling agent in advance.
After being coated with this black photosensitive composition, carry out drying, remove and desolvate.Drying means is not particularly limited, can use following any method, for example (1) is at 80～120 ℃, under preferred 90～100 ℃ temperature on hot plate the method in dry 60～120 seconds, (2) at room temperature place several hours to several days method, (3) put into storage heater or the infrared heater dozens of minutes was removed the method for desolvating by several hours.
Then, by the minus mask, irradiation ultraviolet radiation, excimer laser isoreactivity energy-ray carry out the part exposure.The energy-ray amount of irradiation changes according to the composition of black photosensitive composition, but for example preferred 30～2000mJ/cm
2About.
Then, make film development after the exposure, form desirable pattern form thus by developer solution.Developing method is not particularly limited, and for example can use infusion process, spray-on process etc.As developer solution, can enumerate organic class materials such as monoethanolamine, diethanolamine, triethanolamine, or the aqueous solution of NaOH, potassium hydroxide, sodium carbonate, ammonia, quaternary ammonium salt etc.
Then, after under the temperature about 200 ℃ the pattern after developing being carried out, cure.In addition, preferably formed pattern is carried out blanket exposure.
Thus, can form black matrix", wall or ink jet type color filter formation partition wall with regulation shape.
[formation of color filter]
Below the preparation process with the color filter by the formed black matrix" of said method is described.
(1) forms color filter by photolithographicallpatterned (lithography)
On the substrate that has formed above-mentioned black matrix", use and to contain the black photosensitive composition of R, G, the trichromatic coloured material of B usually, and every kind of color is carried out the process identical with the formation of above-mentioned black matrix" form dyed layer successively.Can form color filter thus.
(2) form color filter by ink-jetting style
When forming color filter by ink-jetting style, use is formed by the formed ink jet type color filter of black photosensitive composition of the present invention and uses partition wall.Because this partition wall is a black, therefore also can be used as black matrix" simultaneously.So this partition wall forms has the opening portion (being separated the part that wall surrounds) that is used to collect China ink.
Be specially, at first, be injected in the above-mentioned opening portion by the China ink of ink-jetting style, and be collected in the partition wall R, G, B.Then, by heat or light the China ink of collection is solidified.Thus, can form color filter.
When black photosensitive composition of the present invention forms pattern, can suppress the generation of wrinkle on the patterned surfaces.Therefore, can form good black matrix".In addition, particularly in wall, require the degree of accuracy of thickness of liquid crystal layer (cell gap).According to by the formed wall of black photosensitive composition of the present invention, can suppress the generation of wrinkle, and holding unit gap more accurately.In addition, owing to have light-proofness, therefore can suppress reflection of light by the formed wall of black photosensitive composition of the present invention.Thus, can prepare the display device that can well show.
Embodiment
Based on embodiment the present invention is described below.
[synthesis example 1]
56 mass parts benzyl methacrylates, 36 mass parts methacrylic acid 2-hydroxyl ethyl esters, 78 mass parts glycidyl methacrylate are dissolved in the 250 mass parts ethylene glycol monomethyl ether acetates, and add 2 mass parts azoisobutyronitriles, carry out heated polymerizable.
Then, adding 40 mass parts has dissolved 2 mass parts and has forbidden the acrylic acid of the methylnaphthohydroquinone of agent and reaction as polymerization.Then, add 42 mass parts tetrahydrobenzene dicarboxylic acid anhydrides and reaction, obtain resin.The quality mean molecular weight of gained resin is 3000.
[embodiment 1-6, comparative example 1]
Mixture table 1 each composition, and adjust with propylene glycol methyl ether acetate, so that the concentration of the solid constituent outside desolventizing is 25 quality %, obtain black photosensitive composition thus.
Table 1
| The optical polymerism compound | Photoepolymerizationinitiater initiater | Dispersible pigment dispersion | |
| Embodiment 1 | Resin A: 30 mass parts DPHA:10 mass parts | The Irgacure369:10 mass parts | Blue dispersion liquid: 193 mass parts carbon dispersion liquids: 48 mass parts |
| Embodiment 2 | Resin A: 30 mass parts DPHA:10 mass parts | The Irgacure369:10 mass parts | Red dispersion liquid: 193 mass parts carbon dispersion liquids: 48 mass parts |
| Embodiment 3 | Resin A: 30 mass parts DPHA:10 mass parts | The Irgacure369:10 mass parts | Yellow dispersion liquid: 193 mass parts carbon dispersion liquids: 48 mass parts |
| Embodiment 4 | Resin A: 30 mass parts DPHA:10 mass parts | The Irgacure369:10 mass parts | Blue dispersion liquid: the red dispersion liquid of 100 mass parts: 93 mass parts carbon dispersion liquids: 48 mass parts |
| Embodiment 5 | Resin A: 30 mass parts DPHA:10 mass parts | The Irgacure369:10 mass parts | Blue dispersion liquid: the red dispersion liquid of 70 mass parts: the yellow dispersion liquid of 70 mass parts: 53 mass parts carbon dispersion liquids: 48 mass parts |
| Embodiment 6 | Resin A: 30 mass parts DPHA:10 mass parts | The Irgacure369:10 mass parts | Blue dispersion liquid: 140 mass parts carbon dispersion liquids: 100 mass parts |
| Comparative example 1 | Resin A: 30 mass parts DPHA:10 mass parts | The Irgacure369:10 mass parts | Carbon dispersion liquid: 208 mass parts |
The corresponding relation of the abbreviation of each composition and formal title is as described below in the table.
DPHA: dipentaerythritol acrylate
Irgacure369:2-benzyl-2-dimethylamino-1-(4-morpholino phenyl)-butane-1-ketone (CibaSpecialty Chemicals corporate system)
Blue dispersion liquid: the blue UM of blue pigment dispersion liquid CF (contain 20 quality %C.I. pigment blue 15s: 6, drive state's pigment system)
Carbon dispersion liquid: " carbon dispersion liquid CF deceives EX-1455 " (contain 24 quality % high resistance carbon, drive state's pigment system)
Red dispersion liquid: " the red EX-109 of CF " (containing 20 quality %C.I. paratoneres 177, anthraquinone class red)
Yellow dispersion liquid: " the yellow HM of CF " (containing 20 quality %C.I. pigment yellow 13s 9, monoazo class yellow uitramarine)
(formation of black matrix")
Use spinner that the black photosensitive composition of gained is coated on the glass substrate, drying is 2 minutes under 90 ℃, forms the black photosensitive composition layer.
Then, by minus mask irradiation ultraviolet radiation optionally on this black photosensitive composition layer.Then, in 2.38% tetramethylammonium hydroxide aqueous solution, develop, and cure 30 minutes after in 220 ℃ baking oven, form the pattern that thickness is the black matrix" of 2.5 μ m thus.
(evaluation)
To the black matrix" that forms as mentioned above, estimate generation, OD value and the cone angle of its wrinkle.It the results are shown in table 2.
Table 2
| The generation of wrinkle | The OD value | Cone angle | |
| Embodiment 1 | Do not have | 4.5 | 80° |
| Embodiment 2 | Do not have | 4.2 | 80° |
| Embodiment 3 | Do not have | 4.0 | 80° |
| Embodiment 4 | Do not have | 4.3 | 80° |
| Embodiment 5 | Do not have | 4.2 | 80° |
| Embodiment 6 | Do not have | More than 8 | 70° |
| Comparative example 1 | Have | More than 8 | 20° |
Claims (11)
1. black photosensitive composition, described black photosensitive composition is the black photosensitive composition that contains optical polymerism compound, Photoepolymerizationinitiater initiater and black pigment, wherein, contains the organic pigment as the dimensionally stable agent.
2. black photosensitive composition as claimed in claim 1, wherein, described black pigment is a carbon black.
3. black photosensitive composition as claimed in claim 1, wherein, the mass ratio of described black pigment and described organic pigment is 10: 2 to 10: 10.
4. black photosensitive composition as claimed in claim 1, wherein, the total amount of described organic pigment and described black pigment is 60～120 quality % with respect to all solids composition outside desolventizing.
5. black photosensitive composition as claimed in claim 1, wherein, described organic pigment is to contain to be selected from the C.I. pigment blue 15: 6, at least a pigment in C.I. paratonere 177, the C.I. pigment yellow 13 9.
6. black photosensitive composition as claimed in claim 1, it is used to form the above thick film of 2 μ m.
7. one kind by the formed black matrix" of each described black photosensitive composition in the claim 1～6.
8. black matrix" as claimed in claim 7, wherein, optical density (OD) is more than 4.
9. black matrix" as claimed in claim 7, wherein, angle of the flank is more than 50 °.
10. a, angle of the flank formed by each described black photosensitive composition in the claim 1～6 is the ink jet type color filter partition wall more than 50 °.
11. one kind by the formed used for liquid crystal display element wall of each described black photosensitive composition in the claim 1～6.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006075284A JP4745093B2 (en) | 2006-03-17 | 2006-03-17 | Black photosensitive composition |
| JP2006075284 | 2006-03-17 |
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| CN101038438A true CN101038438A (en) | 2007-09-19 |
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| CNA2007100877634A Pending CN101038438A (en) | 2006-03-17 | 2007-03-08 | Black photosensitive composition |
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| JP (1) | JP4745093B2 (en) |
| KR (1) | KR100860432B1 (en) |
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- 2007-02-06 KR KR1020070011947A patent/KR100860432B1/en active Active
- 2007-02-09 TW TW096104845A patent/TW200745745A/en unknown
- 2007-03-08 CN CNA2007100877634A patent/CN101038438A/en active Pending
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| CN102870041A (en) * | 2010-05-03 | 2013-01-09 | 巴斯夫欧洲公司 | Color filter for low temperature applications |
| CN102870041B (en) * | 2010-05-03 | 2016-03-09 | 巴斯夫欧洲公司 | For the color filter of cryogenic applications |
| CN103558706A (en) * | 2013-11-05 | 2014-02-05 | 京东方科技集团股份有限公司 | Display substrate and preparation method thereof and display device |
| CN105807561A (en) * | 2015-01-16 | 2016-07-27 | Jsr株式会社 | Radiation-sensitive colored composition, colored pattern, forming method thereof and liquid-crystal display element |
| CN105807561B (en) * | 2015-01-16 | 2021-02-19 | Jsr株式会社 | Radiation-sensitive coloring composition, colored pattern, method for forming the same, and liquid crystal display element |
| CN108351560A (en) * | 2015-11-19 | 2018-07-31 | 罗门哈斯电子材料韩国有限公司 | The method for preparing column spacer |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2007249046A (en) | 2007-09-27 |
| KR100860432B1 (en) | 2008-09-25 |
| JP4745093B2 (en) | 2011-08-10 |
| KR20070094460A (en) | 2007-09-20 |
| TW200745745A (en) | 2007-12-16 |
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