CN101023574A - Electronic apparatus - Google Patents
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- CN101023574A CN101023574A CNA2005800313857A CN200580031385A CN101023574A CN 101023574 A CN101023574 A CN 101023574A CN A2005800313857 A CNA2005800313857 A CN A2005800313857A CN 200580031385 A CN200580031385 A CN 200580031385A CN 101023574 A CN101023574 A CN 101023574A
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- 238000010894 electron beam technology Methods 0.000 claims abstract description 39
- 230000004907 flux Effects 0.000 claims abstract description 29
- 230000005684 electric field Effects 0.000 claims abstract description 13
- 238000007493 shaping process Methods 0.000 claims description 12
- 230000008859 change Effects 0.000 claims description 7
- 235000012489 doughnuts Nutrition 0.000 claims description 4
- 238000000034 method Methods 0.000 claims description 4
- 238000003491 array Methods 0.000 claims description 2
- 241000237858 Gastropoda Species 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 6
- 230000005611 electricity Effects 0.000 description 5
- 239000003990 capacitor Substances 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229910044991 metal oxide Inorganic materials 0.000 description 3
- 150000004706 metal oxides Chemical class 0.000 description 3
- 238000007789 sealing Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Chemical compound [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 description 2
- 229910052746 lanthanum Inorganic materials 0.000 description 2
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910025794 LaB6 Inorganic materials 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- UBAZGMLMVVQSCD-UHFFFAOYSA-N carbon dioxide;molecular oxygen Chemical compound O=O.O=C=O UBAZGMLMVVQSCD-UHFFFAOYSA-N 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229910001004 magnetic alloy Inorganic materials 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000001275 scanning Auger electron spectroscopy Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
- H01J3/14—Arrangements for focusing or reflecting ray or beam
- H01J3/20—Magnetic lenses
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/08—Deviation, concentration or focusing of the beam by electric or magnetic means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
- H01J3/14—Arrangements for focusing or reflecting ray or beam
- H01J3/20—Magnetic lenses
- H01J3/24—Magnetic lenses using permanent magnets only
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Particle Accelerators (AREA)
- Microwave Tubes (AREA)
Abstract
The invention provides a device for producing and focussing an electron beam; the device comprising an evacuated chamber (4), a source of electrons (2), a target (6), means for creating an electric field to accelerate a stream of the electrons constituting the electron beam through the chamber towards the target, and means (12) for providing a magnetic field crossing the electron beam; characterised in that the magnetic flux of the magnetic field progressively reduces in the direction of the target.
Description
Technical field
The present invention relates to be used to produce and the equipment of focused beam and the method that increases electron beam energy.
Background technology
There are the electronic equipment that utilizes electron beam and the example of many types to comprise cathode ray tube, particle accelerator and X-ray machine device.
Electron beam equipment generally comprises electron source, be used to produce accelerated electron electric field device and be used for the target of electron beam.The electron source that often is called " electron gun " is taked the form of cathode element usually, thereby directly or indirectly impels electronics to be launched from negative electrode to its heating by the electric current by negative electrode.Thereby electronics by anode quicken to focus on then create subsequently by vacuum chamber and incide target, as the electron beam on screen or the target electrode.
Summary of the invention
Thereby the invention provides when electronics reduces big or small magnetic field control electronics by variation when predefined paths moves to target and increase the method that incides the electron stream energy on the target.
By method of the present invention, the detected electron-beam voltage of target can be increased basically.
In first aspect, the invention provides the equipment that is used to produce with focused beam; This equipment comprises vacuum chamber, electron source, target, is used to create electric field so that quicken to constitute by the device of vacuum chamber towards the electron stream of the electron beam of target, and the device that is used to provide the magnetic field of passing electron beam; The flux that is characterised in that magnetic field reduces gradually along the target direction.
On the other hand, the invention provides the equipment that is used to produce and strengthen electron beam energy; This equipment comprises vacuum chamber, electron source, target, is used to create electric field so that quicken to constitute by the device of vacuum chamber towards the electron stream of the electron beam of target, and the device that is used to provide the magnetic field of passing electron beam; The flux that is characterised in that magnetic field along the target direction reduce gradually and whereby when electron beam during by magnetic field its energy be enhanced.
On the one hand, the invention provides the equipment that is used to produce and increase electron-beam voltage again; This equipment comprises vacuum chamber, electron source, target, is used to create electric field so that quicken to constitute by the device of vacuum chamber towards the electron stream of the electron beam of target, and the device that is used to provide the magnetic field of passing electron beam; The flux that is characterised in that magnetic field along the target direction reduce gradually and whereby when electron beam during by magnetic field its voltage be increased.
Also have on the one hand, the invention provides power-supply device; Thereby this power-supply device comprises vacuum chamber, is used to produce the device of electron stream, is connected to the electric target that can take out from it of output, is used to create electric field so that quicken by the device of vacuum chamber towards the electron stream of target, and the device that is used to provide the magnetic field of passing electron beam; The flux that is characterised in that magnetic field reduces gradually along the target direction.
Magnetic field is generally vertical with electron beam basically.
The flux in magnetic field can reduce in a continuous manner or it can be a series of the mode that reduces of classifications reduce.But preferably the flux in magnetic field reduces in a continuous manner.
The flux in magnetic field generally is constant with the rate of change towards the distance of target basically, and promptly flux generally reduces with linear fashion towards target.
The rate of change of magnetic fluxes or can change in the mode that increases or reduce along the target direction.Therefore in this case, for example magnetic flux can reduce towards the curve mode of target.
Provide the device in magnetic field can take to be arranged in the form of two or more (as two, four, six or eight) the shaping magnet arrays around the electron stream, the shape of magnet is determined the minimizing along target direction magnetic flux.
Magnet array can comprise that at least one pair of (as one, two or three pair) is arranged in the magnet of the opposed polarity around the electron stream, and promptly magnet is on arbitrary limit of electron stream.
Preferably have two pairs of magnets that are arranged in electron stream opposed polarity on every side at least.
Magnet can be taked along the form of the tapered prolongation band of target direction.Band is a uniform thickness along their length generally.Therefore the angle that attenuates will be determined the reduction of the magnetic flux that magnet provides.
But the end magnet planar trapezoidal and that have broad and narrower end, narrower end is nearer from target.Magnet with this shape generally is linear forms and is used when wherein electron source and target are in the linear chamber opposite end when vacuum chamber.
Shaping magnet or end planar spiral and that have broad and narrower end, narrow end is at the deepest point of spiral.It is in the equipment of the doughnut of target rather than target linear chamber at one end that magnet with this shape can be used in vacuum chamber wherein.
In each case, the magnetic field intensity that magnet provides generally is 0.001 tesla at least, and more common is 0.01 tesla at least, is 0.05 tesla better at least and preferably is 0.1 tesla at least.
Magnet is ceramagnet preferably.
Vacuum chamber can be permanent seal chamber (as the sealed ceramic pipe or other supports the usable material chamber of high vacuum/ultra high vacuum arbitrarily), for example maybe can be connected to vacuum pump in the cathode ray tube of TV or computer monitor.Vacuum chamber can be provided for being connected to the isolating valve of vacuum pump, and isolating valve utilizes vacuum pump to be evacuated to essential pressure in the chamber of making, thereby closing of isolating valve is used for the chamber sealing being kept its vacuum and chamber and vacuum pump being isolated.
Vacuum chamber generally is evacuated to 1 * 10
-7Holder or pressure still less are more typically 5 * 10
-8Holder or still less and preferably 1 * 10
-8The holder or still less.
" getter " can be used for strengthening or keeps vacuum or compensation to enter the leakage of vacuum chamber.Getter is a getter well-known and physics or chemistry.Physical getters comprises the zeolitic material that works as by absorption gas.The chemistry getter generally is by hanging down the metal that steam air pressure solid works with gas such as oxygen, carbon dioxide, nitrogen, carbon monoxide and steam reaction to form.Getter for example can be painted on the inner surface of vacuum chamber.
It is well-known that getter can be taked the form of asepwirator pump and this type of pump.
Electron source can be traditional type comprise according to or coat the electron gun of the negative electrode of electronic emission material (as metal oxide coated cathode), emitting electrons when the heating element that utilizes electric current by negative electrode or adjacent cathodes heats, one or more focusing anodes become electron beam in order to accelerated electron and calibrated electronic simultaneously.
Metal oxide coated cathode can be a barium oxide cathode for example.Perhaps can use lanthanum hexaboride (LaB
6) negative electrode.LaB6 cathode can obtain widely and especially can obtain from Chinese Guangdong Cathy advanced material Co., Ltd (referring to " Cathay Advanced MaterialsLimited ") or New Hampshire Wilden town Kimball physics limited company (referring to " Kimball Physics Inc ").
Equipment of the present invention can be to utilize the equipment of electron beam and example to comprise cathode-ray tube apparatus such as TV and computer monitor, particle accelerator, X-ray machine, power electronic system and can not interrupt power supply arbitrarily.
Equipment of the present invention or or the extra power supply that can be used as, electric current/power supply can be taken out from target thereby target is connected to output.To become the transducer of AC electric current preferably to be placed between target and the output from the DC current conversion of target.Electricity (preferably AC) output from equipment can be used to power supply to electronics and electric equipment scope.In one embodiment, the part electricity output from equipment can be used for producing electron beam and/or being used to power to the asepwirator pump that is connected to vacuum chamber.
Equipment of the present invention can be used for not requiring the portable or isolated power supply that is connected to general supply.Can comprise that when used as such battery produces the sufficient power of electron beam so that initialization to be provided.
Description of drawings
Fig. 1 is an equipment schematic diagram according to an embodiment of the invention.
Fig. 2 a has described the shaping magnet of equipment component in the pie graph 1.
Fig. 2 b is the plane graph of magnet shown in Fig. 2 a.
Fig. 3 is the electronic motion schematic diagram by equipment among Fig. 1.
Fig. 4 be describe when electronics by acting on the schematic diagram of power thereon among Fig. 1 during equipment.
Fig. 5 is the schematic diagram how geometry of demonstration shaping magnet can depend on to experience ideal spiral.
But Fig. 6 is the schematic diagram of equipment shown in Fig. 1 combines the Feedback of Power loop.
Fig. 7 is the parts block diagram of the DC/AC transducer that equipment uses among Fig. 1 to Fig. 6.
Fig. 8 is the end view of equipment shown in Fig. 1 and Fig. 6.
Embodiment
By being described now but be not limited to this referring to figs. 1 to the specific embodiment the present invention shown in Fig. 8.
Equipment shown in Fig. 1 comprises the electron gun 2 that is installed in vacuum tube 4 one ends, and target electrode 6 is installed in the other end of vacuum tube simultaneously.Electron gun can be a traditional type, for example generally is used in cathode-ray tube apparatus, as the type of TV or computer monitor.Therefore, rifle have when the diameter that is heated silk 9 when heating emitting electrons be the metal oxide coated emitter cathode 8 of D.The cathode element electrons emitted can be quickened by annular accelerating anode 10, and it can have for example voltage of 1KV.
Being arranged in around the vacuum tube 4 is the shaping magnet 12 of two pairs of opposed polarities, wherein a pair of shown in Figure 1.Although electromagnet can be used or alternative permanent magnet except that permanent magnet, magnet is a permanent magnet in this embodiment.
As shown in Fig. 2 a and 2b, magnet generally is smooth and is uniform thickness along their length.In the plane, magnet be tapered in form and be tapered along the target direction.Draft angle θ can change but preferably its experience depend on ideal spiral (being usually said logarithm spiral), be in line, size depends on the diameter of emitting cathode and the diameter of target.The mode that can determine magnet shape is described by Fig. 5.
Fig. 5 shows a pair of curve S
1And S
2, arrive the spiral center separately along ideal spiral (logarithm spiral) path.From the classical mathematics theory as can be known, in ideal spiral, 90 degree continuous radius at interval is (as r
1, r
2And r
3) be in golden section () ratio each other.Distance W between two helixes in spiral outer end
1Width W corresponding to the bigger end of magnet shown in Fig. 2
1This width is selected according to the diameter D of emitting cathode 8 and generally is between 2.00 times to 2.75 times (more commonly 2.25 times to 2.75 times) of emitting cathode diameter D.Width W
1Preferably near 2.5 times of emitting cathode 8 diameter D.From the nearer distance W in spiral center
2Width W corresponding to the narrow end of magnet shown in Fig. 2
2This width W
2Diameter according to target electrode is selected.Utilize the corresponding W that is provided with according to the size of emission electrode and target electrode
1And W
2, the length of magnet is subsequently by two mid point P
1And P
2Between the length of spiral path be provided with.Therefore, the shape of magnet can be regarded as the straight line portion of ideal spiral.
Therefore the electronics by vacuum tube when they along the influence of managing the magnetic flux that is changed when mobile.Electronics stressed along on the pipe each point has been shown among Fig. 4, and the result of electric field and magnetic field combination is that electronics has shown the screw along pipe as shown in Figure 3 along target 6 directions from electron gun 2.
The effect that assembly shown in the figure has the intrafascicular electronics of accelerated electron produces higher electron-beam voltage whereby at the target place.
As shown in the figure equipment and wherein parallel lines limit magnet be used to provide between the like device of the constant magnetic flux of pipe and launched compare test.In testing equipment, the distance from the electron source to the target is 460mm, and the size of trapezoidal magnet is as follows: length 438mm, thickness 7mm, trapezoidal sound stage width degree 35mm, narrower end width 4mm.The result who obtains is as follows.
| Magnet geometry | Electron source electric current/accelerating voltage | Target place current/voltage |
| The parallel lines limit | The 10mA/1000 volt | 1000 volts of 10mA |
| It is trapezoidal to attenuate | The 10mA/1000 volt | 1500 volts of 10mA |
Each magnet comprises straight line and the trapezoidal field intensity B that all has 0.1 tesla that attenuates.Yet although the flux phi of straight line portion is constant, the variation flux owing to the magnet area when using trapezoidal magnet changes.
Comparative tests showed substitutes the parallel edges magnet by the use magnet that attenuates, and the electron-beam voltage that target detects can be increased 50%.
Fig. 6 has described the equipment according to second embodiment of the invention.Equipment with Fig. 1 to Fig. 5 is the same, and the equipment among Fig. 6 comprises the electron gun 102 that is installed in vacuum chamber one end with 104 the form of managing, and its surface is shown in Figure 8.Target electrode 106 is installed in the other end of vacuum chamber 104.Electron gun comprises heating element 109 and lanthanum hexaboride (LaB
6) emitting cathode 108.By heating LaB
6The electronics of cathode emission is accelerated anode 110 and quickens in the described mode of top Fig. 1.The shaping magnet 112 of the above-mentioned type is connected on the outer surface of vacuum chamber 104.
DC/AC transducer 114 has power supply input 202 and power supply output 204.Between power supply input 202 and power supply output 204, arrange voltage divider 206, sine-wave generator 208, comprised the photoconductor parallel array that is arranged in the chopper circuit or switch array 210, capacitor 212 and the transformer 214 of transistor array.
The DC/AC transducer of type shown in Figure 7 generally can convert the 0.33A DC electric current (500 watts) of 1500V to the 1.97A AC electric current (473 watts) of 240V.Transducer provides output so that make equipment can be connected to electrical source consumption electricity equipment and electronic equipment scope.
The part electricity output of transducer 114 also can guide to 12V DC power supply 118 by connecting 116, and it is used for power supply and gives electron gun and asepwirator pump (see figure 8).DC power supply 118 is linked to heater 109 and is linked to Cockcroft Wal (referring to the Cockcroft Walton) high voltage multiplier of pausing by connecting 121 by connecting 120, and it converts the 12V dc voltage to above 1kV the voltage that is used for accelerating electrode 110.
The surface of vacuum tube 104 is described in Fig. 8.As shown in Figure 8, vacuum tube 104 comprises stainless steel tube, and its length can for example be similar to 320mm length, 38mm diameter and have the wall thickness of 1.68mm.
At an end of pipe, provide flange 130 so that form the input port of electron gun (not shown).The other end at pipe 104 provides flange 132 to the concetrated pipe 134 of having inserted four road flange connectors.Outlet flange 136 is connected on the twice isolating valve (not shown) at that, and it can be connected to vacuum pump.Outlet flange 138 is connected on the asepwirator pump (not shown), and it assists the vacuum in the holding tube.Asepwirator pump can be any suitable be from the obtainable Sorb AC of Milan, ITA SAES Getters in the commercial obtainable pump of this purpose and the example of this pump
The annex asepwirator pump.Outlet flange 138 has the target electrode 106 that is connected to that, and this electrode is connected so that extend in the pipe 104 of about 10mm outside flange 132.By example, the flange of each connector concetrated pipe 134 all can have 70mm external diameter, 38mm internal diameter and the 8mm degree of depth.Each flange provides and has been used for a plurality of set bolts (general every flange six) of join dependency item to flange.The complete length of flange connector concetrated pipe 138 outer surfaces from tie point 132 to flange can be approximately 126mm easily.In order to prevent loss of vacuum, between relative ledge surface, provide sealing gasket (generally being copper).
Equipment of the present invention links isolating valve by connection electron gun, target electrode, asepwirator pump and isolating valve then to their corresponding flanges and is created to vacuum pump.Utilize vacuum pump, arbitrary gas molecule and steam pipe internal pressure can be reduced to about 10 at first in the pipe to remove by heating
-9Holder.The suitable time (for example 72 hours) can be heated with during removing the arbitrary gas molecule and steam in that absorption at the negative electrode of electron gun afterwards, and isolating valve is closed and vacuum pump is removed.After this, by the mode that asepwirator pump compensates, utilize the integrality advantage vacuum of flange junction sealing to be maintained at about 10 by any minute leakage
-8The level of holder.
Magnet (not shown among Fig. 8) is connected on the outer surface of pipe 104 removedly by geometrical clamp (not shown) device, and it is ceramagnet preferably.
Therefore magnet shown in the figure is tapered in uniform mode and is straight line basically along the magnetic flux change of pipe along length of tube.Yet magnet edge or the non-rectilinear that can be bent to provide similar magnetic flux change.The magnet edge also or can be for example by using part toroidal magnet scope by stepping.
Magnet shown in the figure generally be each by a plurality of (as seven) thus the magnetic alloy section forms and combines and forms the trapezoidal of smooth limit.Yet, combine by rectangular magnet based on ideal spiral a plurality of reduction length and width, can realize the magnet that attenuates at stepping edge.
In another changed, magnet can be bent to form spiral such as ideal spiral, and wherein magnet is tapered towards the spiral center.The vacuum chamber that the spiral type magnet passes through when electron stream is used when being doughnut around central target electrode.In this embodiment, electron stream produces by the electron gun that tangentially is installed on the radial outer wall of doughnut.
Equipment of the present invention can be used as power supply, for example as the portable accessory power supply under the powering-off state.Although the initial electricity that requires is imported with operation electron gun and operation asepwirator pump, can provide it by cell apparatus.In case equipment operation, then part power supply output can be transferred to electron gun and asepwirator pump operates with maintenance equipment.Thereby having set up equipment, test can under its power supply, keep operation for a long time.
Equivalent
Apparent under the prerequisite that does not deviate from principle of the present invention, can carry out numerous modifications and variations to the specific embodiment of the invention described above.The application is intended to comprise all such modifications and variation.
Claims (22)
1. equipment that is used to produce with focused beam; Described equipment comprises vacuum chamber, electron source, target, is used to create electric field so that quicken to constitute by the device of described chamber towards the electron stream of the described electron beam of described target, and the device that is used to provide the magnetic field of passing described electron beam; The magnetic flux that is characterised in that described magnetic field reduces gradually along described target direction.
2. equipment that is used to produce and strengthen electron beam energy; Described equipment comprises vacuum chamber, electron source, target, is used to create electric field so that quicken to constitute by the device of described vacuum chamber towards the electron stream of the described electron beam of described target, and the device that is used to provide the magnetic field of passing described electron beam; The flux that is characterised in that described magnetic field along described target direction reduce gradually and whereby when described electron beam during by described magnetic field its energy be enhanced.
3. equipment that is used to produce and increase electron-beam voltage; Described equipment comprises vacuum chamber, electron source, target, is used to create electric field so that quicken to constitute by the device of described vacuum chamber towards the electron stream of the described electron beam of described target, and the device that is used to provide the magnetic field of passing described electron beam; The flux that is characterised in that described magnetic field along described target direction reduce gradually and whereby when described electron beam during by described magnetic field its voltage be increased.
4. power-supply device; Thereby described power-supply device comprises vacuum chamber, is used to produce the device of electron stream, is connected to the electric target that can take out from it of output, is used to create electric field so that quicken by the device of described vacuum chamber towards the described electron stream of described target, and the device that is used to provide the magnetic field of passing described electron beam; The flux that is characterised in that described magnetic field reduces gradually along described target direction.
5. according to the equipment in the claim of arbitrary front, wherein said magnetic field is vertical substantially with described electric field.
6. according to the equipment in the claim of arbitrary front, wherein said magnetic flux reduces in a continuous manner.
7. according to the equipment in arbitrary claim 1 to 5, wherein said magnetic flux reduces in the mode that a series of classifications reduce.
8. according to the equipment in the claim of arbitrary front, the rate of change of wherein said magnetic flux is constant basically.
9. according to the equipment in the claim of arbitrary front, the wherein said device in magnetic field that provides comprises two or more shaping magnet arrays, and the shape of described magnet is determined the minimizing along described target direction magnetic flux.
10. according to the equipment in the claim 9, wherein said shaping magnet is end planar trapezoidal and that have broad and narrower end, and described narrower end is nearer from described target.
11. according to the equipment in the claim 10, the length of wherein said shaping magnet equals to be positioned at two line S that respectively form ideal spiral
1And S
2Between center line on two some P
1And P
2Between path, outermost point P on described ideal spiral wherein
1Two line S
1And S
2Between distance W
1Corresponding to the width of trapezoidal magnet thicker end and on described ideal spiral innermost point P
2Two line S
1And S
2Between distance W
2Width corresponding to described trapezoidal magnet narrow end.
12. according to the equipment in the claim 9, wherein said shaping magnet be the snail type and have thicker end and a narrow end, described narrow end is at the innermost point of described spiral, and described vacuum chamber is the doughnut around described target.
13. according to the equipment of arbitrary claim 9 to 12, wherein said shaping magnet is a uniform thickness along their length basically.
14. according to the equipment of arbitrary claim 9 to 13, wherein said magnet array comprises that at least one pair of is arranged in the magnet of described electron stream opposed polarity on every side.
15., wherein have two pairs of magnets that are arranged in described electron stream opposed polarity on every side at least according to the equipment in the claim 14.
16. according to the equipment of arbitrary claim 9 to 15, wherein said magnet is taked along the form of the tapered prolongation band of described target direction.
17. according to the equipment in the claim of arbitrary front, the magnetic field intensity that wherein said magnet provides is 0.001 tesla at least, at least 0.01 tesla more commonly is more preferably at least 0.05 tesla and at least 0.1 tesla preferably.
18. according to the equipment in the claim of arbitrary front, wherein said magnet is a ceramagnet.
19. according to the equipment in the claim of arbitrary front, it is 1 * 10 that wherein said vacuum chamber is evacuated to pressure
-7The holder or still less, more typical is 5 * 10
-8Holder or still less and preferably 1 * 10
-8The holder or still less.
20. according to the equipment in the claim of arbitrary front, wherein asepwirator pump is provided to assist to keep the vacuum in the described vacuum chamber.
21. basically as the described in conjunction with the accompanying drawings equipment of this paper.
22. the method for focused beam comprises that use is according to the equipment in the claim of arbitrary front.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB0416519.7 | 2004-07-23 | ||
| GB0416519A GB0416519D0 (en) | 2004-07-23 | 2004-07-23 | Electronic apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101023574A true CN101023574A (en) | 2007-08-22 |
Family
ID=32922725
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNA2005800313857A Pending CN101023574A (en) | 2004-07-23 | 2005-07-22 | Electronic apparatus |
Country Status (5)
| Country | Link |
|---|---|
| EP (1) | EP1820257A2 (en) |
| JP (1) | JP2008507811A (en) |
| CN (1) | CN101023574A (en) |
| GB (1) | GB0416519D0 (en) |
| WO (1) | WO2006008541A2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5438325B2 (en) * | 2006-02-14 | 2014-03-12 | 日立造船株式会社 | How to illuminate the inside of a bottle |
| KR101068680B1 (en) * | 2010-02-03 | 2011-09-29 | 한국과학기술원 | Ultra-small X-ray tube using nanomaterial field emission source |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL45440C (en) * | 1935-03-06 | |||
| GB508852A (en) * | 1938-01-04 | 1939-07-04 | Otto Klemperer | Improvements in or relating to electron discharge devices utilising electron multiplication |
| US2530373A (en) * | 1943-05-04 | 1950-11-21 | Bell Telephone Labor Inc | Ultra high frequency electronic device |
| NL71845C (en) * | 1943-07-14 | |||
| US2551798A (en) * | 1947-07-11 | 1951-05-08 | Rca Corp | Electronic transformer |
| GB687696A (en) * | 1950-03-31 | 1953-02-18 | Vickers Electrical Co Ltd | Improvements relating to the production of beams of high energy electrons from betatron-started synchrotrons |
| US2683804A (en) * | 1951-02-14 | 1954-07-13 | Gen Electric | Megavoltmeter for induction electron accelerators |
| GB1116442A (en) * | 1964-11-19 | 1968-06-06 | Atomic Energy Authority Uk | Improvements in or relating to particle accelerating tubes |
| US4231009A (en) * | 1978-08-30 | 1980-10-28 | Rca Corporation | Deflection yoke with a magnet for reducing sensitivity of convergence to yoke position |
| WO1998018300A2 (en) * | 1996-10-18 | 1998-04-30 | Microwave Technologies Inc. | Rotating-wave electron beam accelerator |
| JP3333421B2 (en) * | 1997-02-28 | 2002-10-15 | シャープ株式会社 | Flat magnetron |
-
2004
- 2004-07-23 GB GB0416519A patent/GB0416519D0/en not_active Ceased
-
2005
- 2005-07-22 JP JP2007522029A patent/JP2008507811A/en not_active Withdrawn
- 2005-07-22 EP EP05762156A patent/EP1820257A2/en not_active Withdrawn
- 2005-07-22 CN CNA2005800313857A patent/CN101023574A/en active Pending
- 2005-07-22 WO PCT/GB2005/002878 patent/WO2006008541A2/en active Application Filing
Also Published As
| Publication number | Publication date |
|---|---|
| GB0416519D0 (en) | 2004-08-25 |
| EP1820257A2 (en) | 2007-08-22 |
| WO2006008541A3 (en) | 2006-06-01 |
| JP2008507811A (en) | 2008-03-13 |
| WO2006008541A2 (en) | 2006-01-26 |
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Open date: 20070822 |