CN100581731C - Surface processsing method of white gem crystal - Google Patents
Surface processsing method of white gem crystal Download PDFInfo
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Abstract
Description
技术领域 technical field
本发明涉及白宝石晶体的表面加工方法,具体地说是利用化学机械抛光法加工白宝石晶体,使其达到超光滑表面的过程。The invention relates to a surface processing method of white gem crystals, in particular to a process of processing white gem crystals with a chemical mechanical polishing method to achieve an ultra-smooth surface.
背景技术 Background technique
化学氧碘激光器由于其波长短及良好的传输特性是目前最有发展前景的高功率激光器之一。由于需要承载很高的功率密度,腔内光学元件特别是激光输出窗口的热变形已成为制约高功率激光器发展的重要因素之一。据国外文献报道,白宝石由于具有一系列独特而优良的物理化学性质,已经广泛应用于高功率激光器(如HF、DF、CO2激光器)作为窗口材料,而且还被应用于红外军事装备、卫星和空间技术的仪表等。因为要承载很高的功率密度,必需要对高功率激光器输出窗口材料进行超光滑表面加工。The chemical oxygen iodine laser is one of the most promising high-power lasers due to its short wavelength and good transmission characteristics. Due to the need to carry a high power density, the thermal deformation of optical components in the cavity, especially the laser output window, has become one of the important factors restricting the development of high-power lasers. According to foreign literature reports, due to a series of unique and excellent physical and chemical properties, white gem has been widely used in high-power lasers (such as HF, DF, CO2 lasers) as window materials, and is also used in infrared military equipment, satellites and Instrumentation for space technology, etc. Because of the high power density to be carried, ultra-smooth surface processing of high-power laser output window materials is necessary.
以往人们加工白宝石的方法是:抛光时采用沥青盘,钻石微粉作为抛光磨料。用此种方法加工的白宝石基片的表面粗糙度一般为2-3nm rms,而且表面光洁度也不好,有很多划痕。In the past, people used the method of processing white gemstones: asphalt disks were used for polishing, and diamond micropowder was used as polishing abrasives. The surface roughness of the white sapphire substrate processed by this method is generally 2-3nm rms, and the surface finish is not good, with many scratches.
按照传统工艺对白宝石基片进行超光滑表面加工,抛光液采用钻石膏,抛光盘采用沥青盘,抛光时间为40小时,表面粗糙度为1nm rms。The ultra-smooth surface of the white sapphire substrate was processed according to the traditional process. The polishing liquid was diamond paste, the polishing disc was an asphalt disc, the polishing time was 40 hours, and the surface roughness was 1nm rms.
按文献报道(脆硬材料的超光滑高平面度抛光工艺-摘自《超精密加工与测控技术论文集》),抛光盘采用锡盘,抛光液采用胶体SiO2溶液,经抛光后(抛光时间约为几百小时以上),白宝石基片表面粗糙度为0.23nm rms。According to the literature report (Ultra-smooth and high-flatness polishing process for brittle and hard materials-excerpted from "Ultra-precision Machining and Measurement and Control Technology Papers"), the polishing disc is made of tin plate, and the polishing liquid is colloidal SiO 2 solution. After polishing (polishing time is about For more than several hundred hours), the surface roughness of the white gemstone substrate is 0.23nm rms.
发明内容 Contents of the invention
本发明的目的在于提供一种白宝石晶体的超光滑表面加工方法。利用该方法加工白宝石晶体可使白宝石晶体的表面粗糙度达到<0.5nm rms。The object of the present invention is to provide a super-smooth surface processing method of white gemstone crystal. Using the method to process the white gem crystal can make the surface roughness of the white gem crystal reach <0.5nm rms.
为实现上述目的,本发明采用的技术方案为:To achieve the above object, the technical solution adopted in the present invention is:
一种白宝石晶体的表面加工方法,将经过研磨加工的白宝石晶体基片采用重量浓度30-50%二氧化硅水溶液(如:日本fujimi公司生产的80#水溶液)进行化学机械抛光,溶液PH值为9~11,抛光机械采用两轴或四轴研磨抛光机,于抛光盘上铺设有光学抛光布,机床转速为40~100转/分,抛光时间为8~14小时;通过化学机械抛光方法使白宝石晶体达到小于0.5nm rms的超光滑表面。抛光过程温度控制在22~25℃。A kind of surface processing method of white sapphire crystal, adopts weight concentration 30-50% silicon dioxide aqueous solution (such as: the 80# aqueous solution that Japanese fujimi company produces) to carry out chemical mechanical polishing through the white sapphire crystal substrate of grinding process, solution PH The value is 9-11. The polishing machine adopts a two-axis or four-axis grinding and polishing machine, and an optical polishing cloth is laid on the polishing disc. The machine speed is 40-100 rpm, and the polishing time is 8-14 hours; through chemical mechanical polishing The method makes white sapphire crystal achieve an ultra-smooth surface of less than 0.5nm rms. The temperature of the polishing process is controlled at 22-25°C.
采用两轴或四轴研磨抛光机,以表面光滑的磨块为磨盘,磨料为碳化硼,机床转速为40~100转/分;A two-axis or four-axis grinding and polishing machine is used, with a smooth-surfaced grinding block as a grinding disc, the abrasive is boron carbide, and the machine speed is 40-100 rpm;
第一道细磨:用粒度为F14的碳化硼,表面研磨均匀,通常研磨5分钟-1小时;The first fine grinding: use boron carbide with a particle size of F14, and the surface is evenly ground, usually for 5 minutes to 1 hour;
第二道细磨:用粒度为F10的碳化硼,表面研磨均匀,通常研磨10分钟-1.5小时;The second fine grinding: use boron carbide with a particle size of F10, and the surface is evenly ground, usually for 10 minutes to 1.5 hours;
第三道细磨:用粒度为F5的碳化硼,表面研磨均匀,通常研磨20分钟-3小时;The third fine grinding: use boron carbide with a particle size of F5, and the surface is evenly ground, usually for 20 minutes to 3 hours;
第四道细磨:用粒度为F3.5的碳化硼,表面研磨均匀,通常研磨30分钟-5小时。The fourth fine grinding: use boron carbide with a particle size of F3.5, and the surface is evenly ground, usually for 30 minutes to 5 hours.
研磨过程温度控制在22~25℃;所述表面光滑的磨块为金钢石块或精密陶瓷块。The temperature in the grinding process is controlled at 22-25° C.; the grinding block with a smooth surface is a diamond block or a precision ceramic block.
本发明的有益效果是:The beneficial effects of the present invention are:
利用本发明的方法不但可以提高白宝石的加工质量,而且可以大大减少加工时间,加工后白宝石晶体表面光洁度好、无划痕,其表面粗糙度小于0.5nm rms。本发明有利于开展高功率激光器输出窗口以及红外军事装备和卫星的仪表的加工工作。The method of the invention can not only improve the processing quality of the white gemstone, but also greatly reduce the processing time. After processing, the white gemstone crystal has a good surface finish and no scratches, and its surface roughness is less than 0.5nm rms. The invention is beneficial to carry out the processing work of the output window of the high-power laser and the instrument of the infrared military equipment and the satellite.
具体实施方式 Detailed ways
由于白宝石的硬度很高,给加工带来一定的难度。根据白宝石的基本属性,粗磨和细磨采用了精密陶瓷做白宝石的磨盘,因为精密陶瓷含有α-Al2O3的成分,其硬度比白宝石略低,与其它的材料如铁、铜、玻璃等相比陶瓷本身的致密度好于以上材料。用其它的材料如铁、铜、玻璃等细磨后白宝石表面会出现一些划痕,用陶瓷粗磨和细磨就解决了这个关键的问题。所采用的材料为碳化硼。为了加快粗磨与细磨的时间,可以采用几道型号的碳化硼,相隔型号不宜太近。Due to the high hardness of white gemstones, it brings certain difficulties to processing. According to the basic properties of white gemstones, precision ceramics are used as grinding discs for white gemstones for rough grinding and fine grinding, because precision ceramics contain α-Al 2 O 3 components, and their hardness is slightly lower than that of white gemstones. Copper, glass, etc. are denser than ceramics themselves than the above materials. After fine grinding with other materials such as iron, copper, glass, etc., some scratches will appear on the surface of white sapphire. Using ceramic rough grinding and fine grinding can solve this key problem. The material used is boron carbide. In order to speed up the time of coarse grinding and fine grinding, several models of boron carbide can be used, and the distance between the models should not be too close.
以前白宝石镜片细磨后基本上采用沥青和松香的混合物来作为抛光的材料,但由于抛光料中它的颗粒的均匀性也不是绝对一样,往往颗粒较大的就被压入抛光盘中,这样就会造成白宝石镜片表面出现划痕,直接影响了实验质量,表面粗糙度也不能达到要求。我们通过了解国内外的一些先进的资料,结合我们实际所遇到的问题,经过反复多次的论证,用一种抛光布代替了传统的沥青抛光法。抛光材料为日本的80#抛光液,经过一定的抛光时间后,白宝石的表面粗糙度可达到小于0.5nmRMS。In the past, the mixture of asphalt and rosin was basically used as the polishing material after the white sapphire lens was finely ground, but because the uniformity of its particles in the polishing material is not absolutely the same, the larger particles are often pressed into the polishing disc. This will cause scratches on the surface of the white sapphire lens, which directly affects the quality of the experiment, and the surface roughness cannot meet the requirements. By understanding some advanced materials at home and abroad, combined with the problems we actually encountered, and after repeated demonstrations, we replaced the traditional asphalt polishing method with a polishing cloth. The polishing material is Japanese 80# polishing liquid. After a certain polishing time, the surface roughness of white gemstone can reach less than 0.5nmRMS.
所述白宝石晶体超光滑表面的具体加工方法如下:The concrete processing method of described super-smooth surface of white sapphire crystal is as follows:
实施例1Example 1
选取Φ30mm白宝石晶体基片Select Φ30mm white sapphire crystal substrate
1.细磨工序:1. Fine grinding process:
磨盘:金钢石块Grinding Disc: diamond block
磨料:碳化硼Abrasive: boron carbide
磨床:两轴研磨抛光机,机床转速为80转/分;Grinding machine: two-axis grinding and polishing machine, the machine speed is 80 rpm;
第一道细磨:用粒度为F14的碳化硼,表面研磨均匀,通常研磨6分钟;The first fine grinding: use boron carbide with a particle size of F14, and the surface is evenly ground, usually for 6 minutes;
第二道细磨:用粒度为F10的碳化硼,表面研磨均匀,通常研磨20分钟;The second fine grinding: use boron carbide with a particle size of F10, and the surface is evenly ground, usually for 20 minutes;
第三道细磨:用粒度为F5的碳化硼,表面研磨均匀,通常研磨30分钟;The third fine grinding: use boron carbide with a particle size of F5, and the surface is evenly ground, usually for 30 minutes;
第四道细磨:用粒度为F3.5的碳化硼,表面研磨均匀,通常研磨40分钟。The fourth fine grinding: use boron carbide with a particle size of F3.5, and the surface is evenly ground, usually for 40 minutes.
研磨过程温度控制在22~25℃;The temperature of the grinding process is controlled at 22-25°C;
2.抛光工序:2. Polishing process:
抛光盘上铺设有光学抛光布;An optical polishing cloth is laid on the polishing disc;
抛光剂:重量浓度40%二氧化硅水溶液(如:日本fujimi公司生产的80#水溶液)80#水溶液Polishing agent: 40% silicon dioxide aqueous solution by weight (such as: 80# aqueous solution produced by Fujimi Company in Japan) 80# aqueous solution
溶液PH值:9Solution pH value: 9
磨床:两轴研磨抛光机Grinding machine: two-axis grinding and polishing machine
机床转速:50转/分Machine speed: 50 rpm
抛光温度:22-25℃Polishing temperature: 22-25°C
抛光时间:8小时Polishing time: 8 hours
通过化学机械抛光方法使白宝石晶体达到小于0.5nm rms的超光滑表面;抛光过程温度控制在22~25℃。The white sapphire crystal achieves an ultra-smooth surface of less than 0.5nm rms by chemical mechanical polishing; the temperature of the polishing process is controlled at 22-25°C.
实施例2Example 2
选取Φ110mm白宝石晶体基片Select Φ110mm white sapphire crystal substrate
1.细磨工序:1. Fine grinding process:
磨盘:金钢石块Grinding Disc: diamond block
磨料:碳化硼Abrasive: boron carbide
磨床:四轴研磨抛光机,机床转速为40转/分;Grinding machine: four-axis grinding and polishing machine, the machine speed is 40 rpm;
第一道细磨:用粒度为F14的碳化硼,表面研磨均匀,通常研磨1小时;The first fine grinding: use boron carbide with a particle size of F14, and the surface is evenly ground, usually for 1 hour;
第二道细磨:用粒度为F10的碳化硼,表面研磨均匀,通常研磨1.5小时;The second fine grinding: use boron carbide with a particle size of F10, and the surface is evenly ground, usually for 1.5 hours;
第三道细磨:用粒度为F5的碳化硼,表面研磨均匀,通常研磨3小时;The third fine grinding: use boron carbide with a particle size of F5, and the surface is evenly ground, usually for 3 hours;
第四道细磨:用粒度为F3.5的碳化硼,表面研磨均匀,通常研磨5小时。The fourth fine grinding: use boron carbide with a particle size of F3.5, and the surface is evenly ground, usually for 5 hours.
研磨过程温度控制在22~25℃;The temperature of the grinding process is controlled at 22-25°C;
2.抛光工序:2. Polishing process:
抛光盘上铺设有光学抛光布;An optical polishing cloth is laid on the polishing disc;
抛光剂:重量浓度30%二氧化硅水溶液Polishing agent: 30% aqueous solution of silica by weight
溶液PH值:11Solution pH value: 11
磨床:四轴研磨抛光机Grinding machine: four-axis grinding and polishing machine
机床转速:40转/分Machine speed: 40 rpm
抛光温度:22-25℃Polishing temperature: 22-25°C
抛光时间:14小时Polishing time: 14 hours
通过化学机械抛光方法使白宝石晶体达到小于0.5nm rms的超光滑表面;抛光过程温度控制在22~25℃。The white sapphire crystal achieves an ultra-smooth surface of less than 0.5nm rms by chemical mechanical polishing; the temperature of the polishing process is controlled at 22-25°C.
实施例3Example 3
选取Φ80mm白宝石晶体基片Select Φ80mm white sapphire crystal substrate
1.细磨工序:1. Fine grinding process:
磨盘:金钢石块Grinding Disc: diamond block
磨料:碳化硼Abrasive: boron carbide
磨床:四轴研磨抛光机,机床转速为60转/分;Grinding machine: four-axis grinding and polishing machine, the machine speed is 60 rpm;
第一道细磨:用粒度为F14的碳化硼,表面研磨均匀,通常研磨0.5小时;The first fine grinding: use boron carbide with a particle size of F14, and the surface is evenly ground, usually for 0.5 hours;
第二道细磨:用粒度为F10的碳化硼,表面研磨均匀,通常研磨50分钟;The second fine grinding: use boron carbide with a particle size of F10, and the surface is evenly ground, usually for 50 minutes;
第三道细磨:用粒度为F5的碳化硼,表面研磨均匀,通常研磨1小时;The third fine grinding: use boron carbide with a particle size of F5, and the surface is evenly ground, usually for 1 hour;
第四道细磨:用粒度为F3.5的碳化硼,表面研磨均匀,通常研磨3小时。The fourth fine grinding: use boron carbide with a particle size of F3.5, and the surface is evenly ground, usually for 3 hours.
研磨过程温度控制在22~25℃;The temperature of the grinding process is controlled at 22-25°C;
2.抛光工序:2. Polishing process:
抛光盘上铺设有光学抛光布;An optical polishing cloth is laid on the polishing disc;
抛光剂:重量浓度50%二氧化硅水溶液Polishing agent: 50% aqueous solution of silica by weight
溶液PH值:10Solution pH value: 10
磨床:四轴研磨抛光机Grinding machine: four-axis grinding and polishing machine
机床转速:90转/分Machine speed: 90 rpm
抛光温度:22-25℃Polishing temperature: 22-25°C
抛光时间:12小时Polishing time: 12 hours
通过化学机械抛光方法使白宝石晶体达到小于0.5nm rms的超光滑表面;抛光过程温度控制在22~25℃。The white sapphire crystal achieves an ultra-smooth surface of less than 0.5nm rms by chemical mechanical polishing; the temperature of the polishing process is controlled at 22-25°C.
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