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CN100571788C - Fluid handling system - Google Patents

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CN100571788C
CN100571788C CNB2005800080221A CN200580008022A CN100571788C CN 100571788 C CN100571788 C CN 100571788C CN B2005800080221 A CNB2005800080221 A CN B2005800080221A CN 200580008022 A CN200580008022 A CN 200580008022A CN 100571788 C CN100571788 C CN 100571788C
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radiation source
handling system
source assembly
fluid handling
described fluid
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CN1929870A (en
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韦斯·弗罗姆
博伊科·查德罗夫
迈克·马尔库
理查德·格拉唐
戴维·奥尔森
吉姆·弗拉塞尔
达斯科·A·凯泽莱
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Trojan Technologies Inc Canada
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    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/30Treatment of water, waste water, or sewage by irradiation
    • C02F1/32Treatment of water, waste water, or sewage by irradiation with ultraviolet light
    • C02F1/325Irradiation devices or lamp constructions
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2201/00Apparatus for treatment of water, waste water or sewage
    • C02F2201/32Details relating to UV-irradiation devices
    • C02F2201/322Lamp arrangement
    • C02F2201/3227Units with two or more lamps

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  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physical Water Treatments (AREA)
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Abstract

本发明涉及一种流体处理系统,包括:入口;出口;设置在该入口和出口之间的流体处理区,该流体处理区具有设置在其中的:(i)具有第一纵向轴线的长条形的第一辐射源组件,和(ii)具有第二纵向轴线的长条形的第二辐射源组件;其中所述第一纵向轴线和第二纵向轴线彼此不平行且不与流体流穿过流体处理区的方向平行。本流体处理系统具有如下优点:能处理大体积的流体(例如污水或饮用水等);能增大对穿过反应器的最大允许速度的限制;要求较小的“占地面积”;形成较低的阻力系数,改进在流体处理系统的长度上的液压损失/梯度;形成辐射源较低(或没有)的受迫振动,因此避免或减轻辐射源和/或保护套管(如果有)的损坏。其它优点将在说明书中讨论。

Figure 200580008022

The present invention relates to a fluid treatment system, comprising: an inlet; an outlet; a fluid treatment zone disposed between the inlet and the outlet, the fluid treatment zone having disposed therein: (i) an elongated strip having a first longitudinal axis and (ii) an elongated second radiation source assembly having a second longitudinal axis; wherein the first and second longitudinal axes are non-parallel to each other and not intersecting with fluid flow through the fluid The directions of the treatment zones are parallel. The fluid treatment system has the following advantages: it can handle large volumes of fluid (such as sewage or drinking water, etc.); it can increase the limit on the maximum allowable velocity passing through the reactor; Low coefficient of drag, improving hydraulic losses/gradients over the length of the fluid handling system; resulting in lower (or no) forced vibration of the radiation source, thus avoiding or mitigating stress on the radiation source and/or protective casing (if present) damage. Other advantages will be discussed in the specification.

Figure 200580008022

Description

流体处理系统 fluid handling system

技术领域 technical field

一方面,本发明涉及一种流体处理系统,更具体地,涉及一种紫外线辐射水处理系统。另一方面,本发明涉及一种用于处理流体的方法,更具体地,涉及一种用于处理辐射水的方法。In one aspect, the present invention relates to a fluid treatment system, and more particularly, to an ultraviolet radiation water treatment system. In another aspect, the invention relates to a method for treating fluid, and more particularly, to a method for treating irradiated water.

背景技术 Background technique

通常,流体处理系统在本领域是已知的。更具体地,紫外线(UV)辐射流体处理系统通常在本领域是已知的。早期的处理系统包括全包围室设计,该室包含有一个或多个辐射(优选为UV)灯。在这类早期的设计中存在某些问题。当应用于如典型的更大规模的市政污水或饮用水处理设备的大的开放型流体处理设备时,这些问题特别地明显。因此,这类反应器具有以下的相关问题:Generally, fluid handling systems are known in the art. More specifically, ultraviolet (UV) radiation fluid treatment systems are generally known in the art. Early processing systems included the design of a fully enclosed chamber containing one or more radiation (preferably UV) lamps. Certain problems existed in such early designs. These problems are particularly pronounced when applied to large open fluid treatment plants, such as are typical of larger scale municipal sewage or drinking water treatment plants. Accordingly, such reactors have the following associated problems:

●反应器的较高的资金成本;● Higher capital cost of the reactor;

●难以接触到浸没的反应器和/或湿的设备(灯、套管清洁器等);Difficult access to submerged reactors and/or wet equipment (lamps, sleeve cleaners, etc.);

●难以将淤塞的材料从流体处理设备中移除;Difficulty removing fouled material from fluid handling equipment;

●较低的流体消毒效率,和/或● Lower fluid disinfection efficiency, and/or

●需要繁杂的设备用于对湿的组件(套管、灯等)的维护。常规反应器中的这些缺点造成所谓的“开放通道”反应器的发展。• Requires cumbersome equipment for maintenance on wetted components (sleeves, lamps, etc.). These disadvantages in conventional reactors have led to the development of so-called "open channel" reactors.

例如,美国专利4,482,809和5,006,244(均为Maarschalkerweerd名下并且均受让于本发明的受让人,且在这里称为Maarschalkerweerd#1专利)均描述了使用紫外线(UV)辐射的重力反馈流体处理系统。For example, U.S. Patents 4,482,809 and 5,006,244 (both in the name of Maarschalkerweerd and both assigned to the assignee of the present invention, and referred to herein as the Maarschalkerweerd #1 patent) both describe gravity feedback fluid treatment systems using ultraviolet (UV) radiation .

这样的系统包括UV灯模块的排列(例如,框架),该排列包括若干UV灯,每个均安装于在一对臂之间延伸并由该臂支撑的套管内,其中该一对臂与截面相接触。这样支撑的套管(包括UV灯)被浸入流体中,该流体被处理而后按需要被辐射。流体暴露于辐射的量由流体与灯的靠近量,灯的输出瓦数和经过灯的流体流量来决定。典型地,可使用一个或多个UV传感器来监控灯的UV输出,并且通过水位闸门等在一定程度上典型地控制处理装置下游的流体水平。Such systems include an array (e.g., a frame) of UV lamp modules comprising a number of UV lamps, each mounted within a sleeve extending between and supported by a pair of arms that are connected to the section touch. The so supported sleeve (including UV lamps) is immersed in a fluid which is treated and then irradiated as required. The amount of exposure of the fluid to radiation is determined by the proximity of the fluid to the lamp, the wattage output of the lamp and the flow of fluid through the lamp. Typically, one or more UV sensors may be used to monitor the UV output of the lamps and typically control the level of fluid downstream of the treatment device to some extent, typically through a water level gate or the like.

Maarschalkerweerd#1专利给出了流体处理系统,该系统的特征在于将设备从湿的或淹没状态取出而不需要全部设备重复的改进的性能。这样的设计将灯排列划分为行和/或列,且特征在于具有反应器开口的顶部来提供“顶部开口”通道中的流体的自由表面流。The Maarschalkerweerd #1 patent presents a fluid handling system characterized by improved performance of taking equipment out of a wet or submerged state without requiring full equipment repetition. Such designs divide the lamp arrangement into rows and/or columns, and feature open tops with reactors to provide free surface flow of fluid in "open top" channels.

Maarschalkerweerd#1专利给出的流体处理系统的特征在于具有流体的自由表面流(典型地,不有意地控制或限定顶部流体表面)。因此,该系统将典型地遵循开放通道水力的运动行为。由于该系统的设计固有地包括流体的自由表面流,对每个灯能够处理的最大流量有限制,以免在某个水力学上邻接的排列被水位变化不利地影响。在更高的流量或流量的显著改变的情况下,不受限或自由的流体的表面流将被用来改变流体流的处理容量和截面形状,因此使反应器相对地不太有效。如果排列中供给到每个灯的功率较低,则每个灯的流体流将较低。流体处理系统全开通道的概念将在这些较低功率灯和较低的水力负载处理系统中满足。这里的问题是,使用较低功率的灯,因此需要相对大量的灯来处理流体流的同一体积。因此,系统的固有成本将过于高和/或与自动灯套管清洁的附加特征及大流体体积处理系统相比没有竞争力。The fluid handling system given in the Maarschalkerweerd #1 patent is characterized by having a free surface flow of fluid (typically, no top fluid surface is intentionally controlled or defined). Therefore, the system will typically follow the kinetic behavior of open channel hydraulics. Since the design of the system inherently includes free surface flow of fluid, there is a limit to the maximum flow that each lamp can handle, lest certain hydraulically contiguous arrangements be adversely affected by changes in water level. At higher flow rates or significant changes in flow rate, unrestricted or free surface flow of the fluid will be used to alter the process capacity and cross-sectional shape of the fluid flow, thus making the reactor relatively less efficient. If the power supplied to each lamp in the array is lower, the fluid flow per lamp will be lower. The fluid handling system full open channel concept will be satisfied in these lower wattage lamp and lower hydraulic load handling systems. The problem here is that lower wattage lamps are used, so a relatively large number of lamps are required to treat the same volume of fluid flow. Therefore, the inherent cost of the system would be prohibitively high and/or not competitive with the added features of automatic lamp sleeve cleaning and large fluid volume handling systems.

这样的情况导致了所谓的“半封闭”流体处理系统。Such circumstances have resulted in so-called "semi-closed" fluid handling systems.

美国专利5,418,370、5,539,210和Re36,896(均为Maarschalkerweerd名下且均受让于本发明的受让人,以下称为Maarschalkerweerd#2专利)中都描述了一种改进的辐射源模块,用于使用UV辐射的重力反馈流体处理系统。通常,该改进的辐射源模块包括从支撑部件处悬臂密封的辐射源组件(典型地包括辐射源和保护(例如石英)套管)。该支撑部件可进一步包括用来在重力反馈流体处理系统中紧固辐射源模块的适合的装置。U.S. Patents 5,418,370, 5,539,210, and Re36,896 (all in the name of Maarschalkerweerd and assigned to the assignee of the present invention, hereinafter referred to as the Maarschalkerweerd #2 patent) all describe an improved radiation source module for use in Gravity feedback fluid handling system for UV radiation. Typically, the improved radiation source module comprises a sealed radiation source assembly (typically comprising a radiation source and a protective (eg quartz) sleeve) cantilevered from a support member. The support member may further comprise suitable means for securing the radiation source module in a gravity feedback fluid treatment system.

这样,为了解决具有大量灯以及清洁每个灯的增加的高成本,对UV流体处理应用了具有更高输出的灯。结果是灯的数量和每个灯的长度显著地减少。这样导致自动灯套管清洁设备的可支付的经济性,对于处理系统的降低的空间要求以及其它优点。为了使用更多的大功率灯(例如中压UV灯),系统使用过程中每灯的水力负载将增加到一定程度,如果反应器表面没有在所有表面上限定则反应器内流体的处理容量/截面面积将显著改变,且因此将使得这样的系统相对不起作用。因此,Maarschalkerweerd#2专利的特征在于具有限定反应器的处理区域内被处理流体的封闭表面。该封闭处理系统具有设置在开放通道内的开口端。能使用枢转铰接、滑动装置和各种其它能使设备移动的装置来将浸没的或湿的设备(UV灯、清洁器等)从半封闭反应器中取出到自由表面。Thus, to address having a large number of lamps and the increased high cost of cleaning each lamp, lamps with higher output are applied to UV fluid processing. The result is a significant reduction in the number of lamps and the length of each lamp. This results in a cost-effective automatic lamp tube cleaning device, a reduced space requirement for the treatment system, and other advantages. In order to use more high-power lamps (such as medium pressure UV lamps), the hydraulic load per lamp during system use will increase to a certain extent, if the reactor surface is not defined on all surfaces then the treatment capacity of the fluid in the reactor / The cross-sectional area would change significantly, and thus would render such a system relatively ineffective. Thus, the Maarschalkerweerd #2 patent is characterized by having enclosed surfaces that define the treated fluid within the treatment zone of the reactor. The closed processing system has an open end disposed within the open channel. Submerged or wet equipment (UV lamps, cleaners, etc.) can be taken out of the semi-closed reactor to a free surface using pivoting hinges, sliding means, and various other means to enable movement of the equipment.

Maarschalkerweerd#2专利中所述的流体处理系统的典型特征在于悬臂连到大致竖直的支撑臂(例如灯只在一端被支撑)的具有较短长度的灯。这样可使灯从半封闭反应器中枢转或以其它方式取出。这些显著变短且功率更大的灯的特征在于将电能转化为UV能时效率较低。与该设备相关的接近和支撑这些灯的成本很重要。The fluid treatment system described in the Maarschalkerweerd #2 patent is typically characterized by a lamp having a short length cantilevered to a generally vertical support arm (eg the lamp is only supported at one end). This allows the lamp to be pivoted or otherwise removed from the semi-closed reactor. These significantly shorter and more powerful lamps are characterized by a lower efficiency in converting electrical energy to UV energy. The cost of accessing and supporting these lights associated with this equipment is significant.

历史上,Maarschalkerweerd#1和#2专利中所述的流体处理模块和系统在市政污水处理领域具有广泛应用(例如对于排放到河流、池塘、湖或其它类似的水流中的水的处理)。Historically, the fluid treatment modules and systems described in the Maarschalkerweerd #1 and #2 patents have found widespread application in the field of municipal wastewater treatment (eg, treatment of water discharged into rivers, ponds, lakes or other similar water streams).

在市政饮用水领域,已知的是使用所谓的“封闭”流体处理系统或“加压”流体处理系统。In the field of municipal drinking water it is known to use so-called "closed" fluid treatment systems or "pressurized" fluid treatment systems.

已知的封闭流体处理装置,例如见美国专利5,504,335(Maarschalkerweerd#3)。Maarschalkerweerd#3给出了包括用于接收流体流的外壳的封闭流体处理装置。该外壳包括流体入口、流体出口、设置在流体入口和流体出口之间的流体处理区、和设置在流体处理区中的至少一个辐射源模块。流体入口、流体出口和流体处理区彼此成直线关系。该至少一个辐射源模块包括密封地连接于一臂的辐射源,该臂密封地安装在外壳上。该辐射源设置为大致平行于流体流。该辐射源模块可通过设置在中间外壳中的孔移动到流体入口和流体出口,因此避免了维护辐射源时将装置进行物理移动的需要。For known closed fluid handling devices, see for example US Patent 5,504,335 (Maarschalkerweerd #3). Maarschalkerweerd #3 presents a closed fluid handling device comprising a housing for receiving a fluid flow. The housing includes a fluid inlet, a fluid outlet, a fluid treatment region disposed between the fluid inlet and the fluid outlet, and at least one radiation source module disposed in the fluid treatment region. The fluid inlet, fluid outlet and fluid treatment zone are in linear relationship to each other. The at least one radiation source module includes a radiation source sealingly connected to an arm that is sealingly mounted on the housing. The radiation source is arranged generally parallel to the fluid flow. The radiation source module is movable to the fluid inlet and fluid outlet through apertures provided in the intermediate housing, thus avoiding the need to physically move the device when servicing the radiation source.

美国专利6,500,346[Taghipour等人(Taghipour)]中给出了封闭流体处理装置,特别是用于对诸如水的流体的紫外辐射处理。该装置包括用于接收流体流的外壳。该外壳具有流体入口、流体出口、设置在流体入口和流体出口之间的流体处理区、和至少一个辐射源,该辐射源具有设置在流体处理区中的纵向轴线,该轴线大致与穿过外壳的流体流的方向横向交叉。流体入口、流体出口和流体处理区设置为彼此大致成直线关系。流体入口具有第一开口,该开口具有:(i)小于流体处理区截面积的截面面积,和(ii)大致平行于至少一个辐射源组件的纵向轴线的最大直径。Closed fluid treatment apparatus, particularly for the treatment of fluids such as water with ultraviolet radiation, is given in US Patent 6,500,346 [Taghipour et al. (Taghipour)]. The device includes a housing for receiving a fluid flow. The housing has a fluid inlet, a fluid outlet, a fluid treatment zone disposed between the fluid inlet and the fluid outlet, and at least one radiation source having a longitudinal axis disposed in the fluid treatment zone approximately in line with the The direction of fluid flow crosses transversely. The fluid inlet, fluid outlet and fluid treatment zone are arranged in generally linear relationship to each other. The fluid inlet has a first opening having (i) a cross-sectional area less than the cross-sectional area of the fluid treatment zone, and (ii) a largest diameter generally parallel to the longitudinal axis of the at least one radiation source assembly.

在上述类型的已知流体处理系统的实际实施中,使辐射源的纵向轴线:(i)平行于穿过流体处理系统的流体流的方向,或(ii)正交于穿过流体处理系统的流体流的方向。而且,在布置(ii)中,通常是将灯设置在排列中,使得从流体处理系统的上游端到下游端,下游辐射源直接位于上游辐射源后边。In practical implementations of known fluid treatment systems of the type described above, the longitudinal axis of the radiation source is: (i) parallel to the direction of fluid flow through the fluid treatment system, or (ii) orthogonal to the direction of fluid flow through the fluid treatment system. The direction of fluid flow. Also, in arrangement (ii) the lamps are typically arranged in an array such that the downstream radiation source is directly behind the upstream radiation source from the upstream end to the downstream end of the fluid treatment system.

UV辐射水处理系统中的布置(ii)的使用基于根据被处理水的穿透度(transmittance),辐射在距辐射源规定的距离内有效的理论。因此,在布置(ii)中留有辐射源的间隔变得很平常,从而相邻辐射源的纵向轴线上的间隔距离大约等于上句中提到的规定距离的两倍。The use of arrangement (ii) in UV radiation water treatment systems is based on the theory that radiation is effective within a prescribed distance from the radiation source, depending on the transmittance of the water being treated. Therefore, it becomes commonplace to leave the radiation sources spaced apart in arrangement (ii) such that adjacent radiation sources are spaced apart on their longitudinal axes by a distance approximately equal to twice the specified distance mentioned in the previous sentence.

不利的是,对于大体积流体的处理,布置(ii)有多个不利的原因。具体地,布置(ii)的实现需要较大的“占地面积”或空间来容纳辐射源。而且,在布置(ii)中使用大量辐射源产生较大的阻力系数,导致在流体处理系统长度上的较大的液压损失/梯度。而且,在布置(ii)中使用大量辐射源会产生涡流效应(在下文中将更详细地讨论该效应),导致辐射源的受迫振动,这样的受迫振动增加了辐射源和/或保护套管(如果有)的损坏的可能性。Disadvantageously, for the treatment of large volumes of fluid, arrangement (ii) is disadvantageous for several reasons. In particular, implementation of arrangement (ii) requires a relatively large "footprint" or space to accommodate the radiation source. Also, the use of a large number of radiation sources in arrangement (ii) produces a larger drag coefficient, resulting in larger hydraulic losses/gradients over the length of the fluid treatment system. Furthermore, the use of a large number of radiation sources in arrangement (ii) creates eddy current effects (discussed in more detail below), resulting in forced vibrations of the radiation sources which increase the Possibility of damage to the pipe (if any).

因此,在本领域中仍有对于流体处理系统的需要,特别是对于具有以下特征中的一个或多个的封闭流体处理系统:Accordingly, there remains a need in the art for fluid treatment systems, particularly closed fluid treatment systems having one or more of the following characteristics:

●能处理大体积的流体(例如污水或饮用水等);●Can handle large volume of fluid (such as sewage or drinking water, etc.);

●能增大对穿过反应器的最大允许速度的限制;the ability to increase the limit on the maximum allowable velocity through the reactor;

●要求较小的“占地面积”;●Requires a smaller "footprint area";

●形成较低的阻力系数,改进在流体处理系统的长度上的液压损失/梯度;• Creates a lower drag coefficient, improving hydraulic losses/gradients over the length of the fluid handling system;

●形成辐射源较低(或没有)的受迫振动,因此避免或减轻辐射源和/或保护套管(如果有)的损坏;Create low (or no) forced vibrations of the radiation source, thus avoiding or mitigating damage to the radiation source and/or protective casing (if any);

●能容易适于利用较新开发的所谓“低压高输出”(LPHO),汞合金和/或UV发射灯,同时允许在用于维护等时容易地将灯从流体处理系统中取出;Can be easily adapted to utilize more recently developed so-called "low pressure high output" (LPHO), amalgam and/or UV emitting lamps, while allowing easy removal of the lamp from the fluid handling system when used for maintenance etc.;

●能使用标准长度的灯用于反应器的各种宽度;Ability to use standard length lamps for various widths of reactors;

●能容易地与清洁系统结合以将淤塞物质从辐射源的外部清除;Can be easily integrated with a cleaning system to remove fouling material from the outside of the radiation source;

●能以更新升级的方式容易地安装在现有流体处理厂中;●It can be easily installed in the existing fluid treatment plant in the way of updating and upgrading;

●提供与常规流体处理系统相比的相对改进的消毒性能。• Provides relatively improved disinfection performance compared to conventional fluid handling systems.

发明内容 Contents of the invention

本发明的目的是提供一种新颖的流体处理系统,该系统可避免或减少至少一个上述的现有技术的缺点。It is an object of the present invention to provide a novel fluid treatment system which avoids or reduces at least one of the above-mentioned disadvantages of the prior art.

一方面,本发明涉及一种流体处理系统,包括:In one aspect, the invention relates to a fluid treatment system comprising:

入口;Entrance;

出口;exit;

设置在该入口和出口之间的流体处理区,该流体处理区具有设置在其中的:(i)具有第一纵向轴线的长条形的第一辐射源组件,和(ii)具有第二纵向轴线的长条形的第二辐射源组件;a fluid treatment zone disposed between the inlet and outlet, the fluid treatment zone having disposed therein: (i) an elongate first radiation source assembly having a first longitudinal axis, and (ii) a second longitudinal axis an axially elongated second radiation source assembly;

其中所述第一纵向轴线和第二纵向轴线彼此不平行且不与流体流穿过流体处理区的方向平行。Wherein the first and second longitudinal axes are non-parallel to each other and to the direction of fluid flow through the fluid treatment zone.

另一方面,本发明涉及一种流体处理系统,包括:In another aspect, the invention relates to a fluid treatment system comprising:

入口;Entrance;

出口;exit;

设置在该入口和出口之间的流体处理区,该流体处理区具有设置在其中的辐射源组件排列,该辐射源组件排列从流体处理区的上游区域到下游区域串连地设置,使得:(i)每个辐射源组件具有横向于流体流穿过流体处理区的方向的纵向轴线,(ii)上游辐射源组件的纵向轴线与下游辐射源组件在垂直于流体流穿过流体处理区的方向交错,从而在该上游辐射源组件和下游辐射源组件之间形成部分重叠,以及(iii)流体流不具有穿过流体处理区的不受阻碍的通路。A fluid treatment zone disposed between the inlet and the outlet, the fluid treatment zone having an arrangement of radiation source assemblies disposed therein, the arrangement of radiation source assemblies being arranged in series from an upstream region to a downstream region of the fluid treatment zone such that: ( i) each radiation source assembly has a longitudinal axis transverse to the direction of fluid flow through the fluid treatment zone, (ii) the longitudinal axis of the upstream radiation source assembly is perpendicular to the direction of fluid flow through the fluid treatment zone staggered so that there is a partial overlap between the upstream radiation source assembly and the downstream radiation source assembly, and (iii) the fluid flow does not have an unimpeded path through the fluid treatment zone.

另一方面,本发明涉及一种流体处理系统,包括:In another aspect, the invention relates to a fluid treatment system comprising:

入口;Entrance;

出口;exit;

设置在该入口和出口之间的流体处理区,该流体处理区具有设置在其中的辐射源组件行的排列;a fluid treatment zone disposed between the inlet and outlet, the fluid treatment zone having an arrangement of rows of radiation source assemblies disposed therein;

每个辐射源组件具有横向于或平行于流体流穿过流体处理区的方向的纵向轴线;each radiation source assembly has a longitudinal axis transverse or parallel to the direction of fluid flow through the fluid treatment zone;

每一行包括多个辐射源组件,该多个辐射源组件在横向于流体流穿过流体处理区的方向上成间隔的关系,从而限定间隙,流体能够穿过该间隙在相邻的一对辐射源组件之间流动;Each row includes a plurality of radiation source assemblies spaced in a spaced relationship transverse to the direction of fluid flow through the fluid treatment zone so as to define a gap through which fluid can pass to radiate radiation in adjacent pairs. flows between source components;

该排列中所有的行在垂直于流体流穿过流体处理区的方向上彼此交错,使得辐射源组件的上游行中的相邻的一对辐射源组件之间的间隙在流体流的方向上被辐射源组件构成的至少两个串连设置的下游行部分地或全部地阻碍。All rows in the arrangement are staggered with each other in a direction perpendicular to the direction of fluid flow through the fluid treatment zone such that the gap between adjacent pairs of radiation source assemblies in the upstream row of radiation source assemblies is divided in the direction of fluid flow. The downstream flow of at least two series arrangements of radiation source assemblies is partially or completely blocked.

另一方面,本发明涉及一种流体处理系统,包括:In another aspect, the invention relates to a fluid treatment system comprising:

入口;Entrance;

出口;exit;

设置在该入口和出口之间的流体处理区,该流体处理区具有设置在其中的辐射源组件排列,每个辐射源组件具有横向于或平行于流体流穿过流体处理区的方向的纵向轴线;a fluid treatment zone disposed between the inlet and outlet, the fluid treatment zone having an array of radiation source assemblies disposed therein, each radiation source assembly having a longitudinal axis transverse or parallel to the direction of fluid flow through the fluid treatment zone ;

该辐射源组件排列包括:第一行辐射源组件,位于第一行辐射源组件下游的第二行辐射源组件,位于第二行辐射源组件下游的第三行辐射源组件,和位于第三行辐射源组件下游的第四行辐射源组件;The radiation source assembly arrangement includes: a first row of radiation source assemblies, a second row of radiation source assemblies downstream of the first row of radiation source assemblies, a third row of radiation source assemblies downstream of the second row of radiation source assemblies, and a third row of radiation source assemblies located downstream of the second row of radiation source assemblies. a fourth row of radiation source assemblies downstream of the row radiation source assemblies;

第一行内的相邻的一对辐射源组件限定流体可流过的第一间隙,第二行的辐射源组件部分阻碍该第一间隙,从而将该第一间隙分为第二间隙和第三间隙,第三行的辐射源组件至少部分阻碍第二间隙,以及第四行的辐射源组件至少部分阻碍第三间隙。Adjacent pairs of radiation source assemblies in the first row define a first gap through which fluid can flow, and the radiation source assemblies of the second row partially obstruct the first gap, thereby dividing the first gap into a second gap and a second gap. Three gaps, the third row of radiation source assemblies at least partially obstructing the second gap, and the fourth row of radiation source assemblies at least partially obstructing the third gap.

另一方面,本发明涉及一种流体处理系统,包括:In another aspect, the invention relates to a fluid treatment system comprising:

入口;Entrance;

出口;exit;

设置在该入口和出口之间的流体处理区,该流体处理区具有设置在其中的排列,该排列包括从流体处理区上游部分到下游部分串连设置的4行辐射源组件;a fluid treatment zone disposed between the inlet and the outlet, the fluid treatment zone having disposed therein an arrangement comprising 4 rows of radiation source assemblies arranged in series from an upstream portion to a downstream portion of the fluid treatment zone;

每个辐射源组件具有横向于流体流穿过流体处理区方向的纵向轴线;each radiation source assembly has a longitudinal axis transverse to the direction of fluid flow through the fluid treatment zone;

其中:(i)所述排列中的第一对辐射源组件行包括在该行中相邻的辐射源组件对之间的大致均一的间隔;和(ii)所述排列中的第二对辐射源组件行包括在该行中相邻的辐射源组件对之间的大致不均一的间隔。wherein: (i) the row of the first pair of radiation source elements in the arrangement includes substantially uniform spacing between adjacent pairs of radiation source elements in the row; and (ii) the second pair of radiation source elements in the arrangement A source assembly row includes a substantially non-uniform spacing between adjacent pairs of radiation source assemblies in the row.

除了上述辐射源组件排列设置,还能使用所谓的边界辐射源组件,即辐射源组件位于平行于或靠近相对的反应器壁。所有边界辐射源组件的轴线互相邻近,各外边界辐射源组件处于相同的平面内。In addition to the arrangement of radiation source modules described above, it is also possible to use so-called border radiation source modules, ie radiation source modules located parallel to or close to opposing reactor walls. The axes of all boundary radiation source components are adjacent to each other, and the outer boundary radiation source components are in the same plane.

因此,本发明的流体处理系统具有以下的一个或多个优点:Accordingly, the fluid treatment system of the present invention has one or more of the following advantages:

●能处理大体积的流体(例如污水或饮用水等);●Can handle large volume of fluid (such as sewage or drinking water, etc.);

●能增大对穿过反应器的最大允许速度的限制;the ability to increase the limit on the maximum allowable velocity through the reactor;

●要求较小的“占地面积”;●Requires a smaller "footprint area";

●形成较低的阻力系数,改进在流体处理系统的长度上的液压损失/梯度;• Creates a lower drag coefficient, improving hydraulic losses/gradients over the length of the fluid handling system;

●形成辐射源较低(或没有)的受迫振动,因此避免或减轻辐射源和/或保护套管(如果有)的损坏;Create low (or no) forced vibrations of the radiation source, thus avoiding or mitigating damage to the radiation source and/or protective casing (if any);

●能容易适于利用较新开发的所谓“低压高输出”(LPHO),汞合金和/或UV发射灯,同时允许在用于维护等时容易地将灯从流体处理系统中取出;Can be easily adapted to utilize more recently developed so-called "low pressure high output" (LPHO), amalgam and/or UV emitting lamps, while allowing easy removal of the lamp from the fluid handling system when used for maintenance etc.;

●能使用标准长度的灯用于反应器的各种宽度;Ability to use standard length lamps for various widths of reactors;

●能容易地与清洁系统结合以将淤塞物质从辐射源的外部清除;Can be easily integrated with a cleaning system to remove fouling material from the outside of the radiation source;

●能以更新升级的方式容易地安装在现有流体处理厂中;●It can be easily installed in the existing fluid treatment plant in the way of updating and upgrading;

●提供与常规流体处理系统相比的相对改进的消毒性能(即,辐射源设置在该系统中,使其纵向轴线平行或垂直于流体流穿过包含在该系统内的流体处理区的方向)。Provides relatively improved disinfection performance compared to conventional fluid treatment systems (i.e., the radiation source is positioned in the system with its longitudinal axis parallel or perpendicular to the direction of fluid flow through a fluid treatment zone contained within the system) .

在总体上的一方面,本发明涉及一种流体处理系统,该系统包括以新颖的方式设置的至少两个辐射源组件。具体地,该辐射源组件设置为使得其中辐射源的各纵向轴线成彼此不平行的关系,且不与流体流穿过流体处理区的方向平行。这种设置不同于常规的流体处理系统,在常规流体处理系统中,所有的灯设置为使得辐射源组件内的各辐射源的纵向轴线成平行的关系,且这些轴线垂直或平行于流体流的方向。In a general aspect, the present invention relates to a fluid treatment system comprising at least two radiation source assemblies arranged in a novel manner. Specifically, the radiation source assembly is arranged such that the respective longitudinal axes of the radiation sources therein are in a non-parallel relationship to each other and not parallel to the direction of fluid flow through the fluid treatment zone. This arrangement differs from conventional fluid treatment systems in which all lamps are arranged such that the longitudinal axes of the radiation sources within the radiation source assembly are in a parallel relationship and these axes are either perpendicular or parallel to the direction of fluid flow. direction.

在本发明一方面的特别优选的实施例中,辐射源组件在排列中一般设置为V形。在该实施例中,优选地具有排列起来形成V形设置的各辐射源组件排列组(bank)。如以下更具体说明的,以这样的方式定向辐射源组件的一个优点是显著降低了由于涡流效应引起的辐射源的受迫振动。In a particularly preferred embodiment of one aspect of the invention, the radiation source assemblies are arranged generally V-shaped in the arrangement. In this embodiment, there are preferably banks of radiation source assemblies arranged to form a V-shaped arrangement. As explained in more detail below, one advantage of orienting the radiation source assembly in this manner is that forced vibrations of the radiation source due to eddy current effects are significantly reduced.

另一方面,本发明涉及一种流体处理系统,其中辐射源组件以一系列行的形式设置为横向于或平行于穿过流体处理区的流体流的方向,每一行包括在垂直于流体流穿过流体处理区的方向上间隔设置的多个辐射源组件。在本发明该方面的一个实施例中(也称为“交错/横向定向”),辐射源组件设置为横向于流体流穿过流体处理区的方向,且以这样的方式定向,即从流体处理区的上游部分到下游部分,辐射源组件在垂直于流体流穿过流体处理区的方向上交错,从而限定了这些组件之间的部分重叠。优选地,组件的集合设置为使得不具有流体流穿过流体处理区内辐射源组件设置的不受阻碍的通路。实际中,可通过看流体处理区的入口来观察,且看到在穿过从入口到出口的流体处理区中的辐射源组件的设置内没有清晰、不阻碍的通路。在本发明该方面的另一实施例中(也称为“交错/平行定向”),辐射源组件设置为平行于流体流穿过流体处理区内的辐射源组件设置的方向,且以这样的方式定向,即从流体处理区的上游部分到下游部分,辐射源组件设置为至少两个串连设置的排列组的形式,使得上游排列组中的多行辐射源组件在垂直于流体流穿过流体处理区中的辐射源组件的设置的方向上与下游排列组中的多行辐射源组件交错。In another aspect, the invention relates to a fluid treatment system wherein the radiation source assemblies are arranged in a series of rows transverse or parallel to the direction of fluid flow through the fluid treatment zone, each row comprising A plurality of radiation source assemblies arranged at intervals in the direction of the fluid treatment zone. In one embodiment of this aspect of the invention (also referred to as "staggered/transversely oriented"), the radiation source assemblies are positioned transverse to the direction of fluid flow through the fluid treatment zone and are oriented in such a way that From an upstream portion of the zone to a downstream portion, the radiation source assemblies are staggered in a direction perpendicular to the direction of fluid flow through the fluid treatment zone, thereby defining a partial overlap between these assemblies. Preferably, the collection of components is arranged such that there is no unimpeded path for fluid flow through the arrangement of the radiation source components within the fluid treatment zone. In practice, this can be seen by looking at the inlet to the fluid treatment zone and seeing that there is no clear, unobstructed pathway within the arrangement of radiation source assemblies through the fluid treatment zone from the inlet to the outlet. In another embodiment of this aspect of the invention (also referred to as "staggered/parallel orientation"), the radiation source assemblies are arranged parallel to the direction in which fluid flow through the radiation source assemblies within the fluid treatment zone is arranged, and in such a Oriented in a manner, that is, from the upstream portion to the downstream portion of the fluid treatment zone, the radiation source assemblies are arranged in the form of at least two series-arranged array groups, so that the radiation source assemblies in the upstream array group are arranged in a row perpendicular to the fluid flow passing through The orientation of the arrangement of radiation source assemblies in the fluid treatment zone is staggered with the rows of radiation source assemblies in the downstream array.

另一方面,本发明涉及一种流体处理系统,其中在流体处理区中设置有辐射源组件排列。该辐射源组件定向为横向于流体流穿过流体处理区的方向。该辐射源组件的排列包括第一行辐射源组件,其设置为在垂直于流体流穿过流体处理区的方向上的行内的辐射源组件对之间限定预定间隔。至少还有两行辐射源组件设置在第一行辐射源组件的下游。在一优选实施例中,这些下游辐射源组件行(例如两行或更多行)结合起来以填满或占用第一行的一列灯内的辐射源组件对之间的预定间隔,即,如果从流体处理系统的入口处看辐射源组件排列。在另一优选实施例中,这些下游辐射源组件行(例如两行或更多行)结合起来以仅部分填满或占用第一行的一列灯内的辐射源组件对之间的预定间隔,即,如果从流体处理系统的入口处看辐射源组件排列的情况。In another aspect, the invention relates to a fluid treatment system wherein an arrangement of radiation source assemblies is provided in a fluid treatment zone. The radiation source assembly is oriented transverse to the direction of fluid flow through the fluid treatment zone. The arrangement of radiation source assemblies includes a first row of radiation source assemblies arranged to define a predetermined spacing between pairs of radiation source assemblies within a row perpendicular to a direction of fluid flow through the fluid treatment zone. At least two further rows of radiation source assemblies are disposed downstream of the first row of radiation source assemblies. In a preferred embodiment, these downstream radiation source assembly rows (e.g., two or more rows) combine to fill or occupy the predetermined spacing between radiation source assembly pairs within a column of lamps in the first row, i.e., if Radiation source assembly arrangement viewed from inlet of fluid handling system. In another preferred embodiment, these downstream radiation source assembly rows (eg, two or more rows) combine to only partially fill or occupy the predetermined spacing between radiation source assembly pairs within a column of lamps in the first row, That is, if the radiation source assembly arrangement is viewed from the inlet of the fluid treatment system.

在本流体处理系统中,能在流体处理区的上游和/或下游结合所谓的过渡区域。优选地,这样的过渡区用作以漏斗或其它的流体流过渡的形式,使得垂直于流体流方向的流体流的截面面积:(i)增大(如果该过渡区位于流体处理区上游)因而降低流体流的速度,或(ii)减小(如果该过渡区位于流体处理区下游)因而增大流体流的速度。In the present fluid treatment system so-called transition zones can be incorporated upstream and/or downstream of the fluid treatment zone. Preferably, such a transition zone acts as a funnel or other fluid flow transition such that the cross-sectional area of fluid flow perpendicular to the direction of fluid flow: (i) increases (if the transition zone is located upstream of the fluid treatment zone) thereby The velocity of the fluid flow is reduced, or (ii) reduced (if the transition zone is located downstream of the fluid treatment zone) thereby increasing the velocity of the fluid flow.

在整个说明书中,均参考使用例如“封闭区”、“封闭截面”和“受约束的”的术语。基本上,这些术语是可互换的,且均用来表示以类似于Maarshalkerweerd#2专利(具体参考这里描述的流体处理区)中所述的方式有效地包围流体流的结构。Throughout the specification, reference is made to terms such as "enclosed area", "enclosed section" and "constrained". Basically, these terms are interchangeable and both are used to denote a structure that effectively encloses a fluid flow in a manner similar to that described in the Maarshalkerweerd #2 patent (with specific reference to the fluid treatment zone described therein).

而且,如本说明书通篇所用的,术语“流体”具有广泛的涵义且包括液体和气体。用于本发明的处理的优选流体是液体,优选为水(例如废水、工业污水、再利用水、饮用水、地下水等)。而且,术语“行”和“列”在本说明书中的使用与辐射源的布置有关,可理解这两个术语可互换使用。Also, as used throughout this specification, the term "fluid" has a broad meaning and includes both liquids and gases. Preferred fluids for the treatment of the present invention are liquids, preferably water (eg waste water, industrial effluent, reused water, drinking water, ground water, etc.). Also, the terms "row" and "column" are used in this specification in relation to the arrangement of radiation sources, it being understood that the two terms can be used interchangeably.

本领域技术人员可知本说明书中所述的使用密封等来提供流体处理系统内相邻元件之间的实际的流体密封。例如,本领域技术人员已知使用配合螺母、O形圈、衬套等的结合来提供辐射源组件外部(例如水)与包含辐射源(例如紫外辐射灯)的辐射源组件内部之间的大致液密的密封。Those skilled in the art will appreciate the use of seals and the like described in this specification to provide an actual fluid seal between adjacent components within a fluid treatment system. For example, it is known to those skilled in the art to use a combination of mating nuts, O-rings, bushings, etc. to provide approximate communication between the exterior of the radiation source assembly (e.g., water) and the interior of the radiation source assembly containing the radiation source (e.g., a UV lamp). Liquid-tight seal.

附图说明 Description of drawings

本发明的实施例将参考附图进行说明,其中相同的数字表示相同的部件,其中:Embodiments of the invention will be described with reference to the accompanying drawings, wherein like numerals indicate like parts, wherein:

图1为本发明流体处理系统的第一实施例的部分剖开的透视图;1 is a perspective view, partially cut away, of a first embodiment of a fluid treatment system of the present invention;

图2为本发明流体处理系统的第二实施例的部分剖开的透视图;Figure 2 is a perspective view, partially cut away, of a second embodiment of the fluid treatment system of the present invention;

图3为从图2所示的流体处理系统的入口看的端部视图;Figure 3 is an end view from the inlet of the fluid treatment system shown in Figure 2;

图4为图2所示的流体处理系统的顶视图(部分切开);Figure 4 is a top view (partially cut away) of the fluid handling system shown in Figure 2;

图5为图2所示的流体处理系统的侧视图;Figure 5 is a side view of the fluid handling system shown in Figure 2;

图6为本发明流体处理系统的第三实施例的辐射源组件的定向的示意侧视图;6 is a schematic side view of the orientation of the radiation source assembly of the third embodiment of the fluid treatment system of the present invention;

图7为本发明流体处理系统的第四实施例的辐射源组件的定向的示意侧视图;7 is a schematic side view of the orientation of the radiation source assembly of the fourth embodiment of the fluid treatment system of the present invention;

图8a为本发明流体处理系统的第五实施例的顶视图(部分剖开);Figure 8a is a top view (partially cut away) of a fifth embodiment of the fluid treatment system of the present invention;

图8b为本发明流体处理系统的第六实施例的顶视图(部分剖开);Figure 8b is a top view (partially cut away) of a sixth embodiment of the fluid treatment system of the present invention;

图9为结合了清洁装置的辐射源组件排列的顶视图,该清洁装置用于将淤塞物质从组件外部清除;Figure 9 is a top view of a radiation source assembly arrangement incorporating a cleaning device for removing fouling material from the outside of the assembly;

图10示出了随着流体流经过现有技术流体处理系统的辐射源组件而产生的涡流;Figure 10 illustrates vortices created as fluid flows through a radiation source assembly of a prior art fluid treatment system;

图11示出了随着流体流经过根据本发明的流体处理系统的辐射源组件而产生的涡流;Figure 11 illustrates vortices created as fluid flows through a radiation source assembly of a fluid treatment system according to the present invention;

图12-15参考以上的交错/平行定向的多个实施例的示意性端部视图(即穿过流体处理区看的视图);和Figures 12-15 are schematic end views (i.e. views looking through the fluid treatment zone) of various embodiments of the staggered/parallel orientation referred to above; and

图16为本发明流体处理系统的高优选实施例中的辐射源组件的定向的示意性侧视图。Figure 16 is a schematic side view of the orientation of the radiation source assembly in a highly preferred embodiment of the fluid treatment system of the present invention.

具体实施方式Detailed ways

参考图1,其中示出了流体处理系统10。流体处理系统10包括入口12和出口24。流体处理区20设置在入口12和出口24之间。Referring to Figure 1, a fluid treatment system 10 is shown. Fluid treatment system 10 includes inlet 12 and outlet 24 . Fluid treatment zone 20 is disposed between inlet 12 and outlet 24 .

流体处理区20通过入口过渡区14与入口12互连,该入口过渡区14包括第一过渡区16和中间过渡区18。出口24通过出口过渡区22与流体处理区20互连。Fluid treatment zone 20 is interconnected with inlet 12 by inlet transition zone 14 , which includes first transition zone 16 and intermediate transition zone 18 . Outlet 24 is interconnected with fluid treatment zone 20 through outlet transition zone 22 .

如图所示,流体按箭头A的方向经过流体处理系统10(包括流体处理区20)。As shown, fluid passes in the direction of arrow A through fluid treatment system 10 (including fluid treatment zone 20).

如图所示,入口12、入口过渡区14、流体处理区20、出口过渡区22和出口24均具有封闭截面。使用术语“封闭截面”是指将流体流在所有的侧面和/或表面限定的封闭体。As shown, inlet 12, inlet transition zone 14, fluid treatment zone 20, outlet transition zone 22, and outlet 24 all have closed cross-sections. The term "closed section" is used to mean a closed body that defines fluid flow on all sides and/or surfaces.

如图所示,入口12和出口24具有圆形截面,非常类似常规的管道设置。还如图所示,流体处理区20具有方形或矩形截面。当然也能将流体处理区20构造成具有其它的截面形状。As shown, the inlet 12 and outlet 24 have a circular cross-section, much like a conventional duct arrangement. As also shown, the fluid treatment zone 20 has a square or rectangular cross-section. Of course, the fluid treatment zone 20 can also be configured with other cross-sectional shapes.

设置在流体处理区20中的为辐射源组件的第一排列组26和辐射源组件的第二排列组28。排列组26和28内的每个辐射源组件为长条形的且具有倾斜于经过流体处理区20的流体流方向(见箭头A或箭头A的投影线虚线30)的纵向轴线。Disposed in the fluid treatment zone 20 is a first array 26 of radiation source assemblies and a second array 28 of radiation source assemblies. Each radiation source assembly within arrays 26 and 28 is elongated and has a longitudinal axis oblique to the direction of fluid flow through fluid treatment zone 20 (see arrow A or dashed line 30 projected from arrow A).

排列组26内的辐射源组件安装在流体处理区20的一侧上且具有由支撑元件32支撑的远端。类似地,排列组28内的每个辐射源组件具有安装在流体处理区20一侧上的一端和由支撑元件32支撑的远端。Radiation source assemblies within array 26 are mounted on one side of fluid treatment zone 20 and have distal ends supported by support elements 32 . Similarly, each radiation source assembly within array 28 has one end mounted on one side of fluid treatment zone 20 and a distal end supported by support member 32 .

结果,由排列组26和28形成的辐射源组件相对流体流的排列成V形构造的形式,“V”的顶点指向流体流。当然,“V”的顶点也能指向相反的方向。As a result, the arrangement of the radiation source assemblies formed by arrays 26 and 28 relative to fluid flow is in the form of a V-shaped configuration with the apex of the "V" pointing towards the fluid flow. Of course, the apex of the "V" could also point in the opposite direction.

而且,尽管排列组26和28内的每个辐射源组件的远端由单个的支撑元件32支撑,但其它的支撑元件对于本领域技术人员是显而易见的。Also, while the distal ends of each radiation source assembly within arrays 26 and 28 are supported by a single support member 32, other support members will be apparent to those skilled in the art.

如图所示,中间过渡区18用于为灯排列的顶点提供组(nesting)区域。这样,优选地使中间过渡区18的侧面逐渐减小到较小的尺寸,同时在所示实施例中,保持顶部和底部处于一致的尺寸(将在下文中进一步说明)。As shown, the intermediate transition region 18 is used to provide a nesting area for the apex of the lamp arrangement. In this way, the sides of the intermediate transition region 18 are preferably tapered to a smaller size while, in the embodiment shown, the top and bottom are kept at a consistent size (further described below).

第一过渡区16与中间过渡区18和入口12互连,并用作以下目的:(i)减少封闭体的尺寸,和(ii)将截面形状从多边形过渡到圆形。类似地,出口过渡区22用于减少封闭体的尺寸并且将该封闭体的截面形状从圆形过渡到多边形。The first transition zone 16 interconnects the intermediate transition zone 18 and the inlet 12 and serves the purpose of (i) reducing the size of the enclosure, and (ii) transitioning the cross-sectional shape from polygonal to circular. Similarly, the outlet transition zone 22 serves to reduce the size of the enclosure and transition the cross-sectional shape of the enclosure from circular to polygonal.

入口过渡区14和出口过渡区22也用于避免或减缓水头损失问题,如果封闭体尺寸的显著变化出现在系统中,则该问题会出现。The inlet transition zone 14 and outlet transition zone 22 also serve to avoid or mitigate head loss problems that can arise if significant changes in enclosure size occur in the system.

现在参考附图2-5说明该流体处理系统的第二实施例。在附图2-5中,元件标号的后两位与图1中的元件标号相同的表示类似的元件。A second embodiment of the fluid treatment system will now be described with reference to Figures 2-5. In the accompanying drawings 2-5, the last two digits of the component numbers are the same as those in Fig. 1 to represent similar components.

参考图2-5,其中示出了流体处理系统100。流体处理系统100包括入口112和出口124。流体处理系统100还包括流体处理区120。Referring to Figures 2-5, a fluid treatment system 100 is shown. Fluid treatment system 100 includes inlet 112 and outlet 124 . Fluid treatment system 100 also includes fluid treatment zone 120 .

入口112通过入口过渡区114与流体处理区120互连。流体出口124通过出口过渡区122与流体处理区120互连。入口过渡区114包括第一过渡区116和中间过渡区118。Inlet 112 is interconnected with fluid treatment zone 120 by inlet transition zone 114 . Fluid outlet 124 is interconnected with fluid treatment zone 120 through outlet transition zone 122 . The entry transition region 114 includes a first transition region 116 and an intermediate transition region 118 .

设置在流体处理区120中的为辐射源组件的第一排列组126和辐射源组件的第二排列组128。排列组126和128内的辐射源组件的方向相对于经过流体处理区120的流体流的方向类似于上述对于图1的说明。Disposed in the fluid treatment zone 120 is a first array 126 of radiation source assemblies and a second array 128 of radiation source assemblies. The orientation of radiation source assemblies within arrays 126 and 128 relative to the fluid flow through fluid treatment zone 120 is similar to that described above for FIG. 1 .

如图所示,排列组126和128内的每个辐射源组件的远端部分由支撑柱支撑,该支撑柱与(i)经过流体处理区120的流体流的方向,和(ii)每个辐射源组件的纵向轴线成横向设置。As shown, the distal portion of each radiation source assembly within arrays 126 and 128 is supported by a support column that is aligned with (i) the direction of fluid flow through fluid treatment zone 120, and (ii) each The longitudinal axis of the radiation source assembly is disposed transversely.

如图所示,特别是与图4相关,支撑柱134用于排列组126和128中的每一行辐射源组件。进一步如图4所示,辐射源排列的上游端包括从排列组126连接到支撑柱134的一行辐射源组件,即没有来自排列组128的由上游中央支撑来支撑的类似的一行辐射源组件。这样的设置在下游支撑柱134a处为反向设置。或者,每个中央支撑柱用作从每个排列组126和128的一行来支撑辐射源组件的远端部分。在一些情况下,支撑柱134也用作挡板,并近似用作防护物,在其之后布置有清洁装置(下述)。As shown, particularly in relation to FIG. 4 , support columns 134 are used to line each row of radiation source assemblies in groups 126 and 128 . As further shown in FIG. 4 , the upstream end of the radiation source array includes a row of radiation source assemblies from array group 126 connected to support columns 134 , ie without a similar row of radiation source assemblies from array group 128 supported by the upstream central support. Such an arrangement is reversed at the downstream support post 134a. Alternatively, each central support column acts as a row from each array 126 and 128 to support the distal portion of the radiation source assembly. In some cases, the support column 134 also serves as a baffle, and approximately as a shield, after which cleaning means (described below) are arranged.

具体参考图2和图5,可看到安装套管136铸连于或以其它方式紧固于流体处理区120的外表面。每个辐射源组件的近端区域被接纳在安装套管136中,且能以常规的方式实现流体型密封(未示出)。Referring specifically to FIGS. 2 and 5 , it can be seen that mounting sleeve 136 is cast or otherwise secured to the outer surface of fluid treatment zone 120 . The proximal region of each radiation source assembly is received within mounting sleeve 136 and is capable of achieving a fluid-type seal (not shown) in a conventional manner.

进一步如图2-5所示,入口112和出口124可适于分别具有合适的标准法兰元件113和125。这样促进了流体处理系统100在常规管道中的隔离。例如,能将法兰元件113和125构造成常规尺寸,例如12英寸至72英寸。As further shown in FIGS. 2-5, the inlet 112 and outlet 124 may be adapted to have suitable standard flange elements 113 and 125, respectively. This facilitates the isolation of fluid treatment system 100 in conventional piping. For example, flange members 113 and 125 can be configured in conventional sizes, such as 12 inches to 72 inches.

具体参考图3,将看到排列组126和128设置为辐射源组件排列,当通过入口112来看流体处理区120时,显示为完全填满流体处理区120的阻碍物。换句话说,没有流体能穿过流体处理区120而不被强制绕着通过排列组126和/或128中的辐射源组件的明显通路。这种情况下,观察者沿着流体流穿过流体处理区120的方向能看到每个辐射源组件的轴线。Referring specifically to FIG. 3 , it will be seen that arrays 126 and 128 are arranged as radiation source assembly arrays that, when viewed through inlet 112 , appear as obstructions that completely fill fluid treatment zone 120 . In other words, no fluid can pass through fluid treatment zone 120 without being forced around a significant path through radiation source assemblies in arrays 126 and/or 128 . In this case, the observer can see the axis of each radiation source assembly along the direction of fluid flow through fluid treatment zone 120 .

通过部分地交错排列组126和128中的辐射源组件的方向可产生这样的效果。例如,参考图5,能看到沿着流体处理区120纵向延伸,上游辐射源组件和下游辐射源组件以连续的方式部分重叠,例如见图5中的线150,该线示出了在每个排列组126和128中的辐射源组件的这样的逐渐交错。换句话说,下游辐射源组件通过相邻的上游辐射源组件部分的露出和部分的遮挡。这样,可看到上述的流体处理区120的截面区域部分(例如设置排列组126和128的部分)的完全阻碍不是通过排列组126和128中的两个连续列的辐射源组件的交错使得下游辐射源组件填在一对上游辐射源组件之间。而是,在本实施例中,三列或更多列这样的辐射源组件结合起定向以实现完全的阻碍。Such an effect may be produced by partially staggering the orientation of the radiation source assemblies in groups 126 and 128 . For example, referring to FIG. 5 , it can be seen that extending longitudinally along the fluid treatment zone 120, the upstream radiation source assembly and the downstream radiation source assembly partially overlap in a continuous manner, see, for example, line 150 in FIG. Such gradual interleaving of the radiation source assemblies in each permutation group 126 and 128. In other words, a downstream radiation source assembly is partially exposed and partially obscured by an adjacent upstream radiation source assembly. In this way, it can be seen that the above-mentioned complete obstruction of the cross-sectional area portion of the fluid treatment zone 120 (for example, the portion where the array groups 126 and 128 are located) is not caused by the staggering of radiation source assemblies in two consecutive columns in the array groups 126 and 128 so that downstream The radiation source assembly is filled between a pair of upstream radiation source assemblies. Rather, in this embodiment, three or more columns of such radiation source assemblies are combined to be oriented to achieve complete obstruction.

优选地,每个辐射源组件优选地包括设置在保护套管(例如由石英等的透辐射材料)内的长条形的辐射源(例如低压高输出紫外辐射灯的紫外辐射灯)。在某些情况下,可以(或优选)利用辐射源而不用保护套管(例如不用保护套管的光子射灯)。Preferably, each radiation source assembly preferably includes a strip-shaped radiation source (such as a low-voltage high-output ultraviolet radiation lamp, an ultraviolet radiation lamp) disposed in a protective sleeve (such as a radiation-transmitting material such as quartz). In some cases, it may be (or preferable) to utilize a radiation source without a protective sleeve (eg, a photon spotlight without a protective sleeve).

如具体参考图5可看到的,入口过渡区114的中间区域118具有与流体处理区120相同的横向。入口过渡区114的中间区域118的侧面如图4所示逐渐减小。这样的布置一方面允许逐渐减小的过渡而另一方面为辐射源排列的顶点留有足够的空间。As can be seen with particular reference to FIG. 5 , the intermediate region 118 of the inlet transition zone 114 has the same lateral direction as the fluid treatment zone 120 . The sides of the intermediate region 118 of the entry transition region 114 taper as shown in FIG. 4 . Such an arrangement on the one hand allows a tapered transition and on the other hand leaves enough space for the apex of the radiation source arrangement.

排列组126和128中的辐射源组件具有倾斜于经过流体处理区120的流体流(箭头A)方向的纵向轴线。结果,可在例如图4中清楚地看到排列组126和128中的辐射源组件的顶点形状的方向。排列组126和128中的辐射源组件的纵向轴线之间的夹角α优选地在从约15°至约170°的范围,更优选地在从约35°至120°的范围,更优选地在从约50°至约120°的范围,最优选地在约60°至约90°的范围。本领域技术人员可知,在具有固定长度的辐射源的情况下,该角度将决定反应器的横截面积。而且,尽管这里在图中没有具体示出,优选和期望地是在本发明的流体处理系统中结合清洁装置来从排列组126和128中的辐射源组件的外部移除污垢物质。Radiation source assemblies in arrays 126 and 128 have longitudinal axes that are oblique to the direction of fluid flow (arrow A) through fluid treatment zone 120 . As a result, the orientation of the apex shapes of the radiation source assemblies in permutations 126 and 128 can be clearly seen, for example, in FIG. 4 . The angle α between the longitudinal axes of the radiation source assemblies in arrays 126 and 128 is preferably in the range of from about 15° to about 170°, more preferably in the range of from about 35° to 120°, more preferably In the range of from about 50° to about 120°, most preferably in the range of about 60° to about 90°. Those skilled in the art know that in the case of a radiation source with a fixed length, this angle will determine the cross-sectional area of the reactor. Also, although not specifically shown in the figures here, it is preferred and desirable to incorporate a cleaning device in the fluid treatment system of the present invention to remove fouling material from the exterior of the radiation source assemblies in arrays 126 and 128 .

在本流体处理系统中结合清洁装置的例子在图9中示意性地示出。如图所示,能够结合作为套管的清洁装置,该套管在辐射源组件的外部以往复的方式形成。如图所示,清洁装置28以可移动套管的形式设置用于每个辐射源组件。在所示实施例中,“布置”清洁装置28使其位于支撑柱134的下游处。清洁装置28的特性没有特别的限制。见,例如美国专利6,342,188[Pearcey等人]和6,646,269[Traubenberg等人],两者均受让于本发明的受让人。An example of a cleaning device incorporated in the present fluid treatment system is shown schematically in FIG. 9 . As shown, the cleaning device can be incorporated as a sleeve formed in a reciprocating fashion on the exterior of the radiation source assembly. As shown, a cleaning device 28 is provided for each radiation source assembly in the form of a movable sleeve. In the illustrated embodiment, the cleaning device 28 is "arranged" so that it is located downstream of the support column 134 . The characteristics of the cleaning device 28 are not particularly limited. See, eg, US Patents 6,342,188 [Pearcey et al] and 6,646,269 [Traubenberg et al], both assigned to the assignee of the present invention.

参考图6,其中示意性地示出了辐射源组件布置的侧部正面图。通常,这样的布置与上述的V形构造相同。如图所示,6个辐射源组件的行B竖直地设置在流体处理区中。在行B中的每对辐射源组件之间具有预先确定的间隔C。Referring to Figure 6, there is shown schematically a side elevational view of a radiation source assembly arrangement. Generally, such an arrangement is the same as the V-shaped configuration described above. As shown, row B of 6 radiation source assemblies are arranged vertically in the fluid treatment zone. There is a predetermined spacing C between each pair of radiation source assemblies in row B.

如图所示,行B的辐射源组件下游以这样的方式设置,使得辐射源组件的两个以上的随后的下游竖直行需要部分阻碍预先确定的间隔C。换句话说,如果沿箭头D看辐射源组件排列,则穿过预先确定的间隔C的流体流将由于行B下游的至少两行辐射源组件的布置而被阻碍。本领域技术人员可知,利用相对足够大量的行B,每行的交错的辐射源组件能完全阻碍穿过该交错排列的直线视线,而如果是较少的辐射源组件,则视线将不会被完全阻碍。As shown, the radiation source assemblies downstream of row B are arranged in such a manner that two or more subsequent downstream vertical rows of radiation source assemblies need to partially obstruct the predetermined spacing C. In other words, if the arrangement of radiation source assemblies is viewed along arrow D, fluid flow through the predetermined interval C will be impeded due to the arrangement of at least two rows of radiation source assemblies downstream of row B. Those skilled in the art know that, with a relatively large number of rows B, the staggered radiation source elements of each row can completely block the line of sight through the staggered arrangement, and if there are fewer radiation source elements, the line of sight will not be blocked. Totally obstructed.

如图所示,辐射源组件排列包括在交错排列的外边缘处的同一平面内设置的四分之一的边界灯,在本实施例中,边界灯设置在流体处理区的外边缘处的同一平面内。如进一步所示的,辐射源组件排列设置为限定由包含四个辐射源组件的平行四边形组成的重复图案。As shown, the radiation source assembly arrangement includes a quarter of boundary lights arranged in the same plane at the outer edge of the staggered arrangement, in this embodiment, the boundary lights are arranged in the same plane at the outer edge of the fluid treatment zone. in plane. As further shown, the radiation source assemblies are arranged to define a repeating pattern consisting of parallelograms containing four radiation source assemblies.

图7示出了类似于图6的示意图,除了辐射源组件的交错不同于图6中所示。具体地,可看到上述的参考图6的平行四边形重复图案没有在图7所示的布置中出现。另外,图7没有示出辐射源组件的边界灯的使用及随后行的交错,使得当从流体处理区的一端看辐射源组件排列时,第一行中的辐射源组件对之间的间隙可通过两个以上的随后的行有效地填满。FIG. 7 shows a schematic diagram similar to FIG. 6 except that the staggering of radiation source components is different than that shown in FIG. 6 . In particular, it can be seen that the repeating pattern of parallelograms described above with reference to FIG. 6 does not occur in the arrangement shown in FIG. 7 . Additionally, Figure 7 does not show the use of boundary lights for radiation source assemblies and the staggering of subsequent rows such that the gap between pairs of radiation source assemblies in the first row can be seen when the radiation source assembly arrangement is viewed from one end of the fluid treatment zone Efficiently filled by more than two subsequent rows.

图8a为类似于图4所示的示意图,不同之处在于在流体处理区中使用了两组排列120a和120b。如图所示,排列120a和120b的每个均为类似于上述图1-4中所示的V形构造。Figure 8a is a schematic diagram similar to that shown in Figure 4, except that two sets of arrangements 120a and 120b are used in the fluid treatment zone. As shown, each of arrays 120a and 120b is a V-shaped configuration similar to that shown in FIGS. 1-4 above.

图8b为类似于图4所示的示意图,不同之处在于在流体处理区中使用了四组排列、120b、120c和120d。如图所示,排列120a、120b、120c和120d的每个均为类似于上述图1-4中所示的V形构造。优选地,每个120a、120b、120c和120d为参考图16如下所述进行设置。在图8b中,优选地是相邻的120a、120b、120c和120d之间的间隔与排列中的一行灯的相邻每对灯之间的间隔相等(例如图16中的尺寸X)。Figure 8b is a schematic diagram similar to that shown in Figure 4, except that four arrangements, 120b, 120c and 120d, are used in the fluid treatment zone. As shown, each of arrays 120a, 120b, 120c, and 120d is a V-shaped configuration similar to that shown in FIGS. 1-4 above. Preferably, each of 120a, 120b, 120c and 120d is arranged as described below with reference to FIG. 16 . In Fig. 8b, it is preferable that the spacing between adjacent ones 120a, 120b, 120c and 120d is equal to the spacing between each adjacent pair of lamps in a row of lamps in the arrangement (eg dimension X in Fig. 16).

参考图10,该图示意性地显示了辐射源组件E设置成使其纵向轴线正交于箭头A所示的流体流的方向,这样的定向在现有技术中已知。如本领域技术人员所知的,辐射源组件E这样的定向形成了流向由箭头A所示的流体流方向的圆形截面。因此在辐射源组件E的下游生成了随机和广角度的漩涡。结果会引起辐射源组件E和/或辐射源组件E附近的其它辐射源组件的受迫振动,能导致组件的破坏。Referring to Figure 10, there is schematically shown a radiation source assembly E arranged with its longitudinal axis normal to the direction of fluid flow indicated by arrow A, such orientations are known in the art. Such orientation of the radiation source assembly E forms a circular cross-section in the direction of fluid flow indicated by arrow A, as known to those skilled in the art. Downstream of the radiation source assembly E, random and wide-angle vortices are thus generated. The result is forced vibrations of the radiation source assembly E and/or other radiation source assemblies in the vicinity of the radiation source assembly E, which can lead to destruction of the assembly.

参考图11,该图示意性地显示了以参考图1-4的上述方式来定向的辐射源组件F。在该定向中,辐射源组件F形成了流向由箭头A表示的流体流方向的卵形或椭圆形截面。因此辐射源组件F下游的漩涡更为规则且不太会产生能导致辐射源组件破坏的受迫振动的缺陷。Referring to Fig. 11, there is schematically shown a radiation source assembly F oriented in the manner described above with reference to Figs. 1-4. In this orientation, the radiation source assembly F forms an oval or elliptical cross-section in the direction of fluid flow indicated by arrow A. As shown in FIG. The vortex downstream of the radiation source assembly F is thus more regular and less prone to defects of forced vibrations that could lead to destruction of the radiation source assembly.

参考图12-15,示出了参考上述的交错/平行定向的多个实施例的端部示意图(例如穿过流体处理区看的视图)。在图12-15中,描述辐射源组件构成的“排列组”时使用“第一”、“第二”、“第三”作为参考。这些术语为了表示从流体处理区上游部分到下游部分的方向上的一系列给定“排列组”的位置。Referring to Figures 12-15, there are shown end schematic views (eg, views through the fluid treatment zone) of various embodiments with reference to the staggered/parallel orientation described above. In Figs. 12-15, "first", "second", and "third" are used as references when describing the "arrangement group" composed of radiation source components. These terms are intended to denote a series of positions for a given "array" in a direction from an upstream portion to a downstream portion of a fluid treatment zone.

因此,参考图12,会看到“第一排列组”中辐射源组件行有两种交错:(i)相关辐射源组件的下游(或上游)“第二排列组”的交错,和(ii)在“第一排列组”中的辐射源的相邻行之间的交错。图12中所示的辐射源组件的布置特别适于应用于诸如Maarshalkerweerd#2专利中所述的流体处理系统。Therefore, referring to FIG. 12 , it will be seen that there are two kinds of interleaving of rows of radiation source assemblies in the "first permutation group": (i) the interleaving of the downstream (or upstream) "second permutation group" of the relevant radiation source assemblies, and (ii) ) the interleaving between adjacent rows of radiation sources in the "first permutation group". The arrangement of the radiation source assembly shown in Fig. 12 is particularly suitable for use in a fluid treatment system such as that described in the Maarshalkerweerd #2 patent.

参考图13,该图示出了根据参考上述的交错/平行定向的辐射源组件的另一示意性的布置。图13中所示的辐射源组件的布置特别适于应用于诸如Maarshalkerweerd#1专利中所述的开放通道流体处理系统。如图所示,该辐射源组件的布置包括第一排列组、第二排列组和第三排列组。从端部视图中可看到第一排列组、第二排列组和第三排列组中的辐射源组件的相邻的三行,第一排列组和第三排列组中的每个为:(i)相关第二排列组交错,和(ii)相互间不交错。辐射的最终定向特征可为:(i)穿过相同排列组的相邻行内的辐射源组件的轴线形成等边三角形,和(ii)穿过第一排列组、第二排列组和第三排列组中相邻三行内的辐射源组件的轴线形成等边三角形。Referring to FIG. 13 , there is shown another schematic arrangement of radiation source assemblies according to the staggered/parallel orientation described above with reference. The arrangement of the radiation source assembly shown in Figure 13 is particularly suitable for use in open channel fluid treatment systems such as those described in the Maarshalkerweerd #1 patent. As shown, the arrangement of radiation source assemblies includes a first array, a second array, and a third array. Three adjacent rows of radiation source assemblies in the first, second and third permutations can be seen from the end view, each of the first and third permutations being:( i) the associated second permutation groups are interleaved, and (ii) are not interleaved with each other. The final directional feature of the radiation may be: (i) forming an equilateral triangle through the axes of the radiation source assemblies in adjacent rows of the same permutation group, and (ii) passing through the first permutation group, the second permutation group and the third permutation group The axes of the radiation source assemblies within three adjacent rows in a group form an equilateral triangle.

参考图14和15,其中示出了类似于上述参考图13的辐射源组件布置的示意性视图。在图13中,从左手侧的反应器壁起,行的位置为:先是第一排列组,接着是第二排列组,再接着是第三排列组。在图14中,从左手侧的反应器壁起,行的位置为:先是第二排列组,接着是第三排列组,再接着是第一排列组。在图15中,从左手侧的反应器壁起,行的位置为:先是第二排列组,接着是第一排列组,再接着是第三排列组。Referring to Figures 14 and 15, there are shown schematic views of a radiation source assembly arrangement similar to that described above with reference to Figure 13 . In Figure 13, from the reactor wall on the left hand side, the row positions are: first the first permutation group, then the second permutation group, then the third permutation group. In Figure 14, from the reactor wall on the left-hand side, the row positions are: first the second permutation group, then the third permutation group, then the first permutation group. In Figure 15, from the reactor wall on the left hand side, the row positions are: first the second permutation group, then the first permutation group, then the third permutation group.

参考图16,其中示出了用于本流体处理系统的辐射源组件的非常优选的布置。因此在图16中,以流体处理系统的侧面正视图显示了辐射源组件的示意性布置(即为了清楚显示,图中忽略了辐射源组件的具体细节支撑,电连接和密封)。图16中的每个椭圆表示流体处理系统的壁内的开口,辐射源组件的端部会穿过该开口放射。优选的是以诸如上述并参考图1-4,8a和8b中的任一幅的方式来布置该辐射源组件。Referring to Figure 16, there is shown a highly preferred arrangement for a radiation source assembly for use in the present fluid treatment system. Therefore, in Fig. 16, the schematic arrangement of the radiation source assembly is shown in a side elevational view of the fluid treatment system (ie, for clarity, the specific details of the radiation source assembly support, electrical connection and sealing are omitted). Each oval in FIG. 16 represents an opening in the wall of the fluid treatment system through which the end of the radiation source assembly radiates. The radiation source assembly is preferably arranged in a manner such as described above with reference to any of Figures 1-4, 8a and 8b.

继续参考图16,其中示出了优选实施例中的流体处理系统200,其包括具有反应器顶板205和反应器底板240的封闭(或闭合)的流体处理区。设置在顶板205和底板240之间的为辐射源组件的四个模块A、B、C和D。模块A、B、C和D大致相同。本领域技术人员可知,尽管图16中示出了四个模块,也能够根据被处理的流体体积,被处理的流体质量以及在本领域技术人员已知范围内的其它因素,使用少于或多于四个模块。Continuing with reference to FIG. 16 , there is shown a preferred embodiment fluid treatment system 200 comprising an enclosed (or closed) fluid treatment zone having a reactor top 205 and a reactor bottom 240 . Disposed between the top plate 205 and the bottom plate 240 are four modules A, B, C and D of radiation source assemblies. Modules A, B, C and D are roughly the same. Those skilled in the art will recognize that although four modules are shown in FIG. in four modules.

模块A、B、C和D中的每个均包括行210、215、220和225。如图所示,行215和220均包括一系列的辐射源组件,每行中的辐射源组件的每个相邻对以大致均一的方式间隔开。具体地,行215中的辐射源组件的所有相邻对之间的距离为X,行210中的辐射源组件的所有相邻对之间的距离也为X。Each of modules A, B, C and D includes rows 210 , 215 , 220 and 225 . As shown, rows 215 and 220 each include a series of radiation source assemblies, with each adjacent pair of radiation source assemblies in each row being spaced in a generally uniform manner. Specifically, the distance between all adjacent pairs of radiation source assemblies in row 215 is X, and the distance between all adjacent pairs of radiation source assemblies in row 210 is also X.

参考行210和225,将看到大部分的相邻的一对辐射源组件具有相等的间隔,在一优选实施例中,如相关行215和220所示的,该间隔为X。但是,行210和225也包含一对间隔为Y的辐射源组件,该间隔Y小于在行210和225中其它地方使用的间隔X。Referring to rows 210 and 225 , it will be seen that most adjacent pairs of radiation source assemblies have an equal spacing, which in a preferred embodiment is X as shown in the associated row 215 and 220 . However, rows 210 and 225 also contain a pair of radiation source assemblies that are spaced Y apart from the spacing X used elsewhere in rows 210 and 225 .

如参考模块A看到的,包括来自每行210、215、220、225的单个辐射源组件的四个辐射源组件设置为限定了平行四边形重复单元E。平行四边形单元E包括了模块A中除了一对边界辐射源组件230之外的所有辐射源组件。本领域技术人员可知,根据诸如被处理的流体体积等因素,能够使用平行四边形重复图案E来按比例增加或减小模块A(模块B、C和D中的一个或多个)。As seen with reference to block A, four radiation source assemblies comprising a single radiation source assembly from each row 210 , 215 , 220 , 225 are arranged to define a parallelogram repeating unit E . Parallelogram unit E includes all radiation source assemblies in module A except a pair of boundary radiation source assemblies 230 . Those skilled in the art will appreciate that module A (one or more of modules B, C, and D) can be scaled up or down using the parallelogram repeating pattern E, depending on factors such as the volume of fluid being processed.

模块A的另一特征是显示在平行四边形重复单元E中的辐射源组件的所谓交错顺序。如图所示,对于给定的平行四边形图案E,从反应器顶板205前进至反应器底板240,次序为先后到达辐射源组件210、220、215和225的行的顺序。换句话说,对于给定的平行四边形重复单元E,从流体处理区上游部分前进到流体处理区下游部分的行的顺序(即210、215、220、225)不同于从反应器顶板205前进至反应器底板240的顺序(即210、220、215、225)。这样就产生了平行四边形重复单元E,优点是具有高效率处理穿过流体处理系统200的流体的能力。Another feature of module A is the so-called staggered sequence of radiation source components shown in parallelogram repeating unit E. As shown, for a given parallelogram pattern E, proceeding from reactor top plate 205 to reactor floor 240 is the order of rows that arrive at radiation source assemblies 210 , 220 , 215 , and 225 . In other words, for a given parallelogram repeating unit E, the order of the rows proceeding from the upstream portion of the fluid treatment zone to the downstream portion of the fluid treatment zone (i.e. 210, 215, 220, 225) is different than the sequence of rows proceeding from the reactor ceiling 205 to the The sequence of the reactor floor 240 (ie 210, 220, 215, 225). This creates a parallelogram repeating unit E, which has the advantage of having the ability to efficiently process fluid passing through the fluid handling system 200 .

具体地,该所谓的交错顺序允许用来操作流体处理系统的功率(power)的可测量性和可调节性。这是指,使用诸如平行四边形重复图案E的交错顺序,在例如流体穿透度(transmittance)、类型和/或特定污染物的浓度等的因素的情况下,能够在给定模块(例如模块A、B、C和D中的一个、多个或全部)内的某些行的辐射源组件中降低功率消耗或甚至是切断功率。例如,能以完全的功率在行210和215中操作辐射源组件,而降低或关闭供给到行220和225中辐射源组件的功率。这样可有利地调节流体处理系统的整个功率消耗(功率消耗通常为与流体处理系统相关的单次最大的操作费用)。In particular, this so-called staggered sequence allows scalability and adjustability of the power used to operate the fluid treatment system. This means that using a staggered sequence such as a repeating pattern E of parallelograms, it is possible to achieve the desired results in a given module (e.g. module A, depending on factors such as fluid transmittance, type, and/or concentration of a particular contaminant, etc.) , one, more, or all of B, C, and D) to reduce power consumption or even cut power in certain rows of radiation source assemblies. For example, the radiation source assemblies in rows 210 and 215 can be operated at full power, while the power supplied to the radiation source assemblies in rows 220 and 225 is reduced or turned off. This advantageously accommodates the overall power consumption of the fluid treatment system (power consumption is typically the single largest operating expense associated with a fluid treatment system).

如果从流体处理区的上游部分前进到流体处理区的下游部分的行的顺序(即210、220、215、225)与从反应器顶板205前进到反应器底板240的行的顺序(即210、215、220、225)相同,将难以实现这样的微调。在这种情况下,为了改变功率消耗,将需要关闭流体处理区内的整个模块,导致相对不均匀的流体处理。If the sequence of rows proceeding from the upstream portion of the fluid treatment zone to the downstream portion of the fluid treatment zone (i.e. 210, 220, 215, 225) is the same as the sequence of rows proceeding from the reactor top plate 205 to the reactor floor 240 (i.e. 210, 215, 220, 225), it will be difficult to achieve such fine-tuning. In this case, in order to vary the power consumption, it would be necessary to shut down the entire module in the fluid treatment area, resulting in relatively uneven fluid treatment.

进一步参考图16,可看到行210和215之间的间隔V与行220和225之间的间隔相同。还可看到行215和220之间的间隔Z大于间隔V。在某些情况下,会期望间隔V和间隔Z大致相同。Referring further to FIG. 16 , it can be seen that the spacing V between rows 210 and 215 is the same as the spacing between rows 220 and 225 . It can also be seen that the spacing Z between rows 215 and 220 is greater than the spacing V. FIG. In some cases, it may be desirable for spacing V and spacing Z to be approximately the same.

而且,在相邻的模块A、B、C和D之间具有间隔T。可看到间隔T大于间隔V。在某些情况下,会期望间隔V和间隔T大致相同。Also, there is an interval T between adjacent modules A, B, C and D. It can be seen that the interval T is greater than the interval V. In some cases, it may be desirable for interval V and interval T to be approximately the same.

而且,在某些情况下,会期望间隔V、间隔Z和间隔T大致相同。Also, in some cases it may be desirable for spacing V, spacing Z, and spacing T to be approximately the same.

尽管参考实施例和实例对本发明进行了说明,但该说明书并不能理解为是限定性质的。因此,所述实施例的各种改变以及本发明的其它实施例,在参考本说明书的情况下,对于本领域技术人员是显而易见的。例如,尽管参考附图的上述实施例涉及一种包括具有封闭截面的流体处理区的流体处理系统,在某些情况下,能够优选地利用具有开放或其它非封闭截面(例如上述Maarschalkerweerd#1专利中所述的开放通道系统)的流体处理区来实现本发明的流体处理系统。而且,在某些情况下,能够优选地利用具有半封闭截面(例如上述Maarschalkerweerd#2专利中所述)的流体处理区来实现本发明的流体处理系统。而且,在某些情况下,能够优选地利用使用所谓的“混合”辐射源模块的流体处理区(例如美国专利申请公开号2002/113021[Traubenberg等人]或国际公开号WO 04/000,735[Traubenberg等人]中所述)来实现本发明的流体处理系统。如上所述,能够结合机械或化学/机械清洁系统来从辐射源组件的外部移除淤塞材料,如Trojan技术公司的多个公开专利申请和受理专利中所述。而且,由各种材料制成的各种常规密封系统可用在本流体处理系统中。密封材料的选择及其获得足够密封的放置位置没有特别地限制。而且,能够修改所述实施例来使用堰、堤和门用于上游、下游或上游下游两者,从而优化本发明的流体处理系统限定的流体处理区的流体流上游和下游。而且,能修改所述实施例来包括倾斜和/或阶梯式通道表面,例如在国际公开号WO 01/66469[Brunet等人]中公开的。而且,能修改所述实施例来包括在流体处理系统和/或辐射源模块的通道壁上的混合物或混合元件,例如在美国专利5,846,437[Whitby等人],6,015,229[Cormack等人],6,126,841[Whitby等人],6,224,759[Whitby等人]和6,420,716[Cormack等人],以及国际公开号WO 01/93995[Brunet等人]中的一个或多个中所述的。这样的混合物或混合元件(有时在本领域中也称为“阻隔物(baffle)”能用于补充或代替上述所谓的边界灯或边界辐射源组件的使用。而且,能够修改所述实施例来提供水力系列(hydraulic series)中的辐射源组件的多个排列组。而且,能修改所述实施例来利用包括设置在保护套管内的多个辐射源的辐射源组件(例如有时在本领域中称为“灯束”)。而且,能修改图1和2中的所述实施例,使得排列组126和128连续设置而不是以并排的关系设置(当然流体处理系统的其它元件的尺寸将因此需要改变)。因此,期望所附权利要求将覆盖任何的这些修改或实施例。While the invention has been described with reference to the examples and examples, this description is not to be construed as limiting. Accordingly, various modifications of the described embodiments, as well as other embodiments of the invention, will be apparent to persons skilled in the art upon reference to the description. For example, although the above-described embodiments with reference to the accompanying drawings relate to a fluid treatment system comprising a fluid treatment zone having a closed cross-section, in some cases it can be advantageous to utilize The fluid treatment zone of the open channel system described in ) to realize the fluid treatment system of the present invention. Furthermore, in some cases it can be advantageous to utilize a fluid treatment zone having a semi-closed cross-section such as that described in the aforementioned Maarschalkerweerd #2 patent to implement the fluid treatment system of the present invention. Also, in some cases it can be advantageous to utilize fluid treatment zones using so-called "hybrid" radiation source modules (e.g. U.S. Patent Application Publication No. 2002/113021 [Traubenberg et al.] or International Publication No. WO 04/000,735 [Traubenberg et al.]) to implement the fluid treatment system of the present invention. As noted above, mechanical or chemical/mechanical cleaning systems can be incorporated to remove fouling material from the exterior of the radiation source assembly, as described in various published patent applications and pending patents by Trojan Technology Corporation. Also, a variety of conventional sealing systems made of various materials can be used in the present fluid handling system. The choice of sealing material and its placement to obtain an adequate seal are not particularly limited. Furthermore, the described embodiments can be modified to optimize fluid flow upstream and downstream of the fluid treatment zone defined by the fluid treatment system of the present invention using weirs, dikes and gates for upstream, downstream, or both. Also, the described embodiments can be modified to include sloped and/or stepped channel surfaces, such as disclosed in International Publication No. WO 01/66469 [Brunet et al.]. Furthermore, the described embodiments can be modified to include mixing or mixing elements on the channel walls of the fluid handling system and/or radiation source modules, for example in US Pat. Whitby et al], 6,224,759 [Whitby et al] and 6,420,716 [Cormack et al], and one or more of International Publication No. WO 01/93995 [Brunet et al]. Such mixtures or mixing elements (sometimes also referred to in the art as "baffles") can be used in addition to or in place of the use of the so-called boundary light or boundary radiation source assemblies described above. Furthermore, the described embodiments can be modified to Multiple permutations of radiation source assemblies in a hydraulic series are provided. Moreover, the embodiments can be modified to utilize radiation source assemblies that include multiple radiation sources disposed within a protective sleeve (such as is sometimes found in the art referred to as a "bundle of light"). Moreover, the described embodiment in FIGS. 1 and 2 can be modified so that arrays 126 and 128 are arranged in series rather than in a side-by-side relationship (of course the dimensions of the other elements of the fluid handling system will vary accordingly required changes). Accordingly, it is intended that any such modifications or embodiments will be covered by the appended claims.

本文中参考的所有公开出版物、专利和专利申请均以完整的范围结合在这里作为参考,该范围与每个单独的公开出版物、专利和专利申请特定和单独的结合于本文作为参考的整个范围相同。All publications, patents, and patent applications referenced herein are hereby incorporated by reference in their entirety to the extent that each individual publication, patent, and patent application is specifically and individually indicated to be incorporated herein by reference in its entirety. Same range.

Claims (329)

1. fluid handling system comprises:
Inlet;
Outlet;
Be arranged on the fluid treatment zone between this entrance and exit, this fluid treatment zone has and is arranged on wherein: (i) have first longitudinal axis strip first radiation source assembly and (ii) have second radiation source assembly of the strip of second longitudinal axis;
Wherein said first longitudinal axis is not parallel each other with second longitudinal axis and to pass the direction of fluid treatment zone not parallel with fluid stream.
2. fluid handling system as claimed in claim 1, wherein this fluid handling system comprises the shell with closed cross-section or open cross-sections.
3. fluid handling system as claimed in claim 2, the closed cross-section of wherein said shell comprises polygon.
4. fluid handling system as claimed in claim 2, the closed cross-section of wherein said shell comprises linear.
5. fluid handling system as claimed in claim 2, the closed cross-section of wherein said shell comprises square.
6. fluid handling system as claimed in claim 2, the closed cross-section of wherein said shell comprises rectangle.
7. fluid handling system as claimed in claim 1, wherein said first radiation source assembly comprises first radiation source.
8. fluid handling system as claimed in claim 7, wherein said first radiation source is arranged in first protective casing.
9. fluid handling system as claimed in claim 8, wherein said first protective casing comprises blind end and open end.
10. fluid handling system as claimed in claim 1, wherein said second radiation source assembly comprises second radiation source.
11. fluid handling system as claimed in claim 10, wherein said second radiation source is arranged in second protective casing.
12. fluid handling system as claimed in claim 11, wherein said second protective casing comprises blind end and open end.
13. fluid handling system as claimed in claim 1, wherein said first radiation source assembly comprises first radiation source, and second radiation source assembly comprises second radiation source.
14. fluid handling system as claimed in claim 13, wherein said first radiation source is arranged in first protective casing, and described second radiation source is arranged in second protective casing.
15. fluid handling system as claimed in claim 14, wherein said first protective casing and second protective casing include blind end and open end.
16. fluid handling system as claimed in claim 2, wherein said shell comprises first erecting device, is used for liquid between the first wall of the proximal part of described first radiation source assembly and described shell and connects airtight and close.
17. fluid handling system as claimed in claim 2, wherein said shell comprises second erecting device, is used for liquid between second wall of the proximal part of described second radiation source assembly and described shell and connects airtight and close.
18. fluid handling system as claimed in claim 2, wherein said shell comprises: the liquid that (i) is used between the first wall of the proximal part of described first radiation source assembly and described shell connects airtight first erecting device that closes, and the liquid that (ii) is used between second wall of the proximal part of described second radiation source assembly and described shell connects airtight second erecting device that closes.
19. fluid handling system as claimed in claim 16, wherein said first erecting device comprise from the outer surface of described shell outstanding sleeve pipe or radiation source.
20. fluid handling system as claimed in claim 17, wherein said second erecting device comprise from the outstanding sleeve pipe of the outer surface of described shell.
21. fluid handling system as claimed in claim 18, wherein said first erecting device and second erecting device include from the outer surface of described shell outstanding sleeve pipe or radiation source.
22. as each described fluid handling system among the claim 1-21, wherein said first radiation source assembly and second radiation source assembly are oriented between described first longitudinal axis and second longitudinal axis and form acute angle.
23. as each described fluid handling system among the claim 1-21, it is 15 ° to 170 ° that wherein said first radiation source assembly and second radiation source assembly are oriented in the angular range that limits between described first longitudinal axis and second longitudinal axis.
24. as each described fluid handling system among the claim 1-21, it is 35 ° to 120 ° that wherein said first radiation source assembly and second radiation source assembly are oriented in the angular range that limits between described first longitudinal axis and second longitudinal axis.
25. as each described fluid handling system among the claim 1-21, it is 60 ° to 90 ° that wherein said first radiation source assembly and second radiation source assembly are oriented in the angular range that limits between described first longitudinal axis and second longitudinal axis.
26., wherein also comprise the support component of the distal portions that is used to support described first radiation source assembly as each described fluid handling system among the claim 1-25.
27., wherein also comprise the support component of the distal portions that is used to support described second radiation source assembly as each described fluid handling system among the claim 1-25.
28., wherein also comprise the support component of the distal portions of the distal portions that is used to support described first radiation source assembly and described second radiation source assembly as each described fluid handling system among the claim 1-25.
29. fluid handling system as claimed in claim 26, wherein said support component supports each radiation source assembly.
30. fluid handling system as claimed in claim 26, wherein said support component comprises the plate that supports each radiation source assembly.
31. fluid handling system as claimed in claim 26, the part of all radiation source assemblies in the wherein said support component support fluid processing system.
32. fluid handling system as claimed in claim 26, wherein said support component comprises the post that passes the direction of fluid treatment zone perpendicular to fluid stream.
33. as each described fluid handling system among the claim 1-21, wherein said first radiation source assembly and second radiation source assembly are coplanar.
34. as each described fluid handling system among the claim 1-21, wherein said first radiation source assembly and second radiation source assembly are nonplanar.
35. as each described fluid handling system among the claim 1-21, wherein said first radiation source assembly and second radiation source assembly are orientated and make described first longitudinal axis and second longitudinal axis assemble towards inlet.
36. as each described fluid handling system among the claim 1-21, wherein said first radiation source assembly and second radiation source assembly are orientated and make described first longitudinal axis and second longitudinal axis assemble at the inlet downstream part towards inlet.
37. as each described fluid handling system among the claim 1-21, wherein said first radiation source assembly and second radiation source assembly are orientated and make described first longitudinal axis and second longitudinal axis assemble towards outlet.
38. as each described fluid handling system among the claim 1-21, wherein said first radiation source assembly and second radiation source assembly are orientated and make described first longitudinal axis and second longitudinal axis assemble at the outlet upstream end towards outlet.
39. fluid handling system as claimed in claim 2, wherein said fluid treatment zone has the radiation source assembly that is arranged on wherein and arranges, this radiation source assembly is arranged and is set to: (i) the first order group of first radiation source assembly formation and (ii) the second order group of second radiation source assembly formation.
40. fluid handling system as claimed in claim 39, wherein said first order group comprise a plurality of first radiation source assemblies that are provided with along the length polyphone of described shell.
41. fluid handling system as claimed in claim 39, wherein said first order group are included in perpendicular to fluid stream and pass a plurality of first radiation source assemblies of contacting and being provided with on the direction of described fluid treatment zone.
42. fluid handling system as claimed in claim 39, wherein said second order group comprise a plurality of second radiation source assemblies that are provided with along the length polyphone of described shell.
43. fluid handling system as claimed in claim 39, wherein said second order group are included in perpendicular to fluid stream and pass a plurality of second radiation source assemblies of contacting and being provided with on the direction of described fluid treatment zone.
44. fluid handling system as claimed in claim 39, wherein said first order group comprises: (i) a plurality of first radiation source assemblies of contacting a plurality of first radiation source assemblies of setting and (ii) contacting and be provided with on the direction of passing fluid treatment zone perpendicular to fluid stream along the length of described shell.
45. fluid handling system as claimed in claim 39, wherein said second order group comprises: (i) a plurality of second radiation source assemblies of contacting a plurality of second radiation source assemblies of setting and (ii) contacting and be provided with on the direction of passing fluid treatment zone perpendicular to fluid stream along the length of described shell.
46. as each described fluid handling system among the claim 1-21, being provided with radiation source assembly in the wherein said fluid treatment zone arranges, this radiation source assembly is arranged and is set to first order group that (i) first radiation source assembly constitutes and the (ii) second order group that constitutes of second radiation source assembly; Wherein this first order group and second order group are along being parallel to first plane that direction that fluid stream passes fluid treatment zone is provided with each other in mirror image.
47. as each described fluid handling system among the claim 1-21, being provided with radiation source assembly in the wherein said fluid treatment zone arranges, this radiation source assembly is arranged and is set to first order group that (i) first radiation source assembly constitutes and the (ii) second order group that constitutes of second radiation source assembly; Wherein the phase adjacency pair of the radiation source assembly in first order group and the second order group becomes the plane relation setting in perpendicular to first planar second plane.
48. as each described fluid handling system among the claim 1-21, being provided with radiation source assembly in the wherein said fluid treatment zone arranges, this radiation source assembly is arranged and is set to first order group that (i) first radiation source assembly constitutes and the (ii) second order group that constitutes of second radiation source assembly; Wherein the first order group becomes the on-plane surface relation to be provided with in perpendicular to first planar second plane with the second order group.
49. as each described fluid handling system among the claim 1-21, wherein also comprise first transition region that is arranged between described inlet and the described fluid treatment zone, this first transition region has the size of variation on the direction of passing fluid treatment zone perpendicular to fluid stream.
50. as each described fluid handling system among the claim 1-21, wherein also comprise second transition region that is arranged between described fluid treatment zone and the described outlet, this second transition region has the size of variation on the direction of passing fluid treatment zone perpendicular to fluid stream.
51. as each described fluid handling system among the claim 1-21, wherein also comprise: (i) be arranged on first transition region between described inlet and the described fluid treatment zone, this first transition region has the size of variation on the direction of passing fluid treatment zone perpendicular to fluid stream, (ii) be arranged on second transition region between described fluid treatment zone and the described outlet, this second transition region has the size of variation on the direction of passing fluid treatment zone perpendicular to fluid stream.
52. fluid handling system as claimed in claim 51, the size of wherein said variation is increasing on the direction of described fluid treatment zone.
53. the fluid handling system described in claim 51, at least one in wherein said first transition region and second transition region has closed cross-section, and this cross section has the increased cross-section area on the direction of described fluid treatment zone.
54. the fluid handling system described in claim 51, at least one in wherein said first transition region and second transition region has closed cross-section, and this cross section has the increased cross-section area on the direction of described fluid treatment zone.
55. the fluid handling system described in claim 51, wherein said first transition region and second transition region all have closed cross-section, and this cross section has the increased cross-section area on the direction of described fluid treatment zone.
56. as each described fluid handling system in claim 51 or 55, in wherein said first transition region and second transition region at least one comprises the intermediate transition zone that is set up in parallel with described fluid treatment zone, this intermediate transition zone has the size of variation on the first direction of the direction of passing this fluid treatment zone perpendicular to fluid stream, and has constant size on the second direction perpendicular to this first direction.
57. as each described fluid handling system among the claim 1-21, at least one in first radiation source assembly of wherein said strip and second radiation source assembly of strip comprises UV ray radiation source.
58. as each described fluid handling system among the claim 1-21, first radiation source assembly of wherein said strip and second radiation source assembly of strip include UV ray radiation source.
59. as each described fluid handling system among the claim 1-21, at least one in first radiation source assembly of wherein said strip and second radiation source assembly of strip comprises the UV ray radiation source of selecting from following group: low pressure, amalgam and photo emissions.
60. as each described fluid handling system among the claim 1-21, first radiation source assembly of wherein said strip and second radiation source assembly of strip include the UV ray radiation source of selecting from following group: low pressure, amalgam and photo emissions.
61. fluid handling system as claimed in claim 49, wherein said varying dimensions is reducing on the direction of described fluid treatment zone.
62. as each described fluid handling system among the claim 1-21, wherein said fluid treatment zone comprises having the shell that becomes oppose side wall that connects roof and diapire.
63. fluid treatment zone as claimed in claim 62, at least a portion of wherein said roof comprises nonmetallic materials, and these nonmetallic materials have the radiation reflection coefficient bigger than metal.
64. fluid treatment zone as claimed in claim 62, at least a portion of wherein said diapire comprises nonmetallic materials, and these nonmetallic materials have the radiation reflection coefficient bigger than metal.
65. fluid treatment zone as claimed in claim 62, at least a portion of wherein said roof and diapire includes nonmetallic materials, and these nonmetallic materials have the radiation reflection coefficient bigger than metal.
66. as the described fluid treatment zone of claim 63, wherein said nonmetallic materials comprise the Teflon TM
67. a fluid handling system comprises:
Inlet;
Outlet;
Be arranged on the fluid treatment zone between this entrance and exit, this fluid treatment zone has the radiation source assembly that is arranged on wherein and arranges, this radiation source assembly is arranged from the upstream region of fluid treatment zone and is provided with to downstream area polyphone ground, make: (i) each radiation source assembly have transverse to or be parallel to the longitudinal axis that fluid stream passes the direction of fluid treatment zone, (ii) the longitudinal axis of upstream radiation source component and downstream radiation source component are staggered on the direction of passing fluid treatment zone perpendicular to fluid stream, overlap thereby between this upstream radiation source component and downstream radiation source component, form, and alternatively, (iii) fluid stream does not have the uncrossed path that passes fluid treatment zone.
68. as the described fluid handling system of claim 67, wherein said fluid handling system comprises the shell with sealing or open cross-sections.
69. as the described fluid handling system of claim 68, the closed cross-section of wherein said shell comprises polygon.
70. as the described fluid handling system of claim 68, the closed cross-section of wherein said shell comprises linear.
71. as the described fluid handling system of claim 68, the closed cross-section of wherein said shell comprises square.
72. as the described fluid handling system of claim 68, the closed cross-section of wherein said shell comprises rectangle.
73., be provided with in the wherein said fluid treatment zone as the described fluid handling system of claim 68: (i) have first longitudinal axis strip first radiation source assembly and (ii) have second radiation source assembly of the strip of second longitudinal axis; Wherein this first longitudinal axis and second longitudinal axis are not parallel each other, and are not parallel to the direction that fluid stream passes fluid treatment zone.
74. as the described fluid handling system of claim 73, wherein said first radiation source assembly comprises first radiation source.
75. as the described fluid handling system of claim 74, wherein said first radiation source is arranged in first protective casing.
76. as the described fluid handling system of claim 75, wherein said first protective casing comprises blind end and open end.
77. as the described fluid handling system of claim 73, wherein said second radiation source assembly comprises second radiation source.
78. as the described fluid handling system of claim 77, wherein said second radiation source is arranged in second protective casing.
79. as the described fluid handling system of claim 78, wherein said second protective casing comprises blind end and open end.
80. as the described fluid handling system of claim 73, wherein said first radiation source assembly comprises first radiation source, second radiation source assembly comprises second radiation source.
81. as the described fluid handling system of claim 80, wherein first radiation source is arranged in first protective casing, second radiation source is arranged in second protective casing.
82. as the described fluid handling system of claim 81, wherein first protective casing and second protective casing include blind end and open end.
83. as the described fluid handling system of claim 68, wherein said shell comprises first erecting device, is used for liquid between the first wall of the proximal part of described first radiation source assembly and described shell and connects airtight and close.
84. as the described fluid handling system of claim 68, wherein said shell comprises second erecting device, is used for liquid between second wall of the proximal part of described second radiation source assembly and described shell and connects airtight and close.
85. as the described fluid handling system of claim 68, wherein said shell comprises: the liquid that (i) is used between the first wall of the proximal part of described first radiation source assembly and described shell connects airtight first erecting device that closes, and the liquid that (ii) is used between second wall of the proximal part of described second radiation source assembly and described shell connects airtight second erecting device that closes.
86. as the described fluid handling system of claim 83, wherein said first erecting device comprises from the outstanding sleeve pipe of the outer surface of described shell.
87. as the described fluid handling system of claim 84, wherein said second erecting device comprises from the outstanding sleeve pipe of the outer surface of described shell.
88. as the described fluid handling system of claim 85, wherein said first erecting device and second erecting device include from the outstanding sleeve pipe of the outer surface of described shell.
89. as the described fluid handling system of claim 73, wherein said first radiation source assembly and second radiation source assembly are oriented between described first longitudinal axis and second longitudinal axis and form acute angle.
90. as the described fluid handling system of claim 73, it is 15 ° to 170 ° that wherein said first radiation source assembly and second radiation source assembly are oriented in the angular range that limits between described first longitudinal axis and second longitudinal axis.
91. as the described fluid handling system of claim 73, it is 35 ° to 120 ° that wherein said first radiation source assembly and second radiation source assembly are oriented in the angular range that limits between described first longitudinal axis and second longitudinal axis.
92. as the described fluid handling system of claim 73, it is 60 ° to 90 ° that wherein said first radiation source assembly and second radiation source assembly are oriented in the angular range that limits between described first longitudinal axis and second longitudinal axis.
93., wherein also comprise the support component of the distal portions that is used to support described first radiation source assembly as the described fluid handling system of claim 73.
94., wherein also comprise the support component of the distal portions that is used to support described second radiation source assembly as the described fluid handling system of claim 73.
95., wherein also comprise the support component of the distal portions of the distal portions that is used to support described first radiation source assembly and described second radiation source assembly as the described fluid handling system of claim 73.
96. as the described fluid handling system of claim 93, wherein said support component supports each radiation source assembly.
97. as the described fluid handling system of claim 93, wherein said support component comprises the plate that supports each radiation source assembly.
98. as the described fluid handling system of claim 93, the part of all radiation source assemblies in the wherein said support component support fluid processing system.
99. as the described fluid handling system of claim 93, wherein said support component comprises the post that passes the direction of fluid treatment zone perpendicular to fluid stream.
100. as the described fluid handling system of claim 73, wherein said first radiation source assembly and second radiation source assembly are coplanar.
101. as the described fluid handling system of claim 73, wherein said first radiation source assembly and second radiation source assembly are nonplanar.
102. as the described fluid handling system of claim 73, wherein said first radiation source assembly and second radiation source assembly are orientated and make described first longitudinal axis and second longitudinal axis assemble towards inlet.
103. as the described fluid handling system of claim 73, wherein said first radiation source assembly and second radiation source assembly are orientated and make described first longitudinal axis and second longitudinal axis assemble at the inlet downstream part towards inlet.
104. as the described fluid handling system of claim 73, wherein said first radiation source assembly and second radiation source assembly are orientated and make described first longitudinal axis and second longitudinal axis assemble towards outlet.
105. as the described fluid handling system of claim 73, wherein said first radiation source assembly and second radiation source assembly are orientated and make described first longitudinal axis and second longitudinal axis assemble at the outlet upstream end towards outlet.
106. as the described fluid handling system of claim 73, wherein said fluid treatment zone has the radiation source assembly that is arranged on wherein and arranges, this radiation source assembly is arranged and is set to: (i) the first order group of first radiation source assembly formation and (ii) the second order group of second radiation source assembly formation.
107. as the described fluid handling system of claim 106, wherein said first order group comprises a plurality of first radiation source assemblies that are provided with along the length polyphone of described shell.
108. as the described fluid handling system of claim 106, wherein said first order group is included in perpendicular to fluid stream and passes a plurality of first radiation source assemblies of contacting and being provided with on the direction of described fluid treatment zone.
109. as the described fluid handling system of claim 106, wherein said second order group comprises a plurality of second radiation source assemblies that are provided with along the length polyphone of described shell.
110. as the described fluid handling system of claim 106, wherein said second order group is included in perpendicular to fluid stream and passes a plurality of second radiation source assemblies of contacting and being provided with on the direction of described fluid treatment zone.
111. as the described fluid handling system of claim 106, wherein said first order group comprises: (i) a plurality of first radiation source assemblies of contacting a plurality of first radiation source assemblies of setting and (ii) contacting and be provided with on the direction of passing fluid treatment zone perpendicular to fluid stream along the length of described shell.
112. as the described fluid handling system of claim 106, wherein said second order group comprises: (i) a plurality of second radiation source assemblies of contacting a plurality of second radiation source assemblies of setting and (ii) contacting and be provided with on the direction of passing fluid treatment zone perpendicular to fluid stream along the length of described shell.
113. as each described fluid handling system among the claim 67-112, being provided with radiation source assembly in the wherein said fluid treatment zone arranges, this radiation source assembly is arranged and is set to first order group that (i) first radiation source assembly constitutes and the (ii) second order group that constitutes of second radiation source assembly; Wherein this first order group and second order group become the mirror image setting along being parallel to first plane that fluid stream passes the direction setting of fluid treatment zone.
114. as each described fluid handling system among the claim 67-112, being provided with radiation source assembly in the wherein said fluid treatment zone arranges, this radiation source assembly is arranged and is set to first order group that (i) first radiation source assembly constitutes and the (ii) second order group that constitutes of second radiation source assembly; Wherein this first order group becomes the plane relation setting with the second order group in perpendicular to described first planar second plane.
115. as each described fluid handling system among the claim 67-112, being provided with radiation source assembly in the wherein said fluid treatment zone arranges, this radiation source assembly is arranged and is set to first order group that (i) first radiation source assembly constitutes and the (ii) second order group that constitutes of second radiation source assembly; Wherein the first order group becomes the on-plane surface relation to be provided with in perpendicular to first planar second plane with the second order group.
116. as each described fluid handling system among the claim 67-112, wherein also comprise first transition region that is arranged between described inlet and the described fluid treatment zone, this first transition region has the size of variation on the direction of passing fluid treatment zone perpendicular to fluid stream.
117. as each described fluid handling system among the claim 67-112, wherein also comprise second transition region that is arranged between described fluid treatment zone and the described outlet, this second transition region has the size of variation on the direction of passing fluid treatment zone perpendicular to fluid stream.
118. as each described fluid handling system among the claim 67-112, wherein also comprise: (i) be arranged on first transition region between described inlet and the described fluid treatment zone, this first transition region has the size of variation on the direction of passing fluid treatment zone perpendicular to fluid stream, (ii) be arranged on second transition region between described fluid treatment zone and the described outlet, this second transition region has the size of variation on the direction of passing fluid treatment zone perpendicular to fluid stream.
119. as each described fluid handling system among the claim 116-112, the size of wherein said variation is increasing on the direction of described fluid treatment zone.
120. the fluid handling system described in claim 116, wherein said first transition region has closed cross-section, and this cross section has the increased cross-section area on the direction of described fluid treatment zone.
121. the fluid handling system described in claim 117, wherein said second transition region has closed cross-section, and this cross section has the increased cross-section area on the direction of described fluid treatment zone.
122. the fluid handling system described in claim 118, wherein said first transition region and second transition region all have closed cross-section, and this cross section has the increased cross-section area on the direction of described fluid treatment zone.
123. as the described fluid handling system of claim 118, in wherein said first transition region and second transition region at least one comprises the intermediate transition zone that is set up in parallel with described fluid treatment zone, this intermediate transition zone has the size of variation on the first direction of the direction of passing this fluid treatment zone perpendicular to fluid stream, and has constant size on the second direction perpendicular to this first direction.
124. as each described fluid handling system among the claim 67-112, wherein said radiation source assembly comprises UV ray radiation source.
125. as each described fluid handling system among the claim 67-112, wherein said radiation source assembly comprises the high output of low pressure UV ray radiation source.
126. as each described fluid handling system among the claim 67-112, wherein said fluid treatment zone comprises having the shell that becomes oppose side wall that connects roof and diapire.
127. as the described fluid treatment zone of claim 126, at least a portion of wherein said roof comprises nonmetallic materials, these nonmetallic materials have the radiation reflection coefficient bigger than metal.
128. as the described fluid treatment zone of claim 126, at least a portion of wherein said diapire comprises nonmetallic materials, these nonmetallic materials have the radiation reflection coefficient bigger than metal.
129. as the described fluid treatment zone of claim 126, at least a portion of wherein said roof and diapire includes nonmetallic materials, these nonmetallic materials have the radiation reflection coefficient bigger than metal.
130. as each described fluid treatment zone among the claim 127-129, wherein said nonmetallic materials comprise the Teflon TM
131. a fluid handling system comprises:
Inlet;
Outlet;
Be arranged on the fluid treatment zone between this entrance and exit, this fluid treatment zone has the arrangement of the multirow radiation source assembly that is arranged on wherein;
Each radiation source assembly have transverse to or be parallel to the longitudinal axis that fluid stream passes the direction of fluid treatment zone;
Each row comprises a plurality of radiation source assemblies, these a plurality of radiation source assemblies at interval relation on the direction of passing fluid treatment zone transverse to fluid stream, thus limiting the gap, fluid can pass this gap and flow between adjacent paired radiation source assembly;
Row all in this arrangement is interlaced with each other on the direction of passing fluid treatment zone perpendicular to fluid stream, and the downstream that at least two polyphones that make gap between the adjacent paired radiation source assembly in the upstream row of radiation source assembly be constituted by radiation source assembly on the direction of fluid stream are provided with partly or wholly hinder.
132. as the described fluid handling system of claim 131, wherein said arrangement comprises the radiation source assembly of three to 20 row.
133. as the described fluid handling system of claim 131, wherein said arrangement comprises three to ten five elements' radiation source assembly.
134. as the described fluid handling system of claim 131, wherein said fluid treatment zone comprises open cross-sections or has the shell of closed cross-section.
135. as the described fluid handling system of claim 134, the closed cross-section of wherein said shell comprises polygon.
136. as the described fluid handling system of claim 134, the closed cross-section of wherein said shell comprises linear.
137. as the described fluid handling system of claim 134, the closed cross-section of wherein said shell comprises square.
138. as the described fluid handling system of claim 134, the closed cross-section of wherein said shell comprises rectangle.
139., be provided with in the wherein said fluid treatment zone as the described fluid handling system of claim 134: (i) have first longitudinal axis strip first radiation source assembly and (ii) have second radiation source assembly of the strip of second longitudinal axis; Wherein this first longitudinal axis and second longitudinal axis are not parallel each other, and are not parallel to the direction that fluid stream passes fluid treatment zone.
140. as the described fluid handling system of claim 139, wherein said first radiation source assembly comprises first radiation source.
141. as the described fluid handling system of claim 140, wherein said first radiation source is arranged in first protective casing.
142. as the described fluid handling system of claim 141, wherein said first protective casing comprises blind end and open end.
143. as the described fluid handling system of claim 139, wherein said second radiation source assembly comprises second radiation source.
144. as the described fluid handling system of claim 143, wherein said second radiation source is arranged in second protective casing.
145. as the described fluid handling system of claim 144, wherein said second protective casing comprises blind end and open end.
146. as the described fluid handling system of claim 139, wherein said first radiation source assembly comprises first radiation source, second radiation source assembly comprises second radiation source.
147. as the described fluid handling system of claim 146, wherein first radiation source is arranged in first protective casing, second radiation source is arranged in second protective casing.
148. as the described fluid handling system of claim 147, wherein first protective casing and second protective casing include blind end and open end.
149. as the described fluid handling system of claim 139, wherein said shell comprises first erecting device, is used for liquid between the first wall of the proximal part of described first radiation source assembly and described shell and connects airtight and close.
150. as the described fluid handling system of claim 139, wherein said shell comprises second erecting device, is used for liquid between second wall of the proximal part of described second radiation source assembly and described shell and connects airtight and close.
151. as the described fluid handling system of claim 139, wherein said shell comprises:
(i) liquid that is used between the first wall of the proximal part of described first radiation source assembly and described shell connects airtight first erecting device that closes, and the liquid that (ii) is used between second wall of the proximal part of described second radiation source assembly and described shell connects airtight second erecting device that closes.
152. as the described fluid handling system of claim 149, wherein said first erecting device comprises from the outstanding sleeve pipe of the outer surface of described shell.
153. as the described fluid handling system of claim 150, wherein said second erecting device comprises from the outstanding sleeve pipe of the outer surface of described shell.
154. as the described fluid handling system of claim 151, wherein said first erecting device and second erecting device include from the outstanding sleeve pipe of the outer surface of described shell.
155. as each described fluid handling system among the claim 139-154, wherein said first radiation source assembly and second radiation source assembly are oriented between described first longitudinal axis and second longitudinal axis and form acute angle.
156. as each described fluid handling system among the claim 139-154, it is 15 ° to 170 ° that wherein said first radiation source assembly and second radiation source assembly are oriented in the angular range that limits between described first longitudinal axis and second longitudinal axis.
157. as each described fluid handling system among the claim 139-154, it is 35 ° to 120 ° that wherein said first radiation source assembly and second radiation source assembly are oriented in the angular range that limits between described first longitudinal axis and second longitudinal axis.
158. as each described fluid handling system among the claim 139-154, it is 60 ° to 90 ° that wherein said first radiation source assembly and second radiation source assembly are oriented in the angular range that limits between described first longitudinal axis and second longitudinal axis.
159., wherein also comprise the support component of the distal portions that is used to support described first radiation source assembly as each described fluid handling system among the claim 139-154.
160., wherein also comprise the support component of the distal portions that is used to support described second radiation source assembly as each described fluid handling system among the claim 139-154.
161., wherein also comprise the support component of the distal portions of the distal portions that is used to support described first radiation source assembly and described second radiation source assembly as each described fluid handling system among the claim 139-154.
162. as the described fluid handling system of claim 159, wherein said support component supports each radiation source assembly.
163. as the described fluid handling system of claim 159, wherein said support component comprises the plate that supports each radiation source assembly.
164. as the described fluid handling system of claim 159, the part of all radiation source assemblies in the wherein said support component support fluid processing system.
165. as the described fluid handling system of claim 159, wherein said support component comprises the post that passes the direction of fluid treatment zone perpendicular to fluid stream.
166. as each described fluid handling system among the claim 139-154, wherein said first radiation source assembly and second radiation source assembly are coplanar.
167. as each described fluid handling system among the claim 139-154, wherein said first radiation source assembly and second radiation source assembly are nonplanar.
168. as each described fluid handling system among the claim 139-154, wherein said first radiation source assembly and second radiation source assembly are orientated and make described first longitudinal axis and second longitudinal axis assemble towards inlet.
169. as each described fluid handling system among the claim 139-154, wherein said first radiation source assembly and second radiation source assembly are orientated and make described first longitudinal axis and second longitudinal axis assemble at the inlet downstream part towards inlet.
170. as each described fluid handling system among the claim 139-154, wherein said first radiation source assembly and second radiation source assembly are orientated and make described first longitudinal axis and second longitudinal axis assemble towards outlet.
171. as each described fluid handling system among the claim 139-154, wherein said first radiation source assembly and second radiation source assembly are orientated and make described first longitudinal axis and second longitudinal axis assemble at the outlet upstream end towards outlet.
172. as each described fluid handling system among the claim 139-154, wherein said fluid treatment zone has the radiation source assembly that is arranged on wherein and arranges, this radiation source assembly is arranged and is set to: (i) the first order group of first radiation source assembly formation and (ii) the second order group of second radiation source assembly formation.
173. as the described fluid handling system of claim 172, wherein said first order group comprises a plurality of first radiation source assemblies that are provided with along the length polyphone of described shell.
174. as the described fluid handling system of claim 172, wherein said first order group is included in perpendicular to fluid stream and passes a plurality of first radiation source assemblies of contacting and being provided with on the direction of described fluid treatment zone.
175. as the described fluid handling system of claim 172, wherein said second order group comprises a plurality of second radiation source assemblies that are provided with along the length polyphone of described shell.
176. as the described fluid handling system of claim 172, wherein said second order group is included in perpendicular to fluid stream and passes a plurality of second radiation source assemblies of contacting and being provided with on the direction of described fluid treatment zone.
177. as the described fluid handling system of claim 172, wherein said first order group comprises: (i) a plurality of first radiation source assemblies of contacting a plurality of first radiation source assemblies of setting and (ii) contacting and be provided with on the direction of passing fluid treatment zone perpendicular to fluid stream along the length of described shell.
178. as the described fluid handling system of claim 172, wherein said second order group comprises: (i) a plurality of second radiation source assemblies of contacting a plurality of second radiation source assemblies of setting and (ii) contacting and be provided with on the direction of passing fluid treatment zone perpendicular to fluid stream along the length of described shell.
179. as each described fluid handling system among the claim 139-154, being provided with radiation source assembly in the wherein said fluid treatment zone arranges, this radiation source assembly is arranged and is set to first order group that (i) first radiation source assembly constitutes and the (ii) second order group that constitutes of second radiation source assembly; Wherein this first order group and second order group become the mirror image setting along being parallel to first plane that fluid stream passes the direction setting of fluid treatment zone.
180. as each described fluid handling system among the claim 139-154, being provided with radiation source assembly in the wherein said fluid treatment zone arranges, this radiation source assembly is arranged and is set to first order group that (i) first radiation source assembly constitutes and the (ii) second order group that constitutes of second radiation source assembly; Wherein this first order group becomes the plane relation setting with the second order group in perpendicular to described first planar second plane.
181. as each described fluid handling system among the claim 139-154, be provided with radiation source assembly in the wherein said fluid treatment zone and arrange, this radiation source assembly is arranged and is set to
(i) the first order group of first radiation source assembly formation and (ii) the second order group of second radiation source assembly formation; Wherein the first order group becomes the on-plane surface relation to be provided with in perpendicular to first planar second plane with the second order group.
182. as each described fluid handling system among the claim 139-154, wherein also comprise first transition region that is arranged between described inlet and the described fluid treatment zone, this first transition region has the size of variation on the direction of passing fluid treatment zone perpendicular to fluid stream.
183. as each described fluid handling system among the claim 139-154, wherein also comprise second transition region that is arranged between described fluid treatment zone and the described outlet, this second transition region has the size of variation on the direction of passing fluid treatment zone perpendicular to fluid stream.
184. as each described fluid handling system among the claim 139-154, wherein also comprise: (i) be arranged on first transition region between described inlet and the described fluid treatment zone, this first transition region has the size of variation on the direction of passing fluid treatment zone perpendicular to fluid stream, (ii) be arranged on second transition region between described fluid treatment zone and the described outlet, this second transition region has the size of variation on the direction of passing fluid treatment zone perpendicular to fluid stream.
185. as the described fluid handling system of claim 182, the size of wherein said variation is increasing on the direction of described fluid treatment zone.
186. the fluid handling system described in claim 182, wherein said first transition region has closed cross-section, and this cross section has the increased cross-section area on the direction of described fluid treatment zone.
187. the fluid handling system described in claim 183, wherein said second transition region has closed cross-section, and this cross section has the increased cross-section area on the direction of described fluid treatment zone.
188. the fluid handling system described in claim 184, wherein said first transition region and second transition region all have closed cross-section, and this cross section has the increased cross-section area on the direction of described fluid treatment zone.
189. as the described fluid handling system of claim 184, in wherein said first transition region and second transition region at least one comprises the intermediate transition zone that is set up in parallel with described fluid treatment zone, this intermediate transition zone has the size of variation on the first direction of the direction of passing this fluid treatment zone perpendicular to fluid stream, and has constant size on the second direction perpendicular to this first direction.
190. as each described fluid handling system among the claim 139-154, wherein said radiation source assembly comprises UV ray radiation source.
191. as each described fluid handling system among the claim 139-154, wherein said radiation source assembly comprises the high output of low pressure UV ray radiation source.
192. as each described fluid handling system among the claim 139-154, wherein said fluid treatment zone comprises having the shell that becomes oppose side wall that connects roof and diapire.
193. as the described fluid treatment zone of claim 192, at least a portion of wherein said roof comprises nonmetallic materials, these nonmetallic materials have the radiation reflection coefficient bigger than metal.
194. as the described fluid treatment zone of claim 192, at least a portion of wherein said diapire comprises nonmetallic materials, these nonmetallic materials have the radiation reflection coefficient bigger than metal.
195. as the described fluid treatment zone of claim 192, at least a portion of wherein said roof and diapire includes nonmetallic materials, these nonmetallic materials have the radiation reflection coefficient bigger than metal.
196. as each described fluid treatment zone among the claim 193-195, wherein said nonmetallic materials comprise the Teflon TM
197. a fluid handling system comprises:
Inlet;
Outlet;
Be arranged on the fluid treatment zone between this entrance and exit, this fluid treatment zone has the radiation source assembly that is arranged on wherein to be arranged, and each radiation source assembly has the longitudinal axis that passes the direction of fluid treatment zone transverse to fluid stream;
This radiation source assembly is arranged and is comprised: the first row radiation source assembly, be positioned at the second row radiation source assembly in the first row radiation source assembly downstream, be positioned at the third line radiation source assembly in the second row radiation source assembly downstream and be positioned at the fourth line radiation source assembly in the third line radiation source assembly downstream;
Adjacent paired radiation source assembly in first row limits first gap that fluid can flow through, the radiation source assembly of second row partly hinders this first gap, thereby this first gap is divided into second gap and third space, the radiation source assembly of the third line to small part hinders second gap, and the radiation source assembly of fourth line to small part hinders third space.
198. as the described fluid handling system of claim 197, wherein said fluid handling system comprises plural N arrangement.
199. as the described fluid handling system of claim 198, wherein the value of N is 1 to 10.
200. as the described fluid handling system of claim 197, wherein said fluid treatment zone comprises open cross-sections or has the shell of closed cross-section.
201. as the described fluid handling system of claim 200, the closed cross-section of wherein said shell comprises polygon.
202. as the described fluid handling system of claim 200, the closed cross-section of wherein said shell comprises linear.
203. as the described fluid handling system of claim 200, the closed cross-section of wherein said shell comprises square.
204. as the described fluid handling system of claim 200, the closed cross-section of wherein said shell comprises rectangle.
205., be provided with in the wherein said fluid treatment zone as the described fluid handling system of claim 200: (i) have first longitudinal axis strip first radiation source assembly and (ii) have second radiation source assembly of the strip of second longitudinal axis; Wherein this first longitudinal axis and second longitudinal axis are not parallel each other, and are not parallel to the direction that fluid stream passes fluid treatment zone.
206. as the described fluid handling system of claim 205, wherein said first radiation source assembly comprises first radiation source.
207. as the described fluid handling system of claim 206, wherein said first radiation source is arranged in first protective casing.
208. as the described fluid handling system of claim 207, wherein said first protective casing comprises blind end and open end.
209. as each described fluid handling system among the claim 205-208, wherein said second radiation source assembly comprises second radiation source.
210. as the described fluid handling system of claim 209, wherein said second radiation source is arranged in second protective casing.
211. as the described fluid handling system of claim 210, wherein said second protective casing comprises blind end and open end.
212. as the described fluid handling system of claim 205, wherein said first radiation source assembly comprises first radiation source, second radiation source assembly comprises second radiation source.
213. as the described fluid handling system of claim 212, wherein first radiation source is arranged in first protective casing, second radiation source is arranged in second protective casing.
214. as the described fluid handling system of claim 213, wherein first protective casing and second protective casing include blind end and open end.
215. as the described fluid handling system of claim 200, wherein said shell comprises first erecting device, is used for liquid between the first wall of the proximal part of described first radiation source assembly and described shell and connects airtight and close.
216. as the described fluid handling system of claim 200, wherein said shell comprises second erecting device, is used for liquid between second wall of the proximal part of described second radiation source assembly and described shell and connects airtight and close.
217. as the described fluid handling system of claim 200, wherein said shell comprises: the liquid that (i) is used between the first wall of the proximal part of described first radiation source assembly and described shell connects airtight first erecting device that closes, and the liquid that (ii) is used between second wall of the proximal part of described second radiation source assembly and described shell connects airtight second erecting device that closes.
218. as the described fluid handling system of claim 215, wherein said first erecting device comprises from the outstanding sleeve pipe of the outer surface of described shell.
219. as the described fluid handling system of claim 216, wherein said second erecting device comprises from the outstanding sleeve pipe of the outer surface of described shell.
220. as the described fluid handling system of claim 217, wherein said first erecting device and second erecting device include from the outstanding sleeve pipe of the outer surface of described shell.
221. as the described fluid handling system of claim 205, wherein said first radiation source assembly and second radiation source assembly are oriented between described first longitudinal axis and second longitudinal axis and form acute angle.
222. as the described fluid handling system of claim 205, it is 15 ° to 170 ° that wherein said first radiation source assembly and second radiation source assembly are oriented in the angular range that limits between described first longitudinal axis and second longitudinal axis.
223. as the described fluid handling system of claim 205, it is 35 ° to 120 ° that wherein said first radiation source assembly and second radiation source assembly are oriented in the angular range that limits between described first longitudinal axis and second longitudinal axis.
224. as the described fluid handling system of claim 205, it is 60 ° to 90 ° that wherein said first radiation source assembly and second radiation source assembly are oriented in the angular range that limits between described first longitudinal axis and second longitudinal axis.
225., wherein also comprise the support component of the distal portions that is used to support described first radiation source assembly as the described fluid handling system of claim 205.
226., wherein also comprise the support component of the distal portions that is used to support described second radiation source assembly as the described fluid handling system of claim 205.
227., wherein also comprise the support component of the distal portions of the distal portions that is used to support described first radiation source assembly and described second radiation source assembly as the described fluid handling system of claim 205.
228. as the described fluid handling system of claim 225, wherein said support component supports each radiation source assembly.
229. as the described fluid handling system of claim 225, wherein said support component comprises the plate that supports each radiation source assembly.
230. as the described fluid handling system of claim 225, the part of all radiation source assemblies in the wherein said support component support fluid processing system.
231. as the described fluid handling system of claim 225, wherein said support component comprises the post that passes the direction of fluid treatment zone perpendicular to fluid stream.
232. as the described fluid handling system of claim 205, wherein said first radiation source assembly and second radiation source assembly are coplanar.
233. as the described fluid handling system of claim 205, wherein said first radiation source assembly and second radiation source assembly are nonplanar.
234. as the described fluid handling system of claim 205, wherein said first radiation source assembly and second radiation source assembly are orientated and make described first longitudinal axis and second longitudinal axis assemble towards inlet.
235. as the described fluid handling system of claim 205, wherein said first radiation source assembly and second radiation source assembly are orientated and make described first longitudinal axis and second longitudinal axis assemble at the inlet downstream part towards inlet.
236. as the described fluid handling system of claim 205, wherein said first radiation source assembly and second radiation source assembly are orientated and make described first longitudinal axis and second longitudinal axis assemble towards outlet.
237. as the described fluid handling system of claim 205, wherein said first radiation source assembly and second radiation source assembly are orientated and make described first longitudinal axis and second longitudinal axis assemble at the outlet upstream end towards outlet.
238. as the described fluid handling system of claim 205, wherein said fluid treatment zone has the radiation source assembly that is arranged on wherein and arranges, this radiation source assembly is arranged and is set to: (i) the first order group of first radiation source assembly formation and (ii) the second order group of second radiation source assembly formation.
239. as the described fluid handling system of claim 238, wherein said first order group comprises a plurality of first radiation source assemblies that are provided with along the length polyphone of described shell.
240. as the described fluid handling system of claim 238, wherein said first order group is included in perpendicular to fluid stream and passes a plurality of first radiation source assemblies of contacting and being provided with on the direction of described fluid treatment zone.
241. as the described fluid handling system of claim 238, wherein said second order group comprises a plurality of second radiation source assemblies that are provided with along the length polyphone of described shell.
242. as the described fluid handling system of claim 238, wherein said second order group is included in perpendicular to fluid stream and passes a plurality of second radiation source assemblies of contacting and being provided with on the direction of described fluid treatment zone.
243. as the described fluid handling system of claim 238, wherein said first order group comprises: (i) a plurality of first radiation source assemblies of contacting a plurality of first radiation source assemblies of setting and (ii) contacting and be provided with on the direction of passing fluid treatment zone perpendicular to fluid stream along the length of described shell.
244. as the described fluid handling system of claim 238, wherein said second order group comprises: (i) a plurality of second radiation source assemblies of contacting a plurality of second radiation source assemblies of setting and (ii) contacting and be provided with on the direction of passing fluid treatment zone perpendicular to fluid stream along the length of described shell.
245. as each described fluid handling system among the claim 197-244, being provided with radiation source assembly in the wherein said fluid treatment zone arranges, this radiation source assembly is arranged and is set to first order group that (i) first radiation source assembly constitutes and the (ii) second order group that constitutes of second radiation source assembly; Wherein this first order group and second order group become the mirror image setting along being parallel to first plane that fluid stream passes the direction setting of fluid treatment zone.
246. as each described fluid handling system among the claim 197-244, being provided with radiation source assembly in the wherein said fluid treatment zone arranges, this radiation source assembly is arranged and is set to first order group that (i) first radiation source assembly constitutes and the (ii) second order group that constitutes of second radiation source assembly; Wherein this first order group becomes the plane relation setting with the second order group in perpendicular to described first planar second plane.
247. as each described fluid handling system among the claim 197-244, being provided with radiation source assembly in the wherein said fluid treatment zone arranges, this radiation source assembly is arranged and is set to first order group that (i) first radiation source assembly constitutes and the (ii) second order group that constitutes of second radiation source assembly; Wherein the first order group becomes the on-plane surface relation to be provided with in perpendicular to first planar second plane with the second order group.
248. as each described fluid handling system among the claim 197-244, wherein also comprise first transition region that is arranged between described inlet and the described fluid treatment zone, this first transition region has the size of variation on the direction of passing fluid treatment zone perpendicular to fluid stream.
249. as each described fluid handling system among the claim 197-244, wherein also comprise second transition region that is arranged between described fluid treatment zone and the described outlet, this second transition region has the size of variation on the direction of passing fluid treatment zone perpendicular to fluid stream.
250. as each described fluid handling system among the claim 197-247, wherein also comprise: (i) be arranged on first transition region between described inlet and the described fluid treatment zone, this first transition region has the size of variation on the direction of passing fluid treatment zone perpendicular to fluid stream, (ii) be arranged on second transition region between described fluid treatment zone and the described outlet, this second transition region has the size of variation on the direction of passing fluid treatment zone perpendicular to fluid stream.
251. as the described fluid handling system of claim 248, the size of wherein said variation is increasing on the direction of described fluid treatment zone.
252. the fluid handling system described in claim 248, wherein said first transition region has closed cross-section, and this cross section has the increased cross-section area on the direction of described fluid treatment zone.
253. the fluid handling system described in claim 249, wherein said second transition region has closed cross-section, and this cross section has the increased cross-section area on the direction of described fluid treatment zone.
254. the fluid handling system described in claim 250, wherein said first transition region and second transition region all have closed cross-section, and this cross section has the increased cross-section area on the direction of described fluid treatment zone.
255. as the described fluid handling system of claim 250, in wherein said first transition region and second transition region at least one comprises the intermediate transition zone that is set up in parallel with described fluid treatment zone, this intermediate transition zone has the size of variation on the first direction of the direction of passing this fluid treatment zone perpendicular to fluid stream, and has constant size on the second direction perpendicular to this first direction.
256. as each described fluid handling system among the claim 197-244, wherein said radiation source assembly comprises UV ray radiation source.
257. as each described fluid handling system among the claim 197-244, wherein said radiation source assembly comprises the high output of low pressure UV ray radiation source.
258. as each described fluid handling system among the claim 197-244, wherein said fluid treatment zone comprises having the shell that becomes oppose side wall that connects roof and diapire.
259. as the described fluid treatment zone of claim 258, at least a portion of wherein said roof comprises nonmetallic materials, these nonmetallic materials have the radiation reflection coefficient bigger than metal.
260. as the described fluid treatment zone of claim 258, at least a portion of wherein said diapire comprises nonmetallic materials, these nonmetallic materials have the radiation reflection coefficient bigger than metal.
261. as the described fluid treatment zone of claim 258, at least a portion of wherein said roof and diapire includes nonmetallic materials, these nonmetallic materials have the radiation reflection coefficient bigger than metal.
262. as each described fluid treatment zone among the claim 259-261, wherein said nonmetallic materials comprise the Teflon TM
263. a fluid handling system comprises:
Inlet;
Outlet;
Be arranged on the fluid treatment zone between this entrance and exit, this fluid treatment zone has the arrangement that is arranged on wherein, and this arrangement comprises the 4 row radiation source assemblies of contacting to the downstream part and being provided with from the fluid treatment zone upstream portion;
Each radiation source assembly has the longitudinal axis that passes the fluid treatment zone direction transverse to fluid stream;
Wherein: (i) first pair of radiation source assembly in the described arrangement capable be included in radiation source assembly adjacent in this row between the interval of homogeneous; Second pair of radiation source assembly in the (ii) described arrangement be capable be included in radiation source assembly adjacent in this row between inhomogenous interval.
264. as the described fluid handling system of claim 263, wherein said first pair of radiation source assembly be capable be arranged on described second pair of radiation source assembly capable between.
265. as the described fluid handling system of claim 263, wherein said fluid handling system comprises plural N arrangement.
266. as the described fluid handling system of claim 265, wherein the value of N is 1 to 10.
267. as the described fluid handling system of claim 263, wherein said fluid treatment zone comprises open cross-sections or has the shell of closed cross-section.
268. as the described fluid handling system of claim 267, the closed cross-section of wherein said shell comprises polygon.
269. as the described fluid handling system of claim 267, the closed cross-section of wherein said shell comprises linear.
270. as the described fluid handling system of claim 267, the closed cross-section of wherein said shell comprises square.
271. as the described fluid handling system of claim 267, the closed cross-section of wherein said shell comprises rectangle.
272., be provided with in the wherein said fluid treatment zone as the described fluid handling system of claim 267: (i) have first longitudinal axis strip first radiation source assembly and (ii) have second radiation source assembly of the strip of second longitudinal axis; Wherein this first longitudinal axis and second longitudinal axis are not parallel each other, and are not parallel to the direction that fluid stream passes fluid treatment zone.
273. as the described fluid handling system of claim 272, wherein said first radiation source assembly comprises first radiation source.
274. as the described fluid handling system of claim 273, wherein said first radiation source is arranged in first protective casing.
275. as the described fluid handling system of claim 274, wherein said first protective casing comprises blind end and open end.
276. as the described fluid handling system of claim 272, wherein said second radiation source assembly comprises second radiation source.
277. as the described fluid handling system of claim 276, wherein said second radiation source is arranged in second protective casing.
278. as the described fluid handling system of claim 277, wherein said second protective casing comprises blind end and open end.
279. as the described fluid handling system of claim 272, wherein said first radiation source assembly comprises first radiation source, second radiation source assembly comprises second radiation source.
280. as the described fluid handling system of claim 279, wherein first radiation source is arranged in first protective casing, second radiation source is arranged in second protective casing.
281. as the described fluid handling system of claim 280, wherein first protective casing and second protective casing include blind end and open end.
282. as the described fluid handling system of claim 267, wherein said shell comprises first erecting device, is used for liquid between the first wall of the proximal part of described first radiation source assembly and described shell and connects airtight and close.
283. as the described fluid handling system of claim 267, wherein said shell comprises second erecting device, is used for liquid between second wall of the proximal part of described second radiation source assembly and described shell and connects airtight and close.
284. as the described fluid handling system of claim 267, wherein said shell comprises: the liquid that (i) is used between the first wall of the proximal part of described first radiation source assembly and described shell connects airtight first erecting device that closes, and the liquid that (ii) is used between second wall of the proximal part of described second radiation source assembly and described shell connects airtight second erecting device that closes.
285. as the described fluid handling system of claim 282, wherein said first erecting device comprises from the outstanding sleeve pipe of the outer surface of described shell.
286. as the described fluid handling system of claim 283, wherein said second erecting device comprises from the outstanding sleeve pipe of the outer surface of described shell.
287. as the described fluid handling system of claim 284, wherein said first erecting device and second erecting device include from the outstanding sleeve pipe of the outer surface of described shell.
288. as the described fluid handling system of claim 272, wherein said first radiation source assembly and second radiation source assembly are oriented between described first longitudinal axis and second longitudinal axis and form acute angle.
289. as the described fluid handling system of claim 272, it is 15 ° to 170 ° that wherein said first radiation source assembly and second radiation source assembly are oriented in the angular range that limits between described first longitudinal axis and second longitudinal axis.
290. as the described fluid handling system of claim 272, it is 35 ° to 120 ° that wherein said first radiation source assembly and second radiation source assembly are oriented in the angular range that limits between described first longitudinal axis and second longitudinal axis.
291. as the described fluid handling system of claim 272, it is 60 ° to 90 ° that wherein said first radiation source assembly and second radiation source assembly are oriented in the angular range that limits between described first longitudinal axis and second longitudinal axis.
292., wherein also comprise the support component of the distal portions that is used to support described first radiation source assembly as the described fluid handling system of claim 272.
293., wherein also comprise the support component of the distal portions that is used to support described second radiation source assembly as the described fluid handling system of claim 272.
294., wherein also comprise the support component of the distal portions of the distal portions that is used to support described first radiation source assembly and described second radiation source assembly as the described fluid handling system of claim 272.
295. as the described fluid handling system of claim 292, wherein said support component supports each radiation source assembly.
296. as the described fluid handling system of claim 292, wherein said support component comprises the plate that supports each radiation source assembly.
297. as the described fluid handling system of claim 292, the part of all radiation source assemblies in the wherein said support component support fluid processing system.
298. as the described fluid handling system of claim 292, wherein said support component comprises the post that passes the direction of fluid treatment zone perpendicular to fluid stream.
299. as the described fluid handling system of claim 272, wherein said first radiation source assembly and second radiation source assembly are coplanar.
300. as the described fluid handling system of claim 272, wherein said first radiation source assembly and second radiation source assembly are nonplanar.
301. as the described fluid handling system of claim 272, wherein said first radiation source assembly and second radiation source assembly are orientated and make described first longitudinal axis and second longitudinal axis assemble towards inlet.
302. as the described fluid handling system of claim 272, wherein said first radiation source assembly and second radiation source assembly are orientated and make described first longitudinal axis and second longitudinal axis assemble at the inlet downstream part towards inlet.
303. as the described fluid handling system of claim 272, wherein said first radiation source assembly and second radiation source assembly are orientated and make described first longitudinal axis and second longitudinal axis assemble towards outlet.
304. as the described fluid handling system of claim 272, wherein said first radiation source assembly and second radiation source assembly are orientated and make described first longitudinal axis and second longitudinal axis assemble at the outlet upstream end towards outlet.
305. as the described fluid handling system of claim 272, wherein said fluid treatment zone has the radiation source assembly that is arranged on wherein and arranges, this radiation source assembly is arranged and is set to: (i) the first order group of first radiation source assembly formation and (ii) the second order group of second radiation source assembly formation.
306. as the described fluid handling system of claim 305, wherein said first order group comprises a plurality of first radiation source assemblies that are provided with along the length polyphone of described shell.
307. as the described fluid handling system of claim 305, wherein said first order group is included in perpendicular to fluid stream and passes a plurality of first radiation source assemblies of contacting and being provided with on the direction of described fluid treatment zone.
308. as the described fluid handling system of claim 305, wherein said second order group comprises a plurality of second radiation source assemblies that are provided with along the length polyphone of described shell.
309. as the described fluid handling system of claim 305, wherein said second order group is included in perpendicular to fluid stream and passes a plurality of second radiation source assemblies of contacting and being provided with on the direction of described fluid treatment zone.
310. as the described fluid handling system of claim 305, wherein said first order group comprises: (i) a plurality of first radiation source assemblies of contacting a plurality of first radiation source assemblies of setting and (ii) contacting and be provided with on the direction of passing fluid treatment zone perpendicular to fluid stream along the length of described shell.
311. as the described fluid handling system of claim 305, wherein said second order group comprises: (i) a plurality of second radiation source assemblies of contacting a plurality of second radiation source assemblies of setting and (ii) contacting and be provided with on the direction of passing fluid treatment zone perpendicular to fluid stream along the length of described shell.
312. as each described fluid handling system among the claim 263-311, being provided with radiation source assembly in the wherein said fluid treatment zone arranges, this radiation source assembly is arranged and is set to first order group that (i) first radiation source assembly constitutes and the (ii) second order group that constitutes of second radiation source assembly; Wherein this first order group and second order group become the mirror image setting along being parallel to first plane that fluid stream passes the direction setting of fluid treatment zone.
313. as each described fluid handling system among the claim 263-311, being provided with radiation source assembly in the wherein said fluid treatment zone arranges, this radiation source assembly is arranged and is set to first order group that (i) first radiation source assembly constitutes and the (ii) second order group that constitutes of second radiation source assembly; Wherein this first order group becomes the plane relation setting with the second order group in perpendicular to described first planar second plane.
314. as each described fluid handling system among the claim 263-311, being provided with radiation source assembly in the wherein said fluid treatment zone arranges, this radiation source assembly is arranged and is set to first order group that (i) first radiation source assembly constitutes and the (ii) second order group that constitutes of second radiation source assembly; Wherein the first order group becomes the on-plane surface relation to be provided with in perpendicular to first planar second plane with the second order group.
315. as each described fluid handling system among the claim 263-311, wherein also comprise first transition region that is arranged between described inlet and the described fluid treatment zone, this first transition region has the size of variation on the direction of passing fluid treatment zone perpendicular to fluid stream.
316. as each described fluid handling system among the claim 263-311, wherein also comprise second transition region that is arranged between described fluid treatment zone and the described outlet, this second transition region has the size of variation on the direction of passing fluid treatment zone perpendicular to fluid stream.
317. as each described fluid handling system among the claim 263-311, wherein also comprise: (i) be arranged on first transition region between described inlet and the described fluid treatment zone, this first transition region has the size of variation on the direction of passing fluid treatment zone perpendicular to fluid stream, (ii) be arranged on second transition region between described fluid treatment zone and the described outlet, this second transition region has the size of variation on the direction of passing fluid treatment zone perpendicular to fluid stream.
318. as the described fluid handling system of claim 315, the size of wherein said variation is increasing on the direction of described fluid treatment zone.
319. the fluid handling system described in claim 315, wherein said first transition region has closed cross-section, and this cross section has the increased cross-section area on the direction of described fluid treatment zone.
320. the fluid handling system described in claim 316, wherein said second transition region has closed cross-section, and this cross section has the increased cross-section area on the direction of described fluid treatment zone.
321. the fluid handling system described in claim 317, wherein said first transition region and second transition region all have closed cross-section, and this cross section has the increased cross-section area on the direction of described fluid treatment zone.
322. as the described fluid handling system of claim 317, in wherein said first transition region and second transition region at least one comprises the intermediate transition zone that is set up in parallel with described fluid treatment zone, this intermediate transition zone has the size of variation on the first direction of the direction of passing this fluid treatment zone perpendicular to fluid stream, and has constant size on the second direction perpendicular to this first direction.
323. as each described fluid handling system among the claim 263-311, wherein said radiation source assembly comprises UV ray radiation source.
324. as each described fluid handling system among the claim 263-311, wherein said radiation source assembly comprises the high output of low pressure UV ray radiation source.
325. as each described fluid handling system among the claim 263-311, wherein said fluid treatment zone comprises having the shell that becomes oppose side wall that connects roof and diapire.
326. as the described fluid treatment zone of claim 325, at least a portion of wherein said roof comprises nonmetallic materials, these nonmetallic materials have the radiation reflection coefficient bigger than metal.
327. as the described fluid treatment zone of claim 325, at least a portion of wherein said diapire comprises nonmetallic materials, these nonmetallic materials have the radiation reflection coefficient bigger than metal.
328. as the described fluid treatment zone of claim 325, at least a portion of wherein said roof and diapire includes nonmetallic materials, these nonmetallic materials have the radiation reflection coefficient bigger than metal.
329. as each described fluid treatment zone among the claim 326-328, wherein said nonmetallic materials comprise the Teflon TM
CNB2005800080221A 2004-03-12 2005-03-14 Fluid handling system Expired - Lifetime CN100571788C (en)

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CN102099105A (en) * 2008-07-15 2011-06-15 特洛伊科技有限公司 Fluid treatment system
US20120061585A1 (en) * 2010-09-15 2012-03-15 Takeshi Ide Ultraviolet water treating apparatus
EP3208243B1 (en) * 2016-02-16 2020-04-08 Xylem Europe GmbH Uv-system with a degassing zone

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