CN100552983C - Microlens module of photoelectric component and manufacturing method thereof - Google Patents
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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Abstract
Description
技术领域 technical field
本发明涉及一种光电组件制造技术,特别是有关于一种光电组件微透镜模块及其制造方法,其可应用于光电组件上制造出多组微透镜(microlens)。The invention relates to a photoelectric component manufacturing technology, in particular to a photoelectric component microlens module and a manufacturing method thereof, which can be applied to a photoelectric component to manufacture multiple groups of microlenses (microlens).
背景技术 Background technique
微透镜(microlens)为一种尺寸极为微小的透镜,其可应用于光电组件,例如为数字相机的影像传感器、发光二极管、或太阳能电池,用以对该光电组件所接收到的光束提供聚焦功能、或是该光电组件所发射出的光束提供扩散功能。A microlens is an extremely small lens that can be applied to optoelectronic components, such as image sensors of digital cameras, light-emitting diodes, or solar cells, to provide focusing functions for the light beams received by the optoelectronic components , or the light beam emitted by the photoelectric component provides a diffusion function.
举例来说,将微透镜附加发光二极管的发光面,可有效地减少全反射现象和波导效应,以借此而提升发光二极管的出光效率;将微透镜附加至太阳能电池的光接收面,可提升光的吸收效率及改善光电转换效率;将微透镜附加至光侦测器,可将讯号光透过聚焦作用而集中于感光区,借此来提升光的利用率、改善光侦测器的讯号与噪音的比率、缩短反应时间、以及减少失真。For example, adding a microlens to the light-emitting surface of a light-emitting diode can effectively reduce total reflection and waveguide effect, thereby improving the light-emitting efficiency of a light-emitting diode; adding a microlens to the light-receiving surface of a solar cell can improve Light absorption efficiency and improvement of photoelectric conversion efficiency; adding a microlens to the photodetector can concentrate the signal light in the photosensitive area through focusing, thereby improving the utilization rate of light and improving the signal of the photodetector Ratio to noise, faster response time, and less distortion.
在微透镜的制造上,相关的专利技术例如包括有下列的美国专利:In the manufacture of microlenses, related patent technologies include, for example, the following US patents:
美国专利第6,171,833号″IMAGE ARRAY OPTOELECTRONICMICROELECTRONIC FABRICATION WITH ENHANCED OPTICALSTABILITY AND METHOD FOR FABRICATION THEREOF″;US Patent No. 6,171,833 "IMAGE ARRAY OPTOELECTRONICMICROELECTRONIC FABRICATION WITH ENHANCED OPTICALSTABILITY AND METHOD FOR FABRICATION THEREOF";
美国专利第6,570,324号″IMAGE DISPLAY DEVICE WITHARRAY OF LENS-LETS″;US Patent No. 6,570,324 "IMAGE DISPLAY DEVICE WITHARRAY OF LENS-LETS";
美国专利第6,048,623号″METHOD OF CONTACT PRINTING ONGOLD COATED FILMS″;US Patent No. 6,048,623 "METHOD OF CONTACT PRINTING ONGOLD COATED FILMS";
美国专利第6,020,047号″POLYMER FILMS HAVING A PRINTEDSELF-AS SEMBLING MONOLAYER″。US Patent No. 6,020,047 "POLYMER FILMS HAVING A PRINTEDSELF-AS SEMBLING MONOLAYER".
为简化说明,有关上述专利技术的详细内容,请参阅其专利说明书。上述的美国专利所采用的制造过程技术包括光阻热熔法、热压模造法、光罩微影法、雷射光刻法、以及喷墨打印法。然而这些制造过程技术由于作业程序上颇为复杂且需要使用成本昂贵的制造过程设备,因此会使得制造过程成本较高而不符合成本经济效益。To simplify the description, please refer to the patent specification for the detailed content of the above-mentioned patented technology. The manufacturing process technologies adopted in the above-mentioned US patents include photoresist hot-melt method, thermal compression molding method, photomask lithography method, laser lithography method, and ink-jet printing method. However, because these manufacturing process technologies are quite complicated in operation procedures and need to use expensive manufacturing process equipment, the cost of the manufacturing process is relatively high, which is not cost-effective.
发明内容 Contents of the invention
鉴于以上所述现有技术的缺点,本发明的主要目的在于提供一种光电组件微透镜模块及其制造方法,其在具体实施上较先前技术更为简易而具有更高的成本经济效益。In view of the above-mentioned shortcomings of the prior art, the main purpose of the present invention is to provide a micro-lens module of an optoelectronic component and a manufacturing method thereof, which is simpler and more cost-effective in implementation than the prior art.
本发明的光电组件微透镜制造方法是设计应用于光电组件上制造出多组微透镜,且其所适用的光电组件例如包括数字相机的影像传感器、发光二极管、和太阳能电池。The microlens manufacturing method of the optoelectronic component of the present invention is designed to be applied to the optoelectronic component to manufacture multiple groups of microlenses, and the optoelectronic component it is suitable for includes, for example, an image sensor of a digital camera, a light emitting diode, and a solar cell.
本发明的光电传感器微透镜制造方法至少包含:(1)分别预制基板及压印模具,其中该基板定义出至少一个微透镜预定布局区域和一个周围区域,而该压印模具定义出至少一个凸出部和一个凹槽部,其中该凸出部和该凹槽部的其中之一选择性地作为特征结构区,且该特征结构区是定义为对应于该基板上的微透镜预定布局区域;(2)将自组装单分子材料布置于该压印模具的凸出部;(3)执行压印程序,其中是将该压印模具上的特征结构区对准该基板上的微透镜预定布局区域,使得该模具的凸出部上所布置的自组装单分子材料被压印至该基板而形成预定图案的自组装薄膜层;以及(4)执行喷印程序,其中,将透光性材料于液体状态下喷印至该基板上的微透镜预定布局区域,令该液状的透光性材料受该自组装薄膜层的局限作用而自行附着至该基板上的微透镜预定布局区域的范围之内。The photoelectric sensor microlens manufacturing method of the present invention at least includes: (1) prefabricating a substrate and an embossing mold respectively, wherein the substrate defines at least one microlens predetermined layout area and a surrounding area, and the embossing mold defines at least one convex a protruding portion and a groove portion, wherein one of the protruding portion and the groove portion is selectively used as a feature structure area, and the feature structure area is defined to correspond to a predetermined layout area of the microlens on the substrate; (2) disposing the self-assembled monomolecular material on the protrusion of the imprinting mold; (3) performing an imprinting process, wherein the characteristic structure area on the imprinting mold is aligned with the microlens predetermined layout on the substrate area, so that the self-assembled monomolecular material arranged on the protruding part of the mold is imprinted onto the substrate to form a self-assembled thin film layer of a predetermined pattern; Spray printing onto the predetermined layout area of the microlens on the substrate in a liquid state, so that the liquid light-transmitting material is self-attached to within the range of the predetermined layout area of the microlens on the substrate due to the confinement of the self-assembled thin film layer Inside.
在产物的实体架构上,本发明的光电组件微透镜模块至少包含:(A)基板,预先定义有至少一个微透镜预定布局区域和一个周围区域;(B)自组装单分子材料层,其压印于该基板的周围区域上而形成自组装薄膜层;以及(C)透光性材料层,其附着于该基板上的微透镜预定布局区域,且受到该自组装薄膜层的阻绝作用而局限于该微透镜预定布局区域的范围之内。In terms of the physical structure of the product, the microlens module of the photoelectric component of the present invention at least includes: (A) a substrate, which is pre-defined with at least one microlens predetermined layout area and a surrounding area; (B) a self-assembled monomolecular material layer, which is pressed Printed on the surrounding area of the substrate to form a self-assembled thin film layer; and (C) a light-transmitting material layer attached to the predetermined layout area of the microlens on the substrate and limited by the blocking effect of the self-assembled thin film layer within the range of the predetermined layout area of the microlens.
本发明的光电组件微透镜模块及其制造方法的特点在于采用压印技术在基板上定义出微透镜预定布局区域及其范围,并利用喷印技术将透光性材料的溶液喷印至基板上的微透镜预定布局区域,即可形成所需的微透镜。与先前技术相比较,由于本光电组件微透镜制造方法不需采用制造过程较复杂且成本昂贵的制造过程技术,因此可使得制造过程更为简易而具有更高的成本经济效益。The feature of the photoelectric component microlens module and its manufacturing method of the present invention is that the predetermined layout area and range of the microlens are defined on the substrate by imprinting technology, and the solution of light-transmitting material is spray-printed on the substrate by using the printing technology The predetermined layout area of the microlens can form the desired microlens. Compared with the prior art, since the manufacturing method of the microlens of the optoelectronic component does not need to adopt complicated and expensive manufacturing process technology, the manufacturing process can be simpler and have higher cost-effectiveness.
附图说明 Description of drawings
图1A为上视结构示意图,用以显示本发明所采用的基板的上视结构形态;FIG. 1A is a schematic diagram of a top view structure, which is used to show the top view structure of the substrate used in the present invention;
图1B为剖面结构示意图,用以显示本发明所采用的基板的剖面结构形态;FIG. 1B is a schematic cross-sectional structure, used to show the cross-sectional structure of the substrate used in the present invention;
图2为剖面结构示意图,用以显示本发明所采用的压印模具的剖面结构形态;Fig. 2 is a schematic cross-sectional structure, used to show the cross-sectional structure of the embossing mold used in the present invention;
图3为剖面结构示意图,用以显示本发明所采用的压印模具于涂布上自组装单分子材料后的剖面结构形态;Fig. 3 is a schematic cross-sectional structure, used to show the cross-sectional structure of the embossing mold used in the present invention after coating the self-assembled monomolecular material;
图4A至4B为剖面结构示意图,用以显示本发明所采用的压印程序的实施方式;4A to 4B are cross-sectional schematic diagrams for illustrating the embodiment of the embossing process adopted by the present invention;
图5A至5B为侧视结构示意图,用以显示本发明所采用的喷印程序的两种实施方式;5A to 5B are side view structural schematic diagrams for showing two implementations of the jet printing process used in the present invention;
图6A至6D为剖面结构示意图,用以显示本发明用来制作压印模具的一种实施方式。6A to 6D are cross-sectional schematic diagrams for illustrating an embodiment of the present invention for making an imprint mold.
[主要组件符号说明][Description of main component symbols]
10 基板10 Substrate
11 微透镜预定布局区域11 Microlens predetermined layout area
12 周围区域12 Surrounding area
20 压印模具20 imprint molds
21 凹槽部21 Groove
22 凸出部22 protrusion
30 自组装单分子材料30 Self-Assembled Monomolecular Materials
31 自组装薄膜层31 self-assembled film layers
40 喷印装置40 jet printing device
50 透光性材料50 translucent material
60 微透镜(小曲率)60 microlenses (small curvature)
61 微透镜(大曲率)61 microlens (large curvature)
70 模板70 templates
71 凸起部71 raised part
72 凹槽部72 Groove
具体实施方式 Detailed ways
以下配合所附的附图,详细说明本发明的光电组件微透镜模块及其制造方法的实施例。Embodiments of the photoelectric component microlens module and its manufacturing method of the present invention will be described in detail below in conjunction with the accompanying drawings.
首先如图1A及1B所示,本发明的光电组件微透镜制造方法的初始步骤是预制基板10,并在该基板10上预先定义出多组微透镜预定布局区域11(注:图1A及1B所示的基板10仅示范性地显示2个微透镜预定布局区域;但在具体实施上,可能包括数万或数百万个微透镜预定布局区域)。此基板10可例如为数字相机的影像传感器芯片组件、发光二极管芯片组件、或太阳能电池芯片组件。如图1A所示,这些微透镜预定布局区域11例如为圆形状,且其以外的区域则定义为周围区域12。在具体实施上,基板10的材料必须与透光性材料之间具有亲液性(high affinity)。由于透光性材料通常采用环氧树脂、光学胶、压克力材料(Polymethylmethacrylate,PMMA)、聚氨酯塑料材料(Polyurethane,PU)、硅胶材料(polydimethylsiloxane,PDMS)、光阻材料(例如SU8);因此基板10的材料可例如为金属(金、银、铜、铝、铁、镍、锆、或铂)、金属氧化物、半导体、半导体氧化物、二氧化硅(SiO2)、玻璃、石英、或高分子材料。First, as shown in Figures 1A and 1B, the initial step of the microlens manufacturing method for optoelectronic components of the present invention is to prefabricate the
接着如图2所示,本发明的光电组件微透镜制造方法的下一个步骤是预制压印模具20;其中该压印模具20形成至少有一个凹槽部21和一个凸出部22,且该凹槽部21的尺寸及位置对应于上述的基板10上的预定的微透镜预定布局区域11,而该凸出部22则是围绕该凹槽部21且对应于上述的基板10上的周围区域12。在具体实施上,此压印模具20的材料最佳为采用硅胶(polydimethylsiloxane,PDMS);且其可利用多种制法来制作。图6A至6D显示一种可行的制法。首先如图6A所示,第一个步骤是预制一块模板70,例如一块硅制的模板;接着如图6B所示,下一个步骤是利用微影技术(photolithography)来移除该模板70的预定部分(即对应于上述的基板10的周围区域12的部分),因此在该模板70上形成凸起部71和凹槽部72;再接着如图6C所示,将PDMS硅胶材料80均匀地涂布在模板70的上表面,且该PDMS硅胶材料80须填满凹槽部72及覆盖于凸起部71的上方直至预定的厚度;最后如图6D所示,在PDMS硅胶材料80凝固后,即可将固化的PDMS硅胶块体取出,即可得到所需的压印模具20。除图6A至6D所示的制法之外,压印模具20还可能有其它种不同的制法。Then, as shown in FIG. 2 , the next step of the microlens manufacturing method for optoelectronic components of the present invention is to prefabricate the
接着如图3所示,制成压印模具20之后,下一个步骤是将自组装单分子材料(self-assembling monolayer,SAM)30涂布于上述的压印模具20的凸出部22。在具体实施上,此自组装单分子材料30的材料必须与透光性材料之间具有斥液性(low affinity)。由于透光性材料通常为采用环氧树脂、光学胶、PMMA、PU、PDMS、SU8;因此自组装单分子材料30的材料可例如为硅烷化合物或硫醇化合物。Next, as shown in FIG. 3 , after the
接着如图4A至4B所示,下一个步骤为执行压印程序;其中,将上述的压印模具20的凹槽部21对准基板10上的微透镜预定布局区域11,再接着令压印模具20的凸出部22压印至该基板10上的微透镜预定布局区域11以外的周围区域12,使得该凸出部22上所涂布的SAM自组装单分子材料30如图4B所示般地被压印至该基板10上,从而在该基板10的周围区域12上形成自组装薄膜层31。Then, as shown in FIGS. 4A to 4B , the next step is to perform an embossing procedure; wherein, the
接着如图5A所示,下一个步骤为执行喷印程序;其中是利用喷印装置40将透光性材料50在液体状态下喷印至该基板10上的微透镜预定布局区域11。由于透光性材料50与基板10的材料之间具有亲液性,因此喷印下来的液状的透光性材料50可自行附着至该基板10上的预定的微透镜预定布局区域11,并自行于预定的微透镜预定布局区域11中向外扩散。但由于透光性材料50与SAM自组装单分子材料所形成的自组装薄膜层31之间具有斥液性,因此液状的透光性材料50将被自组装薄膜层31阻绝于微透镜预定布局区域11的范围之内。当喷印上的透光性材料50凝固之后,即可形成所需的微透镜60。在具体实施上,透光性材料50的材料例如可为环氧树脂、光学胶、压克力材料(Polymethylmethacrylate,PMMA)、聚氨酯塑料材料(Polyurethane,PU)、硅胶材料(polydimethylsiloxane,PDMS)、光阻材料(例如SU8);而喷印装置40例如可为压电式(piezo)、热气泡式(Thermal Bubble)、或声控式(acoustic)的喷印装置。Next, as shown in FIG. 5A , the next step is to execute the jet printing process; wherein the
此外,如图5B所示,若需要制作曲率较大的微透镜61,则可增加透光性材料50的滴数。由于透光性材料50在一定的量下可被自组装薄膜层31完全阻绝于预定的微透镜预定布局区域11的范围之内;因此理论上滴数愈多,则所形成的微透镜61也就具有较大的曲率。In addition, as shown in FIG. 5B , if a
除了前述的实施方式之外,本发明也可相反地改为采用亲液性的自组装单分子,并令基板10的材料改为斥液性。广义而言,压印模具20上的凹槽部21和凸出部22其中之一选择性地被定义来作为特征结构区,且该特征结构区定义为对应于该基板10上的微透镜预定布局区域11;而前述的实施方式是选择将凹槽部21作为特征结构区,但此实施方式则是选择将凸出部22作为特征结构区。在此情况下,压印程序改为将压印模具20的凸出部22对准基板10上的微透镜预定布局区域11,并同时令压印模具20的凹槽部21压印至该基板10上的周围区域12,使得该凸出部22上所涂布的亲液性的自组装单分子材料被压印至该基板10的微透镜预定布局区域11上,而令微透镜预定布局区域11具有亲液性。其余的程序步骤则与前述的实施方式完全相同。In addition to the above-mentioned embodiments, the present invention can also be changed to adopt lyophilic self-assembled single molecules instead, and change the material of the
总而言之,本发明提供了一种光电组件微透镜制造方法,其可应用于在光电组件上制造出多组微透镜;且其特点在于采用压印技术来将自组装单分子材料压印至基板,由此在基板上定义出微透镜预定布局区域及其范围,并利用喷印技术将透光性材料的溶液喷印至基板上的微透镜预定布局区域。当此透光性材料固化后,即可形成所需的微透镜。相较于先前技术,由于本光电组件微透镜制造方法不需采用制造过程较复杂且成本昂贵的制造过程技术,因此可使得制造过程更为简易而具有更高的成本经济效益。本发明因此比先前技术具有更佳的进步性及实用性。In a word, the present invention provides a method for manufacturing microlenses of optoelectronic components, which can be applied to manufacture multiple groups of microlenses on optoelectronic components; In this way, the predetermined microlens layout area and its range are defined on the substrate, and the solution of the light-transmitting material is spray-printed to the predetermined microlens layout area on the substrate by using the jet printing technology. After the light-transmitting material is cured, desired microlenses can be formed. Compared with the prior art, since the manufacturing method of the microlens of the optoelectronic component does not need to adopt complicated and expensive manufacturing process technology, the manufacturing process can be simpler and have higher cost-effectiveness. The present invention is therefore more progressive and practical than the prior art.
以上所述仅为本发明的较佳实施例,并非用以限定本发明的实质技术内容的范围。本发明的实质技术内容广义地定义于下述的申请专利范围中。若任何他人所完成的技术实体或方法与下述的申请专利范围所定义者为完全相同、或是为一种等效的变更,均将被视为涵盖于本发明的申请专利范围之中。The above descriptions are only preferred embodiments of the present invention, and are not intended to limit the scope of the substantive technical content of the present invention. The essential technical content of the present invention is broadly defined in the scope of the following patent applications. If the technical entity or method completed by any other person is exactly the same as that defined in the following patent application scope, or is an equivalent change, it will be deemed to be covered by the patent application scope of the present invention.
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EP1217426A1 (en) * | 2000-07-03 | 2002-06-26 | Seiko Epson Corporation | Method for manufacturing transmission screen and transmission screen |
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US20060012060A1 (en) * | 2004-07-16 | 2006-01-19 | Seiko Epson Corporation | Method for manufacturing microlens |
US7057832B2 (en) * | 2001-04-10 | 2006-06-06 | President And Fellows Of Harvard College | Microlens for projection lithography and method of preparation thereof |
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EP1217426A1 (en) * | 2000-07-03 | 2002-06-26 | Seiko Epson Corporation | Method for manufacturing transmission screen and transmission screen |
US7057832B2 (en) * | 2001-04-10 | 2006-06-06 | President And Fellows Of Harvard College | Microlens for projection lithography and method of preparation thereof |
CN1584743A (en) * | 2003-07-24 | 2005-02-23 | 三星电子株式会社 | Method of manufacturing micro-lens |
US20060012060A1 (en) * | 2004-07-16 | 2006-01-19 | Seiko Epson Corporation | Method for manufacturing microlens |
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