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CN100541235C - Anti-reflection structure, anti-reflection molded body, manufacturing method thereof, and automobile part - Google Patents

Anti-reflection structure, anti-reflection molded body, manufacturing method thereof, and automobile part Download PDF

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Publication number
CN100541235C
CN100541235C CNB2007100856233A CN200710085623A CN100541235C CN 100541235 C CN100541235 C CN 100541235C CN B2007100856233 A CNB2007100856233 A CN B2007100856233A CN 200710085623 A CN200710085623 A CN 200710085623A CN 100541235 C CN100541235 C CN 100541235C
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circle
raised portions
polygon
following expression
diameter
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CN101034165A (en
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野口雄司
福井孝之
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Nissan Motor Co Ltd
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Abstract

The invention discloses a kind of anti-reflection structure, comprise: with a plurality of bossings of the pitch arrangement shorter than the wavelength of luminous ray, each described bossing forms frustum basically and a kind of in the frusto-pyramidal basically, each described bossing comprises: i) form end circle and in be connected in this end circle end polygon the two one of basal surface, a) described end circle and b) circle of the polygonal described end of the external described end has the end diameter Db:100nm<Db<380nm that satisfies following formula separately, ii) form circle and in be connected to this in the circle last polygon the two one of upper surface, a) described circle and the b of going up) the external described polygonal described round last diameter Du:5nm<Du<50nm that satisfies following formula that has separately that.

Description

防反射结构、防反射模制体及其制造方法以及汽车部件 Anti-reflection structure, anti-reflection molded body, manufacturing method thereof, and automobile part

技术领域 technical field

本发明涉及一种防反射细微结构,该防反射细微结构在光的防反射能力和防划伤方面表现优异。而且,本发明涉及具有上述防反射细微结构的防反射模制体,其中防反射模制体作为不反射面板优选地用于诸如下述应用场合:i)车辆(包括汽车)、船只、飞机等的各种仪表,ii)显示装置等。进而,本发明涉及一种制造防反射模制体的方法。再进一步地,本发明涉及具有上述防反射细微结构的汽车部件。The present invention relates to an antireflection fine structure excellent in antireflection ability of light and anti-scratch. Furthermore, the present invention relates to an anti-reflection molded body having the above-mentioned anti-reflection microstructure, wherein the anti-reflection molded body is preferably used as a non-reflection panel for applications such as i) vehicles (including automobiles), boats, airplanes, etc. various instruments, ii) display devices, etc. Furthermore, the present invention relates to a method of manufacturing an antireflection molded body. Still further, the present invention relates to automobile parts having the above-mentioned anti-reflection fine structure.

背景技术 Background technique

作为图像依具体情况输入各种显示装置诸如液晶显示器、CRT显示器等的屏幕上,对于更为实际的例子,输入家用电视屏幕上的外界光或内部照明光等会显著降低图像的可视性。As images are input on the screens of various display devices such as liquid crystal displays, CRT displays, etc., depending on the specific situation, for a more practical example, the external light or internal illumination light input on the home TV screen will significantly reduce the visibility of the image.

而且,在汽车的司机座位处,设置诸如速度计、油表等各种仪表的显示部具有前表面,仪表的前盖装配于其中。依具体情况通过前窗(风挡)或侧窗作为图像输入到显示部上的车外景物使各种显示装置可视性变差。在这种情况下,在显示部上配设仪表罩,由此防止外界光投射到仪表显示器上。Also, at a driver's seat of an automobile, a display portion in which various gauges such as a speedometer, an oil gauge, etc. are provided has a front surface in which a front cover of the gauge is fitted. Depending on the situation, the scene outside the vehicle that is input as an image on the display unit through the front window (windshield) or the side window degrades the visibility of various display devices. In this case, the meter cover is arranged on the display unit, thereby preventing external light from being projected onto the meter display.

一种已知的用于防止上述光反射的结构包括多层防反射膜,该多层防反射膜包括具有不同折射指数的多层薄膜。然而,已公开日本专利申请No.2002-267815披露了一种防反射结构,其采用细微结构用于比上述多层防反射膜更进一步地降低反射率。A known structure for preventing the above-mentioned reflection of light includes a multilayer antireflection film including multilayer thin films having different refractive indices. However, Published Japanese Patent Application No. 2002-267815 discloses an antireflection structure employing a fine structure for further reducing reflectance than the above-mentioned multilayer antireflection film.

已公开日本专利申请No.2002-267815披露一种防反射结构,其中由透明原料制成的大量细微不规则结构(凸起和凹陷)形成在透明模制物件的表面上。形成均小于或等于光的波长的间距改变厚度方向上的光折射指数。Published Japanese Patent Application No. 2002-267815 discloses an antireflection structure in which a large number of fine irregularities (protrusions and depressions) made of a transparent material are formed on the surface of a transparent molded article. Forming the intervals each smaller than or equal to the wavelength of light changes the refractive index of light in the thickness direction.

发明内容 Contents of the invention

本发明的目的是提供一种防反射细微结构,其具有i)细微不规则的端头结构,该结构进行优化,由此防止细微不规则端头的损坏而不丧失光的防反射性,以及ii)防反射又防划伤的特性。An object of the present invention is to provide an anti-reflection microstructure having i) a micro-irregular tip structure optimized so as to prevent damage to the micro-irregular tip without losing light anti-reflection properties, and ii) Anti-reflection and anti-scratch properties.

本发明的另一目的是提供一种具有上述防反射细微结构的防反射模制体。Another object of the present invention is to provide an antireflection molded body having the above-mentioned antireflection fine structure.

本发明的再一目的是提供一种制造防反射模制体的方法。Still another object of the present invention is to provide a method of manufacturing an antireflection molded body.

本发明的进一步目的是提供一种具有上述防反射细微结构的汽车部件(如仪表前盖、窗口玻璃等)。A further object of the present invention is to provide an automobile part (such as a front cover of an instrument, a window glass, etc.) having the above-mentioned anti-reflection fine structure.

在极好地审查或研究之后,本发明人已经发现以下策略能实现上述目的,由此完成本发明:After excellent examination or research, the present inventors have found that the following strategies can achieve the above objects, thereby completing the present invention:

在不对防反射性造成有害影响的范围内,对细微不规则结构的各个细微凸起部分的最易损坏(即最可能被划伤)的头部端面进行平滑处理,其方式是细微不规则结构基本上形成为截头锥体或截头棱锥体。To the extent that anti-reflection properties are not adversely affected, the most vulnerable (i.e. most likely to be scratched) head end faces of the individual raised portions of the microirregularities are smoothed in such a way that the microirregularities Basically formed as a truncated cone or truncated pyramid.

根据本发明的第一方面,提供一种防反射结构,包括:以比可见光线的波长短的间距布置的多个凸起部分,每个所述凸起部分形成为基本上截头圆锥体和基本上截头棱锥体中的一种,每个所述凸起部分包括:i)形成为底圆和内接于该底圆中的底多边形二者之一的底表面,a)所述底圆和b)外接所述底多边形的所述底圆各自具有满足以下表达式的底直径Db:100nm<Db<380nm,ii)形成为上圆和内接于该上圆中的上多边形二者之一的上表面,a)所述上圆和b)外接所述上多边形的所述上圆各自具有满足以下表达式的上直径Du:5nm<Du<50nm,其中,每个所述凸起部分具有头部端面,该头部端面弯曲成限定满足下面表达式的曲率半径R:R≥[{(Du2-Du·Db)/(4·H)}2+(Du/2)2]1/2,其中H代表每个所述凸起部分的高度。According to a first aspect of the present invention, there is provided an antireflection structure comprising: a plurality of raised portions arranged at a pitch shorter than a wavelength of visible light, each of the raised portions being formed into a substantially frustoconical shape and one of substantially truncated pyramids, each of said raised portions comprising: i) a bottom surface formed as one of a base circle and a base polygon inscribed in the base circle, a) said base The circle and b) the base circle circumscribing the base polygon each have a base diameter Db satisfying the following expression: 100nm<Db<380nm, ii) formed as both an upper circle and an upper polygon inscribed in the upper circle One of the upper surfaces, a) the upper circle and b) the upper circle circumscribing the upper polygon each have an upper diameter Du satisfying the following expression: 5nm<Du<50nm, wherein each of the protrusions The part has a head end surface curved to define a radius of curvature R satisfying the following expression: R≥[{(Du 2 −Du·Db)/(4·H)} 2 +(Du/2) 2 ] 1/2 , where H represents the height of each raised portion.

优选地,彼此相邻的所述凸起部分的所述底表面互相接触。Preferably, the bottom surfaces of the raised portions adjacent to each other are in contact with each other.

优选地,每个所述底表面形成为下述中的任一种:i)无取向性的圆,ii)等边三角形,iii)矩形,以及iv)正六边形。Preferably, each of the bottom surfaces is formed in any one of i) a non-oriented circle, ii) an equilateral triangle, iii) a rectangle, and iv) a regular hexagon.

根据本发明第二方面,提供一种防反射模制体,在其第一表面和第二表面二者中的至少一个上包括防反射结构,该防反射结构包括:以比可见光线的波长短的间距布置的多个凸起部分,每个所述凸起部分形成为基本上截头圆锥体和基本上截头棱锥体中的一种,每个所述凸起部分包括:i)形成为底圆和内接于该底圆中的底多边形二者之一的底表面,a)所述底圆和b)外接所述底多边形的所述底圆各自具有满足以下表达式的底直径Db:100nm<Db<380nm,ii)形成为上圆和内接于该上圆中的上多边形二者之一的上表面,a)所述上圆和b)外接所述上多边形的所述上圆各自具有满足以下表达式的上直径Du:5nm<Du<50nm,其中,每个所述凸起部分具有头部端面,该头部端面弯曲成限定满足下面表达式的曲率半径R:R≥[{(Du2-Du·Db)/(4·H)}2+(Du/2)2]1/2,其中H代表每个所述凸起部分的高度。According to a second aspect of the present invention, there is provided an anti-reflection molded body comprising an anti-reflection structure on at least one of its first surface and second surface, the anti-reflection structure comprising: a plurality of raised portions arranged at intervals, each of said raised portions being formed into one of a substantially frustoconical shape and a substantially frustopyramidal shape, each said raised portion comprising: i) formed as The bottom surface of either a bottom circle and a bottom polygon inscribed in the bottom circle, a) the bottom circle and b) the bottom circle circumscribing the bottom polygon each have a bottom diameter Db satisfying the following expression : 100nm<Db<380nm, ii) an upper surface formed as one of an upper circle and an upper polygon inscribed in the upper circle, a) the upper circle and b) the upper surface circumscribing the upper polygon The circles each have an upper diameter Du satisfying the following expression: 5nm<Du<50nm, wherein each of said raised portions has a head end face curved to define a radius of curvature R satisfying the following expression: R≥ [{(Du 2 −Du·Db)/(4·H)} 2 +(Du/2) 2 ] 1/2 , where H represents the height of each of the raised portions.

优选地,所述防反射模制体基本上是透明的。Preferably, the antireflection molding is substantially transparent.

根据本发明第三方面,提供一种制造防反射模制体的方法,包括:I)制备:A)具有防反射结构的成形模具,该防反射结构包括:以比可见光线的波长短的间距布置的多个凸起部分,每个所述凸起部分形成为基本上截头圆锥体和基本上截头棱锥体中的一种,每个所述凸起部分包括:i)形成为底圆和内接于该底圆中的底多边形二者之一的底表面,a)所述底圆和b)外接所述底多边形的所述底圆各自具有满足以下表达式的底直径Db:100nm<Db<380nm,ii)形成为上圆和内接于该上圆中的上多边形二者之一的上表面,a)所述上圆和b)外接所述上多边形的所述上圆各自具有满足以下表达式的上直径Du:5nm<Du<50nm,其中,每个所述凸起部分具有头部端面,该头部端面弯曲成限定满足下面表达式的曲率半径R:R≥[{(Du2-Du·Db)/(4·H)}2+(Du/2)2]1/2,其中H代表每个所述凸起部分的高度,以及B)用于所述防反射模制体的基底;II)在所述成形模具和所述基底中的至少一个被加热的状态下将所述成形模具和所述基底相向压靠;以及III)在所述基底的第一表面和第二表面中的至少一个表面上形成所述防反射结构。According to a third aspect of the present invention, there is provided a method of manufacturing an anti-reflection molded body, comprising: I) preparing: A) a forming mold having an anti-reflection structure, the anti-reflection structure comprising: a plurality of raised portions arranged, each of said raised portions being formed into one of a substantially frustoconical shape and a substantially frustopyramidal shape, each said raised portion comprising: i) formed as a bottomed circle and the bottom surface of either of the bottom polygons inscribed in the bottom circle, a) the bottom circle and b) the bottom circle circumscribing the bottom polygon each have a base diameter Db satisfying the following expression: 100 nm <Db<380nm, ii) an upper surface formed as one of an upper circle and an upper polygon inscribed in the upper circle, a) the upper circle and b) the upper circle circumscribing the upper polygon are each have an upper diameter Du that satisfies the following expression: 5nm<Du<50nm, wherein each of the raised portions has a head end surface that is curved to define a radius of curvature R that satisfies the following expression: R≥[{ (Du 2 -Du·Db)/(4·H)} 2 +(Du/2) 2 ] 1/2 , where H represents the height of each of the raised portions, and B) for the anti-reflection the base of the molded body; II) pressing the forming die and the base against each other in a state where at least one of the forming die and the base is heated; and III) on the first surface of the base The anti-reflection structure is formed on at least one of the second surface and the second surface.

根据本发明第四方面,提供一种制造防反射模制体的方法,包括I)制备:A)具有防反射结构的成形模具,该防反射结构包括:以比可见光线的波长短的间距布置的多个凸起部分,每个所述凸起部分形成为基本上截头圆锥体和基本上截头棱锥体中的一种,每个所述凸起部分包括:i)形成为底圆和内接于该底圆中的底多边形二者之一的底表面,a)所述底圆和b)外接所述底多边形的所述底圆各自具有满足以下表达式的底直径Db:100nm<Db<380nm,ii)形成为上圆和内接于该上圆中的上多边形二者之一的上表面,a)所述上圆和b)外接所述上多边形的所述上圆各自具有满足以下表达式的上直径Du:5nm<Du<50nm,其中,每个所述凸起部分具有头部端面,该头部端面弯曲成限定满足下面表达式的曲率半径R:R≥[{(Du2-Du·Db)/(4·H)}2+(Du/2)2]1/2,其中H代表每个所述凸起部分的高度,以及B)用于所述防反射模制体的基底;II)在所述成形模具和所述基底之间设置有活性能量线固化树脂的情况下向所述成形模具和所述基底照射活性能量;以及III)在所述基底的第一表面和第二表面中的至少一个表面上形成所述防反射结构。According to a fourth aspect of the present invention, there is provided a method of manufacturing an anti-reflection molded body, comprising I) preparing: A) a forming mold having an anti-reflection structure, the anti-reflection structure comprising: a plurality of raised portions, each of which is formed as one of a substantially truncated cone and a substantially truncated pyramid, each of said raised portions comprising: i) formed as a base circle and The bottom surface of either of the bottom polygons inscribed in the bottom circle, a) the bottom circle and b) the bottom circle circumscribing the bottom polygon each have a base diameter Db satisfying the following expression: 100 nm<Db<380nm, ii) an upper surface formed as one of an upper circle and an upper polygon inscribed in the upper circle, a) the upper circle and b) the upper circle circumscribing the upper polygon each have An upper diameter Du satisfying the following expression: 5nm<Du<50nm, wherein each of the raised portions has a head end face curved to define a radius of curvature R satisfying the following expression: R≥[{( Du 2 −Du·Db)/(4·H)} 2 +(Du/2) 2 ] 1/2 , where H represents the height of each of the raised portions, and B) is used for the anti-reflection mode the base of the body; II) irradiating active energy to the forming die and the base with an active energy ray-curable resin disposed between the forming die and the base; and III) The antireflection structure is formed on at least one of the first surface and the second surface.

根据本发明第五方面,提供一种汽车部件,包括防反射结构,该防反射结构包括:以比可见光线的波长短的间距布置的多个凸起部分,每个所述凸起部分形成为基本上截头圆锥体和基本上截头棱锥体中的一种,每个所述凸起部分包括:i)形成为底圆和内接于该底圆中的底多边形二者之一的底表面,a)所述底圆和b)外接所述底多边形的所述底圆各自具有满足以下表达式的底直径Db:100nm<Db<380nm,ii)形成为上圆和内接于该上圆中的上多边形二者之一的上表面,a)所述上圆和b)外接所述上多边形的所述上圆各自具有满足以下表达式的上直径Du:5nm<Du<50nm,其中,每个所述凸起部分具有头部端面,该头部端面弯曲成限定满足下面表达式的曲率半径R:R≥[{(Du2-Du·Db)/(4·H)}2+(Du/2)2]1/2,其中H代表每个所述凸起部分的高度。According to a fifth aspect of the present invention, there is provided an automobile part comprising an anti-reflection structure comprising: a plurality of raised portions arranged at intervals shorter than the wavelength of visible rays, each of the raised portions being formed as one of substantially frustoconical and substantially frustopyramidal, each of said raised portions comprising: i) a base formed as one of a base circle and a base polygon inscribed in the base circle On the surface, a) the base circle and b) the base circle circumscribing the base polygon each have a base diameter Db satisfying the following expression: 100nm<Db<380nm, ii) formed as an upper circle and inscribed on the upper circle The upper surface of either of the upper polygons in the circle, a) the upper circle and b) the upper circle circumscribing the upper polygon each have an upper diameter Du satisfying the following expression: 5nm<Du<50nm, where , each of said convex portions has a head end surface curved to define a radius of curvature R satisfying the following expression: R≥[{(Du 2 −Du·Db)/(4·H)} 2 + (Du/2) 2 ] 1/2 , where H represents the height of each of the raised portions.

附图说明 Description of drawings

本发明的其他目的和特征根据参考附图所作的下述说明将得以理解。Other objects and features of the present invention will be understood from the following description made with reference to the accompanying drawings.

图1A为根据本发明的防反射细微结构的透视图,而图1B为根据本发明具有防反射细微结构的防反射模制体的透视图。FIG. 1A is a perspective view of an antireflection microstructure according to the present invention, and FIG. 1B is a perspective view of an antireflection molded body having an antireflection microstructure according to the present invention.

图2A显示了形成为截头锥体的防反射细微结构的细微凸起部分的测量位置。FIG. 2A shows the measurement positions of the fine convex portions of the antireflection fine structure formed as a truncated cone.

图2B显示了形成为截头棱锥体的防反射细微结构的细微凸起部分的测量位置。FIG. 2B shows the measurement positions of the fine convex portions of the antireflection fine structure formed as a truncated pyramid.

图3显示了防反射细微结构的细微凸起部分的上直径Du相对于平均反射率的曲线图。FIG. 3 is a graph showing the upper diameter Du of the fine convex portion of the anti-reflection microstructure versus the average reflectance.

图4A、图4B和图4C图示了防反射细微结构的细微凸起部分的头部端面的不同形式的示意结构。4A , 4B and 4C illustrate schematic structures of different forms of the head end faces of the fine protrusions of the anti-reflection microstructures.

图5A和图5B显示了根据本发明防反射细微结构的细微凸起部分的脊线的结构由相应n次线性表达式[1]和[2]来表示。5A and 5B show that the structures of the ridge lines of the fine raised portions of the anti-reflection microstructure according to the present invention are represented by the corresponding n-time linear expressions [1] and [2].

具体实施方式 Detailed ways

下文中,参考所附附图对本发明的各种实施例进行详细描述。Hereinafter, various embodiments of the present invention will be described in detail with reference to the accompanying drawings.

为了便于理解,以下说明中包含各种方向用语,如左、右、上、下、前、后等。然而,这种用语应理解为仅是参考其上显示了元件相应部分的附图而言的。For ease of understanding, the following descriptions contain various directional terms, such as left, right, up, down, front, back, etc. However, such terms should be understood only with reference to the drawings in which corresponding parts of the elements are shown.

此外,除非后文另外说明,否则用语“锥体”代表圆形锥体,以与用语“棱锥体”相区分,同时用语“截头锥体”代表圆形截头锥体,以与用语“截头棱锥体”相区分。Furthermore, unless otherwise stated hereinafter, the term "cone" means a circular cone, to be distinguished from the term "pyramid", while the term "frustum" means a circular frustum, to be distinguished from the term " Truncated pyramids" are distinguished.

根据本发明后文详细解释的包括防反射细微结构、其上应用防反射细微结构的防反射模制体、防反射模制体的制造方法、以上各项的实例(包括对比实例)等。Explained later in detail according to the present invention include the antireflection microstructure, the antireflection molded body on which the antireflection microstructure is applied, the manufacturing method of the antireflection molded body, examples (including comparative examples) of the above, and the like.

根据本发明的防反射细微结构包括为数众多的细微凸起部分,每个细微凸起部分形成为截头锥体或截头棱锥体。细微凸起部分以小于可见光线的波长的间距布置,细微凸起部分的底表面和上表面形成为各自具有特定尺寸的圆形或多边形。The antireflection fine structure according to the present invention includes a large number of fine raised portions each formed into a truncated pyramid or a truncated pyramid. The fine raised portions are arranged at a pitch smaller than the wavelength of visible rays, and the bottom surface and the upper surface of the fine raised portions are formed in circular or polygonal shapes each having a specific size.

图1为根据本发明实施例的防反射细微结构1的透视图,而图1B为具有防反射细微结构1的防反射模制体10(随后阐述)的透视图。本发明的防反射细微结构1具有这种结构:头部端面1pe形成于平截头锥体5或平截头棱锥体6(在图1中,为截头锥体),且为数众多的细微凸起部分1p以比可见光线的波长短的间距4布置。FIG. 1 is a perspective view of an antireflection fine structure 1 according to an embodiment of the present invention, and FIG. 1B is a perspective view of an antireflection molded body 10 (described later) having an antireflection fine structure 1 . The anti-reflection fine structure 1 of the present invention has such a structure that the head end face 1pe is formed on a frustum of a pyramid 5 or a frustum of a pyramid 6 (in FIG. The convex portions 1p are arranged at a pitch 4 shorter than the wavelength of visible rays.

因此,在厚度方向上,每个横截面处的光折射指数,该指数由在防反射细微结构1的厚度方向上每个阶梯面上的占有比(防反射细微结构1的原料相对于空气)确定,从空气折射指数到原料折射指数连续改变,由此产生光的防反射性。同时,每个细微凸起部分1p的头部端面1pe在后面描述的数值范围内整平。因此,防反射细微结构1即使与其他部件材料摩擦或碰撞,也不太可能损坏或划伤,满足光的防反射性和防划伤性,对防反射性的有害影响降至最低。Therefore, in the thickness direction, the light refraction index at each cross section is determined by the occupancy ratio of each step surface in the thickness direction of the antireflection fine structure 1 (raw material of the antireflection fine structure 1 with respect to air) It is determined that the refractive index of the air changes continuously from the refractive index of the material, thereby producing the anti-reflection property of light. At the same time, the head end surface 1pe of each finely raised portion 1p is flattened within a numerical range described later. Therefore, even if the anti-reflection microstructure 1 rubs or collides with other component materials, it is less likely to be damaged or scratched, satisfies light anti-reflection and anti-scratch properties, and minimizes harmful effects on anti-reflection properties.

图2A显示了截头锥体5的细微凸起部分1p的尺度。底表面2的底圆2bc的底直径Db和上表面3的上圆3uc的上直径Du分别满足100nm<Db<380nm和5nm<Du<50nm。FIG. 2A shows the dimensions of the finely raised portion 1 p of the frustum 5 . The bottom diameter Db of the bottom circle 2bc of the bottom surface 2 and the upper diameter Du of the upper circle 3uc of the upper surface 3 satisfy 100nm<Db<380nm and 5nm<Du<50nm, respectively.

而且,图2B显示了截头棱锥体6,典型地是四边形截头棱锥体6,的细微凸起部分1p的尺度。同样,底表面2的底多边形2bp的外接圆(即底圆2bc)的底直径Db和上表面3的上多边形3up的外接圆(即上圆3uc)的上直径Du分别满足100nm<Db<380nm和5nm<Du<50nm。Furthermore, FIG. 2B shows the dimensions of the finely raised portion 1p of the truncated pyramid 6, typically a quadrangular truncated pyramid 6. Similarly, the bottom diameter Db of the circumscribed circle (i.e. bottom circle 2bc) of the bottom polygon 2bp of the bottom surface 2 and the upper diameter Du of the circumscribed circle (i.e. the upper circle 3uc) of the upper polygon 3up of the upper surface 3 respectively satisfy 100nm<Db<380nm and 5nm<Du<50nm.

也就是,大于或等于380nm的底直径Db不能使相邻细微凸起部分1p之间的间距4短于可见光线的波长,导致光衍射并由此降低防反射性能力,其中380nm为可见光线的最短波长。That is, the base diameter Db greater than or equal to 380nm, where 380nm is the distance between visible rays, cannot make the interval 4 between adjacent fine convex portions 1p shorter than the wavelength of visible rays, resulting in light diffraction and thereby lowering the antireflection capability. shortest wavelength.

同时,对底直径Db的下限进行阐述。为了获得防反射性能力,通过使细微凸起部分1p的侧面以某一定程度倾斜,光折射指数在厚度方向的横截面上连续改变。由此,鉴于上表面3的上直径Du的上限50nm(后文详细阐述),小于或等于100nm的底直径Db由于侧面倾斜度不足而不能产生足够的防反射性能力。Meanwhile, the lower limit of the bottom diameter Db will be explained. In order to obtain the anti-reflection capability, by inclining the side faces of the fine convex portion 1p to a certain degree, the light refractive index is continuously changed in the cross-section in the thickness direction. Thus, in view of the upper limit of 50 nm of the upper diameter Du of the upper surface 3 (described in detail later), the bottom diameter Db of 100 nm or less cannot produce sufficient anti-reflection capability due to insufficient side slope.

图3是曲线图,显示了防反射细微结构1的每一个细微凸起部分1p的上表面3的上直径Du与平均反射率的对应关系。上直径Du越大,则平面比增加越多,导致更高的反射率。然而,如从图3中明显可见,大于或等于50nm的上直径Du使反射率快速增加。然而,在小于50nm的范围内,该曲线图基本上类似于未进行整平的情况(Du=0)。由此,细微凸起部分1p的上表面3的上直径Du设置为小于50nm。FIG. 3 is a graph showing the correspondence between the upper diameter Du of the upper surface 3 of each fine convex portion 1p of the antireflection microstructure 1 and the average reflectance. The larger the upper diameter Du, the more the planar ratio increases, resulting in higher reflectivity. However, as is evident from FIG. 3 , the upper diameter Du greater than or equal to 50 nm causes a rapid increase in reflectance. However, in the range smaller than 50 nm, the graph is substantially similar to the case without leveling (Du=0). Thus, the upper diameter Du of the upper surface 3 of the fine convex portion 1p is set to be smaller than 50 nm.

然而,在上述防反射细微结构1中,即使电子束刻板印刷(electron beamlithography)等也极难模制出小于或等于作为下限的5nm的上直径Du。However, in the above-mentioned antireflection fine structure 1, it is extremely difficult to mold an upper diameter Du smaller than or equal to 5 nm as a lower limit even by electron beam lithography or the like.

而且,为了进一步降低反射率,上述细微凸起部分1p的上表面3(头部端面1pe)优选地是诸如图4A中的拱顶形等曲面而非平面。上述曲面的曲率半径R优选地满足下面的表达式[X],其中H代表细微凸起部分1p的高度。Also, in order to further reduce the reflectivity, the upper surface 3 (head end surface 1pe) of the above-mentioned fine convex portion 1p is preferably a curved surface such as a dome shape in FIG. 4A rather than a flat surface. The curvature radius R of the above-mentioned curved surface preferably satisfies the following expression [X], where H represents the height of the fine convex portion 1p.

R≥[{(Du2-Du·Db)/(4·H)}2+(Du/2)2]1/2·····[X]R≥[{(Du 2 -Du·Db)/(4·H)} 2 +(Du/2) 2 ] 1/2 ·····[X]

也就是,上述表达式[X]的右侧代表从法线(穿过底表面2的外接圆的中心点)到防反射细微结构1的端头处的脊线12的垂线的长度,换句话说,该垂线的长度代表头部端面1pe的曲率半径。细微凸起部分1p的头部端面1pe的曲率半径R小于或等于如此算得的值使该端头变尖锐,根据具体情况会导致造成划伤的钩。That is, the right side of the above expression [X] represents the length of the perpendicular from the normal (the center point of the circumscribed circle passing through the bottom surface 2) to the ridge line 12 at the tip of the antireflection microstructure 1, expressed as In other words, the length of the perpendicular represents the radius of curvature of the end face 1pe of the head. The radius R of curvature R of the head end surface 1pe of the finely raised portion 1p being less than or equal to the value thus calculated makes the tip sharp, depending on the case, resulting in a scratch-causing hook.

这里,若头部端面1pe处于(包括在)具有上述曲率半径R的圆顶曲面中,则细微凸起部分1p的头部端面1pe的结构可以是可变的(无定形的),如图4B和4C所示。Here, if the head end surface 1pe is in (included) in the dome curved surface having the above-mentioned radius of curvature R, the structure of the head end surface 1pe of the fine convex portion 1p can be variable (amorphous), as shown in FIG. 4B and 4C.

本发明的细微凸起部分1p的结构,如前所述,为截头锥体或截头棱锥体。然而,在这种情况下,该结构不必限定为精确的截头锥体或精确的截头棱锥体,也就是,截头圆锥体的母线或截头棱锥体的脊线12并不局限于直的,而可以是弯曲的。母线或脊线12优选地是弯曲的,满足下述n-次线性表达式[1]和[2]。由此,防反射细微结构1的厚度方向上折射指数的变化变得更为平缓,由此更有效地降低光反射率。这里,线性表达式[1]和[2]的n-次优选地是在大于1小于或等于3的范围。The structure of the fine raised portion 1p of the present invention is, as mentioned above, a truncated pyramid or a truncated pyramid. In this case, however, the structure is not necessarily limited to a precise frustum or a precise frustum of a pyramid, that is, the generatrix of the frustum of the cone or the ridge 12 of the frustum of the pyramid are not limited to straight , but can be curved. The busbars or ridges 12 are preferably curved, satisfying the following n-sublinear expressions [1] and [2]. Thereby, the change in the refractive index in the thickness direction of the antireflection fine structure 1 becomes more gentle, thereby reducing the light reflectance more effectively. Here, the n-times of the linear expressions [1] and [2] are preferably in the range greater than 1 and less than or equal to 3.

参见图5A或图5B对以上内容进行更具体地阐述。在同过细微凸起部分1p中心的垂直截面中,以底侧限定为X轴而顶点11设置在Z轴线上的情况下,i)防反射细微结构1的每个细微凸起部分1p的高度H,ii)至顶点11的高度Ha,该高度由细微凸起部分1p的脊线12的延伸部限定,以及iii)底表面2的底圆2bc的底直径Db或外接底表面2的底多边形2bp的底圆2bc的底直径Db,结合起来,给出由下述n次线性表达式[1]和[2]之一表述的脊线12上的X坐标:Refer to FIG. 5A or FIG. 5B to elaborate the above content in more detail. In a vertical section through the center of the fine raised portion 1p, with the bottom side defined as the X axis and the apex 11 disposed on the Z axis, i) the height of each fine raised portion 1p of the antireflection fine structure 1 H, ii) the height Ha to the apex 11, which is defined by the extension of the ridge line 12 of the fine raised portion 1p, and iii) the base diameter Db of the base circle 2bc of the bottom surface 2 or the base polygon circumscribing the bottom surface 2 The base diameter Db of the base circle 2bc of 2bp, combined, gives the X-coordinate on the ridge 12 expressed by one of the following n-time linear expressions [1] and [2]:

X=(Db/2)×{1-(Z/Ha)n}    ·····[1]见图5AX=(Db/2)×{1-(Z/Ha) n }·····[1] See Figure 5A

Z={Ha/(Db/2)n}×Xn       ·····[2]见图5BZ={Ha/(Db/2) n }×X n [2] See Figure 5B

上文中,当顶点11设置在某一位置时,可加入用于修正的常数项。In the above, when the vertex 11 is set at a certain position, a constant term for correction can be added.

而且,从通过减少细微凸起部分1p之间的平面部分进一步降低反射率的观点来看,细微凸起部分1p的底表面2的结构优选地是这样的:相邻细微凸起部分1p的底表面2互相接触而不分开。Also, from the viewpoint of further reducing the reflectance by reducing the flat portion between the fine raised portions 1p, the structure of the bottom surface 2 of the fine raised portions 1p is preferably such that the bottoms of the adjacent fine raised portions 1p The surfaces 2 are in contact with each other without separation.

从上述观点来看,优选的是可以不带间隔地排列在平面上的i)无取向性的圆、ii)等边三角形、iii)矩形和iv)正六边形。From the above viewpoint, i) non-oriented circles, ii) equilateral triangles, iii) rectangles, and iv) regular hexagons that can be arranged on a plane without gaps are preferable.

将本发明的上述防反射细微结构1模制到基底15上,典型地模制到透明基底15的第一表面15A上,或优选模制到该基底的两个表面(第一表面15A和第二表面15B)上可形成防反射模制体10。将上述防反射模制体10应用于各种显示装置的面板、展示窗或展示柜等的透明面板等,可降低外界光或房间内照明的反射,有效地防止反射图像的内置成像,由此改善图像、显示器和内部陈列物件的可视性。The above-mentioned antireflection microstructure 1 of the present invention is molded onto a substrate 15, typically molded onto the first surface 15A of the transparent substrate 15, or preferably molded onto both surfaces of the substrate (the first surface 15A and the second surface 15A). The anti-reflection molded body 10 can be formed on the two surfaces 15B). Applying the above-mentioned anti-reflection molded body 10 to panels of various display devices, transparent panels such as display windows or display cabinets, etc., can reduce the reflection of external light or indoor lighting, and effectively prevent built-in imaging of reflected images, thereby Improved visibility of graphics, displays and interior displays.

而且,将上述防反射细微结构1(防反射模制体10)应用于各种部件,诸如汽车部件,特别是窗或车顶的玻璃、仪表前盖、车头灯、后蒸发器(rearfinisher)、用于诸如采用液晶等显示装置的前表面的薄膜等,可以产生相同的防反射效果。Moreover, the above-mentioned antireflection fine structure 1 (antireflection molded body 10) is applied to various parts such as automobile parts, especially glass of windows or roofs, bezels, headlights, rear finishers, The same anti-reflection effect can be produced in a film or the like used for the front surface of a display device such as a liquid crystal or the like.

下面描述根据本发明制造防反射模制体10的方法。制备具有上述大量细微凸起部分1p的成形模具。随后,在成形模具和基底15中的至少一个被加热的状态下相对靠压成形模具和基底15。由此,防反射细微结构1形成在基底15的第一表面15A和第二表面15B中的至少一个上。A method of manufacturing the antireflection molded body 10 according to the present invention will be described below. A forming die having the aforementioned large number of finely raised portions 1p was prepared. Subsequently, the forming die and the base 15 are relatively pressed against each other in a state where at least one of the forming die and the base 15 is heated. Thus, the antireflection fine structure 1 is formed on at least one of the first surface 15A and the second surface 15B of the substrate 15 .

可替换地,将活性能量线(active energy line)照射于其间设置有活性能量线固化树脂的成形模具和基底15,继之以活性能量线固化树脂的凝固(固化),由此在基底15的第一表面15A和第二表面15B中的至少一个上形成防反射细微结构1,由此形成防反射模制体10。Alternatively, active energy ray (active energy line) is irradiated to the forming mold and the base 15 with the active energy ray curable resin disposed therebetween, followed by solidification (hardening) of the active energy ray curable resin, whereby the base 15 The antireflection microstructure 1 is formed on at least one of the first surface 15A and the second surface 15B, thereby forming the antireflection molded body 10 .

优选地,用于上述基底15的典型材料是那些具有透明度的材料,具体而言,i)热塑性树脂,例如甲基丙烯酸甲酯、聚丙烯酸甲酯、聚乙烯、聚丙烯、聚乙烯醇、聚偏二氯乙烯、聚对苯二甲酸乙二醇酯、聚氯乙烯、聚苯乙烯、ABS树脂、AS树脂、丙烯酸树脂、聚酰胺、聚缩醛、聚对苯二甲酸丁二酯(polybuthylene terephthalate)、玻璃强化聚对苯二甲酸乙二醇酯、聚碳酸酯、改性聚苯醚、聚苯硫醚、聚醚醚酮、液晶聚合物、氟树脂、多芳基化合物(polyallate)、聚砜、聚醚砜、聚酰胺-酰亚胺、聚醚酰亚胺、热塑性聚酰亚胺等,ii)热固性树脂,例如酚醛树酯、三聚氰铵树脂、尿素树脂、环氧树脂、不饱和聚脂树脂、醇酸树脂、硅氧烷树脂、邻苯二甲酸二烯丙脂树脂、聚酰胺二马来酰亚胺、聚二酰胺三唑等,和iii)上述材料中两种或多种材料的组合。Preferably, typical materials for the above-mentioned substrate 15 are those having transparency, in particular, i) thermoplastic resins such as methyl methacrylate, polymethyl acrylate, polyethylene, polypropylene, polyvinyl alcohol, poly Vinylidene chloride, polyethylene terephthalate, polyvinyl chloride, polystyrene, ABS resin, AS resin, acrylic resin, polyamide, polyacetal, polybutylene terephthalate ), glass-reinforced polyethylene terephthalate, polycarbonate, modified polyphenylene ether, polyphenylene sulfide, polyether ether ketone, liquid crystal polymer, fluororesin, polyallate, poly Sulfone, polyethersulfone, polyamide-imide, polyetherimide, thermoplastic polyimide, etc., ii) thermosetting resins such as phenolic resins, melamine resins, urea resins, epoxy resins, not Saturated polyester resin, alkyd resin, silicone resin, diallyl phthalate resin, polyamide bismaleimide, polyamide triazole, etc., and iii) two or more of the above materials combination of materials.

而且,通过照射诸如紫外线等开始聚合并随后凝固(固化)的活性能量线固化树脂的实例包括:i)紫外线固化丙烯酸脲烷树脂(acryl urethaneresin)、紫外线固化甲基丙烯酸甲酯、紫外线固化聚丙烯酸甲酯、紫外线固化聚酯丙烯酸酯树脂(polyesteracrylate resin)、紫外线固化环氧丙烯酸酯树脂(epoxyacrylate resin)、紫外线固化多元醇丙烯酸酯树脂(polyol acrylateresin),紫外线固化环氧树脂等。在必要的时候可以使用通过照射活性能量线导致原子团(radicals)的聚合引发剂。而且,可加入如异氰酸盐这样的凝固剂(固化剂、硬化剂)来进一步增强凝固。这里使用的活性能量线的典型例子包括:紫外线、X射线、其他电子束、其他电磁波等,但并不具体局限于这些。Also, examples of active energy ray-curable resins that initiate polymerization by irradiation such as ultraviolet rays and are subsequently solidified (cured) include: i) ultraviolet-curable acryl urethaneresin, ultraviolet-curable methyl methacrylate, ultraviolet-curable polyacrylic acid Methyl ester, UV curable polyester acrylate resin, UV curable epoxy acrylate resin, UV curable polyol acrylate resin, UV curable epoxy resin, etc. A polymerization initiator that causes radicals by irradiating active energy rays may be used when necessary. Also, a coagulating agent (curing agent, hardener) such as isocyanate may be added to further enhance coagulation. Typical examples of active energy rays used here include ultraviolet rays, X-rays, other electron beams, other electromagnetic waves, etc., but are not specifically limited to these.

而且,诸如玻璃这样的无机透明材料也可用于基底15。在这种情况下,通过诸如下述方法i)用电子束等切割玻璃的表面,和ii)将融化的无机透明材料浇注入具有本发明防反射细微结构1的模具中,可在基底15的第一表面15A和第二表面15B中的至少一个上形成防反射细微结构1。Also, an inorganic transparent material such as glass may also be used for the substrate 15 . In this case, by a method such as i) cutting the surface of the glass with an electron beam, etc., and ii) pouring the melted inorganic transparent material into the mold having the antireflection fine structure 1 of the present invention, it can be formed on the surface of the substrate 15. Anti-reflection microstructures 1 are formed on at least one of the first surface 15A and the second surface 15B.

在上述后一方法中,在浇注融化的无机透明材料之后,如有必要,在上述材料冷却之前,靠压具有同样防反射结构的第二模具,以由此在基底15的第一表面15A和第二表面15B上形成防反射细微结构1。另外,如有必要,其两个表面由模具靠压的无机透明材料被加热至软化点,并随后施压来转印结构,以由此在基底15的第一表面15A和第二表面15B上形成防反射细微结构1。In the above-mentioned latter method, after pouring the melted inorganic transparent material, if necessary, before the above-mentioned material is cooled, a second mold having the same anti-reflection structure is pressed against, so that the first surface 15A of the substrate 15 and the first surface 15A of the base 15 and The anti-reflection fine structure 1 is formed on the second surface 15B. In addition, if necessary, the inorganic transparent material whose two surfaces are pressed against by the mold is heated to a softening point, and then pressure is applied to transfer the structure, to thereby be printed on the first surface 15A and the second surface 15B of the substrate 15 An anti-reflection fine structure 1 is formed.

实例example

后文中,根据以下实例对本发明进行更具体的阐述。然而,本发明并不限于这些实例。Hereinafter, the present invention will be described more specifically based on the following examples. However, the present invention is not limited to these examples.

(第一实例)(first instance)

通过市场上有售的电子束拉制设备(electron beam drawing device)形成的模子被加热至150℃。随后,在10MPa的压力下将该模子压靠于聚甲基丙烯酸甲酯基底15的两个面(第一表面15A和第二表面15B)上1小时,随后冷却至小于或等于70℃,以由此形成两个表面(第一表面15A和第二表面15B)均配设有防反射细微结构1的防反射模制体10,其中各细微凸起部分1p以六边形封围拼设状态设置(间距4:200nm)。每个细微凸起部分1p形成为截头锥体,具有底直径Db为200nm的底表面2,上直径Du为20nm的上表面3,400nm的高度H,和10.25nm的曲率半径R(在头部端面1pe处)。The mold formed by a commercially available electron beam drawing device is heated to 150°C. Subsequently, the mold was pressed against both faces (the first surface 15A and the second surface 15B) of the polymethylmethacrylate substrate 15 under a pressure of 10 MPa for 1 hour, and then cooled to 70° C. or less to The anti-reflection molded body 10 in which both surfaces (the first surface 15A and the second surface 15B) are provided with the anti-reflection microstructure 1 is thus formed, wherein each fine raised portion 1p encloses the spliced state in a hexagonal shape Set (pitch 4: 200nm). Each fine raised portion 1p is formed as a truncated cone having a bottom surface 2 with a base diameter Db of 200 nm, an upper surface 3 with an upper diameter Du of 20 nm, a height H of 400 nm, and a radius of curvature R (at the head) of 10.25 nm. end face 1pe).

(第二实例)(second instance)

采用通过同样的电子束拉制设备形成的模子实施上述第一实例那样的操作,以由此形成两个表面(第一表面15A和第二表面15B)均配设有防反射细微结构1的、包括聚甲基丙烯酸甲酯基底15的防反射模制体10,其中各细微凸起部分1p以六边形最紧密拼设状态设置(间距4:250nm)。每个细微凸起部分1p形成为截头锥体,具有底直径Db为250nm的底表面2,上直径Du为25nm的上表面3,250nm的高度H,以及头部端面1pe是平的。The same operation as that of the above-mentioned first example is carried out using a mold formed by the same electron beam drawing apparatus, to thereby form a , Antireflection molded body 10 including polymethyl methacrylate base 15 in which fine raised portions 1 p are arranged in a hexagonal closest fit (pitch 4: 250 nm). Each fine convex portion 1p is formed as a truncated cone having a bottom surface 2 with a base diameter Db of 250nm, an upper surface 3 with an upper diameter Du of 25nm, a height H of 250nm, and a head end surface 1pe that is flat.

(第三实例)(third instance)

采用通过同样的电子束拉制设备形成的模子实施上述第一实例那样的操作,以由此形成两个表面(第一表面15A和第二表面15B)均配设有防反射细微结构1的、包括聚甲基丙烯酸甲酯基底15的防反射模制体10,其中各细微凸起部分1p以六边形最紧密拼设状态设置(间距4:250nm)。每个细微凸起部分1p形成为截头锥体,具有底直径Db为250nm的底表面2,上直径Du为25nm的上表面3,250nm的高度H,以及13.71nm的曲率半径R(在头部端面1pe处)。The same operation as that of the above-mentioned first example is carried out using a mold formed by the same electron beam drawing apparatus, to thereby form a , Antireflection molded body 10 including polymethyl methacrylate base 15 in which fine raised portions 1 p are arranged in a hexagonal closest fit (pitch 4: 250 nm). Each fine raised portion 1p is formed as a truncated cone having a bottom surface 2 with a base diameter Db of 250 nm, an upper surface 3 with an upper diameter Du of 25 nm, a height H of 250 nm, and a radius of curvature R (at the head) of 13.71 nm. end face 1pe).

(第四实例)(fourth instance)

采用通过同样的电子束拉制设备形成的模子实施上述第一实例那样的操作,以由此形成两个表面(第一表面15A和第二表面15B)均配设有防反射细微结构1的、包括聚甲基丙烯酸甲酯基底15的防反射模制体10,其中各细微凸起部分1p以六边形最紧密拼设状态设置(间距4:177nm)。每个细微凸起部分1p形成为截头矩形棱锥体,具有(矩形外接圆的)底直径Db为250nm的底表面2,(矩形外接圆的)上直径Du为50nm的上表面3,500nm的高度H,以及25.50nm的曲率半径R(在头部端面1pe处)。The same operation as that of the above-mentioned first example is carried out using a mold formed by the same electron beam drawing apparatus, to thereby form a , Antireflection molded body 10 including polymethyl methacrylate base 15 in which each fine raised portion 1p is arranged in a hexagonal most closely packed state (pitch 4: 177 nm). Each fine raised portion 1p is formed as a truncated rectangular pyramid, having a bottom surface 2 with a base diameter Db of 250 nm (circle circumscribed in a rectangle), and an upper surface 3 with an upper diameter Du of 50 nm (circle circumscribed in a rectangle) of 500 nm. Height H, and a radius of curvature R of 25.50 nm (at the end face 1pe of the head).

(第五实例)(Fifth example)

采用通过同样的电子束拉制设备形成的模子实施上述第一实例那样的操作,以由此形成背面(第二表面15B)配设有防反射细微结构1的、包括聚甲基丙烯酸甲酯基底15的防反射模制体10,其中各细微凸起部分1p以六边形最紧密拼设状态设置(间距4:300nm)。每个细微凸起部分1p形成为截头锥体,具有底直径Db为300nm的底表面2,上直径Du为50nm的上表面3,600nm的高度H,以及25.54nm的曲率半径R(在头部端面1pe处)。The operation as in the above-mentioned first example was carried out using a mold formed by the same electron beam drawing apparatus, to thereby form a polymethylmethacrylate-comprising substrate provided with anti-reflection fine structures 1 on the back side (second surface 15B) 15. The antireflection molded body 10 in which the fine convex portions 1p are arranged in a hexagonal closest fit (pitch 4: 300 nm). Each fine raised portion 1p is formed as a truncated cone having a bottom surface 2 with a base diameter Db of 300 nm, an upper surface 3 with an upper diameter Du of 50 nm, a height H of 600 nm, and a radius of curvature R (at the head) of 25.54 nm. end face 1pe).

(第六实例)(sixth example)

采用通过同样的电子束拉制设备形成的模子实施上述第一实例那样的操作,以由此形成两个表面(第一表面15A和第二表面15B)均配设有防反射细微结构1的、包括聚甲基丙烯酸甲酯基底15的防反射模制体10,其中各细微凸起部分1p以六边形最紧密拼设状态设置(间距4:177nm)。每个细微凸起部分1p形成为截头矩形棱锥体,具有(矩形外接圆的)底直径Db为250nm的底表面2,(矩形外接圆的)上直径Du为30nm的上表面3,640nm的高度Ha(至顶点11),550nm的高度H,以及头部端面1pe是平的。在每个细微凸起部分1p中,从头部端面1pe的外周部分延伸至底表面2的外周部分的脊线12由下述具有次数n=1.2的线性表达式[1]给出。The same operation as that of the above-mentioned first example is carried out using a mold formed by the same electron beam drawing apparatus, to thereby form a , Antireflection molded body 10 including polymethyl methacrylate base 15 in which each fine raised portion 1p is arranged in a hexagonal most closely packed state (pitch 4: 177 nm). Each fine raised portion 1p is formed as a truncated rectangular pyramid, having a bottom surface 2 with a base diameter Db of 250 nm (circle circumscribed in a rectangle), and an upper surface 3 with an upper diameter Du of 30 nm (circle circumscribed in a rectangle) of 640 nm. The height Ha (to the apex 11), the height H of 550nm, and the head end face 1pe are flat. In each fine convex portion 1p, the ridge line 12 extending from the peripheral portion of the head end surface 1pe to the peripheral portion of the bottom surface 2 is given by the following linear expression [1] having degree n=1.2.

X=(Db/2)×{1-(Z/Ha)n}   ·····[1]X=(Db/2)×{1-(Z/Ha) n }·····[1]

(第七实例)(seventh example)

采用通过同样的电子束拉制设备形成的模子实施上述第一实例那样的操作,以由此形成两个表面(第一表面15A和第二表面15B)均配设有防反射细微结构1的、包括聚甲基丙烯酸甲酯基底15的防反射模制体10,其中各细微凸起部分1p以六边形最紧密拼设状态设置(间距4:177nm)。每个细微凸起部分1p形成为截头矩形棱锥体,具有(矩形外接圆的)底直径Db为250nm的底表面2,(矩形外接圆的)上直径Du为50nm的上表面3,720nm的高度Ha(至顶点11),550nm的高度H,以及50nm的曲率半径R(在头部端面1pe处)。在每个细微凸起部分1p中,从头部端面1pe的外周部分延伸至底表面2的外周部分的脊线12由具有次数n=1.2的线性表达式[1]给出。The same operation as that of the above-mentioned first example is carried out using a mold formed by the same electron beam drawing apparatus, to thereby form a , Antireflection molded body 10 including polymethyl methacrylate base 15 in which each fine raised portion 1p is arranged in a hexagonal most closely packed state (pitch 4: 177 nm). Each fine raised portion 1p is formed as a truncated rectangular pyramid, having a bottom surface 2 with a base diameter Db of 250 nm (circle circumscribed in a rectangle), an upper surface 3 with an upper diameter Du of 50 nm (circle circumscribed in a rectangle), and an upper surface 3 of 720 nm. Height Ha (to apex 11), height H of 550 nm, and radius of curvature R of 50 nm (at head end face 1pe). In each fine convex portion 1p, the ridge line 12 extending from the peripheral portion of the head end surface 1pe to the peripheral portion of the bottom surface 2 is given by the linear expression [1] having degree n=1.2.

(第八实例)(eighth example)

采用通过同样的电子束拉制设备形成的模子实施上述第一实例那样的操作,以由此形成两个表面(第一表面15A和第二表面15B)均配设有防反射细微结构1的、包括聚甲基丙烯酸甲酯基底15的防反射模制体10,其中各细微凸起部分1p以六边形最紧密拼设状态设置(间距4:212nm)。每个细微凸起部分1p形成为截头矩形棱锥体,具有(矩形外接圆的)底直径Db为300nm的底表面2,(矩形外接圆的)上直径Du为40nm的上表面3,400nm的高度Ha(至顶点11),300nm的高度H,以及45nm的曲率半径R(在头部端面1pe处)。在每个细微凸起部分1p中,从头部端面1pe的外周部分延伸至底表面2的外周部分的脊线12由下述具有次数n=2的线性表达式[2]给出:The same operation as that of the above-mentioned first example is carried out using a mold formed by the same electron beam drawing apparatus, to thereby form a , Antireflection molded body 10 comprising polymethyl methacrylate base 15 in which fine raised portions 1 p are arranged in a hexagonal closest fit (pitch 4: 212 nm). Each fine raised portion 1p is formed as a truncated rectangular pyramid, having a bottom surface 2 with a base diameter Db of 300 nm (circle circumscribed in a rectangle), an upper surface 3 with an upper diameter Du of 40 nm (circle circumscribed in a rectangle), and an upper surface 3 of 400 nm. Height Ha (to apex 11), height H of 300 nm, and radius of curvature R of 45 nm (at head end face 1 pe). In each fine convex portion 1p, the ridge line 12 extending from the outer peripheral portion of the head end surface 1pe to the outer peripheral portion of the bottom surface 2 is given by the following linear expression [2] with degree n=2:

Z={Ha/(Db/2)n}×Xn    ·····[2]Z={Ha/(Db/2) n }×X n ·····[2]

(第九实例)(ninth example)

采用通过同样的电子束拉制设备形成的模子实施上述第一实例那样的操作,以由此形成两个表面(第一表面15A和第二表面15B)均配设有防反射细微结构1的、包括聚甲基丙烯酸甲酯基底15的防反射模制体10,其中各细微凸起部分1p以六边形最紧密拼设状态设置(间距4:141nm)。每个细微凸起部分1p形成为截头矩形棱锥体,具有(矩形外接圆的)底直径Db为200nm的底表面2,(矩形外接圆的)上直径Du为10nm的上表面3,555nm的高度Ha(至顶点11),500nm的高度H,以及15nm的曲率半径R(在头部端面1pe处)。在每个细微凸起部分1p中,从头部端面1pe的外周部分延伸至底表面2的外周部分的脊线12由具有次数n=2的线性表达式[2]给出。The same operation as that of the above-mentioned first example is carried out using a mold formed by the same electron beam drawing apparatus, to thereby form a , Antireflection molded body 10 comprising polymethyl methacrylate base 15 in which each fine raised portion 1p is arranged in a hexagonal most closely packed state (pitch 4: 141 nm). Each fine raised portion 1p is formed as a truncated rectangular pyramid, having a bottom surface 2 with a base diameter Db of 200 nm (circle circumscribing the rectangle) and an upper surface 3 with an upper diameter Du of 10 nm (circle circumscribing the rectangle) of 555 nm. Height Ha (to apex 11), height H of 500nm, and radius of curvature R of 15nm (at head end face 1pe). In each fine convex portion 1p, the ridge line 12 extending from the peripheral portion of the head end surface 1pe to the peripheral portion of the bottom surface 2 is given by a linear expression [2] having degree n=2.

(第一比较实例)(first comparative example)

采用通过同样的电子束拉制设备形成的模子实施上述第一实例那样的操作,以由此形成两个表面(第一表面15A和第二表面15B)均配设有防反射细微结构1的、包括聚甲基丙烯酸甲酯基底15的防反射模制体10,其中各细微凸起部分1p以六边形最紧密拼设状态设置(间距4:250nm)。每个细微凸起部分1p形成为锥体,具有底直径Db为250nm的底表面2和750nm的高度H。The same operation as that of the above-mentioned first example is carried out using a mold formed by the same electron beam drawing apparatus, to thereby form a , Antireflection molded body 10 including polymethyl methacrylate base 15 in which fine raised portions 1 p are arranged in a hexagonal closest fit (pitch 4: 250 nm). Each fine raised portion 1p is formed into a cone having a bottom surface 2 having a bottom diameter Db of 250 nm and a height H of 750 nm.

(第二比较实例)(second comparative example)

采用通过同样的电子束拉制设备形成的模子实施上述第一实例那样的操作,以由此形成两个表面(第一表面15A和第二表面15B)均配设有防反射细微结构1的、包括聚甲基丙烯酸甲酯基底15的防反射模制体10,其中各细微凸起部分1p以六边形最紧密拼设状态设置(间距4:400nm)。每个细微凸起部分1p形成为截头锥体,具有底直径Db为400nm的底表面2,上直径Du为25nm的上表面3,800nm的高度H,以及12.84nm的曲率半径R(在头部端面1pe处)。The same operation as that of the above-mentioned first example is carried out using a mold formed by the same electron beam drawing apparatus, to thereby form a , Antireflection molded body 10 comprising polymethyl methacrylate base 15 in which fine raised portions 1p are arranged in a hexagonal closest fit (pitch 4: 400 nm). Each fine raised portion 1p is formed as a truncated cone having a bottom surface 2 with a base diameter Db of 400 nm, an upper surface 3 with an upper diameter Du of 25 nm, a height H of 800 nm, and a radius of curvature R (at the head) of 12.84 nm. end face 1pe).

(第三比较实例)(Third comparative example)

采用通过同样的电子束拉制设备形成的模子实施上述第一实例那样的操作,以由此形成两个表面(第一表面15A和第二表面15B)均配设有防反射细微结构1的、包括聚甲基丙烯酸甲酯基底15的防反射模制体10,其中各细微凸起部分1p以六边形最紧密拼设状态设置(间距4:250nm)。每个细微凸起部分1p形成为截头锥体,具有底直径Db为250nm的底表面2,上直径Du为100nm的上表面3,500nm的高度H,以及50.56nm的曲率半径R(在头部端面1pe处)。The same operation as that of the above-mentioned first example is carried out using a mold formed by the same electron beam drawing apparatus, to thereby form a , Antireflection molded body 10 including polymethyl methacrylate base 15 in which fine raised portions 1 p are arranged in a hexagonal closest fit (pitch 4: 250 nm). Each fine raised portion 1p is formed as a truncated cone having a bottom surface 2 with a base diameter Db of 250 nm, an upper surface 3 with an upper diameter Du of 100 nm, a height H of 500 nm, and a radius of curvature R (at the head) of 50.56 nm. end face 1pe).

[评价测试方法][Evaluation test method]

通过上述实例和比较实例获得的上述防反射模制体10,就平均反射率和防划伤方面经受以下评价测试。表1显示了评价测试结果以及每个防反射模制体10的规格。The above-mentioned antireflection molded bodies 10 obtained by the above-mentioned Examples and Comparative Examples were subjected to the following evaluation tests in terms of average reflectance and scratch resistance. Table 1 shows the evaluation test results and the specifications of each antireflection molded body 10 .

(1)平均反射率测量(1) Average reflectance measurement

可变角度分光光度计(由Otsuka电子有限公司制造)用来在光入射角度为0且测量角度为0的条件下测量每个防反射模制体10的反射率。测量在从380nm至780nm的阶式波长(10nm)下进行。测量结果的平均值定义为平均反射率。A variable angle spectrophotometer (manufactured by Otsuka Electronics Co., Ltd.) was used to measure the reflectance of each antireflection molded body 10 under the condition that the light incident angle was 0 and the measurement angle was 0. Measurements were performed at stepwise wavelengths (10 nm) from 380 nm to 780 nm. The average value of the measurement results is defined as the average reflectance.

(2)防划伤测试(2) Anti-scratch test

根据JIS K5600-5-4(其中JIS表示日本工业标准)中规定的铅笔硬度测试,HB铅笔用来以1kg的载荷刻划测试样件。此后,通过视觉检查,具有划痕的样件评价为“不可接受”,而没有划痕的评价为“可接受”。According to the pencil hardness test specified in JIS K5600-5-4 (where JIS stands for Japanese Industrial Standard), an HB pencil is used to scratch the test specimen with a load of 1kg. Thereafter, by visual inspection, the samples with scratches were evaluated as "unacceptable", and the samples without scratches were evaluated as "acceptable".

除了防反射细微结构1的规格之外,表1还显示了评价测试结果,包括平均反射率和防划伤性。In addition to the specifications of the anti-reflective microstructure 1, Table 1 also shows evaluation test results including average reflectance and scratch resistance.

作为结果,具有这样一种结构使得防反射细微结构1的每个细微凸起部分p基本形成为截头锥体或截头棱锥体且底直径Db和上直径Du均处于某一范围内的第一实例至第九实例显示出:i)在可见光线波长下反射率低、和ii)优异的防划伤性。As a result, the first first having a structure such that each fine convex portion p of the antireflection fine structure 1 is substantially formed into a truncated cone or a truncated pyramid with the base diameter Db and the upper diameter Du within a certain range Examples to Ninth Examples show: i) low reflectivity at visible light wavelengths, and ii) excellent scratch resistance.

相反,根据第一比较实例,设置有细微凸起部分1p形成为圆锥体(代替截头圆锥体)的防反射细微结构1的防反射模制体10,在防反射性方面表现优异,但很可能导致划伤,因此不实用(不可接受)。On the contrary, according to the first comparative example, the antireflection molded body 10 provided with the antireflection fine structure 1 in which the fine convex portion 1p is formed into a cone (instead of a truncated cone) is excellent in antireflection, but is very poor. May cause scratches and is therefore impractical (unacceptable).

而且,根据第二比较实例的防反射模制体10,尽管细微凸起部分1p形成为截头圆锥体同时底表面2(底直径Db)大到使间距4(=400nm)大于可见光线的最短波长,防划伤性优异但防反射能力差。Also, according to the antireflection molded body 10 of the second comparative example, although the fine convex portion 1p is formed in a frustoconical shape while the bottom surface 2 (base diameter Db) is so large that the pitch 4 (=400nm) is larger than the shortest of visible rays wavelength, excellent scratch resistance but poor anti-reflection ability.

进而,根据第三比较实例的防反射模制体10,尽管细微凸起部分1p形成为截头圆锥体同时具有极大的上表面3(上直径Du),防划伤性优异但防反射能力差。Furthermore, according to the antireflection molded body 10 of the third comparative example, although the fine convex portion 1p is formed in a truncated cone while having an extremely large upper surface 3 (upper diameter Du), the scratch resistance is excellent but the antireflection capability Difference.

尽管通过参考特定实施例对本发明进行了阐述,但本发明并不限于上面描述的实施例。根据上面的教示,本领域技术人员可对上述实施例作修改和改变。Although the present invention has been described with reference to specific embodiments, the present invention is not limited to the embodiments described above. Based on the above teachings, those skilled in the art can make modifications and changes to the above embodiments.

本发明基于在先日本专利申请No.P2006-054262(于2006年3月1日在日本递交)和No.P2006-293705(于2006年10月30日在日本递交)。要求作为优先权的日本专利申请No.P2006-054262和No.P2006-293705的全部内容合并于此引作参考,以便防范译文错误或省略部分。The present invention is based on prior Japanese Patent Applications No. P2006-054262 (filed in Japan on March 1, 2006) and No. P2006-293705 (filed in Japan on October 30, 2006). The entire contents of Japanese Patent Applications No. P2006-054262 and No. P2006-293705 from which priority is claimed are hereby incorporated by reference in order to prevent translation errors or omissions.

Figure C20071008562300191
Figure C20071008562300191

Claims (8)

1、一种防反射结构,包括:1. An anti-reflection structure, comprising: 以比可见光线的波长短的间距布置的多个凸起部分,每个所述凸起部分形成为基本上截头圆锥体和基本上截头棱锥体中的一种,每个所述凸起部分包括:a plurality of raised portions arranged at intervals shorter than the wavelength of visible rays, each of said raised portions being formed in one of a substantially frustoconical shape and a substantially frustopyramidal shape, each said raised portion Sections include: i)形成为底圆和内接于该底圆中的底多边形二者之一的底表面,a)所述底圆和b)外接所述底多边形的所述底圆各自具有满足以下表达式的底直径Db:i) a bottom surface formed as one of a bottom circle and a bottom polygon inscribed in the bottom circle, a) the bottom circle and b) the bottom circle circumscribing the bottom polygon each have a value satisfying the following expression The bottom diameter Db of: 100nm<Db<380nm,100nm<Db<380nm, ii)形成为上圆和内接于该上圆中的上多边形二者之一的上表面,a)所述上圆和b)外接所述上多边形的所述上圆各自具有满足以下表达式的上直径Du:ii) an upper surface formed as one of an upper circle and an upper polygon inscribed in the upper circle, each of a) the upper circle and b) the upper circle circumscribing the upper polygon has the following expression The upper diameter Du: 5nm<Du<50nm;5nm<Du<50nm; 其中,每个所述凸起部分具有头部端面,该头部端面弯曲成限定满足下面表达式的曲率半径R:Wherein, each of said raised portions has a head end surface curved to define a radius of curvature R satisfying the following expression: R≥[{(Du2-Du·Db)/(4·H)}2+(Du/2)2]1/2 R≥[{(Du 2 -Du·Db)/(4·H)} 2 +(Du/2) 2 ] 1/2 其中H代表每个所述凸起部分的高度。wherein H represents the height of each of said raised portions. 2、根据权利要求1所述的防反射结构,其中2. The anti-reflection structure according to claim 1, wherein 彼此相邻的所述凸起部分的所述底表面互相接触。The bottom surfaces of the raised portions adjacent to each other are in contact with each other. 3、根据权利要求2所述的防反射结构,其中3. The anti-reflection structure according to claim 2, wherein 每个所述底表面形成为下述中的任一种:Each said bottom surface is formed as any of the following: i)无取向性的圆,i) a non-oriented circle, ii)等边三角形,ii) an equilateral triangle, iii)矩形,以及iii) a rectangle, and iv)正六边形。iv) regular hexagon. 4、一种防反射模制体,该防反射模制体在其第一表面和第二表面中的至少一个表面上包括:4. An anti-reflection molded body comprising on at least one of its first surface and second surface: 防反射结构,该防反射结构包括:Anti-reflection structure, the anti-reflection structure includes: 以比可见光线的波长短的间距布置的多个凸起部分,每个所述凸起部分形成为基本上截头圆锥体和基本上截头棱锥体中的一种,每个所述凸起部分包括:a plurality of raised portions arranged at intervals shorter than the wavelength of visible rays, each of said raised portions being formed in one of a substantially frustoconical shape and a substantially frustopyramidal shape, each said raised portion Sections include: i)形成为底圆和内接于该底圆中的底多边形二者之一的底表面,a)所述底圆和b)外接所述底多边形的所述底圆各自具有满足以下表达式的底直径Db:i) a bottom surface formed as one of a bottom circle and a bottom polygon inscribed in the bottom circle, a) the bottom circle and b) the bottom circle circumscribing the bottom polygon each have a value satisfying the following expression The bottom diameter Db of: 100nm<Db<380nm,100nm<Db<380nm, ii)形成为上圆和内接于该上圆中的上多边形二者之一的上表面,a)所述上圆和b)外接所述上多边形的所述上圆各自具有满足以下表达式的上直径Du:ii) an upper surface formed as one of an upper circle and an upper polygon inscribed in the upper circle, each of a) the upper circle and b) the upper circle circumscribing the upper polygon has the following expression The upper diameter Du: 5nm<Du<50nm5nm<Du<50nm 其中,每个所述凸起部分具有头部端面,该头部端面弯曲成限定满足下面表达式的曲率半径R:Wherein, each of said raised portions has a head end surface curved so as to define a radius of curvature R satisfying the following expression: R≥[{(Du2-Du·Db)/(4·H)}2+(Du/2)2]1/2 R≥[{(Du 2 -Du·Db)/(4·H)} 2 +(Du/2) 2 ] 1/2 其中H代表每个所述凸起部分的高度。wherein H represents the height of each of said raised portions. 5、根据权利要求4所述的防反射模制体,其中所述防反射模制体基本上是透明的。5. The antireflection molded body according to claim 4, wherein the antireflection molded body is substantially transparent. 6、一种制造防反射模制体的方法,包括:6. A method of manufacturing an anti-reflective molded body, comprising: I)制备:I) Preparation: A)具有防反射结构的成形模具,该防反射结构包括:A) A forming die with an anti-reflection structure, the anti-reflection structure comprising: 以比可见光线的波长短的间距布置的多个凸起部分,每个所述凸起部分形成为基本上截头圆锥体和基本上截头棱锥体中的一种,每个所述凸起部分包括:a plurality of raised portions arranged at intervals shorter than the wavelength of visible rays, each of said raised portions is formed in one of a substantially frustoconical shape and a substantially truncated pyramidal shape, each of said raised portions Sections include: i)形成为底圆和内接于该底圆中的底多边形二者之一的底表面,a)所述底圆和b)外接所述底多边形的所述底圆各自具有满足以下表达式的底直径Db:i) a bottom surface formed as one of a bottom circle and a bottom polygon inscribed in the bottom circle, a) the bottom circle and b) the bottom circle circumscribing the bottom polygon each have a value satisfying the following expression The bottom diameter Db of: 100nm<Db<380nm,100nm<Db<380nm, ii)形成为上圆和内接于该上圆中的上多边形二者之一的上表面,a)所述上圆和b)外接所述上多边形的所述上圆各自具有满足以下表达式的上直径Du:ii) an upper surface formed as one of an upper circle and an upper polygon inscribed in the upper circle, each of a) the upper circle and b) the upper circle circumscribing the upper polygon has the following expression The upper diameter Du: 5nm<Du<50nm,5nm<Du<50nm, 其中,每个所述凸起部分具有头部端面,该头部端面弯曲成限定满足下面表达式的曲率半径R:Wherein, each of said raised portions has a head end surface curved to define a radius of curvature R satisfying the following expression: R≥[{(Du2-Du·Db)/(4·H)}2+(Du/2)2]1/2 R≥[{(Du 2 -Du·Db)/(4·H)} 2 +(Du/2) 2 ] 1/2 其中H代表每个所述凸起部分的高度,以及where H represents the height of each of the raised portions, and B)用于所述防反射模制体的基底;B) a substrate for the antireflection molding; II)在所述成形模具和所述基底中的至少一个被加热的状态下将所述成形模具和所述基底相向压靠;以及II) pressing the forming die and the substrate against each other in a state where at least one of the forming die and the substrate is heated; and III)在所述基底的第一表面和第二表面中的至少一个表面上形成所述防反射结构。III) forming the antireflection structure on at least one of the first surface and the second surface of the substrate. 7、一种制造防反射模制体的方法,包括:7. A method of manufacturing an anti-reflective molded body, comprising: I)制备:I) preparation: A)具有防反射结构的成形模具,该防反射结构包括:A) A forming die with an anti-reflection structure, the anti-reflection structure comprising: 以比可见光线的波长短的间距布置的多个凸起部分,每个所述凸起部分形成为基本上截头圆锥体和基本上截头棱锥体中的一种,每个所述凸起部分包括:a plurality of raised portions arranged at intervals shorter than the wavelength of visible rays, each of said raised portions being formed in one of a substantially frustoconical shape and a substantially frustopyramidal shape, each said raised portion Sections include: i)形成为底圆和内接于该底圆中的底多边形二者之一的底表面,a)所述底圆和b)外接所述底多边形的所述底圆各自具有满足以下表达式的底直径Db:i) a bottom surface formed as one of a bottom circle and a bottom polygon inscribed in the bottom circle, a) the bottom circle and b) the bottom circle circumscribing the bottom polygon each have a value satisfying the following expression The bottom diameter Db of: 100nm<Db<380nm,100nm<Db<380nm, ii)形成为上圆和内接于该上圆中的上多边形二者之一的上表面,a)所述上圆和b)外接所述上多边形的所述上圆各自具有满足以下表达式的上直径Du:ii) an upper surface formed as one of an upper circle and an upper polygon inscribed in the upper circle, each of a) the upper circle and b) the upper circle circumscribing the upper polygon has the following expression The upper diameter Du: 5nm<Du<50nm,5nm<Du<50nm, 其中,每个所述凸起部分具有头部端面,该头部端面弯曲成限定满足下面表达式的曲率半径R:Wherein, each of said raised portions has a head end surface curved to define a radius of curvature R satisfying the following expression: R≥[{(Du2-Du·Db)/(4·H)}2+(Du/2)2]1/2 R≥[{(Du 2 -Du·Db)/(4·H)} 2 +(Du/2) 2 ] 1/2 其中H代表每个所述凸起部分的高度,以及where H represents the height of each of the raised portions, and B)用于所述防反射模制体的基底;B) a substrate for the antireflection molding; II)在所述成形模具和所述基底之间设置有活性能量线固化树脂的情况下向所述成形模具和所述基底照射活性能量;以及II) irradiating active energy to the forming die and the substrate with an active energy ray-curable resin disposed between the forming die and the substrate; and III)在所述基底的第一表面和第二表面中的至少一个表面上形成所述防反射结构。III) forming the antireflection structure on at least one of the first surface and the second surface of the substrate. 8、一种汽车部件,包括:8. An automobile part, comprising: 防反射结构,该防反射结构包括:Anti-reflection structure, the anti-reflection structure includes: 以比可见光线的波长短的间距布置的多个凸起部分,每个所述凸起部分形成为基本上截头圆锥体和基本上截头棱锥体中的一种,每个所述凸起部分包括:a plurality of raised portions arranged at intervals shorter than the wavelength of visible rays, each of said raised portions being formed in one of a substantially frustoconical shape and a substantially frustopyramidal shape, each said raised portion Sections include: i)形成为底圆和内接于该底圆中的底多边形二者之一的底表面,a)所述底圆和b)外接所述底多边形的所述底圆各自具有满足以下表达式的底直径Db:i) a bottom surface formed as one of a bottom circle and a bottom polygon inscribed in the bottom circle, a) the bottom circle and b) the bottom circle circumscribing the bottom polygon each have a value satisfying the following expression The bottom diameter Db of: 100nm<Db<380nm,100nm<Db<380nm, ii)形成为上圆和内接于该上圆中的上多边形二者之一的上表面,a)所述上圆和b)外接所述上多边形的所述上圆各自具有满足以下表达式的上直径Du:ii) an upper surface formed as one of an upper circle and an upper polygon inscribed in the upper circle, each of a) the upper circle and b) the upper circle circumscribing the upper polygon has the following expression The upper diameter Du: 5nm<Du<50nm,5nm<Du<50nm, 其中,每个所述凸起部分具有头部端面,该头部端面弯曲成限定满足下面表达式的曲率半径R:Wherein, each of said raised portions has a head end surface curved to define a radius of curvature R satisfying the following expression: R≥[{(Du2-Du·Db)/(4·H)}2+(Du/2)2]1/2 R≥[{(Du 2 -Du·Db)/(4·H)} 2 +(Du/2) 2 ] 1/2 其中H代表每个所述凸起部分的高度。wherein H represents the height of each of said raised portions.
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