CN100499135C - Active element array substrate - Google Patents
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- CN100499135C CN100499135C CNB2005101081030A CN200510108103A CN100499135C CN 100499135 C CN100499135 C CN 100499135C CN B2005101081030 A CNB2005101081030 A CN B2005101081030A CN 200510108103 A CN200510108103 A CN 200510108103A CN 100499135 C CN100499135 C CN 100499135C
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- 239000000758 substrate Substances 0.000 title claims abstract description 55
- 239000010409 thin film Substances 0.000 claims description 24
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 4
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 claims description 4
- 238000009826 distribution Methods 0.000 claims 14
- 229910000611 Zinc aluminium Inorganic materials 0.000 claims 1
- HXFVOUUOTHJFPX-UHFFFAOYSA-N alumane;zinc Chemical compound [AlH3].[Zn] HXFVOUUOTHJFPX-UHFFFAOYSA-N 0.000 claims 1
- 230000002159 abnormal effect Effects 0.000 description 3
- JYMITAMFTJDTAE-UHFFFAOYSA-N aluminum zinc oxygen(2-) Chemical compound [O-2].[Al+3].[Zn+2] JYMITAMFTJDTAE-UHFFFAOYSA-N 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 230000003796 beauty Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- JAONJTDQXUSBGG-UHFFFAOYSA-N dialuminum;dizinc;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Al+3].[Al+3].[Zn+2].[Zn+2] JAONJTDQXUSBGG-UHFFFAOYSA-N 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
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Abstract
Description
技术领域 technical field
本发明涉及一种元件阵列基板,且特别涉及一种有源元件阵列基板。The invention relates to an element array substrate, and in particular to an active element array substrate.
背景技术 Background technique
由于显示器的需求与日俱增,因此业界全力投入相关显示器的发展。其中,阴极射线管(cathode raytube,简称CRT)因具有优异的显示质量与技术成熟性,因此长年独占显示器市场。然而,近来由于绿色环保概念的兴起对于其能源消耗较大与产生辐射量较大的特性,加上其产品扁平化空间有限,因此无法满足市场对于轻、薄、短、小、美以及低消耗功率的市场趋势。因此,具有高画质、空间利用效率佳、低消耗功率、无辐射等优越特性之薄膜晶体管液晶显示器(thin filmtransistor liquid crystal display,简称TFT-LCD)已逐渐成为市场之主流。Due to the increasing demand for displays, the industry is fully committed to the development of related displays. Among them, the cathode ray tube (cathode ray tube, referred to as CRT) has been monopolizing the display market for many years because of its excellent display quality and technological maturity. However, due to the rise of the concept of green environmental protection, the characteristics of large energy consumption and large radiation, and the limited space for flat products, it cannot meet the market's requirements for lightness, thinness, shortness, smallness, beauty and low consumption. Power Market Trends. Therefore, thin film transistor liquid crystal displays (thin film transistor liquid crystal displays, referred to as TFT-LCDs), which have superior characteristics such as high image quality, good space utilization efficiency, low power consumption, and no radiation, have gradually become the mainstream of the market.
图1为一种公知的薄膜晶体管阵列基板的俯视示意图。请参照图1,此公知的薄膜晶体管阵列基板100包括基板110、多条扫描配线120、多条数据配线130、多条共享配线140、多个薄膜晶体管150与多个像素电极160。其中,这些扫描配线120与这些数据配线130设置于基板100上,并于基板110上划分出多个像素区域110a。这些薄膜晶体管150分别设置于这些像素区域110a内,且各薄膜晶体管150电连接至对应之扫描配线120与数据配线130。这些像素电极160分别设置于这些像素区域110a内,而各像素电极160电连接至对应之薄膜晶体管150。FIG. 1 is a schematic top view of a known thin film transistor array substrate. Referring to FIG. 1 , the known thin film transistor array substrate 100 includes a substrate 110 , a plurality of scanning wires 120 , a plurality of data wires 130 , a plurality of shared wires 140 , a plurality of thin film transistors 150 and a plurality of pixel electrodes 160 . Wherein, the scan wires 120 and the data wires 130 are disposed on the substrate 100 , and define a plurality of pixel regions 110 a on the substrate 110 . The thin film transistors 150 are respectively disposed in the pixel regions 110 a, and each thin film transistor 150 is electrically connected to the corresponding scanning wiring 120 and data wiring 130 . The pixel electrodes 160 are respectively disposed in the pixel regions 110 a, and each pixel electrode 160 is electrically connected to the corresponding thin film transistor 150 .
这些共享配线140与这些扫描配线120大致平行,且这些共享配线140与这些扫描配线120交替设置于基板110上。各共享配线140具有自两侧边缘向外延伸之多条分支140a,其中这些分支140a分别与这些数据配线130相邻。此外,由于这些分支140a与各像素电极160之边缘有部分重叠,因此这些分支140a不仅能够增加储存电容值Cst,也能遮住各像素电极160与这些数据配线130之间的配向异常区。然而,由于这些分支140a具有最小线宽的限制以及公知的薄膜晶体管阵列基板100中各层对位精度的考虑,因此公知的薄膜晶体管阵列基板100的开口率也就无法进一步增加。The shared wires 140 are substantially parallel to the scan wires 120 , and the shared wires 140 and the scan wires 120 are arranged alternately on the substrate 110 . Each shared wire 140 has a plurality of branches 140a extending outward from two edges, wherein the branches 140a are respectively adjacent to the data wires 130 . In addition, since the branches 140a partially overlap with the edges of the pixel electrodes 160 , the branches 140a can not only increase the storage capacitance Cst, but also cover the abnormal alignment regions between the pixel electrodes 160 and the data lines 130 . However, because the branches 140a have the limitation of the minimum line width and the consideration of alignment accuracy of each layer in the known thin film transistor array substrate 100, the aperture ratio of the known thin film transistor array substrate 100 cannot be further increased.
发明内容 Contents of the invention
鉴于上述情况,本发明的目的是要提供一种有源元件阵列基板,以提高开口率。In view of the above circumstances, the purpose of the present invention is to provide an active element array substrate to increase the aperture ratio.
鉴于上述目的或其它目的,本发明提出一种有源元件阵列基板,其包括一基板、多条第一配线、多条第二配线、多个有源元件、多个像素电极与多条共享配线,其中这些第一配线与这些第二配线设置于基板上,并于基板上划分出多个像素区域。这些有源元件分别设置于这些像素区域内,且各有源元件电连接至对应之第一配线与第一配线。这些像素电极分别设置于这些像素区域内,而各像素电极电连接至对应之有源元件。这些共享配线与这些第一配线平行,且这些共享配线与这些第一配线交替设置于基板上。各共享配线具有自两侧边缘向外延伸之多条分支,且这些分支分别与这些第二配线重叠。In view of the above purpose or other purposes, the present invention proposes an active element array substrate, which includes a substrate, a plurality of first wirings, a plurality of second wirings, a plurality of active elements, a plurality of pixel electrodes and a plurality of The shared wires, wherein the first wires and the second wires are arranged on the substrate, and divide a plurality of pixel regions on the substrate. The active elements are respectively arranged in the pixel regions, and each active element is electrically connected to the corresponding first wiring and the first wiring. The pixel electrodes are respectively arranged in the pixel regions, and each pixel electrode is electrically connected to the corresponding active element. The shared lines are parallel to the first lines, and the shared lines and the first lines are arranged alternately on the substrate. Each shared wiring has a plurality of branches extending outward from the edges of both sides, and these branches overlap with the second wirings respectively.
依照本发明的实施例,这些第一配线可以是扫描配线,而这些第二配线可以是数据配线。According to an embodiment of the present invention, the first wirings may be scan wirings, and the second wirings may be data wirings.
依照本发明的实施例,这些分支可以是分别位于这些第二配线下方。According to an embodiment of the present invention, the branches may be respectively located under the second wires.
依照本发明的实施例,这些分支可以是分别位于这些第二配线上方。According to an embodiment of the present invention, the branches may be respectively located above the second wires.
依照本发明的实施例,这些第一配线与这些共享配线可以是属于同一膜层。According to an embodiment of the present invention, the first wires and the shared wires may belong to the same film layer.
依照本发明的实施例,这些分支分别与这些像素电极边缘可以是有部分重叠。According to an embodiment of the present invention, the branches may partially overlap with the edges of the pixel electrodes respectively.
依照本发明的实施例,各有源元件可以是薄膜晶体管或二极管。此外,薄膜晶体管可以是具有底部栅极之薄膜晶体管或具有顶部栅极之薄膜晶体管。According to an embodiment of the present invention, each active element may be a thin film transistor or a diode. In addition, the thin film transistor may be a thin film transistor with a bottom gate or a thin film transistor with a top gate.
依照本发明的实施例,像素电极的材质可以是铟锡氧化物(indium tin oxide)(以下简称ITO)、铟锌氧化物(indium zinc oxide)(以下简称IZO)或锌铝氧化物(aluminum zinc oxide)(以下简称AZO)。According to an embodiment of the present invention, the material of the pixel electrode can be indium tin oxide (indium tin oxide) (hereinafter referred to as ITO), indium zinc oxide (indium zinc oxide) (hereinafter referred to as IZO) or zinc aluminum oxide (aluminum zinc oxide). oxide) (hereinafter referred to as AZO).
基于上述,本发明将共享配线的分支与第二配线重叠,因此本发明之有源元件阵列基板将可以具有较高的开口率与较高的储存电容值Cst。Based on the above, the present invention overlaps the branch of the shared wiring with the second wiring, so the active device array substrate of the present invention can have a higher aperture ratio and a higher storage capacitance Cst.
为让本发明之上述和其它目的、特征和优点能更明显易懂,下文特举较佳实施例,并配合附图,作详细说明如下。In order to make the above and other objects, features and advantages of the present invention more comprehensible, preferred embodiments are specifically cited below and described in detail with accompanying drawings.
附图说明 Description of drawings
图1为公知的的薄膜晶体管阵列基板的俯视示意图。FIG. 1 is a schematic top view of a known TFT array substrate.
图2为依照本发明实施例之有源元件阵列基板的俯视图。FIG. 2 is a top view of an active device array substrate according to an embodiment of the present invention.
主要元件标记说明:Description of main component marking:
100:公知的薄膜晶体管阵列基板100: known thin film transistor array substrate
110、210:基板110, 210: Substrate
110a、210a:像素区域110a, 210a: pixel area
120:扫描配线120: Scan wiring
130:数据配线130: data wiring
140、240:共享配线140, 240: shared wiring
140a、240a:分支140a, 240a: branches
150:薄膜晶体管150: thin film transistor
160、260:像素电极160, 260: pixel electrode
200:有源元件阵列基板200: active element array substrate
220:第一配线220: first wiring
230:第二配线230: Second wiring
250:有源元件250: active components
具体实施方式 Detailed ways
图2为依照本发明较佳实施例之有源元件阵列基板的俯视图。请参照图2,本实施例之有源元件阵列基板200包括一基板210、多条第一配线220、多条第二配线230、多条共享配线240、多个有源元件250与多个像素电极260。其中,这些第一配线220与这些第二配线230设置于基板210上,并于基板210上划分出多个像素区域210a。此外,这些像素区域210a成阵列方式排列。在本实施例中,这些第一配线220为扫描配线,而这些第二配线230为数据配线。然而,在另一实施例中,这些第一配线220可以是数据配线,而这些第二配线230可以是扫描配线。另外,基板210可以玻璃基板、石英基板或其它透明基板。FIG. 2 is a top view of an active element array substrate according to a preferred embodiment of the present invention. Please refer to FIG. 2, the active
这些共享配线240与这些第一配线220大致平行,且这些共享配线240与这些第一配线220交替设置于基板210上。此外,这些第一配线220与这些共享配线240可以是属于同一膜层。另外,这些有源元件250分别设置于这些像素区域210a内,且各有源元件250电连接至对应之扫描配线220与数据配线230。举例而言,这些有源元件250可以是薄膜晶体管、二极管或其它适合的有源元件。在本实施例中,这些有源元件250为薄膜晶体管,且这些有源元件250为具有底部栅极之薄膜晶体管。然而,这些有源元件250也可以是具有顶部栅极之薄膜晶体管。The shared
这些像素电极260分别设置于这些像素区域210a内,而各像素电极260电连接至对应之有源元件250。此外,像素电极260的材质可以是铟锡氧化物(ITO)、铟锌氧化物(IZO)、锌铝氧化物(AZO)或是其它透明导体材质。值得注意的是,各共享配线240具有自两侧边缘向外延伸之多条分支240a,且这些分支240a分别与这些第二配线230重叠。由于这些分支240a分别与这些第二配线230重叠,因此有源元件阵列基板200便能具有较高的储存电容值Cst。The
更详细地说,这些分支240a可以是位于这些第二配线230的上方或下方。举例来说,当这些有源元件250为具有底部栅极之薄膜晶体管时,这些分支240a位于第二配线230(数据配线)的下方。同样地,当这些有源元件250为具有顶部栅极之薄膜晶体管时,这些分支240a位于第二配线230(数据配线)的上方。值得一提的是,这些分支240a分别与这些像素电极260边缘可以是有部分重叠。换言之,这些分支240a也可以遮蔽各像素电极260与这些第二配线230之间的配向异常区。In more detail, the branches 240a may be located above or below the
值得注意的是,由于共享配线240之分支240a与这些第二配线230重叠,因此第二配线230的RC负载也就提高。和公知技术相比较,在满足驱动IC的最大RC负载的情况下,本发明之有源元件阵列基板200将可以具有较高的开口率、较高储存电容值Cst以及遮蔽各像素电极260与这些第二配线230之间的配向异常区等优点。It should be noted that since the branch 240 a of the shared
虽然本发明已以较佳实施例披露如上,然其并非用以限定本发明,任何所属技术领域的技术人员,在不脱离本发明的精神和范围内,当可作些许的更动与改进,因此本发明的保护范围当视权利要求所界定者为准。Although the present invention has been disclosed above with preferred embodiments, it is not intended to limit the present invention. Any person skilled in the art may make some changes and improvements without departing from the spirit and scope of the present invention. Therefore, the scope of protection of the present invention should be defined by the claims.
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CN105789266A (en) * | 2016-05-30 | 2016-07-20 | 京东方科技集团股份有限公司 | OLED array substrate, making method thereof and display device |
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JP2000292802A (en) * | 1999-04-09 | 2000-10-20 | Hitachi Ltd | Horizontal electric field type active matrix liquid crystal display |
US20040105058A1 (en) * | 2002-12-03 | 2004-06-03 | An-Hsu Lu | Transflective pixel structure |
US20040207649A1 (en) * | 2003-04-17 | 2004-10-21 | Po-Sheng Shih | Black image insertion method and apparatus for display |
CN1570745A (en) * | 2004-04-29 | 2005-01-26 | 友达光电股份有限公司 | Thin film transistor array substrate and repair method thereof |
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JP2000292802A (en) * | 1999-04-09 | 2000-10-20 | Hitachi Ltd | Horizontal electric field type active matrix liquid crystal display |
US20040105058A1 (en) * | 2002-12-03 | 2004-06-03 | An-Hsu Lu | Transflective pixel structure |
US20040207649A1 (en) * | 2003-04-17 | 2004-10-21 | Po-Sheng Shih | Black image insertion method and apparatus for display |
CN1570745A (en) * | 2004-04-29 | 2005-01-26 | 友达光电股份有限公司 | Thin film transistor array substrate and repair method thereof |
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