CN100492057C - Sputtering film deposited thickness correction device - Google Patents
Sputtering film deposited thickness correction device Download PDFInfo
- Publication number
- CN100492057C CN100492057C CNB2005100991128A CN200510099112A CN100492057C CN 100492057 C CN100492057 C CN 100492057C CN B2005100991128 A CNB2005100991128 A CN B2005100991128A CN 200510099112 A CN200510099112 A CN 200510099112A CN 100492057 C CN100492057 C CN 100492057C
- Authority
- CN
- China
- Prior art keywords
- bed material
- film
- optical lens
- thickness correction
- target
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000012937 correction Methods 0.000 title claims abstract description 73
- 238000004544 sputter deposition Methods 0.000 title claims abstract description 43
- 239000000463 material Substances 0.000 claims abstract description 242
- 230000003287 optical effect Effects 0.000 claims abstract description 89
- 238000000151 deposition Methods 0.000 claims abstract description 39
- 230000008021 deposition Effects 0.000 claims abstract description 36
- 239000010408 film Substances 0.000 claims description 334
- 239000011521 glass Substances 0.000 claims description 56
- 230000007246 mechanism Effects 0.000 claims description 29
- 238000000427 thin-film deposition Methods 0.000 claims description 12
- 239000002245 particle Substances 0.000 claims description 8
- 230000001105 regulatory effect Effects 0.000 claims description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 7
- 229920003023 plastic Polymers 0.000 abstract description 107
- 239000004033 plastic Substances 0.000 abstract description 107
- 230000000873 masking effect Effects 0.000 abstract 1
- 230000003667 anti-reflective effect Effects 0.000 description 129
- 239000012528 membrane Substances 0.000 description 21
- 238000010276 construction Methods 0.000 description 15
- 238000000034 method Methods 0.000 description 15
- 210000001951 dura mater Anatomy 0.000 description 12
- 239000007789 gas Substances 0.000 description 12
- 238000009826 distribution Methods 0.000 description 10
- 230000008859 change Effects 0.000 description 9
- 238000000576 coating method Methods 0.000 description 9
- 238000012545 processing Methods 0.000 description 9
- 208000037656 Respiratory Sounds Diseases 0.000 description 8
- 238000002310 reflectometry Methods 0.000 description 8
- 230000003595 spectral effect Effects 0.000 description 8
- 230000005284 excitation Effects 0.000 description 7
- 238000000265 homogenisation Methods 0.000 description 7
- 229910044991 metal oxide Inorganic materials 0.000 description 7
- 150000004706 metal oxides Chemical class 0.000 description 7
- 230000002093 peripheral effect Effects 0.000 description 7
- 210000004243 sweat Anatomy 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 6
- 238000011156 evaluation Methods 0.000 description 6
- 239000002253 acid Substances 0.000 description 5
- 239000003513 alkali Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 238000003475 lamination Methods 0.000 description 5
- 238000001579 optical reflectometry Methods 0.000 description 5
- 230000008093 supporting effect Effects 0.000 description 5
- 239000010936 titanium Substances 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000005336 cracking Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 229910052719 titanium Inorganic materials 0.000 description 4
- 229910052726 zirconium Inorganic materials 0.000 description 4
- 229920000298 Cellophane Polymers 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 238000013461 design Methods 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 238000005137 deposition process Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 230000001976 improved effect Effects 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 230000001939 inductive effect Effects 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 230000004458 physiology of vision Effects 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- 239000013077 target material Substances 0.000 description 2
- MEYZYGMYMLNUHJ-UHFFFAOYSA-N tunicamycin Natural products CC(C)CCCCCCCCCC=CC(=O)NC1C(O)C(O)C(CC(O)C2OC(C(O)C2O)N3C=CC(=O)NC3=O)OC1OC4OC(CO)C(O)C(O)C4NC(=O)C MEYZYGMYMLNUHJ-UHFFFAOYSA-N 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000001464 adherent effect Effects 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- JKJWYKGYGWOAHT-UHFFFAOYSA-N bis(prop-2-enyl) carbonate Chemical compound C=CCOC(=O)OCC=C JKJWYKGYGWOAHT-UHFFFAOYSA-N 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 1
- 230000003292 diminished effect Effects 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- XZWYZXLIPXDOLR-UHFFFAOYSA-N metformin Chemical compound CN(C)C(=N)NC(N)=N XZWYZXLIPXDOLR-UHFFFAOYSA-N 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000011218 segmentation Effects 0.000 description 1
- VSZWPYCFIRKVQL-UHFFFAOYSA-N selanylidenegallium;selenium Chemical compound [Se].[Se]=[Ga].[Se]=[Ga] VSZWPYCFIRKVQL-UHFFFAOYSA-N 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Images
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
The invention relates to a sputtering film deposition system, which comprises a target 31 opposite to the surface of a plastic bed charge (10) and used for a plastic optical device, the surface of the plastic bed charge (10) of which is coated with resistive reflection film (10); wherein, the resistive reflection film (10) has multilayer film and is formed in the way that a first layer(131) made of high refraction material is deposited on one side of the bed charge (10), and then, a second layer made of low refraction material is deposited, and the high refraction material and the low refraction material are folded and stacked. The surface of the bed charge (10) of an optical lens is provided with curvature, and a plurality of the bed charges (10) are arranged horizontally on a disc support (26) which can rotate along a horizontal direction. A film thickness correction board with a function of masking film is arranged between the target (31) and the support (26) to adjust film thickness difference along a direction connecting the perimeter and a central part of the support (26).
Description
Technical field
The present invention relates to film performance to be estimated high antireflection film (anti-reflection film) and be deposited on the lip-deep technology of plastic optical component with sputter (spraying plating) method, relate at this plastic optical component and be used for preventing that the technology of crackle from appearring in above-mentioned anti-reflective film when the plastic optics eyeglass, also relate to the technology of the film thickness homogenization that makes the sputtering method deposition.
Background technology
Consider that from light weight and the superior aspect of shock resistance plastics are commonly used for lens materials recently.Two sides at this glass lens then scribbles anti-reflective film.The setting of anti-reflective film is the surface reflection that is used to prevent on the glass lens because this surface reflection can reduce when producing optical system light transmission, make the light quantity of increase be helpless to the contrast that imaging can reduce image simultaneously.The anti-reflective film of this glass lens normally forms monofilm or multilayer film by vacuum vapour deposition.
The current proposition with sputtering method (Sputtering method) by simply being installed on high-yield method and the system that forms anti-reflective film on optical lens such as the glass lens.The deposition system of this sputtered film is equipped with the sputtered film deposition chamber, and the target in the vacuum tank prepares different films in this chamber by changing in permission.This sputtering system can be under the condition that glass lens is not exposed to atmosphere on this lens surface the deposit multi-layer anti-reflective film, and allow above-mentioned film in two outgrowths of this eyeglass simultaneously.One of advantage of this sputtered film deposition system is, it can form homogeneous membrane on the both sides of eyeglass, this be because it can be in the both sides of eyeglass simultaneously film forming and also on both sides the condition of film forming identical.In addition, when deposit multilayer film on the surface of eyeglass and this film are the coating materials that has different qualities by two kinds, for example high reflecting material and low reflecting material are through repeating and crossover ground lamination when forming, the advantage of then described sputtered film deposition system is, it can form multilayer film quickly and easily and can accurately control the thickness of each layer, and this is because this kind system only need prepare two targets corresponding with various coating materials and carry out sputter by changing target in the sputtered film deposition chamber.By the thickness of accurate each layer of control, just can form the high anti-reflective film of film performance evaluation of estimate.
So, when coming anti-reflective film for plastic optical component such as glass lens preparation, be can provide to have the high highly reflecting films of new sandwich construction and film performance evaluation of estimate for the above-mentioned new film build method that utilizes sputtering technology and system.
When estimating the film performance of eyeglass, interference color (interference colour) are important assessment items.Interference color are because the color that white interference of light generates, and be formed with the glass lens situation of multi-layer anti-reflective film in the above, when on this lens surface, scribbling the transparent membrane that possesses different refractivity, these interference color then are the catoptrical colors that is caused by interference, and the general rough segmentation of interference color of the commercially available lens that scribble anti-reflective film is light blue, grey violet and light green three kinds of colors.Although light green interference color all have superiority on the physiology of vision and aesthetic feeling in above-mentioned each color, especially has an important value commercial, but do not set up the technology that can stably provide this interference color so far, this is because in the selection of coating materials, the definite and membrance casting condition of thickness, or the like, all there are various technical matterss.But, adopt above-mentioned sputtering method then can address the above problem.
But when high-refraction material being formed the ground floor of organic substance glass lens bed material, will bring other problem.Owing to absorb moisture (absorption moisture) and from the pressure of outside, cause As time goes at the interface that the equilibrium state of stress changes, cause anti-reflective film easily to ftracture from the interface.For example when be the ground floor of anti-reflective film the glass lens that forms by high-refraction material by quite strong power with the glass lens press fit in mirror holder and when also making it be absorbed with moisture, this glass lens sometimes will be from its marginal portion cracking.The existence of crackle has reduced the commodity value of eyeglass.Once required to take measures to prevent to produce this class crackle for this reason.
By the sputtering method of current proposition on optical lens during deposition film, normally multi-disc lens bed material (batch to be unit) is fixed on the disk support (substrate holder or lens tray), when rotating this bearing, carry out thin-film deposition in batches and handle.Though thickness can have good distribution when coming film forming with sputtering method, when sputtering method is used for forming the film of optical lens, then need more accurate and more homogeneous thickness distribution.In the time of particularly on the surface that anti-reflective film is formed at optical lens with above-mentioned sputtering method, more required thickness has strict consistance.When the variable thickness of anti-reflective film on the lens surface caused, its reflected colour changed, and this will make the wearer not feel well, and has reduced the use value and the commodity value of this eyeglass.
In addition, as the surface of this optical lens, be that one side forms convex surface and another side forms concave surface, curvature is promptly all arranged.According to this method of utilizing sputtering method on this optical lens surface, to form anti-reflective film, be that this optical lens flatly is positioned on the above-mentioned bearing, and upper and lower target is arranged to respectively each side in the face of this optical lens, on these both sides, to carry out the sputtered film deposit at the same time.But because the both sides of optical lens respectively have unique curvature, cause in the face of the target of each face of optical lens therewith on the face distance between each one different, thereby be difficult to the film that on these surfaces deposit becomes to have uniform thickness.
Summary of the invention
For this reason, the object of the present invention is to provide such plastic optical component, the evaluation of estimate of the film performance of the anti-reflective film that it had is very high, can make anti-reflective film by utilizing sputtering method simultaneously, and has novel sandwich construction.
In addition, when above-mentioned plastic optical component when the glass lens, it can dispose to be formed in and stably provide light green interference color on this eyeglass, and is formed on the anti-reflective film of all having superiority on the physiology of vision and the aesthetic feeling and very high commercial value being arranged.
Another object of the present invention is to the glass lens that provides such, the anti-reflective film that it had is through being arranged to, when the deposit high-refraction material is as ground floor when form multi-layer anti-reflective film on the glass lens bed material of organic substance, can prevent cracking by the surface of improving this plastics bed material.
A further object of the present invention is to provide a kind of mechanism, and it can make the distribution homogeneous of this thickness when forming film by sputtering method on the surface of optical lens bed material.
Plastic optical component of the present invention is the plastic optical component that scribbles anti-reflective film at least one surface of its plastics bed material.This anti-reflective film is the multilayer film that forms like this: in a side of plastics bed material basically by the high-refraction material deposit on ground floor, then become the second layer, again these high-refraction materials and low refractive material on the crossover ground lamination by low refractive material deposit.Making predominant wavelength (dominant wavelength) scope of formed anti-reflective film is 480～550nm, excitation (excitation purity) scope is 10～30%, luminous reflectivity (1uminous reflectance) is 0.7～1.8%, thereby can have light green interference color (interference color).This multi-layer anti-reflective film gets so that plastic optical component possesses light green interference color owing to design and made, and when above-mentioned plastic optical component is used as glass lens, just can obtain the superior and high eyeglass of commodity value on vision physiological and aesthetic feeling.
Have again, in plastic optical component of the present invention, this anti-reflective film is to form multilayer film in this wise: prior to forming ground floor by high-refraction material basically on the plastics bed material, what continue is the second layer of low refractive material, and crossover ground is by these high-refraction materials and low refractive material lamination then; The low refractive material that is positioned at this multilayer film mesozone is thicker, so that obtain required thickness and the durability of anti-reflective film.Above-mentioned anti-reflective film is to form by the deposit high refraction film of the second layer of the ground floor of deposit high refraction film and low refraction film and crossover and low refraction film.The film that forms this each layer of anti-reflective film makes the thickness of this film and quality can satisfy required condition through suitably control.The result can realize having the anti-reflective film of high-quality thin-film performance.Also owing to the design of film, required anti-reflective film can be made quickly and easily.The performance of this film is hardness and durability for example, when this anti-reflective film is used on the plastics bed material, can improve by the thickness that increase is positioned at the low refraction film of zone line.
In above-mentioned plastic optical component, high-refraction material is preferably used zirconium (Zr), titanium (Ti) and tantalum (Ta) or the target made with their alloy of two or three kind of composition and the metal oxide that formed by sputtering method, and low refractive material then is the metal oxide that is formed by sputtering method with silicon (Si) target.Preferably to make high refraction target contain Si.Like this, formed high refraction film can improve the hardness and the durability of this film with regard to containing Si.When forming high-refraction material, the Si target preferably also is set except that the high index of refraction target, by these two kinds of targets of while sputter this high-refraction material is formed hybrid films.By making this high refraction film siliceous, can improve hardness and other similarity of film in this case equally.
In above-mentioned plastic optical component, the gross thickness of anti-reflective film is 4800～5800
, and total thickness 〉=3500 of low refractive material
When the plastics bed material had curvature, this anti-reflective film formed as the broadband film.Like this, by sputter with change the interference color that oblique incidence causes, because of making the thickness distribution difference, curvature causes the heterogeneities of interference color with regard to reducing when the deposited film.Preferably this plastics bed material is formed the anti-reflective film of sandwich construction in its both sides as the bed material of glass lens.Particularly best is that this anti-reflective film has 10 layers, and the thickness of the low refractive material at the layer 6 place in the middle of being positioned at then increases.
Glass lens of the present invention is an example of aforementioned plastic optical component, and anti-reflective film is formed on the plastics bed material with sputtering method, it is a multilayer film, by first by high-refraction material deposit ground floor on a side of this plastics bed material, the second layer of the low refractive material of the deposit that continues, these high-refraction materials of crossover ground lamination and low refractive material then are formed with ultra-thin SiO in addition on this plastics bed material then
(2-x)Film is as pretreatment layer.Because have this ultrathin membrane as pretreatment layer to be located between the high refractive index film and plastics bed material of anti-reflective film ground floor of this sandwich construction, this pretreatment layer just can prevent to occur the crack in anti-reflective film.
The thickness of above-mentioned ultrathin membrane is preferably 15～50
Above-mentioned high-refraction material is preferably with Zr, Ti and any of Ta or two or more metal oxide that the target that becomes alloy to make is formed by sputtering method in them, and low refractive material then is the metal oxide that is formed through sputtering method by the Si target that is used in equally in the glass lens.
The target that preferably makes this high-refraction material is as contain Si equally in glass lens.Like this, formed high refractive index film just contains Si and can improve the hardness and the durability of film.
When forming high-refraction material, outside the high index of refraction target, be provided with the Si target again, this high-refraction material formed hybrid films by while these two kinds of targets of sputter in glass lens.At this moment, because this high refractive index film contains Si equally, just can improve the character such as hardness of film.This anti-reflective film is preferably formed by 10 layers, and makes the identical increase of situation of thickness with the glass lens of the low refractive material that is arranged in middle layer 6.
Anti-reflective film is deposited in the lip-deep sputtering system of plastic optical component being used for, is provided with the thickness correction mechanism that is used for making the homogenization of anti-reflective film thickness.This thickness correction mechanism comprises a thickness correction plate, is used at the thickness difference of thin-film deposition being proofreaied and correct this film to the surface of optical lens bed material the time by sputtering method.This thickness correction plate is located at an optimum position place between target and bed material bearing, whereby to reduce or to disperse the direct influence of the particle of sputter to the optical lens bed material.So can reduce the poor of this batch optical lens bed material upper film thickness of being formed on the bed material bearing, and the homogeneity of improvement film thickness distribution.
The thickness correction mechanism of sputtered film deposit of the present invention, be used for by sputtering method thin-film deposition to the lip-deep film deposition system of optical lens bed material, this optical lens bed material is as the bed material of glass lens with falcate, and described thickness correction mechanism comprises the thickness correction plate that is used to proofread and correct this film thickness difference; It is characterized in that: there is curvature on the surface of described optical lens bed material, and has a plurality of such optical lens bed materials flatly to be arranged on some concentric circless in the disk support, this bearing water intaking mean place and rotatable; The upper surface of described optical lens bed material is a concave surface, and its lower surface is a convex surface; Described film deposition system comprises the target in the face of the described concave surface of optical lens bed material; And described thickness correction plate is the mask spare that is used for described concave surface that is used for regulating film thickness difference, and this mask spare is according to the periphery that connects bearing and the direction setting of central portion, and between target and bearing; Corresponding to those parts size along the circumferential direction of position, border between the described optical lens bed material greater than other parts size along the circumferential direction.
The thickness correction mechanism of sputtered film deposit of the present invention, be used for by sputtering method thin-film deposition to the lip-deep film deposition system of optical lens bed material, this optical lens bed material is as the bed material of glass lens with falcate, and described thickness correction mechanism comprises the thickness correction plate that is used to proofread and correct this film thickness difference; It is characterized in that: there is curvature on the surface of described optical lens bed material, and has a plurality of such optical lens bed materials flatly to be arranged on some concentric circless in the disk support, this bearing water intaking mean place and rotatable; The upper surface of described optical lens bed material is a concave surface, and its lower surface is a convex surface; Described film deposition system comprises the target in the face of the described convex surface of optical lens bed material; And described thickness correction plate is the mask spare that is used for described convex surface that is used for regulating film thickness difference, and this mask spare is according to the periphery that connects bearing and the direction setting of central portion, and between target and bearing; Corresponding to those parts size along the circumferential direction of described optical lens bed material position greater than other parts size along the circumferential direction.
The thickness correction mechanism of sputtered film deposit of the present invention, this thickness correction mechanism is used for by sputtering method thin-film deposition to the lip-deep film deposition system of optical lens bed material, this optical lens bed material is as the bed material of glass lens with falcate, and described thickness correction mechanism comprises the thickness correction plate that is used to proofread and correct this film thickness difference; It is characterized in that: there is curvature on the surface of described optical lens bed material, and has a plurality of such optical lens bed materials flatly to be arranged on some concentric circless in the disk support, this bearing water intaking mean place and rotatable; The upper surface of described optical lens bed material is a concave surface, and its lower surface is a convex surface; Described film deposition system comprises respectively in the face of each last target and following target in described two surfaces up and down of optical lens bed material; Described thickness correction plate is the mask spare that is used for described concave surface that is used for regulating film thickness difference, and this mask spare is complied with the periphery of connection bearing and the direction setting of central portion, and between last target and bearing; And described thickness correction plate is the mask spare that is used for described convex surface that is used for regulating film thickness difference, and this mask spare is complied with the periphery of connection bearing and the direction setting of central portion, and down between target and the bearing; And at the mask spare that is used for convex surface, corresponding to those parts size along the circumferential direction of described optical lens bed material position greater than other parts size along the circumferential direction; And at the mask spare that is used for concave surface, corresponding to those parts size along the circumferential direction of position, border between the described optical lens bed material greater than other parts size along the circumferential direction.
In this sputtering system, there are a plurality of optical lens bed materials of curvature flatly to be arranged on the rotatable circular discs bearing on the surface according to the concentric circles position, wherein be provided with towards the lip-deep target of optical lens bed material, each thickness correction plate plays the mask spare effect that is used for controlling film thickness difference, be arranged between each target spare and the bearing, along direction from the bearing periphery to central part.Such arrangement form can be so that a large amount of for example be located at optical lens bed material on the bed material bearing by three concentric circles positions, and it is poor to reduce its film thickness on different concentric circless, makes the film thickness distribution homogeneous.Should be noted that the thickness correction plate that plays the effect of mask spare is mounted in one of both sides up and down of optical lens material or on both.
Described target comprises respectively in the face of the last target of optical lens bed material both sides and following target, and described mask spare then comprises and is used for being located at the mask spare between target and the bed material bearing and being used for the mask spare between target and bed material bearing under being located at of convex surface of concave surface.At the mask spare that is used for concave surface, corresponding to portion's section of optical lens bed material position along the size of peripheral direction greater than the size of other section along peripheral direction; At the mask spare that is used for convex surface, corresponding to portion's section on border between the optics bed material along the size of peripheral direction greater than the size of other section along peripheral direction.The part that do not corrode that these mask spares can also disturb particle to form from target is overflowed.
Description of drawings
Fig. 1 is the sectional view that shows bright anti-reflection film structure of the present invention;
Fig. 2 generally shows the structure of the sputtered film deposition system that is used to make anti-reflective film;
Fig. 3 shows the anti-reflective film spectral reflectance curve;
Fig. 4 is the sectional view that shows the glass lens structure with multiple field anti-reflective film;
Fig. 5 (A), 5 (B) and 5 (C) are sectional views, are used for that more pretreated glass lens (A), pretreatment layer institute tool thickness exceed the glass lens (B) of preset range and without pretreated glass lens (C);
Fig. 6 generally shows the structure of the sputtered film deposition system major part of setting up thickness correction mechanism;
Fig. 7 is a sectional side elevation, shows the deposit state of bright plastics bed material on the bed material bearing and the relation between this bed material bearing, target and the thickness correction plate;
Fig. 8 is a planimetric map, shows the plane form of bright top thickness correction plate;
Fig. 9 is a planimetric map, shows the plane form of bright bottom thickness correction plate;
What Figure 10 generally showed target does not corrode part.
Embodiment
Best form of implementation of the present invention is described below with reference to the accompanying drawings.
Now form anti-reflective film as the example of plastic optical component and on these glass lens both sides form of implementation of the present invention is described with glass lens.Though the most suitable optical device that forms anti-reflective film of the present invention thereon of glass lens, the present invention is not limited only to this.
Fig. 1 is a schematic cross sectional view, generally shows the representative instance of anti-reflection film structure of the present invention, and Fig. 2 is a structural drawing, illustration sputtered film deposition system.This kind anti-reflective film is to be formed on the both sides of eyeglass, but for ease of explanation, the just cross-section structure of the anti-reflective film of a side that shows among Fig. 1.Anti-reflective film with analog structure also is formed on the opposite side of this eyeglass.
The plastics bed material that should know this glass lens has curvature usually, is curved shape.But, show it with the plain film form among Fig. 1 for ease of explanation.When this plastics bed material was curve form, deposit film thereon was generally just along this bed material surface curvature.
The anti-reflective film 13 that plan is applied on the plastics bed material 10 is formed on the dura mater 11, because dura mater 11 is that coating is on plastics bed material 10 in this form of implementation.As shown in Figure 1, the anti-reflective film 13 of form of implementation of the present invention for example is film formed as 10 layers multilayer.In anti-reflective film 13, the film 131 that is positioned at plastics bed material 10 these side lowermost layer is high refraction films.What be right after high refraction film 131 formation is low refraction film 132.Form film 133～140 then in turn, repeated the order of high refraction film and low refraction film their crossovers.The result, first and third, the film 131,133,135,137 and 139 of five, seven, nine each layers is stacked as high refraction film, and the film 132,134,136,138 and 140 of second, four, six, eight, ten each layers is stacked as low refraction film, has so just formed the anti-reflective film 13 with sandwich construction.Outside the tenth layer the low refraction film 140 is atmosphere.
In this form of implementation, the high-refraction material that constitutes above-mentioned high refraction film for example is the oxide ZrO of zirconium
2, and the low refractive material that constitutes above-mentioned low refraction film for example is the oxide S iO of Si
2Except that zirconium, also can adopt the oxide TiO of Ti and Ta
2, Ta
2o
5Deng.The metal oxide that can also form the alloy from two or more among Zr, Ti and the Ta is as high-refraction material.This high and low refraction film is to make with sputtering method described later.For this reason, prepared target high and low refractive material.
High refraction film also can be used as the hybrid films that contains above-mentioned high-refraction material and Si and forms, and the performance of this film for example hardness and durability can wherein contain Si and is improved by making.The for example available following two kinds of methods of such hybrid films are made.First method is that Si is included in the target of high-refraction material.Utilize this target can become to contain the high refraction film of Si by the sputtering method deposit.Second method is that the Si target is set outside the high-refraction material target again, just can form this hybrid films by while sputter high-refraction material target and Si target.The Si target also can be used as the target of low refractive material.
In the anti-reflective film with sandwich construction 10 13 that forms in a manner described, the thickness of the high and low refraction film of each layer preferably is set as follows, and wherein λ represents 500nm (millimicron).
The thickness setting of ground floor high refraction film is 0.075 λ～0.085 λ, the thickness setting of the low refraction film of the second layer is 0.115 λ～0.130 λ, the thickness setting of the 3rd floor height refraction film is 0.177 λ～0.199 λ, the thickness setting of the 4th layer of low refraction film is 0.101 λ～0.114 λ, the thickness setting of layer 5 high refraction film is 0.102 λ～0.115 λ, the thickness setting of the low refraction film of layer 6 is 0.471 λ～0.511 λ, the thickness setting of layer 7 high refraction film is 0.102 λ～0.115 λ, the thickness setting of the 8th layer of low refraction film is 0.045 λ～0.060 λ, the thickness setting of the 9th floor height refraction film is 0.270 λ～0.304 λ, and the thickness setting of the tenth floor height refraction film is 0.244 λ～0.275 λ.Among above-mentioned each value, the optimum value of each layer thickness is the central value in above each scope.
The gross thickness of above-mentioned anti-reflective film 13 is preferably
And wherein the total thickness of low refraction film is best
With the durability of guaranteeing desired for example hardness and wear resistance of this anti-reflective film etc. adhesiveness and other character as film.In the situation of this form of implementation, the thickness that is positioned at the low refraction film 136 of mesozone layer 6 has been thickeied than other film, so that anti-reflective film 13 acquisitions can be satisfied the thickness of the generic request of hardness and durability.Be positioned at the middle film of the low refraction film of this batch and also thickeied, purpose is to make this structure can be fit to the requirement of this tunic in stress and others.
Be noted that the number of plies in the anti-reflective film 13 is not limited to above-mentioned 10 layers.Consider that from the preparation of this film the number of plies of the anti-reflective film of tool sandwich construction preferably will be lacked, but should do suitably to set in conjunction with required film performance.
As previously mentioned, general glass lens has curvature and is crooked shape.When on the plastics bed material of this bending, preparing the anti-reflective film 13 that has on the sandwich construction shown in Figure 1 with sputtering method described later, the curvature that depends on each several part on this plastics bed material, can produce the difference of thickness distribution, the change that will produce the inhomogeneous and interference color of the interference color that cause because of oblique incidence like this.In order to reduce this puzzlement, preferably anti-reflective film 13 is designed to the film with broadband character.
The example and the manufacture process that prepare the system of above-mentioned anti-reflective film 13 below referring to Fig. 2 general introduction with sputtering method.Fig. 2 is the longitudinal diagram of sputter deposition system 13 major parts, and this system can have the anti-reflective film 13 of sandwich construction simultaneously in the both sides deposit of plastics bed material.
This sputtered film deposition system can roughly be divided into and is used for importing the introducing chamber 21 of intending process object, is used in plastics bed material 10 both sides the alternately vacuum processing chamber of the high and low reflectance coating of deposit (sputtered film deposition chamber) 22 and pretreatment chamber 23, and these three chambers are by gate valve 24 and opened in 25 minutes.Gate valve 24 and 25 by suitable timing ON/OFF to transport/to transport process object.
The bed material bearing 26 that is transported into this sputtered film deposition system through introducing chamber 21 is set in the vacuum processing chamber 22 by gate valve 24.Note the not shown balladeur train that is used for transporting bed material bearing 26 among Fig. 1.Bed material bearing 26 is for example disk-shaped, wherein is formed with a large amount of bed material retaining hole 26a.The plastics bed material 10 that is used for glass lens promptly is arranged at these holes 26a.Because bed material retaining hole 26a leads to upside and downside, just face the upper and lower space of bed material bearing 26 by the plastics bed material 10 of these holes maintenances.The result just can form above-mentioned anti-reflective film 13 by sputtering method on the both sides of plastics bed material 10.
Sputtered film deposition process in the vacuum processing chamber 22 comprise be used for the depositing metal film sputter step and metals deposited film in this sputter step is transformed to the shift step of sull.So, when this system of body plan, be provided with sputter step district 22A and shift step district 22B in the vacuum processing chamber 22.
Bed material bearing 26 is by its centers of the upper and lower supporting member in vacuum processing chamber 22 27,28 supporting flat collocation form of fetching water.Upper and lower supporting member 27,28 is not by showing bright hydraulic cylinder or similar device along vertical driving, and can be done to rotate freely by the interior revolution mechanism that establishes.Bed material bearing 26 rotates according to set rate through the rotating operation of upper and lower supporting member 27,28, and anti-reflective film 13 is deposited on the plastics bed material 10.Like this, the polylith plastics bed material 10 on being located at bed material bearing 26 is during by sputter step district 22A and shift step district 22B, and plastics bed material 10 just is subjected to sputter and conversion process respectively in sputter step district 22A and shift step district 22B.
Sputter equipment is located at the upper and lower of bed material bearing 26 among the sputter step district 22A, comprises target 31, sputtering electrode 32, shielding power supply 33, sputter gas cylinder 34 and mass flow controller 35.When bed material bearing 26 rotates and plastics bed material 10 when arriving between the upper and lower target 31, just be deposited at the target material of launching from target 31 under the sputter state on the both sides of plastics bed material 10 and form the film of this target material.Regulate sputtering atmosphere through mass flow controller 35 by sputter gas bottle 34 introducing sputter gas such as argon gas this moment.
For the above-mentioned anti-reflective film 13 of preparation in the sputtered film deposition process of vacuum processing chamber 22, according to above-mentioned sputter step and aftermentioned shift step depositing metal oxide ZrO
2As the ground floor high refraction film, deposit SiO
2As the low refraction film of the second layer.Crossover ground forms high refraction film ZrO then
2With low refraction film Sio
2Until the 10th layer.In sputter step district 22A, the metal of each metal oxide source of deposit.In first sputter step that is used for deposit ground floor high refraction film 131, prepared the target that Zr makes and on the both sides of plastics bed material 10, formed the Zr film.In the sputter step of the low refraction film 132 of the deposit second layer, above-mentioned target is replaced by the another kind of target that Si makes and is forming the Si film after the sputter on plastics bed material both sides.Like this, by target being replaced by high-refraction material or low refractive material, the stacked high and low refraction film in crossover ground just can form anti-reflective film.Notice that the mechanism that is used for changing target does not show bright in Fig. 2.
Upper and lower being provided with in bed material bearing 26 in shift step district 22B responded to the plasma generator that is coupled.This inductive couple plasma generating means comprises high-frequency discharge chamber 41, radio-frequency coil 42, matching box 43, high frequency electric source 44, reacting gas bottle 45 and mass flow controller 46.When bed material bearing 26 rotates and pending plastics bed material 10 when arriving between these upper and lower inductive couple plasma generating meanss, this plastics bed material 10 just is exposed under the oxygen plasma of introducing by mass flow controller 46 from reacting gas bottle 45, makes (Zr or the Si) oxidation of metals deposited in the sputter step and is transformed to oxide (ZrO
2Or SiO
2).
As mentioned above, have by ZrO
2Film (high refraction film) and SiO
2The anti-reflective film as shown in Figure 1 13 of the sandwich construction that film (low refraction film) is formed, be to be formed in this wise on the both sides of plastics bed material 10: repeat sputter step and shift step, simultaneously, change the target on these polylith plastics bed material 10 both sides setting on the bed material bearing 26 can be in vacuum processing chamber 22 free to rotate.
Attention is provided with the shielding part 47 that sputter step district 22A and shift step district 22B are separated in vacuum processing chamber 22.
Be about in the depositing step of sputtered film deposition system, forming ZrO below
2Film is the condition example of high refraction film:
(1) sputter gas: argon gas (Ar), by flow rate 380～580cc/min supply;
(2) oxidizing gas: oxygen (O
2), by flow rate 46～60cc/min supply;
(3) vacuum tightness in the thin-film deposition: 8.7 * 10
-3Torr;
(4) sputter output: DC power, by 3.3～3.7KW supply;
(5) oxidation rifle output: high frequency (RF) electric power of supply 0.4KW;
(6) deposition rate: 320～360
Min.
Be the relevant SiO that in the sputter step of this sputtered film deposition system, is used for forming below
2Film i.e. the condition example of low refraction film:
(1) sputter gas: argon gas (Ar), by flow rate 110～190cc/min supply;
(2) oxidizing gas: oxygen (O
2), by flow rate 64～70cc/min supply;
(3) vacuum tightness in the thin-film deposition: 2.4 * 10
-3Torr;
(4) sputter output: DC power, by 5.1～5.3KW supply;
(5) oxidation rifle output: supply 0.4KW high frequency (RF) electric power;
(6) deposition rate: 340～380
Min.
Be below this kind anti-reflective film of on glass lens, being obtained with this anti-reflective film 13 under constant temperature and humidity the performance of starting stage of its formation with and performance after 1 month.
As the performance of this anti-reflective film, by following method measure and estimated its wearing quality, adhesiveness, alkali resistance, thermotolerance, acid resistance, to the stability and the interference color of artificial sweat:
(1) wearing quality: carried out the test of steel suede.In this test, with steel suede #0000 friction anti-reflective film, by visual determination scratch degree;
(2) adhesiveness: the plastic lens surface that will have this anti-reflective film is 100 five equilibriums by 1mm interval crosscut, makes the cellophane band firmly adhered thereto, peels off down this cellophane band then apace, checks whether this multi-layer anti-reflective film peels off;
(3) alkali resistance: the plastic lens that will have a this anti-reflective film impregnated in the aqueous solution of NaOH10% (weight) 1 hour, observes the etch state on this multi-layer anti-reflective film surface;
(4) thermotolerance: the plastic lens that will have this anti-reflective film places in the baking oven and heated 1 hour, checks whether this film ftractures.Heating-up temperature causes the most influential temperature of this cracking from 5 ℃ of 70 ℃ of each increases with discriminating;
(5) acid resistance: the plastic lens that will have this anti-reflective film is impregnated into HCl 10% (weight) and H
2SO
4In the aqueous solution of 10% (weight) 1 hour, observe the etch state on this multi-layer anti-reflective film surface;
(6) to the stability of artificial sweat: the plastic lens that will have a this anti-reflective film impregnated in 20 ℃ the artificial sweat 24 hours, and this sweat contains NaCl, Na
2S, NH
4And lactic acid, observe the etch state on this multi-layer anti-reflective film surface;
(7) interference color: with the reflected light of visual observation fluorescent light.
Be that anti-reflective film 13 forms the result of back initial period according to above-mentioned test and evaluation at it below:
(1),, do not have problems owing to almost do not form cut for wearing quality;
(2) for adhesiveness, aforementioned 100 five equilibriums all do not peel off;
(3) for alkali resistance, since not damaged almost, no problem;
(4) for thermotolerance, crackle appears in the time of 75 ℃;
(5) for acid resistance, owing to do not see variation, no problem;
(6) for the stability of artificial sweat, owing to do not see variation, no problem;
(7) interference color are green.
Be below anti-reflective film 13 under constant-temperature constant-humidity environment after 1 month according to the result of above-mentioned test and evaluation.
(1),, do not have problems owing to almost do not form cut for wearing quality;
(2) for adhesiveness, aforementioned 100 five equilibriums all do not peel off;
(3) for alkali resistance, since not damaged almost, no problem;
(4) for thermotolerance, in 60 ℃ crackle appears;
(5) for acid resistance, owing to do not see variation, no problem;
(6) for the stability of artificial sweat, owing to do not see variation, no problem;
(7), change no problem owing to not seeing in the light green interference color for interference color.
Fig. 3 is the example of the spectral reflectivity curved measurement of anti-reflective film 13.From then in the spectral reflectance rate curve as can be known, realized antiradar reflectivity in the broad wavelength coverage of about 420～740nm, promptly obtained the anti-reflective film in broadband.Particularly the wavelength coverage at about 480～550nm has higher reflectivity.
In addition, above-mentioned anti-reflective film is 10～30% by its dominant wavelength ranges being set at 480～550nm, excitation, light reflectivity is 0.7～1.8%, can obtain light green interference color.Light reflectivity and chromaticity generally are used for showing the color (being the interference color of anti-reflective film on the lens surface) of reflecting object in this form of implementation, predominant wavelength and excitation then are used for monochromatic face of land light colour product.At this, light reflectivity is expressed as the object light flux reflected to inciding the ratio of the luminous flux on this object, is equivalent to the Y value in the tristimulus values, and given by following formula
R is a light reflectivity in the formula, P
λBe the spectral component of incident light, V
λBe relative luminous efficiency and R
λIt is spectral reflectivity.
This R becomes and is used for identification and has a spectral component P
λThe criterion of the apparent brightness of light when it enters lens.
Predominant wavelength and excitation are two elements that are used for showing chromaticity under monochromatic specification.
This straight line that connects represented point of chromaticity coordinates on the chromaticity diagram and light source is with the pairing wavelength of the intersection point of spectrum track, and the spy is referred to as predominant wavelength.
The anti-reflective film that possesses this form of implementation of spectral reflectance rate curve shown in Figure 3 has the predominant wavelength of 508nm, 22% excitation, 0.963% light reflectivity and jade-green interference color.
Though the method that is formed anti-reflective film by sputtering method has been described in the above, also can have made similar anti-reflective film by other method such as vacuum vapor deposition method and CVD method with aforementioned sandwich construction.
In addition, this anti-reflective film with sandwich construction is to be formed on the both sides of glass lens in this form of implementation, but as seen this anti-reflective film also is formed at a side in other plastic optical components.
Have, in this form of implementation, the ground floor of this anti-reflective film 13 is high refraction films 131 again, but this high refraction film does not need strictly as ground floor.For example can between dura mater 11 and high refraction film 131, another tunic be set.Therefore, if just passable when this high refraction film 131 is ground floor in the anti-reflective film 13 basically.This will be specified in second form of implementation.
According to above-mentioned plastic optical component, described anti-reflective film with sandwich construction for example forms in this wise with sputtering method: the deposit high-refraction material is that ground floor, low refractive material are the second layer, all stacked high-refraction material in crossover ground and low refractive material in plastics bed material both sides then, and the enlarged in thickness of the low refractive material in the middle of this anti-reflective film is achieved film properties and estimates high anti-reflective film.In addition, because this anti-reflective film is film formed as the broadband, this just can reduce the inconsistent of the interference color that caused by thickness distribution difference relevant with curvature in the sputtering method deposit, can reduce the variation that causes interference color when the plastics bed material has curvature because of oblique incidence simultaneously.Have again, can stably obtain jade-green interference color like this and produced the high anti-reflective film of commercial value that on vision physiological and aesthetic feeling, all has superiority.
Below referring to Fig. 4 and 5 explanations, second form of implementation of the present invention.In this form of implementation, plastic optical component is limited to glass lens.The lip-deep membrane structure that is formed at plastics bed material 10 has improved in case crackle takes place.Identical in fact with parts shown in Figure 1 attached its detailed description of omitting with identical label in the parts among Fig. 4 and 5.
Among Fig. 4, label 10 refers to the plastics bed materials, and 11 refer to dura maters, and 13 refer to anti-reflective films, this three all with aforementioned form of implementation in identical.Anti-reflective film 13 is actually and is formed on the dura mater 11.Specifically, between dura mater 11 and anti-reflective film 13, be formed with SiO as pretreatment layer
(2-x)The ultrathin membrane 12 of (x=0,1).In other words, be to form on the plastics bed material 10 in the anti-reflective film 13 with sandwich construction, form SiO as pretreatment layer
(2-x)Ultrathin membrane 12.The thickness of ultrathin membrane 12 is preferably
By this ultrathin membrane 12 as pretreatment layer is set, can appropriate change plastics bed material 10 and high refraction film 131 interfaces between stress equilibrium.The result can prevent to cause anti-reflective film 13 to crack because of humidity and pressure, makes glass lens keep good surface appearance.In addition, can between anti-reflective film 13 and plastics bed material 10, keep very high adhesiveness naturally.Should be noted that, when the thickness of ultrathin membrane surpasses
The time, can produce the bad problem of adhesiveness change that makes.
Below with reference to Fig. 5 relatively have the anti-reflective film (A) of said structure and have the anti-reflective film (B) of other structure with (C).Anti-reflective film 13 with sandwich construction among Fig. 5 (A) comprises 10 layers altogether of high and low refraction film.The sequence number on the left side 1 to 10 refers to the number of plies among the figure of reflectance coating 13.Be respectively 0.080 λ, 0.12 λ, 0.19 λ, 0.11 λ, 0.11 λ, 0.49 λ, 0.11 λ, 0.05 λ, 0.29 λ and 0.26 λ from the thickness of each layer of 10 layers of low refraction film of the 1st floor height refraction film to the by shown in Fig. 5 (A).These thickness are included in the aforementioned thicknesses scope of each layer.The said structure of this anti-reflective film 13 is also all identical in the anti-reflective film of Fig. 5 (B) and 5 (C).
In the layout of Fig. 5 (A), anti-reflective film 13 is formed on the plastics bed material 10, on the latter's the surface then by having thickness
SiO
(2-x)Ultrathin membrane 12 scribbles dura mater 11.In other words, SiO
(2-x)Ultrathin membrane 12 forms the pre-service film.Notice that the upside of the 10th layer of low refraction film is an atmosphere.
In the arrangement form of Fig. 5 (B), SiO
(2-x)Ultrathin membrane 12a is formed between the plastics bed material 10 that dura mater 11 coatings are arranged on anti-reflective film 13 and the surface as the pre-service film with the same manner.But the thickness of this ultrathin membrane 12a is
Greater than aforesaid
And be not included within the aforementioned range.
In the arrangement form of Fig. 5 (C), between the plastics bed material 10 that dura mater 11 coatings are arranged on anti-reflective film 13 and the surface, do not form SiO
(2-x)Ultrathin membrane.Above-mentioned ultrathin membrane of no use in other words carries out pre-service.This anti-reflective film 13 is to have above being formed directly on the plastics bed material 10 of dura mater 11 coatings.
Below explanation is had the comparative result of the film performance of each glass lens of structure shown in Fig. 5 (A), 5 (B) and 5 (C).For carry out this relatively, prepared to have Fig. 5 (A), 5 (B) and each structure shown in 5 (C), they are assembled on the mirror holder, and in the constant temperature and humidity stove of 46 ℃ of humidity 90% and temperature, kept 24 hours.Check the adhesiveness and the outward appearance (having flawless to take place) thereof of the anti-reflective film of these glass lens then.It should be noted that estimate " adhesiveness,, the time be with this glass lens surface by 1mm crosscut 100 five equilibriums at interval, whether the cellophane band tears off rapidly then and reexamines this anti-reflective film and peel off on the strongly adherent.
As a result, the adhesiveness with glass lens of structure shown in Fig. 5 (A) is 100%, does not see any peeling off, the outward appearance no change.In the glass lens with structure shown in Fig. 5 (B), adhesiveness is 0%, and all anti-reflective films all are stripped from, performance extreme difference, but outward appearance no change.In the glass lens with structure shown in Fig. 5 (C), although adhesiveness is the good situation of 100% genus, the problem of appearance of cracking appears in the edge part branch of eyeglass.
From as can be known above-mentioned, glass lens (plastics bed material 10) scribble ultrathin membrane 12 as the anti-reflective film 13 of pre-service film in having best performance aspect adhesiveness and the outward appearance.Have, this anti-reflective film 13 also shows good performance in wearing quality, alkali resistance, thermotolerance, acid resistance with to the stable direction of artificial sweat again.This anti-reflective film wide wavelength coverage in about 420～740nm on the spectral reflectance rate curve has realized low reflectivity, thereby has made the anti-reflective film in broadband.Specific to about 480～550nm, higher reflectivity is arranged then.In addition, above-mentioned ultrathin membrane and anti-reflective film are by being set at 480～550nm with predominant wavelength, and excitation can provide light green interference color for 10～30% reflectivity for 0.7～1.8%.
According to above-mentioned glass lens, owing to when the formation ground floor is the multi-layer anti-reflective film of high refraction film, formed ultrathin membrane 12 as pretreatment layer, just can prevent the outward appearance when crackle generation and improvement are used on the plastic sheet, can also stably realize light green interference color by this ultrathin membrane and other rete, and produce vision physiological and all superior high glass lens of commodity value of aesthetic feeling.
Below referring to Fig. 6～10 explanations the 3rd form of implementation of the present invention.In this form of implementation, in the device of the aforementioned second sputtered film deposition system, have additional and be used for improving the mechanism that is formed at plastics bed material 10 both sides upper film thickness homogeneity.Among Fig. 6 with essentially identical parts shown in Figure 2 with attached its detailed duplicate explanation of omitting with identical label.The material 10 of should knowing the inside story is not limited to plastics, for example can be glass.
The structure of sputtered film deposition system and operation and aforesaid identical.The design feature of sputtered film deposition system shown in Figure 6 is to be provided with thickness correction mechanism in the sputter step district of vacuum processing chamber 22 22A.
Above-mentioned thickness correction mechanism comprises and is located at the thickness correction plate 51 and 52 that is among the sputter step district 22A between each target 31 and the bed material bearing 26.Do not show the bright structure that is used to support thickness correction plate 51 and 52 among need and Fig. 6.Can adopt any type of supporting structure that can utilize this space.On function, the thickness correction plate is so-called mask spare, is used for covering by the rotation operation of bed material bearing 26 with required shape (overlay pattern) coming plastics bed material 10 in the face of target 31 core positions.Sputtering particle from target 31 can partly shield, by this thickness correction plate with the effect of required overlay pattern mask spare that plays is covered some plastics bed materials 10, be deposited on each plastics bed material 10 lip-deep film thicknesses and can make this thickness homogenization with regard to recoverable.
Describe this thickness correction plate in detail below with reference to Fig. 7 to 9.Fig. 7 is an enlarged drawing, be used for specifically describing relation between form and upper and lower target 31 and the thickness correction plate 51,52 is put in the institute's fetch bit that is set in the plastics bed material 10 on the bed material bearing 26, Fig. 8 illustration plane thickness correction plate 51, Fig. 9 shows bright plane thickness correction plate 52.
Among Fig. 7, direction shown in the arrow 53 is the direction towards bed material bearing 26 centers of rotation, and d1 is the distance of 31 of bed material bearing 26 and lower target, and d2 is the distance of 31 of plastics bed material 10 and lower target.Can know and see have many plastics bed materials 10 to be located among the bed material retaining hole 26a that bed material bearing 26 forms by joint 54 among the figure, get concave surface up with the downward form of convex surface.It is the middle position that its minimum point is come almost be between top, lower target 31 that plastics bed material 10 is got such location.Therefore, above-mentioned is to be determined between the minimum point of lower target 31 and plastics bed material 10 lower surfaces apart from d2.In addition, 31 of bed material bearing 26 and lower target then is slightly larger than the spacing of bed material bearing 26 and upper targets 31 apart from d1.
These a plurality of plastics bed materials 10 are provided in a side of on the concentric circumferences 55,56 and 57 in the bed material bearing 26 as shown in Figure 8.Three such concentric circless have been used in this form of implementation.In addition, can know from Fig. 8 and 9 and see that it is trapezoidal that the upper targets of plane and lower target preferably are, and is positioned at central side and is positioned at perimeter sides to grow the limit with minor face.
The above-mentioned thickness correction plate 51 that is plane shown in Figure 8 is being in upper targets 31 under the aforementioned arrangement form and is being set between this batch plastics bed material 10 on the bed material bearing 26.This thickness correction plate 51 is positioned to make its central part of vertically getting connection bed material bearing 26 and the rectilinear direction (radially) of periphery.In thickness correction plate 51, preferably make device length along the circumferential direction corresponding to concentric circles 55～57 (being provided with the place of plastics bed material) greater than other device length along the circumferential direction, and the length of device in thickness correction plate 51 corresponding to concentric circles 55～57 is diminished from the peripheral part to the middle body gradually.Like this, by rotatable bed material 26, come roughly in the face of a predetermined portions in plastics bed material 10 upper surfaces of the position of upper targets 31 middle bodies and just cover for thickness correction plate 51.As a result, be deposited to thickness homogenization of plastics bed material 10 upper faces (concave surface) upper film owing to the correction that is subjected to 51 shielding actions of thickness correction plate.It should be noted that the thickness correction plate 51 of plane is not limited to form shown in Figure 8.
Similarly, the above-mentioned thickness correction plate 52 with plane shown in Figure 9 is arranged between this batch plastics bed material 10 on lower target 31 and the bed material bearing 26.Thickness correction plate 52 is positioned to make it vertically to get the central part and the rectilinear direction of periphery that connects bed material bearing 26, and the while preferably makes corresponding to the part of the intermediate section of concentric circles 55～57 in the length (border between the plastics bed material) of peripheral direction greater than the length of other parts at peripheral direction.Like this, by rotating bed material bearing 26, plastics bed material 10 lower surface (convex surface) preset range that had arrived the position of roughly facing lower target 31 central parts already will be that thickness correction plate 52 covers.As a result, be deposited to just homogenization of film thickness on plastics bed material 10 lower surface (convex surface).It is shown in Figure 9 this to know that plane thickness correction plate 52 is not only limited in.
Consider that from another point of view thickness correction plate 51 and 52 can also be with being the mask spare with following effects.In other words, be trapezoidal target 31 and generally dispose specific magnet arrangement (not showing bright), be similar to the portion that do not corrode 58 of equilateral triangle in the central part formation one of this target according to thin-film deposition effect based on sputter., do not corrode the reaction product that is deposited in the portion 58 on the target surface at this abnormal discharge just easily takes place when not corroding portion 58 and being stored on the target 31 when this.The result makes this reaction product easily from then on not corrode portion 58, and loss goes out and arrives the surface of plastics bed material 10 as particle.But in above-mentioned sputtered film deposition system, there is thickness correction plate 51 and 52 to be arranged between bed material bearing 26 and top and the lower target as mentioned above, make the thickness correction plate can cover plastics bed material 10 in the face of these two targets, they will disturb and from then on not corrode the particle that portion 58 overflows, and stop these particles to arrive the surface of plastics bed material 10.
Above-mentioned thickness correction mechanism realizes favourable thickness distribution adopting sputtering method by the sputtered film deposition system thin-film deposition on the one or both sides of optical lens bed material the time, can be made the lip-deep film thickness homogenization of optical lens bed material.In addition, this thickness correction plate also can disturb the particle of overflowing from the not erosion portion of target.
The present invention is useful in the high anti-reflective film of coated film performance evaluation value on the plastic optical component.This anti-reflective film is film formed as the broadband, can reduce the interference color that cause because of thickness distribution difference interference color inhomogeneous and that cause because of oblique incidence and change when the plastics bed material has curvature.The present invention is stably obtained jade-green interference color and can be prepared into vision physiological and all outstanding high anti-reflective film of commodity value of aesthetic feeling.Under the glass lens situation, with SiO
(2-x)Ultrathin membrane can prevent from anti-reflective film, to occur crackle when the pretreatment layer.The thickness correction plate of described thickness correction mechanism then can make the film thickness homogenization by sputtering method deposit on plastics bed material surface.
Claims (4)
1. the thickness correction mechanism of sputtered film deposit, this thickness correction mechanism is used for by sputtering method thin-film deposition to the lip-deep film deposition system of optical lens bed material (10), this optical lens bed material (10) is as the bed material of glass lens with falcate, and described thickness correction mechanism comprises the thickness correction plate that is used to proofread and correct this film thickness difference; It is characterized in that:
There is curvature on the surface of described optical lens bed material (10), and has a plurality of such optical lens bed materials (10) flatly to be arranged on some concentric circless in the disk support (26), and this bearing (26) water intaking mean place is also rotatable; The upper surface of described optical lens bed material is a concave surface, and its lower surface is a convex surface;
Described film deposition system comprises the target (31) in the face of the described concave surface of optical lens bed material (10); And
Described thickness correction plate is the mask spare that is used for described concave surface (51) that is used for regulating film thickness difference, and this mask spare (51) is complied with the periphery of connection bearing and the direction setting of central portion, and is positioned between target (31) and the bearing (26); Corresponding to those parts size along the circumferential direction of position, border between the described optical lens bed material greater than other parts size along the circumferential direction.
2. the thickness correction mechanism of sputtered film deposit, this thickness correction mechanism is used for by sputtering method thin-film deposition to the lip-deep film deposition system of optical lens bed material (10), this optical lens bed material (10) is as the bed material of glass lens with falcate, and described thickness correction mechanism comprises the thickness correction plate that is used to proofread and correct this film thickness difference; It is characterized in that:
There is curvature on the surface of described optical lens bed material (10), and has a plurality of such optical lens bed materials (10) flatly to be arranged on some concentric circless in the disk support (26), and this bearing (26) water intaking mean place is also rotatable; The upper surface of described optical lens bed material is a concave surface, and its lower surface is a convex surface;
Described film deposition system comprises the target (31) in the face of the described convex surface of optical lens bed material (10); And
Described thickness correction plate is the mask spare that is used for described convex surface (52) that is used for regulating film thickness difference, and this mask spare (52) is complied with the periphery of connection bearing and the direction setting of central portion, and is positioned between target (31) and the bearing (26); Corresponding to those parts size along the circumferential direction of described optical lens bed material position greater than other parts size along the circumferential direction.
3. the thickness correction mechanism of sputtered film deposit, this thickness correction mechanism is used for by sputtering method thin-film deposition to the lip-deep film deposition system of optical lens bed material (10), this optical lens bed material (10) is as the bed material of glass lens with falcate, and described thickness correction mechanism comprises the thickness correction plate that is used to proofread and correct this film thickness difference; It is characterized in that:
There is curvature on the surface of described optical lens bed material (10), and has a plurality of such optical lens bed materials (10) flatly to be arranged on some concentric circless in the disk support (26), and this bearing (26) water intaking mean place is also rotatable; The upper surface of described optical lens bed material is a concave surface, and its lower surface is a convex surface;
Described film deposition system comprises respectively in the face of each last target and following target (31) in described two surfaces up and down of optical lens bed material (10);
Described thickness correction plate is the mask spare that is used for described concave surface (51) that is used for regulating film thickness difference, and this mask spare (51) is complied with the periphery of connection bearing and the direction setting of central portion, and is positioned between target (31) and the bearing (26); And described thickness correction plate is the mask spare that is used for described convex surface (52) that is used for regulating film thickness difference, and this mask spare (52) is complied with the periphery of connection bearing and the direction setting of central portion, and is positioned between following target (31) and the bearing (26); And
In the mask spare that is used for convex surface (52), corresponding to those parts size along the circumferential direction of described optical lens bed material position greater than other parts size along the circumferential direction; And in the mask spare that is used for concave surface (51), corresponding to those parts size along the circumferential direction of position, border between the described optical lens bed material greater than other parts size along the circumferential direction.
4. the thickness correction mechanism of each described sputtered film deposit in the claim 1 to 3 is characterized in that: described mask spare can disturb state target spare in the past do not corrode the particle of overflowing in the part.
Applications Claiming Priority (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP143173/1997 | 1997-05-16 | ||
| JP143175/1997 | 1997-05-16 | ||
| JP14317397 | 1997-05-16 | ||
| JP143180/1997 | 1997-05-16 | ||
| JP173098/1997 | 1997-06-13 | ||
| JP173096/1997 | 1997-06-13 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB031206115A Division CN1239924C (en) | 1997-05-16 | 1998-05-18 | Plastic optical device having antireflecting membrane and mechanism enabling evenness of such membrane |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1755398A CN1755398A (en) | 2006-04-05 |
| CN100492057C true CN100492057C (en) | 2009-05-27 |
Family
ID=36688800
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2005100991128A Expired - Fee Related CN100492057C (en) | 1997-05-16 | 1998-05-18 | Sputtering film deposited thickness correction device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN100492057C (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR3008193B1 (en) * | 2013-07-05 | 2015-08-14 | Essilor Int | OPTICAL ARTICLE WITH RED RESIDUAL REFLECTION COLOR |
| JP6253009B2 (en) * | 2013-08-28 | 2017-12-27 | 東海光学株式会社 | Optical products and eyeglass lenses |
| CN113866851A (en) * | 2020-06-30 | 2021-12-31 | 宸美（厦门）光电有限公司 | Film structure and light-transmitting substrate |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1033653A (en) * | 1987-12-22 | 1989-07-05 | 昆明物理研究所 | Method for coating diamond-like carbon film on infrared lens of germanium and silicon |
| US5450238A (en) * | 1993-12-10 | 1995-09-12 | Viratec Thin Films, Inc. | Four-layer antireflection coating for deposition in in-like DC sputtering apparatus |
| WO1996031343A1 (en) * | 1995-04-03 | 1996-10-10 | Southwall Technologies Inc. | Antireflective coatings |
-
1998
- 1998-05-18 CN CNB2005100991128A patent/CN100492057C/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1033653A (en) * | 1987-12-22 | 1989-07-05 | 昆明物理研究所 | Method for coating diamond-like carbon film on infrared lens of germanium and silicon |
| US5450238A (en) * | 1993-12-10 | 1995-09-12 | Viratec Thin Films, Inc. | Four-layer antireflection coating for deposition in in-like DC sputtering apparatus |
| WO1996031343A1 (en) * | 1995-04-03 | 1996-10-10 | Southwall Technologies Inc. | Antireflective coatings |
Also Published As
| Publication number | Publication date |
|---|---|
| CN1755398A (en) | 2006-04-05 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN1130575C (en) | Plastic optical component having reflection prevention film and mechanism for making reflection prevention film thickness uniform | |
| FI74697C (en) | FOERFARANDE FOER BELAEGGNING AV ETT GENOMSKINLIGT SUBSTRAT. | |
| DK172762B1 (en) | Coated substrate of glassy material and method of coating | |
| US6768581B1 (en) | Coated lens exhibiting substantially balanced reflectance | |
| JP3975242B2 (en) | Plastic optical component with antireflection film | |
| EP1274660B1 (en) | Method for applying an antireflection coating to inorganic optically transparent substrates | |
| CN108521766A (en) | Include the transparent layered element of screen area | |
| US8002442B2 (en) | Color filter and method for its manufacture | |
| EP1170602B1 (en) | Optical element comprising a superficial mirror coating and method for forming said coating | |
| CN106896423A (en) | For the compound high refractive index layer of antireflective stacked body | |
| EP0283923A1 (en) | Sputtered titanium oxynitride films | |
| AU2001267564A1 (en) | Optical element comprising a superficial mirror coating and method for forming said coating | |
| CN110431122A (en) | anti-reflective coating | |
| JPS63297246A (en) | Colored glass plate | |
| CN100492057C (en) | Sputtering film deposited thickness correction device | |
| EP1889941B1 (en) | Metal multi-layered film structure and method of manufacturing and use of the same | |
| US5837362A (en) | Mirror with scratch resistant surface | |
| AU774079B2 (en) | Plastic optical devices having antireflection film and mechanism for equalizing thickness of antireflection film | |
| US20210292227A1 (en) | Colored glass and preparation method thereof | |
| JPH1130705A (en) | Spectacle plastic lens with reflection preventive film | |
| CN111338007A (en) | Anti-reflection film and preparation method thereof | |
| CN210244332U (en) | Low-reflectivity capacitive touch screen | |
| US20070081249A1 (en) | Optical system for reducing the reflection of optically transparent substrates | |
| JPH01257801A (en) | Antireflection film | |
| JPH11337703A (en) | Antireflection film for ir region and transmission window |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C17 | Cessation of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20090527 Termination date: 20110518 |