CN100449404C - Exposure device and method for manufacturing color filter - Google Patents
Exposure device and method for manufacturing color filter Download PDFInfo
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- CN100449404C CN100449404C CNB031034306A CN03103430A CN100449404C CN 100449404 C CN100449404 C CN 100449404C CN B031034306 A CNB031034306 A CN B031034306A CN 03103430 A CN03103430 A CN 03103430A CN 100449404 C CN100449404 C CN 100449404C
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Abstract
The invention discloses a method for coating and exposing a photoresist, which comprises the following steps: firstly, providing a substrate, then providing a photoresist coating device to coat a plurality of strip photoresist regions on the substrate, and then providing an exposure device which comprises a light source for generating light for exposure and a photomask with a preset pattern, wherein the photomask is arranged between the light source and the substrate. Then, an exposure procedure is carried out on the plurality of strip-shaped photoresist regions, and the preset pattern on the photomask is transferred into a strip-shaped exposure pattern on the substrate through the relative movement of the substrate and the photomask.
Description
Technical field
The present invention relates to the method that a kind of exposure device and a kind of photoresist apply and expose, particularly relate to a kind of exposure device and method thereof that is applied in the colorized optical filtering mirror (color filter) of making display panels.
Background technology
Film transistor plane indicator, Thin Film Transistor-LCD (hereinafter to be referred as TFT-LCD) particularly, mainly be the thin film transistor (TFT) that utilizes into rectangular arrangement, cooperate electronic packages such as suitable electric capacity, switching pad to drive liquid crystal pixel, enrich beautiful figure with generation.Because TFT-LCD has that external form is frivolous, power consumption is few and characteristic such as radiationless pollution, therefore be widely used on the portable information products such as notebook (notebook), PDA(Personal Digital Assistant), even the existing trend that replaces the CRT monitor of traditional desktop PC gradually.
Traditional TFT-LCD has consisted essentially of an infrabasal plate, have on it the sweep trace (scan or gate line) of many thin film transistor (TFT)s that are arranged in array, pixel electrode (pixel electrode), orthogonal staggered (orthogonal) and signal wire (data or signal line), have the upper substrate of colorized optical filtering mirror (colorfilter) and be filled in infrabasal plate and upper substrate between liquid crystal material, wherein upper substrate and infrabasal plate can be transparent glass substrate.And in the employed material of TFT-LCD, the cost of colorized optical filtering mirror accounts for 1/3rd.Generally speaking, the making of colorized optical filtering mirror is earlier to apply the negative photoresist material at infrabasal plate, forms through overexposure and development manufacture craft then.Because present employed photomask is oversize, therefore making the cost that must spend writing on the photomask.And the dog-eat-dog of TFT-LCD in the market, each tame manufacturer all tries one's best and is reducing cost of manufacture, attracts the consumer to knock down price, and therefore how reducing the photomask size just becomes one of direction that can reduce cost.
Please refer to Fig. 1 and Fig. 2, Fig. 1 and Fig. 2 are the existing synoptic diagram of making the exposure device of display panels.Generally speaking, Fig. 1 is the existing exposure device of making colored optical filtering in the display panels, and Fig. 2 is the existing exposure device of making thin film transistor base plate in the display panels.As shown in Figure 1, an exposure device 10 includes a fixed light source 12, a photomask 14 is positioned at light source 12 belows and a substrate 16 is positioned at photomask 14 belows, and the sizableness of photomask 14 and substrate 16.Wherein substrate 16 can be a glass substrate, on it and be provided with blackstreak (black matrix, BM) (not shown), some the oblique light leaks when improving the LCD contrast and preventing that the TFT assembly from producing light leakage current and covering LCD and show.In addition, also be coated with a negative photoresist layer on the substrate 16 and cover blackstreak, wherein the negative photoresist layer is used as the R/G/B chromatograph on the colorized optical filtering mirror.
Carry out an exposure program then, the predetermined pattern on the photomask 14 is transferred to the negative photoresist layer on the substrate 16.Then carry out a development manufacture craft, to remove not by the negative photoresist layer of light source irradiation.Repeat aforesaid exposure and development manufacture craft for several times, the R/G/B chromatograph on the colorized optical filtering mirror just can be formed on the substrate 16.Wherein this exposure program is that photomask 14 and substrate 16 are maintained static simultaneously, so that 12 long periods of light source and shine overall optical mask 14 all sidedly, and then the predetermined pattern on the photomask 14 intactly is transferred to negative photoresist layer on the substrate 16.This exposure program adopts a close induction type (proximity) exposure technique, and wherein photomask 14 is about 100～200 microns (μ m) with the spacing g of substrate 16.Wherein, big or small rough the equating of the size of photomask 14 and substrate 16.
As shown in Figure 2, one exposure device 20 includes a fixed light source 22, a photomask 24 is positioned at light source 22 belows and a substrate 26 is positioned at photomask 24 belows, and the size of photomask 24 is about 1/4th of substrate 26, and 26 of photomask 24 and substrates also are provided with an optical system 28, in order to being passed on the substrate 26 by the light of photomask 24.As noted earlier, substrate 26 is a glass substrate, and visual actual needs applies a negative photoresist layer or positive photoresist layer on it.Wherein substrate 26 includes the glass substrate of four display panels.
At first carry out an exposure program, behind the regional 26a on photomask 24 align substrates 26, again with identical mobile photomask 24 in speed synchronization ground and substrate 26, so that the predetermined pattern on the photomask 24 is transferred to the regional 26a of substrate 26.Wait to finish after the exposure program of regional 26a, moving substrate 26 makes the regional 26b on photomask 24 align substrates 26, repeats aforesaid exposure program again.Treat to finish in regular turn on the substrate 26 behind each regional exposure program, then carry out a development manufacture craft, to remove not by the negative photoresist layer of light source irradiation.Wherein, the size of photomask 24 approximates the size of a regional 26a, so be example with Fig. 2, the size of photomask 24 approximates 1/4 of substrate 26.
Because in the manufacture craft of making TFT-LCD, the resolution (resolution) that predetermined pattern shifts requires and is so high unlike semiconductor fabrication process, therefore aforesaid two kinds of prior aries all may be widely used in and make on the colorized optical filtering mirror.Yet substrate 16 is about 620mm * 750mm with the size of substrate 26, and the appropriate litigation fees of its corresponding employed photomask is high.Therefore, if can reduce the size of photomask effectively, certainly will be able to reduce the cost of manufacture of TFT-LCD significantly.
In addition, on substrate, cover a negative photoresist layer or positive photoresist layer, generally with rotary the coating (spin coating).The practice is that substrate is placed on the universal stage, but the axle center driven rotary platform of universal stage below rotates, and provide an appropriate vacuum in the axle center to hold base material, photoresist liquid then spills down from the substrate top, utilize the centrifugal force of substrate rotating, and move toward substrate peripheral, form the uniform photoresist layer of a layer thickness at last.Yet substrate size now is increasing, rotational substrate more and more difficult, and therefore traditional rotary coating can't make the thickness of photoresist layer reach fully evenly.
Summary of the invention
The object of the present invention is to provide the method for coating of a kind of exposure device and a kind of photoresist and exposure, not only can reduce the size of photomask, the display panels of making is cut apart easily, and then reduce cost of manufacture.
According to purpose of the present invention, a kind of method of making colored filter is proposed, include the following step: at first, provide a substrate.Afterwards, provide a photoresist applicator, on this substrate, to apply a plurality of strip photoresists district.Then, provide a light source, be used for producing the light of an exposure usefulness.Afterwards, provide a photomask with predetermined pattern, place this light source therewith between the substrate.Then, when this a plurality of strip photoresists district is carried out an exposure program, by this substrate therewith the relativity that produces of photomask move, make the predetermined pattern on this photomask be become a strip exposing patterns on this substrate by transcription.
Provide a kind of photoresist coating unit according to another object of the present invention is to, be used on a substrate, evenly applying photoresist liquid.This coating unit includes a photoresist applicator, a photoresist supply and a pedestal.The photoresist applicator has a plurality of palisade openings, and to the photoresist applicator, and pedestal is to carry this substrate in order to take advantage of to the photoresist supply in order to supply photoresist liquid.Wherein, this substrate therewith the photoresist applicator produce one and relatively move so that this photoresist applicator can apply out a plurality of strip photoresists district on this substrate.
Be to propose a kind of exposure device according to a further object of the present invention, be used for the photoresist layer on the substrate is exposed.This exposure device includes a light source, a photomask and a pedestal.Light source is in order to produce the light of an exposure usefulness.Photomask places between this light source and this substrate, and it has a predetermined pattern.Pedestal then is to carry this substrate in order to take advantage of.Wherein, when this photoresist layer is carried out exposure program, by this substrate therewith a relativity of photomask move, make this predetermined pattern on this photomask be become a strip exposing patterns on this substrate by transcription.
Since the present invention with the photomask size be contracted to photomask on the sizableness of light area, and stationary photomask and light source simultaneously, the pedestal by mobile bearing substrate with the design transfer on the photomask to substrate.Therefore can reach the size that reduces photomask, and then reduce the effect of cost of manufacture.In addition, the present invention provides a kind of air-flotation type system with bearing substrate stably in addition, and this air-flotation type system can be applied in respectively on the pedestal of exposure device and photoresist coating unit.
Description of drawings
Fig. 1 and Fig. 2 are the existing synoptic diagram of making the exposure system of display panels;
Fig. 3 is the synoptic diagram of the exposure device of preferred embodiment of the present invention;
Fig. 4 A is the synoptic diagram of air-flotation type system among Fig. 3;
Fig. 4 B is the enlarged diagram of photoresist applicator among Fig. 4 A;
Fig. 5 is the enlarged diagram after the exposure device of Fig. 3 is simplified;
Fig. 6 A and Fig. 6 B are the synoptic diagram with non-rotating cladding process making n piece display panels of a preferred embodiment of the present invention;
Fig. 7 A is the synoptic diagram of PA type pedestal;
Fig. 7 B is the synoptic diagram of PV type pedestal;
Fig. 7 C is the synoptic diagram of the air-flotation type system of a preferred embodiment of the present invention.
Embodiment
The invention provides a kind of exposure device, produce relativity and move, can make the predetermined pattern on this photomask be become a strip exposing patterns on the substrate by transcription by making between substrate and photomask.So, the size that can dwindle photomask makes its size only be about 1/10th of substrate.In addition, this exposure device can contain an air-flotation type system in addition with the stable substrate that drives, and makes substrate produce moving of relativity to photomask.Moreover, the present invention is preferable can contain in addition again a photoresist applicator in order to a plurality of strip photoresist of even coating district on substrate, so that the present invention also can make the process of making display panels more simple and easy.
Please refer to the 3rd figure, it illustrates the synoptic diagram of the exposure device of preferred embodiment of the present invention.Exposure device 30 is used for the photoresist layer on the substrate 36 is exposed.Exposure device 30 includes a light source 31, a photomask 32 and a pedestal 35.Light source 31 is in order to produce the light of an exposure usefulness.Photomask 32 places between light source 31 and the substrate 36, and it has a predetermined pattern.35 of pedestals are in order to take advantage of carried base board 36.The light area 33 of one arc is formed on the photomask 32.Wherein, have a plurality of regularly arranged opening (slit) 32a that are on the photomask 32.When the photoresist layer is carried out exposure program, move by substrate 36 a relativity with photomask 32, make the predetermined pattern on the photomask 32 be become a strip exposing patterns on the substrate 36 by transcription.
Wherein, pedestal 35 also comprises an air-flotation type system 38 (air-float system) (being shown among Fig. 7 A and Fig. 7 B) and a driving section 37 (being shown among Fig. 4 A).Please refer to Fig. 4 A, it illustrates the synoptic diagram of air-flotation type system among Fig. 3.Shown in Fig. 4 A, also have a fixed part 34a who couples with driving section 37 on the pedestal 35, fixed part 34a is in order to drive substrate 36.Driving section 37 sees through fixed part 34a and drives substrate 36.Air-flotation type system 38 makes substrate 36 be suspended in pedestal 35 tops, and keeps a determining deviation in order to take advantage of carried base board 36, and driving section 37 then is connected with air-flotation type system 38, in order to carrying and drive substrate 36, substrate 36 can stably be moved around above pedestal 35.In addition, a photoresist applicator 34b also can be set up in pedestal 35 tops.Air-flotation type system 38 about being connected with driving section 37 in the pedestal 35 will cooperate Fig. 7 A and Fig. 7 B, explanation hereinafter.
Please be simultaneously with reference to Fig. 4 B, it is the enlarged diagram of photoresist applicator among Fig. 4 A.Photoresist applicator 34b is connected with a pipeline 34g, and utilizes forcing pump 34c that photoresist liquid 34d is delivered to photoresist applicator 34b, via lower opening (lip) 34e photoresist liquid evenly is coated on the substrate 36 then.If apart from homogeneous, substrate 36 itself is stably mobile, and the opening homogeneous of photoresist applicator 34b itself between photoresist applicator 34b and the substrate 36, then on substrate 36, can form the photoresist layer 34f with uniform thickness.
In addition, also can comprise between light source 31 and the photomask 32 among Fig. 3 and mould light optical system (beamforming optical system) (not shown), be used for converting the light that light source 31 is launched to an arc light beam (arcuate beam) 33a, be projected on the photomask 32 and formation light area 33 then.In another embodiment of the present invention, the aforesaid light optical system (not shown) of moulding also can convert the light that light source 31 is projected to one rectangular light beam (rectangular beam).When carrying out exposure program, light source 31 all maintains static with photomask 32, moves the substrate 36 of suspension by the driving section on the pedestal 35 37, with step by step with the design transfer on the photomask 32 to the substrate 36 to form the strip exposing patterns.It will be at following detailed description exposure program.
Please refer to Fig. 5, the enlarged diagram after its exposure device that illustrates Fig. 3 is simplified.As shown in Figure 5, glass substrate 36a, the 36b, 36c and the 36d that include four display panels on the substrate 36 are arranged in the exposure device, which is provided with the blackstreak (not shown), and be coated with a negative photoresist layer.At first carry out an exposure program, utilize pedestal 35 moving substrates 36 earlier, so that the regional 36a on the substrate 36 moves to the suitable position of photomask 32 and 33 belows, light area.Then, move the direction of substrate 36 along the arrow A indication with a predetermined speed driving section of pedestal 35, so that the predetermined pattern on the photomask 32 is transferred to the negative photoresist layer on the regional 36a step by step.After waiting to finish the exposure program of regional 36a, again substrate 36 is continued to move along the direction of arrow A indication, so that the predetermined pattern on the photomask 32 continues to be transferred to step by step the negative photoresist layer on the regional 36b.After waiting to finish the exposure program of regional 36a and regional 36b, follow moving substrate 36, so that the regional 36c on the substrate 36 moves to the suitable position of photomask 32 and 33 belows, light area.Then, substrate 36 moves along the direction of arrow A indication, so that the predetermined pattern on the photomask 32 is transferred to the negative photoresist layer on regional 36c and the regional 36d step by step.
The light area 33 of arc is perpendicular to the spacing at the two ends, the left and right sides of substrate 36 moving directions and the same length of photomask 32.The light area 33 of arc is parallel between the rear and front end of substrate 36 moving directions apart from roughly the same with the width of photomask 32.Similarly, during as if use rectangle sensitive area, the light area of rectangle is perpendicular to the same length of distance between the two ends, the left and right sides of substrate 36 moving directions with photomask 32.And the light area of rectangle is parallel between the rear and front end of substrate 36 moving directions apart from roughly the same with the width of photomask 32.
Wherein, the exposure of above-mentioned zone 36a, 36b, 36c and 36d order can be exchanged, and its main feature is to be fixed light source 31 and photomask 32, by pedestal 35 moving substrates 36 to finish exposure program.Wherein the width of photomask 32 and length are respectively W and L, and the width of light area, length and A/F are respectively W ', L ' and t, and width and the length of arbitrary glass substrate 36a, 36b, 36c and 36d are respectively W " and L ".In preferred embodiment of the present invention, W ' is slightly less than W, L ' is slightly less than L, t approximates the width of the colored filter of strip, and W is about W " 1/3 to 1/4; the rough L that equals of L ", promptly the size of photomask 32 only is about 1/10th of a substrate 36, dwindles many more than photomask needed in the art.
Then, carry out a development manufacture craft, to remove on the substrate 36 not negative photoresist layer by light shone.Repeat above-mentioned coating negative photoresist layer, exposure and development manufacture craft for several times, just the R/G/B chromatograph of colorized optical filtering mirror can be made on glass substrate 36a, 36b, 36c and the 36d.Wherein, as shown in Figure 5, the neighboring area 36e on the substrate 36 is used for separating display panels 36a, 36b, 36c and 36d, is the zone of not wishing to be subjected to light therefore, and the negative photoresist layer that makes back this neighboring area 36e that develops is by flush away.For cutting apart display panels 36a, 36b, 36c and 36d smoothly, can utilize following several mode:
(1) in exposure process, with movable catch (Dynamic mask blade) above reasonable time point inserts base material to obstruct the light, make negative photoresist layer on the 36e of neighboring area can not be subjected to the irradiation of light.
(2) in exposure process, add a masking device (shield frame) in addition, as a frame-type photomask between photomask 32 and substrate 36, so that the negative photoresist layer on the 36e of neighboring area can not be subjected to the irradiation of light.
(3) utilize non-rotating to apply the negative photoresist floor spacing is arranged is covered on the substrate forming a plurality of strip photoresists district, and then expose.
(4) use dynamic photomask (active mask) as the liquid crystal type photomask, utilize voltage to turn to obstruct the light or to allow light pass through by liquid crystal molecule.
(5) RGB uses positive light anti-etching agent (positive type resist), and neighboring area 36e is exposed in addition.
In said method, not only easy, save time again with the tool economic benefit of (3) kind mode, segmentation effect is also best.Below promptly do further narration at method how to utilize the non-rotating cladding process on a sheet of substrate, to apply the photoresist layer of 9 display panels.
The present invention uses a photoresist coating unit to finish (3) above-mentioned kind mode.The photoresist coating unit is used for evenly applying photoresist liquid on substrate 76, and it includes photoresist applicator 71, a photoresist supply and pedestal 35.Photoresist applicator 71 has a plurality of palisade openings.The photoresist supply can be made up of institutes such as pipeline and forcing pumps shown in Fig. 4 A, in order to supply photoresist liquid to photoresist applicator 71.Pedestal 35 is then as indicated above, in order to take advantage of carried base board 76.Wherein, substrate 76 can relatively move so that photoresist liquid forms a plurality of strip photoresists district on substrate 76 with 71 generations one of photoresist applicator.
The present invention is used the photoresist coating unit, and the method that forms the photoresist layer is described below.At first, as shown in Figure 6A, utilizing photoresist applicator 71 to carry out photoresist liquid along the Y direction on substrate 76 applies, wherein photoresist applicator 71 has 3 palisade openings, and therefore these palisade openings gap that is separated by applies out photoresist district 72a, 72b, the 72c of three strips.Then, shown in Fig. 6 B, substrate 76 is carried out along the strip of directions X exposure (stripeexposure), and the moving direction of substrate is vertical with the coating direction of photoresist applicator 71 during exposure, and exposure area and exposure directions are shown in arrow E1, E2, E3.Because the part of negative photoresist irradiation can stay after development, and leave the space between the negative photoresist of strip, therefore behind the exposure imaging, can produce regional 78a, 78b, 78c, 78d, 78e, 78f, 78g, 78h, 78i, each zone corresponds to a display panels.In other words, the meeting nature forms the photoresist distributive province of 9 display panels on the substrate 76, and need not block the neighboring area of not wishing to be subjected to light on the substrate 76 than modes such as costliness (as modes such as (1), (2), (4), (5)) with other cost, just can reach the effect that liquid crystal panel separates smoothly.
Wherein, when these three the strip photoresist districts on the substrate 76 are exposed, suppose that the order of exposure is regional 78a, 78d, 78g, 78b, 78e, 78h, with 78c, 78f, 78i, exposure program then of the present invention is as follows.At first, carry out step (a), moving substrate 76 is so that photomask 32 is positioned at the top to regional 78a.Then, carry out step (b), along directions X moving substrate 76 so that photomask 32 produces with substrate 76 relatively moves, exposure actions with the photoresist of finishing regional 78a, make on the photomask 32 by the formed predetermined pattern of a plurality of regularly arranged openings, be able to transcription and become strip exposing patterns (promptly being the strip pattern of colored filter) among the regional 78a.Then, step (c) continues X along the direction translation, so that photomask 32 is positioned at the top to regional 78d with substrate 76.Then, carry out step (d), so that photomask 32 relatively moves with substrate 76 generations, finish the exposure actions of the photoresist of regional 78d, to form the strip exposing patterns among the regional 78d along directions X moving substrate 76.Afterwards, carry out step (e), along the directions X translation, so that photomask 32 is positioned at the top to regional 78g, and continue to make photomask 32 and substrate 76 generations to relatively move, substrate 76 to form the strip exposing patterns among the regional 78g.Via strip exposure first time manufacture craft by step (a)～(e) formed, with finish regional 78a, 78d, with the exposure actions of 78g.
In like manner, then photomask 32 is positioned over the top of regional 78b, and carries out secondary strip exposure manufacture craft, with finish regional 78b, 78e, with the exposure actions of 78h.Afterwards, again photomask 32 is placed on the top of regional 78c, and carries out strip exposure manufacture craft for the third time, with finish regional 78c, 78f, with the exposure actions of 78i.Two row have non-exposed area (can stop light by the non-open region of photomask, light can't be penetrated so far in the non-exposed area) between the zones, to isolate along two adjacent zones of Y direction.Wherein, the bearing of trend in three strip photoresist districts is the Y direction, and the bearing of trend of strip exposing patterns is along directions X, and the two is vertical mutually.
In addition, the air-flotation type system 38 on the pedestal 35 of the present invention can be divided into PA type pedestal and PV type pedestal according to the air supporting principle.Fig. 7 A is the synoptic diagram of PA type pedestal.In the PA type pedestal 35, gas blowing orifice flow goes out shown in arrow a1, a2, a3, a4, a5, is discharged into normal pressure (release to atmosphere) shown in arrow b1, b2, b3, b4, b5 from adjacent holes again.Fig. 7 B is the synoptic diagram of PV type pedestal.In the PV type pedestal 35, gas, is extracted gas out shown in arrow d1, d2, d3, d4, d5 from adjacent holes in the mode of vacuumizing (vacuum) shown in arrow c1, c2, c3, c4, c5 from the spray orifice ejection again.From the above: the main difference of PA type pedestal and PV type pedestal is: PV type pedestal is extracted gas out with air suction mode.Therefore, place the substrate 36 of PV type pedestal top can be subjected to stronger suction and more close pedestal 35.Generally speaking, in the PA type pedestal, substrate 36 is about 50～200 μ m with the distance of pedestal 35, and in the PV type pedestal, substrate 36 is about 30～100 μ m with the distance of pedestal 35.
In practical application, the air-flotation type system can be in conjunction with PA type pedestal and PV type pedestal.Please refer to Fig. 7 C, it illustrates the synoptic diagram according to the air-flotation type system of a preferred embodiment of the present invention.Shown in Fig. 7 C, pedestal 35 is made up of PA type-PV type-PA type.When substrate 36 moves from left to right, during through PV type zone, can more stably move owing to be subjected to a downward suction, therefore can carry out important production process to substrate 36, as the photoresist that utilizes photoresist applicator 34b to carry out substrate 36 applies in PV type zone.In addition, except the photoresist applicator, pedestal 35 also can install additional as ultraviolet light device, in order to substrate is carried out the ultraviolet ray irradiation, perhaps installs arrangement for detecting additional, whether keeps certain value in order to check the distance between substrate 36 and the pedestal 35.
Compared with prior art, the present invention with the photomask size be contracted to photomask on the sizableness of light area, and make simultaneously between substrate and photomask and produce relative motion so that the predetermined pattern on the photomask step by step transcription become a strip exposing patterns on the substrate.Existing employed photomask is approximately the several times of photomask size used in the present invention, therefore, uses instead can reduce significantly behind the present invention and makes the used photomask cost of colorized optical filtering mirror.In addition, utilization air-flotation type system is bearing substrate stably, but not revolving photoresist applicator can make the manufacturing process of liquid crystal panel more simple and easy, and the panel separating effect is more good.
In sum; though disclosed the present invention in conjunction with above preferred embodiment; yet it is not in order to limit the present invention; any skilled personnel without departing from the spirit and scope of the present invention; can be used for a variety of modifications and variations, so protection scope of the present invention should be with being as the criterion that claim was defined.
Claims (21)
1. method of making colored filter includes the following step:
One substrate is provided;
Provide a photoresist applicator, on this substrate, to apply a plurality of strip photoresists district;
One light source is provided, is used for producing the light of an exposure usefulness;
One photomask with predetermined pattern is provided, places between this light source and this substrate; And
When this a plurality of strip photoresists district was carried out an exposure program, the relativity by this substrate and this photomask moved, and made the predetermined pattern on this photomask be become a strip exposing patterns on this substrate by transcription.
2. the method for claim 1, wherein these a plurality of strip photoresist districts and this strip exposing patterns are orthogonal.
3. the method for claim 1, wherein this substrate is taken advantage of by a pedestal and is carried, and this pedestal comprises:
This substrate is carried in order to take advantage of in one air-flotation type system, makes this substrate be suspended in this pedestal top one spacing; And
One driving section is connected with this air-flotation type system, in order to drive this substrate.
4. the method for claim 1, wherein this predetermined pattern has a plurality of regularly arranged openings that are.
5. the method for claim 1, wherein this light source can form an arc the light area on this photomask, wherein this light area perpendicular between the two ends, the left and right sides of this substrate moving direction apart from the same length of this photomask.
6. the method for claim 1, wherein this light source can form the light area of an arc on this photomask, and it is roughly the same that wherein this light area is parallel to the width of the spacing of rear and front end of this substrate moving direction and this photomask.
7. the method for claim 1, wherein this light source can form the light area of a rectangle on this photomask, and wherein this light area is perpendicular to the spacing at the two ends, the left and right sides of this substrate moving direction and the same length of this photomask.
8. the method for claim 1, wherein this light source can form the light area of a rectangle on this photomask, and it is roughly the same that wherein this light area is parallel to the width of the spacing of rear and front end of this substrate moving direction and this photomask.
9. the method for claim 1, wherein this photoresist applicator has a plurality of palisade openings, and the gap that all is separated by between those palisade openings.
10. the method for claim 1, wherein this photoresist applicator is with this a plurality of strip photoresists district of the coating of a first direction on this substrate, and the moving direction of this first direction when carrying out this exposure program with this substrate is vertical.
11. method as claimed in claim 3, wherein this air-flotation type system also comprises an arrangement for detecting, whether keeps certain value in order to this spacing of checking this substrate and this pedestal.
12. the photoresist coating unit that method adopted of making colored filter according to claim 1 is used for evenly applying photoresist liquid on described substrate, this coating unit includes:
Described photoresist applicator has a plurality of palisade openings;
One photoresist supply is in order to supply this photoresist liquid to this photoresist applicator; And
One pedestal carries this substrate in order to take advantage of;
Wherein, this substrate can relatively move so that this photoresist liquid forms a plurality of strip photoresists district on this substrate with this photoresist applicator generation one.
13. coating unit as claimed in claim 12, one first gap wherein all is separated by between these a plurality of palisade openings.
14. coating unit as claimed in claim 13 wherein have one second gap between this a plurality of strip photoresists district, and the size in this second gap is suitable with this first gap.
15. exposure device that method adopted of making colored filter according to claim 1, be used for the photoresist layer on the described substrate is exposed, this exposure device includes: described light source and described photomask and a pedestal, described pedestal moves in order to take advantage of to carry and drive described substrate.
16. exposure device as claimed in claim 15, wherein this pedestal comprises:
This substrate is carried in order to take advantage of in one air-flotation type system, makes this substrate be suspended in this pedestal top one spacing; And
One driving section links with this air-flotation type system, in order to drive this substrate.
17. exposure device as claimed in claim 15, wherein this predetermined pattern has a plurality of regularly arranged openings that are.
18. exposure device as claimed in claim 15, wherein this light source can form the light area of an arc on this photomask, and wherein this light area is perpendicular to the spacing at the two ends, the left and right sides of this substrate moving direction and the same length of this photomask.
19. exposure device as claimed in claim 15, wherein this light source can form the light area of an arc on this photomask, and it is roughly the same that wherein this light area is parallel to the width of the spacing of rear and front end of this substrate moving direction and this photomask.
20. exposure device as claimed in claim 15, wherein this light source can form the light area of a rectangle on this photomask, and wherein this light area is perpendicular to the spacing at the two ends, the left and right sides of this substrate moving direction and the same length of this photomask.
21. exposure device as claimed in claim 15, wherein this light source can form the light area of a rectangle on this photomask, and wherein the rear and front end that is parallel to this substrate moving direction, this light area is roughly the same in the width of the spacing of vertical direction and this photomask.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB031034306A CN100449404C (en) | 2003-01-30 | 2003-01-30 | Exposure device and method for manufacturing color filter |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB031034306A CN100449404C (en) | 2003-01-30 | 2003-01-30 | Exposure device and method for manufacturing color filter |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1521564A CN1521564A (en) | 2004-08-18 |
| CN100449404C true CN100449404C (en) | 2009-01-07 |
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| Application Number | Title | Priority Date | Filing Date |
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| CNB031034306A Expired - Fee Related CN100449404C (en) | 2003-01-30 | 2003-01-30 | Exposure device and method for manufacturing color filter |
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Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1955842B (en) * | 2005-10-27 | 2010-06-16 | 中华映管股份有限公司 | Lithographic apparatus |
| CN101281364B (en) * | 2007-04-03 | 2012-10-31 | 奇美电子股份有限公司 | Manufacturing method of color filter and manufacturing method of liquid crystal display panel |
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| JPH04186719A (en) * | 1990-11-20 | 1992-07-03 | Seiko Epson Corp | Nozzle for dispenser |
| JPH09281478A (en) * | 1996-04-18 | 1997-10-31 | Toppan Printing Co Ltd | Pattern exposure method |
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| CN1242084A (en) * | 1996-12-23 | 2000-01-19 | 新系统有限公司 | System for the transfer of digitized images to an image support or vice-versa |
| JP2000077319A (en) * | 1998-08-28 | 2000-03-14 | Canon Inc | Device and method for arranging its structure part |
| JP2000214595A (en) * | 1999-01-25 | 2000-08-04 | Ushio Inc | Exposure device for strip-shaped work |
| JP4186719B2 (en) * | 2003-05-07 | 2008-11-26 | ソニー株式会社 | Program receiving apparatus, program receiving method, program recording apparatus, information processing apparatus, and information providing system |
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| JPS62115719A (en) * | 1985-11-14 | 1987-05-27 | Canon Inc | Light optical system |
| JPH04186719A (en) * | 1990-11-20 | 1992-07-03 | Seiko Epson Corp | Nozzle for dispenser |
| JPH09281478A (en) * | 1996-04-18 | 1997-10-31 | Toppan Printing Co Ltd | Pattern exposure method |
| US5976256A (en) * | 1996-11-27 | 1999-11-02 | Tokyo Electron Limited | Film coating apparatus |
| CN1242084A (en) * | 1996-12-23 | 2000-01-19 | 新系统有限公司 | System for the transfer of digitized images to an image support or vice-versa |
| JP2000077319A (en) * | 1998-08-28 | 2000-03-14 | Canon Inc | Device and method for arranging its structure part |
| JP2000214595A (en) * | 1999-01-25 | 2000-08-04 | Ushio Inc | Exposure device for strip-shaped work |
| JP4186719B2 (en) * | 2003-05-07 | 2008-11-26 | ソニー株式会社 | Program receiving apparatus, program receiving method, program recording apparatus, information processing apparatus, and information providing system |
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| CN1521564A (en) | 2004-08-18 |
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