CN100444027C - Method for making inverted trapezoidal structure by micropatterning complementary structure - Google Patents

Abstract

The invention belongs to a complementary structure micropattern processing method. Firstly, microstructures with positive trapezoidal cross-sections were fabricated on the substrate surface by capillary micromolding. Using this structure as a support, another layer of thin film is applied on its surface. Then choose a solvent that can dissolve the microstructure produced by capillary micromolding, but not dissolve the surface film to dissolve the microstructure, and drive the film on the surface to peel off together, thereby leaving a microstructure with an inverted trapezoidal cross-section on the surface of the substrate. The structure can be used for the separation of the organic semiconductor layer and the electrode layer in the organic flat panel display. Compared with the prior art, the present invention has the characteristics of simple equipment and process, and can produce inverted trapezoidal structures of various materials in principle.

Description

Method for making inverted trapezoidal structure by micropatterning complementary structure

technical field

The invention belongs to a micro-patterning processing method, in particular to a method for producing an inverted trapezoidal structure by micro-patterning a complementary structure used for the production of an organic light-emitting layer and an electrode separator for an organic electroluminescent matrix display.

Background technique

Organic light-emitting display has become one of the most popular flat-panel display technologies due to its characteristics of flexibility, light weight, low energy consumption, and wide viewing angle. When applying organic electroluminescent diodes to flat panel displays, it is necessary to arrange the diodes in a matrix form. Diodes arranged in a matrix are generally specified by the method of vertical crossing of row electrodes and column electrodes. On the substrate with patterned row electrodes, in order to realize the separation of the column electrodes and to protect the performance of the organic semiconductor layer, it is necessary to select an applicable micropatterning method.

In the prior art, a mask is generally placed between the evaporation source and the deposition substrate, and then direct evaporation is performed. This method has a simple process and can protect the performance of the organic light emitting diode, but the precision of the processing matrix is limited by the precision of the mask plate and the precision of the evaporation system.

There is also an inverted trapezoidal structure (undercut structure) made by photolithography. The cross section of the structure is an inverted trapezoid, that is, a structure with a wide top and a narrow bottom. It can be used as a separator after the organic semiconductor layer and electrode layer are deposited to realize organic semiconductor layer. and separation of the electrode layer. In addition, on July 4, 2003, "Advanced Materials", Volume 15, page 1075, published by Wiley Press, reported a work by LeeHong H. et al. of Korea entitled "The Fabrication of Inverted Trapezoidal Three-dimensional Structure and Its Application in Organic Light-Emitting Diodes". " article. In this article, the inverted trapezoidal structure of photolithography is used to make a soft template of silicone rubber. Using the soft template and capillary micro-molding method, the epoxy resin is capillary and cured to obtain an inverted trapezoidal structure of epoxy resin and used for organic semiconductor layers. and separation after electrode layer deposition. Due to the disadvantages of complex and expensive lithography equipment, the need to control the ambient temperature and cleanliness, and complex processing steps in the lithography process, the inverted trapezoidal structure of epoxy resin produced by the capillary micromolding described above, although it is different from that of lithography Compared with the method, the requirements for expensive equipment and harsh environment are overcome, and the processing steps are simplified at the same time, but the inverted trapezoidal structure of the epoxy resin cannot be used for the lift-off process.

Contents of the invention

In order to overcome the shortcomings of the above two technologies, the present invention provides a method for making an inverted trapezoidal structure by micro-patterning an organic light-emitting layer and an electrode separator for an organic electroluminescent matrix display, which can realize a soluble organic film made of inverted trapezoidal structure.

Firstly, a capillary micromolding method is used to fabricate a microstructure with a regular trapezoidal cross-section on the surface of a target substrate, and then coat another layer of film on it. A solvent is then selected that can dissolve the microstructural material produced by capillary micromolding, but has no effect on the film material coated on its surface. When the microstructure produced by capillary micromolding dissolves from the substrate, the film coated on its surface is driven to fall off, leaving a microstructure with an inverted trapezoidal cross section on the surface of the substrate.

The specific steps and conditions for implementing the method are described as follows:

1), as shown in Figure 1, select the polydimethylsiloxane soft template 2 with a positive trapezoidal surface pattern cross section, place the polydimethylsiloxane soft template 2 on the target substrate 1, and polydimethylsiloxane soft template 2 A capillary channel 3 is formed between the methylsiloxane soft template 2 and the target substrate 1 . Add an aqueous solution of polyvinylpyrrolidone with a mass concentration of 10-30% to the port 3 of the capillary channel, and after the aqueous solution of polyvinylpyrrolidone flows into the capillary channel 3 under the action of capillary force, the polydimethylsiloxane The oxane soft template 2 and the target substrate 1 are placed together in a 30-80° C. drying oven to dry the aqueous solution of polyvinylpyrrolidone.

2), peel off the polydimethylsiloxane soft template 2 from the dried target substrate 1, and apply a thickness corresponding to the maximum height of the polyvinylpyrrolidone microstructure on the target substrate 1 with the polyvinylpyrrolidone 4 pattern photoresist film 5, and then the photoresist film 5 is dried.

3) The target substrate 1 obtained after the treatment in step 2) is placed in water, the polyvinylpyrrolidone 4 is dissolved, and the photoresist film 5 coated on its surface is driven to peel off. The target substrate 1 after the above treatment is dried, and an inverted trapezoidal structure 6 of photoresist is obtained on the target substrate 1 .

The target substrate 1 described in the method of the present invention is glass or glass with indium tin oxide deposited on its surface.

Compared with the photolithography technology, the method of the present invention only needs to use simple equipment such as a drying oven and a spin coater, and the processing process only needs three steps, so the processing technology is simpler. Since pure water is used as the main solvent in the processing, the pollution to the environment can be effectively reduced. At the same time, the above method has processed a pattern with a precision of 5 microns, which is higher than the precision of 10 microns of the inverted trapezoidal structure processed by general photolithography technology. Compared with the technology of capillary micromolding to make epoxy resin inverted trapezoidal structure, the structure made by the method of the present invention can not only be used for the separation of organic layer and electrode in organic electroluminescent matrix display, but also can be used for stripping process, so the present invention Compared with the inverted trapezoidal structure of epoxy resin produced by capillary micromolding, the structure produced by the invention has a wider application range.

Description of drawings

FIG. 1 is a schematic diagram of the process of manufacturing an inverted trapezoidal structure by micropatterning complementary structures.

A of FIG. 1 is a schematic diagram of a polydimethylsiloxane soft template 2 and a target substrate 1 forming a capillary channel 3 .

B of FIG. 1 is a schematic diagram of a polydimethylsiloxane soft template 2 and a target substrate 1 forming a capillary channel 3 and filling it with polyvinylpyrrolidone 4 .

C in FIG. 1 is a schematic diagram after coating a photoresist film 5 on the surface of polyvinylpyrrolidone 4 .

D of FIG. 1 is a schematic diagram of the finally obtained inverted trapezoidal structure 6 of the photoresist.

In Fig. 1, 1-substrate, 2-polydimethylsiloxane soft template, 3-capillary channel, 4-polyvinylpyrrolidone, 5-photoresist film, 6-photoresist inverted ladder structure.

Fig. 2 is a scanning electron micrograph of the inverted trapezoidal structure 6 of the photoresist produced by the method of forming the inverted trapezoidal structure by micropatterning the complementary structure.

Detailed ways

Example 1

1) Select a polydimethylsiloxane soft template 2 with a positive trapezoidal surface cross-section, place the polydimethylsiloxane soft template 2 on the glass substrate 1, and place the polydimethylsiloxane soft template 2 on the glass substrate 1. A capillary channel 3 is formed between the template 2 and the glass substrate 1 . Add an aqueous solution of polyvinylpyrrolidone with a concentration of 10% by weight to the capillary channel 3, and after the aqueous solution of polyvinylpyrrolidone flows into the capillary channel 3 under the action of capillary force, soften the polydimethylsiloxane The template 2 and the glass substrate 1 were placed together in a drying oven at 30 degrees Celsius to dry the polyvinylpyrrolidone aqueous solution.

2), peel off the polydimethylsiloxane soft template 2 from the dried glass substrate 1, coat a photoresist film 5 on the glass substrate 1 with polyvinylpyrrolidone 4 patterns, and then apply the photoresist film 5 drying.

3) Place the above-treated glass substrate 1 in water, the polyvinylpyrrolidone 4 dissolves, and drives the photoresist film 5 coated on its surface to peel off. The above-treated glass substrate 1 is dried to obtain an inverted trapezoidal structure 6 of the photoresist pattern.

Example 2

1), select the polydimethylsiloxane soft template 2 whose surface pattern cross-section is a regular trapezoidal structure, and place the polydimethylsiloxane soft template 2 on the glass substrate with indium tin oxide deposited on the surface (hereinafter referred to as On the "ITO glass substrate") 1 , a capillary channel 3 is formed between the polydimethylsiloxane soft template 2 and the ITO glass substrate 1 . Add an aqueous solution of polyvinylpyrrolidone with a concentration of 20% by weight to the capillary channel 3, and after the aqueous solution of polyvinylpyrrolidone flows into the capillary channel 3 under the action of capillary force, soften the polydimethylsiloxane The template 2 and the ITO glass substrate 1 were placed together in a drying oven at 50 degrees Celsius to dry the polyvinylpyrrolidone aqueous solution.

2), the polydimethylsiloxane soft template 2 is peeled off from the dried ITO glass substrate 1, and a photoresist film 5 is coated on the ITO glass substrate 1 with polyvinylpyrrolidone 4 patterns, and then photoetched Adhesive film 5 is dried.

3) Place the above-treated ITO glass substrate 1 in water, the polyvinylpyrrolidone 4 dissolves, and drives the photoresist film 5 coated on its surface to peel off. The ITO glass substrate 1 after the above treatment is dried to obtain the inverted trapezoidal structure 6 of the photoresist pattern.

Example 3

1) Select the polydimethylsiloxane soft template 2 whose surface pattern cross-section is a regular trapezoidal structure, place the polydimethylsiloxane soft template 2 on the glass substrate 1, and the polydimethylsiloxane soft template 2 and the glass substrate 1 form a capillary channel 3 . Add an aqueous solution of polyvinylpyrrolidone with a concentration of 30% by weight to the end of the capillary channel 3, and after the aqueous solution of polyvinylpyrrolidone flows into the capillary channel 3 under the action of capillary force, soften the polydimethylsiloxane The template 2 and the glass substrate 1 were placed together in a drying oven at 80 degrees Celsius to dry the polyvinylpyrrolidone aqueous solution.

2) Peel off the polydimethylsiloxane soft template 2 from the dried glass substrate 1, apply a photoresist film 5 on the glass substrate 1 with polyvinylpyrrolidone 4 patterns, and then apply the photoresist film 5 drying.

3) Place the above-treated glass substrate 1 in water, the polyvinylpyrrolidone 4 dissolves, and drives the photoresist film 5 coated on its surface to peel off. The above-treated glass substrate 1 is dried to obtain an inverted trapezoidal structure 6 of the photoresist pattern.

Claims (8)

1. A method for making an inverted trapezoidal structure by micro-patterning complementary structures, characterized in that the steps and conditions are as follows: 1), select the polydimethylsiloxane soft template (2) whose surface pattern cross-section is a regular trapezoidal structure, place the polydimethylsiloxane soft template (2) on the target substrate (1), polydimethylsiloxane A capillary channel (3) is formed between the methylsiloxane soft template (2) and the target substrate (1), and an aqueous solution of polyvinylpyrrolidone with a mass concentration of 10-30% is added to the port of the capillary channel (3) place, after the aqueous solution of polyvinylpyrrolidone flows into the capillary channel (3) under the action of capillary force, place the polydimethylsiloxane soft template (2) and the target substrate (1) together at 30-80°C The aqueous solution of polyvinylpyrrolidone is dried in the dry box; 2) Peel off the polydimethylsiloxane soft template (2) from the dried target substrate (1), and coat the polyvinylpyrrolidone (4) patterned target substrate (1) with polyvinyl pyrrolidone The maximum height of the pyrrolidone microstructure corresponds to the thickness of the photoresist film (5), and then the photoresist film (5) is dried; 3), place the target substrate (1) obtained after step 2) in water, polyvinylpyrrolidone (4) dissolves, and drives the photoresist film (5) coated on its surface to peel off, and after the above treatment After the target substrate (1) is dried, an inverted trapezoidal structure (6) of photoresist is obtained on the target substrate (1). 2. The method for fabricating an inverted trapezoidal structure by micropatterning complementary structures according to claim 1, characterized in that the target substrate (1) is glass with indium tin oxide deposited on its surface. 3. The method for fabricating inverted trapezoidal structures by micropatterning complementary structures as claimed in claim 1, characterized in that the mass concentration of polyvinylpyrrolidone in the aqueous solution is 10%. 4. The method for fabricating inverted trapezoidal structures by micropatterning complementary structures as claimed in claim 1, characterized in that the mass concentration of polyvinylpyrrolidone in the aqueous solution is 20%. 5. The method for producing inverted trapezoidal structures by micropatterning complementary structures as claimed in claim 1, characterized in that the mass concentration of polyvinylpyrrolidone in the aqueous solution is 30%. 6. The method for fabricating an inverted trapezoidal structure by micropatterning complementary structures as claimed in claim 1, characterized in that the drying temperature of the soft template and the target substrate (1) is 30 degrees Celsius. 7. The method for fabricating an inverted trapezoidal structure by micropatterning complementary structures according to claim 1, characterized in that the soft template and the target substrate (1) are dried at a temperature of 50 degrees Celsius. 8. The method for fabricating an inverted trapezoidal structure by micropatterning complementary structures as claimed in claim 1, characterized in that the drying temperature of the soft template and the target substrate (1) is 80 degrees Celsius.

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