CN100431182C - light emitting assembly - Google Patents
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Description
技术领域 technical field
本发明涉及一种发光二极管,尤其是涉及一种具有漫射面的发光组件。The invention relates to a light-emitting diode, in particular to a light-emitting component with a diffusing surface.
背景技术 Background technique
发光组件的应用颇为广泛,例如,可应用于光学显示装置、激光二极管、交通号标志、数据储存装置、通讯装置、照明装置、以及医疗装置。在此技术中,目前技术人员重要课题之一是如何提高发光组件的发光效率。Light-emitting components are widely used, for example, in optical display devices, laser diodes, traffic signs, data storage devices, communication devices, lighting devices, and medical devices. In this technology, one of the important topics for technicians at present is how to improve the luminous efficiency of the light-emitting component.
由Snell定律的关系可知,光只有在临界角θc内才可以完全射出,超过此临界角外的光线则会被反射而可能被吸收。换言之,当发光二极管所发出的光由折射率高的材料进入折射率低的介质中时,由发光二极管发光层内部所产生的光线,需在2θc的圆锥形才可顺利射出到发光二极管外部。也就是发光二极管所发出的光由高折射率的发光二极管外延层进入低折射率的介质环境中,例如基板或空气等,发光二极管发光层内部所产生的光线会部分经由折射进入介质环境中,但有一部份入射角大于临界角的入射光线被反射回发光二极管外延层,由于发光二极管外延层周围环境皆为低介质材料,因此反射光线经由内部来回反射最后部分光线被吸收或完全消失。From the relationship of Snell's law, it can be seen that light can be completely emitted only within the critical angle θc , and light beyond this critical angle will be reflected and may be absorbed. In other words, when the light emitted by the light-emitting diode enters the medium with a low refractive index from a material with a high refractive index, the light generated inside the light-emitting layer of the light-emitting diode needs to be in the conical shape of 2θ c to be successfully emitted to the outside of the light-emitting diode. . That is, the light emitted by the light-emitting diode enters the medium environment with a low refractive index from the epitaxial layer of the light-emitting diode with a high refractive index, such as a substrate or air, etc., and the light generated inside the light-emitting layer of the light-emitting diode will partly enter the medium environment through refraction, However, a part of the incident light with an incident angle greater than the critical angle is reflected back to the epitaxial layer of the LED. Since the surrounding environment of the epitaxial layer of the LED is all low-dielectric materials, the reflected light is reflected back and forth through the interior, and finally part of the light is absorbed or completely disappears.
Stefan Illek等人(美国专利公开第2002/0017652号)披露一种埋藏式微反射器,其利用蚀刻技术,将一发光组件的外延层蚀刻成一微反射结构,该微反射结构包括半圆球形、金字塔形或角锥形等,接着沈积一金属反射层于该外延层上,再将微反射结构外延层的顶端与一导电载体(硅芯片)键结在一起,再移除原先外延层的不透明基板。通过该埋藏式微反射器,使得所有由发光层产生射向该微反射器的光线皆反射回外延层,并以垂直发光二极管正面出光面的方向射出,而不会再受到临界角的限制。Stefan Illek et al. (U.S. Patent Publication No. 2002/0017652) disclose a buried microreflector, which uses etching technology to etch the epitaxial layer of a light-emitting component into a microreflective structure, which includes hemispherical, pyramidal Or pyramid shape, etc., then deposit a metal reflective layer on the epitaxial layer, then bond the top of the micro-reflective structure epitaxial layer with a conductive carrier (silicon chip), and then remove the opaque substrate of the original epitaxial layer . Through the buried micro-reflector, all light emitted from the light-emitting layer to the micro-reflector is reflected back to the epitaxial layer, and emitted in a direction perpendicular to the light-emitting surface of the front surface of the light-emitting diode, without being limited by the critical angle.
发明内容 Contents of the invention
本案发明人在思考如何解决内部全反射的问题点时获得一发明灵感,认为若提供一种发光组件,该发光组件利用一透明黏结层将一透光基板与一发光迭层结合在一起,该发光迭层具有一漫射面,该漫射面通过该透明黏结层与该透光基板相黏结,其中该发光迭层与该透明黏结层之间有折射率的差异,根据两者之间折射率差异,使得发光二极管内部产生的光线被取出机率提高,进而提高发光效率。由图1可知,发光层所发出的光线1A射向该漫射面时,光线1A部分经由折射进入透光基板形成一光场1B;另一部份光线1A则可通过该漫射面漫射(Diffuse)开来形成一光场1C,利用漫射面使得原先受临界角限制的光线经由漫射后反射回发光迭层,再经由发光迭层的正面被取出,如此将使得光线有较高的机率被取出。若仍有部分第一次漫射开来的光线又被发光迭层正面全反射回漫射面,则可再经由漫射面第二次漫射改变光线入射角,以提高光取出机率。因此不论经过几次全反射的光线,只要经过漫射面将光线漫射开,即可增加光取出机率,进而提高发光效率。The inventor of this case obtained an inspiration when thinking about how to solve the problem of total internal reflection. He believed that if a light-emitting component is provided, the light-emitting component uses a transparent adhesive layer to combine a light-transmitting substrate and a light-emitting laminated layer. The light-emitting stack has a diffusing surface, and the diffusing surface is bonded to the light-transmitting substrate through the transparent bonding layer, wherein there is a difference in refractive index between the light-emitting stacking layer and the transparent bonding layer, according to the refraction between the two The difference in efficiency increases the probability of the light generated inside the light-emitting diode being taken out, thereby improving the luminous efficiency. It can be seen from Figure 1 that when the light 1A emitted by the luminescent layer hits the diffusing surface, part of the light 1A enters the light-transmitting substrate through refraction to form a light field 1B; the other part of the light 1A can be diffused through the diffusing surface (Diffuse) to form a light field 1C, using the diffuse surface to make the light originally limited by the critical angle diffused and reflected back to the light-emitting stack, and then taken out through the front of the light-emitting stack, so that the light will have a higher chance of being removed. If some light diffused for the first time is still fully reflected back to the diffusion surface by the front of the light-emitting layer, the incident angle of the light can be changed through the second diffusion on the diffusion surface to increase the probability of light extraction. Therefore, no matter how many times the light has undergone total reflection, as long as the light is diffused through the diffusing surface, the probability of light extraction can be increased, thereby improving the luminous efficiency.
本发明的发光组件包括:一具有漫射面的半导体发光迭层,其中该半导体发光迭层系外延生长于一第一透光基板上;一第二透光基板;以及一形成于该第二透光基板及该半导体发光迭层的漫射面之间的透明黏结层,其中,该发光迭层与该透明黏结层之间有折射率的差异。The light-emitting component of the present invention includes: a semiconductor light-emitting laminate with a diffusing surface, wherein the semiconductor light-emitting laminate is epitaxially grown on a first light-transmitting substrate; a second light-transmitting substrate; and a semiconductor light-emitting laminate formed on the second A transparent bonding layer between the light-transmitting substrate and the diffusing surface of the semiconductor light-emitting laminated layer, wherein there is a difference in refractive index between the light-emitting laminated layer and the transparent bonding layer.
本发明的另一发光组件包括:一具有漫射面的半导体发光迭层;一透光基板;以及一形成于该透光基板及该半导体发光迭层的漫射面之间的透明导电黏结层,其中,该发光迭层与该透明黏结层之间有折射率的差异。Another light-emitting component of the present invention includes: a semiconductor light-emitting stack with a diffusing surface; a light-transmitting substrate; and a transparent conductive adhesive layer formed between the light-transmitting substrate and the diffusing surface of the semiconductor light-emitting stack , wherein there is a difference in refractive index between the light-emitting laminated layer and the transparent adhesive layer.
本发明的又一发光组件包括:一透光基板;形成于该透光基板上的一第一反应层;形成于该第一反应层上的一透明黏结层;形成于该透明黏结层上的一第二反应层;以及形成于该第二反应层上的一具有漫射面的半导体发光迭层,该漫射面与透明黏结层相接,其中,该发光迭层与该透明黏结层之间有折射率的差异。Another light-emitting component of the present invention includes: a light-transmitting substrate; a first reaction layer formed on the light-transmitting substrate; a transparent adhesive layer formed on the first reaction layer; a transparent adhesive layer formed on the transparent adhesive layer. A second reaction layer; and a semiconductor light-emitting layer with a diffusing surface formed on the second reaction layer, the diffusing surface is in contact with the transparent bonding layer, wherein the light-emitting layer and the transparent bonding layer There is a difference in the refractive index between them.
本发明的半导体发光迭层上表面还包括一第二漫射面。The upper surface of the semiconductor light-emitting stacked layer of the present invention also includes a second diffusing surface.
本发明所述的漫射面是为一粗化面。该漫射面也可具有一分布式图形,该分布式图形的表面为一粗化表面。The diffusion surface of the present invention is a rough surface. The diffusing surface can also have a distributed pattern, and the surface of the distributed pattern is a rough surface.
上述的分布式图形包括选自半圆球形、金字塔形、及角锥形所构成图形组群中的至少一种图形。The above-mentioned distributed graphics include at least one graphic selected from the group of graphics consisting of hemispherical, pyramidal, and pyramidal shapes.
在本发明中,上述的第二反应层可通过该漫射面将透明黏结层部分穿透与第一反应层接触,当第一及第二反应层为具导电性,透光基板为导电基板时,该第一及第二反应层产生欧姆接触,则该发光组件为垂直结构。In the present invention, the above-mentioned second reaction layer can partially penetrate the transparent adhesive layer and contact the first reaction layer through the diffusing surface. When the first and second reaction layers are conductive, the light-transmitting substrate is a conductive substrate. When the ohmic contact is formed between the first and second reaction layers, the light-emitting component has a vertical structure.
本发明所述的发光组件,其中该半导体发光迭层的同一方向具有一第一电极及一第二电极。在上述的第一电极及/或第二电及之下,半导体发光迭层之上分别包括一第一及/或一第二透光导电层;该透光导电层的材料包括选自氧化铟锡、氧化镉锡、氧化锑锡、氧化锌铝及氧化锌锡所构成材料组群中的至少一种材料或其它可代替的材料。In the light-emitting component of the present invention, the semiconductor light-emitting stack has a first electrode and a second electrode in the same direction. Under the above-mentioned first electrode and/or the second electrode, the semiconductor light-emitting stack layer includes a first and/or a second light-transmitting conductive layer; the material of the light-transmitting conductive layer includes selected from indium oxide At least one material in the material group formed by tin, cadmium tin oxide, antimony tin oxide, zinc aluminum oxide and zinc tin oxide, or other alternative materials.
当本发明所述的发光组件为垂直结构时,其中该半导体发光迭层的正面及透光基板反面分别形成一第一电极及一第二电极。在上述的第一电极及之下,半导体发光迭层正面之上包括一第一透光导电层;该透光导电层的材料包括选自氧化铟锡、氧化镉锡、氧化锑锡、氧化锌铝及氧化锌锡所构成材料组群中的至少一种材料或其它可代替的材料。When the light-emitting component of the present invention has a vertical structure, a first electrode and a second electrode are respectively formed on the front side of the semiconductor light-emitting stack and the back side of the light-transmitting substrate. Under the above-mentioned first electrode, a first light-transmitting conductive layer is included on the front surface of the semiconductor light-emitting stack; the material of the light-transmitting conductive layer includes selected from indium tin oxide, cadmium tin oxide, antimony tin oxide, zinc oxide At least one material in the material group composed of aluminum and zinc tin oxide or other alternative materials.
本发明所述的发光组件,其中该半导体发光迭层包括一第一半导体层;形成于该第一半导体层上的发光层;以及形成于该发光层上的第二半导体层。The light-emitting component of the present invention, wherein the semiconductor light-emitting stack includes a first semiconductor layer; a light-emitting layer formed on the first semiconductor layer; and a second semiconductor layer formed on the light-emitting layer.
本发明所述的发光组件,其中该第二透光基板,包括选自于GaP、SiC、Al2O3、及玻璃所构成材料组群中的至少一种材料。该半导体发光迭层,包括选自于AlGaInP、AlN、GaN、AlGaN、InGaN及AlInGaN所构成材料组群中的至少一种材料。In the light-emitting component of the present invention, the second light-transmitting substrate includes at least one material selected from the group consisting of GaP, SiC, Al2O3, and glass. The semiconductor light emitting layer includes at least one material selected from the material group consisting of AlGaInP, AlN, GaN, AlGaN, InGaN and AlInGaN.
该透明黏结层包括选自于聚醯亚胺(PI)、苯并环丁烯(BCB)、过氟环丁烯(PFCB)、及氧化铟锡所构成材料组群中的至少一种材料。The transparent adhesive layer includes at least one material selected from the group consisting of polyimide (PI), benzocyclobutene (BCB), perfluorocyclobutene (PFCB), and indium tin oxide.
本发明所述的透明导电黏结层包括选自于自发性导电高分子(Intrinsically conducting polymer)、及高分子中掺杂导电材料所构成材料组群中的至少一种材料。该高分子包括选自于聚醯亚胺(PI)、苯并环丁烯(BCB)、及过氟环丁烯(PFCB)所构成材料组群中的至少一种材料。该导电材料包括选自于氧化铟锡、氧化镉锡、氧化锑锡、氧化锌、氧化锌锡、Au、及Ni/Au所构成材料组群中的至少一种材料。透光基板具导电性。The transparent conductive adhesive layer of the present invention includes at least one material selected from the material group consisting of intrinsically conducting polymers and polymers doped with conductive materials. The polymer includes at least one material selected from the group consisting of polyimide (PI), benzocyclobutene (BCB), and perfluorocyclobutene (PFCB). The conductive material includes at least one material selected from the material group consisting of indium tin oxide, cadmium tin oxide, antimony tin oxide, zinc oxide, zinc tin oxide, Au, and Ni/Au. The transparent substrate is conductive.
上述的第一反应层包括选自于SiNx、Ti、及Cr所构成材料组群中的至少一种材料。第二反应层包括选自于SiNx、Ti、及Cr所构成材料组群中的至少一种材料。The above-mentioned first reaction layer includes at least one material selected from the material group consisting of SiNx, Ti, and Cr. The second reaction layer includes at least one material selected from the material group consisting of SiNx, Ti, and Cr.
附图说明Description of drawings
图1为一光线漫射图;Figure 1 is a light diffusion diagram;
图2为一显示本发明的发光组件的示意图;FIG. 2 is a schematic diagram showing a light-emitting component of the present invention;
图3为一显示本发明的发光组件的示意图。FIG. 3 is a schematic diagram showing a light emitting device of the present invention.
符号说明:Symbol Description:
10透光基板10 light-transmitting substrate
11透明黏结层11 transparent bonding layer
12第一半导体层12 first semiconductor layer
121漫射面121 diffuse surface
13发光层13 luminous layers
14第二半导体层14 Second semiconductor layer
15第一电极15 first electrode
16第二电极16 second electrode
20导电透光基板20 conductive light-transmitting substrate
21导电透明黏结层21 conductive transparent adhesive layer
具体实施方式 Detailed ways
实施例1Example 1
图2为本发明一较佳实施例的发光组件1,包括一透光基板10;形成于该透光基板10上的一透明黏结层11;形成于该透明黏结层11上的一第一半导体层12,该第一半导体层12接近透明黏结层侧的表面是一漫射面121,其中,该发光迭层与该透明黏结层之间有折射率的差异,该第一半导体层12远离透明黏结层侧具有一外延区及电极区;形成于该第一半导体层12外延区上的一发光层13;形成于该发光层13上的一第二半导体层14;形成于该第一半导体层12电极区上的一第一电极15;以及形成于该第二半导体层14上的一第二电极16。2 is a light-emitting component 1 of a preferred embodiment of the present invention, including a light-transmitting
上述的第一半导体层12、发光层13及第二半导体层14是于一第一透光基板上以外延方法形成。上述的漫射面121为一粗化面,该粗化面可于发光二极管外延制程中生长而成,或者是晶粒制程中经过化学蚀刻或利用感应耦合电浆(Inductive Coupling Plasma,ICP)干蚀刻技术蚀刻部分的第一半导体迭层12而成,接着再将该具有粗化面的发光二极管利用透明黏结层11转移接合至透光基板,使得该粗化面及透光基板通过该透明黏结层相接合。The above-mentioned
上述的漫射面121也可以预先图形的光罩蚀刻技术,在该第一半导体层表面形成一预定图形,该预定图形可以是半圆球形、金字塔形或角锥形,再接着在预定图形的第一半导体层表面形成一粗化表面,使得光取出效率提高。The above-mentioned
上述的透光基板与该透明黏结层之间可加入一第一反应层。A first reaction layer can be added between the above-mentioned transparent substrate and the transparent bonding layer.
透明黏结层与第一半导体层之间可加入一第二反应层,以增加透明黏结层的黏结力。A second reaction layer can be added between the transparent adhesive layer and the first semiconductor layer to increase the adhesion of the transparent adhesive layer.
在上述的第一电极之下,第一半导体层之上包括一第一透光导电层;在上述的第二电极之下,第二半导体层之上包括一第二透光导电层;该第一透光导电层的材料包括选自氧化铟锡、氧化镉锡、氧化锑锡、氧化锌铝及氧化锌锡所构成材料组群中的至少一种材料或其它可代替的材料;该第二透光导电层的材料包括选自氧化铟锡、氧化镉锡、氧化锑锡、氧化锌铝及氧化锌锡所构成材料组群中的至少一种材料或其它可代替的材料。Under the above-mentioned first electrode, the first semiconductor layer includes a first light-transmitting conductive layer; under the above-mentioned second electrode, the second semiconductor layer includes a second light-transmitting conductive layer; The material of a light-transmitting conductive layer includes at least one material selected from the material group consisting of indium tin oxide, cadmium tin oxide, antimony tin oxide, zinc aluminum oxide, and zinc tin oxide, or other alternative materials; the second The material of the transparent conductive layer includes at least one material selected from the material group consisting of indium tin oxide, cadmium tin oxide, antimony tin oxide, zinc aluminum oxide and zinc tin oxide, or other alternative materials.
上述的第二反应层可通过该漫射面将透明黏结层部分穿透与第一反应层接触,当第一及第二反应层为具导电性,透光基板为导电基板时,该第一及第二反应层产生欧姆接触,则该发光组件为垂直结构。The above-mentioned second reaction layer can partially penetrate the transparent adhesive layer and contact the first reaction layer through the diffusing surface. When the first and second reaction layers are conductive and the light-transmitting substrate is a conductive substrate, the first And the second reaction layer produces ohmic contact, then the light-emitting component has a vertical structure.
当发光组件为垂直结构时,可于该第二半导体之上透光基板之下分别形成一第一电极及一第二电极。在上述的第一电极及之下,第二半导体层之上包括一第一透光导电层;该透光导电层的材料包括选自氧化铟锡、氧化镉锡、氧化锑锡、氧化锌铝及氧化锌锡所构成材料组群中的至少一种材料或其它可代替的材料。When the light-emitting component has a vertical structure, a first electrode and a second electrode can be respectively formed on the second semiconductor and under the light-transmitting substrate. Under and above the first electrode, the second semiconductor layer includes a first light-transmitting conductive layer; the material of the light-transmitting conductive layer includes selected from indium tin oxide, cadmium tin oxide, antimony tin oxide, zinc aluminum oxide And at least one material in the material group composed of zinc tin oxide or other alternative materials.
实施例2Example 2
图3为本发明另一较佳实施例的发光组件2,其主要结构与发光组件1类似,差异处在于以一导电透明黏结层21取代透明黏结层11,而透光基板为一导电透光基板20,如此可以使发光组件2上下导通,第一电极15形成于导电透光基板20之下;第二电极16形成于第二半导体层14之上。Fig. 3 is another preferred embodiment of the light-emitting component 2 of the present invention, its main structure is similar to that of the light-emitting component 1, the difference is that a conductive
在发光组件2中,该第二电极之下,第二半导体层之上包括一透光导电层;该透光导电层的材料包括选自氧化铟锡、氧化镉锡、氧化锑锡、氧化锌铝及氧化锌锡所构成材料组群中的至少一种材料或其它可代替的材料。In the light-emitting component 2, a light-transmitting conductive layer is included under the second electrode and above the second semiconductor layer; the material of the light-transmitting conductive layer includes selected from indium tin oxide, cadmium tin oxide, antimony tin oxide, zinc oxide At least one material in the material group composed of aluminum and zinc tin oxide or other alternative materials.
上述的各实施例中第二半导体发光迭层上表面还包括一第二漫射面。In the above-mentioned embodiments, the upper surface of the second semiconductor light emitting stack further includes a second diffusing surface.
上述的各实施例中透光基板,包括选自于GaP、SiC、Al2O3、及玻璃所构成材料组群中的至少一种材料。In each of the above-mentioned embodiments, the light-transmitting substrate includes at least one material selected from the group consisting of GaP, SiC, Al2O3, and glass.
上述的导电透光基板,包括选自于GaP、及SiC所构成材料组群中的至少一种材料。The above-mentioned conductive and light-transmitting substrate includes at least one material selected from the material group consisting of GaP and SiC.
上述的第一半导体层、发光层及第二半导体层,包括选自于AlGaInP、AlN、GaN、AlGaN、InGaN及AlInGaN所构成材料组群中的至少一种材料。The above-mentioned first semiconductor layer, light emitting layer and second semiconductor layer include at least one material selected from the material group consisting of AlGaInP, AlN, GaN, AlGaN, InGaN and AlInGaN.
上述的透明黏结层包括选自于聚醯亚胺(PI)、苯并环丁烯(BCB)、过氟环丁烯(PFCB)、及氧化铟锡所构成材料组群中的至少一种材料。The above-mentioned transparent adhesive layer includes at least one material selected from the material group consisting of polyimide (PI), benzocyclobutene (BCB), perfluorocyclobutene (PFCB), and indium tin oxide .
上述的第一反应层包括选自于SiNx、Ti、及Cr所构成材料组群中的至少一种材料。The above-mentioned first reaction layer includes at least one material selected from the material group consisting of SiNx, Ti, and Cr.
上述的第二反应层包括选自于SiNx、Ti、及Cr所构成材料组群中的至少一种材料。The above-mentioned second reaction layer includes at least one material selected from the material group consisting of SiNx, Ti, and Cr.
上述的导电透明黏结层包括选自于自发性导电高分子(Intrinsicallyconducting polymer)、及高分子中掺杂导电材料所构成材料组群中的至少一种材料。其中该导电材料包括选自于氧化铟锡、氧化镉锡、氧化锑锡、氧化锌、氧化锌锡、Au、及Ni/Au所构成材料组群中的至少一种材料。The above-mentioned conductive transparent adhesive layer includes at least one material selected from the material group consisting of intrinsically conductive polymers and polymers doped with conductive materials. Wherein the conductive material includes at least one material selected from the group consisting of indium tin oxide, cadmium tin oxide, antimony tin oxide, zinc oxide, zinc tin oxide, Au, and Ni/Au.
以上所述的,仅为本发明的较佳实施例,本发明的范围不限于这些较佳实施例,凡依本发明所做的任何变更,皆属本发明申请专利的范围。因此任何本技术领域的普通技术人员,在不脱离本发明的权利要求书的范围及精神下,当然可做任何改变。The above descriptions are only preferred embodiments of the present invention, and the scope of the present invention is not limited to these preferred embodiments. Any changes made according to the present invention belong to the scope of patent application of the present invention. Therefore, any person skilled in the art can certainly make any changes without departing from the scope and spirit of the claims of the present invention.
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Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW415116B (en) * | 1999-07-02 | 2000-12-11 | Opto Tech Corp | Light-emitting diode (LED) capable of brightening illumination and the method of fabrication |
US20030057444A1 (en) * | 2001-07-24 | 2003-03-27 | Nichia Corporation | Semiconductor light emitting device |
CN1423842A (en) * | 1999-12-03 | 2003-06-11 | 美商克立光学公司 | Enhanced light extration in LEDS through the use of internal and external optical elements |
CN1498427A (en) * | 2001-03-21 | 2004-05-19 | ͬ�Ϳ�ҵ��ʽ���� | Semiconductor light emitting element |
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TW415116B (en) * | 1999-07-02 | 2000-12-11 | Opto Tech Corp | Light-emitting diode (LED) capable of brightening illumination and the method of fabrication |
CN1423842A (en) * | 1999-12-03 | 2003-06-11 | 美商克立光学公司 | Enhanced light extration in LEDS through the use of internal and external optical elements |
CN1498427A (en) * | 2001-03-21 | 2004-05-19 | ͬ�Ϳ�ҵ��ʽ���� | Semiconductor light emitting element |
US20030057444A1 (en) * | 2001-07-24 | 2003-03-27 | Nichia Corporation | Semiconductor light emitting device |
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