CN100417961C - Microlens and Optical Fiber Integration Method Based on Focused Ion Beam Technology - Google Patents
Microlens and Optical Fiber Integration Method Based on Focused Ion Beam Technology Download PDFInfo
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Abstract
Description
技术领域 technical field
本发明涉及一种采用聚焦离子束一步制作技术实现微透镜与光导纤维集成一体化的新方法,即基于聚焦离子束技术的微透镜与光纤集成方法。The invention relates to a new method for integrating a microlens and an optical fiber by adopting a one-step manufacturing technology of a focused ion beam, that is, a method for integrating a microlens and an optical fiber based on a focused ion beam technology.
背景技术 Background technique
“光纤透镜”在光学测量、环境监测、生化分析等领域有着愈来愈广泛的应用,尤其在近年来备受青睐的微光学系统研制和开发中起着至关重要的作用。早在80年代初,美国Crawford Hill实验室的G.Eisenstein等就用化学腐蚀法在单膜光纤端部的芯部制作出微型锥透镜(G.Eisenstein,and D.Vitello,“Chemically etched conical microlenses for coupling single-mode lasersinto single-mode fibers.”Applied Optics21(19),3470-3474(1982))。在此前后的近30年中,电弧熔化法、激光加工法、光致聚合法等方法相继问世(D.Kato,“Light coupling from astrip-geometry GaAs diode laser into an optical fiber with a spherical end.”J.Appl.Phys.44,2756-2758(1973))、H.M.Presby,A.F.Benner,and C.A.Edwards,“laser micromachining of efficientfiber microlenses,”Appl.Opt.29,2692-2695(1990)、Renaud Bachelot,Carole Ecoffet,etc.“Integration of micrometer-sized polymer elements at the end of optical fibers by free-radicalphotopolymerization,”Appl.Opt.40(32),5860-5871(2001))。"Fiber optic lens" has been widely used in optical measurement, environmental monitoring, biochemical analysis and other fields, especially in the development and development of micro-optical systems that have been favored in recent years. As early as the early 1980s, G. Eisenstein of the Crawford Hill Laboratory in the United States used chemical etching to produce micro-axicons at the core of the single-film fiber end (G. Eisenstein, and D. Vitello, "Chemically etched conical microlenses for coupling single-mode lasers into single-mode fibers." Applied Optics 21(19), 3470-3474(1982)). In the nearly 30 years before and after, methods such as arc melting, laser processing, and photopolymerization have come out one after another (D. Kato, "Light coupling from asstrip-geometry GaAs diode laser into an optical fiber with a spherical end." J.Appl.Phys.44, 2756-2758(1973)), H.M.Presby, A.F.Benner, and C.A.Edwards, "laser micromachining of efficient fiber microlenses," Appl.Opt.29, 2692-2695(1990), Renaud Bachelot, Carole Ecoffet, etc. "Integration of micrometer-sized polymer elements at the end of optical fibers by free-radical photopolymerization," Appl. Opt. 40(32), 5860-5871(2001)).
新加坡南洋理工大学精密工程与纳米技术中心与中国科学院光电技术研究所微细加工光学技术国家重点实验室合作研究出一种新的微透镜与光纤集成方法。实现精确控制的微透镜-光纤集成方法正将带来的应用前景已经使许多著名大学和研究单位在这方面不断开展探索性研究。但到目前为止,对于用聚焦离子束一步制作技术实现精确控制的微透镜与光纤集成方法,国内外还未见报道,相关技术细节也很少。The Center for Precision Engineering and Nanotechnology, Nanyang Technological University, Singapore, and the State Key Laboratory of Microfabrication Optical Technology, Institute of Optoelectronic Technology, Chinese Academy of Sciences, have jointly developed a new method of integrating microlenses and optical fibers. The application prospects brought by the microlens-fiber integration method for precise control have led many famous universities and research institutes to carry out exploratory research in this area. But so far, there have been no reports at home and abroad on the one-step fabrication technology of focused ion beams to achieve precise control of microlenses and optical fiber integration methods, and there are few related technical details.
已报道的传统集成方法共同的不足之处有两点:一是难以实现微透镜面型的精确控制,二是无法实现微衍射结构的集成。虽然意大利的M.Prasciolu等人于2003年报到了采用电子束刻蚀法在光纤端部制作出衍射结构(M.Prasciolu,D.Cojoc,S.Cabrini,etc.“Design and fabrication ofon-fiber diffractive elements for fiber-waeguide coupling by means of e-beamlithography,”Microelectronic Engineering,67-68,169-174(2003)),但是仍然需要图形转移工序将光刻胶图案转移致光纤端部。There are two common deficiencies in the reported traditional integration methods: one is that it is difficult to achieve precise control of the micro-lens surface, and the other is that it is impossible to achieve the integration of micro-diffraction structures. Although Italy's M.Prasciolu et al. reported in 2003 that the electron beam etching method was used to make a diffractive structure at the end of the fiber (M.Prasciolu, D.Cojoc, S.Cabrini, etc. "Design and fabrication of on-fiber diffractive elements for fiber-waeguide coupling by means of e-beamlithography," Microelectronic Engineering, 67-68, 169-174 (2003)), but a pattern transfer process is still required to transfer the photoresist pattern to the end of the optical fiber.
发明内容Contents of the invention
本发明的技术解决问题是:克服现有技术的不足,提出一种可实现一步制作和精确控制的基于聚焦离子束技术的微透镜与光纤集成方法。The technical problem of the present invention is: to overcome the deficiencies of the prior art, and to propose a microlens and optical fiber integration method based on focused ion beam technology that can realize one-step fabrication and precise control.
本发明的技术解决方案是:基于聚焦离子束技术的微透镜与光纤集成方法,通过以下步骤完成:The technical solution of the present invention is: the integrated method of microlens and optical fiber based on focused ion beam technology is completed through the following steps:
(1)首先选择微透镜材料并进行定标;(1) First select the microlens material and perform calibration;
(2)根据系统要求设计出用于集成的微透镜,如球面、非球面、椭球面、柱面、衍射透镜、闪耀光珊、正弦光栅等;(2) Design microlenses for integration according to system requirements, such as spherical, aspheric, ellipsoidal, cylindrical, diffractive lens, blazing light, sinusoidal grating, etc.;
(3)选取光纤,并剥离光纤外层塑料包层至端面距离5mm左右;(3) Select the optical fiber, and strip the outer plastic cladding of the optical fiber to a distance of about 5mm from the end face;
(4)将步骤(2)所设计的微透镜连续曲面的数据离散化,并根据离散化的数据、定标数据、以及制作过程参数编写出机器自动运行的控制程序;(4) discretize the data of the microlens continuous curved surface designed in step (2), and write out the control program for machine automatic operation according to the discretized data, calibration data, and production process parameters;
(5)将步骤(3)剪切好的光纤端部用专用抛光机抛光处理至表面粗糙度在2纳米以下;(5) polishing the end of the optical fiber cut in step (3) with a special polishing machine until the surface roughness is below 2 nanometers;
(6)将处理好的光纤固定在专用卡具中,放入聚焦离子束真空室中,光纤应与工作台面保持垂直;(6) Fix the processed optical fiber in a special fixture, put it into the focused ion beam vacuum chamber, and keep the optical fiber perpendicular to the worktable;
(7)用聚焦离子束对光纤成像观察并作对芯调整以及垂直度调整;(7) Use the focused ion beam to observe the optical fiber imaging and adjust the core and verticality;
(8)设置机器运行的初始参数以及运行模式(刻蚀模式或沉积模式)、并运行步骤(4)中的设计程序,完成一步刻蚀制作或者沉积制作;(8) Set the initial parameters of the machine operation and the operating mode (etching mode or deposition mode), and run the design program in step (4), to complete one-step etching production or deposition production;
(9)采用干涉仪对微透镜的几何参量进行测量;(9) adopt interferometer to measure the geometric parameter of microlens;
(10)微透镜-光纤集成一体的性能测试(聚焦特性、准直特性、以及耦合效率)。(10) Performance testing of microlens-fiber integration (focusing characteristics, collimating characteristics, and coupling efficiency).
所述的设计的微透镜的连续曲面是由离散的多台阶逼近而成的,不同的台阶对应不同的刻蚀深度或沉积高度,离散的步距视具体的透镜设计尺寸而定,如环带宽度为3~10微米,离散步距为0.5微米;如环带宽度为1~3微米,离散步距为0.15微米;如环带宽度为10~20微米,离散步距为0.8微米;如环带宽度>20微米,离散步距则为1微米。整个制作过程由计算机编程控制,设置机器运行初始参数,如离子束能量、束流密度、工作台高度、工作台倾斜角度、视场、离子驻留时间、以及X与Y方向的束斑重叠量等,然后调用设计程序并启动加工过程。由于光纤材料为石英,属于非金属绝缘体,加工时须使用正电荷中合器(在Micrion 9500EX型机器中称为Flood Gun),有的商业化聚焦离子束机器无此配置,例如FEI Quanta 2003D。由于光纤端部位置的特殊性,无法用原子力显微镜测量该透镜的几何尺寸,而非接触的光学干涉仪是较为合适的测量工具,如WYKO NT2000型干涉仪。集成微透镜的光学性能测试可采用光束轮廓测量仪、光源、显微物镜与集成光纤的耦合、精密三维移动台等装置搭接实现。The continuous curved surface of the microlens of the design is approximated by discrete multi-steps, and different steps correspond to different etching depths or deposition heights, and the discrete step distance depends on the specific lens design size, such as annulus The width is 3-10 microns, and the discrete step is 0.5 microns; if the ring width is 1-3 microns, the discrete step is 0.15 microns; if the ring width is 10-20 microns, the discrete step is 0.8 microns; Band width > 20 microns, discrete step is 1 micron. The whole production process is controlled by computer programming, and the initial parameters of machine operation are set, such as ion beam energy, beam current density, worktable height, worktable tilt angle, field of view, ion residence time, and beam spot overlap in X and Y directions etc., then call the design program and start the machining process. Since the optical fiber material is quartz, which is a non-metallic insulator, a positive charge neutralizer (called Flood Gun in the Micrion 9500EX machine) must be used during processing. Some commercial focused ion beam machines do not have this configuration, such as FEI Quanta 2003D. Due to the particularity of the position of the end of the optical fiber, the geometric size of the lens cannot be measured with an atomic force microscope, and a non-contact optical interferometer is a more suitable measurement tool, such as the WYKO NT2000 interferometer. The optical performance test of the integrated microlens can be realized by lapping devices such as a beam profiler, a light source, a coupling between a microscopic objective lens and an integrated optical fiber, and a precision three-dimensional moving stage.
本发明与现有技术相比具有的优点:本发明是直接将设计的微透镜几何参数输入计算机控制聚焦离子束4斑点(可聚焦到最小至10纳米)按照一定的轨迹逐点写入加工,属于一步制作方法(参见图1),避免了以往报道的激光直接写入法、电子束扫描直接写入法以及光学刻划方法中必不可少的从光致抗蚀剂到基底的图形转移工序,减少了累积制作误差,从而大大提高了微透镜制作过程中的控制精度;此外可以利用聚焦离子束的高偏转扫描控制精度实现微透镜面型的精确控制。常规的各种微透镜(球面、非球面、椭球面、柱面、衍射透镜、闪耀光栅、正弦光栅等)与光纤的集成均可用该方法实现(参见图2-1、图2-2、图3-1、图3-2、及图5)。本发明的离子束直接辅助沉积技术是基于材料添加原理的一步制作方法,根据优化设计选定的沉积厚度进行逐层沉积,沉积材料通常选为二氧化硅(参见图4、图6、及图7)。整个过程可以编程控制也可手动控制。该方法成功地实现了折射微型球面、柱面、以及椭球面透镜的直接单步制作。利用这一方法可制成微光学传感器、微型光谱仪、微型生化分析仪、以及小卫星有效载荷用微型传感器等,对研制和开发微光电系统、以及分析监测仪器小型化和紧凑化提供了一个重要和有效的手段。Compared with the prior art, the present invention has the advantages that the designed microlens geometric parameters are directly input into the computer to control the 4 spots of the focused ion beam (which can be focused to a minimum of 10 nanometers) and are processed point by point according to a certain trajectory. It is a one-step production method (see Figure 1), which avoids the necessary pattern transfer process from photoresist to substrate in the previously reported laser direct writing method, electron beam scanning direct writing method and optical scribing method , reducing the cumulative manufacturing error, thereby greatly improving the control precision in the microlens production process; in addition, the high deflection scanning control precision of the focused ion beam can be used to realize the precise control of the microlens surface. The integration of various conventional microlenses (spherical, aspheric, ellipsoidal, cylindrical, diffractive lens, blazed grating, sinusoidal grating, etc.) 3-1, Figure 3-2, and Figure 5). The ion beam direct assisted deposition technology of the present invention is a one-step manufacturing method based on the principle of material addition, and deposits layer by layer according to the selected deposition thickness of the optimized design, and the deposition material is usually selected as silicon dioxide (see Fig. 4, Fig. 6, and Fig. 7). The whole process can be programmed or manually controlled. This method successfully realizes the direct single-step fabrication of refractive micro-spherical, cylindrical, and ellipsoidal lenses. Using this method, micro-optical sensors, micro-spectrometers, micro-biochemical analyzers, and micro-sensors for small satellite payloads can be made, which provides an important basis for the research and development of micro-optical systems, as well as the miniaturization and compactness of analytical monitoring instruments. and effective means.
附图说明 Description of drawings
图1为本发明的聚焦离子束直接写入方法原理图;Fig. 1 is the schematic diagram of the direct writing method of the focused ion beam of the present invention;
图2-1和图2-2为本发明的聚焦离子束直接写入衍射透镜原理图;Figure 2-1 and Figure 2-2 are schematic diagrams of the focused ion beam directly written into the diffractive lens of the present invention;
图3-1和图3-2为本发明的聚焦离子束4直接写入法在光纤端部2集成微型折射透镜8和衍射透镜3原理图;Fig. 3-1 and Fig. 3-2 are the principle diagrams of integrating the miniature refracting lens 8 and the
图4为本发明的聚焦离子束4直接沉积法在光纤端部2集成微型折射透镜9原理图;Fig. 4 is the schematic diagram of the integrated miniature refracting lens 9 at the
图5为本发明衍射光学元件制作流程图;Fig. 5 is a flow chart of making a diffractive optical element of the present invention;
图6为本发明微透镜沉积法制作流程图;Fig. 6 is the production flowchart of microlens deposition method of the present invention;
图7为本发明直接沉积法逐层沉积原理图。Fig. 7 is a principle diagram of the layer-by-layer deposition of the direct deposition method of the present invention.
具体实施方式 Detailed ways
实施例1Example 1
如图5衍射光学元件制作流程图所示,As shown in Figure 5, the production flow chart of diffractive optical elements,
通过本发明的方法制作的微型衍射透镜与多模光纤的集成一体化,其制作过程如下:The integration of the miniature diffractive lens made by the method of the present invention and the multimode optical fiber is as follows:
(1)采用融石英材料进行定标,即找出离子剂量与相应的刻蚀深度之间的线性关系;(1) Use fused silica material for calibration, that is, find out the linear relationship between the ion dose and the corresponding etching depth;
(2)剥离光纤2外层塑料包层1至端面距离5毫米左右,将设计的具有连续浮雕结构的微型衍射光学元件3(参见图1、图2-1、2-2和图3-2)表面二维轮廓离散化,如设计直径为67微米的微衍射透镜,其离散步距为0.5微米,并根据离散化的数据,如直径和对应深度、步骤(1)的定标数据、以及刻蚀过程参数,如离子束能量、束流密度、加工视场、离子剂量等编写计算机6运行控制程序;(2) Strip the outer plastic cladding 1 of the
(3)将剪切好的多模光纤2(参见图1和图3)端部用专用抛光机抛光处理至表面粗糙度在2纳米以下(Ra值),可用WYKO干涉仪测量此时的表面粗糙度;(3) Polish the end of the cut multimode fiber 2 (see Figure 1 and Figure 3) with a special polishing machine until the surface roughness is below 2 nanometers (Ra value), and the surface at this time can be measured with a WYKO interferometer roughness;
(4)将处理好的光纤固定在专用卡具中,放入聚焦离子束真空室中,光纤应与工作台面保持垂直(为方便加工,可一次装卡多根光纤);(4) Fix the processed optical fiber in a special fixture and put it into the focused ion beam vacuum chamber. The optical fiber should be kept perpendicular to the worktable (for the convenience of processing, multiple optical fibers can be clamped at one time);
(5)用聚焦离子束4(参见图1、图3-1和3-2)对光纤2成像观察并作对芯调整以及垂直度调整(可通过倾斜工作台实现);(5) Use the focused ion beam 4 (see Fig. 1, Fig. 3-1 and 3-2) to observe the image of the
(6)将机器工作模式设置为刻蚀模式,并设置机器运行初始参数,如离子束能量、束流密度、工作台高度、工作台倾斜角度、视场、离子驻留时间、以及X与Y方向的束斑重叠量等;(6) Set the working mode of the machine to etching mode, and set the initial parameters of the machine operation, such as ion beam energy, beam density, table height, table tilt angle, field of view, ion residence time, and X and Y beam spot overlap in the direction, etc.;
(7)启动正电荷中合器(图中未标出),调用并运行设计程序,完成一步刻蚀制作;(7) Start the positive charge neutralizer (not shown in the figure), call and run the design program, and complete one-step etching production;
(8)取出光纤,用WYKO干涉仪测量三维轮廓的深度、浮雕宽度及其对称性、浮雕结构表面粗糙度等;(8) Take out the optical fiber, and use the WYKO interferometer to measure the depth of the three-dimensional profile, the relief width and its symmetry, the surface roughness of the relief structure, etc.;
(9)测试该集成透镜光纤的聚焦特性或准直特性。(9) Testing the focusing or collimating characteristics of the integrated lens fiber.
实施例2Example 2
参见微透镜直接原理图4、沉积法制作流程图6、及直接沉积法逐层沉积原理图7。Refer to Figure 4 for direct principle of microlens,
通过本发明的方法(聚焦离子束直接沉积的材料添加方法)制作的微型折射透镜(球面透镜)与多模光纤的集成一体化,其制作过程如下:The integration of the micro-refractive lens (spherical lens) and the multimode optical fiber made by the method of the present invention (material addition method for direct deposition of focused ion beams) is as follows:
(1)采用二氧化硅(SiO2)材料进行定标,即找出离子剂量与相应的沉积厚度之间的线性关系;(1) Use silicon dioxide (SiO 2 ) material for calibration, that is, to find out the linear relationship between the ion dose and the corresponding deposition thickness;
(2)剥离光纤2外层塑料包层1至端面距离5毫米左右,将设计的微型球面透镜8(参见图4)表面二维轮廓离散化,如设计直径为65微米的微折射透镜,其离散步距为0.5微米,并根据离散化的数据,直径和对应球冠高度、步骤(1)的定标数据、以及刻蚀过程参数,如离子束4能量、束流密度、加工视场、离子剂量等编写计算机运行控制程序;(2) Strip the distance from the outer plastic cladding 1 of the
(3)将剪切好的多模光纤2(参见图4)端部用专用抛光机抛光处理直表面粗糙度在2纳米以下(Ra值),可用WYKO干涉仪测量此时的表面粗糙度;(3) Polish the end of the cut multimode optical fiber 2 (see FIG. 4 ) with a special polishing machine, and the straight surface roughness is below 2 nanometers (Ra value), and the surface roughness at this time can be measured by a WYKO interferometer;
(4)将处理好的光纤2固定在专用卡具中,然后放入聚焦离子束真空室中。光纤应与工作台面保持垂直(为方便加工,可一次装卡多根光纤);(4) Fix the processed
(5)用聚焦离子束4(参见图4)对光纤2成像观察并作对芯调整以及垂直度调整(可通过倾斜工作台实现);(5) Use the focused ion beam 4 (see FIG. 4 ) to observe the image of the
(6)将机器工作模式设置为沉积模式,选择二氧化硅(SiO2)作为沉积材料,工作台高度设置为沉积位置(距离离子腔5发射面32毫米),并设置机器运行的初始参数,如离子能量、束流密度、工作台倾斜角度、视场、离子驻留时间、以及X与Y方向的束斑重叠量等(重叠量是0,束斑间距是刻蚀模式的10倍);(6) The working mode of the machine is set to the deposition mode, silicon dioxide (SiO 2 ) is selected as the deposition material, the height of the workbench is set to the deposition position (32 mm from the emission surface of the ion chamber 5), and the initial parameters of the machine operation are set, Such as ion energy, beam current density, table tilt angle, field of view, ion residence time, and beam spot overlap in X and Y directions, etc. (the overlap is 0, and the beam spot spacing is 10 times that of the etching mode);
(7)启动气源喷射装置9(参见图4)调用并运行设计程序,化学气体10(TMCTS+H2O)在离子束的作用下分解并沉积在光纤端部,完成微透镜8的一步沉积制作。此处的后处理工序(包含在运行程序中)为整个沉积过程的关键,如图7所示(覆盖层12,尺寸与底部第一层11相同),它决定了沉积透镜8的最终轮廓以及表面粗糙度;(7) Start the gas source injection device 9 (see Figure 4) to call and run the design program, the chemical gas 10 (TMCTS+H 2 O) is decomposed and deposited on the end of the optical fiber under the action of the ion beam, and completes the step of the microlens 8 Deposition production. The post-processing procedure (included in the operation program) here is the key of the whole deposition process, as shown in Figure 7 (covering
(8)取出光纤,用WYKO干涉仪测量三维轮廓的直径、球冠高度、球冠表面粗糙度、以及球冠的对称性等;(8) Take out the optical fiber, and use the WYKO interferometer to measure the diameter of the three-dimensional profile, the height of the spherical cap, the surface roughness of the spherical cap, and the symmetry of the spherical cap;
(9)测试该集成透镜光纤的聚焦特性或准直特性。(9) Testing the focusing or collimating characteristics of the integrated lens fiber.
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