CN100412671C - Liquid crystal display device having a plurality of pixel electrodes - Google Patents
Liquid crystal display device having a plurality of pixel electrodes Download PDFInfo
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- CN100412671C CN100412671C CNB2006100663486A CN200610066348A CN100412671C CN 100412671 C CN100412671 C CN 100412671C CN B2006100663486 A CNB2006100663486 A CN B2006100663486A CN 200610066348 A CN200610066348 A CN 200610066348A CN 100412671 C CN100412671 C CN 100412671C
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Abstract
一种液晶显示装置,其包括一栅极线形成于一绝缘基板上,一有源层形成于该栅极线上,一源极线,以及一漏极线耦接一像素电极并横跨该有源层与该栅极线的重叠区域,其中该栅极线包含一第一宽度部分及一第二宽度部分,且该第一宽度部分较该第二宽度部分窄并与该漏极线重叠。
A liquid crystal display device includes a gate line formed on an insulating substrate, an active layer formed on the gate line, a source line, and a drain line coupled to a pixel electrode and spanning the overlapping area of the active layer and the gate line, wherein the gate line includes a first width portion and a second width portion, and the first width portion is narrower than the second width portion and overlaps with the drain line.
Description
技术领域 technical field
本发明是有关于液晶显示器(Liquid Crystal Display;LCD),且特别有关于一种可缩减栅极-漏极寄生电容并避免栅极-漏极电容不均的薄膜晶体管(Thin Film Transistor;TFT)-液晶显示器(TFT-LCD)装置。The present invention relates to a liquid crystal display (Liquid Crystal Display; LCD), and in particular to a thin film transistor (Thin Film Transistor; TFT) capable of reducing gate-drain parasitic capacitance and avoiding uneven gate-drain capacitance - Liquid crystal display (TFT-LCD) devices.
背景技术 Background technique
图1是显示一典型使用薄膜晶体管-液晶显示器装置(TFT-LCD)的平面图。此TFT-LCD装置10是包括一栅极线11沿水平方向设置于一绝缘基板(未图式)上,并且该栅极线11具有一延伸区域以作为一栅极12。一有源层13形成于该栅极12上,举例而言,是由非晶硅(amorphous silicon)等半导体材料所构成。一源极线14以垂直该栅极线11的方向延伸并跨越该栅极线11,并具有一延伸区域以作为一源极15。一漏极线16耦接一像素电极18并沿该栅极线11的延伸方向具有一漏极17。该源极15与漏极17分别与该栅极12的相对二侧重叠。该像素电极18通常是由一透明且具良好传导力的导电材料构成,譬如是氧化铟锡(indium-tin-oxide;ITO)或氧化铟锌(indium-zinc-oxide;IZO)。FIG. 1 is a plan view showing a typical device using a thin film transistor-liquid crystal display (TFT-LCD). The TFT-LCD device 10 includes a
然而,微影(photolithography)工艺中机台变异而使掩模在TFT的形成过程发生偏移时,源极15/漏极17与栅极12之间的重叠区域发生变化,栅极-源极电容(以下简称为CGS)以与栅极-漏极电容(CGD)因此随之变化。图2是一TFT-LCD当中一像素单元的等效电路图,用以说明CGD对于亮度的影响。图中G表示栅极,S表示源极,D代表漏极,CLC液晶电容,CS储存电容,并且此二电容皆并联于一像素电极P及一共享电极C之间。当TFT-LCD打开时,栅极电压等于一相对高电压VGH,而TFT-LCD内总电荷Q1与像素电极电压VP1之间的关系式可表为:However, when the machine variation in the photolithography process causes the mask to shift during the TFT formation process, the overlapping area between the
Q1=CGD(VP1-VGH)+(CLC+CS)(VP1-VCOM) ...(1)Q 1 =C GD (V P1 -V GH )+(C LC +C S )(V P1 -V COM ) ...(1)
其中VCOM是共享电极的电压。where V COM is the voltage of the common electrode.
反之,当TFT-LCD关闭时,栅极电压等于一相对低电压VGL,而TFT-LCD内总电荷Q2与像素电极电压VP2之间的关系式可表为:Conversely, when the TFT-LCD is turned off, the gate voltage is equal to a relatively low voltage V GL , and the relationship between the total charge Q 2 in the TFT-LCD and the pixel electrode voltage V P2 can be expressed as:
Q2=CGD(VP2-VGL)+(CLC+CS)(VP2-VCOM) ...(2)Q 2 =C GD (V P2 -V GL )+(C LC +C S )(V P2 -V COM ) ...(2)
由于总电荷守恒,即Q1=Q2,因此由(1)(2)可知:Since the total charge is conserved, that is, Q1=Q2, it can be known from (1)(2):
ΔVP=VP1-VP2=(VGH-VGL)(CGD/(CCL+CS+CGD)) ...(3)ΔV P =V P1 -V P2 =(V GH -V GL )(C GD /(C CL +C S +C GD )) ...(3)
由式(3)可知,ΔVP(以下称为馈入电压(feedthrough voltage)),是受CGD影响。由于LCD的亮度是由像素电极电压加以控制,因此微影制程中机台变异使不同区域TFT的Cgd发生偏差时,结果液晶显示器各处即出现亮度不均匀的现象,严重的话,即产生所谓的「Mura」。It can be seen from formula (3) that ΔV P (hereinafter referred to as feedthrough voltage) is affected by C GD . Since the brightness of the LCD is controlled by the voltage of the pixel electrode, when the variation of the machine in the lithography process causes the C gd of the TFT in different regions to deviate, the result is that the brightness of the liquid crystal display is uneven, and if it is serious, it will cause the so-called "Mura".
除了上述问题外,显示器屏幕表面亦会因为CGD值过大而发生闪烁的问题,此乃由于施加至液晶的电压的有效值从一画面到下一画面变动所致。In addition to the above-mentioned problems, the surface of the display screen also suffers from flickering problems due to excessive C GD values, which is caused by the effective value of the voltage applied to the liquid crystal varying from one frame to the next.
当栅极-漏极电容(CGD)增加时,栅极线的时间常数(time constant)随之增加。结果,当外加栅极电压于显示器表面从驱动侧往遥远的另一侧由高转低时会有延迟发生,遥远另一侧的邻近区域会发生所谓的再写入(rewriting)现象,意思是,一既定水平周期的邻近水平周期的资料(即漏极电位)会在该既定水平周期内被写入。结果,一既定像素的电位发生偏移。When the gate-drain capacitance (C GD ) increases, the time constant of the gate line increases accordingly. As a result, when the applied gate voltage changes from high to low on the surface of the display from the driving side to the far side, there will be a delay, and the adjacent area on the far side will experience the so-called rewriting phenomenon, which means , the data (that is, the drain potential) of adjacent horizontal periods of a predetermined horizontal period will be written in the predetermined horizontal period. As a result, the potential of a given pixel is shifted.
另外,如图2所示,在栅极电压由高转低的期间,TFT的寄生电容会使像素电极具有如式(3)所表示的压降ΔVP。当此馈入电压增加时,薄膜晶体内源极和漏极间的电压差距增加。结果,当栅极电压于显示器表面自驱动侧往遥远的另一侧由高转低后,更容易发生延迟所致的再写入现象。由式(3)可明显看出,ΔVP和CGD值间具有密切的关系。当CGD减少时,ΔVP亦随之减少。因此,借由减少CGD,可对再写入现象加以抑制。In addition, as shown in FIG. 2 , during the transition of the gate voltage from high to low, the parasitic capacitance of the TFT will cause the pixel electrode to have a voltage drop ΔV P as represented by formula (3). As this fed voltage increases, the voltage gap between the source and drain within the thin film crystal increases. As a result, when the gate voltage changes from high to low from the driving side to the far side of the display surface, the rewriting phenomenon caused by delay is more likely to occur. It can be clearly seen from formula (3) that there is a close relationship between ΔV P and C GD values. When C GD decreases, ΔVP also decreases. Therefore, by reducing C GD , the rewrite phenomenon can be suppressed.
有鉴于此,可缩减栅极-漏极寄生电容并避免栅极-漏极电容不均的薄膜晶体管-液晶显示器装置是本领域技术者所向往。In view of this, a TFT-LCD device that can reduce gate-drain parasitic capacitance and avoid uneven gate-drain capacitance is desired by those skilled in the art.
发明内容 Contents of the invention
本发明揭露一种使用薄膜晶体管的液晶显示(LCD)装置及其形成方法,其可避免栅极-漏极电容于机台对位不准时发生偏差,因而可防范LCD不同区域亮度不均匀的现象。并且该液晶显示装置亦具有缩减的CGD,因此可防范显示器闪烁等问题。The present invention discloses a liquid crystal display (LCD) device using a thin film transistor and its forming method, which can avoid the deviation of the gate-drain capacitance when the alignment of the machine is not accurate, and thus prevent the phenomenon of uneven brightness in different areas of the LCD . Moreover, the liquid crystal display device also has reduced C GD , so problems such as flickering of the display can be prevented.
本发明提供一种液晶显示装置。该液晶显示装置包括一绝缘基板,一栅极线形成于该绝缘基板上,一有源层形成于该栅极线上,一源极线,以及一漏极线耦接一像素电极并横跨该有源层与该栅极线的重叠区域,其中该栅极线具有一栅极包含一第一宽度部分及一第二宽度部分,且该第一宽度部分较该第二宽度部分窄并与该漏极线重叠。The invention provides a liquid crystal display device. The liquid crystal display device includes an insulating substrate, a gate line is formed on the insulating substrate, an active layer is formed on the gate line, a source line, and a drain line are coupled to a pixel electrode and span the The overlapping region of the active layer and the gate line, wherein the gate line has a gate including a first width portion and a second width portion, and the first width portion is narrower than the second width portion and is in line with the second width portion The drain lines overlap.
本发明提供一种液晶显示装置,此液晶显示装置包括一绝缘基板,一栅极线形成于该绝缘基板上,一有源层形成于该栅极线上,一源极线横跨该栅极线并具有一延伸区域,以及一漏极线耦接一像素电极并横跨该有源层与该栅极线的重叠区域,并具有至少一延伸区域形成于该源极线的延伸区域其中一侧及该有源层与该栅极线的重叠区域上,其中该栅极线包含一第一宽度部分及一第二宽度部分,且该第一宽度部分较该第二宽度部分窄并与该漏极线重叠。The invention provides a liquid crystal display device, which comprises an insulating substrate, a gate line is formed on the insulating substrate, an active layer is formed on the gate line, and a source line crosses the gate line and has an extension area, and a drain line coupled to a pixel electrode and across the overlapping area of the active layer and the gate line, and has at least one extension area formed in one of the extension areas of the source line side and the overlapping area of the active layer and the gate line, wherein the gate line includes a first width portion and a second width portion, and the first width portion is narrower than the second width portion and is in line with the The drain lines overlap.
附图说明 Description of drawings
图1是一传统TFT-LCD装置的平面图;Fig. 1 is a plan view of a conventional TFT-LCD device;
图2是一TFT-LCD的等效电路图;Fig. 2 is an equivalent circuit diagram of a TFT-LCD;
图3是显示本发明的一液晶显示装置的实施例的平面图;3 is a plan view showing an embodiment of a liquid crystal display device of the present invention;
图4是显示本发明另一液晶显示装置的实施例的平面图。FIG. 4 is a plan view showing another embodiment of a liquid crystal display device of the present invention.
符号说明:Symbol Description:
10~传统薄膜晶体管-液晶显示装置10~Traditional thin film transistor-liquid crystal display device
30、40~本发明的液晶显示装置30, 40~The liquid crystal display device of the present invention
11~栅极线 12~栅极11~Gate line 12~Gate
13~有源层13~active layer
14~源极线 15~源极14~
16~漏极线 17~漏极16~
18~像素电极18~Pixel electrode
31~栅极线 32~栅极31~
33~有源层33~active layer
34~源极线 35~源极34~
36~漏极线 37~漏极36~
38~像素电极38~Pixel electrode
39、391、392、394、395~信道区域39, 391, 392, 394, 395 ~ channel area
具体实施方式 Detailed ways
本发明的结构与其形成方法,连同其额外的目的与优点,需借由以下特定实施例的描述并且阅读时参考附加图标,以能获得最佳的理解。The structure and method of forming the present invention, together with additional objects and advantages thereof, may be best understood from the following description of specific embodiments and when read with reference to the accompanying figures.
此处所参考的图标并未以等比例来作缩减。图中所描绘不同组件的相对尺寸并非用以表示这些组件实际尺寸的比例特性,而仅用以辅佐本领域的通常技术,使其能清楚地知悉如何制造与使用本发明,以及明了蕴含于本发明内的创造性概念。The icons referenced herein are not scaled down to scale. The relative sizes of the various components depicted in the drawings are not intended to represent the proportional characteristics of the actual sizes of these components, but are only used to assist ordinary skill in the art so that they can clearly understand how to make and use the present invention, as well as understand the implications of the present invention. Inventive concepts within inventions.
参考图3,其是显示本发明的一液晶显示装置的实施例的平面图。此液晶显示装置30包括一栅极线31沿水平方向设置于一绝缘基板上。如图所示,该栅极线31包含一第一宽度部分及一第二宽度部分,其中该第一宽度部分较该第二宽度部分为窄。一有源层33形成于该栅极线31的第一宽度部分与第二宽度部分之上,其中该栅极线31具有一栅极32位于第一宽度部分以及第二宽度部分与该有源层33相重叠的区域。一源极线34以大体上垂直于该栅极线31的延伸方向横跨该栅极线31,并具有一延伸区域于该有源层33上作为源极35。一漏极线36依大体上垂直于该栅极线31的延伸方向并横跨该有源层33及该栅极线31的第一宽度部分的重叠区域,该漏极线36具有一漏极37于该有源层33上且耦接至一像素电极38,其中该源极35与漏极37之间在该有源层33内具有信道区域39。Referring to FIG. 3, it is a plan view showing an embodiment of a liquid crystal display device of the present invention. The liquid
由此图可明显看出,由于漏极线36延伸超出该有源层33与该栅极线31的重叠区域的边界,因而在对位不准时,栅极线/栅极31/32、有源层33、漏极线/漏极36/37三者的重叠区域仍不发生改变,意即CGD值不发生偏差,从而显示器的亮度不会不均匀。另一方面,由于栅极线包含宽度较窄的第一宽度部分,并且该该漏极线是与该第一宽度部分相重叠,因而栅极线/栅极31/32、有源层33、漏极线/漏极36/37三者的重叠区域减少,从而CGD值减少,结果画面闪烁等现象减轻。It can be clearly seen from this figure that since the
需特别说明的是,栅极线的第一宽度部分不需仅限制于与漏极线36相重叠的区域,而可往源极线34方向延伸(未图标)。It should be noted that the first width portion of the gate line is not limited to the area overlapping the
此外,由于栅极线31的第一宽度部分较窄,因而于第一宽度部分二侧乃留下闲置区域。因此,于本发明的另一实施例中,漏极线36可增加至少一延伸区域于第一宽度部分的其中一侧该有源层33与该栅极线31的重叠区域的边界上,如此可使漏极线36与源极线34之间的信道区域宽度增加,从而增加导通电流。In addition, since the first width portion of the
参考图4,其是显示本发明另一液晶显示装置的实施例的平面图。此液晶显示装置40与液晶显示装置30完全相同,差别仅在漏极线增加二延伸区域分别形成于该源极线34的延伸区域35二侧及该有源层33与该栅极线31的重叠区域上。因此源极35与漏极37之间是在该有源层33内所定义的信道区域改为包含39、391、392三区域。Referring to FIG. 4, it is a plan view showing another embodiment of the liquid crystal display device of the present invention. This liquid
由此图可清楚看出,相较于图3的信道区域39,信道区域多出了二区域391、392。另外,有源层33可往源极线34延伸并往上下二方向扩张,如此信道区域39可再增加394及395二区域。It can be clearly seen from this figure that, compared with the
虽然本发明已以较佳实施例揭露如上,然其并非用以限定本发明,任何熟知此技艺者,在不脱离本发明的精神和范围内,当可作些许的更动与润饰,因此本发明的保护范围当视申请专利范围所界定者为准。Although the present invention has been disclosed above with preferred embodiments, it is not intended to limit the present invention. Any skilled person can make some changes and modifications without departing from the spirit and scope of the present invention. Therefore, this The scope of protection of an invention shall be determined by the scope of the patent application.
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