[go: up one dir, main page]

CN100412671C - Liquid crystal display device having a plurality of pixel electrodes - Google Patents

Liquid crystal display device having a plurality of pixel electrodes Download PDF

Info

Publication number
CN100412671C
CN100412671C CNB2006100663486A CN200610066348A CN100412671C CN 100412671 C CN100412671 C CN 100412671C CN B2006100663486 A CNB2006100663486 A CN B2006100663486A CN 200610066348 A CN200610066348 A CN 200610066348A CN 100412671 C CN100412671 C CN 100412671C
Authority
CN
China
Prior art keywords
line
liquid crystal
gate line
crystal display
width portion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CNB2006100663486A
Other languages
Chinese (zh)
Other versions
CN1821857A (en
Inventor
黄添钧
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AUO Corp
Original Assignee
AU Optronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by AU Optronics Corp filed Critical AU Optronics Corp
Priority to CNB2006100663486A priority Critical patent/CN100412671C/en
Publication of CN1821857A publication Critical patent/CN1821857A/en
Application granted granted Critical
Publication of CN100412671C publication Critical patent/CN100412671C/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Liquid Crystal (AREA)
  • Thin Film Transistor (AREA)

Abstract

一种液晶显示装置,其包括一栅极线形成于一绝缘基板上,一有源层形成于该栅极线上,一源极线,以及一漏极线耦接一像素电极并横跨该有源层与该栅极线的重叠区域,其中该栅极线包含一第一宽度部分及一第二宽度部分,且该第一宽度部分较该第二宽度部分窄并与该漏极线重叠。

Figure 200610066348

A liquid crystal display device includes a gate line formed on an insulating substrate, an active layer formed on the gate line, a source line, and a drain line coupled to a pixel electrode and spanning the overlapping area of the active layer and the gate line, wherein the gate line includes a first width portion and a second width portion, and the first width portion is narrower than the second width portion and overlaps with the drain line.

Figure 200610066348

Description

液晶显示装置 Liquid crystal display device

技术领域 technical field

本发明是有关于液晶显示器(Liquid Crystal Display;LCD),且特别有关于一种可缩减栅极-漏极寄生电容并避免栅极-漏极电容不均的薄膜晶体管(Thin Film Transistor;TFT)-液晶显示器(TFT-LCD)装置。The present invention relates to a liquid crystal display (Liquid Crystal Display; LCD), and in particular to a thin film transistor (Thin Film Transistor; TFT) capable of reducing gate-drain parasitic capacitance and avoiding uneven gate-drain capacitance - Liquid crystal display (TFT-LCD) devices.

背景技术 Background technique

图1是显示一典型使用薄膜晶体管-液晶显示器装置(TFT-LCD)的平面图。此TFT-LCD装置10是包括一栅极线11沿水平方向设置于一绝缘基板(未图式)上,并且该栅极线11具有一延伸区域以作为一栅极12。一有源层13形成于该栅极12上,举例而言,是由非晶硅(amorphous silicon)等半导体材料所构成。一源极线14以垂直该栅极线11的方向延伸并跨越该栅极线11,并具有一延伸区域以作为一源极15。一漏极线16耦接一像素电极18并沿该栅极线11的延伸方向具有一漏极17。该源极15与漏极17分别与该栅极12的相对二侧重叠。该像素电极18通常是由一透明且具良好传导力的导电材料构成,譬如是氧化铟锡(indium-tin-oxide;ITO)或氧化铟锌(indium-zinc-oxide;IZO)。FIG. 1 is a plan view showing a typical device using a thin film transistor-liquid crystal display (TFT-LCD). The TFT-LCD device 10 includes a gate line 11 disposed on an insulating substrate (not shown) along the horizontal direction, and the gate line 11 has an extended region as a gate 12 . An active layer 13 is formed on the gate 12, for example, made of semiconductor materials such as amorphous silicon. A source line 14 extends in a direction perpendicular to the gate line 11 and crosses the gate line 11 , and has an extended region serving as a source 15 . A drain line 16 is coupled to a pixel electrode 18 and has a drain 17 along the extending direction of the gate line 11 . The source 15 and the drain 17 respectively overlap two opposite sides of the gate 12 . The pixel electrode 18 is usually made of a transparent conductive material with good conductivity, such as indium-tin-oxide (ITO) or indium-zinc-oxide (IZO).

然而,微影(photolithography)工艺中机台变异而使掩模在TFT的形成过程发生偏移时,源极15/漏极17与栅极12之间的重叠区域发生变化,栅极-源极电容(以下简称为CGS)以与栅极-漏极电容(CGD)因此随之变化。图2是一TFT-LCD当中一像素单元的等效电路图,用以说明CGD对于亮度的影响。图中G表示栅极,S表示源极,D代表漏极,CLC液晶电容,CS储存电容,并且此二电容皆并联于一像素电极P及一共享电极C之间。当TFT-LCD打开时,栅极电压等于一相对高电压VGH,而TFT-LCD内总电荷Q1与像素电极电压VP1之间的关系式可表为:However, when the machine variation in the photolithography process causes the mask to shift during the TFT formation process, the overlapping area between the source 15/drain 17 and the gate 12 changes, and the gate-source The capacitance (hereinafter referred to as C GS ) and the gate-drain capacitance (C GD ) accordingly vary accordingly. FIG. 2 is an equivalent circuit diagram of a pixel unit in a TFT-LCD to illustrate the influence of C GD on brightness. In the figure, G represents the gate, S represents the source, D represents the drain, C LC liquid crystal capacitor, C S storage capacitor, and these two capacitors are connected in parallel between a pixel electrode P and a shared electrode C. When the TFT-LCD is turned on, the gate voltage is equal to a relatively high voltage V GH , and the relationship between the total charge Q 1 in the TFT-LCD and the pixel electrode voltage V P1 can be expressed as:

Q1=CGD(VP1-VGH)+(CLC+CS)(VP1-VCOM)             ...(1)Q 1 =C GD (V P1 -V GH )+(C LC +C S )(V P1 -V COM ) ...(1)

其中VCOM是共享电极的电压。where V COM is the voltage of the common electrode.

反之,当TFT-LCD关闭时,栅极电压等于一相对低电压VGL,而TFT-LCD内总电荷Q2与像素电极电压VP2之间的关系式可表为:Conversely, when the TFT-LCD is turned off, the gate voltage is equal to a relatively low voltage V GL , and the relationship between the total charge Q 2 in the TFT-LCD and the pixel electrode voltage V P2 can be expressed as:

Q2=CGD(VP2-VGL)+(CLC+CS)(VP2-VCOM)             ...(2)Q 2 =C GD (V P2 -V GL )+(C LC +C S )(V P2 -V COM ) ...(2)

由于总电荷守恒,即Q1=Q2,因此由(1)(2)可知:Since the total charge is conserved, that is, Q1=Q2, it can be known from (1)(2):

ΔVP=VP1-VP2=(VGH-VGL)(CGD/(CCL+CS+CGD))      ...(3)ΔV P =V P1 -V P2 =(V GH -V GL )(C GD /(C CL +C S +C GD )) ...(3)

由式(3)可知,ΔVP(以下称为馈入电压(feedthrough voltage)),是受CGD影响。由于LCD的亮度是由像素电极电压加以控制,因此微影制程中机台变异使不同区域TFT的Cgd发生偏差时,结果液晶显示器各处即出现亮度不均匀的现象,严重的话,即产生所谓的「Mura」。It can be seen from formula (3) that ΔV P (hereinafter referred to as feedthrough voltage) is affected by C GD . Since the brightness of the LCD is controlled by the voltage of the pixel electrode, when the variation of the machine in the lithography process causes the C gd of the TFT in different regions to deviate, the result is that the brightness of the liquid crystal display is uneven, and if it is serious, it will cause the so-called "Mura".

除了上述问题外,显示器屏幕表面亦会因为CGD值过大而发生闪烁的问题,此乃由于施加至液晶的电压的有效值从一画面到下一画面变动所致。In addition to the above-mentioned problems, the surface of the display screen also suffers from flickering problems due to excessive C GD values, which is caused by the effective value of the voltage applied to the liquid crystal varying from one frame to the next.

当栅极-漏极电容(CGD)增加时,栅极线的时间常数(time constant)随之增加。结果,当外加栅极电压于显示器表面从驱动侧往遥远的另一侧由高转低时会有延迟发生,遥远另一侧的邻近区域会发生所谓的再写入(rewriting)现象,意思是,一既定水平周期的邻近水平周期的资料(即漏极电位)会在该既定水平周期内被写入。结果,一既定像素的电位发生偏移。When the gate-drain capacitance (C GD ) increases, the time constant of the gate line increases accordingly. As a result, when the applied gate voltage changes from high to low on the surface of the display from the driving side to the far side, there will be a delay, and the adjacent area on the far side will experience the so-called rewriting phenomenon, which means , the data (that is, the drain potential) of adjacent horizontal periods of a predetermined horizontal period will be written in the predetermined horizontal period. As a result, the potential of a given pixel is shifted.

另外,如图2所示,在栅极电压由高转低的期间,TFT的寄生电容会使像素电极具有如式(3)所表示的压降ΔVP。当此馈入电压增加时,薄膜晶体内源极和漏极间的电压差距增加。结果,当栅极电压于显示器表面自驱动侧往遥远的另一侧由高转低后,更容易发生延迟所致的再写入现象。由式(3)可明显看出,ΔVP和CGD值间具有密切的关系。当CGD减少时,ΔVP亦随之减少。因此,借由减少CGD,可对再写入现象加以抑制。In addition, as shown in FIG. 2 , during the transition of the gate voltage from high to low, the parasitic capacitance of the TFT will cause the pixel electrode to have a voltage drop ΔV P as represented by formula (3). As this fed voltage increases, the voltage gap between the source and drain within the thin film crystal increases. As a result, when the gate voltage changes from high to low from the driving side to the far side of the display surface, the rewriting phenomenon caused by delay is more likely to occur. It can be clearly seen from formula (3) that there is a close relationship between ΔV P and C GD values. When C GD decreases, ΔVP also decreases. Therefore, by reducing C GD , the rewrite phenomenon can be suppressed.

有鉴于此,可缩减栅极-漏极寄生电容并避免栅极-漏极电容不均的薄膜晶体管-液晶显示器装置是本领域技术者所向往。In view of this, a TFT-LCD device that can reduce gate-drain parasitic capacitance and avoid uneven gate-drain capacitance is desired by those skilled in the art.

发明内容 Contents of the invention

本发明揭露一种使用薄膜晶体管的液晶显示(LCD)装置及其形成方法,其可避免栅极-漏极电容于机台对位不准时发生偏差,因而可防范LCD不同区域亮度不均匀的现象。并且该液晶显示装置亦具有缩减的CGD,因此可防范显示器闪烁等问题。The present invention discloses a liquid crystal display (LCD) device using a thin film transistor and its forming method, which can avoid the deviation of the gate-drain capacitance when the alignment of the machine is not accurate, and thus prevent the phenomenon of uneven brightness in different areas of the LCD . Moreover, the liquid crystal display device also has reduced C GD , so problems such as flickering of the display can be prevented.

本发明提供一种液晶显示装置。该液晶显示装置包括一绝缘基板,一栅极线形成于该绝缘基板上,一有源层形成于该栅极线上,一源极线,以及一漏极线耦接一像素电极并横跨该有源层与该栅极线的重叠区域,其中该栅极线具有一栅极包含一第一宽度部分及一第二宽度部分,且该第一宽度部分较该第二宽度部分窄并与该漏极线重叠。The invention provides a liquid crystal display device. The liquid crystal display device includes an insulating substrate, a gate line is formed on the insulating substrate, an active layer is formed on the gate line, a source line, and a drain line are coupled to a pixel electrode and span the The overlapping region of the active layer and the gate line, wherein the gate line has a gate including a first width portion and a second width portion, and the first width portion is narrower than the second width portion and is in line with the second width portion The drain lines overlap.

本发明提供一种液晶显示装置,此液晶显示装置包括一绝缘基板,一栅极线形成于该绝缘基板上,一有源层形成于该栅极线上,一源极线横跨该栅极线并具有一延伸区域,以及一漏极线耦接一像素电极并横跨该有源层与该栅极线的重叠区域,并具有至少一延伸区域形成于该源极线的延伸区域其中一侧及该有源层与该栅极线的重叠区域上,其中该栅极线包含一第一宽度部分及一第二宽度部分,且该第一宽度部分较该第二宽度部分窄并与该漏极线重叠。The invention provides a liquid crystal display device, which comprises an insulating substrate, a gate line is formed on the insulating substrate, an active layer is formed on the gate line, and a source line crosses the gate line and has an extension area, and a drain line coupled to a pixel electrode and across the overlapping area of the active layer and the gate line, and has at least one extension area formed in one of the extension areas of the source line side and the overlapping area of the active layer and the gate line, wherein the gate line includes a first width portion and a second width portion, and the first width portion is narrower than the second width portion and is in line with the The drain lines overlap.

附图说明 Description of drawings

图1是一传统TFT-LCD装置的平面图;Fig. 1 is a plan view of a conventional TFT-LCD device;

图2是一TFT-LCD的等效电路图;Fig. 2 is an equivalent circuit diagram of a TFT-LCD;

图3是显示本发明的一液晶显示装置的实施例的平面图;3 is a plan view showing an embodiment of a liquid crystal display device of the present invention;

图4是显示本发明另一液晶显示装置的实施例的平面图。FIG. 4 is a plan view showing another embodiment of a liquid crystal display device of the present invention.

符号说明:Symbol Description:

10~传统薄膜晶体管-液晶显示装置10~Traditional thin film transistor-liquid crystal display device

30、40~本发明的液晶显示装置30, 40~The liquid crystal display device of the present invention

11~栅极线  12~栅极11~Gate line 12~Gate

13~有源层13~active layer

14~源极线  15~源极14~source line 15~source

16~漏极线  17~漏极16~drain line 17~drain

18~像素电极18~Pixel electrode

31~栅极线  32~栅极31~gate line 32~gate

33~有源层33~active layer

34~源极线  35~源极34~source line 35~source

36~漏极线  37~漏极36~drain line 37~drain

38~像素电极38~Pixel electrode

39、391、392、394、395~信道区域39, 391, 392, 394, 395 ~ channel area

具体实施方式 Detailed ways

本发明的结构与其形成方法,连同其额外的目的与优点,需借由以下特定实施例的描述并且阅读时参考附加图标,以能获得最佳的理解。The structure and method of forming the present invention, together with additional objects and advantages thereof, may be best understood from the following description of specific embodiments and when read with reference to the accompanying figures.

此处所参考的图标并未以等比例来作缩减。图中所描绘不同组件的相对尺寸并非用以表示这些组件实际尺寸的比例特性,而仅用以辅佐本领域的通常技术,使其能清楚地知悉如何制造与使用本发明,以及明了蕴含于本发明内的创造性概念。The icons referenced herein are not scaled down to scale. The relative sizes of the various components depicted in the drawings are not intended to represent the proportional characteristics of the actual sizes of these components, but are only used to assist ordinary skill in the art so that they can clearly understand how to make and use the present invention, as well as understand the implications of the present invention. Inventive concepts within inventions.

参考图3,其是显示本发明的一液晶显示装置的实施例的平面图。此液晶显示装置30包括一栅极线31沿水平方向设置于一绝缘基板上。如图所示,该栅极线31包含一第一宽度部分及一第二宽度部分,其中该第一宽度部分较该第二宽度部分为窄。一有源层33形成于该栅极线31的第一宽度部分与第二宽度部分之上,其中该栅极线31具有一栅极32位于第一宽度部分以及第二宽度部分与该有源层33相重叠的区域。一源极线34以大体上垂直于该栅极线31的延伸方向横跨该栅极线31,并具有一延伸区域于该有源层33上作为源极35。一漏极线36依大体上垂直于该栅极线31的延伸方向并横跨该有源层33及该栅极线31的第一宽度部分的重叠区域,该漏极线36具有一漏极37于该有源层33上且耦接至一像素电极38,其中该源极35与漏极37之间在该有源层33内具有信道区域39。Referring to FIG. 3, it is a plan view showing an embodiment of a liquid crystal display device of the present invention. The liquid crystal display device 30 includes a gate line 31 disposed on an insulating substrate along a horizontal direction. As shown in the figure, the gate line 31 includes a first width portion and a second width portion, wherein the first width portion is narrower than the second width portion. An active layer 33 is formed on the first width portion and the second width portion of the gate line 31, wherein the gate line 31 has a gate 32 located at the first width portion and the second width portion and the active layer. The area where layers 33 overlap. A source line 34 crosses the gate line 31 substantially perpendicular to the extending direction of the gate line 31 , and has an extension region on the active layer 33 as a source 35 . A drain line 36 is substantially perpendicular to the extending direction of the gate line 31 and across the overlapping area of the active layer 33 and the first width portion of the gate line 31, the drain line 36 has a drain 37 is on the active layer 33 and coupled to a pixel electrode 38 , wherein there is a channel region 39 in the active layer 33 between the source electrode 35 and the drain electrode 37 .

由此图可明显看出,由于漏极线36延伸超出该有源层33与该栅极线31的重叠区域的边界,因而在对位不准时,栅极线/栅极31/32、有源层33、漏极线/漏极36/37三者的重叠区域仍不发生改变,意即CGD值不发生偏差,从而显示器的亮度不会不均匀。另一方面,由于栅极线包含宽度较窄的第一宽度部分,并且该该漏极线是与该第一宽度部分相重叠,因而栅极线/栅极31/32、有源层33、漏极线/漏极36/37三者的重叠区域减少,从而CGD值减少,结果画面闪烁等现象减轻。It can be clearly seen from this figure that since the drain line 36 extends beyond the boundary of the overlapping area of the active layer 33 and the gate line 31, when the alignment is not correct, the gate lines/gates 31/32, there are The overlapping area of the source layer 33 and the drain line/drain 36/37 remains unchanged, which means that the C GD value does not deviate, so that the brightness of the display will not be uneven. On the other hand, since the gate line includes a narrow first width portion, and the drain line overlaps the first width portion, the gate line/gate 31/32, the active layer 33, The overlapping area of the drain lines/drain electrodes 36/37 is reduced, thereby reducing the C GD value, and consequently reducing the flickering of the screen.

需特别说明的是,栅极线的第一宽度部分不需仅限制于与漏极线36相重叠的区域,而可往源极线34方向延伸(未图标)。It should be noted that the first width portion of the gate line is not limited to the area overlapping the drain line 36 , but can extend toward the source line 34 (not shown).

此外,由于栅极线31的第一宽度部分较窄,因而于第一宽度部分二侧乃留下闲置区域。因此,于本发明的另一实施例中,漏极线36可增加至少一延伸区域于第一宽度部分的其中一侧该有源层33与该栅极线31的重叠区域的边界上,如此可使漏极线36与源极线34之间的信道区域宽度增加,从而增加导通电流。In addition, since the first width portion of the gate line 31 is relatively narrow, there are idle regions on both sides of the first width portion. Therefore, in another embodiment of the present invention, the drain line 36 can increase at least one extended area on the border of the overlapping area of the active layer 33 and the gate line 31 on one side of the first width portion, so The width of the channel region between the drain line 36 and the source line 34 can be increased, thereby increasing the conduction current.

参考图4,其是显示本发明另一液晶显示装置的实施例的平面图。此液晶显示装置40与液晶显示装置30完全相同,差别仅在漏极线增加二延伸区域分别形成于该源极线34的延伸区域35二侧及该有源层33与该栅极线31的重叠区域上。因此源极35与漏极37之间是在该有源层33内所定义的信道区域改为包含39、391、392三区域。Referring to FIG. 4, it is a plan view showing another embodiment of the liquid crystal display device of the present invention. This liquid crystal display device 40 is exactly the same as the liquid crystal display device 30, and the only difference is that two extension regions are added to the drain line, which are respectively formed on both sides of the extension region 35 of the source line 34 and between the active layer 33 and the gate line 31. on the overlapping area. Therefore, the channel region defined in the active layer 33 between the source electrode 35 and the drain electrode 37 includes three regions 39 , 39 1 , and 39 2 .

由此图可清楚看出,相较于图3的信道区域39,信道区域多出了二区域391、392。另外,有源层33可往源极线34延伸并往上下二方向扩张,如此信道区域39可再增加394及395二区域。It can be clearly seen from this figure that, compared with the channel area 39 in FIG. 3 , there are two more areas 39 1 and 39 2 in the channel area. In addition, the active layer 33 can extend toward the source line 34 and expand in two directions up and down, so that the channel region 39 can be further increased by two regions 39 4 and 39 5 .

虽然本发明已以较佳实施例揭露如上,然其并非用以限定本发明,任何熟知此技艺者,在不脱离本发明的精神和范围内,当可作些许的更动与润饰,因此本发明的保护范围当视申请专利范围所界定者为准。Although the present invention has been disclosed above with preferred embodiments, it is not intended to limit the present invention. Any skilled person can make some changes and modifications without departing from the spirit and scope of the present invention. Therefore, this The scope of protection of an invention shall be determined by the scope of the patent application.

Claims (9)

1. 一种液晶显示装置,包括:1. A liquid crystal display device, comprising: 一绝缘基板;an insulating substrate; 一栅极线形成于该绝缘基板上;A gate line is formed on the insulating substrate; 一有源层形成于该栅极线上;an active layer is formed on the gate line; 一源极线形成于该绝缘基板上,与该栅极线垂直;A source line is formed on the insulating substrate, perpendicular to the gate line; 一像素电极;以及a pixel electrode; and 一漏极线耦接该像素电极并横跨该有源层与该栅极线的重叠区域,a drain line coupled to the pixel electrode and across the overlapping area of the active layer and the gate line, 其中该栅极线包含一第一宽度部分及一第二宽度部分,且该第一宽度部分较该第二宽度部分窄并与该漏极线重叠。Wherein the gate line includes a first width portion and a second width portion, and the first width portion is narrower than the second width portion and overlaps with the drain line. 2. 如权利要求1所述的液晶显示装置,其中该漏极线具有至少一延伸区域,该延伸区域形成于该有源层与该栅极线的重叠区域的边界上。2. The liquid crystal display device as claimed in claim 1 , wherein the drain line has at least one extended region, and the extended region is formed on a boundary of an overlapping region of the active layer and the gate line. 3. 如权利要求1所述的液晶显示装置,其中该源极线横跨该栅极线,并具有一延伸区域位于该有源层与该栅极线的重叠区域上。3. The liquid crystal display device as claimed in claim 1 , wherein the source line crosses the gate line, and has an extension area located on an overlapping area of the active layer and the gate line. 4. 如权利要求3所述的液晶显示装置,其中该漏极线具有至少一延伸区域,该延伸区域形成于该源极线的延伸区域其中一侧且在该有源层与该栅极线的重叠区域上。4. The liquid crystal display device as claimed in claim 3 , wherein the drain line has at least one extension region, the extension region is formed on one side of the extension region of the source line and between the active layer and the gate line on the overlapping area. 5. 如权利要求4所述的液晶显示装置,其中该漏极线具有二延伸区域,该二延伸区域分别形成于该源极线的延伸区域两侧该有源层与该栅极线的重叠区域边界上。5. The liquid crystal display device as claimed in claim 4 , wherein the drain line has two extension regions, and the two extension regions are respectively formed on the overlap of the active layer and the gate line on both sides of the extension region of the source line on the border of the region. 6. 如权利要求1所述的液晶显示装置,其中该栅极线还包含一栅极,位于该第一宽度部分与部分该第二宽度部分上。6. The liquid crystal display device as claimed in claim 1 , wherein the gate line further comprises a gate, located on the first width portion and part of the second width portion. 7. 如权利要求3所述的液晶显示装置,其中该源极线的延伸区域作为一源极。7. The liquid crystal display device as claimed in claim 3 , wherein the extended region of the source line serves as a source. 8. 如权利要求1所述的液晶显示装置,其中该漏极线重叠该有源层与该栅极线的该第一宽度部分作为一漏极。8. The liquid crystal display device as claimed in claim 1 , wherein the drain line overlaps the active layer and the first width portion of the gate line as a drain. 9. 如权利要求1所述的液晶显示装置,其中该漏极线延伸超出该有源层与该第一宽度部分的重叠区域的边界。9. The liquid crystal display device as claimed in claim 1, wherein the drain line extends beyond a boundary of an overlapping area of the active layer and the first width portion.
CNB2006100663486A 2006-03-30 2006-03-30 Liquid crystal display device having a plurality of pixel electrodes Active CN100412671C (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CNB2006100663486A CN100412671C (en) 2006-03-30 2006-03-30 Liquid crystal display device having a plurality of pixel electrodes

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CNB2006100663486A CN100412671C (en) 2006-03-30 2006-03-30 Liquid crystal display device having a plurality of pixel electrodes

Publications (2)

Publication Number Publication Date
CN1821857A CN1821857A (en) 2006-08-23
CN100412671C true CN100412671C (en) 2008-08-20

Family

ID=36923299

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB2006100663486A Active CN100412671C (en) 2006-03-30 2006-03-30 Liquid crystal display device having a plurality of pixel electrodes

Country Status (1)

Country Link
CN (1) CN100412671C (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104656328B (en) * 2013-11-15 2017-10-31 群创光电股份有限公司 Display panel and display device
US11527553B2 (en) * 2020-07-30 2022-12-13 Taiwan Semiconductor Manufacturing Co., Ltd. Three-dimensional memory device and method

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1297220A (en) * 1999-11-22 2001-05-30 阿尔卑斯电气株式会社 Active array type LCD
US20010023090A1 (en) * 1998-07-30 2001-09-20 Sang-Gul Lee Thin film transistor and a fabricating method thereof
US6337234B2 (en) * 1997-07-29 2002-01-08 Lg.Philips Lcd Co., Ltd. Method of fabricating a buried bus coplanar thin film transistor
US20040141124A1 (en) * 2002-10-16 2004-07-22 Lg.Philips Lcd Co., Ltd. Liquid crystal display device
CN1624550A (en) * 2003-12-01 2005-06-08 Nec液晶技术株式会社 LCD unit
US20050134755A1 (en) * 2003-12-23 2005-06-23 L.G. Philips Lcd Co., Ltd. Liquid crystal display device and method of fabricating the same
US20050168678A1 (en) * 2004-02-04 2005-08-04 Sharp Kabushiki Kaisha Display device

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6337234B2 (en) * 1997-07-29 2002-01-08 Lg.Philips Lcd Co., Ltd. Method of fabricating a buried bus coplanar thin film transistor
US20010023090A1 (en) * 1998-07-30 2001-09-20 Sang-Gul Lee Thin film transistor and a fabricating method thereof
CN1297220A (en) * 1999-11-22 2001-05-30 阿尔卑斯电气株式会社 Active array type LCD
US20040141124A1 (en) * 2002-10-16 2004-07-22 Lg.Philips Lcd Co., Ltd. Liquid crystal display device
CN1624550A (en) * 2003-12-01 2005-06-08 Nec液晶技术株式会社 LCD unit
US20050134755A1 (en) * 2003-12-23 2005-06-23 L.G. Philips Lcd Co., Ltd. Liquid crystal display device and method of fabricating the same
US20050168678A1 (en) * 2004-02-04 2005-08-04 Sharp Kabushiki Kaisha Display device

Also Published As

Publication number Publication date
CN1821857A (en) 2006-08-23

Similar Documents

Publication Publication Date Title
CN100580955C (en) Thin film transistor and liquid crystal display device using same
CN101131491B (en) Liquid crystal display device having delay compensation
JP4553318B2 (en) LCD display
CN100583459C (en) pixel structure and thin film transistor thereof
US8618548B2 (en) Thin film transistor array panel with overlapping floating electrodes and pixel electrodes
KR20070075583A (en) Liquid crystal display
US8258556B2 (en) Thin film transistor, thin film transistor array panel, and display device
JP4088005B2 (en) Liquid crystal display
CN100412671C (en) Liquid crystal display device having a plurality of pixel electrodes
KR101211255B1 (en) liquid crystal panel and fabrication method thereof
JP2005107526A (en) Ocb mode liquid crystal display
US7830483B2 (en) Liquid crystal display device
KR20080086273A (en) Liquid crystal display device having thin film transistor and manufacturing method thereof
JP4563253B2 (en) Liquid crystal display
US11515337B2 (en) Array substrate, display apparatus, and method of fabricating array substrate
JPH05251700A (en) Thin film field effect type transistor
KR101279271B1 (en) Liquid crystal display device and method for manufacturing thereof
CN106647079A (en) Array substrate, drive method of array substrate, preparation method of array substrate and display device
CN1794075B (en) Liquid crystal display device and method for forming the same
JP2004177545A (en) Liquid crystal display device
KR101471144B1 (en) Method of detecting storage voltage, display apparutus using the storage voltage and method of driving the display apparutus
KR20040061375A (en) Thin Film Transistor Formed in Array Substrate for Use in Liquid Crystal Display Device and Manufacturing Method Thereof
CN101101913A (en) thin film transistor array
CN107615156A (en) Active matrix substrate, liquid crystal panel, and method for manufacturing active matrix substrate
KR101556160B1 (en) Thin film transistor array panel

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant