CN100401467C - Processing device - Google Patents
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- CN100401467C CN100401467C CNB200510076524XA CN200510076524A CN100401467C CN 100401467 C CN100401467 C CN 100401467C CN B200510076524X A CNB200510076524X A CN B200510076524XA CN 200510076524 A CN200510076524 A CN 200510076524A CN 100401467 C CN100401467 C CN 100401467C
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Abstract
为了即使在由于加工通过粘接带(T)与框架(F)形成一体的晶片而在框架(F)上附着有粘接屑的情况下,也能不受该粘接屑的影响而圆滑地进行其后的输送等,在本发明的加工装置中,在进行输出送入晶片(W)时的晶片(W)转接的接受装置(11)中,具有由第一底面支承部(112)与第一侧部支承部(113)构成的第一L字形导轨(110)、和由第二底面支承部(114)与第二侧部支承部(115)构成并和第一L字形导轨(110)相向地配设的第二L字形导轨(111);在第一底面支承部(112)的上部与第二底面支承部(114)的上部,相向地配设着限制从晶片盒输出的框架的移动用的第一引出限制部(116)与第二引出限制部(117)。
Even in the case where adhesive chips are attached to the frame (F) due to the processing of the wafer integrated with the frame (F) through the adhesive tape (T), it can be smoothly and smoothly without being affected by the adhesive chips. Carry out subsequent conveyance etc., in the processing apparatus of the present invention, in the accepting device (11) of the wafer (W) transfer when carrying out feeding into wafer (W), have by the first bottom surface supporting part (112) The first L-shaped guide rail (110) constituted with the first side support portion (113), and the second bottom surface support portion (114) and the second side support portion (115) constitute and the first L-shaped guide rail ( 110) The second L-shaped guide rail (111) that is arranged oppositely; On the top of the first bottom surface support part (112) and the top of the second bottom surface support part (114), the upper part of the second bottom surface support part (114) is arranged oppositely to limit the output from the wafer box. A first drawout restricting part (116) and a second drawout restricting part (117) for movement of the frame.
Description
技术领域 technical field
本发明涉及进行晶片加工的加工装置。The present invention relates to a processing device for processing wafers.
背景技术 Background technique
由划线(ストリ一ト)分隔开而在表面形成多个集成电路地构成的半导体晶片,被切割而分割成一个个半导体芯片,被利用于各种电子设备等。A semiconductor wafer having a plurality of integrated circuits formed on its surface separated by scribing lines is diced and divided into individual semiconductor chips, which are used in various electronic devices and the like.
例如在对半导体晶片进行切割时、为了稳定地支承形成得较薄的半导体晶片,如图15所示,将半导体晶片W2的背面粘贴于粘接带T的粘接面的中央部,同时在粘接面的外周部粘贴上框架F,由此形成半导体晶片W2通过粘接带T与框架F形成一体的状态。将与框架F形成一体的半导体晶片W2收容于晶片盒300中,由输出送入装置301夹持框架F并将其从晶片盒300中取出,而后将框架F保持于构成输送装置的吸附盘(图中未示出)并输送到卡盘台上。保持于卡盘台上的半导体晶片W2经切割被分割成一个个半导体芯片,再经洗净除去切削屑等之后,将框架F输送保持于输送装置而进行输送,由输出送入装置301再将其收容于晶片盒内。这样,在半导体晶片W2的加工时,必须通过粘接带T使半导体晶片W2与框架F一体化、来输送并保持框架F(例如参照日本特开2003-257896号公报)。For example, when dicing a semiconductor wafer, in order to stably support a thin semiconductor wafer, as shown in FIG. The frame F is pasted on the outer peripheral portion of the contact surface, whereby the semiconductor wafer W2 is integrated with the frame F through the adhesive tape T. As shown in FIG. The semiconductor wafer W2 integrally formed with the frame F is housed in the
但是,在将高速旋转的切削刀片切入粘贴在粘接带上的半导体晶片而进行切削地切割时,为了将半导体晶片完全切断,必须将切削刀片也稍稍切入粘接带,因此,粘接带的粘接层往往变成粘接屑飞散出去而附着在框架上。如果粘接屑附着在框架上,则在保持框架并输送半导体晶片等时,在解除框架的保持状态并使其脱离时常常不能使框架解脱。在这种情况下,不能使框架位于所要求的位置,而在不能预期的位置脱落,常常产生损伤和框架形成一体的半导体晶片、或者损伤加工装置的问题。However, when cutting the semiconductor wafer attached to the adhesive tape with a high-speed rotating cutting blade, the cutting blade must also be slightly cut into the adhesive tape in order to cut the semiconductor wafer completely. The adhesive layer tends to fly out as adhesive crumbs and adhere to the frame. If adhesive waste adheres to the frame, the frame cannot be released when the frame is released from the holding state when the frame is held and the semiconductor wafer or the like is transported. In this case, the frame cannot be positioned at a desired position, but falls off at an unexpected position, often causing problems such as damage to the semiconductor wafer integrated with the frame, or damage to the processing equipment.
另外,附着于框架上的粘接屑经洗净不能完全除去,当在这种状态下使用于其他加工装置时,在其他加工装置中也会产生同样的问题。In addition, the adhesive shavings adhering to the frame cannot be completely removed by washing, and when it is used in other processing equipment in this state, the same problem occurs in other processing equipment.
发明内容 Contents of the invention
因此,本发明要解决的课题就是,即使在粘接屑附着在框架上的情况下,也能确实使框架脱开。Therefore, the problem to be solved by the present invention is to reliably detach the frame even when adhesive chips are attached to the frame.
本发明所提供的加工装置,其特征在于,所述加工装置至少具有把晶片从晶片盒输送到接受装置并送入到该晶片盒内的输出送入装置,所述晶片与框架粘贴在粘接带上,由此通过粘接带与框架形成一体,该接受装置具有第一L字形导轨和第二L字形导轨,所述第一L字形导轨由可滑动地支承该框架底面的第一底面支承部与支承该框架的侧部的第一侧部支承部构成,所述第二L字形导轨由可滑动地支承该框架底面的第二底面支承部与支承该框架侧部的第二侧部支承部构成并与该第一L字形导轨对置配置着;该第一L字形导轨与该第二L字形导轨构成为可向相互接近的方向或相互离开的方向移动;在该第一底面支承部的上部与该第二底面支承部的上部,相向地配置着对由该输出送入装置从该晶片盒输出的框架的水平方向的移动进行限制的第一引出限制部和第二引出限制部。The processing device provided by the present invention is characterized in that the processing device at least has an output and feeding device for transferring the wafer from the wafer cassette to the receiving device and into the wafer cassette, and the wafer and the frame are pasted on the bonding surface. On the belt, thereby being integrated with the frame by adhesive tape, the receiving device has a first L-shaped guide rail and a second L-shaped guide rail, the first L-shaped guide rail is supported by a first bottom surface which slidably supports the bottom surface of the frame The second L-shaped guide rail is composed of a second bottom surface support portion that slidably supports the bottom surface of the frame and a second side portion that supports the side portion of the frame. The first L-shaped guide rail and the second L-shaped guide rail are configured to be movable toward the direction of mutual approach or the direction of mutual separation; the first bottom support part The upper part of the upper part and the upper part of the second bottom surface supporting part are oppositely disposed with a first drawing-out restricting part and a second drawing-out restricting part for restricting the horizontal movement of the frame output from the wafer cassette by the loading and unloading device.
进而,本发明还提供一种加工装置,所述加工装置至少具有输出送入装置和输送装置,所述输出送入装置把晶片从晶片盒输送到接受装置并送入到该晶片盒内,所述晶片与框架粘贴在粘接带上,由此通过粘接带与框架形成一体,所述输送装置吸引保持与被输出到该接受装置的晶片形成一体的框架,并向垂直方向移动而输送该晶片,同时,将该晶片送入该接受装置,其特征在于:该接受装置具有第一L字形导轨和第二L字形导轨,所述第一L字形导轨由可滑动地支承该框架底面的第一底面支承部与支承该框架的侧部的第一侧部支承部构成,所述第二L字形导轨由可滑动地支承该框架底面的第二底面支承部与支承该框架侧部的第二侧部支承部构成并与该第一L字形导轨对置配置着;该第一L字形导轨与该第二L字形导轨构成为可向相互接近的方向或相互离开的方向移动;在该第一侧部支承部的上部与该第二侧部支承部的上部,在相向的位置配设着对该框架的垂直方向移动进行限制的第一框架压紧部与第二框架压紧部。在本加工装置中也可以在所述第一底面支承部的上部与所述第二底面支承部的上部,相向地配置着对由所述输出送入装置从所述晶片盒输出的框架的水平方向移动进行限制的第一引出限制部和第二引出限制部。Furthermore, the present invention also provides a processing device, the processing device has at least a carrying-in device and a conveying device, and the carrying-in device transfers wafers from a wafer cassette to a receiving device and feeds them into the wafer cassette, so that The wafer and the frame are attached to the adhesive tape, thereby being integrated with the frame through the adhesive tape, and the transport device attracts and holds the frame integrated with the wafer delivered to the receiving device, and moves in the vertical direction to transport the wafer. At the same time, the wafer is sent into the receiving device, which is characterized in that: the receiving device has a first L-shaped guide rail and a second L-shaped guide rail, and the first L-shaped guide rail is slidably supported by a second L-shaped guide rail that slidably supports the bottom surface of the frame. A bottom surface support portion and a first side portion support portion that supports the side portion of the frame, and the second L-shaped guide rail is composed of a second bottom surface support portion that slidably supports the bottom surface of the frame and a second bottom surface support portion that supports the side portion of the frame. The side support part is formed and arranged opposite to the first L-shaped guide rail; the first L-shaped guide rail and the second L-shaped guide rail are configured to move toward a direction approaching each other or a direction away from each other; The upper portion of the side support portion and the upper portion of the second side support portion are disposed at opposing positions with a first frame holding portion and a second frame holding portion for restricting movement in the vertical direction of the frame. In this processing device, a horizontal support for the frame carried out from the wafer cassette by the carrying-in device may be disposed opposite to the upper part of the first bottom support part and the upper part of the second bottom support part. The direction movement is restricted by the first drawing-out restricting part and the second drawing-out restricting part.
在本发明中,由于在构成接受装置的第一L字形导轨的第一底面支承部与第二L字形导轨的第二底面支承部上分别相向地设置限制框架的水平方向移动的第一引出限制部与第二引出限制部,从而在由输出送入装置引出框架时,例如即使是在框架上附着有粘接屑框架而不能从输出送入装置上离开的情况下,由于框架抵接于两个引出限制部、而位于一定的位置,可确实地使框架从输出送入装置脱开,可使晶片单元位于所期望的位置。从而不会造成晶片的损伤或加工装置的损伤。In the present invention, since the first bottom surface support portion of the first L-shaped guide rail and the second bottom surface support portion of the second L-shaped guide rail constituting the receiving device are respectively provided opposite to each other, the first drawing-out restrictions that limit the horizontal movement of the frame are provided. part and the second drawing-out restricting part, so that when the frame is drawn out by the feeding-in device, for example, even if the frame is attached with adhesive scraps and the frame cannot be separated from the feeding-in device, since the frame abuts against the two If the lead-out restricting portion is located at a certain position, the frame can be reliably disengaged from the loading and unloading device, and the wafer unit can be located at a desired position. Therefore, damage to the wafer or damage to the processing equipment will not be caused.
另外,在本发明中,由于在构成接受装置的L字形导轨的侧部支承部上设置着第一压紧部与第二压紧部,即使在输送装置解除框架的吸附沿垂直方向移动时、由于框架上附着的粘接屑而使框架不能从输送装置脱离的情况下,由于框架抵接于两个压紧部、框架的垂直方向的移动受到限制,由此可使框架确实从输送装置脱离。从而可避免晶片受到损伤或加工装置受到损伤。In addition, in the present invention, since the first clamping portion and the second clamping portion are provided on the side support portion of the L-shaped guide rail constituting the receiving device, even when the conveying device releases the suction of the frame and moves in the vertical direction, When the frame cannot be detached from the conveying device due to adhesive chips adhering to the frame, since the frame abuts against the two pressing parts, the movement of the frame in the vertical direction is restricted, thereby enabling the frame to be detached from the conveying device reliably . Damage to the wafer or damage to the processing device can thereby be avoided.
在构成接受装置的第一L字形导轨的第一底面支承部与第二L字形导轨的第二底面支承部上分别设置第一引出限制部与第二引出限制部,同时,在第一L字形导轨的侧部支承部与第二L字形导轨的侧部支承部上分别设置第一压紧部与第二压紧部,因此,例如即使在框架上附着有粘接屑的情况下,也可由框架抵接于两个引出限制部、使框架确实从输出送入装置脱离,同时,由于框架抵接于两个框架压紧部、限制了框架垂直方向的移动,由此可使框架确实从输送装置脱离。On the first bottom surface support portion of the first L-shaped guide rail and the second bottom surface support portion of the second L-shaped guide rail that constitute the receiving device, a first drawing-out restricting portion and a second drawing-out restricting portion are respectively provided. The side support portion of the guide rail and the side support portion of the second L-shaped guide rail are respectively provided with a first pressing portion and a second pressing portion, therefore, for example, even if adhesive chips are attached to the frame, the The frame abuts against the two lead-out restricting parts, so that the frame can be detached from the output and feeding device. The device disengages.
附图说明 Description of drawings
图1是表示作为加工装置的一例的切削装置的立体图。FIG. 1 is a perspective view showing a cutting device as an example of a processing device.
图2是表示通过粘接带与框架形成一体的晶片的立体图。Fig. 2 is a perspective view showing a wafer integrated with a frame by an adhesive tape.
图3是表示输出送入装置的构成的立体图。Fig. 3 is a perspective view showing the configuration of the feeding-in device.
图4是表示接受装置的构成的立体图。Fig. 4 is a perspective view showing the configuration of the receiving device.
图5是表示切削晶片的状态的立体图。Fig. 5 is a perspective view showing a state in which a wafer is cut.
图6是概略表示由切削引起粘接屑飞散的状态的断面图。Fig. 6 is a cross-sectional view schematically showing a state in which bonding chips are scattered by cutting.
图7是表示要输送附着有粘接屑的框架的状态的立体图。Fig. 7 is a perspective view showing a state in which a frame to which adhesive scraps are attached is to be conveyed.
图8是概略表示吸附了附着有粘接屑的框架的状态的断面图。Fig. 8 is a cross-sectional view schematically showing a state in which a frame to which adhesive chips are adhered is sucked.
图9是概略表示将晶片单元载置于接受装置的状态的断面图。Fig. 9 is a cross-sectional view schematically showing a state in which a wafer unit is placed on a receiving device.
图10是概略表示框架从输送装置脱离之前的状态的断面图。Fig. 10 is a cross-sectional view schematically showing a state before the frame is detached from the conveying device.
图11是概略表示框架从输送装置脱离的状态的断面图。Fig. 11 is a cross-sectional view schematically showing a state in which the frame is detached from the conveying device.
图12是表示框架的移动被第一引出限制部与第二引出限制部限制的状态的平面图。Fig. 12 is a plan view showing a state in which the movement of the frame is restricted by the first drawing-out regulating portion and the second drawing-out regulating portion.
图13是图10的A-A线断面图。Fig. 13 is a sectional view taken along line A-A of Fig. 10 .
图14是表示框架从输出送入装置脱离了的状态的平面图。Fig. 14 is a plan view showing a state in which the frame is detached from the loading and unloading device.
图15是表示将框架从晶片盒取出状态的说明图。Fig. 15 is an explanatory diagram showing a state in which the frame is taken out of the wafer cassette.
具体实施方式 Detailed ways
图1中所示的切削装置1是使用本发明的加工装置的一种,具有进行半导体晶片等的切削的功能。如图2所示,要切削的晶片W、被粘贴于粘接带T的中央部。另外,在粘接带T的外周部粘贴着框架F。这样,晶片W在通过粘接带T与框架F形成一体的状态下、如图1所示,被收容于载置在盒升降台10a上的晶片盒100中,所述盒升降台10a位于盒载置区域10中。晶片W通过粘接带T与框架F形成一体的结构被叫做晶片单元U。在晶片盒100内收容多个晶片单元U。A cutting device 1 shown in FIG. 1 is one type of processing device using the present invention, and has a function of cutting a semiconductor wafer or the like. As shown in FIG. 2, the wafer W to be chipped is attached to the central portion of the adhesive tape T. As shown in FIG. In addition, the frame F is attached to the outer peripheral portion of the adhesive tape T. As shown in FIG. In this way, the wafer W is housed in the
在图1所示的盒载置区域10的近旁,配设着接受装置11,所述接受装置11用来载置从晶片盒100中输出的晶片单元U或者向晶片盒100中送入的晶片单元U。在接受装置11的近旁,配设着输出送入的装置12与输送装置14,所述输出送入装置12用来从晶片盒100中输出晶片单元U和向晶片盒100中送入晶片单元U;所述输送装置14用来在接受装置11与卡盘台13之间或者与洗净区域17之间进行晶片单元U的输送。In the vicinity of the
输送装置14由可在Y轴方向移动的臂部140、从臂部140向下方垂设的垂设部141、在垂设部141上沿垂直方向(Z轴方向)升降的升降部142和设于升降部142下端的吸附盘143构成,可以在吸附盘143吸附着框架F的状态下,通过臂部140在Y轴方向移动而输送晶片单元U。The
如图3所示,输出送入装置12由配设于Y轴方向的滚珠丝杠120及导向导轨121、使滚珠丝杠120转动的马达122、与滚珠丝杠120螺纹结合并可滑动地结合于导向导轨121的移动部123、设置于移动部123并可在相互接近或离开的方向上下运动来夹持或放开框架F的两个凸缘状捏手部124构成,随着由马达122驱动使滚珠丝杠120转动,移动部123在Y轴方向移动。As shown in FIG. 3 , the output and
如图4中放大表示的那样,接受装置11由相向地设置的第一L字形导轨110与第二L字形导轨111构成。第一L字形导轨110由可滑动地支承构成图1与图2所示的晶片单元U的框架F的底面的第一底面支承部112、和支承框架F的侧部的第一侧部支承部113构成;第二L字形导轨111由可滑动地支承框架F的底面的第二底面支承部114、与支承框架F的侧部的第二侧部支承部115构成。第一L字形导轨110与第二L字形导轨111,任何一个的断面都形成为L字形,由在X轴方向朝相互接近的方向或者相互离开的方向的移动,可以夹持或者放开框架F。As enlarged and shown in FIG. 4 , the receiving
在第一底面支承部112的上部配设第一引出限制部116,在第二底面支承部114的上部配设第二引出限制部117,第一引出限制部116与第二引出限制部117在X方向相向地。另外,从第一侧部支承部113向-X方向突出形成第一框架压紧部118,从第二侧部支承部115向+X方向突出形成第二框架压紧部119,第一框架压紧部118与第二框架压紧部119形成于相向的位置。A first draw-out restricting
一并参照图1与图4进行说明,用于保持晶片单元U的卡盘台13沿X方向可移动地配设于接受装置11的下方,在卡盘台13的+X方向的相邻位置、配设具有切削刀片的切削装置16和用于检测应切削位置的校准装置15。Referring to FIG. 1 and FIG. 4 together, the chuck table 13 for holding the wafer unit U is movably arranged below the receiving
在要切削收容于晶片盒100中的晶片W时,借助位于盒载置区域10中的盒升降台10a的升降、使晶片单元U位于规定的高度,输出送入装置12向+Y方向移动,捏手部124夹持构成晶片单元U的框架F。而后,输出送入装置12向-Y方向移动,在规定的位置解除捏手部124的夹持,由此可使晶片单元U载置于构成接受装置11的第一L字形导轨110与第二L字形导轨111的上面。这样,在从晶片盒100引出晶片单元U时,以框架F的外周侧面和第一侧部支承部113及第二侧部支承部115不接触的程度,使第一L字形导轨110与第二L字形导轨111离开。When the wafer W accommodated in the
而后,使第一L字形导轨110与第二L字形导轨111向相互接近的方向移动,由第一侧部支承部113与第二侧部支承部115夹持框架F,使晶片单元U位于一定的位置。Then, the first L-shaped
图1所示的输送装置14移动到晶片单元U的正上方,升降部142下降、吸附盘143吸附框架F。而后,第一L字形导轨110与第二L字形导轨111向相互离开方向移动,使第一框架压紧部118与第二框架压紧部119不位于框架F的正上方,之后,升降部142上升、使晶片单元U上升,而后使升降部142下降、解除吸附盘143的吸附,由此可使晶片单元U载置在卡盘台13上,吸附保持晶片W。The conveying
使卡盘台13向+X方向移动,在由校准装置15检测出要切削的位置之后,卡盘台13进一步向相同方向移动,如图5所示,构成切削装置16的切削刀片160一边高速旋转一边切入晶片W的划线,由此进行切削。另外,使切削装置16一边向Y轴方向分度进给、一边将同方向的划线全部切削,之后,使卡盘台13旋转90°,而后对与已切削的划线成正交方向的全部划线再进行切削,由切割分割出一个个芯片。The chuck table 13 is moved to the +X direction. After the position to be cut is detected by the
在切削晶片W时,为了确实切断晶片W,如图6所示,切削刀片160也切入粘接带T一些。从而,粘接带T也被切削、并飞散出粘接屑200。如图7所示,飞散的粘接屑200附着于构架F的表面。在图6与图7中、将粘接屑200表示得比实际的要大。When cutting the wafer W, in order to cut the wafer W reliably, the
在晶片W切削结束之后,借助使构成输送装置14的升降部142下降,如图8所示,吸附盘143吸附附着有粘接屑200的框架F,而后使升降部142上升,由使臂部140沿Y轴方向移动将晶片单元U输送到洗净区域17(参照图1)。在图1所示的洗净区域17中,保持台170保持并转动晶片单元U,同时从喷嘴171喷出洗净水、除去附着于晶片W上的切削屑。另一方面,对于附着于框架F上的粘接屑200(参照图6、图7、图8)来说,也不尽能完全除去。After the cutting of the wafer W is completed, the lifting
参照图1继续进行说明,洗净后的晶片单元U、在框架F被吸附于吸附盘143的状态下由输送装置14输送到接受装置11,载置于第一L字形导轨110与第二L字形导轨111的上面。这时,如图9所示,如第一框架压紧部118与第二框架压紧部119不处在框架F的正下方位置的话,当载置晶片单元U时,第一框架压紧部118与第二框架压紧部119不会成为障碍。Continue to describe with reference to Fig. 1, the wafer unit U after the cleaning, under the state that frame F is adsorbed on the
其次,如图10所示,使第一L字形导轨110与第二L字形导轨111相接近,使得至少第一框架压紧部118与第二框架压紧部119的一部分处于框架F的正上方位置。解除吸附盘143的吸附、同时使升降部142上升,框架从吸附盘143脱离。这时,如在框架F上附着有粘接屑200,如图11所示,则框架F不会从吸附盘143离开,框架F也会和吸附盘143一起向上方提升一些。但是,框架F被从构成第一L字形导轨110的第一侧部支承部113向水平方向突出出来的第一框架压紧部118、和从构成第二L字形导轨111的第二侧部支承部115向水平方向突出出来的第二框架压紧部119向下方推压,框架F被强制性地从吸附盘143脱离,晶片单元U确实载置于第一L字形导轨110与第二L字形导轨111的上面。从而,不会损伤晶片W、也不会损伤切削装置1。Next, as shown in FIG. 10 , make the first L-shaped
这样,一边由输出送入装置12的移动部123推压框架F的端部、一边输出送入装置12向+Y方向移动,由此将载置于接受装置11上的晶片单元U收容于晶片盒100的规定的开口。In this way, while the end portion of the frame F is pushed by the moving
这样被切割的晶片W,一个个芯片从粘接带T上剝离下来;而在切割其他晶片时,使用过的框架F被再次利用,要切削的其他晶片通过粘接带T与框架F粘接为一体,再收容于晶片盒100中。在框架F被再利用的情况下,如图7所示,往往在框架F的表面附着有粘接屑。The wafer W thus cut is peeled off from the adhesive tape T one by one; connected as a whole, and then accommodated in the
在切削新的晶片时,也是和上述同样的顺序从晶片盒100中输出后进行切削。即,首先如图12与图13所示,由输出送入装置12的捏手部124夹持框架F从晶片盒100中取出晶片单元U1。这时,以框架F的外周侧面和第一侧部支承部113与第二侧部支承部115不相接触的程度,使第一L字形导轨110与第二L字形导轨111离开。晶片单元U1为切削前的晶片W1与框架F形成一体的结构,由于框架F的外周部抵接于第一引出限制部116与第二引出限制部117,即使在有粘接屑200附着于框架F、捏手部124与框架F粘接在一起的状态下,也可由使输出送入装置12在向-Y方向移动,强制性地使框架F从捏手部124脱离,而载置在接受装置11上。从而不会损伤晶片W1、也不会损伤切削装置。When cutting a new wafer, it is carried out from the
在晶片单元U1载置在接受装置11上之后,如图14所示,使第一L字形导轨110与第二L字形导轨111向相互接近的方向移动,框架F由第一侧部支承部113与第二侧部支承部115推压而对位于一定的位置。这时,框架F的侧面以接触于第一引出限制部116与第二引出限制部117的侧面的状态滑动,向+Y方向移动一些。After the wafer unit U1 is placed on the receiving
而后,像图5所示那样进行切削,被分割成一个个芯片的晶片W1、在与框架F形成一体的状态下被切割。在被送入洗净区域17中洗净之后,收容于晶片盒100中。而且,在为了切削将晶片单元U载置于吸附台13时、或者为切削后的洗净将晶片单元U载置于洗净区域17的保持台170时,要解除吸附盘143的吸附并使升降部142上升,但在卡盘台13与保持台170上,由于保持晶片的吸引力作用于和升降部142的移动方向相反的方向,故即使在框架F上附着有粘接屑200的状态下,由于该吸引力与升降部142上升的作用,吸附盘143会从框架F脱离。Then, dicing is performed as shown in FIG. 5 , and the wafer W1 divided into individual chips is diced while being integrated with the frame F. As shown in FIG. After being sent to the
这样,在输送过程中,由于将晶片单元U1载置于所希望的位置,不会损伤晶片W1,也不会损伤切削装置1。而且,上边对用于切削装置进行了说明,但是本发明也可应用于其他加工装置。In this way, since the wafer unit U1 is placed at a desired position during transportation, neither the wafer W1 nor the cutting device 1 is damaged. Furthermore, the above description has been made for a cutting device, but the present invention can also be applied to other processing devices.
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JP5260124B2 (en) * | 2008-04-10 | 2013-08-14 | 株式会社ディスコ | Processing equipment |
JP5129002B2 (en) * | 2008-04-10 | 2013-01-23 | 株式会社ディスコ | Processing equipment |
JP5507089B2 (en) * | 2009-02-02 | 2014-05-28 | キヤノンマシナリー株式会社 | Wafer ring transfer device |
JP5422345B2 (en) * | 2009-11-17 | 2014-02-19 | 株式会社ディスコ | Processing equipment |
JP6456768B2 (en) * | 2015-05-18 | 2019-01-23 | 株式会社ディスコ | Processing equipment |
JP6653562B2 (en) * | 2015-12-16 | 2020-02-26 | 株式会社ディスコ | Processing equipment |
KR102098085B1 (en) * | 2018-11-02 | 2020-05-29 | (주)가온코리아 | wafer loading apparatus |
JP7355618B2 (en) * | 2018-12-04 | 2023-10-03 | 株式会社ディスコ | Wafer splitting device |
JP7479244B2 (en) * | 2020-08-18 | 2024-05-08 | 株式会社ディスコ | Processing Equipment |
CN113460675A (en) * | 2021-06-29 | 2021-10-01 | 东方日升(常州)新能源有限公司 | Silicon chip moves and carries mechanism |
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US6216682B1 (en) * | 1998-07-06 | 2001-04-17 | Disco Corporation | Cutting apparatus |
US6345616B1 (en) * | 1999-06-21 | 2002-02-12 | Disco Corporation | Cutting machine |
CN1387978A (en) * | 2001-05-30 | 2003-01-01 | 株式会社迪斯科 | Cutting machine |
US6527627B2 (en) * | 2000-07-04 | 2003-03-04 | Disco Corporation | Semiconductor wafer grinding method |
-
2004
- 2004-06-30 JP JP2004193239A patent/JP4427396B2/en not_active Expired - Lifetime
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Publication number | Priority date | Publication date | Assignee | Title |
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US6216682B1 (en) * | 1998-07-06 | 2001-04-17 | Disco Corporation | Cutting apparatus |
US6345616B1 (en) * | 1999-06-21 | 2002-02-12 | Disco Corporation | Cutting machine |
US6527627B2 (en) * | 2000-07-04 | 2003-03-04 | Disco Corporation | Semiconductor wafer grinding method |
CN1387978A (en) * | 2001-05-30 | 2003-01-01 | 株式会社迪斯科 | Cutting machine |
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