CN100389330C - Light guide plate manufacturing method - Google Patents

Abstract

The invention relates to a method for manufacturing a light guide plate, which includes the following steps: forming a mask with a predetermined pattern; using the mask to form an embossing template; providing a light guide plate substrate, and using the embossing template to imprint the light guide plate substrate , forming a light guide plate. Since it adopts the embossing method to process the light guide plate substrate, when using an embossing template with high precision, it is possible to produce a light guide plate with extremely fine dots.

Description

Light guide plate manufacturing method

【Technical field】

The invention relates to a method for manufacturing a light guide plate.

【Background technique】

In recent years, with the colorization and enlargement of liquid crystal displays, their application fields are more extensive, such as notebook computers, various desktop computers, and LCD TVs. Because the liquid crystal display is a passive component, it cannot emit light by itself, so it is necessary to use a light source as the light source of the liquid crystal display, such as the backlight module (Backlight Module), wherein the light guide plate is an important component in the backlight module, used for Guide the transmission direction of the light beam emitted from the light source, and convert the line light source or point light source into a surface light source to emit.

In order to improve the uniformity of the emitted light, generally a plurality of dots are arranged on the surface of the light guide plate to scatter the light to improve the uniformity of the emitted light beam from the light guide plate, thereby improving the overall performance of the backlight module. In order to make the outgoing light uniform on a finer scale, finer dots can be set on the light guide plate, even very fine dots that can diffract the light.

At present, the manufacturing method of the light guide plate is mostly injection molding. The powder is added into the heating cylinder of the injection molding machine, and after becoming molten, it is injected into the closed mold cavity through the nozzle under high pressure. The molten material is cooled in the mold to solidify and shape into a light guide plate.

However, the injection molding technology usually can only reach a size of tens of microns, which cannot produce a light guide plate with the above-mentioned extremely fine dots.

【Content of invention】

In order to overcome the defect that the light guide plate manufacturing method in the prior art cannot produce extremely fine dots, the present invention provides a light guide plate manufacturing method capable of producing fine dots.

The technical solution adopted by the present invention to solve the technical problem is to provide a method for manufacturing a light guide plate, which includes the following steps: providing a mask with a predetermined pattern; using the mask and utilizing the microlithography electroforming process to make a nickel An embossing template; a light guide plate substrate is provided, and the nickel imprint template is used to carry out nano-imprinting on the light guide plate substrate to form a light guide plate.

Compared with the prior art, the advantage of the manufacturing method of the light guide plate provided by the present invention is that it adopts the embossing method to process the light guide plate substrate, and when using the embossing template with high precision, the light guide plate with extremely fine dots can be produced.

【Description of drawings】

FIG. 1 is a flow chart of the first embodiment of the manufacturing method of the light guide plate of the present invention.

FIG. 2 is a flow chart of the second embodiment of the manufacturing method of the light guide plate of the present invention.

FIG. 3 is a flow chart of the third embodiment of the manufacturing method of the light guide plate of the present invention.

【Detailed ways】

Please refer to FIG. 1 , which is a flow chart of the first embodiment of the manufacturing method of the light guide plate of the present invention. The manufacturing method of the light guide plate includes the following steps: forming a mask with a predetermined pattern (mask forming step 11); using the mask to perform a lithographic imaging process on a silicon substrate, so that a pattern corresponding to the mask pattern is formed on the silicon substrate. Pattern (silicon substrate lithography step 12); use the silicon substrate with a specific pattern to make a nickel imprint template (nickel template formation step 13); provide a light guide plate substrate, and use the nickel imprint template to perform nanoimprinting on the light guide plate substrate , to form a light guide plate (nanoimprinting step 14).

A photo mask is a commonly used device in the semiconductor industry. It is usually formed by plating a chromium film on a silicon dioxide substrate, and then using electron beam exposure to form a predetermined light-transmitting part. In the semiconductor manufacturing process, multiple masks are usually used to carry out the mask (lithography) process on a semiconductor substrate successively. One mask process is to transfer the pattern on the mask to the semiconductor substrate to be processed. After film processing, the substrate forms a multilayer structure.

The mask forming step 11 and the lithographic imaging step 12 of the light guide plate manufacturing method of the present invention adopt the above-mentioned common technology in the semiconductor industry. The lithographic imaging step 12 is applied on a silicon substrate. After the lithographic imaging step 12, the silicon substrate A concave pattern corresponding to the mask is formed on the mask. The nickel imprint template forming step 13 is to deposit metallic nickel on the silicon substrate, thereby forming a nickel imprint template having an imprint pattern corresponding to the concave pattern on the silicon substrate.

The step 14 of forming the light guide plate is to adopt Nano Imprinting (Nano Imprinting) technology, which was proposed by Chou.SY et al. in Appl.Phys.Lett.Vol.67 P3114 in 1995. This technique can fabricate devices with structures of tens of nanometers in size. The light guide plate forming step 14 uses a nickel imprint template to perform nanoimprinting on a light guide plate substrate. The material of the light guide plate substrate is resin. After nanoimprinting, a light guide plate with fine dots is formed.

Due to the adoption of nano-imprinting technology, the light guide plate manufacturing method can produce a light guide plate with a dot size of tens of nanometers, and the use of nickel as a template material can make the imprint template have a long life.

Please refer to FIG. 2 , which is a flow chart of the second embodiment of the manufacturing method of the light guide plate of the present invention. The manufacturing method of the light guide plate comprises the steps of: forming a mask with a predetermined pattern (mask forming step 21); using the mask to make a nickel imprint using LIGA (Lithography Electroforming Micro Molding) technology Template (nickel imprint template forming step 23 ); provide a light guide plate substrate, and use the nickel imprint template to perform nanoimprinting on the light guide plate substrate to form a light guide plate (nanoimprint step 24 ).

The difference between the second embodiment and the first embodiment is that the nickel imprinting template is made by LIGA technology, so the manufacturing process is simpler and the manufacturing cost is lower. LIGA technology is a microstructure mold process proposed by the German Institute for Microstructure Technology (Institute for Microstructure Technology) combined with semiconductor manufacturing technology. In the step of making a nickel imprint template using LIGA technology, the nickel imprint template is formed by electroplating using NiP as an electrode, and its thickness is between 500 microns and 2000 microns.

Please refer to FIG. 3 , which is a flow chart of the third embodiment of the manufacturing method of the light guide plate of the present invention. The manufacturing method of the light guide plate includes the following steps: forming a mask with a predetermined pattern (mask forming step 31); using the mask to carry out a lithographic imaging process on a silicon substrate, so that a pattern corresponding to the mask pattern is formed on the silicon substrate. Patterning (silicon substrate imaging step 32 ); providing a light guide plate substrate, and using the silicon substrate as an imprint template to perform nanoimprinting on the light guide plate substrate to form a light guide plate (nanoimprinting step 34 ).

Since the third embodiment directly uses the silicon substrate as an imprint template, compared with the first embodiment, it is simpler because it omits one step, and the lithography process can form a deeper pattern on the silicon substrate, but the silicon Compared with nickel, the template material for imprinting is prone to cracks in nanoimprinting, so the reliability of its subsequent imprinting process is reduced.

In addition to nanoimprinting, the above three embodiments can be imprinted by hot embossing (Hot Embossing) technology. Nanoimprint is slightly worse.

Claims (2)

1. A method for manufacturing a light guide plate, comprising: providing a mask with a predetermined pattern; using the mask and utilizing a microlithography electroforming process to make a nickel imprint template; providing a light guide plate substrate, using the nickel imprint template The printing template performs nano-imprinting on the light guide plate substrate to form the light guide plate. 2. The manufacturing method of the light guide plate as claimed in claim 1, wherein the manufacturing method of the nickel imprint template comprises: using the mask to form a pattern on a silicon substrate through photolithography, and then using the patterned A nickel imprint template was fabricated from the silicon substrate.

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