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CN100375216C - Tripolar Field Emission Display with Bottom Gate Structure and Its Fabrication Process - Google Patents

Tripolar Field Emission Display with Bottom Gate Structure and Its Fabrication Process Download PDF

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CN100375216C
CN100375216C CNB200510017470XA CN200510017470A CN100375216C CN 100375216 C CN100375216 C CN 100375216C CN B200510017470X A CNB200510017470X A CN B200510017470XA CN 200510017470 A CN200510017470 A CN 200510017470A CN 100375216 C CN100375216 C CN 100375216C
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conductive strip
carbon nanotube
control grid
nanotube cathode
gate structure
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CN1667790A (en
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李玉魁
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Zhengzhou Foguang Power Generation Equipment Co Ltd
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Zhongyuan University of Technology
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Abstract

本发明涉及一种带有底栅结构的碳纳米管阴极的三极结构场致发射显示器及其制作工艺,显示器包括由阴极面板、阳极面板和玻璃围框构成的密封真空腔,在阴极面板上有印刷的碳纳米管阴极以及控制碳纳米管电子发射的底栅结构控制栅极,在阳极面板上有光刻的锡铟氧化物薄膜层以及制备在锡铟氧化物薄膜层上面的荧光粉层,在阴极面板上制作有底栅结构,用于控制碳纳米管阴极的电子发射,具有结构简单、制作工艺简单、制作成本低廉、制作过程稳定可靠的优点。

Figure 200510017470

The invention relates to a field emission display with a three-pole structure of a carbon nanotube cathode with a bottom grid structure and its manufacturing process. The display includes a sealed vacuum chamber composed of a cathode panel, an anode panel and a glass enclosure. There are printed carbon nanotube cathodes and bottom gate structure control grids that control the electron emission of carbon nanotubes. There is a photolithographic tin indium oxide film layer on the anode panel and a phosphor layer prepared on the tin indium oxide film layer. , a bottom grid structure is fabricated on the cathode panel for controlling the electron emission of the carbon nanotube cathode, and has the advantages of simple structure, simple manufacturing process, low manufacturing cost, and stable and reliable manufacturing process.

Figure 200510017470

Description

底栅结构的三极场发射显示器及其制作工艺 Tripolar Field Emission Display with Bottom Gate Structure and Its Fabrication Process

技术领域 technical field

本发明属于真空科学技术、纳米科学技术、平面显示技术以及微电子技术的相互交叉领域,涉及到场致发射平板显示器的器件制作,具体涉及到碳纳米管阴极的三极结构场致发射显示器的器件制作方面的内容,特别涉及到带有底栅结构的、碳纳米管阴极的、三极结构的场致发射平面显示器件的制作工艺。The invention belongs to the fields of vacuum science and technology, nano science and technology, flat display technology and microelectronic technology, and relates to the manufacture of devices for field emission flat panel displays, in particular to devices for field emission displays with a triode structure of carbon nanotube cathodes The content of production, in particular, relates to the production process of field emission flat display devices with bottom gate structure, carbon nanotube cathode, and triode structure.

背景技术 Background technique

碳纳米管是一种特殊的冷阴极材料,能够仅仅在外界电压的作用下发射大量的电子,这是由于其特殊的结构而决定的。对于利用碳纳米管作为阴极材料的场致发射平面显示器件来说,为了能够最大程度的降低生产成本,降低整体器件的工作电压,以便于和常规的IC电路相结合,制作三极结构的场致发射平面显示器件是一个必然的选择。Carbon nanotubes are a special cold cathode material that can emit a large amount of electrons only under the action of an external voltage, which is determined by its special structure. For field emission flat display devices using carbon nanotubes as cathode materials, in order to reduce production costs to the greatest extent and reduce the operating voltage of the overall device, it is convenient to combine with conventional IC circuits to make a field with a three-pole structure. An emission flat display device is an inevitable choice.

在三极结构的碳纳米管阴极场致发射显示器件中,栅极结构对于碳纳米管阴极的电子发射起着必要的控制作用。栅极结构的制作工艺以及栅极衬底材料的选择都有着十分严格的要求。其中,控制栅极结构形式的选择也是研究人员重点考虑的内容之一,目前,大多数平板显示器件中都选择了控制栅极位于碳纳米管阴极上方的结构形式,栅极结构的强有力控制作用很明显。但是所形成的栅极电流比较大,对于器件的材料要求比较高,在器件的制作过程中容易使得碳纳米管阴极受到一定的损伤和污染,这是其不利之处。In the carbon nanotube cathode field emission display device with a triode structure, the gate structure plays a necessary role in controlling the electron emission of the carbon nanotube cathode. The manufacturing process of the gate structure and the selection of the gate substrate material have very strict requirements. Among them, the choice of the structure of the control grid is also one of the key considerations of the researchers. At present, most flat panel display devices have selected the structure of the control grid above the carbon nanotube cathode. The strong control of the gate structure The effect is obvious. However, the formed gate current is relatively large, and the requirements for the material of the device are relatively high, and the cathode of the carbon nanotube is easy to be damaged and polluted to a certain extent during the manufacturing process of the device, which is its disadvantage.

目前,各制作企业或者研究机构使用的用来制作控制栅极的材料各不相同,但大多都使用了专用的特殊制作材料,同时也使用了特殊的制作工艺,这就带来了一系列的问题,如:器件制作成本高;制作过程复杂;制作工艺条件要求过于苛刻,无法进行大面积制作等等。At present, the materials used to make control grids by various manufacturing companies or research institutions are different, but most of them use special special materials and special manufacturing processes, which brings a series of problems. Problems, such as: high device manufacturing cost; complicated manufacturing process; too harsh manufacturing process conditions, unable to carry out large-scale manufacturing, etc.

此外,还需要进一步降低整体平板显示器件的制作成本,器件制作过程免于复杂化,有利于进行商业化的大规模生产。In addition, it is also necessary to further reduce the manufacturing cost of the overall flat panel display device, so that the manufacturing process of the device is free from complexity, which is beneficial to commercial mass production.

发明内容 Contents of the invention

本发明的目的在于克服上述场致发射显示器中存在的缺点而提供一种带有底栅结构的、制作过程稳定可靠、结构简单、成品率高、成本低廉的三极场发射平面显示器及其制作工艺。The purpose of the present invention is to overcome the shortcomings of the above-mentioned field emission display and provide a three-pole field emission flat panel display with a bottom grid structure, stable and reliable manufacturing process, simple structure, high yield and low cost and its manufacture. craft.

本发明主要包括由阴极面板、阳极面板和玻璃围框构成的密封真空腔,在阴极面板上有印刷的碳纳米管阴极以及控制碳纳米管电子发射的底栅结构控制栅极,在阳极面板上有光刻的锡铟氧化物薄膜层以及制备在锡铟氧化物薄膜层上面的荧光粉层。其特征在于栅极结构位于碳纳米管阴极的底部和两侧,用于控制碳纳米管阴极的电子发射。The present invention mainly includes a sealed vacuum chamber composed of a cathode panel, an anode panel and a glass enclosure. On the cathode panel, there are printed carbon nanotube cathodes and a bottom gate structure control grid for controlling the electron emission of carbon nanotubes. On the anode panel, There is a photoetched tin indium oxide thin film layer and a phosphor layer prepared on the tin indium oxide thin film layer. It is characterized in that the gate structure is located at the bottom and both sides of the carbon nanotube cathode, and is used for controlling the electron emission of the carbon nanotube cathode.

本发明中的底栅结构的固定位置为安装固定在阴极面板上;本发明中底栅结构的控制栅极位于碳纳米管阴极的底部和两侧,用于控制碳纳米管阴极的电子发射;本发明中的底栅结构的衬底材料为大型、具有相当良好的耐热性和可操作性、成本低廉的高性能绝缘材料;本发明中的底栅结构中的衬底材料为玻璃,如钠钙玻璃,硼硅玻璃;本发明中的底栅结构中的底部控制栅极导电条为银浆条,也可以为锡铟氧化物薄膜导电层,也可以为铬、镍、金、银金属;本发明中的底栅结构中的银浆条是结合丝网印刷工艺完成的;本发明中的底栅结构中的绝缘隔离层为绝缘浆料层,是结合丝网印刷工艺完成的;本发明中的底栅结构中的侧壁控制栅极导电条为银浆条,是结合丝网印刷工艺完成的;本发明中的底栅结构中的侧壁控制栅极导体条和底部栅极导电条是相互连通的;本发明中的底栅结构中的侧壁控制栅极导电条位于碳纳米管阴极导电条的两侧,并且利用绝缘浆料进行相互隔离开;本发明中的底栅结构中的侧壁控制栅极导电条可以高于碳纳米管阴极导电条的制作平面,也可以和碳纳米管阴极导电条位于同一水平面上,也可以略低于碳纳米管阴极导电条的制作平面;本发明中的底栅结构中的侧壁控制栅极导电条也可以为金属铝、金、镍、铬,采用常规蒸镀或者溅射工艺来完成;本发明中的底栅结构中需要在绝缘隔离层上制作碳纳米管阴极导电条;本发明中的底栅结构中在绝缘隔离层上印刷银浆来作为碳纳米管阴极导电条,是结合丝网印刷工艺完成的;本发明中的底栅结构中的碳纳米管阴极导电条可以为银浆条,也可以为铝、金、镍、铬,采用常规的蒸镀或者溅射工艺来完成;本发明中的底栅结构中的碳纳米管阴极导电条的走向是和底部控制栅极导电条的走向相互垂直的;本发明中的底栅结构中的碳纳米管阴极导电条和侧壁控制栅极导电条之间是相互隔离开的,其相互隔离开的距离大于或等于碳纳米管阴极导电条和底部控制栅极导电条之间的垂直距离;本发明中的底栅结构中需要在绝缘隔离层上再次印刷绝缘保护层;本发明中的底栅结构中的绝缘保护层是绝缘浆料层,是结合丝网印刷工艺完成的;本发明中的底栅结构中的绝缘保护层需要在碳纳米管阴极导电条的上方预留出碳纳米管阴极的空余之处,为后续的碳纳米管阴极制备和后处理作准备,其余之处全部用绝缘保护层覆盖起来;本发明中的底栅结构中由衬底材料玻璃、底部控制栅极导电条、绝缘隔离层、侧壁控制栅极导电条、碳纳米管阴极导电条和绝缘保护层构成。The fixed position of the bottom grid structure in the present invention is installed and fixed on the cathode panel; the control grid of the bottom grid structure in the present invention is located at the bottom and both sides of the carbon nanotube cathode, and is used to control the electron emission of the carbon nanotube cathode; The substrate material of the bottom gate structure in the present invention is large, has quite good heat resistance and operability, and low-cost high-performance insulating material; The substrate material in the bottom gate structure in the present invention is glass, such as Soda-lime glass, borosilicate glass; the bottom control grid conductive strip in the bottom grid structure in the present invention is a silver paste strip, which can also be a tin-indium oxide thin film conductive layer, or can be chromium, nickel, gold, silver metal The silver paste bar in the bottom gate structure in the present invention is completed in conjunction with the screen printing process; the insulating isolation layer in the bottom gate structure in the present invention is an insulating paste layer, which is completed in conjunction with the screen printing process; The sidewall control grid conductive strips in the bottom gate structure in the invention are silver paste strips, which are completed in combination with the screen printing process; the sidewall control grid conductor strips and the bottom grid conductive strips in the bottom gate structure in the present invention The strips are interconnected; the sidewall control grid conductive strips in the bottom gate structure in the present invention are located on both sides of the carbon nanotube cathode conductive strips, and are isolated from each other by insulating paste; the bottom gate structure in the present invention The sidewall control grid conductive strip in the above can be higher than the fabrication plane of the carbon nanotube cathode conductive strip, also can be located on the same horizontal plane as the carbon nanotube cathode conductive strip, and can also be slightly lower than the fabrication plane of the carbon nanotube cathode conductive strip The sidewall control grid conductive strips in the bottom gate structure of the present invention can also be metal aluminum, gold, nickel, chromium, and are completed by conventional evaporation or sputtering processes; in the bottom gate structure of the present invention, it is necessary to Make the carbon nanotube cathode conductive strip on the insulating spacer; In the bottom grid structure in the present invention, print silver paste on the insulating spacer as the carbon nanotube cathode conductive strip, which is completed in conjunction with the screen printing process; The carbon nanotube cathode conductive strips in the bottom grid structure can be silver paste strips, and can also be aluminum, gold, nickel, chromium, and are completed by conventional evaporation or sputtering processes; the carbon nanotubes in the bottom grid structure in the present invention The trend of the nanotube cathode conductive strip is perpendicular to that of the bottom control grid conductive strip; the carbon nanotube cathode conductive strip and the sidewall control grid conductive strip in the bottom gate structure of the present invention are mutually isolated The distance between them is greater than or equal to the vertical distance between the carbon nanotube cathode conductive strip and the bottom control grid conductive strip; in the bottom gate structure in the present invention, an insulating protective layer needs to be printed again on the insulating isolation layer; The insulating protective layer in the bottom gate structure in the present invention is an insulating paste layer, which is completed in conjunction with the screen printing process; the insulating protective layer in the bottom gate structure in the present invention needs to be pre-prepared on the top of the carbon nanotube cathode conductive strip. Reserve the vacant part of the carbon nanotube cathode to prepare for the subsequent carbon nanotube cathode preparation and post-processing, and the rest are all covered with an insulating protective layer; the bottom gate structure in the present invention is made of substrate material glass, The bottom control grid conductive strip, the insulating isolation layer, the side wall control grid conductive strip, the carbon nanotube cathode conductive strip and the insulating protection layer are formed.

本发明中的底栅结构采用如下的工艺进行制作:The bottom gate structure in the present invention is manufactured using the following process:

1)衬底材料玻璃[1]的准备:1) Preparation of substrate material glass [1]:

对整体衬底材料玻璃进行划片;Scribing the overall substrate material glass;

2)底部控制栅极导电条[2]的制作:2) Fabrication of the bottom control grid conductive strip [2]:

结合丝网印刷工艺,在衬底材料玻璃上印刷银浆,形成底部控制栅极导电条[2];经过烘烤(烘烤温度:150℃,保持时间:10分钟)之后,放置在烧结炉中进行高温烧结(烧结温度:585℃,保持时间:10分钟);Combined with the screen printing process, print silver paste on the substrate material glass to form the bottom control grid conductive strip [2]; after baking (baking temperature: 150°C, holding time: 10 minutes), place it in a sintering furnace High temperature sintering (sintering temperature: 585°C, holding time: 10 minutes);

3)绝缘隔离层[3]的制作:3) The making of insulation barrier [3]:

结合丝网印刷工艺,在衬底材料玻璃上印刷绝缘浆料,形成绝缘隔离层[3];经过烘烤(烘烤温度:150℃,保持时间:10分钟)之后,放置在烧结炉中进行高温烧结(烧结温度:590℃,保持时间:10分钟);Combined with the screen printing process, the insulating paste is printed on the substrate material glass to form an insulating isolation layer [3]; after baking (baking temperature: 150°C, holding time: 10 minutes), it is placed in a sintering furnace for High temperature sintering (sintering temperature: 590°C, holding time: 10 minutes);

4)侧壁控制栅极导电条[4]的制作:4) Fabrication of sidewall control grid conductive strips [4]:

结合丝网印刷工艺,在衬底材料玻璃上印刷银浆,形成侧壁控制栅极导电条[4]。经过烘烤(烘烤温度:150℃,保持时间:10分钟)之后,放置在烧结炉中进行高温烧结(烧结温度:585℃,保持时间:10分钟)。由于在制作绝缘隔离层的时候已经预留了空余之处,因此能够将银浆印刷在绝缘隔离层的空余之处,和底部控制栅极导电条[2]相连通。所以当在底部控制栅极导电条上施加电压的时候,也就同时在侧壁控制栅极导电条上施加了电压。由于在绝缘浆料隔离层的上面还要印刷碳纳米管阴极导电条,并且碳纳米管阴极导电条的走向是和底部控制栅极导电条的走向相互垂直的,所以侧壁控制栅极导电条位于碳纳米管阴极导电条的两侧,并且利用绝缘浆料进行相互隔离开。Combined with the screen printing process, silver paste is printed on the substrate material glass to form sidewall control grid conductive strips [4]. After baking (baking temperature: 150° C., holding time: 10 minutes), it is placed in a sintering furnace for high-temperature sintering (sintering temperature: 585° C., holding time: 10 minutes). Since a vacant place has been reserved when the insulating isolating layer is made, the silver paste can be printed on the vacant place of the insulating isolating layer, and connected with the bottom control grid conductive strip [2]. Therefore, when a voltage is applied to the bottom control gate conductive strip, a voltage is simultaneously applied to the sidewall control gate conductive strip. Since the carbon nanotube cathode conductive strip is also printed on the insulating paste isolation layer, and the direction of the carbon nanotube cathode conductive strip is perpendicular to the direction of the bottom control grid conductive strip, so the side wall control grid conductive strip They are located on both sides of the carbon nanotube cathode conductive strip, and are isolated from each other by insulating paste.

5)碳纳米管阴极导电条[5]的制作:5) Fabrication of carbon nanotube cathode conductive strip [5]:

结合丝网印刷工艺,在绝缘浆料隔离层[3]上面印刷银浆,形成碳纳米管阴极导电条[5]。经过烘烤(烘烤温度:150℃,保持时间:10分钟)之后,放置在烧结炉中进行高温烧结(烧结温度:585℃,保持时间:10分钟)。其中,碳纳米管阴极导电条[5]的走向是和底部控制栅极导电条[2]的走向相互垂直的,并且碳纳米管阴极导电条[5]和侧壁控制栅极导电条[4]之间相互隔离开,其相互隔离开的距离等于碳纳米管阴极导电条[5]和底部控制栅极导电条[2]之间的垂直距离。Combined with the screen printing process, silver paste is printed on the insulating paste isolation layer [3] to form the carbon nanotube cathode conductive strip [5]. After baking (baking temperature: 150° C., holding time: 10 minutes), it is placed in a sintering furnace for high-temperature sintering (sintering temperature: 585° C., holding time: 10 minutes). Wherein, the direction of the carbon nanotube cathode conductive strip [5] is perpendicular to the direction of the bottom control grid conductive strip [2], and the carbon nanotube cathode conductive strip [5] and the sidewall control grid conductive strip [4] ] are separated from each other, and the distance between them is equal to the vertical distance between the carbon nanotube cathode conductive strip [5] and the bottom control grid conductive strip [2].

6)绝缘保护层[6]的制作:6) The making of insulating protective layer [6]:

结合丝网印刷工艺,在绝缘隔离层上再次印刷绝缘保护层[6]。经过烘烤(烘烤温度:150℃,保持时间:10分钟)之后,放置在烧结炉中进行高温烧结(烧结温度:590℃,保持时间:10分钟)。要求在碳纳米管阴极导电条的上方预留出碳纳米管阴极的空余之处,其余之处全部用绝缘浆料保护层覆盖起来。Combined with the screen printing process, the insulating protective layer is printed again on the insulating isolation layer [6]. After baking (baking temperature: 150° C., holding time: 10 minutes), it is placed in a sintering furnace for high-temperature sintering (sintering temperature: 590° C., holding time: 10 minutes). It is required to reserve a space for the carbon nanotube cathode above the carbon nanotube cathode conductive strip, and cover the rest with an insulating slurry protective layer.

7)玻璃表面的处理7) Treatment of glass surface

对整体玻璃表面进行清洁处理,除掉杂质。Clean the overall glass surface to remove impurities.

本发明中的带有底栅结构的碳纳米管阴极场致发射平板显示器按照如下的工艺进行制作:The carbon nanotube cathode field emission flat-panel display with the bottom gate structure among the present invention is made according to the following process:

1、阴极板的制作:1. Production of cathode plate:

1)碳纳米管阴极[7]的印刷:1) Printing of carbon nanotube cathode [7]:

结合丝网印刷工艺,将碳纳米管[7]印刷在预留的绝缘保护层的空余之处。Combined with the screen printing process, the carbon nanotubes [7] are printed on the reserved space of the insulating protective layer.

2)碳纳米管[7]阴极的后处理2) Post-treatment of carbon nanotube [7] cathode

对印刷后的碳纳米管[7]阴极进行后处理,以改善碳纳米管的场发射特性。The printed CNTs [7] cathode is post-treated to improve the field emission properties of the CNTs.

2、阳极面板的制作:2. Production of anode panels:

1)清洁平板玻璃[8],除掉表面杂质;1) Clean the flat glass [8] to remove surface impurities;

2)在平板玻璃[8]上蒸镀一层锡铟氧化物[9]薄膜;2) Evaporate a layer of tin indium oxide [9] thin film on flat glass [8];

3)对锡铟氧化物[9]薄膜进行光刻,形成导电条;3) performing photolithography on the tin-indium oxide [9] thin film to form conductive strips;

4)结合丝网印刷工艺,在导电条的非显示区域印刷绝缘浆料[10]层,用于防止寄生电子发射;经过烘烤(烘烤温度:150℃,保持时间:5分钟)之后,放置在烧结炉中进行高温烧结(烧结温度:580℃,保持时间:10分钟);4) In combination with the screen printing process, a layer of insulating paste [10] is printed on the non-display area of the conductive strip to prevent parasitic electron emission; after baking (baking temperature: 150°C, holding time: 5 minutes), Place in a sintering furnace for high-temperature sintering (sintering temperature: 580°C, holding time: 10 minutes);

5)结合丝网印刷工艺,在导电条上面的显示区域印刷荧光粉层[11];在烘箱当中进行烘烤(烘烤温度:120℃,保持时间:10分钟);5) Combined with the screen printing process, print the phosphor layer on the display area above the conductive strip [11]; bake in an oven (baking temperature: 120°C, holding time: 10 minutes);

3、器件装配3. Device assembly

将阴极面板、阳极面板以及玻璃围框[12]装配到一起,并将消气剂放入到空腔当中,用低熔点玻璃粉固定。在玻璃面板的四周涂抹好低熔点玻璃粉,用夹子固定。Assemble the cathode panel, anode panel and glass enclosure [12] together, put the getter into the cavity, and fix it with low-melting glass powder. Apply low-melting point glass powder around the glass panel and fix it with clips.

5、成品制作5. Finished product production

对已经装配好的器件进行如下的封装工艺:将样品器件放入烘箱当中进行烘烤;放入烧结炉当中进行高温烧结;在排气台上进行器件排气、封离,在烤消机上对器件内部的消气剂进行烤消,最后加装管脚形成成品件。Carry out the following packaging process for the assembled device: put the sample device into the oven for baking; put it in the sintering furnace for high-temperature sintering; perform exhaust and sealing of the device on the exhaust table, and clean it on the baking machine The getter inside the device is roasted and eliminated, and finally pins are added to form a finished product.

本发明具有如下积极效果:The present invention has following positive effect:

本发明中的底栅结构中的控制栅极部分是位于碳纳米管阴极的底部和两侧,用于控制碳纳米管阴极电子的场致发射。当在控制栅极上施加适当电压的时候,碳纳米管阴极就会发射出大量的电子,所发射的电子在阳极高电压的作用下,直接向阳极高速运动,轰击荧光粉层而发光,由于控制栅极位于碳纳米管阴极的底部和两侧,并且用绝缘隔离层和碳纳米管阴极相互隔离开,所以所发射的电子不会受到控制栅极结构的截流,这样所形成的控制栅极电流也就比较小,极大地提高了碳纳米管阴极的场致发射效率,也提高了显示器件的发光效率。在本发明中的底栅结构中,由于在碳纳米管阴极导电条的两侧也同时制作了侧壁控制栅极导电条部分,起到了进一步增强碳纳米管顶端的电场强度的效应,进一步提高了碳纳米管阴极发射电子的能力,改善了显示器件的场致发射性能。在本发明中的底栅结构中,从制作工艺的角度来看,是先制作了底栅结构,后制作碳纳米管阴极。当所有的控制栅极结构部分都制作完毕之后,才进行碳纳米管阴极部分的制作,这样,所制作的碳纳米管阴极不会受到控制栅极结构制作工艺的干扰,也就不会对碳纳米管阴极部分产生污染和损伤,极大地提高了器件制作的成功率。改进了碳纳米管阴极的场致发射电子的能力。另外,在底栅结构的制作过程中,并没有采用特殊的结构制作材料,也没有采用特殊的器件制作工艺,这在很大程度上就进一步降低了整体平板显示器件的制作成本,简化了器件的制作过程,能够进行大面积的器件制作,有利于进行商业化的大规模生产。The control gate part in the bottom gate structure of the present invention is located at the bottom and both sides of the carbon nanotube cathode, and is used to control the field emission of electrons from the carbon nanotube cathode. When an appropriate voltage is applied to the control grid, the carbon nanotube cathode will emit a large number of electrons, and the emitted electrons will move directly to the anode at high speed under the action of the high voltage of the anode, and bombard the phosphor layer to emit light. The control grid is located on the bottom and both sides of the carbon nanotube cathode, and is separated from the carbon nanotube cathode by an insulating isolation layer, so the emitted electrons will not be intercepted by the control grid structure, so that the formed control grid The current is relatively small, which greatly improves the field emission efficiency of the carbon nanotube cathode, and also improves the luminous efficiency of the display device. In the bottom grid structure in the present invention, since the sidewall control grid conductive strip part is also made simultaneously on both sides of the carbon nanotube cathode conductive strip, the effect of further enhancing the electric field intensity at the top of the carbon nanotube is played, further improving The ability of the carbon nanotube cathode to emit electrons is improved, and the field emission performance of the display device is improved. In the bottom gate structure in the present invention, from the perspective of manufacturing process, the bottom gate structure is fabricated first, and then the carbon nanotube cathode is fabricated. After all the control grid structure parts have been manufactured, the carbon nanotube cathode part is made, so that the carbon nanotube cathode will not be disturbed by the control grid structure manufacturing process, and will not affect the carbon nanotube cathode. Contamination and damage occur in the cathode part of nanotubes, which greatly improves the success rate of device fabrication. The ability of the carbon nanotube cathode to field emit electrons is improved. In addition, in the manufacturing process of the bottom gate structure, no special structural materials are used, and no special device manufacturing process is used, which further reduces the manufacturing cost of the overall flat panel display device to a large extent and simplifies the device. The production process can be used for large-area device production, which is conducive to commercial mass production.

该带有底栅结构的三极碳纳米管阴极场致发射平面显示器包括有如下的主要组成部分:由阴极面板、阳极面板和玻璃围框构成的密封真空腔,在阴极面板上有印刷的碳纳米管阴极以及控制碳纳米管电子发射的底栅结构控制栅极,在阳极面板上有光刻的锡铟氧化物薄膜层以及制备在锡铟氧化物薄膜层上面的荧光粉层。其特征在于栅极结构位于碳纳米管阴极的底部和两侧,用于控制碳纳米管阴极的电子发射。The three-pole carbon nanotube cathode field emission flat panel display with a bottom grid structure includes the following main components: a sealed vacuum chamber composed of a cathode panel, an anode panel and a glass enclosure, and printed carbon on the cathode panel. The nanotube cathode and the bottom gate structure control grid for controlling the carbon nanotube electron emission, a photoetched tin indium oxide thin film layer and a phosphor layer prepared on the tin indium oxide thin film layer are arranged on the anode panel. It is characterized in that the gate structure is located at the bottom and both sides of the carbon nanotube cathode, and is used for controlling the electron emission of the carbon nanotube cathode.

附图说明 Description of drawings

图1给出了底栅结构的纵向结构示意图。Figure 1 shows a schematic diagram of the vertical structure of the bottom gate structure.

图2给出了底栅结构的横向结构示意图。FIG. 2 shows a schematic diagram of the lateral structure of the bottom gate structure.

图3中给出了一个带有底栅结构的的碳纳米管阴极场致发射平面显示器的实施例的结构示意图。FIG. 3 shows a schematic structural view of an embodiment of a carbon nanotube cathode field emission flat panel display with a bottom gate structure.

具体实施方式 Detailed ways

下面结合附图和实施例对本发明进行进一步说明,但本发明并不局限于这些实施例。The present invention will be further described below in conjunction with the accompanying drawings and embodiments, but the present invention is not limited to these embodiments.

如图1、2、3所示,包括有由阴极面板玻璃[1]、阳极面板玻璃[8]和玻璃围框[12]所构成的密封真空腔,在阴极面板玻璃[1]上有印刷的碳纳米管阴极[7]以及控制碳纳米管[7]电子发射的底栅结构控制栅极,在阳极面板玻璃[8]上有光刻的锡铟氧化物薄膜层[9]以及制备在锡铟氧化物薄膜层[9]上面的荧光粉层[11]。控制栅极部分位于碳纳米管阴极的底部和两侧,用于控制碳纳米管阴极的电子发射。其中两侧的控制栅极部分对碳纳米管阴极的电子发射起到了增强效应。在进一步减小栅极电流、提高碳纳米管阴极场致发射性能、改进显示器件的场发射效率的同时,还能够进一步降低整体平板器件的制作成本,简化整体器件制作工艺和制作过程。As shown in Figures 1, 2, and 3, it includes a sealed vacuum chamber composed of cathode panel glass [1], anode panel glass [8] and glass enclosure [12]. There are printed on the cathode panel glass [1] The carbon nanotube cathode [7] and the bottom gate structure control grid for controlling the electron emission of carbon nanotubes [7], there is a photolithographic tin indium oxide film layer [9] on the anode panel glass [8] and prepared in Phosphor powder layer [11] above tin indium oxide thin film layer [9]. The control grid part is located at the bottom and both sides of the carbon nanotube cathode, and is used to control the electron emission of the carbon nanotube cathode. The control grid parts on both sides have enhanced effect on the electron emission of the carbon nanotube cathode. While further reducing the gate current, improving the field emission performance of the carbon nanotube cathode, and improving the field emission efficiency of the display device, it can further reduce the manufacturing cost of the overall flat panel device and simplify the overall device manufacturing process and manufacturing process.

本发明中的底栅结构采用如下的工艺进行制作:The bottom gate structure in the present invention is manufactured using the following process:

1)衬底材料玻璃[1]的准备:1) Preparation of substrate material glass [1]:

对整体衬底材料玻璃进行划片;Scribing the overall substrate material glass;

2)底部控制栅极导电条[2]的制作:2) Fabrication of the bottom control grid conductive strip [2]:

结合丝网印刷工艺,在衬底材料玻璃上印刷银浆,形成底部控制栅极导电条[2];经过烘烤(烘烤温度:150℃,保持时间:10分钟)之后,放置在烧结炉中进行高温烧结(烧结温度:585℃,保持时间:10分钟);Combined with the screen printing process, print silver paste on the substrate material glass to form the bottom control grid conductive strip [2]; after baking (baking temperature: 150°C, holding time: 10 minutes), place it in a sintering furnace High temperature sintering (sintering temperature: 585°C, holding time: 10 minutes);

3)绝缘隔离层[3]的制作:3) The making of insulation barrier [3]:

结合丝网印刷工艺,在衬底材料玻璃上印刷绝缘浆料,形成绝缘隔离层[3];经过烘烤(烘烤温度:150℃,保持时间:10分钟)之后,放置在烧结炉中进行高温烧结(烧结温度:590℃,保持时间:10分钟);Combined with the screen printing process, the insulating paste is printed on the substrate material glass to form an insulating isolation layer [3]; after baking (baking temperature: 150°C, holding time: 10 minutes), it is placed in a sintering furnace for High temperature sintering (sintering temperature: 590°C, holding time: 10 minutes);

4)侧壁控制栅极导电条[4]的制作:4) Fabrication of sidewall control grid conductive strips [4]:

结合丝网印刷工艺,在衬底材料玻璃上印刷银浆,形成侧壁控制栅极导电条[4]。经过烘烤(烘烤温度:150℃,保持时间:10分钟)之后,放置在烧结炉中进行高温烧结(烧结温度:585℃,保持时间:10分钟)。由于在制作绝缘隔离层的时候已经预留了空余之处,因此能够将银浆印刷在绝缘隔离层的空余之处,和底部控制栅极导电条[2]相连通。所以当在底部控制栅极导电条上施加电压的时候,也就同时在侧壁控制栅极导电条上施加了电压。由于在绝缘浆料隔离层的上面还要印刷碳纳米管阴极导电条,并且碳纳米管阴极导电条的走向是和底部控制栅极导电条的走向相互垂直的,所以侧壁控制栅极导电条位于碳纳米管阴极导电条的两侧,并且利用绝缘浆料进行相互隔离开。Combined with the screen printing process, silver paste is printed on the substrate material glass to form sidewall control grid conductive strips [4]. After baking (baking temperature: 150° C., holding time: 10 minutes), it is placed in a sintering furnace for high-temperature sintering (sintering temperature: 585° C., holding time: 10 minutes). Since a vacant place has been reserved when the insulating isolating layer is made, the silver paste can be printed on the vacant place of the insulating isolating layer, and connected with the bottom control grid conductive strip [2]. Therefore, when a voltage is applied to the bottom control gate conductive strip, a voltage is simultaneously applied to the sidewall control gate conductive strip. Since the carbon nanotube cathode conductive strip is also printed on the insulating paste isolation layer, and the direction of the carbon nanotube cathode conductive strip is perpendicular to the direction of the bottom control grid conductive strip, so the side wall control grid conductive strip They are located on both sides of the carbon nanotube cathode conductive strip, and are isolated from each other by insulating paste.

5)碳纳米管阴极导电条[5]的制作:5) Fabrication of carbon nanotube cathode conductive strip [5]:

在绝缘浆料隔离层[3]上面印刷银浆,形成碳纳米管阴极导电条[5]。经过烘烤(烘烤温度:150℃,保持时间:10分钟)之后,放置在烧结炉中进行高温烧结(烧结温度:585℃,保持时间:10分钟)。其中,碳纳米管阴极导电条[5]的走向是和底部控制栅极导电条[2]的走向相互垂直的,并且碳纳米管阴极导电条[5]和侧壁控制栅极导电条[4]之间相互隔离开,其相互隔离开的距离等于碳纳米管阴极导电条[5]和底部控制栅极导电条[2]之间的垂直距离。Silver paste is printed on the insulating paste separation layer [3] to form a carbon nanotube cathode conductive strip [5]. After baking (baking temperature: 150° C., holding time: 10 minutes), it is placed in a sintering furnace for high-temperature sintering (sintering temperature: 585° C., holding time: 10 minutes). Wherein, the direction of the carbon nanotube cathode conductive strip [5] is perpendicular to the direction of the bottom control grid conductive strip [2], and the carbon nanotube cathode conductive strip [5] and the sidewall control grid conductive strip [4] ] are separated from each other, and the distance between them is equal to the vertical distance between the carbon nanotube cathode conductive strip [5] and the bottom control grid conductive strip [2].

6)绝缘保护层[6]的制作:6) The making of insulating protective layer [6]:

结合丝网印刷工艺,在绝缘隔离层上再次印刷绝缘保护层[6]。经过烘烤(烘烤温度:150℃,保持时间:10分钟)之后,放置在烧结炉中进行高温烧结(烧结温度:590℃,保持时间:10分钟)。要求在碳纳米管阴极导电条的上方预留出碳纳米管阴极的空余之处,其余之处全部用绝缘浆料保护层覆盖起来。Combined with the screen printing process, the insulating protective layer is printed again on the insulating isolation layer [6]. After baking (baking temperature: 150° C., holding time: 10 minutes), it is placed in a sintering furnace for high-temperature sintering (sintering temperature: 590° C., holding time: 10 minutes). It is required to reserve a space for the carbon nanotube cathode above the carbon nanotube cathode conductive strip, and cover the rest with an insulating slurry protective layer.

7)玻璃表面的处理7) Treatment of glass surface

对整体玻璃表面进行清洁处理,除掉杂质。Clean the overall glass surface to remove impurities.

本发明中的带有底栅结构的碳纳米管阴极场致发射平板显示器按照如下的工艺进行制作:The carbon nanotube cathode field emission flat-panel display with the bottom gate structure among the present invention is made according to the following process:

1、阴极板的制作:1. Production of cathode plate:

1)碳纳米管阴极[7]的印刷:1) Printing of carbon nanotube cathode [7]:

结合丝网印刷工艺,将碳纳米管[7]印刷在预留的绝缘保护层的空余之处。Combined with the screen printing process, the carbon nanotubes [7] are printed on the reserved space of the insulating protective layer.

2)碳纳米管[7]阴极的后处理2) Post-treatment of carbon nanotube [7] cathode

对印刷后的碳纳米管[7]阴极进行后处理,以改善碳纳米管的场发射特性。The printed CNTs [7] cathode is post-treated to improve the field emission properties of the CNTs.

2、阳极面板的制作:2. Production of anode panels:

1)清洁平板玻璃[8],除掉表面杂质;1) Clean the flat glass [8] to remove surface impurities;

2)在平板玻璃[8]上蒸镀一层锡铟氧化物[9]薄膜;2) Evaporate a layer of tin indium oxide [9] thin film on flat glass [8];

3)对锡铟氧化物[9]薄膜进行光刻,形成导电条;3) performing photolithography on the tin-indium oxide [9] thin film to form conductive strips;

4)结合丝网印刷工艺,在导电条的非显示区域印刷绝缘浆料[10]层,用于防止寄生电子发射;经过烘烤(烘烤温度:150℃,保持时间:5分钟)之后,放置在烧结炉中进行高温烧结(烧结温度:580℃,保持时间:10分钟);4) In combination with the screen printing process, a layer of insulating paste [10] is printed on the non-display area of the conductive strip to prevent parasitic electron emission; after baking (baking temperature: 150°C, holding time: 5 minutes), Place in a sintering furnace for high-temperature sintering (sintering temperature: 580°C, holding time: 10 minutes);

5)结合丝网印刷工艺,在导电条上面的显示区域印刷荧光粉层[11];在烘箱当中进行烘烤(烘烤温度:120℃,保持时间:10分钟);5) Combined with the screen printing process, print the phosphor layer on the display area above the conductive strip [11]; bake in an oven (baking temperature: 120°C, holding time: 10 minutes);

3、器件装配3. Device assembly

将阴极面板、阳极面板以及玻璃围框[12]装配到一起,并将消气剂放入到空腔当中,用低熔点玻璃粉固定。在玻璃面板的四周涂抹好低熔点玻璃粉,用夹子固定。Assemble the cathode panel, anode panel and glass enclosure [12] together, put the getter into the cavity, and fix it with low-melting glass powder. Apply low-melting point glass powder around the glass panel and fix it with clips.

5、成品制作5. Finished product production

对已经装配好的器件进行如下的封装工艺:将样品器件放入烘箱当中进行烘烤;放入烧结炉当中进行高温烧结;在排气台上进行器件排气、封离,在烤消机上对器件内部的消气剂进行烤消,最后加装管脚形成成品件。Carry out the following packaging process for the assembled device: put the sample device into the oven for baking; put it in the sintering furnace for high-temperature sintering; perform exhaust and sealing of the device on the exhaust table, and clean it on the baking machine The getter inside the device is roasted and eliminated, and finally pins are added to form a finished product.

Claims (7)

1.一种底栅结构的三极场发射显示器,包括有阴极面板[1]、阳极面板[8]以及玻璃围框[12]所构成的密封真空腔,在阴极面板[1]上有印刷的碳纳米管阴极[7]以及控制碳纳米管阴极[7]电子发射的底栅结构控制栅极,在阳极面板[8]上有光刻的锡铟氧化物薄膜层[9]以及制备在锡铟氧化物薄膜层[9]上面的荧光粉层[11],其特征在于:底栅结构位于碳纳米管阴极的底部和两侧,用于控制碳纳米管阴极的电子发射,所述底栅结构由阴极面板[1]、底部控制栅极导电条[2]、绝缘隔离层[3]、侧壁控制栅极导电条[4]、碳纳米管阴极导电条[5]和绝缘保护层[6]构成,底部控制栅极导电条[2]安装固定在阴极面板上,所述底栅结构中的侧壁控制栅极导电条为银浆条,侧壁控制栅极导电条和底部控制栅极导电条是相互连通的,侧壁控制栅极导电条位于碳纳米管阴极导电条的两侧,并且利用绝缘浆料进行相互隔离开,侧壁控制栅极导电条高于碳纳米管阴极导电条的制作平面,或者和碳纳米管阴极导电条位于同一水平面上,或者低于碳纳米管阴极导电条的制作平面。1. A three-pole field emission display with a bottom grid structure, comprising a sealed vacuum chamber formed by a cathode panel [1], an anode panel [8] and a glass enclosure [12], and printed on the cathode panel [1] The carbon nanotube cathode [7] and the bottom gate structure control grid that controls the electron emission of the carbon nanotube cathode [7], there is a photolithographic tin indium oxide film layer [9] on the anode panel [8] and prepared in The phosphor layer [11] above the tin indium oxide thin film layer [9] is characterized in that: the bottom gate structure is located at the bottom and both sides of the carbon nanotube cathode, and is used to control the electron emission of the carbon nanotube cathode. The grid structure consists of cathode panel [1], bottom control grid conductive strip [2], insulating spacer [3], side wall control grid conductive strip [4], carbon nanotube cathode conductive strip [5] and insulating protective layer [6], the bottom control grid conductive strip [2] is installed and fixed on the cathode panel, the side wall control grid conductive strip in the bottom grid structure is a silver paste strip, the side wall control grid conductive strip and the bottom control The grid conductive strips are connected to each other, the side wall control grid conductive strips are located on both sides of the carbon nanotube cathode conductive strips, and are isolated from each other by insulating paste, the side wall control grid conductive strips are higher than the carbon nanotube cathode The fabrication plane of the conductive strip is either located on the same level as the carbon nanotube cathode conductive strip, or is lower than the fabrication plane of the carbon nanotube cathode conductive strip. 2.如权利要求1所述的底栅结构的三极场发射显示器,其特征在于:所述底栅结构的衬底材料为钠钙玻璃或硼硅玻璃。2 . The triode field emission display with bottom gate structure according to claim 1 , wherein the substrate material of the bottom gate structure is soda lime glass or borosilicate glass. 3 . 3.如权利要求1所述的底栅结构的三极场发射显示器,其特征在于:所述底栅结构中的底部控制栅极导电条[2]为银浆条,是结合丝网印刷工艺完成的,或为锡铟氧化物薄膜导电层,或为铬、镍、金、银金属,底栅结构中的绝缘隔离层[3]为绝缘浆料层。3. The triode field emission display with bottom gate structure as claimed in claim 1, characterized in that: the bottom control grid conductive strip [2] in the bottom gate structure is a silver paste strip, which is combined with a screen printing process The completed one is either a tin-indium oxide thin film conductive layer, or chromium, nickel, gold, silver metal, and the insulating isolation layer [3] in the bottom gate structure is an insulating paste layer. 4.如权利要求1所述的底栅结构的三极场发射显示器,其特征在于:所述的底栅结构中的侧壁控制栅极导电条[4]为金属铝、金、镍、铬之一。4. The three-pole field emission display of bottom gate structure as claimed in claim 1, is characterized in that: the sidewall control gate conductive bar [4] in described bottom gate structure is metal aluminum, gold, nickel, chromium one. 5.如权利要求1所述的底栅结构的三极场发射显示器,其特征在于:所述底栅结构中在绝缘隔离层上制作碳纳米管阴极导电条,底栅结构中的碳纳米管阴极导电条为银浆条,或者为铝、金、镍、铬,碳纳米管阴极导电条的走向是和底部控制栅极导电条的走向相互垂直的,碳纳米管阴极导电条和侧壁控制栅极导电条之间是相互隔离开的,其相互隔离开的距离大于或等于碳纳米管阴极导电条和底部控制栅极导电条之间的垂直距离。5. the triode field emission display of bottom gate structure as claimed in claim 1, is characterized in that: in described bottom gate structure, make carbon nanotube cathode conductive strip on insulating spacer layer, the carbon nanotube in the bottom gate structure The cathode conductive strip is silver paste, or aluminum, gold, nickel, chromium, and the direction of the carbon nanotube cathode conductive strip is perpendicular to the direction of the bottom control grid conductive strip. The carbon nanotube cathode conductive strip and the side wall control The gate conductive strips are mutually isolated, and the distance between them is greater than or equal to the vertical distance between the carbon nanotube cathode conductive strip and the bottom control grid conductive strip. 6.如权利要求1所述的底栅结构的三极场发射显示器,其特征在于:所述底栅结构中在绝缘隔离层[3]上印刷有绝缘保护层[6],底栅结构中的绝缘保护层是绝缘浆料层,绝缘保护层在碳纳米管阴极导电条的上方预留出碳纳米管阴极的空余之处,为后续的碳纳米管阴极制备和后处理作准备,其余之处全部用绝缘保护层覆盖起来。6. The triode field emission display with bottom gate structure as claimed in claim 1, characterized in that: in the bottom gate structure, an insulating protective layer [6] is printed on the insulating isolation layer [3], and in the bottom gate structure The insulating protective layer is an insulating slurry layer, and the insulating protective layer reserves the vacancy of the carbon nanotube cathode above the carbon nanotube cathode conductive strip, preparing for the subsequent preparation and post-processing of the carbon nanotube cathode, and the rest All are covered with an insulating layer. 7.一种底栅结构的三极场发射显示器的制作工艺,其特征在于:所述底栅结构采用如下的工艺进行制作:7. A manufacturing process of a triode field emission display with a bottom gate structure, characterized in that: the bottom gate structure is manufactured using the following process: 1)衬底材料玻璃[1]的准备:1) Preparation of substrate material glass [1]: 对整体衬底材料玻璃进行划片;Scribing the overall substrate material glass; 2)底部控制栅极导电条[2]的制作:2) Fabrication of the bottom control grid conductive strip [2]: 结合丝网印刷工艺,在衬底材料玻璃上印刷银浆,形成底部控制栅极导电条[2];经过烘烤,烘烤温度:150℃,保持时间:10分钟,之后,放置在烧结炉中进行高温烧结,烧结温度:585℃,保持时间:10分钟;Combined with the screen printing process, print silver paste on the substrate material glass to form the bottom control grid conductive strip [2]; after baking, the baking temperature: 150 ° C, holding time: 10 minutes, after that, place it in the sintering furnace Carry out high temperature sintering in medium temperature, sintering temperature: 585°C, holding time: 10 minutes; 3)绝缘隔离层[3]的制作:3) The making of insulation barrier [3]: 结合丝网印刷工艺,在衬底材料玻璃上印刷绝缘浆料,形成绝缘隔离层[3];经过烘烤,烘烤温度:150℃,保持时间:10分钟,之后,放置在烧结炉中进行高温烧结,烧结温度:590℃,保持时间:10分钟;Combined with the screen printing process, the insulating paste is printed on the substrate material glass to form an insulating isolation layer [3]; after baking, the baking temperature is 150 ° C, and the holding time is 10 minutes. After that, it is placed in a sintering furnace. High temperature sintering, sintering temperature: 590°C, holding time: 10 minutes; 4)侧壁控制栅极导电条[4]的制作:4) Fabrication of sidewall control grid conductive strips [4]: 结合丝网印刷工艺,在衬底材料玻璃上印刷银浆,形成侧壁控制栅极导电条[4],经过烘烤,烘烤温度:150℃,保持时间:10分钟,之后,放置在烧结炉中进行高温烧结,烧结温度:585℃,保持时间:10分钟,由于在制作绝缘隔离层的时候已经预留了空余之处,因此能够将银浆印刷在绝缘隔离层的空余之处,和底部控制栅极导电条[2]相连通,所以当在底部控制栅极导电条上施加电压的时候,也就同时在侧壁控制栅极导电条上施加了电压,由于在绝缘浆料隔离层的上面还要印刷碳纳米管阴极导电条,并且碳纳米管阴极导电条的走向是和底部控制栅极导电条的走向相互垂直的,所以侧壁控制栅极导电条位于碳纳米管阴极导电条的两侧,并且利用绝缘浆料进行相互隔离开,Combined with the screen printing process, print silver paste on the substrate material glass to form sidewall control grid conductive strips [4], after baking, baking temperature: 150 ° C, holding time: 10 minutes, after that, place it in the sintering Carry out high-temperature sintering in the furnace, sintering temperature: 585 ° C, holding time: 10 minutes, since the vacancy has been reserved when making the insulating isolation layer, the silver paste can be printed on the vacant part of the insulating isolation layer, and The bottom control grid conductive strip [2] is connected, so when a voltage is applied to the bottom control grid conductive strip, a voltage is also applied to the sidewall control grid conductive strip at the same time, because the insulating paste isolation layer The carbon nanotube cathode conductive strip is also printed on the top of the carbon nanotube cathode conductive strip, and the direction of the carbon nanotube cathode conductive strip is perpendicular to the direction of the bottom control grid conductive strip, so the side wall control grid conductive strip is located on the carbon nanotube cathode conductive strip. on both sides, and are isolated from each other by insulating paste, 5)碳纳米管阴极导电条[5]的制作:5) Fabrication of carbon nanotube cathode conductive strip [5]: 结合丝网印刷工艺,在绝缘浆料隔离层[3]上面印刷银浆,形成碳纳米管阴极导电条[5],经过烘烤,烘烤温度:150℃,保持时间:10分钟,之后,放置在烧结炉中进行高温烧结,烧结温度:585℃,保持时间:10分钟,其中,碳纳米管阴极导电条[5]的走向是和底部控制栅极导电条[2]的走向相互垂直的,并且碳纳米管阴极导电条[5]和侧壁控制栅极导电条[4]之间相互隔离开,其相互隔离开的距离等于碳纳米管阴极导电条[5]和底部控制栅极导电条[2]之间的垂直距离,Combined with the screen printing process, print silver paste on the insulating paste isolation layer [3] to form a carbon nanotube cathode conductive strip [5], after baking, the baking temperature: 150 ° C, holding time: 10 minutes, after that, Place in a sintering furnace for high-temperature sintering, sintering temperature: 585°C, holding time: 10 minutes, wherein the direction of the carbon nanotube cathode conductive strip [5] is perpendicular to the direction of the bottom control grid conductive strip [2] , and the carbon nanotube cathode conductive strip [5] and the side wall control grid conductive strip [4] are separated from each other, and the distance between them is equal to the carbon nanotube cathode conductive strip [5] and the bottom control grid conductive strip [5]. the vertical distance between bars [2], 6)绝缘保护层[6]的制作:6) The making of insulating protective layer [6]: 结合丝网印刷工艺,在绝缘隔离层上再次印刷绝缘保护层[6],经过烘烤,烘烤温度:150℃,保持时间:10分钟,之后,放置在烧结炉中进行高温烧结,烧结温度:590℃,保持时间:10分钟,要求在碳纳米管阴极导电条的上方预留出碳纳米管阴极的空余之处,其余之处全部用绝缘浆料保护层覆盖起来,Combined with the screen printing process, the insulating protective layer [6] is printed again on the insulating isolation layer, and after baking, the baking temperature is 150 ° C, and the holding time is 10 minutes. After that, it is placed in a sintering furnace for high-temperature sintering. : 590°C, holding time: 10 minutes, it is required to reserve a space for the carbon nanotube cathode above the carbon nanotube cathode conductive strip, and cover the rest with a protective layer of insulating paste. 7)玻璃表面的处理7) Treatment of glass surface 对整体玻璃表面进行清洁处理,除掉杂质。Clean the overall glass surface to remove impurities.
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