A kind of microelectrode making method and device
Technical field
The present invention relates to electrode manufacturing technology field, particularly a kind of microelectrode making method and device.
Background technology
Microelectrode is that expose at the tip, and the insulating tinsel of remainder aspect the neuroscience basic research, is used for neuro physiology research, inserts the Nerve impulse that can survey in the cerebral tissue in the brain.
The microelectrode of using on the neuro physiology, be made up of sharp-pointed tinsel and insulating barrier, certain-length is exposed at the tinsel tip, after the insertion nervous tissue, near neuronic discharge exposed eletrode tip can be sensed can be used for neuroscience basic research and medical application.
Microelectrode insulant commonly used has glass and insullac.The insulating technology of glass material is comparatively complicated, and most advanced and sophisticated exposed length is wayward, and yield rate is low.Insullac insulating method commonly used is that wire electrode is inserted in the insullac, takes out rear tip and upwards erects placement, because gravity and surface tension effects, most advanced and sophisticated lacquer painting can break, and makes eletrode tip expose certain-length, and insulation forms insulating barrier after drying and solidifying.
The problem of this technology is, wire electrode can not be too thin, otherwise because surface tension effects, exposed length can be too big, even break and can not overlay on the wire electrode in the lacquer painting many places, cause the insulation failure, therefore do not manufacture the thin microelectrode of diameter, the microelectrode that diameter is thin is littler to the damage of tissue when inserting nervous tissue.Secondly, realize most advanced and sophisticated exposing by gravity and surface tension, its exposed length can not accurately be controlled, and influences electrode impedance and serviceability.
Summary of the invention
Purpose of the present invention provides a kind of manufacture method and device of microelectrode.
A kind of manufacture method of microelectrode is characterized in that, comprises the steps:
A) etch the fine wire that head is tip shape with electrochemical method;
B) the tinsel sharp end is upwards immersed in the insullac, expose at the tip;
C) tinsel is moved upward, simultaneously tinsel is exposed the part heating of insullac, lacquer is solidified;
D) repeated multiple times b), c) step, reach predetermined insullac thickness;
E) tinsel that will coat insullac is put into baking box, makes the insullac full solidification;
F) get finished product.
The tinsel point upward stays predetermined length to expose lacquer painting.
When moving upward, tinsel, insullac is solidified to exposing the heated by electrodes of lacquer painting.
A kind of microelectrode manufacturing installation, form by tinsel (1), chuck (2), insullac (3), heater coil (4), tinsel (1) is fixed on the chuck (2), heater coil (4) is centered around on the tinsel (1), for tinsel (1) heating, tinsel (1) and chuck (2) place insullac (3).
20 microns of the diameters of tinsel (1).
Microelectrode of the present invention can be used for neuroscience basic research and medical application.Advantage of the present invention and effect explanation.
Description of drawings
Fig. 1 is a microelectrode sketch map wiry.
Fig. 2 is the process drawing of microelectrode tinsel in insullac.
Fig. 3 is the process drawing of microelectrode tinsel in insullac.
Fig. 4 is the process drawing of microelectrode tinsel in insullac.
Fig. 5 is the sketch map after the microelectrode tinsel is finished in insullac.
The specific embodiment
Fig. 1 is the signal figure of microelectrode tinsel (1).
Fig. 2 is the manufacture process of microelectrode tinsel in insullac (3); Be equipped with 20 microns of diameters, (1) one in the tinsel of sharp end is arranged, be clipped on the chuck (2) that at the uniform velocity moves up and down, move down chuck (2), 50 microns of liquid levels that expose insullac (3) to tinsel (1) tip, chuck (2) again moves up, give heater coil (4) energising heating of metal silk (1) most advanced and sophisticated exposed portions serve simultaneously, make insulation enamelled coating primary solidification, repeat said process 5 times, the insullac layer thickness reaches about 3 microns, take off the tinsel (1) that has the enamelled coating that insulate, put into oven heat to the enamelled coating full solidification that insulate.
Fig. 3 is that microelectrode tinsel (1) sinks in the insullac (3), carries out the process of insullac japanning.
Fig. 4 is a microelectrode tinsel (1) after japanning is finished in insullac (3), rises and leaves the situation of insullac (3).
Fig. 5 is the figure after microelectrode tinsel (1) japanning is finished.(5) be illustrated in microelectrode tinsel (1) and go up the insulation enamelled coating.