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CN100362387C - Electrostatic Charpy Interferometric Light Modulator - Google Patents

Electrostatic Charpy Interferometric Light Modulator Download PDF

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Publication number
CN100362387C
CN100362387C CNB2005100573911A CN200510057391A CN100362387C CN 100362387 C CN100362387 C CN 100362387C CN B2005100573911 A CNB2005100573911 A CN B2005100573911A CN 200510057391 A CN200510057391 A CN 200510057391A CN 100362387 C CN100362387 C CN 100362387C
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China
Prior art keywords
moving reflector
electrode layer
lower electrode
fixing glass
light
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CNB2005100573911A
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CN1776476A (en
Inventor
黄尚廉
张洁
张智海
韩磊
闫许
伍艺
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Chongqing University
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Chongqing University
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Abstract

本发明涉及一种静电简支梁式干涉光调制器,主要由衬底、控制电路、下电极层、简支梁、可动反射镜以及固定玻璃平板构成。在衬底上形成有下电极层和控制电路,下电极层与控制电路各单元电极控制端接触;在下电极层上淀积绝缘层,绝缘层之上形成有简支梁及支撑锚,支撑锚上支撑可动反射镜阵列,可动反射镜阵列与下电极层构成间距可变的平行平板电容器,可动反射镜阵列上方覆盖有固定玻璃平板,固定玻璃平板与可动反射镜之间留有一定的间距。简支梁采用类机翼形状,可减少地形效应,增加可动反射镜表面平整度。本调制器通过可动反射镜在静电力的作用下发生上下垂直运动对入射光的相位调制,实现光的开关态。本光栅光调制器具有响应速度快、面阵结构、结构简单,器件加工工艺简单等优点。

Figure 200510057391

The invention relates to an electrostatic simply supported beam interference light modulator, which is mainly composed of a substrate, a control circuit, a lower electrode layer, a simply supported beam, a movable reflector and a fixed glass plate. A lower electrode layer and a control circuit are formed on the substrate, and the lower electrode layer is in contact with the control terminals of each unit electrode of the control circuit; an insulating layer is deposited on the lower electrode layer, and simply supported beams and support anchors are formed on the insulating layer. The movable reflector array is supported on the top, and the movable reflector array and the lower electrode layer form a parallel plate capacitor with variable spacing. The fixed glass plate is covered on the movable reflector array, and there is a gap between the fixed glass plate and the movable reflector. a certain distance. The simply supported beam adopts an airfoil-like shape, which can reduce the terrain effect and increase the flatness of the movable mirror surface. The modulator realizes the on-off state of the light through the phase modulation of the incident light through the vertical movement of the movable mirror under the action of the electrostatic force. The grating light modulator has the advantages of fast response speed, surface array structure, simple structure, simple device processing technology and the like.

Figure 200510057391

Description

Electrostatic cimple-beam interference light modulator
Technical field
The present invention relates to a kind of spatial light modulation device, in particular, the present invention is a kind of by distance between static driven change glass plate and the moving reflector, make incident light by the time optical path difference change, utilize the interference of light principle to realize static interference light modulator to the incident light modulation.
Background technology
Prior art discloses the multiple photomodulator based on MEMS technology that can use separately or use with other modulators, and these modulators comprise digital micro-mirror device (DMD) and grating light valve (GLV) etc.
DMD is up to a million the modulators that deflectable reflection micro mirror constitutes by the manufacturing of MEMS technology.DMI) total light extraction efficiency of image device improves greatly, and modulating speed is fast, and contrast, brightness and homogeneity are all very outstanding, and the image of the close clearance order projection of micro mirror produces finer seamless picture, and it is not high to analyze Z-TEK.But still there is complex manufacturing process in it, the shortcoming that yields is low.
GLV is that the movable grizzly bar in a series of intervals constitutes, and it is to utilize the optical grating diffraction principle to realize the light signal modulation, and its manufacturing process is simple, and response speed is faster, and control circuit is simple, the yield rate height.Its shortcoming is: cannot say for sure to demonstrate,prove the grizzly bar that constitutes grating and be in the same plane; Gap affects diffraction efficiency between the grizzly bar; Real useful area is too little on the removable slit, and therefore single elemental area is big, makes GLV only be fit to do linear array, must add optical scanning mechanism and just can be used for optical imaging system.
Summary of the invention
Low for the useful area of the shortcoming that overcomes the DMD complex process and GLV, as to be difficult to be integrated into face battle array shortcoming, the object of the present invention is to provide a kind of electrostatic cimple-beam interference light modulator, free beam adopts the class wing shapes, can reduce orographic effect, increases the moving reflector surface smoothness.Adopt the interference of light principle that incident light is modulated, the technology of device is made simply, the yields height, modulating speed is fast, and optics effectively utilizes area big.
The technical solution adopted in the present invention is as follows:
The present invention discloses a kind of electrostatic cimple-beam interference light modulator, and it mainly comprises following structure:
1, substrate;
2, be manufactured on control circuit on the substrate;
3, the lower electrode layer that on substrate, forms, each cell electrode control end of lower electrode layer and control circuit contacts;
4, be deposited on insulation course on the lower electrode layer;
5, free beam that on insulation course, forms and support anchor, free beam adopts the class wing shapes;
6, be connected the moving reflector array that is supported on the support anchor, moving reflector array and lower electrode layer constitute the air chamber of gap variable, each moving reflector is by the top electrode that is connected to form between the free beam, and common ground, a pixel of a corresponding light modulator arrays of moving reflector, the corresponding photomodulator unit that forms of each moving reflector all can independently apply bias voltage, make moving reflector do vertical movement up and down, the flat board that constitutes phase variable is interfered device, forms the dot matrix of different interference effects;
7, cover the fixing glass flat board of all moving reflector tops by the bonding mode, four angles of fixing glass flat board are supported on the substrate, leave certain spacing between fixing glass flat board and the moving reflector, spacing between dull and stereotyped lower surface of fixing glass and the moving reflector should satisfy make incident light by back chimney fixing glass planar surface reflected light and by the moving reflector reflection again the phase differential between the dull and stereotyped projection light of fixing glass be n π (n=1,3,5......), the dull and stereotyped upper and lower surface plated film of fixing glass is realized effective transmission and reflection.
Distance can change by the bottom electrode change in voltage between described fixed flat planar glass and the moving reflector, between not during making alive when being biased voltage V, incident light is π through the out-of-date phase differential that will form.
This photomodulator adopts static driven, its principle of work is: reflect on the glass plate surface when incident light incides device surface, transmitted light incides moving reflector behind glass plate simultaneously, through producing certain phase difference with reflected light behind the glass plate, the phase differential size is by the distance decision between glass plate and the movable reflecting surface, when phase differential is zero, light beam interferes long mutually, behind lens, form bright spot, and phase differential is when being π, light beam interferes mutually and disappears, and forms dim spot behind lens, thereby realizes incident light is carried out phase modulation (PM).
This optical modulation device can adopt the manufacturing of MEMS technology, and it and existing IC technology are compatible, at silicon chip higher slice structure device.
Advantage of the present invention is: device is a two-dimensional array, be used for need not to add optical scanning mechanism when image shows, therefore simplified optical system, because it is its simple double-decker, simple in structure, yields is high, can realize with general IC surface processing technique fully, solved the DMD complex process, the problem that yields is low adopts the static driven moving reflector simultaneously, modulating speed is fast, and simultaneously optics effectively utilizes area to compare GLV to improve a lot; The simple beam structure that adopts has adopted the structure of class wing, has improved the depth of parallelism of moving reflector.
This modulator can be widely used on high definition digital television, Projection Display, printer, optical communication, the spectrometer.
Description of drawings
Fig. 1: electrostatic cimple-beam interference light modulator structural drawing
Fig. 2: the partial structurtes figure that removes the electrostatic cimple-beam interference light modulator behind the fixing glass flat board
Fig. 3: the cellular construction figure that removes the electrostatic cimple-beam interference light modulator behind the fixing glass flat board
Fig. 4: the structural drawing after removing moving reflector on Fig. 3 basis
Fig. 5 A and Fig. 5 B: the sectional view of electrostatic cimple-beam interference light modulator list pixel under the different operating state
Fig. 6: during the light beam oblique incidence, electrostatic cimple-beam interference light modulator is based on the shear interference optical schematic diagram
Fig. 7: during light beam normal incidence, electrostatic cimple-beam interference light modulator is based on the shear interference optical schematic diagram
Among the figure, 1 substrate; 2 lower electrode layers; 3 insulation courses; The gap of 4 free beams and bottom electrode; 5 free beams; 6 support anchor; 7 moving reflectors; 8 fixing glass flat boards
Embodiment
The invention will be further described below in conjunction with the drawings and specific embodiments:
Referring to Fig. 1, Fig. 3 and Fig. 4, the manufacturing process of this modulator is as follows: production control circuit on substrate 1, splash-proofing sputtering metal and photoetching thereon forms lower electrode layer 2, each cell electrode control end of lower electrode layer 2 and control circuit contacts, the certain thickness insulation course 3 of deposit, splash-proofing sputtering metal aluminium forms the free beam 5 of class wing shapes and supports anchor 6, supporting deposit formation moving reflector 7 on the anchor again, the fixing glass flat board 8 (can be stationary mirror again) that will be coated with semi-permeable diaphragm at lower surface covers moving reflector 7 tops by the mode of bonding at last, four angles of fixing glass flat board 8 are supported on the substrate 1, dull and stereotyped 8 lower surfaces of fixing glass and moving reflector 7 spacings make incident light by the back from fixing glass planar surface reflected light and by the moving reflector reflection again between fixing glass flat board transmitted light phase differential be π.
By Fig. 2 as seen, a pixel of each moving reflector 7 respective devices, all moving reflectors 7 are whole as public top electrode by being connected to form between the free beam 5, but each moving reflector 7 can realize independently moving up and down, and control the light and shade attitude of this pixel.
Fig. 5 A and Fig. 5 B are the change in location situations of the moving reflector 7 of device under the different operating state, among the figure, and h 1Be electrostatic cimple-beam interference light modulator list pixel in dark attitude be distance between fixing glass flat board and the moving reflector; h 2Be electrostatic cimple-beam interference light modulator list pixel in bright attitude be distance between fixing glass flat board and the moving reflector; V is the voltage that drives the moving reflector motion.When bottom electrode does not apply voltage, incident light impinges perpendicularly on device array, because from the light of fixing glass flat board 8 reflection with have the optical path difference of odd-multiple half-wavelength from the light of moving reflector 7 reflections, be that phase differential is n π (n=1,3,5......), disappear by interfering mutually after dull and stereotyped 8 outgoing of fixing glass, correspond to the dark attitude of device this moment; And after bottom electrode applied suitable voltage, phase differential was zero, and is long mutually by interfering after dull and stereotyped 8 outgoing of fixing glass, corresponds to the bright attitude of device this moment; Vertical movement up and down takes place to the phase modulation (PM) of incident light in moving reflector 7 under the effect of electrostatic force, realize the switch attitude of light, its optical schematic diagram as shown in Figure 6 when the light beam oblique incidence, incident beam A is through twice refraction and primary event, the outgoing of P point, i.e. light beam A from figure ', incident beam B is through primary event, also P point outgoing from figure, i.e. light beam B ', light beam A ' and B ' again the P point interfere; H represents the distance between the fixing glass flat board and moving reflector in the electrostatic cimple-beam interference light modulator list pixel.When light beam normal incidence, its optical schematic diagram as shown in Figure 7, incident beam A reflects at upper surface, P from figure 1Point outgoing, i.e. light beam A '; Incident beam A is through twice refraction, and primary event is also from the outgoing of P point, i.e. light beam A ", light beam A so ' and A " P in the drawings 1Point interferes.Same principle, light beam B ' and B " in the drawings P 2Point interferes.Change by distance h realizes that the phase appearance of interfering disappears.(dotted line of Fig. 7 is just in order clearly to see the path of light, and in fact incident light, reflected light, refract light do not have horizontal displacement)
Bias voltage among the present invention applies and adopts this area existing mature technology, adopts driven more.According to different array requests, adopt active driving or passive drive mode.The electrode outlet line of driving circuit can obtain when making this structure simultaneously.
Invention has been described more than to adopt example.But those those skilled in the art have read become after the disclosure file open-and-shut improvement and modification, still belong to the application's spirit and category.

Claims (3)

1. electrostatic cimple-beam interference light modulator is characterized in that it comprises:
A. substrate;
B. be manufactured on the control circuit on the substrate;
C. the lower electrode layer that on substrate, forms, each cell electrode control end of lower electrode layer and control circuit contacts;
D. be deposited on the insulation course on the lower electrode layer;
E. free beam that on insulation course, forms and support anchor;
F. be connected and be supported on the moving reflector array that supports on the anchor, moving reflector array and lower electrode layer constitute the air chamber of gap variable, each moving reflector is by the top electrode that is connected to form between the free beam, and common ground, a pixel of a corresponding light modulator arrays of moving reflector, the corresponding photomodulator unit that forms of each moving reflector independently applies bias voltage, make moving reflector do vertical movement up and down, the flat board that constitutes phase variable is interfered device, forms the dot matrix of different interference effects;
G. cover the fixing glass flat board of moving reflector top by the bonding mode, four angles of fixing glass flat board are supported on the substrate, spacing between dull and stereotyped lower surface of fixing glass and the moving reflector should satisfy make incident light by the back from fixing glass planar surface reflected light and by the moving reflector reflection again the phase differential between the dull and stereotyped transmitted light of fixing glass be n π, n=1 wherein, 3,5...... the dull and stereotyped upper and lower surface plated film of fixing glass is realized effective transmission and reflection.
2. photomodulator according to claim 1, it is characterized in that: distance can change by the bottom electrode change in voltage between fixing glass flat board and the moving reflector, between not during making alive when being biased voltage V, incident light through out-of-date be π with the phase differential that forms.
3. photomodulator according to claim 1 is characterized in that: free beam adopts the class wing shapes.
CNB2005100573911A 2005-11-18 2005-11-18 Electrostatic Charpy Interferometric Light Modulator Expired - Fee Related CN100362387C (en)

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Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104730709A (en) * 2015-04-15 2015-06-24 重庆大学 Phase modulation type micromirror array programmable fresnel zone plate and zooming method thereof
JP6814076B2 (en) 2017-03-14 2021-01-13 浜松ホトニクス株式会社 Optical module
JP6461445B1 (en) 2017-07-06 2019-01-30 浜松ホトニクス株式会社 Optical device
US12160084B2 (en) * 2019-10-15 2024-12-03 Texas Instruments Incorporated MEMS-based phase spatial light modulating architecture
CN119059487A (en) * 2023-05-30 2024-12-03 华为技术有限公司 A micro-electromechanical system chip, control method and related device

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5170283A (en) * 1991-07-24 1992-12-08 Northrop Corporation Silicon spatial light modulator
CN1206119A (en) * 1997-03-19 1999-01-27 株式会社东金 Optical modulating element having sloping reflector plate
CN1292103A (en) * 1998-03-02 2001-04-18 微激光系统公司 Improved pattern generator
JP2002277771A (en) * 2001-03-21 2002-09-25 Ricoh Co Ltd Optical modulator
CN1517743A (en) * 2003-01-16 2004-08-04 精工爱普生株式会社 Optical modulator, display device and manufacturing method thereof

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5170283A (en) * 1991-07-24 1992-12-08 Northrop Corporation Silicon spatial light modulator
CN1206119A (en) * 1997-03-19 1999-01-27 株式会社东金 Optical modulating element having sloping reflector plate
CN1292103A (en) * 1998-03-02 2001-04-18 微激光系统公司 Improved pattern generator
JP2002277771A (en) * 2001-03-21 2002-09-25 Ricoh Co Ltd Optical modulator
CN1517743A (en) * 2003-01-16 2004-08-04 精工爱普生株式会社 Optical modulator, display device and manufacturing method thereof

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