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CH783765A4 - - Google Patents

Info

Publication number
CH783765A4
CH783765A4 CH783765A CH783765A CH783765A4 CH 783765 A4 CH783765 A4 CH 783765A4 CH 783765 A CH783765 A CH 783765A CH 783765 A CH783765 A CH 783765A CH 783765 A4 CH783765 A4 CH 783765A4
Authority
CH
Switzerland
Application number
CH783765A
Other versions
CH423939A (fr
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to CH783765A priority Critical patent/CH423939A/fr
Priority to DE19661590230 priority patent/DE1590230A1/de
Priority to NL6607682A priority patent/NL6607682A/xx
Priority to GB24581/66A priority patent/GB1089813A/en
Priority to FR63953A priority patent/FR1481823A/fr
Priority to JP41035722A priority patent/JPS4913911B1/ja
Publication of CH423939A publication Critical patent/CH423939A/fr
Publication of CH783765A4 publication Critical patent/CH783765A4/xx
Priority to US805108*A priority patent/US3491274A/en

Links

Classifications

    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H1/00Constructional details of impedance networks whose electrical mode of operation is not specified or applicable to more than one type of network
    • H03H1/02RC networks, e.g. filters
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76Making of isolation regions between components
    • H01L21/762Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
    • H01L21/76297Dielectric isolation using EPIC techniques, i.e. epitaxial passivated integrated circuit
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D1/00Resistors, capacitors or inductors
    • H10D1/40Resistors
    • H10D1/43Resistors having PN junctions
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/201Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of only components covered by H10D1/00 or H10D8/00, e.g. RLC circuits
    • H10D84/204Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of only components covered by H10D1/00 or H10D8/00, e.g. RLC circuits of combinations of diodes or capacitors or resistors
    • H10D84/209Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of only components covered by H10D1/00 or H10D8/00, e.g. RLC circuits of combinations of diodes or capacitors or resistors of only resistors

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Semiconductor Integrated Circuits (AREA)
CH783765A 1965-06-04 1965-06-04 Résistance diffusée dans un circuit intégré CH423939A (fr)

Priority Applications (7)

Application Number Priority Date Filing Date Title
CH783765A CH423939A (fr) 1965-06-04 1965-06-04 Résistance diffusée dans un circuit intégré
DE19661590230 DE1590230A1 (de) 1965-06-04 1966-06-01 In eine integrierte Schaltung diffundierter Widerstand
NL6607682A NL6607682A (fi) 1965-06-04 1966-06-02
GB24581/66A GB1089813A (en) 1965-06-04 1966-06-02 Diffused resistance in an integrated circuit
FR63953A FR1481823A (fr) 1965-06-04 1966-06-02 Résistance diffusée dans un circuit intégré
JP41035722A JPS4913911B1 (fi) 1965-06-04 1966-06-04
US805108*A US3491274A (en) 1965-06-04 1969-02-28 Diffused resistance in an integrated circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH783765A CH423939A (fr) 1965-06-04 1965-06-04 Résistance diffusée dans un circuit intégré

Publications (2)

Publication Number Publication Date
CH423939A CH423939A (fr) 1967-05-13
CH783765A4 true CH783765A4 (fi) 1967-05-13

Family

ID=4331161

Family Applications (1)

Application Number Title Priority Date Filing Date
CH783765A CH423939A (fr) 1965-06-04 1965-06-04 Résistance diffusée dans un circuit intégré

Country Status (6)

Country Link
US (1) US3491274A (fi)
JP (1) JPS4913911B1 (fi)
CH (1) CH423939A (fi)
DE (1) DE1590230A1 (fi)
GB (1) GB1089813A (fi)
NL (1) NL6607682A (fi)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3584269A (en) * 1968-10-11 1971-06-08 Ibm Diffused equal impedance interconnections for integrated circuits
US3619739A (en) * 1969-01-16 1971-11-09 Signetics Corp Bulk resistor and integrated circuit using the same
US3629667A (en) * 1969-03-14 1971-12-21 Ibm Semiconductor resistor with uniforms current distribution at its contact surface
JPS5937582B2 (ja) * 1981-06-29 1984-09-11 日本電気株式会社 半導体集積回路装置
EP0195232B1 (en) * 1985-03-20 1991-12-11 Hitachi, Ltd. Piezoresistive strain sensing device
DE3802796A1 (de) * 1988-01-30 1989-08-10 Bosch Gmbh Robert Elektronisches geraet mit schaltmitteln zur daempfung von nach aussen dringenden hochfrequenten stoerspannungen

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3293087A (en) * 1963-03-05 1966-12-20 Fairchild Camera Instr Co Method of making isolated epitaxial field-effect device
US3317850A (en) * 1963-04-29 1967-05-02 Fairchild Camera Instr Co Temperature-stable differential amplifier using field-effect devices
US3271685A (en) * 1963-06-20 1966-09-06 Westinghouse Electric Corp Multipurpose molecular electronic semiconductor device for performing amplifier and oscillator-mixer functions including degenerative feedback means
BE650116A (fi) * 1963-07-05 1900-01-01
US3335340A (en) * 1964-02-24 1967-08-08 Ibm Combined transistor and testing structures and fabrication thereof

Also Published As

Publication number Publication date
JPS4913911B1 (fi) 1974-04-03
NL6607682A (fi) 1966-12-05
US3491274A (en) 1970-01-20
CH423939A (fr) 1967-05-13
DE1590230A1 (de) 1970-05-06
GB1089813A (en) 1967-11-08

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