CH617063GA3 - Method of adjusting the properties of a resonator, resonator obtained by this method and use of the resonator - Google Patents
Method of adjusting the properties of a resonator, resonator obtained by this method and use of the resonator Download PDFInfo
- Publication number
- CH617063GA3 CH617063GA3 CH784777A CH784777A CH617063GA3 CH 617063G A3 CH617063G A3 CH 617063GA3 CH 784777 A CH784777 A CH 784777A CH 784777 A CH784777 A CH 784777A CH 617063G A3 CH617063G A3 CH 617063GA3
- Authority
- CH
- Switzerland
- Prior art keywords
- resonator
- properties
- adjusting
- frequency
- variation
- Prior art date
Links
- 239000010453 quartz Substances 0.000 abstract 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
- 239000013078 crystal Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/02—Details
- H03H9/02007—Details of bulk acoustic wave devices
- H03H9/02157—Dimensional parameters, e.g. ratio between two dimension parameters, length, width or thickness
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
- H03H3/04—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks for obtaining desired frequency or temperature coefficient
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
- H03H3/04—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks for obtaining desired frequency or temperature coefficient
- H03H2003/0414—Resonance frequency
Landscapes
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
- Electric Clocks (AREA)
- Oscillators With Electromechanical Resonators (AREA)
Abstract
The fine adjustment is carried out, in a single operation, of the thermal properties and of the frequency of a quartz resonator comprising a quartz crystal having the shape of a rectangular plate of dimensions: 3.4 x 3.9 x 0.15 mm, provided with electrodes, by adding a 15 microgramme weight (corresponding to 0.3% of the total weight of the resonator) shared out between two point regions located in the middle (A, A') of two opposite sides (a, a') of the plate. There is thus obtained, simultaneously, a variation of the first-order thermal coefficient of -2 x 10<-6>/ DEG C and a relative variation of the frequency of -2.5 x 10<-3>. <IMAGE>
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH784777A CH617063GA3 (en) | 1977-06-27 | 1977-06-27 | Method of adjusting the properties of a resonator, resonator obtained by this method and use of the resonator |
DE19782828048 DE2828048A1 (en) | 1977-06-27 | 1978-06-26 | Quartz crystal resonator adjustment - involves altering mass at two small areas near edge of resonator without changing size |
JP7793678A JPS5444857A (en) | 1977-06-27 | 1978-06-27 | Method of controlling characteristics of crystal oscillator |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH784777A CH617063GA3 (en) | 1977-06-27 | 1977-06-27 | Method of adjusting the properties of a resonator, resonator obtained by this method and use of the resonator |
Publications (2)
Publication Number | Publication Date |
---|---|
CH617063B CH617063B (en) | |
CH617063GA3 true CH617063GA3 (en) | 1980-05-14 |
Family
ID=4331307
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CH784777A CH617063GA3 (en) | 1977-06-27 | 1977-06-27 | Method of adjusting the properties of a resonator, resonator obtained by this method and use of the resonator |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPS5444857A (en) |
CH (1) | CH617063GA3 (en) |
DE (1) | DE2828048A1 (en) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4375604A (en) * | 1981-02-27 | 1983-03-01 | The United States Of America As Represented By The Secretary Of The Army | Method of angle correcting doubly rotated crystal resonators |
JPS57188121A (en) * | 1981-05-15 | 1982-11-19 | Seiko Instr & Electronics Ltd | Frequency adjusting method of coupling oscillator |
JPS5833308A (en) * | 1981-08-21 | 1983-02-26 | Seiko Instr & Electronics Ltd | Coupled quartz oscillator |
JPS58159012A (en) * | 1982-03-16 | 1983-09-21 | Seiko Instr & Electronics Ltd | Manufacture of coupling vibrator unit |
JPS58166818A (en) * | 1982-03-29 | 1983-10-03 | Seiko Instr & Electronics Ltd | Frequency control method of coupling oscillator |
JPS58170109A (en) * | 1982-03-30 | 1983-10-06 | Seiko Instr & Electronics Ltd | Miniature gt-cut crystal oscillator |
US4455500A (en) * | 1983-07-28 | 1984-06-19 | Western Geophysical Company Of America | Sensitivity and capacitance adjustment method for piezoelectric accelerometers |
JPH0640612B2 (en) * | 1986-03-31 | 1994-05-25 | 朝日電波株式会社 | Piezoelectric vibrator |
US5168191A (en) * | 1987-10-02 | 1992-12-01 | Quartztronics, Inc. | Crystal resonator with low acceleration sensitivity and method of manufacture thereof |
US5022130A (en) * | 1987-10-02 | 1991-06-11 | Quartztronics, Inc. | Method of manufacturing crystal resonators having low acceleration sensitivity |
US4935658A (en) * | 1987-10-02 | 1990-06-19 | Quartztronics, Inc. | Crystal resonator with low acceleration sensitivity and method of manufacture thereof |
JPH02186817A (en) * | 1989-01-13 | 1990-07-23 | Seiko Electronic Components Ltd | Contour sliding crystal resonator |
US5112642A (en) * | 1990-03-30 | 1992-05-12 | Leybold Inficon, Inc. | Measuring and controlling deposition on a piezoelectric monitor crystal |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS533178A (en) * | 1976-06-30 | 1978-01-12 | Seiko Instr & Electronics Ltd | Crystal vibrator |
-
1977
- 1977-06-27 CH CH784777A patent/CH617063GA3/en not_active IP Right Cessation
-
1978
- 1978-06-26 DE DE19782828048 patent/DE2828048A1/en active Granted
- 1978-06-27 JP JP7793678A patent/JPS5444857A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
DE2828048C2 (en) | 1989-03-16 |
JPH03804B2 (en) | 1991-01-09 |
CH617063B (en) | |
DE2828048A1 (en) | 1979-01-11 |
JPS5444857A (en) | 1979-04-09 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PL | Patent ceased |