CH447757A - Process for the deposition of bright nickel by electroplating - Google Patents
Process for the deposition of bright nickel by electroplatingInfo
- Publication number
- CH447757A CH447757A CH813064A CH813064A CH447757A CH 447757 A CH447757 A CH 447757A CH 813064 A CH813064 A CH 813064A CH 813064 A CH813064 A CH 813064A CH 447757 A CH447757 A CH 447757A
- Authority
- CH
- Switzerland
- Prior art keywords
- electroplating
- deposition
- bright nickel
- bright
- nickel
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
- C25D3/14—Electroplating: Baths therefor from solutions of nickel or cobalt from baths containing acetylenic or heterocyclic compounds
- C25D3/18—Heterocyclic compounds
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/08—Electroplating with moving electrolyte e.g. jet electroplating
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
- C25D5/611—Smooth layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US29208363A | 1963-07-01 | 1963-07-01 |
Publications (1)
Publication Number | Publication Date |
---|---|
CH447757A true CH447757A (en) | 1967-11-30 |
Family
ID=23123132
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CH813064A CH447757A (en) | 1963-07-01 | 1964-06-22 | Process for the deposition of bright nickel by electroplating |
Country Status (6)
Country | Link |
---|---|
JP (1) | JPS4827182B1 (en) |
CH (1) | CH447757A (en) |
DE (1) | DE1496900A1 (en) |
FR (1) | FR1398658A (en) |
GB (1) | GB1060753A (en) |
NL (1) | NL6407471A (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2352077A1 (en) * | 1976-05-17 | 1977-12-16 | Electroplating Eng | High speed plating of metal with nickel layer - using insoluble anode and controlling nickel ion concn in bath |
US4439284A (en) * | 1980-06-17 | 1984-03-27 | Rockwell International Corporation | Composition control of electrodeposited nickel-cobalt alloys |
US4441969A (en) * | 1982-03-29 | 1984-04-10 | Omi International Corporation | Coumarin process and nickel electroplating bath |
-
1964
- 1964-05-22 GB GB21343/64A patent/GB1060753A/en not_active Expired
- 1964-06-16 FR FR978413A patent/FR1398658A/en not_active Expired
- 1964-06-19 DE DE19641496900 patent/DE1496900A1/en active Pending
- 1964-06-22 CH CH813064A patent/CH447757A/en unknown
- 1964-07-01 NL NL6407471A patent/NL6407471A/xx unknown
- 1964-07-01 JP JP39037071A patent/JPS4827182B1/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
JPS4827182B1 (en) | 1973-08-20 |
DE1496900A1 (en) | 1969-08-14 |
GB1060753A (en) | 1967-03-08 |
FR1398658A (en) | 1965-05-07 |
NL6407471A (en) | 1965-01-04 |
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