CH442000A - Photosensitive diazotype material - Google Patents
Photosensitive diazotype materialInfo
- Publication number
- CH442000A CH442000A CH1499464A CH1499464A CH442000A CH 442000 A CH442000 A CH 442000A CH 1499464 A CH1499464 A CH 1499464A CH 1499464 A CH1499464 A CH 1499464A CH 442000 A CH442000 A CH 442000A
- Authority
- CH
- Switzerland
- Prior art keywords
- diazotype material
- photosensitive
- photosensitive diazotype
- diazotype
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
- G03C1/815—Photosensitive materials characterised by the base or auxiliary layers characterised by means for filtering or absorbing ultraviolet light, e.g. optical bleaching
- G03C1/8155—Organic compounds therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/52—Compositions containing diazo compounds as photosensitive substances
- G03C1/61—Compositions containing diazo compounds as photosensitive substances with non-macromolecular additives
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US32547463A | 1963-11-21 | 1963-11-21 |
Publications (1)
Publication Number | Publication Date |
---|---|
CH442000A true CH442000A (en) | 1967-08-15 |
Family
ID=23268031
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CH1499464A CH442000A (en) | 1963-11-21 | 1964-11-20 | Photosensitive diazotype material |
Country Status (4)
Country | Link |
---|---|
BE (1) | BE656027A (en) |
CH (1) | CH442000A (en) |
GB (1) | GB1094374A (en) |
NL (1) | NL6413561A (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3525618A (en) * | 1964-12-04 | 1970-08-25 | Geigy Ag J R | Diazotype film materials |
DE1668358C3 (en) * | 1968-01-17 | 1980-04-03 | Hoechst Ag, 6000 Frankfurt | 6-phenyl-a-pyrones as an absorbent for UV radiation |
US3836369A (en) * | 1972-09-05 | 1974-09-17 | Du Pont | Diazo photosensitive composition |
DE3307364A1 (en) * | 1983-03-02 | 1984-09-06 | Hoechst Ag, 6230 Frankfurt | TWO-COMPONENT DIAZON TYPE MATERIAL |
FR2639942B1 (en) * | 1988-12-02 | 1991-03-29 | Sanofi Sa | OXIMATED PROPENONE ETHERS, PROCESS FOR THEIR PREPARATION AND PHARMACEUTICAL COMPOSITIONS CONTAINING THEM |
-
1964
- 1964-11-18 GB GB4700664A patent/GB1094374A/en not_active Expired
- 1964-11-20 CH CH1499464A patent/CH442000A/en unknown
- 1964-11-20 NL NL6413561A patent/NL6413561A/xx unknown
- 1964-11-20 BE BE656027D patent/BE656027A/xx unknown
Also Published As
Publication number | Publication date |
---|---|
GB1094374A (en) | 1967-12-13 |
BE656027A (en) | 1965-03-16 |
NL6413561A (en) | 1965-05-24 |
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