CH427447A - Acid bath for the production of galvanic metal coatings - Google Patents
Acid bath for the production of galvanic metal coatingsInfo
- Publication number
- CH427447A CH427447A CH1462561A CH1462561A CH427447A CH 427447 A CH427447 A CH 427447A CH 1462561 A CH1462561 A CH 1462561A CH 1462561 A CH1462561 A CH 1462561A CH 427447 A CH427447 A CH 427447A
- Authority
- CH
- Switzerland
- Prior art keywords
- production
- acid bath
- metal coatings
- galvanic metal
- galvanic
- Prior art date
Links
- 239000002253 acid Substances 0.000 title 1
- 238000000576 coating method Methods 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000002184 metal Substances 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/16—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms acylated on ring nitrogen atoms
- C07D295/20—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms acylated on ring nitrogen atoms by radicals derived from carbonic acid, or sulfur or nitrogen analogues thereof
- C07D295/21—Radicals derived from sulfur analogues of carbonic acid
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D233/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings
- C07D233/04—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member
- C07D233/28—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D233/30—Oxygen or sulfur atoms
- C07D233/42—Sulfur atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D251/00—Heterocyclic compounds containing 1,3,5-triazine rings
- C07D251/02—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings
- C07D251/08—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/38—Electroplating: Baths therefor from solutions of copper
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DED35328A DE1146322B (en) | 1961-02-02 | 1961-02-02 | Acid galvanic metal baths |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CH427447A true CH427447A (en) | 1966-12-31 |
Family
ID=7042588
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CH1462561A CH427447A (en) | 1961-02-02 | 1961-12-16 | Acid bath for the production of galvanic metal coatings |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US3203878A (en) |
| BE (1) | BE613365A (en) |
| CH (1) | CH427447A (en) |
| DE (1) | DE1146322B (en) |
| DK (1) | DK103053C (en) |
| GB (1) | GB928011A (en) |
| NL (2) | NL274211A (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1248415B (en) * | 1964-03-07 | 1967-08-24 | Dehydag Gmbh | Acid galvanic copper baths |
| US3414493A (en) * | 1965-10-19 | 1968-12-03 | Lea Ronal Inc | Electrodeposition of copper |
| US3725220A (en) * | 1972-04-27 | 1973-04-03 | Lea Ronal Inc | Electrodeposition of copper from acidic baths |
| US4376685A (en) * | 1981-06-24 | 1983-03-15 | M&T Chemicals Inc. | Acid copper electroplating baths containing brightening and leveling additives |
| GB2109815B (en) * | 1981-11-18 | 1985-09-04 | Ibm | Electrodepositing chromium |
| US4786746A (en) * | 1987-09-18 | 1988-11-22 | Pennsylvania Research Corporation | Copper electroplating solutions and methods of making and using them |
| ES2624637T3 (en) * | 2008-05-30 | 2017-07-17 | Atotech Deutschland Gmbh | Electrogalvanoplasty additive for the deposition of an alloy of a metal of group IB / binary or ternary of group IB-group IIIA / ternary, quaternary or quinary of group IB, group IIIA-group VIA |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL202744A (en) * | 1953-09-19 | |||
| DE1007592B (en) * | 1955-01-19 | 1957-05-02 | Dehydag Gmbh | Bath for the production of galvanic metal coatings |
| US3006954A (en) * | 1957-12-27 | 1961-10-31 | Shell Oil Co | Urea and thiourea compounds |
| US2948752A (en) * | 1959-05-18 | 1960-08-09 | Monsanto Canada Ltd | Combined fungistatic and bacteriostatic agents |
-
0
- NL NL134137D patent/NL134137C/xx active
- NL NL274211D patent/NL274211A/xx unknown
-
1961
- 1961-02-02 DE DED35328A patent/DE1146322B/en active Pending
- 1961-12-16 CH CH1462561A patent/CH427447A/en unknown
- 1961-12-28 GB GB46401/61A patent/GB928011A/en not_active Expired
-
1962
- 1962-02-01 US US170522A patent/US3203878A/en not_active Expired - Lifetime
- 1962-02-01 BE BE613365A patent/BE613365A/en unknown
- 1962-02-01 DK DK46962AA patent/DK103053C/en active
Also Published As
| Publication number | Publication date |
|---|---|
| NL134137C (en) | |
| US3203878A (en) | 1965-08-31 |
| GB928011A (en) | 1963-06-06 |
| BE613365A (en) | 1962-05-29 |
| NL274211A (en) | |
| DE1146322B (en) | 1963-03-28 |
| DK103053C (en) | 1965-11-08 |
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