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CA936451A - Continuous epitaxial deposition system - Google Patents

Continuous epitaxial deposition system

Info

Publication number
CA936451A
CA936451A CA088264A CA88264A CA936451A CA 936451 A CA936451 A CA 936451A CA 088264 A CA088264 A CA 088264A CA 88264 A CA88264 A CA 88264A CA 936451 A CA936451 A CA 936451A
Authority
CA
Canada
Prior art keywords
deposition system
epitaxial deposition
continuous epitaxial
continuous
epitaxial
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA088264A
Other versions
CA88264S (en
Inventor
Rice Warren
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Texas Instruments Inc
Original Assignee
Texas Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Texas Instruments Inc filed Critical Texas Instruments Inc
Application granted granted Critical
Publication of CA936451A publication Critical patent/CA936451A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
CA088264A 1969-08-14 1970-07-15 Continuous epitaxial deposition system Expired CA936451A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US85001569A 1969-08-14 1969-08-14

Publications (1)

Publication Number Publication Date
CA936451A true CA936451A (en) 1973-11-06

Family

ID=25307056

Family Applications (1)

Application Number Title Priority Date Filing Date
CA088264A Expired CA936451A (en) 1969-08-14 1970-07-15 Continuous epitaxial deposition system

Country Status (4)

Country Link
US (1) US3598082A (en)
JP (1) JPS509629B1 (en)
CA (1) CA936451A (en)
GB (1) GB1320714A (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2054538C3 (en) * 1970-11-05 1979-03-22 Siemens Ag, 1000 Berlin Und 8000 Muenchen Device for depositing layers of semiconductor material
US4098923A (en) * 1976-06-07 1978-07-04 Motorola, Inc. Pyrolytic deposition of silicon dioxide on semiconductors using a shrouded boat
JPS53104829U (en) * 1977-01-31 1978-08-23
US4803947A (en) * 1986-01-15 1989-02-14 Canon Kabushiki Kaisha Apparatus for forming deposited film
US5044314A (en) * 1986-10-15 1991-09-03 Advantage Production Technology, Inc. Semiconductor wafer processing apparatus
US4949669A (en) * 1988-12-20 1990-08-21 Texas Instruments Incorporated Gas flow systems in CCVD reactors
US4941429A (en) * 1988-12-20 1990-07-17 Texas Instruments Incorporated Semiconductor wafer carrier guide tracks
US6093252A (en) 1995-08-03 2000-07-25 Asm America, Inc. Process chamber with inner support
US6383330B1 (en) 1999-09-10 2002-05-07 Asm America, Inc. Quartz wafer processing chamber
US6626997B2 (en) 2001-05-17 2003-09-30 Nathan P. Shapiro Continuous processing chamber
US7169233B2 (en) * 2003-11-21 2007-01-30 Asm America, Inc. Reactor chamber
USD1028913S1 (en) 2021-06-30 2024-05-28 Asm Ip Holding B.V. Semiconductor deposition reactor ring

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2674809A (en) * 1950-08-24 1954-04-13 Raduner & Co Ag Apparatus for thermic treatment by infrared radiation
US3190262A (en) * 1961-10-20 1965-06-22 Alloyd Corp Vapor deposition
US3473510A (en) * 1966-02-23 1969-10-21 Corning Glass Works Method and apparatus for the continuous doping of semiconductor materials

Also Published As

Publication number Publication date
GB1320714A (en) 1973-06-20
US3598082A (en) 1971-08-10
JPS509629B1 (en) 1975-04-14

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