CA2366953A1 - Release layer, method for producing the same and its use - Google Patents
Release layer, method for producing the same and its use Download PDFInfo
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- CA2366953A1 CA2366953A1 CA002366953A CA2366953A CA2366953A1 CA 2366953 A1 CA2366953 A1 CA 2366953A1 CA 002366953 A CA002366953 A CA 002366953A CA 2366953 A CA2366953 A CA 2366953A CA 2366953 A1 CA2366953 A1 CA 2366953A1
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- Prior art keywords
- release coating
- release
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- deposited
- substrate
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/60—Deposition of organic layers from vapour phase
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
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- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Laminated Bodies (AREA)
- Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
Abstract
The invention relates to a release layer, to a method for producing the same and to the use of said release layer. Such release layers are for example used for producing pigments and for producing blocking foils. According to the invention, the vapor-deposited release layer consists of an organic monomer, preferably a triazine such as melamine. The release layer and the releasable cover layer can be applied in the same vaporization plant. The removal of the release layer, too, can be effected already in vacuo. The substrates used can be two-dimensional or three-dimensional material, but the release layer can also be vapor-deposited as a structured layer to generate a structured substrate as the final product. The release layer can be lacquered, coated or laminated.
Description
Release coating, method of manufacturing same and use The present invention relates to a release coating, a method of manufacturing same and to uses of such release coatings.
Release coatings are used to detach a layer applied thereto. The released layer or the partially released substrate film represents the end product. For example, the released layer is used to produce pigments or embossings. A partial covering of the substrate before being coated with the release coating structures an additionally applied layer after the covering has been released.
In the manufacture of pigments, e.g. metallic pigments based on metals for lacquer coatings, a layer which is several tens of nanometres thick, e.g. aluminium, is vapour-deposited by means of vacuum technology onto a lacquered polymer film, e.g. polyethylene terephthalate (PET). When this coated film is dipped into solvent, for aluminium e.g. acetone, the (aluminium) layer is released from the polymer film. From the released layer, metallic pigments are then manufactured. In order to obtain greater pigments, the aluminium layer is then additionally coated. A method of this type is disclosed for example in US 3 949 139.
According to prior art, the polymer film is lacquered outside the vacuum to produce the pigments.
In embossed films, according to prior art, the release of the second layer takes place by means of a heated embossing die.
The purpose of the present invention is to make available release coatings, methods of manufacturing same and uses of such release coatings, which can be applied and released in a simple and inexpensive manner.
This object is achieved by the release coating according to the preamble of claim 1, the method for manufacturing same according to the preamble of claim 8, in conjunction with their characteristic features, and through the application according to claim 7.
The release coating according to this invention, vapour-deposited by means of vacuum technology, contains an organic monomer. By this means, the manufacture of release coatings with the aid of coatings produced by vacuum technology is also possible at low temperatures for example. As the organic monomer, advantageously a water-soluble organic monomer is used. By this means, the use of solvents which are harmful to the environment can be avoided.
Furthermore, the substrate is not damaged by water, such that lower material consumption and thus lower - production costs result. With negligible damage of the substrate, for example a polymer film, by the whole process, the substrate can be used again and even several times, such that both the impact on the environment and the process costs are reduced.
The release coating according to this invention consists of a triazine, advantageously a 1, 3, 5-triazine, its salt or a mixture thereof. As triazines can be considered especially melamine, ammeline, ammelide, cyanuric acid, 2-ureidomelamine, melam, melem, melon or melamine salts such as melamine cyanurate, melamine phosphate, dimelamine pyrophosphate or melamine polyphosphate or functionalised melamine such as hei~amethoxymethyl melamine or acrylate-functionalised melamine or a mixture of the above substances. These release coatings are partially water-soluble and often easy to remove. What is advantageous about the use of melamine or melamine derivatives is in particular that the vaporisation temperature of melamine is merely approximately 200°C.
Thus only low thermal stressing occurs of the substrate and of the screens or strips located in the vaporiser.
Furthermore, melamine comes away in warm water, such that not only can the release coating be dissolved with hot water, but also the cleaning of the apparatus used to manufacture the release coating can be carried out simply with hot water.
Suitable as the substrate are especially sheet materials, in particular strip-form materials such as films made of polymers, since these are only slightly thermally stressed during the manufacture of the release coatings according to the invention, and when the release coating is released only come into contact with water. Suitable as polymers for this purpose are in particular polyester, polypropylene, polyethylene, polyamide, polycarbonate or combinations thereof. As materials, also paper, cardboard, metallic strips or :,ombinations thereof are suitable.
These release coatings according to the invention can be used in particular to produce nanoparticles, to produce pigments, for example metallic effect pigments, pigments made of TiOz, SiO;~ or other ax_ides, for lacquer coating or for producing embossed films and also for producing substrates coated in a structured manner. In the latter case, the substrate with the structured surface represents the desired product.
When a pre-structured substrate is used, a structuring of the later released particles, especially nanoparticles, occurs. Thus the structure of the particles is determined via the structure of the substrate.
The manufacture of the release coatings according to the invention comes about by the application of the release coating to a substrate by means of vacuum technology. The substrate can here be only partially coated with the release coating, in order to obtain a structured coating of the substrate with the covering layer by releasing the only partially applied release coating. The release of the release coating can also occur already inside the vacuum chamber, for example by the release coating being removed under vacuum by heating. There can also be a multiple layer construction, such that a differing number of covering layers in various regions of the substrate can then be released. The additional layers and covering layers do not necessarily have to be applied by means of vacuum technology. However it is particularly advantageous if the additional covering layers and the release coating/release coatings are vapour-deposited in the same vacuum chamber, for example by vaporisation sources disposed the one behind the other. By this means, the whole substrate coating occurs in just one operating cycle and reduced manufacturing costs ensue.
Naturally, the additional covering layers do not necessarily have to contain organic monomers but can 5 also be, as in prior art, inorganic layers such as aluminium layers or oxide layers for example. The release coating can also be provided with the covering layer by lacquering, coating or laminating, possibly several times. The coating can take place in an additional vacuum system.
As methods for applying the release coating/release coatings or the covering layer/covering layers, in addition to other methods, especially thermal vaporisation, cathode sputtering or chemical Vapour deposition (CVD) are available. The substrate can here be pre-treated with a plasma source before each individual layer is vapour-deposited, in order to improve the adherence of t:he layer to be applied on the previously applied layer.
Examples of the release coating according to the invention and examples of the method for manufacturing same are described below.
The figures show:
Fig. 1 the basic structure of a conventional vacuum strip-coating line and Fig. 2 the basic structure of a vacuum-coating system for the method according to the invention;
Fig. 3 the basic structure of a further vacuum-coating system for the method according to the invention, ~ Fig. 4 the basic structure of a further vacuum-coating system for the method according to the invention.
The vacuum-coating system according to prior art, as shown in Fig. 1, has a coating chamber 1 in which a vaporiser 2 is located. with this vaporiser 2, the material for a conventional release coating is converted into a gas phase 7. Furthermore, this conventional system has a take-off roller 4 and a take-up roller 5 for a polymer film 6. This film is guided over a coating roller 3 and thus plunges into the gas phase 7 of the material to be applied. By this means, the polymer film is coated with the release coating.
Following this coating which has taken place in the vacuum strip-coating line, the film is, for example, lacquered outside this system.
Fig. 2 shows the structure of a vacuum strip-coating line for the method according to the invention. This strip-coating line has two coating chambers 1, 1' which are separated from one another by a partition wall 10.
As on the conventional strip-coating line, two winding rollers 4, 5 are disposed in the strip-coating line, in order to wind a polymer film from the take-off roller 4 onto the take-up roller 5. The polymer film 6 is here guided over a coating roller 3, a deflection roller 9 and a coating roller 3'.
In the respective coating chambers 1, 1' is located respectively a vaporiser 2, 2'. Vaporiser 2 here vaporises melamine to produce a release coating on the polymer strip 6. Vaporiser 2' contains metals, in order to deposit a pigment layer on the film 6. The coating roller 3 is here so disposed in the proxim,_'ty of the vaporiser 2 and coating roller 3' in the proximity of vaporiser 2', that the polymer film consisting of polyethylene terephthalate (PET), guided around these coating rollers, plunges into the gas phase produced by the respective vaporisers. Between the two coating rollers 3 and 3', the polymer film is guided over a deflection roller 9.
In the vacuum strip-coating line described, the polymer film is now guided from the take-off roller 4 over the coating roller 3 and thereby provided with a melamine layer as a release coating, Via the deflection roller 9, the polymer film 6 is thF~n in turn led out of the melamine gas phase and then brought into the metallic gas phase, which is created by vaporiser 2'. There, the melamine-coated polymer film 6 is coated with metal pigments. Thereafter, the finished polymer film is wound onto the take-up roller 5.
In the method described here, as a result of the low vaporisation temperature of approximately 250°C in vaporiser 2, only low thermal stressing of the polymer film and the coating screens or partitions 10 occurs.
Furthermore, these can be cleaned of the applied melamine easily with hot water.
What is advantageous about the coated polymer film is that the release coating formed of melamine can be dissolved by dipping in hot water and that the second vapour-deposited metal pigment layer is thus released from the polymer film 6.
Fig. 3 shows an additional coating chamber for the method according to the invention, similar parts being provided with corresponding reference numerals to those in Fig. 2. The vacuum strip-coating line in Fig. 3 again has a take-off roller 4 and a take-up roller 5 for a film 6. This :Film 6 is guided around a deposition roller_ 3. To the side of and below the deposition roller 3 are disposed two deposition chambers 1, 1', with respective vaporisers 2 or 2'.
Vaporiser 2 is disposed in the region in which the film 6 is spanned between the take-up roller 4 and the deposition roller 3. By this vaporiser, melamine is applied as a release coating to the film 6. With vaporiser 2', which is located below the deposition roller 3, the foil is coated with metal pigments before it is wound again onto the take-up roller 5.
In Fig. 4 is described another principle for producing metal pigment particles b:y means of the method according to the invention. The vacuum strip-coating line of Fig. 4 is again provided with corresponding reference numerals for corresponding parts to those in Fig. 3. It has again two deposition chambers l, 1' with respectively a vaporiser 2, 2', which are both disposed around a deposition roller 3. In contrast to Fig. 3, however, herd a metal strip circulating on the deposition roller 3, or the metal roller itself is coated by the vaporisers instead of a film guided around the deposition roller_ 3. In the coating chamber 1, first the metal roller 3 or the metal strip 6 circulating on same, is coated with melamine and then in deposition chamber 1' with metal particles, such as aluminium for example. On the further periphery of the deposition roller 3 is disposed a heat source 11 and a release roller 12 and a release chamber 13. A region of the deposition roller 3 or of the circulating strip, coated on the deposition roller by vaporisers 2 and 2' with melamine and aluminium, runs during a rotation of the deposition roller 3 or of the circulating strip consequently also past the heat source and the release roller 12. The deposition roller 3 or the circulating strip is heated up to approximately 250°C by the heat source 11. Thus in the region of the heat source 11 and the release roller 12, the melamine vaporises and the aluminium applied above this melamine release coating is released from the metal roller 3 or from the metal strip 6 circulating on same. The aluminium pigment is then extracted in the release chamber 13 and removed from the vacuum charriber. Thus the region now free of melamine and aluminium on the metal roller 3 or on the metal strip 6 circulating on same is available again for vaporisation in the deposition chambers 1 and 1' with melamine and aluminium. The advantage of this method lies in the continuous operation of the system, since no exchange of take-off rollers 4 and take-up rollers 5 and roll material 6 is necessary as described in relation to Figs. 1 to 3.
Further possibilities of a device and a method as described in connection with Fig. 4 consist in the fact that the release of the vapour-deposited layers can take place in vacuum, i.e. for example the release chamber 13 is under vacuum. As release processes, apart from heating the roller 3 or the circulating strip at the corresponding point, methods are also available using electron beams, laser and/or photon radiation or infra-red radiation. The release process can also be so controlled that, before release, the quality of the vapour-deposited layers is checked by means of suitable methods and then the layers which show the desired quality features are released partially and/or in stages, e.g. in different release chambers, depending on their quality.
Release coatings are used to detach a layer applied thereto. The released layer or the partially released substrate film represents the end product. For example, the released layer is used to produce pigments or embossings. A partial covering of the substrate before being coated with the release coating structures an additionally applied layer after the covering has been released.
In the manufacture of pigments, e.g. metallic pigments based on metals for lacquer coatings, a layer which is several tens of nanometres thick, e.g. aluminium, is vapour-deposited by means of vacuum technology onto a lacquered polymer film, e.g. polyethylene terephthalate (PET). When this coated film is dipped into solvent, for aluminium e.g. acetone, the (aluminium) layer is released from the polymer film. From the released layer, metallic pigments are then manufactured. In order to obtain greater pigments, the aluminium layer is then additionally coated. A method of this type is disclosed for example in US 3 949 139.
According to prior art, the polymer film is lacquered outside the vacuum to produce the pigments.
In embossed films, according to prior art, the release of the second layer takes place by means of a heated embossing die.
The purpose of the present invention is to make available release coatings, methods of manufacturing same and uses of such release coatings, which can be applied and released in a simple and inexpensive manner.
This object is achieved by the release coating according to the preamble of claim 1, the method for manufacturing same according to the preamble of claim 8, in conjunction with their characteristic features, and through the application according to claim 7.
The release coating according to this invention, vapour-deposited by means of vacuum technology, contains an organic monomer. By this means, the manufacture of release coatings with the aid of coatings produced by vacuum technology is also possible at low temperatures for example. As the organic monomer, advantageously a water-soluble organic monomer is used. By this means, the use of solvents which are harmful to the environment can be avoided.
Furthermore, the substrate is not damaged by water, such that lower material consumption and thus lower - production costs result. With negligible damage of the substrate, for example a polymer film, by the whole process, the substrate can be used again and even several times, such that both the impact on the environment and the process costs are reduced.
The release coating according to this invention consists of a triazine, advantageously a 1, 3, 5-triazine, its salt or a mixture thereof. As triazines can be considered especially melamine, ammeline, ammelide, cyanuric acid, 2-ureidomelamine, melam, melem, melon or melamine salts such as melamine cyanurate, melamine phosphate, dimelamine pyrophosphate or melamine polyphosphate or functionalised melamine such as hei~amethoxymethyl melamine or acrylate-functionalised melamine or a mixture of the above substances. These release coatings are partially water-soluble and often easy to remove. What is advantageous about the use of melamine or melamine derivatives is in particular that the vaporisation temperature of melamine is merely approximately 200°C.
Thus only low thermal stressing occurs of the substrate and of the screens or strips located in the vaporiser.
Furthermore, melamine comes away in warm water, such that not only can the release coating be dissolved with hot water, but also the cleaning of the apparatus used to manufacture the release coating can be carried out simply with hot water.
Suitable as the substrate are especially sheet materials, in particular strip-form materials such as films made of polymers, since these are only slightly thermally stressed during the manufacture of the release coatings according to the invention, and when the release coating is released only come into contact with water. Suitable as polymers for this purpose are in particular polyester, polypropylene, polyethylene, polyamide, polycarbonate or combinations thereof. As materials, also paper, cardboard, metallic strips or :,ombinations thereof are suitable.
These release coatings according to the invention can be used in particular to produce nanoparticles, to produce pigments, for example metallic effect pigments, pigments made of TiOz, SiO;~ or other ax_ides, for lacquer coating or for producing embossed films and also for producing substrates coated in a structured manner. In the latter case, the substrate with the structured surface represents the desired product.
When a pre-structured substrate is used, a structuring of the later released particles, especially nanoparticles, occurs. Thus the structure of the particles is determined via the structure of the substrate.
The manufacture of the release coatings according to the invention comes about by the application of the release coating to a substrate by means of vacuum technology. The substrate can here be only partially coated with the release coating, in order to obtain a structured coating of the substrate with the covering layer by releasing the only partially applied release coating. The release of the release coating can also occur already inside the vacuum chamber, for example by the release coating being removed under vacuum by heating. There can also be a multiple layer construction, such that a differing number of covering layers in various regions of the substrate can then be released. The additional layers and covering layers do not necessarily have to be applied by means of vacuum technology. However it is particularly advantageous if the additional covering layers and the release coating/release coatings are vapour-deposited in the same vacuum chamber, for example by vaporisation sources disposed the one behind the other. By this means, the whole substrate coating occurs in just one operating cycle and reduced manufacturing costs ensue.
Naturally, the additional covering layers do not necessarily have to contain organic monomers but can 5 also be, as in prior art, inorganic layers such as aluminium layers or oxide layers for example. The release coating can also be provided with the covering layer by lacquering, coating or laminating, possibly several times. The coating can take place in an additional vacuum system.
As methods for applying the release coating/release coatings or the covering layer/covering layers, in addition to other methods, especially thermal vaporisation, cathode sputtering or chemical Vapour deposition (CVD) are available. The substrate can here be pre-treated with a plasma source before each individual layer is vapour-deposited, in order to improve the adherence of t:he layer to be applied on the previously applied layer.
Examples of the release coating according to the invention and examples of the method for manufacturing same are described below.
The figures show:
Fig. 1 the basic structure of a conventional vacuum strip-coating line and Fig. 2 the basic structure of a vacuum-coating system for the method according to the invention;
Fig. 3 the basic structure of a further vacuum-coating system for the method according to the invention, ~ Fig. 4 the basic structure of a further vacuum-coating system for the method according to the invention.
The vacuum-coating system according to prior art, as shown in Fig. 1, has a coating chamber 1 in which a vaporiser 2 is located. with this vaporiser 2, the material for a conventional release coating is converted into a gas phase 7. Furthermore, this conventional system has a take-off roller 4 and a take-up roller 5 for a polymer film 6. This film is guided over a coating roller 3 and thus plunges into the gas phase 7 of the material to be applied. By this means, the polymer film is coated with the release coating.
Following this coating which has taken place in the vacuum strip-coating line, the film is, for example, lacquered outside this system.
Fig. 2 shows the structure of a vacuum strip-coating line for the method according to the invention. This strip-coating line has two coating chambers 1, 1' which are separated from one another by a partition wall 10.
As on the conventional strip-coating line, two winding rollers 4, 5 are disposed in the strip-coating line, in order to wind a polymer film from the take-off roller 4 onto the take-up roller 5. The polymer film 6 is here guided over a coating roller 3, a deflection roller 9 and a coating roller 3'.
In the respective coating chambers 1, 1' is located respectively a vaporiser 2, 2'. Vaporiser 2 here vaporises melamine to produce a release coating on the polymer strip 6. Vaporiser 2' contains metals, in order to deposit a pigment layer on the film 6. The coating roller 3 is here so disposed in the proxim,_'ty of the vaporiser 2 and coating roller 3' in the proximity of vaporiser 2', that the polymer film consisting of polyethylene terephthalate (PET), guided around these coating rollers, plunges into the gas phase produced by the respective vaporisers. Between the two coating rollers 3 and 3', the polymer film is guided over a deflection roller 9.
In the vacuum strip-coating line described, the polymer film is now guided from the take-off roller 4 over the coating roller 3 and thereby provided with a melamine layer as a release coating, Via the deflection roller 9, the polymer film 6 is thF~n in turn led out of the melamine gas phase and then brought into the metallic gas phase, which is created by vaporiser 2'. There, the melamine-coated polymer film 6 is coated with metal pigments. Thereafter, the finished polymer film is wound onto the take-up roller 5.
In the method described here, as a result of the low vaporisation temperature of approximately 250°C in vaporiser 2, only low thermal stressing of the polymer film and the coating screens or partitions 10 occurs.
Furthermore, these can be cleaned of the applied melamine easily with hot water.
What is advantageous about the coated polymer film is that the release coating formed of melamine can be dissolved by dipping in hot water and that the second vapour-deposited metal pigment layer is thus released from the polymer film 6.
Fig. 3 shows an additional coating chamber for the method according to the invention, similar parts being provided with corresponding reference numerals to those in Fig. 2. The vacuum strip-coating line in Fig. 3 again has a take-off roller 4 and a take-up roller 5 for a film 6. This :Film 6 is guided around a deposition roller_ 3. To the side of and below the deposition roller 3 are disposed two deposition chambers 1, 1', with respective vaporisers 2 or 2'.
Vaporiser 2 is disposed in the region in which the film 6 is spanned between the take-up roller 4 and the deposition roller 3. By this vaporiser, melamine is applied as a release coating to the film 6. With vaporiser 2', which is located below the deposition roller 3, the foil is coated with metal pigments before it is wound again onto the take-up roller 5.
In Fig. 4 is described another principle for producing metal pigment particles b:y means of the method according to the invention. The vacuum strip-coating line of Fig. 4 is again provided with corresponding reference numerals for corresponding parts to those in Fig. 3. It has again two deposition chambers l, 1' with respectively a vaporiser 2, 2', which are both disposed around a deposition roller 3. In contrast to Fig. 3, however, herd a metal strip circulating on the deposition roller 3, or the metal roller itself is coated by the vaporisers instead of a film guided around the deposition roller_ 3. In the coating chamber 1, first the metal roller 3 or the metal strip 6 circulating on same, is coated with melamine and then in deposition chamber 1' with metal particles, such as aluminium for example. On the further periphery of the deposition roller 3 is disposed a heat source 11 and a release roller 12 and a release chamber 13. A region of the deposition roller 3 or of the circulating strip, coated on the deposition roller by vaporisers 2 and 2' with melamine and aluminium, runs during a rotation of the deposition roller 3 or of the circulating strip consequently also past the heat source and the release roller 12. The deposition roller 3 or the circulating strip is heated up to approximately 250°C by the heat source 11. Thus in the region of the heat source 11 and the release roller 12, the melamine vaporises and the aluminium applied above this melamine release coating is released from the metal roller 3 or from the metal strip 6 circulating on same. The aluminium pigment is then extracted in the release chamber 13 and removed from the vacuum charriber. Thus the region now free of melamine and aluminium on the metal roller 3 or on the metal strip 6 circulating on same is available again for vaporisation in the deposition chambers 1 and 1' with melamine and aluminium. The advantage of this method lies in the continuous operation of the system, since no exchange of take-off rollers 4 and take-up rollers 5 and roll material 6 is necessary as described in relation to Figs. 1 to 3.
Further possibilities of a device and a method as described in connection with Fig. 4 consist in the fact that the release of the vapour-deposited layers can take place in vacuum, i.e. for example the release chamber 13 is under vacuum. As release processes, apart from heating the roller 3 or the circulating strip at the corresponding point, methods are also available using electron beams, laser and/or photon radiation or infra-red radiation. The release process can also be so controlled that, before release, the quality of the vapour-deposited layers is checked by means of suitable methods and then the layers which show the desired quality features are released partially and/or in stages, e.g. in different release chambers, depending on their quality.
Claims (29)
1. Release coating vapour-deposited on a substrate by means of vacuum technology, characterised in that it consists substantially of triazines or their salts or a mixture thereof in monomer form.
2. Release coating according to the preceding claim, characterised in that it contains a 1, 3, 5-triazine or its salt or a mixture thereof.
3. Release coating according to at least one of the preceding claims, characterised in that it contains melamine, ammeline, ammelide, cyanuric acid, 2-ureidomelamine, melam, melem, melon or melamine salts such as melamine cyanurate, melamine phosphate, dimelamine pyrophosphate or melamine polyphosphate or functionalised melamine such as hexamethoxymethyl melamine or acrylate-functionalised melamine or a mixture thereof.
4. Release coating according to at least one of the preceding claims, characterised in that the substrate consists of sheet, especially web-shaped, materials such as for example films made of polymers such as for example polyester, polypropylene, polyethylene, polyamide, polycarbonate, paper, cardboard, metallic strips or combinations thereof.
5. Release coating according to at least one of the preceding claims, characterised in that the substrate is pre-structured, for example as embossed strip-form materials, for example made of metals or plastics materials, or by lacquering, for example ultraviolet-hardening lacquering.
6. Use of a release coating according to at least one of the preceding claims for producing nanoparticles, to produce pigments, for example metallic effect pigments, for lacquering or for producing embossed films.
7. Use of a release coating according to at least one of claims 1 to 5, to produce structured surfaces on a substrate.
8. Method of manufacturing a release coating according to at least one of claims 1 to 5 on a substrate, characterised in that the release coating is applied to the substrate by means of vacuum technology.
9. Method according to the preceding claim, characterised in that the substrate is only partially coated with the release coating.
10. Method according to one of claims 3 or 9, characterised in that at least one additional covering layer is applied to the release coating.
11. Method according to the preceding claim, characterised in that the at least one additional covering layer and the release coating are vapour-deposited in the same vacuum chamber.
12. Method according to at least one of the two preceding claims, characterised in that the release coating and possibly the at least one additional covering layer are vapour-deposited by thermal vaporisation, cathode sputtering or CVD.
13. Method according to at least one of the three preceding claims, characterised in that inorganic layers such as Al layers or oxide layers are vapour-deposited as additional covering layers.
14. Method according to at least one of claims 8 to 13, characterised in that the release coating is then lacquered, coated or laminated, possibly several times.
15. Method according to at least one of claims 8 to 14, characterised in that the substrate is pre-treated with a plasma source before one of the layers is vapour-deposited.
16. Method according to one of claims 8 to 15, characterised in that the release coating and possibly the additional covering layers are then released.
17. Method according to claim 16, characterised in that the release coating and the possible additional covering layers are released by heating and/or using electron beams, laser, photon radiation and/or infra-red radiation.
18. Method according to claim 16 or 17, characterised in that the release coating and possibly the additional covering layers are released in vacuum.
19. Method according to one of claims 16 to 18, characterised in that before the release of the release coating and possibly of the additional covering layers, the quality of the vapour-deposited layers is checked by means of suitable methods, and then the layers which show the desired quality features are released partially and/or in stages, for example in different release chambers, depending on their quality.
20. Method for the reversible coating of substrate with a release coating, characterised in that the substrate is coated by means of vacuum technology with a release coating formed from organic monomers and the release coating is then released by means of vacuum technology.
21. Method according to claim 20, characterised in that the release coating is vapour-deposited by thermal vaporisation, cathode sputtering or CVD.
22. Method according to one of claims 20 or 21, characterised in that by heating and/or using electron beams, laser, photon radiation and/or infra-red radiation.
23. Method according to one of claims 20 to 22, characterised in that the substrate is only partially coated with the release coating.
24. Method according to one of claims 20 to 23, characterised in that the release coating is applied and released in the same vacuum chamber.
25. Method according to one of claims 20 to 24, characterised in that before the release coating is released, at least one additional covering layer is applied to same.
26. Method according to claim 25, characterised in that that the at least one additional covering layer and the release coating are vapour-deposited in the same vacuum chamber.
27. Method according to one of claims 25 or 26, characterised in that the release coating and the at least one additional covering layer are vapour-deposited and released in the same vacuum chamber.
28. Method according to one of claims 25 to 27, characterised in that the release coating and the at least one additional covering layer are vapour-deposited by thermal vaporisation, cathode sputtering or CVD.
29. Method according to one of claims 25 to 28, characterised in that before the release of the release coating and of the at least one additional covering layer the quality of the vapour-deposited layers is checked by means of suitable methods, and then the layers which show the desired quality features are released partially and/or in stages, for example in different release chambers, depending on their quality.
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19917075 | 1999-04-15 | ||
| DE19917075.4 | 1999-04-15 | ||
| DE19933230.4 | 1999-07-15 | ||
| DE19933230A DE19933230C2 (en) | 1999-04-15 | 1999-07-15 | Release layer, process for its production and use |
| PCT/EP2000/002472 WO2000062943A1 (en) | 1999-04-15 | 2000-03-21 | Release layer, method for producing the same and its use |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA2366953A1 true CA2366953A1 (en) | 2000-10-26 |
Family
ID=26052918
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA002366953A Abandoned CA2366953A1 (en) | 1999-04-15 | 2000-03-21 | Release layer, method for producing the same and its use |
Country Status (6)
| Country | Link |
|---|---|
| EP (1) | EP1165257B1 (en) |
| JP (1) | JP2002542392A (en) |
| AT (1) | ATE245055T1 (en) |
| AU (1) | AU3813800A (en) |
| CA (1) | CA2366953A1 (en) |
| WO (1) | WO2000062943A1 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7157116B2 (en) | 2001-05-21 | 2007-01-02 | Ciba Specialty Chemicals Corporation | Method for the production of plane-parallel platelets by using organic separating agents |
| US7223472B2 (en) | 2002-03-11 | 2007-05-29 | Ciba Specialty Chemicals Corporation | Gloss pigments having high colour saturation |
| US7256425B2 (en) | 2002-02-18 | 2007-08-14 | Ciba Specialty Chemicals Corporation | Methods of producing plane-parallel structures of silicon suboxide, silicon dioxide and/or silicon carbide, plane-parallel structures obtainable by such methods, and the use thereof |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2004101662A1 (en) * | 2003-05-15 | 2004-11-25 | Dsm Ip Assets B.V. | Process for preparing a composite material |
| EP1623053A1 (en) * | 2003-05-15 | 2006-02-08 | DSM IP Assets B.V. | Process for the preparation of a composite material |
| JP2007186774A (en) * | 2006-01-16 | 2007-07-26 | Bridgestone Corp | Film-forming method and apparatus |
| JP2007186775A (en) * | 2006-01-16 | 2007-07-26 | Bridgestone Corp | Film-forming method and apparatus |
| JP4536784B2 (en) * | 2008-01-31 | 2010-09-01 | 富士フイルム株式会社 | Method for producing functional film |
| JP5081712B2 (en) * | 2008-05-02 | 2012-11-28 | 富士フイルム株式会社 | Deposition equipment |
| JP6562402B2 (en) | 2016-03-31 | 2019-08-21 | 株式会社東亜電化 | Method for forming coating on metal surface |
| CN106222613A (en) * | 2016-07-29 | 2016-12-14 | 南京凤源新材料科技有限公司 | A kind of preparation method of PET film surface evaporation micron order Al film |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0081599B1 (en) * | 1981-12-10 | 1988-02-24 | Revlon, Inc. | Process for making metallic leafing pigments |
| US6218004B1 (en) * | 1995-04-06 | 2001-04-17 | David G. Shaw | Acrylate polymer coated sheet materials and method of production thereof |
| US5811183A (en) * | 1995-04-06 | 1998-09-22 | Shaw; David G. | Acrylate polymer release coated sheet materials and method of production thereof |
| JP3162313B2 (en) * | 1997-01-20 | 2001-04-25 | 工業技術院長 | Thin film manufacturing method and thin film manufacturing apparatus |
-
2000
- 2000-03-21 AT AT00916985T patent/ATE245055T1/en not_active IP Right Cessation
- 2000-03-21 JP JP2000612071A patent/JP2002542392A/en active Pending
- 2000-03-21 WO PCT/EP2000/002472 patent/WO2000062943A1/en active IP Right Grant
- 2000-03-21 CA CA002366953A patent/CA2366953A1/en not_active Abandoned
- 2000-03-21 EP EP00916985A patent/EP1165257B1/en not_active Expired - Lifetime
- 2000-03-21 AU AU38138/00A patent/AU3813800A/en not_active Abandoned
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7157116B2 (en) | 2001-05-21 | 2007-01-02 | Ciba Specialty Chemicals Corporation | Method for the production of plane-parallel platelets by using organic separating agents |
| US7256425B2 (en) | 2002-02-18 | 2007-08-14 | Ciba Specialty Chemicals Corporation | Methods of producing plane-parallel structures of silicon suboxide, silicon dioxide and/or silicon carbide, plane-parallel structures obtainable by such methods, and the use thereof |
| US7223472B2 (en) | 2002-03-11 | 2007-05-29 | Ciba Specialty Chemicals Corporation | Gloss pigments having high colour saturation |
Also Published As
| Publication number | Publication date |
|---|---|
| AU3813800A (en) | 2000-11-02 |
| EP1165257A1 (en) | 2002-01-02 |
| EP1165257B1 (en) | 2003-07-16 |
| JP2002542392A (en) | 2002-12-10 |
| ATE245055T1 (en) | 2003-08-15 |
| WO2000062943A1 (en) | 2000-10-26 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FZDE | Discontinued | ||
| FZDE | Discontinued |
Effective date: 20060321 |