[go: up one dir, main page]

CA1162778A - Method for dry sensitization of an insulating surface and powder to be used in the method - Google Patents

Method for dry sensitization of an insulating surface and powder to be used in the method

Info

Publication number
CA1162778A
CA1162778A CA000349530A CA349530A CA1162778A CA 1162778 A CA1162778 A CA 1162778A CA 000349530 A CA000349530 A CA 000349530A CA 349530 A CA349530 A CA 349530A CA 1162778 A CA1162778 A CA 1162778A
Authority
CA
Canada
Prior art keywords
powder
substrate
compound
metal
transfer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA000349530A
Other languages
French (fr)
Inventor
Gunnar Sorensen
Leo G. Svendsen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Neselco AS
Original Assignee
Neselco AS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Neselco AS filed Critical Neselco AS
Application granted granted Critical
Publication of CA1162778A publication Critical patent/CA1162778A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
    • H05K3/181Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
    • H05K3/182Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1603Process or apparatus coating on selected surface areas
    • C23C18/1607Process or apparatus coating on selected surface areas by direct patterning
    • C23C18/1608Process or apparatus coating on selected surface areas by direct patterning from pretreatment step, i.e. selective pre-treatment
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/28Sensitising or activating
    • C23C18/285Sensitising or activating with tin based compound or composition
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03GELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G15/00Apparatus for electrographic processes using a charge pattern
    • G03G15/22Apparatus for electrographic processes using a charge pattern involving the combination of more than one step according to groups G03G13/02 - G03G13/20
    • G03G15/225Apparatus for electrographic processes using a charge pattern involving the combination of more than one step according to groups G03G13/02 - G03G13/20 using contact-printing
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03GELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G15/00Apparatus for electrographic processes using a charge pattern
    • G03G15/65Apparatus which relate to the handling of copy material
    • G03G15/6582Special processing for irreversibly adding or changing the sheet copy material characteristics or its appearance, e.g. stamping, annotation printing, punching
    • G03G15/6585Special processing for irreversibly adding or changing the sheet copy material characteristics or its appearance, e.g. stamping, annotation printing, punching by using non-standard toners, e.g. transparent toner, gloss adding devices
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05Patterning and lithography; Masks; Details of resist
    • H05K2203/0502Patterning and lithography
    • H05K2203/0517Electrographic patterning
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/12Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
    • H05K3/1266Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by electrographic or magnetographic printing
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/29Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2982Particulate matter [e.g., sphere, flake, etc.]
    • Y10T428/2991Coated
    • Y10T428/2998Coated including synthetic resin or polymer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemically Coating (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)

Abstract

ABSTRACT

A method of dry, selective sensitization of the surface of an insulating substrate for electroless deposition of a metal, wherein the transfer takes place by use of a xerographic process for transfer of a dielectric powder containing the metal compound, after which the transferred powder is exposed to treatment that will secure adherence to the surface.

Description

". 1 This invention relates to a method for dry, selective sensitization of the surface of an insulating substrate for electroless deposition of a metal, including transFer of a metal compound to the surface. The invention also relates to a powder to be used in the method.
Within electronics, it has for a long time been desirable to be able to transfer conducting materials in a prescribed pattern (selectively) with good adherence to the surface of an insulating substrate. In particular because the prescribed pattern might have details that do not touch other parts of the pattern, electroless desposition has been used. In this method there can be used for example masking of those parts of the surface which should not be metallized or/and sensitization of the parts which should be metallized. It is well known to use aqueous sensitization solutions and lately (e.g.
as described, in Danish Patent No. 132 801) pure organic solutions have been used. In the Danish Patent No.
132801 an extremely lucid exposition of the function of these solutions, together with advantages of aqueous and organic solvents, has been made.
The method where aqueous solvents are used may be summarized as follows:
(1) Immersing in a Sn solution (sensitizer), rinsing.
(2) Immersing in an activator solution (e.g. a Pd compound)~

1 18277~

rinsing.
(3) Immersing in a metallizing bath.
The method where an organic solvent is used is based upon direct transfer of, for example, Pd ions to the surface of the substrate by evaporating the organic solvent, which might have etched the surface of the substrate.
These methods have the disadvantage that the precision of the metallization is determined by the method used for transfer of the sensitized pattern. As an example can be mentioned serigraphy, where the resolution will be no better than the mesh gauge of the silk screen. Also confluency and diffluency before drying may occur. Another problem in connection with the above methods is that the adherence ln practice does not appear to be very good~ a problem which is well known from non-selective metalllzing.
The solutions of this problem are, for example9 described in SE Patent No. 350 774 (rubbing-in together with slight grinding) 7 GB Patent No. 1 324 653 (ion bombardment), and DE AS No. 1 571 802 (deposition of a binding layer prior to atomization of metal particles).
Transfer of the pattern may also be carried out by a selective desensitization by ultraviolet light, as described in the proceedings of the conference Physics in Industry i976: "New Photoimaging Processes for Industrial Use - a Link between Basic and Applied Research,"
pp. 101-105.

.

~ 1~2778 Still anothe~ method for transfer of a conduct-ing pattern to the surface of a substrate consists in el-ect~ostat~c precipitation of a masklng layer, which is a positive picture of the desired conductive pattern on an existing layer of Cu on the insulating substrate. According to U.S. Patent Nos. 2,966,429 and 2,910,351, the layer is produced ~y confluency during the melting of an electrostatically transferred thin layer of a dielectric powder. After removal by etching of the non-masked Cu layer, the conducting pattern will be left. In U.S.
Patent ~o. 2,910,351, reference is made to a photo-elec-tro-static process involving -the surface of the substrate to be covered by a photo-conducting, insulating layer.

The U.S. Patent No. 2,910,351 also describes that a dielectric powder in an ensuing partial process for electroplating with silver may be mixed with an Ag compound which, after melting-in with the dielectric powder, is reduced to metallic Ag in a bath. In this way, -the conduct-ing pattern obtained in the first partial process is covered by Ag particles, which may then be electroplated with other materials. It should be borne in mind that this partial process implies the presence of a conducting layer, in the description Cu, under the ~ 16~78 transferred and by reduc-tion created Ag particles.
~ he procedure described in the U S patent Nos.
2966429 and 2910351 is time consuming, bwt provides good results when coarse details such as printed circuits wi-th satisfactory adherence are produced. However, bo-th procedures use s-tationary "pat-tern electrodes" for the transfer of -the pattern, which makes it difficult -to alter the conductive pattern. Actually, the transfer only consists in selectively protecting parts of a laminated layer of Cu against being etched away; hence the good adherence may be ascribed to the lamination process.
~ he purpose of -the present invention is to avoid the disadvantages mentioned above and to obtain a transfer of a pattern to a surface of an insulating substrate, which is more flexible (i.e. easy to alter), and which provides a better adherence and greater possibilities of obtaining finer details than do the hitherto known procedures.
~ he present in~ention provides a method of dry, selective sensitization of the surface of an insulating substrate for elec-troless deposition of a metal, wherein the transfer takes place by use of a xerographic process for transfer of a dielec-tric powder containing -the metal compound, a~ter which the transferred powder is exposed to a treatment that will secure adherence to the surface.

':.' ~ ~L6~77~

The powder to be used in the method according to the invention may cornprise a thermoplastic plastic material with an Sn2 compound precipitated on the surface of each powder particle.
Alternatively, the powder to be used in the method according to the invention may comprise a thermoplastic plastic material with an Sn2+ compound distributed in each powder particle.
The powder to be used in the method according to the invention may be such that, when in a molten state, it wets the surface to be sensitized.
The treatment after the transfer of the powder may comprise treating the substrate and powder with an organic solvent to obtain adherence.
Alternatively, adherence between the powder and substrate surface may be obtained by melting of the substrate surface.
The powder to be used in the method according to the invention rnay contain an infrared-absorbing material.
Further the main component of the powder to be used in the method according to the invention may be a material with a large loss-angle at microwave frequencies.
What makes it possible to utilize a procedure as specified in the present invention, and which has not been known hitherto, is that it still may be advantageous --` l 162778 to use a three-step process as that described in the discussion of the prior art~ above, but it is possible to avoid the wet process at the transfer of the Sn2 com-pound ~ the sensitizing part of the process, and the subsequent selective desensi-tizing. The adherence between the Sn2+ compound and the surface of the substrate in the wet process is not overwhelmingly good, but quite surprisingly it has appeared that transfer perforrned according to the invention gives an adherence which is extremely good, i.e. that the Pd and Cu atoms transferred in the following preferred processes have a better fixation to the substrate than it has been possible to obtaln so far.
The xerographic process has appeared to be well-suited for transfer of the sensitizing Sn2 compound as it provides both a suitable coverage of the insulating substrate and a suitable resolutïon, which are normally conflicting factors. Furthermore, many of the plastic qualities used for toning powders in xerographic copying machines are well suited as regards adhesion to a large number of different substrate materials. As an example, reference is made to those mentioned in US Patent No.
2 966 429; furthermore, it will be a simple matter for the man skilled in the art to check the usability of commercially available plastic materials. Good results are obtained with such different materials as poly-7 ~ 162778 acryla-t~s, polyamides, polyvinylchlorides, and phenol resins. As usable substrate materials may be mentioned polyesters, polyacrylates, polyvinyl-chlorides, poly-carbonates, i.e. a great deal of the materials used in practical electronics.
The fixation to the surface of the insulating substrate can be partly obtained by methods which are generally well known, by powders not containing sensitizing metal cornpounds, typically by "burning down". This means that each particle of the powder is heated so that upon melting it spreads on the surface to a degree which depends on the wetting (the surface tension). According to the invention, the same demands are not made to a pore-free confluencing that are made in the procedures that are based on using the layer obtained as a mask prior to etching. This is probably connected with the sensitizing mechanism which, rather than demanding an even surface as a basis for the subsequent electro-less metal deposition, uses the metal-compound particles deposited on the surface as a seed. This means that the demands on the adherence are greater than the demands on the spreading.
With a view to obtaining a local heating of the transferred particles, materials have been added to them which absorb the energy radiati~n, the wavelength of which depends on the application and combination of '' f g 16~778 substrate/powder. In cases where the powder rnaterial is not thermoplastic, it will be expedient to let each powder particle heat the surface of the substrate in its area of contact, and a suitable choice of softening temperature for the substrate will make possible a melting-down in this case. This rnethod is just a special case of the method which consists in heating all the surface to the melting point.
In circumstances where heating is not desirable, fixation can be made by letting the powder on the substrate pass an atmosphere with a suitable vapour pressure of an organic solvent which, in the well-known way, makes the substrate and the particles stick to one another, and subsequently evaporate the solvent.
There are several ways of produ!cing the prepared powders used according to the invention. The methods used so far have all had the purpose of ensuring that each powder particle, at least on its surface, has had a reasonably even distribution of Sn2~ compounds. This can be obtained in two principally different ways:
- either directly by impregnating the surface of each particle, or by producing a solid mass aiming at an even distribution of the sensitizing compound in the plastics material which is subsequently pulverized in the usual way to obtain a suitable size of the particles.
This size is determined by the construction of the .

~ ~2~78 .

xerographic transfer apparatus and is a well-~nown technique.
The invention will be further described with reference to the following illustrative Examples.
Example 1 Production of a sensitizing plastic powder, aiming at an even distribution of tin compounds in the material:
To 10 g of a plastic material is added 0.05 - 0.5 g of SnC12, 2H20.
This mixture can be wet or dry-ground in an aqueous or organic liquid. Then the liquid may be removed by a conventional drying technique, e.g. evaporation, filtration, or spray-drying.
Impregnation of the individual plastic par~ticles with a tin compound may, according to the invention, use as its starting point already existing powdersj but may also be done at the production of the plastic powder.
A more appropriate way of obtaining the desired distribution of tin in the single plastic particle is to do it during the production of the powder. This can, for example, be achieved by atomizer-drying (spray -drying) the plastic-containing solution, which also contains a tin compound. I
Since certain Sn compounds, e.g. SnC12, 2H20, are soluble in organic solvents, it is possible to ~ 162778 o influence the powder particles individually by a solvent, which makes the particles quell and hence absorb the tin compounds which are dissolved in the organic solvent. Evaporation of the solvent creates the desired distribution of SnC12, 2H20.
Example 2 A plastic powder, which quells when an organic solvent is used, is suspended in such a solvént, to which is added a saturated solution of SnC12~ 2H20 in methanol without precipitation of tin compounds. After a certain time of reaction, the solvent can be removed by, e.g., filtering or spray-drying of the suspension, which now contains the prepared powder. The quantity of tin to be added depends very much on the combination of plastic material and solvent and their relative volumes and also on the method of drying of the powder. In so far as the plastic material can be completely dissolved in an organic solvent, a tin compound, also in an organic solvent, may be added. Then the prepared powder can be obtained by a conventional process of drying, e~g. by spray-drying of the plastic-containing solution.
Another method, which has been successfully used, is a chemical precipitation of an Sn compound on the powder particles during continuous stirring.
Example 3 Precipitation of a tin compound on each plastic particle.

. .

1 16~778 10 g of a plastic powder is suspended in 200 ml of methanol.
While stirring, a saturated solution of SnC12, 2H20 in methanol is added~ the quantity depending on the size of the powder particles. The weight of the SnC12, 2H20 may be, for example, 1-10% of that of the plastic powder. While stirring an alkaline agent is added, causing the suspended plastic powder to work as a scavenger for the precipitation of hydroxytin-chlorides. The powder prepared in this way can then then be dried, and if necessary ground and sieved.
By the development of the method, according to the invention, sensitization of an insulating surface has been obtained with a view to a subsequent electro-less metallization, performed by known methods, without demanding preceding special matters or masks~ as any pattern which can be copied by a xerographic process can be transferred to the desired substrate surface. The method does not put heavy demands on resources nor is it detrimental to the enviroment, as etching-off of the superfluous metal layer is avoided. Furthermore, the metal layer transferred by electroless metallization has a much better adherence to the surface of the substrate (e.g. as measured by the Scotch-Tape method) than layers of the same thickness, which have been transferred by conventional electroless deposition or by evaporation or vpd methods (vpd: vapour-phase deposition). In , J
., addition, the present method makes much less demands on -the cleaning of the surface of the substrate prior to metallization than do the methods rnentioned above.

Claims (8)

THE EMBODIMENTS OF THE INVENTION IN WHICH AN EXCLUSIVE
PROPERTY OR PRIVILEGE IS CLAIMED ARE DEFINED AS FOLLOWS:
1. A method for the dry, selective sensitization of the surface of an insulating substrate and subsequent electroless deposition of a metal, comprising: xerographic-ally depositing a dielectric powder containing a metal compound on an insulator substrate in a desired pattern;
fixing said deposited powder on the surface of said sub-strates; and electrolessly depositing a conductive metal from solution onto the pattern defined by said xerographic-ally deposited powder.
2. A method as claimed in claim 1, wherein said fixing comprises treating the substrate and the powder with an organic solvent to obtain adherence.
3. A method as claimed in claim 1, wherein said fixing comprises melting the substrate surface to obtain adherence between the substrate surface and the powder.
4. A method as claimed in claim 1, wherein the powder comprises a thermoplastic material with an Sn2+
compound precipitated on the surface of each powder particle.
5. A method as claimed in claim 1, wherein the powder comprises a thermoplastic material with an Sn2+
compound distributed in each powder particle.
6. A method as claimed in claim 1, wherein the powder is such that, when in a molten state, it wets the surface to be sensitized.
7. A method as claimed in claim 1, wherein the powder contains an infrared-absorbing material.
8. A method as claimed in claim 1, wherein the powder is a material with a large loss-angle at microwave frequencies.
CA000349530A 1979-04-11 1980-04-10 Method for dry sensitization of an insulating surface and powder to be used in the method Expired CA1162778A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DK150779A DK153337C (en) 1979-04-11 1979-04-11 PROCEDURES FOR TRANS-SENSITIZATION OF AN INSULATING SURFACE
DK1507/79 1979-04-11

Publications (1)

Publication Number Publication Date
CA1162778A true CA1162778A (en) 1984-02-28

Family

ID=8105559

Family Applications (1)

Application Number Title Priority Date Filing Date
CA000349530A Expired CA1162778A (en) 1979-04-11 1980-04-10 Method for dry sensitization of an insulating surface and powder to be used in the method

Country Status (12)

Country Link
US (1) US4504529A (en)
EP (1) EP0026211B1 (en)
JP (1) JPH0210593B2 (en)
CA (1) CA1162778A (en)
DE (1) DE3067809D1 (en)
DK (1) DK153337C (en)
IE (1) IE49192B1 (en)
IL (1) IL59807A (en)
IT (1) IT1128410B (en)
NO (1) NO154370C (en)
WO (1) WO1980002222A1 (en)
ZA (1) ZA802121B (en)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DK427780A (en) * 1980-10-10 1982-04-11 Neselco As POWDER USED BY THROTTLE SENSIBILIZATION FOR CURRENT METALLIZATION
DK148327C (en) * 1981-07-24 1985-11-04 Neselco As POWDER USED BY THROTTLE SENSIBILIZATION FOR CURRENT METALLIZATION
DE3134507A1 (en) * 1981-09-01 1983-03-17 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Process for selective chemical metal deposition
DK153572C (en) * 1982-02-18 1988-12-19 Platonec Aps POWDER USED BY TWO ACTIVATION FOR POWERFUL METALLIZATION, PROCEDURE FOR PREPARING THEREOF AND USE THEREOF
IT1184408B (en) * 1985-04-09 1987-10-28 Telettra Lab Telefon Forming printed circuit boards
US5244525A (en) * 1987-11-02 1993-09-14 Kimberly-Clark Corporation Methods for bonding, cutting and printing polymeric materials using xerographic printing of IR absorbing material
US4851320A (en) * 1988-05-23 1989-07-25 Tektronix, Inc. Method of forming a pattern of conductor runs on a dielectric sheet
US5213850A (en) * 1989-03-24 1993-05-25 Nippon Paint Co., Ltd. Process for plating a metallic deposit between functional pattern lines on a substrate
JP3266633B2 (en) 1990-11-19 2002-03-18 ロクタイト.コーポレイション Photocurable silicone composition
US5269980A (en) * 1991-08-05 1993-12-14 Northeastern University Production of polymer particles in powder form using an atomization technique
DE4142658A1 (en) * 1991-12-19 1993-06-24 Siemens Ag Deposition of solder pattern on circuit boards - applying charge drum collecting pattern of soldered powder particles for transfer to board.
US5304447A (en) * 1992-02-11 1994-04-19 Elf Technologies, Inc. Plateable toner and method for producing the same
DE4319759A1 (en) * 1993-06-15 1994-12-22 Bayer Ag Powder mixtures for metallizing substrate surfaces
DE19731346C2 (en) * 1997-06-06 2003-09-25 Lpkf Laser & Electronics Ag Conductor structures and a method for their production
DE19942054A1 (en) * 1999-09-03 2001-12-06 Schott Glas Printing agent comprises a two component toner made of charge controlling particles and support materials
CN1539028A (en) * 2001-06-04 2004-10-20 ���ڵٿ����޹�˾ Patterning method
GB2381274A (en) * 2001-10-29 2003-04-30 Qinetiq Ltd High resolution patterning method
GB2382798A (en) * 2001-12-04 2003-06-11 Qinetiq Ltd Inkjet printer which deposits at least two fluids on a substrate such that the fluids react chemically to form a product thereon
US20040265531A1 (en) * 2003-06-30 2004-12-30 Mckean Dennis R. Sliders bonded by a debondable silicon-based encapsulant
EP2003939A1 (en) * 2007-06-14 2008-12-17 Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO Method for preparing a pattern for a 3-dimensional electric circuit
KR20120127599A (en) * 2010-01-14 2012-11-22 더 리젠츠 오브 더 유니버시티 오브 캘리포니아 A universal solution for growing thin films of electrically conductive nanostructures
CA2887556C (en) 2012-10-12 2021-01-12 The Regents Of The University Of California Polyaniline membranes with increased hydrophilicity
ES2893539T3 (en) 2013-05-15 2022-02-09 Univ California Polyaniline membranes formed by phase inversion for forward osmosis applications
BR112016023415B1 (en) 2014-04-08 2022-03-03 The Regents Of The University Of California Membrane filtration and its production method, polymer and method for water purification

Family Cites Families (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB299903A (en) * 1927-08-02 1928-11-02 Albert Ivan Gates Warren Improvements in processes for coating non-conducting substances with metals
GB567503A (en) * 1943-06-02 1945-02-16 Frank Enoch Kerridge Improvements in or relating to the production of metallic designs on non-metallic materials
US2910351A (en) * 1955-01-03 1959-10-27 Gen Electric Method of making printed circuit
US2947625A (en) * 1955-12-21 1960-08-02 Ibm Method of manufacturing printed circuits
US2966429A (en) * 1956-08-31 1960-12-27 Gen Electric Method of and apparatus for making printed circuits
US3043685A (en) * 1957-07-18 1962-07-10 Xerox Corp Xerographic and magnetic image recording and reproducing
US2939804A (en) * 1958-01-23 1960-06-07 Uarco Inc Resin particle coated with metal
NL241541A (en) * 1959-07-22
US3231374A (en) * 1960-09-02 1966-01-25 Rca Corp Methods for preparing etch resists using an electrostatic image developer composition
US3275436A (en) * 1962-07-24 1966-09-27 Xerox Corp Method of image reproduction utilizing a uniform releasable surface film
US3226256A (en) * 1963-01-02 1965-12-28 Jr Frederick W Schneble Method of making printed circuits
US3350202A (en) * 1964-10-27 1967-10-31 Union Carbide Corp Method of xerographically photosensitizing planographic printing plates
GB1175832A (en) * 1965-10-12 1969-12-23 Emi Ltd Improvements relating to the production of an Electrical Conductor Adhering to an Insulating Support
US3494790A (en) * 1965-10-29 1970-02-10 Texas Instruments Inc Preparation of welding surfaces on semiconductors
US3942983A (en) * 1967-06-09 1976-03-09 Minnesota Mining And Manufacturing Company Electroless deposition of a non-noble metal on light generated nuclei of a metal more noble than silver
FR1593570A (en) * 1967-09-14 1970-06-01
NL157659B (en) * 1967-09-22 1978-08-15 Philips Nv PROCEDURE FOR THE MANUFACTURE OF ELECTRICALLY CONDUCTIVE COPPER PATTERNS BY A PHOTOGRAPHIC ROAD.
NL6808469A (en) * 1968-06-15 1969-12-17
CA929705A (en) * 1969-01-13 1973-07-10 Ransburg Corporation Deposition materials and methods
US3691993A (en) * 1970-11-23 1972-09-19 Ibm Apparatus for transferring developed image
US3785983A (en) * 1970-12-02 1974-01-15 Minolta Camera Kk Method of producing a liquid developer for use in the electronic photography
US3745045A (en) * 1971-01-06 1973-07-10 R Brenneman Electrical contact surface using an ink containing a plating catalyst
US3880689A (en) * 1971-09-30 1975-04-29 Eastman Kodak Co Magnetic developer containing an electroless plating sensitizer, and method of using same
BE789988A (en) * 1971-10-12 1973-04-12 Xerox Corp COMPOSITION OF DEVELOPER AND METHOD FOR ITS USE
CA986770A (en) * 1972-04-10 1976-04-06 Jack C. Goldfrank Pressure fixable magnetic toners
JPS511434B2 (en) * 1972-05-15 1976-01-17
JPS5187042A (en) * 1975-01-29 1976-07-30 Hitachi Metals Ltd
JPS5196330A (en) * 1975-02-21 1976-08-24
US4042730A (en) * 1976-03-29 1977-08-16 Bell Telephone Laboratories, Incorporated Process for electroless plating using separate sensitization and activation steps
JPS5841760B2 (en) * 1976-05-29 1983-09-14 神崎製紙株式会社 Manufacturing method of coloring agent
NL7704238A (en) * 1977-04-19 1978-10-23 Philips Nv PROCEDURE FOR ADDITIVE MANUFACTURE OF WIRING PATTERNS.
US4307168A (en) * 1977-05-05 1981-12-22 Eastman Kodak Company Amplification of developed electrographic image patterns
JPS54126959A (en) * 1978-03-25 1979-10-02 Nippon Mektron Kk Method of producing circuit board

Also Published As

Publication number Publication date
IT8067559A0 (en) 1980-04-10
NO154370C (en) 1986-09-03
IT1128410B (en) 1986-05-28
IE49192B1 (en) 1985-08-21
WO1980002222A1 (en) 1980-10-16
ZA802121B (en) 1981-04-29
EP0026211A1 (en) 1981-04-08
EP0026211B1 (en) 1984-05-16
IL59807A (en) 1983-11-30
IE800732L (en) 1980-10-11
JPS56500435A (en) 1981-04-02
NO154370B (en) 1986-05-26
NO803710L (en) 1980-12-09
DK153337B (en) 1988-07-04
US4504529A (en) 1985-03-12
DE3067809D1 (en) 1984-06-20
DK153337C (en) 1988-11-14
JPH0210593B2 (en) 1990-03-08
DK150779A (en) 1980-10-12

Similar Documents

Publication Publication Date Title
CA1162778A (en) Method for dry sensitization of an insulating surface and powder to be used in the method
US4248921A (en) Method for the production of electrically conductive and solderable structures and resulting articles
US5055321A (en) Adhesive for electroless plating, printed circuit boards and method of producing the same
KR100325790B1 (en) Conductor track structures, and method for producing the same
EP0328944B1 (en) Conditioning a non-conductive substrate for subsequent selective deposition of a metal thereon
US4756756A (en) Forming of thick-layer, hybrid electronic printed circuits
CA1282367C (en) Glow discharge metal deposition on non-conductor from organometallic compound
EP0180101B1 (en) Deposition of patterns using laser ablation
US4718972A (en) Method of removing seed particles from circuit board substrate surface
DE1925760A1 (en) Process for making patterned metal thin films
US4039698A (en) Method for making patterned platinum metallization
US3791340A (en) Method of depositing a metal pattern on a surface
JPH0326816B2 (en)
US6265075B1 (en) Circuitized semiconductor structure and method for producing such
US3619285A (en) Method of making a patterned metal film article
EP0048992B1 (en) Printed circuit board and method for fabricating the same
US3674485A (en) Method of manufacturing electrically conducting metal layers
US5158657A (en) Circuit substrate and process for its production
EP0163089B1 (en) Process for activating a substrate for electroless deposition of a conductive metal
JPH0454399B2 (en)
US20020051944A1 (en) Pattern forming method of forming a metallic pattern on a surface of a circuit board by electroless plating
US3928663A (en) Modified hectorite for electroless plating
CA1082817A (en) Method of depositing metal conducting patterns on large area surfaces
CA1062071A (en) Method of manufacturing an external electrically conducting metal pattern
US4084968A (en) Method of manufacturing electrically conductive metal layers on substrates

Legal Events

Date Code Title Description
MKEX Expiry