CA1054905A - Method of etching apertures in a thin metal foil - Google Patents
Method of etching apertures in a thin metal foilInfo
- Publication number
- CA1054905A CA1054905A CA243,150A CA243150A CA1054905A CA 1054905 A CA1054905 A CA 1054905A CA 243150 A CA243150 A CA 243150A CA 1054905 A CA1054905 A CA 1054905A
- Authority
- CA
- Canada
- Prior art keywords
- foil
- apertures
- etchant
- covered
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/02—Manufacture of electrodes or electrode systems
- H01J9/14—Manufacture of electrodes or electrode systems of non-emitting electrodes
- H01J9/142—Manufacture of electrodes or electrode systems of non-emitting electrodes of shadow-masks for colour television tubes
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/02—Local etching
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- ing And Chemical Polishing (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
Abstract
ABSTRACT:
A method of etching apertures in a thin metal foil. The foil is first covered on both sides with etchant-resistant layers which have the desir-ed pattern of apertures. One of the said layers is covered with a continuous protective layer. First, the side not covered with a protective layer is etched. The protective layer is then removed by means of a solvent, and then the other side is etched. According to the invention, the protective layer consists of a waxy hydrocarbon and the solvent consists of perchloroethylene.
A method of etching apertures in a thin metal foil. The foil is first covered on both sides with etchant-resistant layers which have the desir-ed pattern of apertures. One of the said layers is covered with a continuous protective layer. First, the side not covered with a protective layer is etched. The protective layer is then removed by means of a solvent, and then the other side is etched. According to the invention, the protective layer consists of a waxy hydrocarbon and the solvent consists of perchloroethylene.
Description
P~IN 7 BKS/R~1
2~.3.75 ~6~5~
"Method o:f etching apertures in a thin metal foil'i.
.
The invention relates to a method of etch-ing aper-tures in a thin me-tal foil, ~l~ich.l~e-th~:ithQi.foil is .~ covered on both sides with an etchan-t-resistant layer having a desired pattern of apertures, a ; 5 first of the two sides of the foil is then covered with a continuous covering layer~which is also s-tchant-resistant, then the foil is treated with an etchant to form cavities on the second side of the foil which is not covered w:ith ths said cover-ing layer, the covering layer is then removed with ~-a solvelLt after which the foil is treated with an etchant to forrn cavities on the first side of the foil irl such a manner that the caviti~s on both : .sides form contlnuous apertures in the foil.
- -Such a method is known from United States Patent Speclfication 2,750,524 and is used, for ~ample,: for etching apertures in a metal foil :.:
used in the manufacture of a shad~pw mask for a dis- .
play tube for colour tele~vision. In order to snsure that the apertures have -the desired profils, in the kno~n method ons of the two ~ldes is first subjeot-cd to an init:ial etching trsa-tment - a covering layer beil1~ present on the other side - succeeded by etching the aper-tur.es through frorll said other ', ~ ' , - . ' , ': , , ' , , , PIIN. 7874.
sicle.
In the known method it i5 difficult both `. to ~ind a suitable composition for the covering layer O which is provided on the first side o~ the foil~and to '~ 5 find a suitable solvent for the said covering layer.
~, The apertured etchant-resis-tant layer rnust not be , .
attached either by the covering layer or by the solYent for the said covering layer. The aperture~ etchant-7, resistant generally consists of photosensitive fish glu0 which prior to 0xposure to light is water~soluble and after exposure to light and ba~ing can be removed by sodium hydroxide solution.
It is the object o~ the invention to pro-~` vide a covering layer and a solv0nt ~or the covering '~ 15 layer which can be used in partiGular in combination with a layer of ~ish glueO
: ~ For tha-t purpose~ according to the invention ;the covering layor ~hould consist of a waxy hydrooarbon j~ ~ and the solvent should consist of p0rchloroethylene.
Experiments with a.large number of~ substances j for the covering lay0r hav0 demonstrated that a wa~y hydrocarbon and perchloroethylene ls the best combina-tion of covering lay0r and solvent for the covering layer.
. It was o:~ particular importance that the covering layer j 25 could be remov0d withou-t leaving any r0sidues, since otherwise on0 or more o~ the apertures in the pattern of a.pertures rnay get clogged, .: . .
_ 3 _ . .
,' , '', ,' ' ' .
, PHN. 7874.
10-1975.
The invcntion wlll now be de.scribed in greater detail with reference to the accompanying dra~ing, in which each Figure shows a part of a I metal foil in successive stages of a meth~d of e-tch-c 5 ing apertures in it.
In Figure 1~ the metal foil 1 bears two la-yers 2 and 3 which are etchant-resistant and in :~ each of which a pattern of apertures 3 for example 7 i 4, 5, 6 and 7 respectively have been produced. The apertures 4 and 6 make a pair, as do the aper-tures 1 5 and 7. The layers 2 and 3 consi.st of fish glue in j which the apertures 4, 5, 6 and 7 have been produced by mQans of a kno~n pho-togra.phic method.
i ~ In Figure 2, the layer 2 is covered with a layer 8.which also covers the apertures 4 and 5.
The layer 8 consists of a waxy hydrocarbon which does . 1~ ~ - .
not attack the fisll glue layer 2 and is provided by ~ mearls o~ a ~solution of 16 kg "Apiezon" wax in 100 l j ~ .of perchloroethylene "Apiezonl' is -the trademark of .: 20 . Apiezon Products Ltd.~in England for l~axy hydrocarbons.
The wax used ma~ be) for example, of -the type Apiezon 1~.
: ~ An etchan-t is then sprayed against the - foil 1 with the layers 2, 3 and 8, and7 as is shown in Fieure 3, the cavities 9 and 10 are etched in : 25 the foiJ 1 v:La the apertures 6 and 7 in the layer 3.
The depth of the cavities g and lO is approxima-tely 2/3 of the thicklless ~approxlmately 0 150 mm th:ick) . . . .
PMN. 787~.
,~ . .
of the fo~l 1.
As is shown in Figure 4, the layer 8 is then removed f`rom the layer 2 and from the apertures 4 and 5 by means of a solvent. The said solvent is again perchloroethylene whic'h dissolves the waxy hydrocarbon without leaving a residue but which does not attack
"Method o:f etching apertures in a thin metal foil'i.
.
The invention relates to a method of etch-ing aper-tures in a thin me-tal foil, ~l~ich.l~e-th~:ithQi.foil is .~ covered on both sides with an etchan-t-resistant layer having a desired pattern of apertures, a ; 5 first of the two sides of the foil is then covered with a continuous covering layer~which is also s-tchant-resistant, then the foil is treated with an etchant to form cavities on the second side of the foil which is not covered w:ith ths said cover-ing layer, the covering layer is then removed with ~-a solvelLt after which the foil is treated with an etchant to forrn cavities on the first side of the foil irl such a manner that the caviti~s on both : .sides form contlnuous apertures in the foil.
- -Such a method is known from United States Patent Speclfication 2,750,524 and is used, for ~ample,: for etching apertures in a metal foil :.:
used in the manufacture of a shad~pw mask for a dis- .
play tube for colour tele~vision. In order to snsure that the apertures have -the desired profils, in the kno~n method ons of the two ~ldes is first subjeot-cd to an init:ial etching trsa-tment - a covering layer beil1~ present on the other side - succeeded by etching the aper-tur.es through frorll said other ', ~ ' , - . ' , ': , , ' , , , PIIN. 7874.
sicle.
In the known method it i5 difficult both `. to ~ind a suitable composition for the covering layer O which is provided on the first side o~ the foil~and to '~ 5 find a suitable solvent for the said covering layer.
~, The apertured etchant-resis-tant layer rnust not be , .
attached either by the covering layer or by the solYent for the said covering layer. The aperture~ etchant-7, resistant generally consists of photosensitive fish glu0 which prior to 0xposure to light is water~soluble and after exposure to light and ba~ing can be removed by sodium hydroxide solution.
It is the object o~ the invention to pro-~` vide a covering layer and a solv0nt ~or the covering '~ 15 layer which can be used in partiGular in combination with a layer of ~ish glueO
: ~ For tha-t purpose~ according to the invention ;the covering layor ~hould consist of a waxy hydrooarbon j~ ~ and the solvent should consist of p0rchloroethylene.
Experiments with a.large number of~ substances j for the covering lay0r hav0 demonstrated that a wa~y hydrocarbon and perchloroethylene ls the best combina-tion of covering lay0r and solvent for the covering layer.
. It was o:~ particular importance that the covering layer j 25 could be remov0d withou-t leaving any r0sidues, since otherwise on0 or more o~ the apertures in the pattern of a.pertures rnay get clogged, .: . .
_ 3 _ . .
,' , '', ,' ' ' .
, PHN. 7874.
10-1975.
The invcntion wlll now be de.scribed in greater detail with reference to the accompanying dra~ing, in which each Figure shows a part of a I metal foil in successive stages of a meth~d of e-tch-c 5 ing apertures in it.
In Figure 1~ the metal foil 1 bears two la-yers 2 and 3 which are etchant-resistant and in :~ each of which a pattern of apertures 3 for example 7 i 4, 5, 6 and 7 respectively have been produced. The apertures 4 and 6 make a pair, as do the aper-tures 1 5 and 7. The layers 2 and 3 consi.st of fish glue in j which the apertures 4, 5, 6 and 7 have been produced by mQans of a kno~n pho-togra.phic method.
i ~ In Figure 2, the layer 2 is covered with a layer 8.which also covers the apertures 4 and 5.
The layer 8 consists of a waxy hydrocarbon which does . 1~ ~ - .
not attack the fisll glue layer 2 and is provided by ~ mearls o~ a ~solution of 16 kg "Apiezon" wax in 100 l j ~ .of perchloroethylene "Apiezonl' is -the trademark of .: 20 . Apiezon Products Ltd.~in England for l~axy hydrocarbons.
The wax used ma~ be) for example, of -the type Apiezon 1~.
: ~ An etchan-t is then sprayed against the - foil 1 with the layers 2, 3 and 8, and7 as is shown in Fieure 3, the cavities 9 and 10 are etched in : 25 the foiJ 1 v:La the apertures 6 and 7 in the layer 3.
The depth of the cavities g and lO is approxima-tely 2/3 of the thicklless ~approxlmately 0 150 mm th:ick) . . . .
PMN. 787~.
,~ . .
of the fo~l 1.
As is shown in Figure 4, the layer 8 is then removed f`rom the layer 2 and from the apertures 4 and 5 by means of a solvent. The said solvent is again perchloroethylene whic'h dissolves the waxy hydrocarbon without leaving a residue but which does not attack
3 the fish glue of the layers, 2 and 3.
¦ Etchant is -then spra~ed against the foil so that the cavities 11 and 12 are etched in the foil via the apertures 4 and 5 as is shown in Fi~re 5. ..
The cavities 9 and 10 are also slightl~ enlarged . by this etching treatment. The cavities 11 and 12 '' i : ~ debouch :into -the cavlties 9 and 10, respectivelyO
After remo~ing the layers 2 and 3 b~ means of sodium hydroxide solu-tion, the ~oil then comprises : the apertures 13 and 14 shown in Figure 6 which have the requlred shape, ~or example~ narrow on the side on which the electron impinge in an operating shadow, ~ mask tube, a.nd wide on the screen side o~ the tubeO
"~, : 20 . ~ . .
:, . , , :
~ ~ , .
.
.
.
-,5 ~~
,
¦ Etchant is -then spra~ed against the foil so that the cavities 11 and 12 are etched in the foil via the apertures 4 and 5 as is shown in Fi~re 5. ..
The cavities 9 and 10 are also slightl~ enlarged . by this etching treatment. The cavities 11 and 12 '' i : ~ debouch :into -the cavlties 9 and 10, respectivelyO
After remo~ing the layers 2 and 3 b~ means of sodium hydroxide solu-tion, the ~oil then comprises : the apertures 13 and 14 shown in Figure 6 which have the requlred shape, ~or example~ narrow on the side on which the electron impinge in an operating shadow, ~ mask tube, a.nd wide on the screen side o~ the tubeO
"~, : 20 . ~ . .
:, . , , :
~ ~ , .
.
.
.
-,5 ~~
,
Claims
PROPERTY OR PRIVILEGE IS CLAIMED ARE DEFINED AS FOLLOWS:
1. A method of etching apertures in a thin metal foil, in which method each side of the foil is covered with an etchant-resistant layer of fish glue having a desired pattern of apertures, a first of the two sides of the foil is then covered with a continuous covering layer which is also etchant-resistant, then the foil is treated with an etchant to form cavities on the second side of the foil which is not covered with the said covering layer, the covering layer is then removed by means of a solvent, after which the foil is treated with an etchant to form cavities on the first side of the foil in such a manner that the cavities on both sides form continuous apertures in the foil, character-ized in that the covering layer consists of a waxy hydrocarbon and the solvent consists of perchloro-ethylene.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL7500247A NL7500247A (en) | 1975-01-09 | 1975-01-09 | METHOD OF ETCHING HOLES IN A THIN METAL BAND. |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA1054905A true CA1054905A (en) | 1979-05-22 |
Family
ID=19822960
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA243,150A Expired CA1054905A (en) | 1975-01-09 | 1976-01-08 | Method of etching apertures in a thin metal foil |
Country Status (10)
| Country | Link |
|---|---|
| JP (1) | JPS5536268B2 (en) |
| AU (1) | AU503706B2 (en) |
| BE (1) | BE837377A (en) |
| BR (1) | BR7600036A (en) |
| CA (1) | CA1054905A (en) |
| ES (1) | ES444114A1 (en) |
| FR (1) | FR2297258A1 (en) |
| GB (1) | GB1480323A (en) |
| IT (1) | IT1055737B (en) |
| NL (1) | NL7500247A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56139676A (en) * | 1980-04-02 | 1981-10-31 | Toshiba Corp | Method and apparatus for etching metal sheet |
| JPS6023515A (en) * | 1983-07-18 | 1985-02-06 | Nitto Kasen Kogyo Kk | Closing device for sidewise-opening gate |
| US5348825A (en) * | 1991-07-02 | 1994-09-20 | Dai Nippon Printing Co., Ltd. | Method for manufacturing shadow mask and shadow mask manufactured by said method |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2750524A (en) * | 1951-11-15 | 1956-06-12 | Mergenthaler Linotype Gmbh | Perforate mask for multicolor television apparatus and method of producting same |
| US3679500A (en) * | 1970-08-07 | 1972-07-25 | Dainippon Screen Mfg | Method for forming perforations in metal sheets by etching |
-
1975
- 1975-01-09 NL NL7500247A patent/NL7500247A/en unknown
-
1976
- 1976-01-05 IT IT6701076A patent/IT1055737B/en active
- 1976-01-05 AU AU10015/76A patent/AU503706B2/en not_active Expired
- 1976-01-06 BR BR7600036A patent/BR7600036A/en unknown
- 1976-01-06 GB GB32876A patent/GB1480323A/en not_active Expired
- 1976-01-07 JP JP133876A patent/JPS5536268B2/ja not_active Expired
- 1976-01-07 ES ES444114A patent/ES444114A1/en not_active Expired
- 1976-01-07 BE BE163368A patent/BE837377A/en unknown
- 1976-01-08 CA CA243,150A patent/CA1054905A/en not_active Expired
- 1976-01-09 FR FR7600398A patent/FR2297258A1/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| GB1480323A (en) | 1977-07-20 |
| AU503706B2 (en) | 1979-09-13 |
| IT1055737B (en) | 1982-01-11 |
| FR2297258B1 (en) | 1980-03-21 |
| NL7500247A (en) | 1976-07-13 |
| FR2297258A1 (en) | 1976-08-06 |
| BR7600036A (en) | 1976-08-03 |
| JPS5193739A (en) | 1976-08-17 |
| AU1001576A (en) | 1977-07-14 |
| DE2558335A1 (en) | 1976-07-15 |
| BE837377A (en) | 1976-07-07 |
| DE2558335B2 (en) | 1976-12-23 |
| JPS5536268B2 (en) | 1980-09-19 |
| ES444114A1 (en) | 1977-04-16 |
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