CA1017988A - Unit power optical projection and scanning photographic exposure apparatus - Google Patents
Unit power optical projection and scanning photographic exposure apparatusInfo
- Publication number
- CA1017988A CA1017988A CA260,881A CA260881A CA1017988A CA 1017988 A CA1017988 A CA 1017988A CA 260881 A CA260881 A CA 260881A CA 1017988 A CA1017988 A CA 1017988A
- Authority
- CA
- Canada
- Prior art keywords
- exposure apparatus
- unit power
- optical projection
- power optical
- photographic exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CA260,881A CA1017988A (en) | 1973-03-09 | 1976-09-10 | Unit power optical projection and scanning photographic exposure apparatus |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US33986073A | 1973-03-09 | 1973-03-09 | |
| CA260,881A CA1017988A (en) | 1973-03-09 | 1976-09-10 | Unit power optical projection and scanning photographic exposure apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA1017988A true CA1017988A (en) | 1977-09-27 |
Family
ID=25668362
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA260,881A Expired CA1017988A (en) | 1973-03-09 | 1976-09-10 | Unit power optical projection and scanning photographic exposure apparatus |
Country Status (1)
| Country | Link |
|---|---|
| CA (1) | CA1017988A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112684657A (en) * | 2020-12-24 | 2021-04-20 | 四川长虹电器股份有限公司 | Method for collimating solid-state light-emitting chip or chip array light source |
-
1976
- 1976-09-10 CA CA260,881A patent/CA1017988A/en not_active Expired
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112684657A (en) * | 2020-12-24 | 2021-04-20 | 四川长虹电器股份有限公司 | Method for collimating solid-state light-emitting chip or chip array light source |
| CN112684657B (en) * | 2020-12-24 | 2022-02-01 | 四川长虹电器股份有限公司 | Method for collimating solid-state light-emitting chip or chip array light source |
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