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BR9602141A - Composição polimerizável e processo para produzir composição polimerizável - Google Patents

Composição polimerizável e processo para produzir composição polimerizável

Info

Publication number
BR9602141A
BR9602141A BR9602141A BR9602141A BR9602141A BR 9602141 A BR9602141 A BR 9602141A BR 9602141 A BR9602141 A BR 9602141A BR 9602141 A BR9602141 A BR 9602141A BR 9602141 A BR9602141 A BR 9602141A
Authority
BR
Brazil
Prior art keywords
polymerizable composition
producing
composition
producing polymerizable
polymerizable
Prior art date
Application number
BR9602141A
Other languages
English (en)
Inventor
Wojciech A Wilczak
Original Assignee
Hoechst Celanese Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=23728891&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=BR9602141(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Hoechst Celanese Corp filed Critical Hoechst Celanese Corp
Publication of BR9602141A publication Critical patent/BR9602141A/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F3/00—Colour separation; Correction of tonal value
    • G03F3/10—Checking the colour or tonal value of separation negatives or positives
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/12—Esters of monohydric alcohols or phenols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F257/00—Macromolecular compounds obtained by polymerising monomers on to polymers of aromatic monomers as defined in group C08F12/00
    • C08F257/02—Macromolecular compounds obtained by polymerising monomers on to polymers of aromatic monomers as defined in group C08F12/00 on to polymers of styrene or alkyl-substituted styrenes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F4/00—Polymerisation catalysts
    • C08F4/28—Oxygen or compounds releasing free oxygen
    • C08F4/32—Organic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/116—Redox or dye sensitizer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/134—Brightener containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Polymerisation Methods In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
BR9602141A 1995-05-05 1996-05-03 Composição polimerizável e processo para produzir composição polimerizável BR9602141A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/435,560 US5707781A (en) 1995-05-05 1995-05-05 Photopolymerizable compositions having acyl or diacyl phosphine oxide and a fluorescent optical brightner

Publications (1)

Publication Number Publication Date
BR9602141A true BR9602141A (pt) 1998-06-30

Family

ID=23728891

Family Applications (1)

Application Number Title Priority Date Filing Date
BR9602141A BR9602141A (pt) 1995-05-05 1996-05-03 Composição polimerizável e processo para produzir composição polimerizável

Country Status (8)

Country Link
US (1) US5707781A (pt)
EP (1) EP0741333B2 (pt)
JP (1) JPH08305018A (pt)
KR (1) KR960041215A (pt)
AU (1) AU695703B2 (pt)
BR (1) BR9602141A (pt)
CA (1) CA2175759A1 (pt)
DE (1) DE69609242T3 (pt)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6080450A (en) * 1996-02-23 2000-06-27 Dymax Corporation Composition exhibiting improved fluorescent response
GB9605712D0 (en) * 1996-03-19 1996-05-22 Minnesota Mining & Mfg Novel uv-curable compositions
US6106992A (en) * 1996-11-14 2000-08-22 Dai Nippon Printing Co., Ltd. Photoresist film and process for producing back plate of plasma display panel
DE19907957A1 (de) * 1998-02-27 1999-09-02 Ciba Geigy Ag Pigmentierte photohärtbare Zusammensetzung
EP1106627B1 (en) 1999-12-08 2003-10-29 Ciba SC Holding AG Novel phosphine oxide photoinitiator systems and curable compositions with low color
US6602601B2 (en) 2000-12-22 2003-08-05 Corning Incorporated Optical fiber coating compositions
US6890399B2 (en) * 2002-01-18 2005-05-10 Henkel Corporation (Meth)acrylate compositions having a self-indicator of cure and methods of detecting cure
JP3886813B2 (ja) * 2002-01-24 2007-02-28 富士通株式会社 研磨方法
US20030186165A1 (en) * 2002-03-28 2003-10-02 Agfa-Gevaert Photopolymerizable composition sensitized for the wavelength range from 300 to 450 nm
EP1349006B1 (en) * 2002-03-28 2013-09-25 Agfa Graphics N.V. Photopolymerizable composition sensitized for the wavelength range from 300 to 450 nm.
JP2003313208A (ja) * 2002-04-19 2003-11-06 Meiko:Kk 光硬化性樹脂組成物
US7078157B2 (en) * 2003-02-27 2006-07-18 Az Electronic Materials Usa Corp. Photosensitive composition and use thereof
DE602004021120D1 (de) * 2003-09-22 2009-06-25 Agfa Graphics Nv Photopolymerisierbare zusammensetzung.
MX2007006609A (es) * 2004-12-01 2007-08-14 Henkel Corp Composiciones de silicona curable que incorporan un sistema de deteccion fluorescente.
EP1944173B1 (en) * 2007-01-15 2010-04-21 FUJIFILM Corporation Ink composition and inkjet recording method using the same
US8129447B2 (en) * 2007-09-28 2012-03-06 Fujifilm Corporation Ink composition and inkjet recording method using the same
JP2010024277A (ja) * 2008-07-16 2010-02-04 Fujifilm Corp インクジェット用インク組成物、及び、インクジェット記録方法
JP5344892B2 (ja) * 2008-11-27 2013-11-20 富士フイルム株式会社 インクジェット用インク組成物、及びインクジェット記録方法
JP5685849B2 (ja) * 2010-07-29 2015-03-18 セイコーエプソン株式会社 紫外線硬化型インクジェットインク組成物およびインクジェット記録方法
EP4041779A1 (en) * 2019-10-10 2022-08-17 IGM Resins Italia S.r.l. Combination of photoinitiators and uses thereof
WO2023214012A1 (en) * 2022-05-06 2023-11-09 Igm Group B. V. Photoinitiator package comprising phosphine oxide photoinitiators, oxazole-based sensitizers and amine additives
CN119137224A (zh) * 2022-05-06 2024-12-13 Igm集团公司 包含氧化膦光引发剂、基于香豆素的敏化剂和胺添加剂的光引发剂包

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2784183A (en) * 1951-09-06 1957-03-05 Geigy Ag J R Fluorescent monotriazole compounds
BE593834A (pt) * 1959-08-05
US3644394A (en) * 1968-06-24 1972-02-22 Ciba Geigy Corp Condensation products of n-coumarin alkylpyrazoles and aldehydes
BE788560A (fr) * 1972-06-09 1973-03-08 Du Pont Protection contre le halo dans la formation d'images dans des photopolymeres en couches multiples
DE2909992A1 (de) * 1979-03-14 1980-10-02 Basf Ag Photopolymerisierbare aufzeichnungsmassen, insbesondere zur herstellung von druckplatten und reliefformen
DE3619792A1 (de) * 1986-06-18 1987-12-23 Basf Ag Photopolymerisierbare aufzeichnungsmaterialien sowie photoresistschichten und flachdruckplatten auf basis dieser aufzeichnungsmaterialien
DE3633436A1 (de) * 1986-10-01 1988-04-14 Basf Ag Photopolymerisierbare aufzeichnungsmasse, insbesondere zur herstellung von druckplatten und reliefformen
GB8715435D0 (en) * 1987-07-01 1987-08-05 Ciba Geigy Ag Forming images
DE3837569A1 (de) * 1988-11-04 1990-05-10 Espe Stiftung Mit sichtbarem licht aushaertbare dentalmassen
ES2098260T3 (es) * 1989-08-04 1997-05-01 Ciba Geigy Ag Oxidos de mono- y diacilfosfina.
US5218009A (en) * 1989-08-04 1993-06-08 Ciba-Geigy Corporation Mono- and di-acylphosphine oxides
US4987051A (en) * 1989-08-09 1991-01-22 E. I. Du Pont De Nemours And Company Image-reversal process using photosensitive peel-apart elements
EP0446175A3 (en) * 1990-03-09 1991-11-21 Ciba-Geigy Ag Mixture of photoinitiators
JPH04178403A (ja) * 1990-11-13 1992-06-25 Mitsubishi Petrochem Co Ltd ジエチレン性不飽和単量体の硬化方法
US5559163A (en) * 1991-01-28 1996-09-24 The Sherwin-Williams Company UV curable coatings having improved weatherability
RU2091385C1 (ru) * 1991-09-23 1997-09-27 Циба-Гейги АГ Бисацилфосфиноксиды, состав и способ нанесения покрытий
DE59307404D1 (de) * 1992-03-11 1997-10-30 Ciba Geigy Ag Benzoyl substituierte Phosphabicycloalkane und -sulfide als Photoinitiatoren
US5300399A (en) * 1993-01-21 1994-04-05 Hoechst Celanese Corporation Negative working, peel developable, single sheet color proofing system having a crosslinked layer containing a polymer with phenolic moieties
ZA941879B (en) * 1993-03-18 1994-09-19 Ciba Geigy Curing compositions containing bisacylphosphine oxide photoinitiators

Also Published As

Publication number Publication date
US5707781A (en) 1998-01-13
KR960041215A (ko) 1996-12-19
JPH08305018A (ja) 1996-11-22
EP0741333B2 (en) 2007-06-27
AU5071796A (en) 1996-11-14
CA2175759A1 (en) 1996-11-06
DE69609242T2 (de) 2001-01-25
EP0741333A1 (en) 1996-11-06
DE69609242D1 (de) 2000-08-17
AU695703B2 (en) 1998-08-20
EP0741333B1 (en) 2000-07-12
DE69609242T3 (de) 2007-12-27

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Legal Events

Date Code Title Description
FB34 Technical and formal requirements: requirement - article 34 of industrial property law
B11T Dismissal: dismissal of application maintained