[go: up one dir, main page]

BR8503966A - Processo para a reducao de formacoes de halo na exposicao a radiacao,para a formacao de imagem, da(s)camada(s)de reproducao de uma chapa de impressao - Google Patents

Processo para a reducao de formacoes de halo na exposicao a radiacao,para a formacao de imagem, da(s)camada(s)de reproducao de uma chapa de impressao

Info

Publication number
BR8503966A
BR8503966A BR8503966A BR8503966A BR8503966A BR 8503966 A BR8503966 A BR 8503966A BR 8503966 A BR8503966 A BR 8503966A BR 8503966 A BR8503966 A BR 8503966A BR 8503966 A BR8503966 A BR 8503966A
Authority
BR
Brazil
Prior art keywords
formations
exposure
radiation
printing plate
image formation
Prior art date
Application number
BR8503966A
Other languages
English (en)
Inventor
Werner Dr Frass
Engelbert Dr Pliefke
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of BR8503966A publication Critical patent/BR8503966A/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/151—Matting or other surface reflectivity altering material

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Ink Jet Recording Methods And Recording Media Thereof (AREA)
  • Laminated Bodies (AREA)
BR8503966A 1984-08-21 1985-08-20 Processo para a reducao de formacoes de halo na exposicao a radiacao,para a formacao de imagem, da(s)camada(s)de reproducao de uma chapa de impressao BR8503966A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19843430712 DE3430712A1 (de) 1984-08-21 1984-08-21 Verfahren zur reduzierung von unterstrahlungen bei der bestrahlung von reproduktionsschichten

Publications (1)

Publication Number Publication Date
BR8503966A true BR8503966A (pt) 1986-06-03

Family

ID=6243538

Family Applications (1)

Application Number Title Priority Date Filing Date
BR8503966A BR8503966A (pt) 1984-08-21 1985-08-20 Processo para a reducao de formacoes de halo na exposicao a radiacao,para a formacao de imagem, da(s)camada(s)de reproducao de uma chapa de impressao

Country Status (6)

Country Link
US (1) US4725526A (pt)
EP (1) EP0172525A3 (pt)
JP (1) JPS6159450A (pt)
BR (1) BR8503966A (pt)
CA (1) CA1267028A (pt)
DE (1) DE3430712A1 (pt)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3627757A1 (de) * 1986-08-16 1988-02-18 Basf Ag Verfahren zur herstellung von flachdruckplatten
US5182183A (en) * 1987-03-12 1993-01-26 Mitsubishi Kasei Corporation Positive photosensitive planographic printing plates containing specific high-molecular weight compound and photosensitive ester of O-napthoquinonediazidosulfonic acid with polyhydroxybenzophenone
FR2619958B1 (fr) * 1987-08-31 1992-02-21 Thomson Semiconducteurs Circuit de detection de seuil de temperature
US4889787A (en) * 1988-04-25 1989-12-26 Minnesota Mining And Manufacturing Company Low gain positive acting diazo oxide pre-press proofing system with polyvinyl ether and particulate slip agent in adhesive layer
US5204233A (en) * 1990-10-09 1993-04-20 Konica Corporation Photographic silver halide element having coated particles
US5208139A (en) * 1990-12-11 1993-05-04 Fuji Photo Film Co., Ltd. Silver halide photographic materials
DE4126836A1 (de) * 1991-08-14 1993-02-18 Hoechst Ag Strahlungsempfindliches aufzeichnungsmaterial aus schichttraeger und positiv arbeitender, strahlungsempfindlicher schicht mit rauher oberflaeche
US6613494B2 (en) * 2001-03-13 2003-09-02 Kodak Polychrome Graphics Llc Imageable element having a protective overlayer
JP3955303B2 (ja) 2005-04-25 2007-08-08 有限会社ムゲンコーポレーション コンテナ等の防振装置およびその使用方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE625606A (pt) * 1961-12-01
JPS4829059B1 (pt) * 1969-08-02 1973-09-06
NL7007827A (pt) * 1970-05-29 1971-12-01
US3779774A (en) * 1972-05-09 1973-12-18 Xidex Corp Silicone surfactants for vesicular films
JPS4986103A (pt) * 1972-12-25 1974-08-17
US4036644A (en) * 1973-03-16 1977-07-19 International Business Machines Corporation Photoresist process and photosensitive O-quinone diazide article with aliphatic carboxylic acid as adhesion promotor
US4168979A (en) * 1974-03-19 1979-09-25 Fuji Photo Film Co., Ltd. Light-sensitive printing plate with matt overlayer
GB1522406A (en) * 1975-04-07 1978-08-23 Fuji Photo Film Co Ltd Light-sensitive silver halide photographic materials
US4199649A (en) * 1978-04-12 1980-04-22 Bard Laboratories, Inc. Amorphous monomolecular surface coatings
DE2926236A1 (de) * 1979-06-29 1981-01-15 Hoechst Ag Lichtempfindliches, positiv arbeitendes kopiermaterial mit rauher oberflaeche
JPS5660432A (en) * 1979-10-23 1981-05-25 Fuji Photo Film Co Ltd Photosolubilizing composition
DE3022473A1 (de) * 1980-06-14 1981-12-24 Hoechst Ag, 6000 Frankfurt Lichtempfindliches kopiermaterial und verfahren zu seiner herstellung
JPS57165848A (en) * 1981-04-07 1982-10-13 Canon Inc Image bearing material
JPS57208556A (en) * 1981-06-18 1982-12-21 Nippon Paint Co Ltd Photosensitive printing plate material
US4377631A (en) * 1981-06-22 1983-03-22 Philip A. Hunt Chemical Corporation Positive novolak photoresist compositions

Also Published As

Publication number Publication date
CA1267028C (en) 1990-03-27
EP0172525A2 (de) 1986-02-26
JPS6159450A (ja) 1986-03-26
EP0172525A3 (de) 1987-10-07
DE3430712A1 (de) 1986-03-06
US4725526A (en) 1988-02-16
CA1267028A (en) 1990-03-27

Similar Documents

Publication Publication Date Title
US4621041B1 (en) Lithographic printing plate
DE3368132D1 (en) Process for preparing an overcoated photopolymer printing plate
BR8406563A (pt) Composicao sensivel a radiacao,elemento sensivel a radiacao e processo para produzir uma imagem litografica sobre um elemento
GB2129822B (en) Photosensitive plate for lithographic printing plate
FR2546105B1 (fr) Plaque compressible d'impression et procede pour sa fabrication
BR8702714A (pt) Composicao fotossensivel e processo para laminar uma pelicula fotossensivel a um substrato
BR8201950A (pt) Composicao de vidro fotocromica vidro fotocromico processo de formacao de chapas de vidro
AU567264B2 (en) Aqueous developable photosensitive lithographic printing plate composition
GB2060923B (en) Process for preparing positive-acting photosensitive lithographic printing plate precursor
ZA826871B (en) Syndiotactic polybutadiene composition for photosensitive printing plate
BR8503966A (pt) Processo para a reducao de formacoes de halo na exposicao a radiacao,para a formacao de imagem, da(s)camada(s)de reproducao de uma chapa de impressao
BR8302993A (pt) Processo para registrar e sensibilizar com radiacao actinica, um conjunto de substratos de folha registraveis, entre si
FR2567076B1 (fr) Procede pour la realisation d'exemplaires uniques d'une impression
DE3469923D1 (en) Process for producing aluminum support for lithographic printing plates
BR8801789A (pt) Composicao revelavel em agua,curavel por radiacao,processo para a formacao de uma foto-mascara em um substrato e processo para a formacao de um painel de circuito impresso
GB2046461B (en) Method for producing photosensitive printing plate precursor
GB2046931B (en) Method of developing positive-acting photosensitive lithographic printing plate precursor
EP0154981A3 (en) Process for producing light-sensitive lithographic plate requiring no dampening solution
GB2032124B (en) Lithographic printing plate having two photosensitive layers
GB8319180D0 (en) Producing compressible layer in printing
EP0164128A3 (en) Process for making lithographic printing plates, and printing plates made by the process
FR2531909B1 (fr) Procede d'impression par transfert
DE3568505D1 (en) Electrophotographic lithographic printing plate
DE3379079D1 (en) Photosensitive composition, photoprinting material prepared therewith and process for producing a printing plate with that material
GB2069164B (en) Lithographic printing plate making process