BR7801031A - METHOD AND APPLIANCE FOR FORMING AN ELECTRONIC BEAM OF VARIABLE SIZE - Google Patents

METHOD AND APPLIANCE FOR FORMING AN ELECTRONIC BEAM OF VARIABLE SIZE

Info

Publication number: BR7801031A
Authority: BR; Brazil
Prior art keywords: appliance; forming; variable size; electronic beam; electronic
Prior art date: 1977-02-23

Application number

BR7801031A

Other languages

Portuguese (pt)

Inventor

P Ryan

H Pfeiffer

E Weber

Original Assignee

Ibm

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1977-02-23

Filing date

1978-02-21

Publication date

1978-12-12

1978-02-21 Application filed by Ibm filed Critical Ibm

1978-12-12 Publication of BR7801031A publication Critical patent/BR7801031A/en

Classifications

- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/3002—Details
- H01J37/3007—Electron or ion-optical systems
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields

Landscapes

Chemical & Material Sciences (AREA)
Analytical Chemistry (AREA)
Electron Beam Exposure (AREA)

BR7801031A 1977-02-23 1978-02-21 METHOD AND APPLIANCE FOR FORMING AN ELECTRONIC BEAM OF VARIABLE SIZE BR7801031A (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
US77123577A	1977-02-23	1977-02-23

Publications (1)

Publication Number	Publication Date
BR7801031A true BR7801031A (en)	1978-12-12

Family

ID=25091155

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
BR7801031A BR7801031A (en)	1977-02-23	1978-02-21	METHOD AND APPLIANCE FOR FORMING AN ELECTRONIC BEAM OF VARIABLE SIZE

Country Status (9)

Country	Link
JP (1)	JPS53124078A (en)
BR (1)	BR7801031A (en)
CA (1)	CA1166766A (en)
DE (1)	DE2805371C2 (en)
FR (1)	FR2382091A1 (en)
GB (1)	GB1587852A (en)
IT (1)	IT1158434B (en)
NL (1)	NL7802010A (en)
SE (1)	SE437441B (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS543476A (en) *	1977-06-09	1979-01-11	Jeol Ltd	Electron beam exposure device
GB1598219A (en) *	1977-08-10	1981-09-16	Ibm	Electron beam system
JPS5679429A (en) *	1979-12-03	1981-06-30	Chiyou Lsi Gijutsu Kenkyu Kumiai	Electron beam exposure process
EP0053225B1 (en) *	1980-11-28	1985-03-13	International Business Machines Corporation	Electron beam system and method
US4423305A (en) *	1981-07-30	1983-12-27	International Business Machines Corporation	Method and apparatus for controlling alignment of an electron beam of a variable shape
JPS5928336A (en) *	1982-08-09	1984-02-15	Nippon Telegr & Teleph Corp <Ntt>	Pattern forming method
CN116441562B (en) *	2023-06-16	2023-08-15	西安赛隆增材技术股份有限公司	Device and method for calibrating beam spot of electron beam

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
NL6807439A (en) *	1968-05-27	1969-12-01
US3644700A (en) *	1969-12-15	1972-02-22	Ibm	Method and apparatus for controlling an electron beam
US3801792A (en) *	1973-05-23	1974-04-02	Bell Telephone Labor Inc	Electron beam apparatus
JPS5251871A (en) *	1975-10-23	1977-04-26	Rikagaku Kenkyusho	Projecting method for charge particle beams
JPS5283177A (en) *	1975-12-31	1977-07-11	Fujitsu Ltd	Electron beam exposure device
GB1557924A (en) *	1976-02-05	1979-12-19	Western Electric Co	Irradiation apparatus and methods
NL177578C (en) *	1976-05-14	1985-10-16	Thomson Csf	DEVICE FOR DESCRIBING AN OBJECT WITH A PARTICULAR BUNDLE.
FR2351497A1 (en) *	1976-05-14	1977-12-09	Thomson Csf	Corpuscular optics lens arrangement - projects image onto object by subsequent programmed drawing of picture elements onto object (NL 16.11.77)
DE2627632A1 (en) *	1976-06-19	1977-12-22	Jenoptik Jena Gmbh	Nonthermic electron beam machining - has radiation control by pulse impact point and beam cross section corresp. to specific section to be machined
JPS5320391A (en) *	1976-08-09	1978-02-24	Becton Dickinson Co	Blood inspection apparatus

1977
- 1977-11-29 CA CA000291957A patent/CA1166766A/en not_active Expired
1978
- 1978-01-05 FR FR7800742A patent/FR2382091A1/en active Granted
- 1978-01-20 GB GB2456/78A patent/GB1587852A/en not_active Expired
- 1978-02-09 DE DE2805371A patent/DE2805371C2/en not_active Expired
- 1978-02-10 IT IT20143/78A patent/IT1158434B/en active
- 1978-02-15 JP JP1548478A patent/JPS53124078A/en active Granted
- 1978-02-15 SE SE7801728A patent/SE437441B/en not_active IP Right Cessation
- 1978-02-21 BR BR7801031A patent/BR7801031A/en unknown
- 1978-02-22 NL NL7802010A patent/NL7802010A/en not_active Application Discontinuation

Also Published As

Publication number	Publication date
DE2805371C2 (en)	1984-02-16
DE2805371A1 (en)	1978-08-24
CA1166766A (en)	1984-05-01
SE7801728L (en)	1978-08-24
FR2382091A1 (en)	1978-09-22
IT7820143A0 (en)	1978-02-10
NL7802010A (en)	1978-08-25
IT1158434B (en)	1987-02-18
JPS53124078A (en)	1978-10-30
FR2382091B1 (en)	1982-04-09
JPS5424833B2 (en)	1979-08-23
SE437441B (en)	1985-02-25
GB1587852A (en)	1981-04-08

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