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BR7310275D0 - IMPROVEMENT IN A MULTIPLE JUNCLE SEMICONDUCTOR DEVICE - Google Patents

IMPROVEMENT IN A MULTIPLE JUNCLE SEMICONDUCTOR DEVICE

Info

Publication number
BR7310275D0
BR7310275D0 BR10275/73A BR1027573A BR7310275D0 BR 7310275 D0 BR7310275 D0 BR 7310275D0 BR 10275/73 A BR10275/73 A BR 10275/73A BR 1027573 A BR1027573 A BR 1027573A BR 7310275 D0 BR7310275 D0 BR 7310275D0
Authority
BR
Brazil
Prior art keywords
juncle
improvement
semiconductor device
semiconductor
multiple juncle
Prior art date
Application number
BR10275/73A
Other languages
Portuguese (pt)
Inventor
Yagi Hajime
Tsuyuki Tadaharu
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Publication of BR7310275D0 publication Critical patent/BR7310275D0/en

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/60Impurity distributions or concentrations
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/13Semiconductor regions connected to electrodes carrying current to be rectified, amplified or switched, e.g. source or drain regions
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/13Semiconductor regions connected to electrodes carrying current to be rectified, amplified or switched, e.g. source or drain regions
    • H10D62/133Emitter regions of BJTs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/13Semiconductor regions connected to electrodes carrying current to be rectified, amplified or switched, e.g. source or drain regions
    • H10D62/141Anode or cathode regions of thyristors; Collector or emitter regions of gated bipolar-mode devices, e.g. of IGBTs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/13Semiconductor regions connected to electrodes carrying current to be rectified, amplified or switched, e.g. source or drain regions
    • H10D62/141Anode or cathode regions of thyristors; Collector or emitter regions of gated bipolar-mode devices, e.g. of IGBTs
    • H10D62/148Cathode regions of thyristors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/01Manufacture or treatment
    • H10D84/0112Integrating together multiple components covered by H10D8/00, H10D10/00 or H10D18/00, e.g. integrating multiple BJTs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/01Manufacture or treatment
    • H10D84/02Manufacture or treatment characterised by using material-based technologies
    • H10D84/03Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology
    • H10D84/038Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology using silicon technology, e.g. SiGe
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/60Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of BJTs
    • H10D84/611Combinations of BJTs and one or more of diodes, resistors or capacitors
    • H10D84/613Combinations of vertical BJTs and one or more of diodes, resistors or capacitors
    • H10D84/617Combinations of vertical BJTs and only diodes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/60Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of BJTs
    • H10D84/67Complementary BJTs
    • H10D84/673Vertical complementary BJTs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D99/00Subject matter not provided for in other groups of this subclass
BR10275/73A 1972-12-29 1973-12-28 IMPROVEMENT IN A MULTIPLE JUNCLE SEMICONDUCTOR DEVICE BR7310275D0 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP48000550A JPS5147583B2 (en) 1972-12-29 1972-12-29

Publications (1)

Publication Number Publication Date
BR7310275D0 true BR7310275D0 (en) 1974-09-24

Family

ID=11476818

Family Applications (1)

Application Number Title Priority Date Filing Date
BR10275/73A BR7310275D0 (en) 1972-12-29 1973-12-28 IMPROVEMENT IN A MULTIPLE JUNCLE SEMICONDUCTOR DEVICE

Country Status (15)

Country Link
JP (1) JPS5147583B2 (en)
AT (1) AT376844B (en)
BE (1) BE809216A (en)
BR (1) BR7310275D0 (en)
CA (1) CA993568A (en)
CH (1) CH577750A5 (en)
DE (1) DE2364752A1 (en)
DK (1) DK140036C (en)
ES (1) ES421881A1 (en)
FR (1) FR2212645B1 (en)
GB (1) GB1460037A (en)
IT (1) IT1002384B (en)
NL (1) NL7317815A (en)
NO (1) NO140844C (en)
SE (1) SE398940B (en)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5914897B2 (en) * 1975-02-08 1984-04-06 ソニー株式会社 semiconductor equipment
AT377645B (en) * 1972-12-29 1985-04-10 Sony Corp SEMICONDUCTOR COMPONENT
JPS5754969B2 (en) * 1974-04-04 1982-11-20
JPS5753672B2 (en) * 1974-04-10 1982-11-13
JPS57658B2 (en) * 1974-04-16 1982-01-07
JPS5714064B2 (en) * 1974-04-25 1982-03-20
JPS5648983B2 (en) * 1974-05-10 1981-11-19
JPS5718710B2 (en) * 1974-05-10 1982-04-17
JPS5426789Y2 (en) * 1974-07-23 1979-09-03
IT1061510B (en) * 1975-06-30 1983-04-30 Rca Corp BIPOLAR TRANSISTOR PRESENTING AN EMITTER WITH A HIGH LOW CONCENTRATION OF IMPURITIES AND ITS MANUFACTURING METHOD
JPS52100978A (en) * 1976-02-20 1977-08-24 Nippon Telegr & Teleph Corp <Ntt> Semiconductor device
JPS5565460A (en) * 1978-11-09 1980-05-16 Ibm Method of manufacturing semiconductor device improved in current gain
JPS5946103B2 (en) * 1980-03-10 1984-11-10 日本電信電話株式会社 transistor

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE547227A (en) * 1955-04-21
US3343048A (en) * 1964-02-20 1967-09-19 Westinghouse Electric Corp Four layer semiconductor switching devices having a shorted emitter and method of making the same
DE1221363B (en) * 1964-04-25 1966-07-21 Telefunken Patent Method for reducing the sheet resistance of semiconductor components
DE1297237B (en) * 1964-09-18 1969-06-12 Itt Ind Gmbh Deutsche Surface transistor and process for its manufacture
US3500141A (en) * 1964-10-13 1970-03-10 Ibm Transistor structure
GB1160429A (en) * 1965-10-14 1969-08-06 Philco Ford Corp Improvements in and relating to Semiconductive Devices.
US3469117A (en) * 1966-01-08 1969-09-23 Nippon Telegraph & Telephone Electric circuit employing semiconductor devices
US3432920A (en) * 1966-12-01 1969-03-18 Rca Corp Semiconductor devices and methods of making them
US3512056A (en) * 1967-04-25 1970-05-12 Westinghouse Electric Corp Double epitaxial layer high power,high speed transistor
FR1574577A (en) * 1967-08-03 1969-07-11
US3504242A (en) * 1967-08-11 1970-03-31 Westinghouse Electric Corp Switching power transistor with thyristor overload capacity
US3538401A (en) * 1968-04-11 1970-11-03 Westinghouse Electric Corp Drift field thyristor
US3544863A (en) * 1968-10-29 1970-12-01 Motorola Inc Monolithic integrated circuit substructure with epitaxial decoupling capacitance
US3591430A (en) * 1968-11-14 1971-07-06 Philco Ford Corp Method for fabricating bipolar planar transistor having reduced minority carrier fringing
JPS4840667B1 (en) * 1969-03-28 1973-12-01
US3717515A (en) * 1969-11-10 1973-02-20 Ibm Process for fabricating a pedestal transistor
DE2060854A1 (en) * 1970-12-10 1972-08-17 Siemens Ag Semiconductor component with three zones of alternating conductivity type and arrangement for its control
DE2211384A1 (en) * 1971-03-20 1972-11-30 Philips Nv Circuit arrangement with at least one radiation-fed circuit element and semiconductor arrangement for use in such a circuit arrangement
JPS493583A (en) * 1972-04-20 1974-01-12

Also Published As

Publication number Publication date
NL7317815A (en) 1974-07-02
AU6378973A (en) 1975-06-19
FR2212645B1 (en) 1977-08-05
ATA1083973A (en) 1984-05-15
NO140844B (en) 1979-08-13
DE2364752A1 (en) 1974-08-01
JPS4991191A (en) 1974-08-30
SE398940B (en) 1978-01-23
BE809216A (en) 1974-04-16
FR2212645A1 (en) 1974-07-26
CA993568A (en) 1976-07-20
NO140844C (en) 1979-11-21
CH577750A5 (en) 1976-07-15
IT1002384B (en) 1976-05-20
DK140036B (en) 1979-06-05
JPS5147583B2 (en) 1976-12-15
DK140036C (en) 1979-12-24
GB1460037A (en) 1976-12-31
ES421881A1 (en) 1976-08-01
AT376844B (en) 1985-01-10

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