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BR0214226A - Composição de limpeza, processo para manualmente limpar substratos sujos, e, kit para realizar o processo - Google Patents

Composição de limpeza, processo para manualmente limpar substratos sujos, e, kit para realizar o processo

Info

Publication number
BR0214226A
BR0214226A BR0214226-0A BR0214226A BR0214226A BR 0214226 A BR0214226 A BR 0214226A BR 0214226 A BR0214226 A BR 0214226A BR 0214226 A BR0214226 A BR 0214226A
Authority
BR
Brazil
Prior art keywords
cleaning
composition
manually
substrates
kit
Prior art date
Application number
BR0214226-0A
Other languages
English (en)
Inventor
Vijaya Milind Bargaje
Vidur Behal
Kripa Devagna Mody
Glyn Roberts
Paul Johan Marie Willem Birker
Original Assignee
Unilever Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Unilever Nv filed Critical Unilever Nv
Publication of BR0214226A publication Critical patent/BR0214226A/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/43—Solvents
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D17/00—Detergent materials or soaps characterised by their shape or physical properties
    • C11D17/0008—Detergent materials or soaps characterised by their shape or physical properties aqueous liquid non soap compositions
    • C11D17/0017—Multi-phase liquid compositions
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/24—Hydrocarbons
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C11D7/263—Ethers
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C11D7/266—Esters or carbonates
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/28—Organic compounds containing halogen

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Detergent Compositions (AREA)

Abstract

"COMPOSIçãO DE LIMPEZA, PROCESSO PARA MANUALMENTE LIMPAR SUBSTRATOS SUJOS, E, KIT PARA REALIZAR O PROCESSO" . A invenção diz respeito a uma composição de limpeza adequada para manualmente limpar substratos. A composição compreende pelo menos duas fases líquidas imiscíveis tendo uma interface líquida-líquida com uma tensão interfacial maior do que 5 mN/m, a diferença na densidade entre as duas fases líquidas sendo não maior do que 0,2 g/cm^ 3^. Após agitação, a composição é aplicada ao substrato a ser limpo, e subseq³entemente fricção é aplicada ao substrato. A composição fornece a estabilidade necessária após agitação, e apresenta boa detergência, particularmente quanto à sujeira particulada.
BR0214226-0A 2001-11-19 2002-10-28 Composição de limpeza, processo para manualmente limpar substratos sujos, e, kit para realizar o processo BR0214226A (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
IN1091MU2001 2001-11-19
PCT/EP2002/012036 WO2003044147A1 (en) 2001-11-19 2002-10-28 Improved washing system

Publications (1)

Publication Number Publication Date
BR0214226A true BR0214226A (pt) 2004-09-21

Family

ID=11097313

Family Applications (1)

Application Number Title Priority Date Filing Date
BR0214226-0A BR0214226A (pt) 2001-11-19 2002-10-28 Composição de limpeza, processo para manualmente limpar substratos sujos, e, kit para realizar o processo

Country Status (9)

Country Link
US (1) US6881714B2 (pt)
EP (1) EP1446468A1 (pt)
CN (1) CN1589317A (pt)
AR (1) AR037541A1 (pt)
AU (1) AU2002342866A1 (pt)
BR (1) BR0214226A (pt)
CA (1) CA2465823A1 (pt)
WO (1) WO2003044147A1 (pt)
ZA (1) ZA200403193B (pt)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7737097B2 (en) * 2003-06-27 2010-06-15 Lam Research Corporation Method for removing contamination from a substrate and for making a cleaning solution
US7799141B2 (en) * 2003-06-27 2010-09-21 Lam Research Corporation Method and system for using a two-phases substrate cleaning compound
US8316866B2 (en) * 2003-06-27 2012-11-27 Lam Research Corporation Method and apparatus for cleaning a semiconductor substrate
US7648584B2 (en) * 2003-06-27 2010-01-19 Lam Research Corporation Method and apparatus for removing contamination from substrate
US8522801B2 (en) * 2003-06-27 2013-09-03 Lam Research Corporation Method and apparatus for cleaning a semiconductor substrate
US7913703B1 (en) 2003-06-27 2011-03-29 Lam Research Corporation Method and apparatus for uniformly applying a multi-phase cleaning solution to a substrate
US20040261823A1 (en) * 2003-06-27 2004-12-30 Lam Research Corporation Method and apparatus for removing a target layer from a substrate using reactive gases
US8043441B2 (en) * 2005-06-15 2011-10-25 Lam Research Corporation Method and apparatus for cleaning a substrate using non-Newtonian fluids
US7568490B2 (en) * 2003-12-23 2009-08-04 Lam Research Corporation Method and apparatus for cleaning semiconductor wafers using compressed and/or pressurized foams, bubbles, and/or liquids
US7862662B2 (en) * 2005-12-30 2011-01-04 Lam Research Corporation Method and material for cleaning a substrate
US7416370B2 (en) * 2005-06-15 2008-08-26 Lam Research Corporation Method and apparatus for transporting a substrate using non-Newtonian fluid
US8323420B2 (en) 2005-06-30 2012-12-04 Lam Research Corporation Method for removing material from semiconductor wafer and apparatus for performing the same
US8522799B2 (en) * 2005-12-30 2013-09-03 Lam Research Corporation Apparatus and system for cleaning a substrate
SG154438A1 (en) * 2005-12-30 2009-08-28 Lam Res Corp Cleaning compound and method and system for using the cleaning compound
US20080148595A1 (en) * 2006-12-20 2008-06-26 Lam Research Corporation Method and apparatus for drying substrates using a surface tensions reducing gas
US7897213B2 (en) * 2007-02-08 2011-03-01 Lam Research Corporation Methods for contained chemical surface treatment
US8226775B2 (en) 2007-12-14 2012-07-24 Lam Research Corporation Methods for particle removal by single-phase and two-phase media
DE102009027206A1 (de) * 2009-06-25 2010-12-30 Chemische Fabrik Kreussler & Co. Gmbh Verwendung von Dietherverbindungen bei der chemischen Reinigung von Textil-, Leder- oder Pelzwaren
MX375722B (es) * 2016-02-23 2025-03-06 Unilever Ip Holdings B V Una composición acuosa desinfectante y método para tratar substratos.

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
LU55174A1 (pt) * 1967-12-28 1969-08-08 Unilever Nv
US4176080A (en) * 1977-10-03 1979-11-27 The Procter & Gamble Company Detergent compositions for effective oily soil removal
DE3152654C2 (de) * 1980-12-22 1987-07-16 Electrolux Ab Verfahren zum Waschen von Textilgegenst{nden und Vorrichtung zur Durchf}hrung des Verfahrens
AU671895B2 (en) * 1993-04-12 1996-09-12 Colgate-Palmolive Company, The Tricritical point composition
US5962391A (en) * 1994-02-04 1999-10-05 Colgate-Palmolive Co. Near tricritical point compositions containing bleach and or biostatic agent
CN1430688A (zh) * 2000-05-23 2003-07-16 荷兰联合利华有限公司 清洁织物的方法
CA2460663A1 (en) * 2001-10-12 2003-04-24 Unilever Plc Cleaning composition with an immiscible liquid system
CN1568385A (zh) * 2001-10-12 2005-01-19 荷兰联合利华有限公司 无毒性的清洗组合物

Also Published As

Publication number Publication date
EP1446468A1 (en) 2004-08-18
WO2003044147A1 (en) 2003-05-30
US20030148903A1 (en) 2003-08-07
CN1589317A (zh) 2005-03-02
CA2465823A1 (en) 2003-05-30
ZA200403193B (en) 2005-04-28
US6881714B2 (en) 2005-04-19
AR037541A1 (es) 2004-11-17
AU2002342866A1 (en) 2003-06-10

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Legal Events

Date Code Title Description
B08F Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette]

Free format text: REFERENTE A 5A, 6A E 7A ANUIDADES.

B08K Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette]

Free format text: REFERENTE AO DESPACHO 8.6 DA RPI 2034 DE 29/12/2009.