BE892711A - Procede et appareillage pour former un enduit d'oxyde par la technique de nebulisation reactive - Google Patents
Procede et appareillage pour former un enduit d'oxyde par la technique de nebulisation reactiveInfo
- Publication number
- BE892711A BE892711A BE0/207717A BE207717A BE892711A BE 892711 A BE892711 A BE 892711A BE 0/207717 A BE0/207717 A BE 0/207717A BE 207717 A BE207717 A BE 207717A BE 892711 A BE892711 A BE 892711A
- Authority
- BE
- Belgium
- Prior art keywords
- reactive
- forming
- oxide coating
- nebulization technique
- nebulization
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
- C23C14/0042—Controlling partial pressure or flow rate of reactive or inert gases with feedback of measurements
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
- Analytical Chemistry (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Fluid Mechanics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Physical Vapour Deposition (AREA)
- Nozzles (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56048258A JPS57161063A (en) | 1981-03-31 | 1981-03-31 | Method and device for sticking metallic oxide film on substrate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| BE892711A true BE892711A (fr) | 1982-07-16 |
Family
ID=12798411
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BE0/207717A BE892711A (fr) | 1981-03-31 | 1982-03-31 | Procede et appareillage pour former un enduit d'oxyde par la technique de nebulisation reactive |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US4407709A (fr) |
| JP (1) | JPS57161063A (fr) |
| BE (1) | BE892711A (fr) |
| DE (1) | DE3212037A1 (fr) |
| FR (1) | FR2503190A1 (fr) |
| GB (1) | GB2097428A (fr) |
Families Citing this family (58)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AU2323584A (en) * | 1983-01-11 | 1984-12-13 | Oabrand Pty. Ltd. | Reduction of halogens in carbonaceous material |
| US4478702A (en) * | 1984-01-17 | 1984-10-23 | Ppg Industries, Inc. | Anode for magnetic sputtering apparatus |
| JPS60204626A (ja) * | 1984-03-30 | 1985-10-16 | Anelva Corp | 酸化鉄薄膜の形成方法および装置 |
| JPS60208813A (ja) * | 1984-04-02 | 1985-10-21 | Mitsubishi Electric Corp | 光電変換装置とその製造方法 |
| US4610771A (en) * | 1984-10-29 | 1986-09-09 | Ppg Industries, Inc. | Sputtered films of metal alloy oxides and method of preparation thereof |
| JPS61130485A (ja) * | 1984-11-28 | 1986-06-18 | Mitsubishi Electric Corp | 真空モニタ装置 |
| US4675091A (en) * | 1986-04-16 | 1987-06-23 | United States Of America As Represented By The Secretary Of The Navy | Co-sputtered thermionic cathodes and fabrication thereof |
| JP2624240B2 (ja) * | 1986-06-20 | 1997-06-25 | 松下電器産業株式会社 | 透明導電膜の形成方法 |
| DE3709177A1 (de) * | 1987-03-20 | 1988-09-29 | Leybold Ag | Verfahren und vorrichtung zur regelung der reaktiven schichtabscheidung auf substraten mittels magnetronkatoden |
| JP2607091B2 (ja) * | 1987-08-04 | 1997-05-07 | 日東電工株式会社 | 長尺のフィルム基板に金属酸化物被膜を連続的に付着させる方法及びその装置 |
| JPH01165766A (ja) * | 1987-12-22 | 1989-06-29 | Seiko Epson Corp | 反応性スパッタリング成膜法 |
| JPH01165768A (ja) * | 1987-12-22 | 1989-06-29 | Seiko Epson Corp | 反応性スパッタリング成膜法 |
| DE68909618T2 (de) * | 1988-01-09 | 1994-05-05 | Sumitomo Bakelite Co | Verfahren zur Herstellung eines mit einer Dünnschicht aus Metalloxid überzogenen durchsichtigen leitenden Films. |
| FR2633920B1 (fr) * | 1988-07-08 | 1992-02-21 | Saint Gobain Vitrage | Procede pour produire une couche transparente a faible resistivite |
| JP2584058B2 (ja) * | 1989-05-26 | 1997-02-19 | 松下電器産業株式会社 | 透明導電膜形成装置および透明導電膜形成方法 |
| US4988424A (en) * | 1989-06-07 | 1991-01-29 | Ppg Industries, Inc. | Mask and method for making gradient sputtered coatings |
| KR920703870A (ko) * | 1989-08-07 | 1992-12-18 | 원본미기재 | 광학적 산화물 코우팅을 증진된 속도로 부착하는 방법 |
| JP2713481B2 (ja) * | 1989-12-04 | 1998-02-16 | 株式会社日立製作所 | イオンビームスパッタによる多元系薄膜形成方法および多元系薄膜形成装置 |
| GB9005321D0 (en) * | 1990-03-09 | 1990-05-02 | Matthews Allan | Modulated structure composites produced by vapour disposition |
| US5063050A (en) * | 1990-03-23 | 1991-11-05 | Revlon, Inc. | Tableted powder cosmetics |
| JPH049748A (ja) * | 1990-04-27 | 1992-01-14 | Sharp Corp | ニオブ酸リチウム薄膜の評価方法およびその製造装置 |
| JPH06506987A (ja) * | 1992-02-14 | 1994-08-04 | フォルシュングスツェントルム・ユーリッヒ・ゲゼルシャフト・ミト・ベシュレンクテル・ハフツング | 反応性陰極スパッタリングで薄膜を作製する方法およびこの方法を実行する装置 |
| FR2689976B1 (fr) * | 1992-04-14 | 1995-06-30 | Innovatique Sa | Procede et dispositif pour la determination et le controle de la composition du melange gazeux reactif utilise au cours d'un traitement thermochimique sous atmosphere rarefiee. |
| US5757494A (en) * | 1994-10-21 | 1998-05-26 | J.A. Woollam Co. Inc. | System and method for improving data acquisition capability in spectroscopic ellipsometers |
| US5956145A (en) * | 1992-09-18 | 1999-09-21 | J. A. Woollam Co. Inc. | System and method for improving data acquisition capability in spectroscopic rotatable element, rotating element, modulation element, and other ellipsometer and polarimeter and the like systems |
| DE4235200C1 (fr) * | 1992-10-19 | 1993-07-29 | Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung Ev, 8000 Muenchen, De | |
| DE4242633C2 (de) * | 1992-12-17 | 1996-11-14 | Fraunhofer Ges Forschung | Verfahren zur Durchführung von stabilen Niederdruck-Glimmprozessen |
| FR2699934B1 (fr) * | 1992-12-30 | 1995-03-17 | Lorraine Inst Nat Polytech | Procédé de contrôle de la concentration en métalloïde d'un dépôt réalisés par voie physique en phase vapeur réactive à l'aide d'un plasma froid de pulvérisation. |
| DE4324683C1 (de) * | 1993-07-22 | 1994-11-17 | Fraunhofer Ges Forschung | Verfahren zur Anpassung des Generators bei bipolaren Niederdruck-Glimmprozessen |
| US5911856A (en) * | 1993-09-03 | 1999-06-15 | Canon Kabushiki Kaisha | Method for forming thin film |
| US6468401B1 (en) * | 1995-04-24 | 2002-10-22 | Bridgestone Corporation | Formation of metal compound thin film and preparation of rubber composite material |
| DE19605314C2 (de) * | 1996-02-14 | 2002-01-31 | Fraunhofer Ges Forschung | Verfahren zum Bearbeiten von Substraten in einem bipolaren Niederdruck-Glimmprozeß |
| JP3689524B2 (ja) * | 1996-03-22 | 2005-08-31 | キヤノン株式会社 | 酸化アルミニウム膜及びその形成方法 |
| JP2873937B2 (ja) * | 1996-05-24 | 1999-03-24 | 工業技術院長 | ガラスの光微細加工方法 |
| US6217720B1 (en) * | 1997-06-03 | 2001-04-17 | National Research Council Of Canada | Multi-layer reactive sputtering method with reduced stabilization time |
| WO1999007914A1 (fr) * | 1997-08-08 | 1999-02-18 | Lockheed Martin Corporation | Commande de procede de pulverisation cathodique en couche mince, en fonction des raie d'emission multispectroscopiques |
| EP0918042A1 (fr) * | 1997-11-20 | 1999-05-26 | Balzers Hochvakuum AG | Substrat revêtu d'au moins une couche de MgO |
| US6106676A (en) * | 1998-04-16 | 2000-08-22 | The Boc Group, Inc. | Method and apparatus for reactive sputtering employing two control loops |
| JP2003201562A (ja) * | 2002-01-11 | 2003-07-18 | Nippon Telegr & Teleph Corp <Ntt> | 成膜モニタリング方法 |
| US6863772B2 (en) * | 2002-10-09 | 2005-03-08 | Taiwan Semiconductor Manufacturing Co., Ltd | Dual-port end point window for plasma etcher |
| DE10260614B4 (de) * | 2002-12-23 | 2008-01-31 | Advanced Micro Devices, Inc., Sunnyvale | Plasmaparametersteuerung unter Verwendung von Lerndaten |
| US7172681B2 (en) * | 2003-02-05 | 2007-02-06 | Bridgestone Corporation | Process for producing rubber-based composite material |
| JP4720298B2 (ja) * | 2005-06-07 | 2011-07-13 | 株式会社ブリヂストン | 導電性化合物薄膜の成膜方法 |
| FR2888587B1 (fr) | 2005-07-13 | 2007-10-05 | Sidel Sas | Appareil pour le depot pecvd d'une couche barriere interne sur un recipient, comprenant un dispositif d'analyse optique du plasma |
| US20080233016A1 (en) * | 2007-03-21 | 2008-09-25 | Verity Instruments, Inc. | Multichannel array as window protection |
| DE102009059097B4 (de) * | 2009-12-18 | 2011-09-01 | Dtf Technology Gmbh | Verfahren und Vorrichtung zur Auswertung des von einem Plasma emittierten Lichtes zur Regelung von plasmagestützten Vakuumprozessen |
| US9862640B2 (en) | 2010-01-16 | 2018-01-09 | Cardinal Cg Company | Tin oxide overcoat indium tin oxide coatings, coated glazings, and production methods |
| US10000411B2 (en) | 2010-01-16 | 2018-06-19 | Cardinal Cg Company | Insulating glass unit transparent conductivity and low emissivity coating technology |
| US10060180B2 (en) | 2010-01-16 | 2018-08-28 | Cardinal Cg Company | Flash-treated indium tin oxide coatings, production methods, and insulating glass unit transparent conductive coating technology |
| US11155493B2 (en) | 2010-01-16 | 2021-10-26 | Cardinal Cg Company | Alloy oxide overcoat indium tin oxide coatings, coated glazings, and production methods |
| US10000965B2 (en) | 2010-01-16 | 2018-06-19 | Cardinal Cg Company | Insulating glass unit transparent conductive coating technology |
| CN103187225B (zh) * | 2011-12-28 | 2015-10-21 | 中微半导体设备(上海)有限公司 | 一种可监测刻蚀过程的等离子体处理装置 |
| JP6244103B2 (ja) * | 2012-05-04 | 2017-12-06 | ヴァイアヴィ・ソリューションズ・インコーポレイテッドＶｉａｖｉ Ｓｏｌｕｔｉｏｎｓ Ｉｎｃ． | 反応性スパッタ堆積のための方法および反応性スパッタ堆積システム |
| CN104937131B (zh) * | 2013-01-23 | 2018-01-16 | 株式会社尼康 | 成膜装置和膜的制造方法 |
| DE112016001033T5 (de) * | 2015-03-03 | 2017-12-21 | Semiconductor Energy Laboratory Co., Ltd. | Halbleitervorrichtung, Verfahren zum Herstellen derselben oder Anzeigevorrichtung mit derselben |
| US11028012B2 (en) | 2018-10-31 | 2021-06-08 | Cardinal Cg Company | Low solar heat gain coatings, laminated glass assemblies, and methods of producing same |
| CN112746259B (zh) * | 2020-12-30 | 2023-06-23 | 尚越光电科技股份有限公司 | 一种通过等离子体辉光光谱来控制磁控溅射镀膜杂质含量的方法 |
| US12224159B1 (en) * | 2023-08-09 | 2025-02-11 | Sky Tech Inc. | Gas mixing method to enhance plasma |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US738926A (en) * | 1902-10-13 | 1903-09-15 | Harry E Myers | Trolley. |
| FR1541499A (fr) * | 1966-10-31 | 1968-10-04 | Air Reduction | Procédé et appareil de contrôle de la densité d'une vapeur par spectroscopie |
| US3738926A (en) * | 1972-03-28 | 1973-06-12 | Bell Canada | Method and apparatus for controlling the electrical properties of sputtered films |
| US4036167A (en) * | 1976-01-30 | 1977-07-19 | Inficon Leybold-Heraeus Inc. | Apparatus for monitoring vacuum deposition processes |
| US4113599A (en) * | 1977-09-26 | 1978-09-12 | Ppg Industries, Inc. | Sputtering technique for the deposition of indium oxide |
| US4166784A (en) * | 1978-04-28 | 1979-09-04 | Applied Films Lab, Inc. | Feedback control for vacuum deposition apparatus |
| JPS55157233A (en) * | 1979-05-28 | 1980-12-06 | Hitachi Ltd | Method and apparatus for monitoring etching |
-
1981
- 1981-03-31 JP JP56048258A patent/JPS57161063A/ja active Pending
-
1982
- 1982-03-30 GB GB8209333A patent/GB2097428A/en not_active Withdrawn
- 1982-03-31 US US06/363,777 patent/US4407709A/en not_active Expired - Fee Related
- 1982-03-31 BE BE0/207717A patent/BE892711A/fr not_active IP Right Cessation
- 1982-03-31 FR FR8205508A patent/FR2503190A1/fr active Pending
- 1982-03-31 DE DE19823212037 patent/DE3212037A1/de not_active Withdrawn
Also Published As
| Publication number | Publication date |
|---|---|
| FR2503190A1 (fr) | 1982-10-08 |
| DE3212037A1 (de) | 1982-10-21 |
| JPS57161063A (en) | 1982-10-04 |
| GB2097428A (en) | 1982-11-03 |
| US4407709A (en) | 1983-10-04 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RE | Patent lapsed |
Owner name: NIPPON SHEET GLASS CO. Effective date: 19850331 |