BE841190A - PHOTOSENSITIVE COPY MATERIAL - Google Patents

PHOTOSENSITIVE COPY MATERIAL

Info

Publication number: BE841190A
Authority: BE; Belgium
Prior art keywords: copy material; photosensitive copy; photosensitive; copy
Prior art date: 1975-04-29

Application number

BE166510A

Other languages

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1975-04-29

Filing date

1976-04-27

Publication date

1976-10-27

1976-04-27 Application filed filed Critical

1976-10-27 Publication of BE841190A publication Critical patent/BE841190A/en

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
- G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides

Landscapes

Physics & Mathematics (AREA)
Spectroscopy & Molecular Physics (AREA)
General Physics & Mathematics (AREA)
Photosensitive Polymer And Photoresist Processing (AREA)

BE166510A 1975-04-29 1976-04-27 PHOTOSENSITIVE COPY MATERIAL BE841190A (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
US57266275A	1975-04-29	1975-04-29

Publications (1)

Publication Number	Publication Date
BE841190A true BE841190A (en)	1976-10-27

Family

ID=24288819

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
BE166510A BE841190A (en)	1975-04-29	1976-04-27	PHOTOSENSITIVE COPY MATERIAL

Country Status (4)

Country	Link
BE (1)	BE841190A (en)
DE (1)	DE2617088A1 (en)
FR (1)	FR2309896A1 (en)
GB (1)	GB1546971A (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
CA1119447A (en) *	1978-09-06	1982-03-09	John P. Vikesland	Positive-acting photoresist composition containing a crosslinked urethane resin, a cured epoxy resin and a photosensitizer
DE3023201A1 (en) *	1980-06-21	1982-01-07	Hoechst Ag, 6000 Frankfurt	POSITIVELY WORKING RADIATION-SENSITIVE MIXTURE
EP0087262A1 (en) *	1982-02-22	1983-08-31	Minnesota Mining And Manufacturing Company	Positive acting photosensitive compositions
DE3445276A1 (en) *	1984-12-12	1986-06-19	Hoechst Ag, 6230 Frankfurt	RADIATION-SENSITIVE MIXTURE, LIGHT-SENSITIVE RECORDING MATERIAL MADE THEREOF AND METHOD FOR PRODUCING A FLAT PRINTING FORM
EP0704718B1 (en) *	1989-12-01	2002-03-20	Tosoh Corporation	Positive photosensitive composition for forming lenses
US6462107B1 (en) *	1997-12-23	2002-10-08	The Texas A&M University System	Photoimageable compositions and films for printed wiring board manufacture
EP2233288A1 (en) *	2009-03-23	2010-09-29	Founder Fine Chemical Industry Co., Ltd.	Radiation sensitive composition and method for preparing radiation sensitive composition

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
FR1538320A (en) *	1965-11-02	1968-09-06	Ferrania Spa	Manufacturing process of presensitized dies for offset printing
DE2053363C3 (en) *	1970-10-30	1980-09-18	Hoechst Ag, 6000 Frankfurt	Photosensitive mixture
AR205345A1 (en) *	1973-06-20	1976-04-30	Minnesota Mining & Mfg	PHOTOSENSITIVE ORGANOPHILIC COMPOSITION AND LITHOGRAPHIC PLATE PREPARED WITH THE SAME

1976
- 1976-04-17 DE DE19762617088 patent/DE2617088A1/en not_active Withdrawn
- 1976-04-27 BE BE166510A patent/BE841190A/en not_active IP Right Cessation
- 1976-04-27 GB GB1703676A patent/GB1546971A/en not_active Expired
- 1976-04-28 FR FR7612538A patent/FR2309896A1/en active Granted

Also Published As

Publication number	Publication date
DE2617088A1 (en)	1976-11-11
GB1546971A (en)	1979-06-06
FR2309896A1 (en)	1976-11-26
FR2309896B1 (en)	1979-04-20

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IT1066484B (en)	1985-03-12	ELECTROPHOTOGRAPHIC COPIER
IT1057378B (en)	1982-03-10	ELECTROPHOTOGRAPHIC COPIER

Legal Events

Date	Code	Title	Description
1984-10-31	RE	Patent lapsed	Owner name: PROCEDE ET INSTALLATION POUR LA CONFECTION DE LAME Effective date: 19840427

Date

Code

Title

Description

1984-10-31

Patent lapsed

Owner name: PROCEDE ET INSTALLATION POUR LA CONFECTION DE LAME

Effective date: 19840427