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BE797385R - Thin mineral film deposition appts - using plasma excited by rf induction - Google Patents

Thin mineral film deposition appts - using plasma excited by rf induction

Info

Publication number
BE797385R
BE797385R BE129306A BE129306A BE797385R BE 797385 R BE797385 R BE 797385R BE 129306 A BE129306 A BE 129306A BE 129306 A BE129306 A BE 129306A BE 797385 R BE797385 R BE 797385R
Authority
BE
Belgium
Prior art keywords
appts
cavity
induction
film deposition
plasma
Prior art date
Application number
BE129306A
Other languages
French (fr)
Original Assignee
Univ L Etat A Mons
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to GB1954472A priority Critical patent/GB1356769A/en
Application filed by Univ L Etat A Mons filed Critical Univ L Etat A Mons
Priority to BE129306A priority patent/BE797385R/en
Application granted granted Critical
Publication of BE797385R publication Critical patent/BE797385R/en
Priority to CH348974A priority patent/CH581198A5/xx
Priority to DE2412928A priority patent/DE2412928A1/en
Priority to JP49033156A priority patent/JPS5026778A/ja
Priority to GB1337874A priority patent/GB1419239A/en
Priority to US455097A priority patent/US3922214A/en
Priority to NLAANVRAGE7404173,A priority patent/NL178700C/en
Priority to IT20536/74A priority patent/IT1007402B/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/228—Gas flow assisted PVD deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3471—Introduction of auxiliary energy into the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/342—Hollow targets

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

The substrate is mounted centrally in an upper vacuum chanber communicating via a concentric opening with a cavity in which the plasma is formed. The wall of the cavity and a coaxial central electrode of the material to be deposited are connected to a voltage source and inert or reactive gas fed into the cavity is excited into a plasma by an external RF induction coil surrounding the cavity. Appts. gives uniform deposition esp. of refractory material.
BE129306A 1971-04-27 1973-03-27 Thin mineral film deposition appts - using plasma excited by rf induction BE797385R (en)

Priority Applications (9)

Application Number Priority Date Filing Date Title
GB1954472A GB1356769A (en) 1973-03-27 1972-04-27 Apparatus and method for depositing thin layers on a substrate
BE129306A BE797385R (en) 1971-04-27 1973-03-27 Thin mineral film deposition appts - using plasma excited by rf induction
CH348974A CH581198A5 (en) 1973-03-27 1974-03-13
DE2412928A DE2412928A1 (en) 1973-03-27 1974-03-18 DEVICE FOR THE PRODUCTION OF THIN MINERAL LAYERS
JP49033156A JPS5026778A (en) 1973-03-27 1974-03-26
GB1337874A GB1419239A (en) 1973-03-27 1974-03-26 Apparatus for the vacuum deposition of thin layers on the surface of a substrate
US455097A US3922214A (en) 1973-03-27 1974-03-27 Device for manufacturing thin layers of mineral substances
NLAANVRAGE7404173,A NL178700C (en) 1973-03-27 1974-03-27 Apparatus for depositing a thin layer on a substrate.
IT20536/74A IT1007402B (en) 1973-03-27 1974-04-08 DEVICE FOR MANUFACTURING THIN LAYERS OF INORGANIC SUBSTANCES

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
BE102716 1971-04-27
BE129306A BE797385R (en) 1971-04-27 1973-03-27 Thin mineral film deposition appts - using plasma excited by rf induction

Publications (1)

Publication Number Publication Date
BE797385R true BE797385R (en) 1973-07-16

Family

ID=25647551

Family Applications (1)

Application Number Title Priority Date Filing Date
BE129306A BE797385R (en) 1971-04-27 1973-03-27 Thin mineral film deposition appts - using plasma excited by rf induction

Country Status (1)

Country Link
BE (1) BE797385R (en)

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