AU6689296A - Low cost local interconnect process - Google Patents
Low cost local interconnect processInfo
- Publication number
- AU6689296A AU6689296A AU66892/96A AU6689296A AU6689296A AU 6689296 A AU6689296 A AU 6689296A AU 66892/96 A AU66892/96 A AU 66892/96A AU 6689296 A AU6689296 A AU 6689296A AU 6689296 A AU6689296 A AU 6689296A
- Authority
- AU
- Australia
- Prior art keywords
- low cost
- local interconnect
- interconnect process
- cost local
- low
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
- H01L21/76895—Local interconnects; Local pads, as exemplified by patent document EP0896365
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
- H01L21/76886—Modifying permanently or temporarily the pattern or the conductivity of conductive members, e.g. formation of alloys, reduction of contact resistances
- H01L21/76889—Modifying permanently or temporarily the pattern or the conductivity of conductive members, e.g. formation of alloys, reduction of contact resistances by forming silicides of refractory metals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/532—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body characterised by the materials
- H01L23/53204—Conductive materials
- H01L23/53271—Conductive materials containing semiconductor material, e.g. polysilicon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US510811 | 1983-07-05 | ||
US51081195A | 1995-08-03 | 1995-08-03 | |
PCT/US1996/012695 WO1997006560A1 (en) | 1995-08-03 | 1996-08-05 | Low cost local interconnect process |
Publications (1)
Publication Number | Publication Date |
---|---|
AU6689296A true AU6689296A (en) | 1997-03-05 |
Family
ID=24032302
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU66892/96A Abandoned AU6689296A (en) | 1995-08-03 | 1996-08-05 | Low cost local interconnect process |
Country Status (2)
Country | Link |
---|---|
AU (1) | AU6689296A (en) |
WO (1) | WO1997006560A1 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6576544B1 (en) * | 2001-09-28 | 2003-06-10 | Lsi Logic Corporation | Local interconnect |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56134757A (en) * | 1980-03-26 | 1981-10-21 | Nec Corp | Complementary type mos semiconductor device and its manufacture |
JPS6010673A (en) * | 1983-06-30 | 1985-01-19 | Fujitsu Ltd | semiconductor equipment |
US4821085A (en) * | 1985-05-01 | 1989-04-11 | Texas Instruments Incorporated | VLSI local interconnect structure |
EP0239825B1 (en) * | 1986-03-21 | 1993-08-25 | Siemens Aktiengesellschaft | Method for producing a bipolar transistor structure for very high speed switchings |
JP2757927B2 (en) * | 1990-06-28 | 1998-05-25 | インターナショナル・ビジネス・マシーンズ・コーポレイション | Method of interconnecting spaced silicon regions on a semiconductor substrate |
JP3252518B2 (en) * | 1993-03-19 | 2002-02-04 | ソニー株式会社 | Dry etching method |
US5545584A (en) * | 1995-07-03 | 1996-08-13 | Taiwan Semiconductor Manufacturing Company | Unified contact plug process for static random access memory (SRAM) having thin film transistors |
-
1996
- 1996-08-05 WO PCT/US1996/012695 patent/WO1997006560A1/en active Application Filing
- 1996-08-05 AU AU66892/96A patent/AU6689296A/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
WO1997006560A1 (en) | 1997-02-20 |
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