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AU4395099A - Exposure method and device - Google Patents

Exposure method and device

Info

Publication number
AU4395099A
AU4395099A AU43950/99A AU4395099A AU4395099A AU 4395099 A AU4395099 A AU 4395099A AU 43950/99 A AU43950/99 A AU 43950/99A AU 4395099 A AU4395099 A AU 4395099A AU 4395099 A AU4395099 A AU 4395099A
Authority
AU
Australia
Prior art keywords
exposure method
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU43950/99A
Inventor
Taro Ogata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU4395099A publication Critical patent/AU4395099A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
AU43950/99A 1999-06-30 1999-06-30 Exposure method and device Abandoned AU4395099A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP1999/003534 WO2001003170A1 (en) 1999-06-30 1999-06-30 Exposure method and device

Publications (1)

Publication Number Publication Date
AU4395099A true AU4395099A (en) 2001-01-22

Family

ID=14236127

Family Applications (1)

Application Number Title Priority Date Filing Date
AU43950/99A Abandoned AU4395099A (en) 1999-06-30 1999-06-30 Exposure method and device

Country Status (2)

Country Link
AU (1) AU4395099A (en)
WO (1) WO2001003170A1 (en)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4370581B2 (en) * 2003-02-17 2009-11-25 株式会社ニコン Exposure apparatus and optical member for exposure apparatus
WO2004090952A1 (en) 2003-04-09 2004-10-21 Nikon Corporation Exposure method and apparatus, and device manufacturing method
TWI609409B (en) 2003-10-28 2017-12-21 尼康股份有限公司 Optical illumination device, exposure device, exposure method and device manufacturing method
TWI612338B (en) 2003-11-20 2018-01-21 尼康股份有限公司 Optical illuminating apparatus, exposure device, exposure method, and device manufacturing method
TWI505329B (en) 2004-02-06 2015-10-21 尼康股份有限公司 Optical illumination apparatus, light-exposure apparatus, light-exposure method and device manufacturing method
KR101544336B1 (en) 2005-05-12 2015-08-12 가부시키가이샤 니콘 Projection optical system, exposure apparatus and exposure method
US8451427B2 (en) 2007-09-14 2013-05-28 Nikon Corporation Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
JP5267029B2 (en) 2007-10-12 2013-08-21 株式会社ニコン Illumination optical apparatus, exposure apparatus, and device manufacturing method
CN101681125B (en) 2007-10-16 2013-08-21 株式会社尼康 Illumination optical system, exposure apparatus, and device manufacturing method
KR101562073B1 (en) 2007-10-16 2015-10-21 가부시키가이샤 니콘 Illumination optical system, exposure apparatus, and device manufacturing method
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
WO2009145048A1 (en) 2008-05-28 2009-12-03 株式会社ニコン Inspection device and inspecting method for spatial light modulator, illuminating optical system, method for adjusting the illuminating optical system, exposure device, and device manufacturing method

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2815010B2 (en) * 1997-04-07 1998-10-27 株式会社ニコン Projection optical device and imaging characteristic adjustment method
JPH1116816A (en) * 1997-06-25 1999-01-22 Nikon Corp Projection aligner, method for exposure with the device, and method for manufacturing circuit device using the device
JPH11135428A (en) * 1997-08-27 1999-05-21 Nikon Corp Projection light alignment and projection aligner

Also Published As

Publication number Publication date
WO2001003170A1 (en) 2001-01-11

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase