AU2001273259A1 - Differentially-pumped material processing system - Google Patents

Differentially-pumped material processing system

Info

Publication number: AU2001273259A1
Authority: AU; Australia
Prior art keywords: differentially; processing system; material processing; pumped material; pumped
Prior art date: 2000-07-10
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Abandoned

Application number

AU2001273259A

Inventor

Piero Sferlazzo

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Oerlikon Management USA Inc

Original Assignee

Unaxis USA Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2000-07-10

Filing date

2001-07-09

Publication date

2002-01-21

2001-07-09 Application filed by Unaxis USA Inc filed Critical Unaxis USA Inc

2002-01-21 Publication of AU2001273259A1 publication Critical patent/AU2001273259A1/en

Status Abandoned legal-status Critical Current

Classifications

- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/228—Gas flow assisted PVD deposition
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
- C23C14/044—Coating on selected surface areas, e.g. using masks using masks using masks to redistribute rather than totally prevent coating, e.g. producing thickness gradient
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/46—Sputtering by ion beam produced by an external ion source

Landscapes

Chemical & Material Sciences (AREA)
Chemical Kinetics & Catalysis (AREA)
Engineering & Computer Science (AREA)
Materials Engineering (AREA)
Mechanical Engineering (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Physical Vapour Deposition (AREA)

AU2001273259A 2000-07-10 2001-07-09 Differentially-pumped material processing system Abandoned AU2001273259A1 (en)

Applications Claiming Priority (7)

Application Number	Priority Date	Filing Date	Title
US21704900P	2000-07-10	2000-07-10
US60217049		2000-07-10
US26611401P	2001-02-02	2001-02-02
US60266114		2001-02-02
US09840393		2001-04-23
US09/840,393 US6495010B2 (en)	2000-07-10	2001-04-23	Differentially-pumped material processing system
PCT/US2001/021516 WO2002005324A2 (en)	2000-07-10	2001-07-09	Differentially-pumped material processing system

Publications (1)

Publication Number	Publication Date
AU2001273259A1 true AU2001273259A1 (en)	2002-01-21

Family

ID=27396362

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
AU2001273259A Abandoned AU2001273259A1 (en)	2000-07-10	2001-07-09	Differentially-pumped material processing system

Country Status (6)

Country	Link
US (1)	US6495010B2 (en)
EP (1)	EP1301650A2 (en)
JP (1)	JP2004524435A (en)
CN (1)	CN1208494C (en)
AU (1)	AU2001273259A1 (en)
WO (1)	WO2002005324A2 (en)

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US8347814B2 (en) *	2008-01-22	2013-01-08	Raytheon Canada Limited	Method and apparatus for coating a curved surface
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US20110020623A1 (en) *	2009-07-22	2011-01-27	Raytheon Company	Method and Apparatus for Repairing an Optical Component Substrate Through Coating
KR101442941B1 (en) *	2010-03-09	2014-09-22	샤프 가부시키가이샤	Vapor deposition mask, vapor deposition apparatus and vapor deposition method
US20110229659A1 (en) *	2010-03-22	2011-09-22	Timothy Ray Reynolds	Ion beam assisted deposition of ophthalmic lens coatings
US8758580B2 (en)	2010-08-23	2014-06-24	Vaeco Inc.	Deposition system with a rotating drum
JP5362920B2 (en) *	2010-12-03	2013-12-11	シャープ株式会社	Vapor deposition equipment and recovery equipment
SG11201402177XA (en)	2011-11-08	2014-06-27	Intevac Inc	Substrate processing system and method
WO2014100506A1 (en)	2012-12-19	2014-06-26	Intevac, Inc.	Grid for plasma ion implant
US20140262749A1 (en) *	2013-03-14	2014-09-18	Intermolecular, Inc.	Methods of Plasma Surface Treatment in a PVD Chamber
CN106030761B (en)	2014-01-27	2019-09-13	威科仪器有限公司	Chip carrier and its manufacturing method for chemical gas-phase deposition system
WO2018052642A1 (en) *	2016-09-13	2018-03-22	Applied Materials, Inc.	A single oxide metal deposition chamber
EP3366804B1 (en) *	2017-02-22	2022-05-11	Satisloh AG	Box coating apparatus for vacuum coating of substrates, in particular spectacle lenses
JP7039234B2 (en) *	2017-09-29	2022-03-22	芝浦メカトロニクス株式会社	Film forming equipment
WO2019126017A1 (en) *	2017-12-18	2019-06-27	Applied Materials, Inc.	Methods and apparatus for physical vapor deposition
JP7134009B2 (en) *	2018-07-31	2022-09-09	東京エレクトロン株式会社	Film forming apparatus and film forming method

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2001
- 2001-04-23 US US09/840,393 patent/US6495010B2/en not_active Expired - Fee Related
- 2001-07-09 EP EP01952518A patent/EP1301650A2/en not_active Withdrawn
- 2001-07-09 CN CN01814637.6A patent/CN1208494C/en not_active Expired - Fee Related
- 2001-07-09 WO PCT/US2001/021516 patent/WO2002005324A2/en active Application Filing
- 2001-07-09 JP JP2002509089A patent/JP2004524435A/en active Pending
- 2001-07-09 AU AU2001273259A patent/AU2001273259A1/en not_active Abandoned

Also Published As

Publication number	Publication date
WO2002005324A3 (en)	2002-06-20
US6495010B2 (en)	2002-12-17
EP1301650A2 (en)	2003-04-16
WO2002005324A2 (en)	2002-01-17
CN1208494C (en)	2005-06-29
US20020003086A1 (en)	2002-01-10
JP2004524435A (en)	2004-08-12
CN1449455A (en)	2003-10-15

Publication	Publication Date	Title
AU2001273259A1 (en)	2002-01-21	Differentially-pumped material processing system
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AU2001259377A1 (en)	2001-12-17	Material transport system
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AU2001268656A1 (en)	2002-01-21	Automated processing system
AU2001294835A1 (en)	2002-04-15	Video processing
AU2001253513A1 (en)	2001-11-12	Substrate processing system
AU2001288233A1 (en)	2002-02-18	Flexible preamble processing
AU4262601A (en)	2001-10-15	Image processing
AU2001279535A1 (en)	2002-05-30	Bone-regeneration material
AU6408601A (en)	2001-12-24	A distributed processing system
AU2993200A (en)	2000-08-29	Multiple processing system
AU2001241521A1 (en)	2001-09-03	Wafer processing system
AU2001284775A1 (en)	2002-02-25	Anti-balling system
AUPR062500A0 (en)	2000-11-02	Message processing
AU2001252656A1 (en)	2001-11-12	Material selling system
AU2001238041A1 (en)	2001-08-27	Separate account processing
AU2001230253A1 (en)	2001-08-14	Processing method
AU2555699A (en)	1999-08-16	Processing unit
AU4682799A (en)	1999-12-30	Processing system
AU2001289885A1 (en)	2002-04-02	Air-preparation system
AU2001274345A1 (en)	2002-01-21	Processing an object