[go: up one dir, main page]

AU2001265093A1 - Methods and apparatus for plasma processing - Google Patents

Methods and apparatus for plasma processing

Info

Publication number
AU2001265093A1
AU2001265093A1 AU2001265093A AU6509301A AU2001265093A1 AU 2001265093 A1 AU2001265093 A1 AU 2001265093A1 AU 2001265093 A AU2001265093 A AU 2001265093A AU 6509301 A AU6509301 A AU 6509301A AU 2001265093 A1 AU2001265093 A1 AU 2001265093A1
Authority
AU
Australia
Prior art keywords
methods
plasma processing
plasma
processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001265093A
Inventor
Jason F. Elston
Russell F. Jewett
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of AU2001265093A1 publication Critical patent/AU2001265093A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32357—Generation remote from the workpiece, e.g. down-stream
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/30—Plasma torches using applied electromagnetic fields, e.g. high frequency or microwave energy

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Treatment Of Fiber Materials (AREA)
AU2001265093A 2000-05-25 2001-05-25 Methods and apparatus for plasma processing Abandoned AU2001265093A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US20800900P 2000-05-25 2000-05-25
US60208009 2000-05-25
PCT/US2001/017266 WO2001093315A2 (en) 2000-05-25 2001-05-25 Methods and apparatus for plasma processing

Publications (1)

Publication Number Publication Date
AU2001265093A1 true AU2001265093A1 (en) 2001-12-11

Family

ID=22772854

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001265093A Abandoned AU2001265093A1 (en) 2000-05-25 2001-05-25 Methods and apparatus for plasma processing

Country Status (3)

Country Link
US (1) US6696662B2 (en)
AU (1) AU2001265093A1 (en)
WO (1) WO2001093315A2 (en)

Families Citing this family (55)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6888040B1 (en) * 1996-06-28 2005-05-03 Lam Research Corporation Method and apparatus for abatement of reaction products from a vacuum processing chamber
US7100532B2 (en) 2001-10-09 2006-09-05 Plasma Control Systems, Llc Plasma production device and method and RF driver circuit with adjustable duty cycle
US7132996B2 (en) 2001-10-09 2006-11-07 Plasma Control Systems Llc Plasma production device and method and RF driver circuit
US7084832B2 (en) 2001-10-09 2006-08-01 Plasma Control Systems, Llc Plasma production device and method and RF driver circuit with adjustable duty cycle
US6841201B2 (en) * 2001-12-21 2005-01-11 The Procter & Gamble Company Apparatus and method for treating a workpiece using plasma generated from microwave radiation
AUPS044202A0 (en) * 2002-02-11 2002-03-07 Varian Australia Pty Ltd Microwave plasma source
US20040045578A1 (en) * 2002-05-03 2004-03-11 Jackson David P. Method and apparatus for selective treatment of a precision substrate surface
JP2004055614A (en) * 2002-07-16 2004-02-19 Tokyo Electron Ltd Plasma processing apparatus
US20040216845A1 (en) * 2003-05-02 2004-11-04 Czeslaw Golkowski Non-thermal plasma generator device
US20060272674A1 (en) * 2005-06-02 2006-12-07 Cerionx, Inc. Method and apparatus for cleaning and surface conditioning objects using plasma
US20060162740A1 (en) * 2005-01-21 2006-07-27 Cerionx, Inc. Method and apparatus for cleaning and surface conditioning objects using non-equilibrium atmospheric pressure plasma
EP1631701A4 (en) * 2003-06-16 2009-01-07 Cerionx Inc Atmospheric pressure non-thermal plasma device to clean and sterilize the surface of probes, cannulas, pin tools, pipettes and spray heads
US20060272675A1 (en) * 2005-06-02 2006-12-07 Cerionx, Inc. Method and apparatus for cleaning and surface conditioning objects using plasma
US8092644B2 (en) * 2003-06-16 2012-01-10 Ionfield Systems, Llc Method and apparatus for cleaning and surface conditioning objects using plasma
US8092643B2 (en) * 2003-06-16 2012-01-10 Ionfield Systems, Llc Method and apparatus for cleaning and surface conditioning objects using plasma
US20060162741A1 (en) * 2005-01-26 2006-07-27 Cerionx, Inc. Method and apparatus for cleaning and surface conditioning objects with plasma
US8366871B2 (en) * 2003-06-16 2013-02-05 Ionfield Holdings, Llc Method and apparatus for cleaning and surface conditioning objects using plasma
GB0403797D0 (en) * 2004-02-20 2004-03-24 Boc Group Plc Gas abatement
US7164095B2 (en) * 2004-07-07 2007-01-16 Noritsu Koki Co., Ltd. Microwave plasma nozzle with enhanced plume stability and heating efficiency
JP2008506516A (en) * 2004-07-13 2008-03-06 レール・リキード−ソシエテ・アノニム・プール・レテュード・エ・レクスプロワタシオン・デ・プロセデ・ジョルジュ・クロード Atmospheric pressure plasma treatment of gas emissions
FR2888130A1 (en) * 2005-07-06 2007-01-12 Air Liquide Electronics Sys Gas conversion by chemical bond cleavage in an electric and-or magnetic field, e.g. for treatment of fluorinated effluents from semiconductor production, involves injecting gas into the field in a non-rectilinear manner
US7806077B2 (en) * 2004-07-30 2010-10-05 Amarante Technologies, Inc. Plasma nozzle array for providing uniform scalable microwave plasma generation
US20060052883A1 (en) * 2004-09-08 2006-03-09 Lee Sang H System and method for optimizing data acquisition of plasma using a feedback control module
DE102004046814B3 (en) * 2004-09-27 2006-03-09 Siemens Ag Method and device for influencing combustion processes, in particular for the operation of a gas turbine
GB2442990A (en) * 2004-10-04 2008-04-23 C Tech Innovation Ltd Microwave plasma apparatus
US20060130966A1 (en) * 2004-12-20 2006-06-22 Darko Babic Method and system for flowing a supercritical fluid in a high pressure processing system
US8044319B2 (en) * 2005-02-07 2011-10-25 Pratt & Whitney Canada Corp. Variable arc gap plasma igniter
US20060237030A1 (en) * 2005-04-22 2006-10-26 Cerionx, Inc. Method and apparatus for cleaning and surface conditioning objects with plasma
US7313310B2 (en) * 2005-05-25 2007-12-25 Honeywell International Inc. Plasma directing baffle and method of use
GB0516695D0 (en) * 2005-08-15 2005-09-21 Boc Group Plc Microwave plasma reactor
TW200742506A (en) * 2006-02-17 2007-11-01 Noritsu Koki Co Ltd Plasma generation apparatus and work process apparatus
US8236144B2 (en) * 2007-09-21 2012-08-07 Rf Thummim Technologies, Inc. Method and apparatus for multiple resonant structure process and reaction chamber
US8128788B2 (en) * 2008-09-19 2012-03-06 Rf Thummim Technologies, Inc. Method and apparatus for treating a process volume with multiple electromagnetic generators
US20100074810A1 (en) * 2008-09-23 2010-03-25 Sang Hun Lee Plasma generating system having tunable plasma nozzle
US7921804B2 (en) * 2008-12-08 2011-04-12 Amarante Technologies, Inc. Plasma generating nozzle having impedance control mechanism
US20100201272A1 (en) * 2009-02-09 2010-08-12 Sang Hun Lee Plasma generating system having nozzle with electrical biasing
US20100254853A1 (en) * 2009-04-06 2010-10-07 Sang Hun Lee Method of sterilization using plasma generated sterilant gas
EP2420113A4 (en) 2009-04-14 2014-04-02 Rf Thummim Technologies Inc Method and apparatus for excitation of resonances in molecules
CA2830480A1 (en) 2010-03-17 2011-09-22 Rf Thummim Technologies, Inc. Method and apparatus for electromagnetically producing a disturbance in a medium with simultaneous resonance of acoustic waves created by the disturbance
US9174296B2 (en) * 2010-10-20 2015-11-03 Lam Research Corporation Plasma ignition and sustaining methods and apparatuses
US10639691B1 (en) 2012-01-05 2020-05-05 David P. Jackson Method for forming and applying an oxygenated machining fluid
US10477665B2 (en) * 2012-04-13 2019-11-12 Amastan Technologies Inc. Microwave plasma torch generating laminar flow for materials processing
US9387511B1 (en) 2012-04-15 2016-07-12 Cleanlogix Llc Particle-plasma ablation process for polymeric ophthalmic substrate surface
US20150118416A1 (en) * 2013-10-31 2015-04-30 Semes Co., Ltd. Substrate treating apparatus and method
CN103742942B (en) * 2014-01-08 2015-07-22 温州天球电器有限公司 Automobile-mounted cigarette lighter with protection device
AU2016304411B2 (en) 2015-07-31 2021-01-07 Agilent Technologies, Inc. Chambers for microwave plasma generation
US10109467B2 (en) * 2016-06-01 2018-10-23 Taiwan Semiconductor Manufacturing Co., Ltd. Advanced exhaust system
JP6918200B2 (en) 2017-04-04 2021-08-11 株式会社日立ハイテク Passive electrostatic CO2 composite spray coater
US10264663B1 (en) 2017-10-18 2019-04-16 Lam Research Corporation Matchless plasma source for semiconductor wafer fabrication
US11634323B2 (en) 2018-08-23 2023-04-25 Transform Materials Llc Systems and methods for processing gases
US11633710B2 (en) 2018-08-23 2023-04-25 Transform Materials Llc Systems and methods for processing gases
WO2021183373A1 (en) * 2020-03-13 2021-09-16 Vandermeulen Peter F Methods and systems for medical plasma treatment and generation of plasma activated media
CN111763926A (en) * 2020-07-02 2020-10-13 成都蓝玛尚科技有限公司 Material synthesis system based on high-temperature normal-pressure microwave plasma
FR3119506B1 (en) * 2021-02-03 2023-03-31 Sairem Soc Pour Lapplication Industrielle De La Recherche En Electronique Et Micro Ondes Apparatus for producing a plasma comprising a plasma ignition unit
JP7605569B2 (en) * 2021-07-21 2024-12-24 東京エレクトロン株式会社 Plasma source and plasma processing device

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5329076A (en) 1976-08-31 1978-03-17 Toshiba Corp Plasma treating apparatus of semiconductor substrates
US4463239A (en) * 1982-12-06 1984-07-31 General Electric Company Rotating slot antenna arrangement for microwave oven
US5137701A (en) 1984-09-17 1992-08-11 Mundt Randall S Apparatus and method for eliminating unwanted materials from a gas flow line
FR2591412A1 (en) 1985-12-10 1987-06-12 Air Liquide Method for the production of powders and a sealed microwave plasma reactor
US5083004A (en) 1989-05-09 1992-01-21 Varian Associates, Inc. Spectroscopic plasma torch for microwave induced plasmas
US5051557A (en) 1989-06-07 1991-09-24 The United States Of America As Represented By The Secretary Of The Department Of Health And Human Services Microwave induced plasma torch with tantalum injector probe
US5300202A (en) 1989-08-26 1994-04-05 Helmut Moegel Process and device for disposing of organic vapors, in particular solvent vapors
WO1992014861A1 (en) * 1991-02-26 1992-09-03 Idemitsu Petrochemical Co., Ltd. Microwave plasma cvd device, and method for synthesizing diamond by device thereof
US5349154A (en) 1991-10-16 1994-09-20 Rockwell International Corporation Diamond growth by microwave generated plasma flame
US5453125A (en) 1994-02-17 1995-09-26 Krogh; Ole D. ECR plasma source for gas abatement
US5565118A (en) * 1994-04-04 1996-10-15 Asquith; Joseph G. Self starting plasma plume igniter for aircraft jet engine
DE19507077C1 (en) * 1995-01-25 1996-04-25 Fraunhofer Ges Forschung Plasma reactor for diamond layer deposition
US5793013A (en) 1995-06-07 1998-08-11 Physical Sciences, Inc. Microwave-driven plasma spraying apparatus and method for spraying
US5750823A (en) 1995-07-10 1998-05-12 R.F. Environmental Systems, Inc. Process and device for destruction of halohydrocarbons
FR2751565B1 (en) 1996-07-26 1998-09-04 Air Liquide PROCESS AND PLANT FOR THE TREATMENT OF PERFLUOROUS AND HYDROFLUOROCARBON GASES FOR THEIR DESTRUCTION
FR2757082B1 (en) 1996-12-13 1999-01-15 Air Liquide PROCESS FOR DEPURING A PLASMAGEN GAS AND INSTALLATION FOR THE IMPLEMENTATION OF SUCH A PROCESS

Also Published As

Publication number Publication date
WO2001093315A2 (en) 2001-12-06
US6696662B2 (en) 2004-02-24
US20020020691A1 (en) 2002-02-21
WO2001093315A3 (en) 2002-03-21

Similar Documents

Publication Publication Date Title
AU2001265093A1 (en) Methods and apparatus for plasma processing
AU2001279189A1 (en) Plasma processing method and apparatus
AU2001271030A1 (en) Plasma processing apparatus
AU2001285422A1 (en) Trade receivable processing method and apparatus
AU2001231132A1 (en) Plasma processing system and method
AU2001239926A1 (en) Apparatus and method for volume processing and rendering
AU2003243016A1 (en) Plasma processing apparatus and plasma processing method
AU2003284605A1 (en) Plasma processing apparatus and plasma processing method
AU2003284683A1 (en) Plasma processing method and apparatus
EP1289003A4 (en) Plasma processing apparatus
AU2003284684A1 (en) Plasma processing apparatus and method
AU2003211351A1 (en) Plasma processing device and plasma processing method
AU2002222639A1 (en) Processing method and processing apparatus
AU2003284598A1 (en) Plasma processing apparatus and plasma processing method
AU2002326159A1 (en) Plasma treating apparatus and plasma treating method
AU2001273272A1 (en) Pyrolysis-based fuel processing method and apparatus
AU2003261790A1 (en) Plasma processing method and plasma processing device
AU2001232960A1 (en) Methods and apparatus for processing insulating substrates
AU2001270163A1 (en) Vacuum plasma processor apparatus and method
AU3853900A (en) Arc detection method and apparatus
EP1091396A3 (en) Plasma processing method
AU2001261266A1 (en) Plasma processing method and apparatus
EP1154466A4 (en) Method and apparatus for plasma processing
AU2002222137A1 (en) Method and apparatus for processing waste
AU2001241518A1 (en) Vacuum ear-folding process and apparatus