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ATE491762T1 - Verfahren zum abtrennen von hochtemperaturfilmen und/oder vorrichtungen von metallsubstraten - Google Patents

Verfahren zum abtrennen von hochtemperaturfilmen und/oder vorrichtungen von metallsubstraten

Info

Publication number
ATE491762T1
ATE491762T1 AT06802491T AT06802491T ATE491762T1 AT E491762 T1 ATE491762 T1 AT E491762T1 AT 06802491 T AT06802491 T AT 06802491T AT 06802491 T AT06802491 T AT 06802491T AT E491762 T1 ATE491762 T1 AT E491762T1
Authority
AT
Austria
Prior art keywords
metallic substrate
devices
high temperature
polymeric film
metal substrates
Prior art date
Application number
AT06802491T
Other languages
English (en)
Inventor
Nicole Anderson
Dimitris Elias Katsoulis
Bizhong Zhu
Original Assignee
Dow Corning
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dow Corning filed Critical Dow Corning
Application granted granted Critical
Publication of ATE491762T1 publication Critical patent/ATE491762T1/de

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22C—FOUNDRY MOULDING
    • B22C3/00—Selection of compositions for coating the surfaces of moulds, cores, or patterns
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18—Manufacture of films or sheets
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C37/00—Component parts, details, accessories or auxiliary operations, not covered by group B29C33/00 or B29C35/00
    • B29C37/0067—Using separating agents during or after moulding; Applying separating agents on preforms or articles, e.g. to prevent sticking to each other
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2383/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen, or carbon only; Derivatives of such polymers
    • C08J2383/04—Polysiloxanes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49117—Conductor or circuit manufacturing
    • Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49117—Conductor or circuit manufacturing
    • Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/49155—Manufacturing circuit on or in base
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49227—Insulator making
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31652—Of asbestos
    • Y10T428/31663—As siloxane, silicone or silane

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Mechanical Engineering (AREA)
  • Laminated Bodies (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Drying Of Semiconductors (AREA)
  • ing And Chemical Polishing (AREA)
  • Formation Of Insulating Films (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
AT06802491T 2005-09-29 2006-08-30 Verfahren zum abtrennen von hochtemperaturfilmen und/oder vorrichtungen von metallsubstraten ATE491762T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US72170805P 2005-09-29 2005-09-29
PCT/US2006/033548 WO2007040870A1 (en) 2005-09-29 2006-08-30 Method of releasing high temperature films and/or devices from metallic substrates

Publications (1)

Publication Number Publication Date
ATE491762T1 true ATE491762T1 (de) 2011-01-15

Family

ID=37496438

Family Applications (1)

Application Number Title Priority Date Filing Date
AT06802491T ATE491762T1 (de) 2005-09-29 2006-08-30 Verfahren zum abtrennen von hochtemperaturfilmen und/oder vorrichtungen von metallsubstraten

Country Status (9)

Country Link
US (2) US8356407B2 (de)
EP (1) EP1940989B1 (de)
JP (1) JP2009510216A (de)
KR (1) KR101285575B1 (de)
CN (1) CN101278025A (de)
AT (1) ATE491762T1 (de)
DE (1) DE602006018976D1 (de)
TW (1) TWI404221B (de)
WO (1) WO2007040870A1 (de)

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JP5313478B2 (ja) * 2007-10-05 2013-10-09 東レ・ダウコーニング株式会社 セラミック状酸化ケイ素系被膜の形成方法、セラミック状酸化ケイ素系被膜を有する無機質基材の製造方法、セラミック状酸化ケイ素系被膜形成剤および半導体装置
ATE524530T1 (de) * 2008-01-30 2011-09-15 Dow Corning Verwendung von glasartigen siliconbasierten hartbeschichtungen als trennbeschichtungen für druckbare elektronik
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US20170326850A1 (en) * 2014-12-03 2017-11-16 Tokyo Ohka Kogy Co., Ltd. Laminate production method, substrate processing method, and laminate
CN105118893A (zh) * 2015-08-31 2015-12-02 苏州瑞晟纳米科技有限公司 一种微晶玻璃覆盖柔性薄膜太阳能电池样片的热处理方法
DE102015015452A1 (de) * 2015-12-02 2017-06-08 Forschungszentrum Jülich GmbH Verfahren zum Planarisieren von Nanostrukturen
TW201806779A (zh) 2016-05-16 2018-03-01 道康寧公司 用於顯示裝置基板處理之包括矽倍半氧烷聚合物及矽烷中至少一者的黏合劑剝離層
CN106009016A (zh) * 2016-08-11 2016-10-12 潘忠宁 一种单分散聚倍半硅氧烷球形薄膜制备方法
CN111629899A (zh) * 2018-01-17 2020-09-04 Ａｇｃ株式会社 层叠体、层叠体的制造方法和电子设备的制造方法

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Also Published As

Publication number Publication date
EP1940989B1 (de) 2010-12-15
TWI404221B (zh) 2013-08-01
US8356407B2 (en) 2013-01-22
KR101285575B1 (ko) 2013-07-15
KR20080063761A (ko) 2008-07-07
WO2007040870A1 (en) 2007-04-12
JP2009510216A (ja) 2009-03-12
US20090098393A1 (en) 2009-04-16
CN101278025A (zh) 2008-10-01
EP1940989A1 (de) 2008-07-09
US20130108501A1 (en) 2013-05-02
DE602006018976D1 (de) 2011-01-27
TW200721524A (en) 2007-06-01

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