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ATE429468T1 - FLUORINATED PHOTOINITIATORS IN DUAL-CURE RESINS - Google Patents

FLUORINATED PHOTOINITIATORS IN DUAL-CURE RESINS

Info

Publication number
ATE429468T1
ATE429468T1 AT01996581T AT01996581T ATE429468T1 AT E429468 T1 ATE429468 T1 AT E429468T1 AT 01996581 T AT01996581 T AT 01996581T AT 01996581 T AT01996581 T AT 01996581T AT E429468 T1 ATE429468 T1 AT E429468T1
Authority
AT
Austria
Prior art keywords
present
photoinitiators
dual
cure resins
surface active
Prior art date
Application number
AT01996581T
Other languages
German (de)
Inventor
Gisele Baudin
Tunja Jung
Rinaldo Huesler
Original Assignee
Ciba Holding Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Holding Inc filed Critical Ciba Holding Inc
Application granted granted Critical
Publication of ATE429468T1 publication Critical patent/ATE429468T1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
    • C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
    • C07D295/10—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms
    • C07D295/104—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings
    • C07D295/108—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings to an acyclic saturated chain
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/23—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton
    • C07C323/31—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having the sulfur atom of at least one of the thio groups bound to a carbon atom of a six-membered aromatic ring of the carbon skeleton
    • C07C323/32—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having the sulfur atom of at least one of the thio groups bound to a carbon atom of a six-membered aromatic ring of the carbon skeleton having at least one of the nitrogen atoms bound to an acyclic carbon atom of the carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/62—Halogen-containing esters
    • C07C69/63—Halogen-containing esters of saturated acids
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C07F7/1804—Compounds having Si-O-C linkages

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Paints Or Removers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Optical Fibers, Optical Fiber Cores, And Optical Fiber Bundles (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

The present invention relates to a process for the preparation of scratch-resistant coatings by dual cure of compositions comprising surface active benzoyl compounds wherein at least one non-polar fluorinated alkyl group is present. The invention also relates to a process for concentrating these surface-active photoinitiators in the surface of coatings, to novel surface active benzoyl compounds wherein at least one non-polar fluorinated alkyl group is present, to compositions wherein the novel surface active fluorinated photoinitiators are present, and to a method for improving the flow of a curable composition on substrates.
AT01996581T 2000-11-20 2001-11-13 FLUORINATED PHOTOINITIATORS IN DUAL-CURE RESINS ATE429468T1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP00811098 2000-11-20
PCT/EP2001/013130 WO2002040602A1 (en) 2000-11-20 2001-11-13 Fluorinated-photoinitiators in dual cure resins

Publications (1)

Publication Number Publication Date
ATE429468T1 true ATE429468T1 (en) 2009-05-15

Family

ID=8175040

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01996581T ATE429468T1 (en) 2000-11-20 2001-11-13 FLUORINATED PHOTOINITIATORS IN DUAL-CURE RESINS

Country Status (12)

Country Link
US (1) US20040067311A1 (en)
EP (1) EP1392779B1 (en)
JP (1) JP2004525994A (en)
KR (1) KR100853363B1 (en)
CN (1) CN1235984C (en)
AT (1) ATE429468T1 (en)
AU (1) AU2002218297A1 (en)
BR (1) BR0115471A (en)
CA (1) CA2424477A1 (en)
DE (1) DE60138488D1 (en)
MX (1) MXPA03004456A (en)
WO (1) WO2002040602A1 (en)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1289556C (en) * 2002-02-04 2006-12-13 西巴特殊化学品控股有限公司 Fluorinated photoinitiators in highly fluorinated monomers
JP4501462B2 (en) * 2003-03-12 2010-07-14 Ｔｄｋ株式会社 Object with composite hard coat layer and method for forming composite hard coat layer
AU2004245242A1 (en) * 2003-06-06 2004-12-16 Ciba Specialty Chemicals Holding Inc. Novel surface-active polysiloxane photoinitiators
US20080241567A1 (en) * 2005-05-25 2008-10-02 Sarfraz Ahmed Siddiqui Frosting methods, frosted articles, & frosting liquids
US7244508B2 (en) * 2005-05-25 2007-07-17 Int'l Cellulose Corp. Frosting coating materials, articles, and methods
CA2621186A1 (en) * 2005-09-22 2007-04-12 Ciba Specialty Chemicals Holding Inc. Scratch resistant polymer and coating compositions
EP1948744B1 (en) * 2005-11-17 2010-06-23 DCC IP Corp. Stabilizers for thermosetting powder coating compositions
JP4874689B2 (en) * 2006-03-31 2012-02-15 富士フイルム株式会社 Holographic recording composition and optical recording medium using the same
EP2101716A2 (en) * 2006-12-13 2009-09-23 3M Innovative Properties Company Methods of using a dental composition having an acidic component and a photobleachable dye
JP5207837B2 (en) * 2007-08-02 2013-06-12 富士フイルム株式会社 Curable composition, cured film, method for producing photospacer, substrate for liquid crystal display device and liquid crystal display device
JP5109632B2 (en) * 2007-12-10 2012-12-26 コニカミノルタホールディングス株式会社 Photoinitiator, photopolymerizable composition, and photocuring method
CN101812143B (en) * 2010-04-09 2012-08-29 北京化工大学 Fluorine-containing photoinitiator and application thereof
JP2014009173A (en) * 2012-06-28 2014-01-20 Toray Fine Chemicals Co Ltd Sulfide compound and method of producing the same
CN102912472B (en) * 2012-11-07 2014-07-02 北京化工大学 Method for preparing electrospinning nanofiber with surface photosensitive activity
CN104059402B (en) * 2014-03-04 2017-01-04 深圳市西卡德科技有限公司 A kind of photo-polymerization type photosensitive macromolecular material, preparation method and applications
CN110908234B (en) * 2018-08-28 2022-08-02 深圳光峰科技股份有限公司 Curing adhesive and projection screen thereof
KR102765439B1 (en) * 2021-12-06 2025-02-11 주식회사 테크늄 Compound with acetophenone group, photocurable composition including the same, photocurable film formed from the photocurable composition, and image display including the photocurable film
CN114957302A (en) * 2022-05-10 2022-08-30 常州大学 Carborane fluorine-containing photoinitiator and preparation method and application thereof

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2590895B1 (en) * 1985-12-03 1988-01-15 Atochem FLUORINATED ACRYLIC MONOMERS, DERIVATIVE POLYMERS AND THEIR APPLICATION AS HYDROPHOBIC AND OLEOPHOBIC AGENTS
DE69217559T2 (en) * 1991-12-11 1997-06-05 Allied Signal Inc UV CURING OF FLUORINATED MONOMERS
US6620857B2 (en) * 1996-07-02 2003-09-16 Ciba Specialty Chemicals Corporation Process for curing a polymerizable composition
JP4058112B2 (en) * 1996-07-02 2008-03-05 チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド Method for curing a polymerizable composition
DE19860041A1 (en) * 1998-12-23 2000-06-29 Basf Ag Coating agents curable by addition to isocyanate groups and also by radiation-induced addition to activated C-C double bonds
US6448302B1 (en) * 2000-01-19 2002-09-10 The Sherwin-Williams Company Radiation curable coatings having low gloss and coated articles made therefrom

Also Published As

Publication number Publication date
WO2002040602A1 (en) 2002-05-23
KR20030055313A (en) 2003-07-02
CA2424477A1 (en) 2002-05-23
MXPA03004456A (en) 2003-08-19
CN1474862A (en) 2004-02-11
DE60138488D1 (en) 2009-06-04
KR100853363B1 (en) 2008-08-22
US20040067311A1 (en) 2004-04-08
EP1392779A1 (en) 2004-03-03
EP1392779B1 (en) 2009-04-22
AU2002218297A1 (en) 2002-05-27
CN1235984C (en) 2006-01-11
BR0115471A (en) 2003-08-19
JP2004525994A (en) 2004-08-26

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