[go: up one dir, main page]

ATE393840T1 - METHOD FOR TEMPERATURE-CONTROLLED VAPOR DEPOSITION ON A SUBSTRATE - Google Patents

METHOD FOR TEMPERATURE-CONTROLLED VAPOR DEPOSITION ON A SUBSTRATE

Info

Publication number
ATE393840T1
ATE393840T1 AT01923924T AT01923924T ATE393840T1 AT E393840 T1 ATE393840 T1 AT E393840T1 AT 01923924 T AT01923924 T AT 01923924T AT 01923924 T AT01923924 T AT 01923924T AT E393840 T1 ATE393840 T1 AT E393840T1
Authority
AT
Austria
Prior art keywords
substrate
vapor deposition
temperature
layer
substance
Prior art date
Application number
AT01923924T
Other languages
German (de)
Inventor
Dina Katsir
Zvi Finkelstein
Israel Tartakovsky
Original Assignee
Acktar Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Acktar Ltd filed Critical Acktar Ltd
Application granted granted Critical
Publication of ATE393840T1 publication Critical patent/ATE393840T1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

A method of controlling the temperature of a low thermal emittance substrate (18) during a vapor deposition process which includes a first step of forming a preselected substance on a first side of the substrate (18) by vapor deposition, the substance having a high thermal emittance layer (40). The method includes a second step of forming on a second side of the substrate, a layer of a preselected substance (42), where the layer on the first side (42) radiates excess heat away from the substrate (18), thereby preventing heating of the substrate (18) to more than a predetermined temperature. Several multi-stage, free-span, vapor deposition apparatuses (10, 50, 70, 80, 90) are also taught which use the above method.
AT01923924T 2000-04-09 2001-04-05 METHOD FOR TEMPERATURE-CONTROLLED VAPOR DEPOSITION ON A SUBSTRATE ATE393840T1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
IL13555000A IL135550A0 (en) 2000-04-09 2000-04-09 Method and apparatus for temperature controlled vapor deposition on a substrate
PCT/IL2001/000326 WO2001076768A1 (en) 2000-04-09 2001-04-05 Method and apparatus for temperature controlled vapor deposition on a substrate

Publications (1)

Publication Number Publication Date
ATE393840T1 true ATE393840T1 (en) 2008-05-15

Family

ID=11074035

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01923924T ATE393840T1 (en) 2000-04-09 2001-04-05 METHOD FOR TEMPERATURE-CONTROLLED VAPOR DEPOSITION ON A SUBSTRATE

Country Status (7)

Country Link
EP (1) EP1390157B1 (en)
JP (1) JP4439156B2 (en)
AT (1) ATE393840T1 (en)
AU (1) AU2001250604A1 (en)
DE (1) DE60133838T2 (en)
IL (1) IL135550A0 (en)
WO (1) WO2001076768A1 (en)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2418628B (en) 2004-10-01 2006-12-13 Acktar Ltd Improved laminates and the manufacture thereof
JP4747658B2 (en) * 2005-04-22 2011-08-17 大日本印刷株式会社 Film forming apparatus and film forming method
JP4747665B2 (en) * 2005-05-11 2011-08-17 大日本印刷株式会社 Film forming apparatus and film forming method
CN101273052B (en) 2005-07-29 2016-01-13 爱尔兰詹森科学公司 The macrocyclic hcv inhibitors of hepatitis C virus
US20090223551A1 (en) * 2008-03-04 2009-09-10 Solexant Corp. Process for making solar cells
JP5528727B2 (en) * 2009-06-19 2014-06-25 富士フイルム株式会社 Thin film transistor manufacturing apparatus, oxide semiconductor thin film manufacturing method, thin film transistor manufacturing method, oxide semiconductor thin film, thin film transistor, and light emitting device
JP5278218B2 (en) * 2009-07-15 2013-09-04 住友金属鉱山株式会社 Long resin film processing apparatus and roll cooling apparatus, roll cooling method, and long resin film and roll cooling method
JP5959099B2 (en) 2011-07-29 2016-08-02 日東電工株式会社 Manufacturing method of laminate
CN103628046B (en) * 2012-08-24 2015-11-11 中微半导体设备(上海)有限公司 A kind of temperature controlling system and temperature control method regulating substrate surface temperature
US9380813B2 (en) 2014-02-11 2016-07-05 Timothy McCullough Drug delivery system and method
US9220294B2 (en) 2014-02-11 2015-12-29 Timothy McCullough Methods and devices using cannabis vapors
US10821240B2 (en) 2014-02-11 2020-11-03 Vapor Cartridge Technology Llc Methods and drug delivery devices using cannabis
WO2020171114A1 (en) * 2019-02-20 2020-08-27 パナソニックＩｐマネジメント株式会社 Film production method, film production device, and electrode foil production method
MX2022003189A (en) 2019-09-16 2022-06-08 Vapor Cartridge Tech Llc Drug delivery system with stackable substrates.

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59173266A (en) * 1983-03-23 1984-10-01 Fuji Photo Film Co Ltd Apparatus for formation of thin film
EP0344316B1 (en) * 1987-07-30 1994-11-02 Matsushita Electric Industrial Co., Ltd. Method for producing an electrolytic capacitor
US4844009A (en) * 1987-11-28 1989-07-04 Leybold Aktiengesellschaft Apparatus for coating webs of material having an open structure in depth
WO1989010430A1 (en) * 1988-04-27 1989-11-02 American Thin Film Laboratories, Inc. Vacuum coating system
US5239026A (en) * 1991-08-26 1993-08-24 Minnesota Mining And Manufacturing Company Low loss high numerical aperture cladded optical fibers
US5803976A (en) * 1993-11-09 1998-09-08 Imperial Chemical Industries Plc Vacuum web coating
TW289900B (en) * 1994-04-22 1996-11-01 Gould Electronics Inc
TW359688B (en) * 1995-02-28 1999-06-01 Nisshin Steel Co Ltd High anticorrosion Zn-Mg series-plated steel sheet and method of manufacture it
WO1997005994A1 (en) * 1995-08-04 1997-02-20 Microcoating Technologies Inc Chemical vapor deposition and powder formation using thermal spray with near supercritical and supercritical fluid solutions

Also Published As

Publication number Publication date
WO2001076768A1 (en) 2001-10-18
DE60133838T2 (en) 2009-06-10
JP2005537385A (en) 2005-12-08
EP1390157A1 (en) 2004-02-25
JP4439156B2 (en) 2010-03-24
EP1390157B1 (en) 2008-04-30
DE60133838D1 (en) 2008-06-12
EP1390157A4 (en) 2006-06-07
IL135550A0 (en) 2001-05-20
AU2001250604A1 (en) 2001-10-23

Similar Documents

Publication Publication Date Title
ATE393840T1 (en) METHOD FOR TEMPERATURE-CONTROLLED VAPOR DEPOSITION ON A SUBSTRATE
DE60143926D1 (en) Apparatus and method for vacuum evaporation
ATE107365T1 (en) SYNTHETIC DIAMOND DEPOSITION APPARATUS CONTAINING SPRING-PRESSURED WIRES.
DE50100443D1 (en) CONDENSATION COATING PROCESS
DE60218898D1 (en) DEVICE AND METHOD FOR HOUSING CONSERVATION COMPENSATION WITH AN INTEGRATED HEAT DISTRIBUTOR
WO2007021692A3 (en) Method and apparatus to control semiconductor film deposition characteristics
EP1209251A3 (en) Temperature control system for wafer
WO1997003236A3 (en) System and method for thermal processing of a semiconductor substrate
DK1060285T3 (en) Device and method for depositing a semiconductor material
FR2857982B1 (en) PROCESS FOR PRODUCING AN EPITAXIC LAYER
WO2003060184A3 (en) Method and apparatus for forming silicon containing films
EP0823492A3 (en) Zone heating system with feedback control
TW348272B (en) Method and apparatus for depositing planar and highly oriented layers
TW200628619A (en) Vacuum coating system
EP1067587A3 (en) Thermally processing a substrate
ATE201460T1 (en) METHOD FOR PRODUCING ALUMINUM OXIDE FILM USING DIALKYLA ALUMINUM ALKOXIDE
WO1999039022A3 (en) SUBSTRATE SUPPORT FOR SiC EPITAXY AND METHOD FOR PRODUCING AN INSERT FOR A SUSCEPTOR
ATE476536T1 (en) SUSCEPTOR SYSTEM
WO2001067505A3 (en) Substrate thermal management system
WO2003062922A3 (en) Photomask and method for manufacturing the same
TW200623218A (en) Process control methods, and semiconductor fabrication methods
KR101268822B1 (en) Heater for wafer
ATE193067T1 (en) REACTION CHAMBER WITH QUASI HOT WALL
DK1546631T3 (en) Methods for redistributing heat flux on process tubes within process heaters and process heaters including them
FR2889087B1 (en) COOKING SUPPORT FOR CERAMICS AND METHOD OF OBTAINING

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties