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ATA905283A - Loesung zur entfernung von zinn oder zinnbleilegierungslot von einer kupfer- oder nickelbasis - Google Patents

Loesung zur entfernung von zinn oder zinnbleilegierungslot von einer kupfer- oder nickelbasis

Info

Publication number
ATA905283A
ATA905283A AT0905283A AT905283A ATA905283A AT A905283 A ATA905283 A AT A905283A AT 0905283 A AT0905283 A AT 0905283A AT 905283 A AT905283 A AT 905283A AT A905283 A ATA905283 A AT A905283A
Authority
AT
Austria
Prior art keywords
tin
copper
removal
solution
nickel base
Prior art date
Application number
AT0905283A
Other languages
English (en)
Other versions
AT385521B (de
Original Assignee
Circuit Chemistry Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Circuit Chemistry Corp filed Critical Circuit Chemistry Corp
Publication of ATA905283A publication Critical patent/ATA905283A/de
Application granted granted Critical
Publication of AT385521B publication Critical patent/AT385521B/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/44—Compositions for etching metallic material from a metallic material substrate of different composition
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K13/00—Etching, surface-brightening or pickling compositions
    • C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
    • C09K13/08—Etching, surface-brightening or pickling compositions containing an inorganic acid containing a fluorine compound
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/067—Etchants

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • ing And Chemical Polishing (AREA)
  • Manufacture And Refinement Of Metals (AREA)
AT0905283A 1982-09-20 1983-09-20 Loesung zur entfernung von zinn oder zinn-bleilegierungslot von einer kupfer- oder nickelbasis AT385521B (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/420,482 US4397753A (en) 1982-09-20 1982-09-20 Solder stripping solution

Publications (2)

Publication Number Publication Date
ATA905283A true ATA905283A (de) 1987-09-15
AT385521B AT385521B (de) 1988-04-11

Family

ID=23666665

Family Applications (1)

Application Number Title Priority Date Filing Date
AT0905283A AT385521B (de) 1982-09-20 1983-09-20 Loesung zur entfernung von zinn oder zinn-bleilegierungslot von einer kupfer- oder nickelbasis

Country Status (11)

Country Link
US (1) US4397753A (de)
EP (1) EP0119262B1 (de)
JP (1) JPS59501751A (de)
AT (1) AT385521B (de)
CA (1) CA1203149A (de)
CH (1) CH661742A5 (de)
DE (1) DE3390209T1 (de)
GB (1) GB2138448B (de)
NL (1) NL8320311A (de)
SE (1) SE452329B (de)
WO (1) WO1984001168A1 (de)

Families Citing this family (40)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT1144797B (it) * 1981-10-14 1986-10-29 Alfachimici Spa Soluzione per l asportazione di stagno o lega stagno piombo da un substrato mediante operazione a spruzzo
AU1334783A (en) * 1982-03-12 1983-10-24 Eriksson Jan-Olof Bertil A non-abrasive metal cleaning agent
US4544439A (en) * 1984-07-26 1985-10-01 International Business Machines Corporation System for repairing electrical short circuits between parallel printed circuits
US4604144A (en) * 1985-09-11 1986-08-05 At&T Technologies, Inc. Process for cleaning a circuit board
US4687545A (en) * 1986-06-18 1987-08-18 Macdermid, Incorporated Process for stripping tin or tin-lead alloy from copper
US4713144A (en) * 1986-08-01 1987-12-15 Ardrox Inc. Composition and method for stripping films from printed circuit boards
EP0265578A1 (de) * 1986-10-30 1988-05-04 Jan-Olof Eriksson Zusammensetzung eines nicht abschleifenden Polier- und Reinigungsmittels und Verfahren zu ihrer Herstellung
DE3738307A1 (de) * 1987-11-11 1989-05-24 Ruwel Werke Gmbh Badloesungen und verfahren zum entfernen von blei/zinn-, blei- bzw. zinnschichten auf kupfer- oder nickeloberflaechen
US4957653A (en) * 1989-04-07 1990-09-18 Macdermid, Incorporated Composition containing alkane sulfonic acid and ferric nitrate for stripping tin or tin-lead alloy from copper surfaces, and method for stripping tin or tin-lead alloy
US4944851A (en) * 1989-06-05 1990-07-31 Macdermid, Incorporated Electrolytic method for regenerating tin or tin-lead alloy stripping compositions
US4921571A (en) * 1989-07-28 1990-05-01 Macdermid, Incorporated Inhibited composition and method for stripping tin, lead or tin-lead alloy from copper surfaces
JPH0375386A (ja) * 1989-08-18 1991-03-29 Metsuku Kk 錫又は錫‐鉛合金の剥離方法
US5017267A (en) * 1990-07-17 1991-05-21 Macdermid, Incorporated Composition and method for stripping tin or tin-lead alloy from copper surfaces
US5565039A (en) * 1994-06-03 1996-10-15 Wagenknecht; John H. Method for dissolution of soft metals from a substrate of a harder metal
US5824631A (en) * 1994-06-03 1998-10-20 Wagenknecht; John H. Compositions for dissolution of soft metals
US6642199B2 (en) * 2001-04-19 2003-11-04 Hubbard-Hall, Inc. Composition for stripping nickel from substrates and process
EP1302569A3 (de) * 2001-10-11 2004-03-03 Shipley Co. L.L.C. Entschichtungslösung
US6838114B2 (en) 2002-05-24 2005-01-04 Micron Technology, Inc. Methods for controlling gas pulsing in processes for depositing materials onto micro-device workpieces
US6821347B2 (en) 2002-07-08 2004-11-23 Micron Technology, Inc. Apparatus and method for depositing materials onto microelectronic workpieces
US6955725B2 (en) 2002-08-15 2005-10-18 Micron Technology, Inc. Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces
US6818249B2 (en) * 2003-03-03 2004-11-16 Micron Technology, Inc. Reactors, systems with reaction chambers, and methods for depositing materials onto micro-device workpieces
US7335396B2 (en) 2003-04-24 2008-02-26 Micron Technology, Inc. Methods for controlling mass flow rates and pressures in passageways coupled to reaction chambers and systems for depositing material onto microfeature workpieces in reaction chambers
US7344755B2 (en) 2003-08-21 2008-03-18 Micron Technology, Inc. Methods and apparatus for processing microfeature workpieces; methods for conditioning ALD reaction chambers
US7235138B2 (en) 2003-08-21 2007-06-26 Micron Technology, Inc. Microfeature workpiece processing apparatus and methods for batch deposition of materials on microfeature workpieces
US7422635B2 (en) 2003-08-28 2008-09-09 Micron Technology, Inc. Methods and apparatus for processing microfeature workpieces, e.g., for depositing materials on microfeature workpieces
US7056806B2 (en) 2003-09-17 2006-06-06 Micron Technology, Inc. Microfeature workpiece processing apparatus and methods for controlling deposition of materials on microfeature workpieces
US7282239B2 (en) * 2003-09-18 2007-10-16 Micron Technology, Inc. Systems and methods for depositing material onto microfeature workpieces in reaction chambers
US7323231B2 (en) 2003-10-09 2008-01-29 Micron Technology, Inc. Apparatus and methods for plasma vapor deposition processes
US7581511B2 (en) 2003-10-10 2009-09-01 Micron Technology, Inc. Apparatus and methods for manufacturing microfeatures on workpieces using plasma vapor processes
US7647886B2 (en) 2003-10-15 2010-01-19 Micron Technology, Inc. Systems for depositing material onto workpieces in reaction chambers and methods for removing byproducts from reaction chambers
US7258892B2 (en) * 2003-12-10 2007-08-21 Micron Technology, Inc. Methods and systems for controlling temperature during microfeature workpiece processing, e.g., CVD deposition
US7906393B2 (en) * 2004-01-28 2011-03-15 Micron Technology, Inc. Methods for forming small-scale capacitor structures
US7584942B2 (en) * 2004-03-31 2009-09-08 Micron Technology, Inc. Ampoules for producing a reaction gas and systems for depositing materials onto microfeature workpieces in reaction chambers
US8133554B2 (en) 2004-05-06 2012-03-13 Micron Technology, Inc. Methods for depositing material onto microfeature workpieces in reaction chambers and systems for depositing materials onto microfeature workpieces
US7699932B2 (en) 2004-06-02 2010-04-20 Micron Technology, Inc. Reactors, systems and methods for depositing thin films onto microfeature workpieces
EP2503029B1 (de) 2011-03-22 2013-03-20 Atotech Deutschland GmbH Verfahren zum Ätzen einer mit Zinn oder einer Zinnlegierung gefüllten vertieften Struktur
TWI521097B (zh) 2014-06-25 2016-02-11 優勝奈米科技有限公司 剝錫添加劑及其應用
CN106283057A (zh) * 2016-09-28 2017-01-04 佛山科学技术学院 一种浓缩金镀层退镀液及其使用方法
JP7135384B2 (ja) * 2018-03-30 2022-09-13 住友大阪セメント株式会社 光導波路素子
CN113984465A (zh) * 2021-10-12 2022-01-28 江西洪都航空工业集团有限责任公司 一种用于溶解钎锡焊料的溶解液及溶解方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3677949A (en) * 1970-09-04 1972-07-18 Enthone Selectively stripping tin and/or lead from copper substrates
US4004956A (en) * 1974-08-14 1977-01-25 Enthone, Incorporated Selectively stripping tin or tin-lead alloys from copper substrates
SU773063A1 (ru) * 1979-02-15 1980-10-23 Предприятие П/Я А-7438 Раствор дл сн ти олов нно-свинцовых покрытий с медной основы
US4306933A (en) * 1980-02-11 1981-12-22 Chemline Industries Tin/tin-lead stripping solutions
US4297257A (en) * 1980-04-17 1981-10-27 Dart Industries Inc. Metal stripping composition and method

Also Published As

Publication number Publication date
SE8402705D0 (sv) 1984-05-18
DE3390209C2 (de) 1993-01-21
CA1203149A (en) 1986-04-15
DE3390209T1 (de) 1985-01-24
SE8402705L (sv) 1984-05-18
SE452329B (sv) 1987-11-23
WO1984001168A1 (en) 1984-03-29
GB8412205D0 (en) 1984-06-20
AT385521B (de) 1988-04-11
GB2138448A (en) 1984-10-24
CH661742A5 (de) 1987-08-14
JPS59501751A (ja) 1984-10-18
EP0119262A1 (de) 1984-09-26
EP0119262A4 (de) 1985-04-23
EP0119262B1 (de) 1987-12-16
US4397753A (en) 1983-08-09
GB2138448B (en) 1985-12-24
NL8320311A (nl) 1984-08-01

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Legal Events

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ELJ Ceased due to non-payment of the annual fee