AT325678B - PROCESS FOR ALKALINE ETCHING OF PN-TRANSITIONS PROVIDED SEMI-CONDUCTOR ARRANGEMENTS - Google Patents

PROCESS FOR ALKALINE ETCHING OF PN-TRANSITIONS PROVIDED SEMI-CONDUCTOR ARRANGEMENTS

Info

Publication number: AT325678B
Authority: AT; Austria
Prior art keywords: alkaline etching; conductor arrangements; provided semi; transitions provided; transitions
Prior art date: 1972-03-23

Application number

AT1017072A

Other languages

German (de)

Other versions

ATA1017072A (en

Original Assignee

Siemens Ag

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1972-03-23

Filing date

1972-11-29

Publication date

1975-11-10

1972-11-29 Application filed by Siemens Ag filed Critical Siemens Ag

1975-01-15 Publication of ATA1017072A publication Critical patent/ATA1017072A/en

1975-11-10 Application granted granted Critical

1975-11-10 Publication of AT325678B publication Critical patent/AT325678B/en

Classifications

- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02002—Preparing wafers
- H01L21/02005—Preparing bulk and homogeneous wafers
- H01L21/02008—Multistep processes
- H01L21/0201—Specific process step
- H01L21/02019—Chemical etching
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/32—Alkaline compositions
- C23F1/40—Alkaline compositions for etching other metallic material
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/30604—Chemical etching
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/30604—Chemical etching
- H01L21/30608—Anisotropic liquid etching
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/30604—Chemical etching
- H01L21/30612—Etching of AIIIBV compounds
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/308—Chemical or electrical treatment, e.g. electrolytic etching using masks
- H01L21/3081—Chemical or electrical treatment, e.g. electrolytic etching using masks characterised by their composition, e.g. multilayer masks, materials

Landscapes

Engineering & Computer Science (AREA)
Chemical & Material Sciences (AREA)
Computer Hardware Design (AREA)
Microelectronics & Electronic Packaging (AREA)
General Chemical & Material Sciences (AREA)
Condensed Matter Physics & Semiconductors (AREA)
General Physics & Mathematics (AREA)
Manufacturing & Machinery (AREA)
Chemical Kinetics & Catalysis (AREA)
Physics & Mathematics (AREA)
Power Engineering (AREA)
Materials Engineering (AREA)
Mechanical Engineering (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Weting (AREA)
ing And Chemical Polishing (AREA)
Thyristors (AREA)

AT1017072A 1972-03-23 1972-11-29 PROCESS FOR ALKALINE ETCHING OF PN-TRANSITIONS PROVIDED SEMI-CONDUCTOR ARRANGEMENTS AT325678B (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
DE19722214197 DE2214197C3 (en)	1972-03-23	1972-03-23	Process for etching semiconductor wafers containing PN junctions

Publications (2)

Publication Number	Publication Date
ATA1017072A ATA1017072A (en)	1975-01-15
AT325678B true AT325678B (en)	1975-11-10

Family

ID=5839938

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
AT1017072A AT325678B (en)	1972-03-23	1972-11-29	PROCESS FOR ALKALINE ETCHING OF PN-TRANSITIONS PROVIDED SEMI-CONDUCTOR ARRANGEMENTS

Country Status (11)

Country	Link
JP (1)	JPS525230B2 (en)
AT (1)	AT325678B (en)
BE (1)	BE797244A (en)
CH (1)	CH575175A5 (en)
DE (1)	DE2214197C3 (en)
ES (1)	ES409621A1 (en)
FR (1)	FR2176664B1 (en)
GB (1)	GB1362507A (en)
IT (1)	IT972618B (en)
NL (1)	NL7217673A (en)
SE (1)	SE378478B (en)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
GB889872A (en) *	1957-04-24	1962-02-21	Sarkes Tarzian	A method of treating a semi-conductor device
FR1266612A (en) *	1960-06-02	1961-07-17		Etching solutions for the surface treatment of semiconductor materials
NL271850A (en) *	1961-02-03
GB980513A (en) *	1961-11-17	1965-01-13	Licentia Gmbh	Improvements relating to the use of silicon in semi-conductor devices
DE1621511A1 (en) *	1967-04-01	1970-07-23	Siemens Ag	Process for anti-reflective coating of silicon single crystal surfaces

1972
- 1972-03-23 DE DE19722214197 patent/DE2214197C3/en not_active Expired
- 1972-11-29 CH CH1742472A patent/CH575175A5/xx not_active IP Right Cessation
- 1972-11-29 AT AT1017072A patent/AT325678B/en active
- 1972-12-14 ES ES409621A patent/ES409621A1/en not_active Expired
- 1972-12-20 IT IT3323272A patent/IT972618B/en active
- 1972-12-21 FR FR7245655A patent/FR2176664B1/fr not_active Expired
- 1972-12-27 NL NL7217673A patent/NL7217673A/xx unknown
1973
- 1973-01-25 GB GB380173A patent/GB1362507A/en not_active Expired
- 1973-03-22 JP JP3304473A patent/JPS525230B2/ja not_active Expired
- 1973-03-23 BE BE129187A patent/BE797244A/en unknown
- 1973-03-23 SE SE7304136A patent/SE378478B/xx unknown

Also Published As

Publication number	Publication date
NL7217673A (en)	1973-09-25
FR2176664B1 (en)	1977-12-30
JPS4915371A (en)	1974-02-09
JPS525230B2 (en)	1977-02-10
FR2176664A1 (en)	1973-11-02
DE2214197B2 (en)	1981-04-23
DE2214197A1 (en)	1973-09-27
BE797244A (en)	1973-07-16
ES409621A1 (en)	1975-12-01
ATA1017072A (en)	1975-01-15
GB1362507A (en)	1974-08-07
SE378478B (en)	1975-09-01
IT972618B (en)	1974-05-31
DE2214197C3 (en)	1982-01-14
CH575175A5 (en)	1976-04-30

Publication	Publication Date	Title
AT358978B (en)	1980-10-10	METHOD FOR PROCESSING KAOLINTON
ATA501373A (en)	1979-07-15	METHOD OF PROCESSING KAOLINTON
CH498493A (en)	1970-10-31	Process for producing monolithic semiconductor devices
AT363910B (en)	1981-09-10	METHOD FOR WASHING CALCIUM SULFATHEMIHYDRATE CRYSTALS
CH445649A (en)	1967-10-31	Method for manufacturing semiconductor circuits
AT258364B (en)	1967-11-27	Method for manufacturing semiconductor devices
AT332133B (en)	1976-09-10	PROCESS FOR RECRISTALLIZATION ANNEALING OF BRASS SEMI-PRODUCTS
CH558217A (en)	1975-01-31	PROCESS FOR RELEASING DEPOSITS ON SURFACES OF COMPONENTS.
AT303485B (en)	1972-10-15	PROCESS FOR VACUUM EVAPORATION OF LAYERS
AT327837B (en)	1976-02-25	PROCESS FOR CRYSTALLIZING FRUCTOSE
AT266220B (en)	1968-11-11	Process for the production of semiconductor components on a magnetic substrate
DE1934743B2 (en)	1971-04-29	METHOD OF ETCHING SILICON NITRIDE
AT262381B (en)	1968-06-10	Method for manufacturing semiconductor circuits
ATA764673A (en)	1977-02-15	METHOD OF CALCINATING PLASTER
AT338873B (en)	1977-09-26	PROCESS FOR MANUFACTURING SMALL THYRISTORS
AT320607B (en)	1975-02-25	Process for obtaining D-penicillamine
AT337779B (en)	1977-07-25	METHOD OF CONTACTING A SEMICONDUCTOR DISC
AT325678B (en)	1975-11-10	PROCESS FOR ALKALINE ETCHING OF PN-TRANSITIONS PROVIDED SEMI-CONDUCTOR ARRANGEMENTS
AT331807B (en)	1976-08-25	PROCESS FOR MANUFACTURING PURE LACTAMEN
AT327856B (en)	1976-02-25	METHOD OF PRINTING TEXTILES
AT328822B (en)	1976-04-12	PROCESS FOR PRE-TREATMENT OF PLASTIC SURFACES
AT259016B (en)	1967-12-27	Method for manufacturing semiconductor devices
AT347546B (en)	1978-12-27	PROCESS FOR MANUFACTURING OPAQUE COATING
AT316269B (en)	1974-07-10	Method of making compound material
CH489911A (en)	1970-04-30	Method for contacting semiconductor arrangements