AT260290B - Pre-coated photosensitive material for the production of printing forms - Google Patents
Pre-coated photosensitive material for the production of printing formsInfo
- Publication number
- AT260290B AT260290B AT472065A AT472065A AT260290B AT 260290 B AT260290 B AT 260290B AT 472065 A AT472065 A AT 472065A AT 472065 A AT472065 A AT 472065A AT 260290 B AT260290 B AT 260290B
- Authority
- AT
- Austria
- Prior art keywords
- production
- photosensitive material
- printing forms
- coated photosensitive
- coated
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D215/00—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems
- C07D215/02—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen atoms or carbon atoms directly attached to the ring nitrogen atom
- C07D215/16—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen atoms or carbon atoms directly attached to the ring nitrogen atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D215/20—Oxygen atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D215/00—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems
- C07D215/02—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen atoms or carbon atoms directly attached to the ring nitrogen atom
- C07D215/16—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen atoms or carbon atoms directly attached to the ring nitrogen atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D215/20—Oxygen atoms
- C07D215/24—Oxygen atoms attached in position 8
- C07D215/26—Alcohols; Ethers thereof
- C07D215/32—Esters
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DEK0053038 | 1964-05-27 |
Publications (1)
Publication Number | Publication Date |
---|---|
AT260290B true AT260290B (en) | 1968-02-26 |
Family
ID=7226574
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT472065A AT260290B (en) | 1964-05-27 | 1965-05-24 | Pre-coated photosensitive material for the production of printing forms |
Country Status (4)
Country | Link |
---|---|
AT (1) | AT260290B (en) |
BE (1) | BE664410A (en) |
GB (1) | GB1073098A (en) |
NL (1) | NL6506249A (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4526856A (en) * | 1983-05-23 | 1985-07-02 | Allied Corporation | Low striation positive diazoketone resist composition with cyclic ketone(s) and aliphatic alcohol as solvents |
US5866295A (en) * | 1997-03-07 | 1999-02-02 | Clariant Finance (Bvi) Limited | Photosensitive quinolone compounds and a process of preparation |
-
1965
- 1965-05-17 NL NL6506249A patent/NL6506249A/xx unknown
- 1965-05-24 AT AT472065A patent/AT260290B/en active
- 1965-05-24 BE BE664410A patent/BE664410A/xx unknown
- 1965-05-26 GB GB2242865A patent/GB1073098A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
NL6506249A (en) | 1965-11-29 |
GB1073098A (en) | 1967-06-21 |
BE664410A (en) | 1965-11-24 |
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