AT252966B - Lichtempfindliches Material zur Herstellung von Druckformen - Google Patents

Lichtempfindliches Material zur Herstellung von Druckformen

Info

Publication number: AT252966B
Authority: AT; Austria
Prior art keywords: photosensitive material; printing forms; making printing; making; forms
Prior art date: 1963-10-03

Application number

AT835164A

Other languages

English (en)

Original Assignee

Kalle Ag

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1963-10-03

Filing date

1964-09-30

Publication date

1967-03-10

1964-09-30 Application filed by Kalle Ag filed Critical Kalle Ag

1967-03-10 Application granted granted Critical

1967-03-10 Publication of AT252966B publication Critical patent/AT252966B/de

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Photosensitive Polymer And Photoresist Processing (AREA)
Printing Plates And Materials Therefor (AREA)
Materials For Photolithography (AREA)

AT835164A 1963-10-03 1964-09-30 Lichtempfindliches Material zur Herstellung von Druckformen AT252966B (de)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
DE1963K0050993 DE1447015B2 (de)	1963-10-03	1963-10-03	Lichtempfindliche schichten zur herstellung von druckformen

Publications (1)

Publication Number	Publication Date
AT252966B true AT252966B (de)	1967-03-10

Family

ID=7225836

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
AT835164A AT252966B (de)	1963-10-03	1964-09-30	Lichtempfindliches Material zur Herstellung von Druckformen

Country Status (7)

Country	Link
US (1)	US3269837A (de)
AT (1)	AT252966B (de)
BE (1)	BE653790A (de)
CH (1)	CH434976A (de)
DE (1)	DE1447015B2 (de)
GB (1)	GB1031547A (de)
NL (1)	NL6411486A (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
GB1116674A (en) *	1966-02-28	1968-06-12	Agfa Gevaert Nv	Naphthoquinone diazide sulphofluoride
CA1120763A (en) *	1977-11-23	1982-03-30	James A. Carothers	Enhancement of resist development
US4268602A (en) *	1978-12-05	1981-05-19	Toray Industries, Ltd.	Photosensitive O-quinone diazide containing composition
DE3541723A1 (de) *	1985-11-26	1987-05-27	Hoechst Ag	Lichtempfindliches, diazoniumgruppen enthaltendes polykondensationsprodukt, verfahren zu seiner herstellung und lichtempfindliches aufzeichnungsmaterial, das dieses polykondensationsprodukt enthaelt
US5173390A (en) *	1986-06-27	1992-12-22	Texas Instruments Incorporated	Water soluble contrast enhancement composition and method of use
US4997742A (en) *	1986-06-27	1991-03-05	Texas Instruments Inc.	Water soluble contrast enhancement composition with 1-oxy-2 diazonaphthalene sulfonamide salt and polyvinyl alcohol
US4816380A (en) *	1986-06-27	1989-03-28	Texas Instruments Incorporated	Water soluble contrast enhancement layer method of forming resist image on semiconductor chip
US4797345A (en) *	1987-07-01	1989-01-10	Olin Hunt Specialty Products, Inc.	Light-sensitive 1,2-naphthoquinone-2-diazide-4-sulfonic acid monoesters of cycloalkyl substituted phenol and their use in light-sensitive mixtures
US5272026A (en) *	1987-12-18	1993-12-21	Ucb S.A.	Negative image process utilizing photosensitive compositions containing aromatic fused polycyclic sulfonic acid and partial ester or phenolic resin with diazoquinone sulfonic acid or diazoquinone carboxylic acid, and associated imaged article
GB8729510D0 (en) *	1987-12-18	1988-02-03	Ucb Sa	Photosensitive compositions containing phenolic resins & diazoquinone compounds
DE3822522A1 (de) *	1988-07-04	1990-03-22	Hoechst Ag	1,2-naphthochinon-2-diazid-sulfonsaeureamide und lichtempfindliche gemische, die diese enthalten
JP2599007B2 (ja) *	1989-11-13	1997-04-09	富士写真フイルム株式会社	ポジ型感光性組成物
DE4134526A1 (de) *	1990-10-18	1992-05-14	Toyo Gosei Kogyo Kk	Positive photoresist-zusammensetzung und mustererzeugungsverfahren unter verwendung dieser zusammensetzung
JP2008230028A (ja) *	2007-03-20	2008-10-02	Fujifilm Corp	機上現像可能な平版印刷版原版

1963
- 1963-10-03 DE DE1963K0050993 patent/DE1447015B2/de active Granted
1964
- 1964-09-30 BE BE653790A patent/BE653790A/xx unknown
- 1964-09-30 AT AT835164A patent/AT252966B/de active
- 1964-10-01 US US400936A patent/US3269837A/en not_active Expired - Lifetime
- 1964-10-01 CH CH1274664A patent/CH434976A/de unknown
- 1964-10-02 GB GB40258/64A patent/GB1031547A/en not_active Expired
- 1964-10-02 NL NL6411486A patent/NL6411486A/xx unknown

Also Published As

Publication number	Publication date
NL6411486A (de)	1965-04-05
BE653790A (de)	1965-03-30
DE1447015A1 (de)	1969-01-09
GB1031547A (en)	1966-06-02
DE1447015B2 (de)	1973-03-15
CH434976A (de)	1967-04-30
US3269837A (en)	1966-08-30

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