Abstract
The microelectronics circuits used in the aerospace applications work in an extremely radiated environment, causing a large possibility of a single event upset (SEU). Static random access memory (SRAM) is the most susceptible of these circuits as it occupies a significant area of the recent System-on-Chip (SoC) and also frequently store important data. Therefore, retaining data integrity with regards to SEUs has become a primary requirement of SRAM bit-cell design. Use of FinFET devices in the SRAM cell can offer higher resistance against radiation compared to the CMOS counterparts. In this work, using TCAD simulations, we have analysed effect of SEU on three different FinFET based 6T bit-cell configurations, in which number of fins in the access and pull-down transistors are different. We have analysed the effect of SEU at an angle of 90° and 60°.












References
Dodd L and Massengill L 2003 Basic mechanisms and modeling of single-event upset in digital microelectronics. IEEE Trans. Nucl. Sci. 50(3): 261–263
WP-01206-1.0. White Paper. © 2013 Altera Corporation, Introduction to Single-Event Upsets, San Jose, CA
Bhattacharya D and Jha N 2014 FinFETs: from devices to architectures. Adv. Electron. 10: 365689. https://doi.org/10.1155/2014/365689
Limachia M, Thakker R and Kothari N 2018 A near-threshold 10T differential SRAM cell with high read and write margin for tri-gated FinFET technology. Integr VLSI J Elsevier 61: 126–137
Senthil Kumar M 2015 A 22 nm FinFET based 6T-SRAM cell design with scaled supply voltage for increase read access time, 28 April 2015 Springer © Science and Business Media, New York
Saxena G, Agrawal R and Sharma S 2013 Single event upset (SEU) in SRAM. Int. J. Eng. Res. Appl. 3(4): 2171–2175
Rahman N and Singh B P 2013 Static-Noise-Margin Analysis of Conventional 6T SRAM Cell at 45 nm Technology, Int. J. Comput. Appl. 66(20): 283–297 (ISSN: 0975-8887)
Kumar V, Singh R P P, Gupta R and Vaid R 2016 Effect of high-k gate dielectric materials on electrical characteristics of GaAs channel material based double gate n-FinFET. Int. J. Emerg. Res. Manag. Technol. 139: 28–32
Mustafa M, Bhat T A and Beigh M R 2013 Threshold voltage sensitivity to metal gate work-function based performance evaluation of double-gate n-FinFET structures for LSTP technology. World J. Nano Sci. Eng. 3(1): 17–22
Goyal A, Tomar A and Goyal A 2017 Effect of W/L ratio on SRAM cell SNM for high-speed application. Int. Res. J. Eng. Technol. 4(4): 2326-2332
Cogenda TCAD Tool Suite [Online]. Available: http://www.congendatcad.com
Ahlbin J R 2011 Effect of multiple-transistor charge collection on single-event transient pulse widths. IEEE Trans. Device Mater. 11(3): 401–405
Acknowledgements
Authors are thankful for the financial support offered under the Grant Number: GUJCOST/MRP/2015-16/2651 by Gujarat Council On Science and Technology (GUJCOST), Department of Science and Technology, Government of Gujarat to carry out this research activity.
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Limachia, M., Kothari, N. Characterization of various FinFET based 6T SRAM cell configurations in light of radiation effect. Sādhanā 45, 31 (2020). https://doi.org/10.1007/s12046-020-1269-8
Received:
Accepted:
Published:
DOI: https://doi.org/10.1007/s12046-020-1269-8