Trimming of Imperfect Cylindrical Fused Silica Resonators by Chemical Etching
<p>The schematic of chemical trimming: (<b>a</b>) The front view of the etching geometry; (<b>b</b>) The half-section view of the etching geometry.</p> "> Figure 2
<p>The relation between the fourth harmonic mass removed by chemical trimming and the etching parameters: (<b>a</b>) Dependence of the trimming efficiency on angle <span class="html-italic">α</span>; (<b>b</b>) Dependence of the fourth harmonic mass removed by chemical trimming on angle <span class="html-italic">α</span> and <span class="html-italic">δ</span>.</p> "> Figure 3
<p>The cylindrical resonator and the experimental setup: (<b>a</b>) Cylindrical fused silica resonator; (<b>b</b>) Experimental setup of the chemical trimming.</p> "> Figure 4
<p>The chemical trimming results on resonator #I01: (<b>a</b>) Variations of the total mass and the lower natural frequency; (<b>b</b>) Variation of the frequency split Δ<span class="html-italic">f</span> on the total balancing mass <span class="html-italic">M<sub>T</sub></span><sub>4</sub>.</p> "> Figure 5
<p>The variations of frequency split and Q factor of resonator #I01: (<b>a</b>) Before chemical trimming; (<b>b</b>) After chemical trimming.</p> "> Figure 6
<p>The variation of frequency split and Q factor of #I02 and #I03: (<b>a</b>) #I02 before trimming; (<b>b</b>) #I02 after trimming; (<b>c</b>) #I03 before trimming; (<b>d</b>) #I03 after trimming.</p> "> Figure 6 Cont.
<p>The variation of frequency split and Q factor of #I02 and #I03: (<b>a</b>) #I02 before trimming; (<b>b</b>) #I02 after trimming; (<b>c</b>) #I03 before trimming; (<b>d</b>) #I03 after trimming.</p> "> Figure A1
<p>Coordinate system and geometry of the cylindrical shell.</p> ">
Abstract
:1. Introduction
2. Chemical Trimming Principle
3. Experiment and Results
4. Discussions
5. Conclusions
Author Contributions
Funding
Acknowledgments
Conflicts of Interest
Appendix A
References
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Resonator | Before Etching | After Etching | ||||||
---|---|---|---|---|---|---|---|---|
f1 (Hz) | Δf (Hz) | Q1 | δQ (%) | f1 (Hz) | Δf (Hz) | Q1 | δQ (%) | |
#I01 | 4586.243 | 2.270 | 6814 | 2.864 | 4570.654 | 0.061 | 7200 | 0.167 |
#I02 | 4011.621 | 1.249 | 8830 | 2.221 | 4003.475 | 0.049 | 8790 | 0.929 |
#I03 | 3961.133 | 1.318 | 8696 | 0.825 | 3954.773 | 0.061 | 9143 | 0.207 |
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Tao, Y.; Pan, Y.; Jin, S.; Jia, Y.; Yang, K.; Luo, H. Trimming of Imperfect Cylindrical Fused Silica Resonators by Chemical Etching. Sensors 2019, 19, 3596. https://doi.org/10.3390/s19163596
Tao Y, Pan Y, Jin S, Jia Y, Yang K, Luo H. Trimming of Imperfect Cylindrical Fused Silica Resonators by Chemical Etching. Sensors. 2019; 19(16):3596. https://doi.org/10.3390/s19163596
Chicago/Turabian StyleTao, Yunfeng, Yao Pan, Shilong Jin, Yonglei Jia, Kaiyong Yang, and Hui Luo. 2019. "Trimming of Imperfect Cylindrical Fused Silica Resonators by Chemical Etching" Sensors 19, no. 16: 3596. https://doi.org/10.3390/s19163596